JPS63205293A - Preparation of support of planogrphic printing plate - Google Patents
Preparation of support of planogrphic printing plateInfo
- Publication number
- JPS63205293A JPS63205293A JP3779887A JP3779887A JPS63205293A JP S63205293 A JPS63205293 A JP S63205293A JP 3779887 A JP3779887 A JP 3779887A JP 3779887 A JP3779887 A JP 3779887A JP S63205293 A JPS63205293 A JP S63205293A
- Authority
- JP
- Japan
- Prior art keywords
- web
- heated
- treatment
- induction heating
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007639 printing Methods 0.000 title claims description 13
- 238000011282 treatment Methods 0.000 claims abstract description 39
- 238000010438 heat treatment Methods 0.000 claims abstract description 24
- 230000006698 induction Effects 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 15
- 239000007788 liquid Substances 0.000 claims abstract description 13
- 239000000126 substance Substances 0.000 claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 abstract description 38
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 38
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract description 27
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract description 11
- 229910017604 nitric acid Inorganic materials 0.000 abstract description 11
- 235000011121 sodium hydroxide Nutrition 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 4
- 238000005260 corrosion Methods 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 3
- 230000005674 electromagnetic induction Effects 0.000 abstract description 2
- 238000005406 washing Methods 0.000 abstract 1
- 238000012545 processing Methods 0.000 description 15
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 13
- 238000000034 method Methods 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 235000011007 phosphoric acid Nutrition 0.000 description 7
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 6
- 238000005868 electrolysis reaction Methods 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- 239000008151 electrolyte solution Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 3
- 239000010407 anodic oxide Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- -1 H2SO Chemical compound 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 235000010338 boric acid Nutrition 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、平版印刷版支持体の製造方法に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing a lithographic printing plate support.
平版印刷版支持体の製造方法にはいろいろあるが、電気
化学的処理方法、化学的処理方法では、反応状態をコン
トロールするには、反応時間２液組成、液温、電気条件
などを変えることにより反応をコントロールしている。There are various methods for producing lithographic printing plate supports, but in electrochemical processing methods and chemical processing methods, the reaction conditions can be controlled by changing the reaction time, composition of the two liquids, liquid temperature, electrical conditions, etc. controlling the reaction.
゛
しかし、近年生産性向上の要望が高まり、処理時間を短
くする必要から、処理液の液温を上昇させるか、処理槽
を延長するなどの対応を行ってきた。However, in recent years there has been a growing demand for improved productivity and the need to shorten processing time, so measures have been taken such as increasing the temperature of the processing solution or extending the length of the processing tank.
しかし、処理液の液温を上昇させることにより、処理液
のスケール発生並びに処理槽などの器材の腐食が激しく
なり、弊害が顕著になって来た。However, by increasing the temperature of the processing solution, scale generation in the processing solution and corrosion of equipment such as processing tanks become more severe, and the negative effects have become noticeable.
また、処理槽の延長についても、建設費の増大、並びに
スペースの増加となり、設備コストが高くなるという問
題点が顕在化してきた。また、少量多品種生産という面
から処理条件の変更時間を出来るだけ少くする必要があ
るが、従来の方法では処理液の液温を上昇、下降するの
に多くの時間、並びにエネルギーコストが必要であった
。Furthermore, the problem of extending the treatment tank has become apparent as it increases construction costs and space, leading to higher equipment costs. In addition, from the perspective of low-volume, high-mix production, it is necessary to minimize the time required to change processing conditions, but with conventional methods, it takes a lot of time and energy costs to raise and lower the temperature of the processing solution. there were.
本発明は１以上の様な課題をふまえ、鋭意検討を行った
結果、以下の発明となったのである。すなわち、処理液
中で、誘導加熱により金属シート又はウェブを加熱しな
がら、化学的処理、又は電気化学的処理を行うことを特
徴とする方法である。The present invention was made based on one or more problems, and as a result of intensive studies, the following invention was achieved. That is, this method is characterized by performing chemical treatment or electrochemical treatment while heating a metal sheet or web by induction heating in a treatment liquid.
また処理液中で誘導加熱により金属シート又はウェブを
加熱しながら、化学的処理、並びに電気化学的処理を行
うことを特徴とする方法である。Further, this method is characterized by performing chemical treatment and electrochemical treatment while heating the metal sheet or web by induction heating in a treatment liquid.
本発明においては支持体用の金属シート又はウェブとし
てアルミニウム板が主として用いられるが、用いられる
アルミニウム板の素材としては、純アルミニウムおよび
アルミニウム合金があり、後者としては珪素、銅、鉄、
マンガン、マグネシウム、クロム、亜鉛、鉛、ビスマス
、ニッケルなどを微量含むアルミニウムを主成分とする
合金がある。いずれにしてもアルミニウムの純度が９９
．０％以上であるものが好ましいといえる。In the present invention, an aluminum plate is mainly used as the metal sheet or web for the support, and the materials used for the aluminum plate include pure aluminum and aluminum alloys, and the latter include silicon, copper, iron,
There are alloys whose main component is aluminum, containing trace amounts of manganese, magnesium, chromium, zinc, lead, bismuth, nickel, etc. In any case, the purity of aluminum is 99
．． It can be said that it is preferable that the content is 0% or more.
以下、アルミニウム板を粗面化する場合によって本発明
を詳述するが、本発明はこれに限らずアルミニウム板を
他の表面処理する場合に適用できるのは勿論、亜鉛、鉄
等、他の金属シート又はウェブに対しても適用可能であ
る。The present invention will be described in detail below based on the case of roughening an aluminum plate, but the present invention is not limited to this and can of course be applied to other surface treatments of aluminum plates, as well as other metals such as zinc and iron. It is also applicable to sheets or webs.
前記の素材からなるアルミニウム板より製造した平版印
刷版は、一般には印刷機の構造の関係から長方形の形状
のものが使用されるが、本発明によりアルミニウム板を
処理するさいには、特に大量生産の規模の場合ウェブ状
（帯状）として処理するのが好ましく、処理後に所望の
長方形に裁断される。Lithographic printing plates manufactured from aluminum plates made of the above-mentioned materials are generally rectangular in shape due to the structure of the printing press, but when processing aluminum plates according to the present invention, they are particularly suitable for mass production. In the case of a size of , it is preferable to process it in the form of a web (band shape), which is then cut into a desired rectangular shape.
アルミニウム板の厚さは、それによってつくられた平版
印刷版を印刷機に接着した場合に必要な引張強度、耐力
、延び、折曲げ強度などの関係から実用的には０．１〜
０．５ｎｍの範囲で適宜選択される。Practically speaking, the thickness of the aluminum plate is 0.1 to 0.1, considering the tensile strength, yield strength, elongation, bending strength, etc. required when a planographic printing plate made using the aluminum plate is adhered to a printing machine.
The thickness is appropriately selected within the range of 0.5 nm.
アルミニウム板に本発明における化学的処理又は電気化
学的処理を行うに当り、前もって機械的に砂目立てを行
うのが好ましい。機械的砂目立ては砂目立てを行うこと
ができる機械的研磨手段ならどの手段でもよく、例えば
ブラッシグレインなどによってもよい。Before chemically or electrochemically treating an aluminum plate in the present invention, it is preferable to mechanically grain the aluminum plate in advance. Mechanical graining may be any mechanical polishing means capable of graining, such as brush graining.
アルミニウム板の化学的処理としてはカセイソーダなど
のアルカリを用いる化学エツチング処理が代表的である
。またアルカリ以外にもアルミニウムを侵食する溶液（
例えばフッ酸、リン酸、硫酸等の酸）でエツチングして
もよい。好ましいアルカリ剤は、カセイソーダ、カセイ
カリ、メタ珪酸ソーダ、炭酸ソーダ、アルミン酸ソーダ
、グルコン酸ソーダ等である。濃度１〜５０重量％、温
度は常温〜９０℃、時間は５秒間〜５分間の範囲から選
択されるのが適当であり、アルミニウムのエツチング量
が０．１〜Ｌｏｇ／ｍ２の範囲になるように選択される
ことが好ましい。A typical chemical treatment for aluminum plates is chemical etching treatment using an alkali such as caustic soda. In addition to alkali, there are also solutions that attack aluminum (
For example, etching may be performed using an acid such as hydrofluoric acid, phosphoric acid, or sulfuric acid. Preferred alkaline agents include caustic soda, caustic potash, sodium metasilicate, soda carbonate, sodium aluminate, and sodium gluconate. It is appropriate to select a concentration of 1 to 50% by weight, a temperature of room temperature to 90°C, and a time of 5 seconds to 5 minutes, so that the amount of aluminum etched is in the range of 0.1 to Log/m2. is preferably selected.
このようにアルカリエツチングしたアルミニウム板の表
面には、アルカリに不溶な物質（スマット）が残存する
ので、酸性溶液（ＨＮＯ３、Ｈ２ＳＯいＨ３ＰＯ４溶液
等）により、デスマット処理を行なう。Since alkali-insoluble substances (smut) remain on the surface of the aluminum plate that has been etched with alkali, desmut treatment is performed using an acidic solution (HNO3, H2SO, H3PO4 solution, etc.).
アルミニウム板の電気化学的処理の一例は粗面化である
。An example of electrochemical treatment of aluminum plates is surface roughening.
このときに用いる電解液は、塩酸、硝酸またはその混合
液が好ましい。０．１〜１０ｗｔ％ より好ましくは、
０．３〜３ｉ１ｔ％の溶液中で直流又は交流を用いて電
解される。電解に使用する電気量に応じて表面には粗面
が形成される。砂目のピット深さは０．５〜１０μ、ピ
ット径は１〜１００μ、より好ましくは、ピット深さが
１〜４μ、ピット径５〜２０μである。The electrolytic solution used at this time is preferably hydrochloric acid, nitric acid, or a mixture thereof. 0.1-10wt% More preferably,
Electrolysis is carried out using direct current or alternating current in a solution of 0.3 to 3 i1t%. A rough surface is formed on the surface depending on the amount of electricity used for electrolysis. The grain pit depth is 0.5-10μ, the pit diameter is 1-100μ, more preferably the pit depth is 1-4μ, and the pit diameter is 5-20μ.
このようなピット径を形成するには、特公昭５６−１９
２８０号、特公昭５５−１９１９１号公報に記載の特殊
交番波形を用いるのがより好ましい。即ち、電解波形を
コントロールすることにより、経済的かつ均一に砂目を
形成することができる。また、米国特許３９６３５６４
号、同３９８０５３９号等の明細書に開示されているよ
うな、アミン、グルコン酸、ホウ酸、リン酸、フッ酸等
を電解液に添加してもよい。In order to form such a pit diameter,
It is more preferable to use the special alternating waveform described in No. 280 and Japanese Patent Publication No. 55-19191. That is, by controlling the electrolytic waveform, grains can be formed economically and uniformly. Also, US Patent No. 3,963,564
Amine, gluconic acid, boric acid, phosphoric acid, hydrofluoric acid, etc. may be added to the electrolytic solution, as disclosed in the specifications of No. 3,980,539 and the like.
さらに、本発明は、アルミニウム板を化学的処理をした
後、引き続いて前記の電気化学的処理を行うことができ
る。その電気化学的処理で使用する電解液は上と同じで
あるが、電解に使用する電気量に応じて表面には２次組
面が形成される。２次砂目のピット深さは０．１〜１μ
、ピット径は０．１〜５μ、より好ましくは、ピット深
さは０．１〜０．８μ、ピット径０．１〜３μである。Furthermore, in the present invention, after chemically treating the aluminum plate, the electrochemical treatment described above can be performed subsequently. The electrolytic solution used in the electrochemical treatment is the same as above, but a secondary surface is formed on the surface depending on the amount of electricity used for electrolysis. The pit depth of secondary grain is 0.1~1μ
, the pit diameter is 0.1-5μ, more preferably the pit depth is 0.1-0.8μ, and the pit diameter is 0.1-3μ.
電解波形をコントロールすることにより経済的かつ均一
に２次砂目を形成することができる。By controlling the electrolytic waveform, secondary grains can be formed economically and uniformly.
これらの処理で誘導加熱するためには公知の誘導加熱装
置を使用することができ、それに通ずる電流の量を変え
ることにより処理液中のアルミニウム板の温度を調節す
ることができる。For induction heating in these treatments, a known induction heating device can be used, and the temperature of the aluminum plate in the treatment solution can be adjusted by changing the amount of current passed therethrough.
２次砂目を形成したアルミニウム板は、引続き。The aluminum plate with secondary grains continues.
酸又はアルカリ溶液で処理されることが好ましい。Preferably, it is treated with an acid or alkaline solution.
具体的には特公昭５６−１１３１６号公報に記載されて
いる硫酸の他に、リン酸またはリン酸とクロム酸の混液
が用いられる。また、特公昭４ｇ−２８１２３号公報に
記載されているようなカセイソーダなどのアルカリ性溶
液で軽くエツチング処理を行って２表面に付着している
スマットを除去する。アルカリ溶液で付着したスマット
を除去する場合、アルミニウム表面をエツチングするの
で、アルカリに不溶成分が残存する。それ故に、酸性溶
液（硫酸、リン酸、クロム酸等）により再度デスマット
する必要がある。Specifically, in addition to the sulfuric acid described in Japanese Patent Publication No. 56-11316, phosphoric acid or a mixture of phosphoric acid and chromic acid is used. Further, smut adhering to the surface of the 2nd layer is removed by lightly etching it with an alkaline solution such as caustic soda as described in Japanese Patent Publication No. 4G-28123. When removing attached smut with an alkaline solution, the aluminum surface is etched, so alkali-insoluble components remain. Therefore, it is necessary to desmut again with an acidic solution (sulfuric acid, phosphoric acid, chromic acid, etc.).
また、高圧水でスラリー液を加速し、１次砂目形成後ブ
ラッシグレイン法により砂目形状を変性させた後そのま
ま平版印刷用支持体として用いても良いが、感光層中の
ジアゾ化合物の経時安定性を保つ為、または、感光層と
の接着性、耐刷性等の向上の為に中間層あるいはアルミ
ニウム表面上に陽極酸化皮膜を形成させてもよい。この
処理は電気化学的砂目を重畳させた支持体にも適用され
る。Alternatively, the slurry liquid may be accelerated with high-pressure water, the grain shape may be modified by the brush grain method after primary grain formation, and then used as is as a support for lithographic printing. In order to maintain stability or to improve adhesion with the photosensitive layer, printing durability, etc., an anodized film may be formed on the intermediate layer or the aluminum surface. This treatment also applies to supports with superimposed electrochemical grains.
ここで中間層とは、米国特許第２７１４０６６号及び同
第３１８１４６１号の各明細書に記されている様にアル
カリ金属シリケート、例えば珪酸ナトリウムによる浸漬
方法でのシリケート層、あるいは、親水性下塗層例えば
ＣＭＣ，ＰＶＡ等の下塗層を言う。The intermediate layer herein refers to a silicate layer formed by dipping with an alkali metal silicate, for example, sodium silicate, or a hydrophilic undercoat layer, as described in the specifications of U.S. Pat. For example, it refers to an undercoat layer such as CMC or PVA.
陽極酸化皮膜の形成に用いられる電解液としては硫酸以
外に例えばリン酸、クロム酸、シュウ酸、ペンセンスル
ホン酸等がある。In addition to sulfuric acid, examples of the electrolytic solution used to form the anodic oxide film include phosphoric acid, chromic acid, oxalic acid, pensene sulfonic acid, and the like.
陽極酸化皮膜０．１〜Ｌｏｇ／ｍ２、より好ましくは０
．３〜５ ｇ／ｍ”表面に形成するのが良い。陽極酸化
処理する前にアルカリエツチング、デスマット処理する
のが好ましい。Anodic oxide film 0.1 to Log/m2, more preferably 0
．． 3 to 5 g/m'' on the surface. It is preferable to perform alkali etching and desmutting treatment before anodizing treatment.
陽極酸化の処理条件は、使用される電解液によって種々
変化するので一概には決定されないが一般的には、電解
液の濃度が１〜８０重量％、液温５〜７０℃、電流密度
０．５〜６０Ａ／ａＪ、電圧１〜１００ｖ、電解時間１
０秒〜５分の範囲が適当である。The conditions for anodic oxidation vary depending on the electrolyte used, so they cannot be determined unconditionally, but generally, the concentration of the electrolyte is 1 to 80% by weight, the temperature is 5 to 70°C, and the current density is 0. 5-60A/aJ, voltage 1-100v, electrolysis time 1
A range of 0 seconds to 5 minutes is appropriate.
この様にして得られた陽極酸化皮膜を持つ砂目のアルミ
ニウム板はそれ自身安定で親水性に優れたものであるか
ら、直ちに感光性塗膜を上に設ける事も出来るが、必要
しこより更に表面処理、を施す事が出来る。たとえば、
先に記載したアルカリ金属珪酸塩によるシリケート層あ
るいは、親水性高分子化合物よりなる下塗層を設けるこ
とができる。The grained aluminum plate with the anodic oxide film obtained in this way is itself stable and has excellent hydrophilic properties, so it is possible to immediately apply a photosensitive coating on it, but if necessary, Surface treatment can be applied. for example,
A silicate layer made of the alkali metal silicate described above or an undercoat layer made of a hydrophilic polymer compound can be provided.
下塗層の塗布量は５〜１５０ｍｇ／ｌ１１２が好ましい
。The coating amount of the undercoat layer is preferably 5 to 150 mg/l112.
次に、このように処理したアルミニウム支持体上に感光
性塗膜を設け１画像露出、現像して製版した後に、印刷
機にセットし、印刷を開始する。Next, a photosensitive coating film is provided on the aluminum support thus treated, exposed for one image, developed and made into a plate, and then set in a printing machine to start printing.
以下本発明の詳細を化学的処理の場合を例として図によ
り説明する。１は金属ウェブであり、２はウェブを搬送
する為のパスロール、３は処理液を次工程に移さない為
の水切ニップ装置である。The details of the present invention will be explained below with reference to the drawings, taking the case of chemical treatment as an example. 1 is a metal web, 2 is a pass roll for conveying the web, and 3 is a draining nip device for not transferring the processing liquid to the next process.
また４Ａ、 ４Ｂは被加熱物１を加熱させるための誘導
加熱装置であり、コイルが各磁極毎に巻かれていて、こ
のコイルに印加される交番電流によって各磁極から交番
磁界が発生する。被加熱物１である金属ウェブ１が交番
磁界内に置かれると電磁誘導によって被加熱物中にうず
電流が流れ、このうず電流によってジュール熱が発生し
、金属ウェブ１が加熱される。５は処理液であり、６は
処理槽である。Further, 4A and 4B are induction heating devices for heating the object to be heated 1, in which a coil is wound around each magnetic pole, and an alternating magnetic field is generated from each magnetic pole by an alternating current applied to the coil. When the metal web 1, which is the object 1 to be heated, is placed in an alternating magnetic field, eddy currents flow through the object due to electromagnetic induction, and this eddy current generates Joule heat, thereby heating the metal web 1. 5 is a processing liquid, and 6 is a processing tank.
実施例により本発明を具体的に説明するが、本発明はこ
の実施例のみに限定されるものではない。The present invention will be specifically explained with reference to Examples, but the present invention is not limited to these Examples.
〔実施例１〕
機械的に粗面化したアルミニウムウェブを用いて化学的
処理を行った。機械的に粗面化されたアルミニウムウェ
ブは、中心表面粗さが０．６μであり、電子顕微鏡写真
で観察すると、パリと称される突起物が随所に見られた
。このアルミニウムウェブを２０℃に温めた１０％カセ
イソーダ水溶液中で、誘導加熱コイルに１２ＯＡの電流
を通じてアルミニウを行った後、３０℃３０％の硝酸水
溶液に９０秒間浸漬して中和し、十分水洗した。化学的
処理されたアルミニウムウェブは、中心表面粗さが０．
５５μであり、電子顕微鏡写真で観察すると、突起物が
なくなっていた。８０時間連続処理した後、処理槽にス
ケールの発生もなく、スケールによる故障も全く発生し
なかった。[Example 1] A chemical treatment was performed using a mechanically roughened aluminum web. The mechanically roughened aluminum web had a center surface roughness of 0.6 μm, and when observed with an electron microscope, protrusions called Paris were seen everywhere. This aluminum web was heated in a 10% caustic soda aqueous solution heated to 20°C, and a current of 12OA was passed through an induction heating coil to perform aluminization, and then immersed in a 30% nitric acid aqueous solution at 30°C for 90 seconds to neutralize it, and thoroughly washed with water. . The chemically treated aluminum web has a center surface roughness of 0.
It was 55μ, and when observed with an electron microscope, there were no protrusions. After continuous treatment for 80 hours, no scale was generated in the treatment tank, and no failures due to scale occurred.
〔比較例１〕
実施例１で用いた機械的に粗面化されたアルミニウムウ
ェブを、７０℃に温めた１０％カセイソーダ水溶液中で
３０秒間浸漬し、水洗を行った後、３０°Ｃ３０％の硝
酸水溶液に９０秒間浸漬して中和し、十分水洗した。処
理したアルミニウムウェブは、実施例１の同様に、表面
粗さは０．５５μで、突起物もなくなっていた。しかし
、８０時間連続処理すると、随所にスケールが発生し、
スケールによる故障も多発した。[Comparative Example 1] The mechanically roughened aluminum web used in Example 1 was immersed for 30 seconds in a 10% caustic soda aqueous solution heated to 70°C, rinsed with water, and then heated to 30% at 30°C. It was immersed in a nitric acid aqueous solution for 90 seconds to neutralize it, and thoroughly washed with water. Similar to Example 1, the treated aluminum web had a surface roughness of 0.55μ and no protrusions. However, after 80 hours of continuous processing, scales appeared everywhere.
There were also many failures due to scale.
〔実施例２〕
７０℃に温めた１０％カセイソーダ水溶液中に、３０秒
間浸漬し、水洗後、３０％硝酸水溶液に９０秒間浸漬し
て中和し、十分水洗したアルミニウムウェブを、２０℃
０．７％硝酸水溶液中で誘導加熱コイルに１００Ａの電
流を通じてアルミニウムウェブが６０℃に加熱されるよ
う保持し、特公昭５５−１９１９１号公報に記載の交番
波形電流を用いて電気化学的に処理して粗面化した。電
解条件は、Ｖ＾＝１２．７ボルト、ＶＣ＝９．１ボルト
、陽極時電気量が７００クロ一ン／ｄｍ２となる様にし
た。粗面化されたアルミニウムウェブは、中心表面粗さ
は、０．５２μであり、砂目も均一であった。８０時間
連続処理した後、硝酸槽内にスケールの発生が全くなか
った。[Example 2] An aluminum web was immersed in a 10% caustic soda aqueous solution heated to 70°C for 30 seconds, washed with water, neutralized by immersed in a 30% nitric acid aqueous solution for 90 seconds, and thoroughly washed with water.
The aluminum web was heated to 60° C. by passing a current of 100 A through an induction heating coil in a 0.7% nitric acid aqueous solution, and then electrochemically treated using an alternating waveform current as described in Japanese Patent Publication No. 19191/1983. The surface was roughened. The electrolytic conditions were such that V = 12.7 volts, VC = 9.1 volts, and the amount of electricity at the anode was 700 chrome/dm2. The roughened aluminum web had a center surface roughness of 0.52μ and a uniform grain. After continuous treatment for 80 hours, no scale was observed in the nitric acid tank.
〔実施例３〕
２０℃に温めた１０％カセイソーダ水溶液中で、誘導加
熱コイルに１２ＯＡの電流を通じて、アルミニウムウェ
ブが７０℃に加熱される様３０秒間浸漬し、水洗を行っ
た後、３０℃３０％の硝酸水溶液に９０秒間浸漬して中
和し、十分水洗したアルミニウムウェブを、２０℃０．
７％硝酸水溶液中で、誘導加熱コイルに１０ＯＡの電流
を通じてアルミニウムウェブが６０℃に加熱されるよう
保持し、特公昭５５−１９１９１号公報に記載の交番波
形電流を用いて、電気化学的に処理して粗面化した。電
解条件はＶＡ＝１２．７ボルト、ＶＣ＝９．１ボルト、
陽極時電気量が７００クローン／ｄＩ１１２となる様に
した。粗面化されたアルミニウムウェブは、中心表面粗
さは０．５２μであり、砂目も均一であった。８０時間
連続処理した後、誘導加熱を行っている処理槽は、スケ
ールの発生がなく、スケールによる故障も全くなかった
。[Example 3] An aluminum web was immersed in a 10% caustic soda aqueous solution warmed to 20°C for 30 seconds by passing a current of 12OA through an induction heating coil so that it was heated to 70°C, washed with water, and then heated to 30°C. % nitric acid aqueous solution for 90 seconds and thoroughly washed with water.
In a 7% nitric acid aqueous solution, the aluminum web was heated to 60°C by passing a current of 10 OA through an induction heating coil, and then electrochemically treated using an alternating waveform current as described in Japanese Patent Publication No. 19191/1983. The surface was roughened. Electrolysis conditions are VA=12.7 volts, VC=9.1 volts,
The amount of electricity at the anode was set to 700 clones/dI112. The roughened aluminum web had a center surface roughness of 0.52μ and a uniform grain. After continuous treatment for 80 hours, no scale was generated in the treatment tank in which induction heating was performed, and there were no failures due to scale.
〔比較例２〕
実施例２，３の同様な処理を、誘導加熱を用いないで、
カセイソーダ７０℃、硝酸液６０°Ｃに保ち処理を行っ
た。１０時間程で、スケールが発生し、故障が多発した
。[Comparative Example 2] Similar treatment to Examples 2 and 3 was performed without using induction heating.
The caustic soda solution was kept at 70°C and the nitric acid solution was kept at 60°C. After about 10 hours, scaling occurred and failures occurred frequently.
以上述べた様に金属シート又はウェブを誘導加熱するこ
とにより、反応速度が上がり、しかも。As mentioned above, by induction heating the metal sheet or web, the reaction rate increases.
それでいて処理液自身を高温にする必要がないので、ス
ケールの発生、並びに材料の腐食などがない。また、金
属シート又はウェブ自身の温度が容易に変えられる為、
処理液自体の温度を変化させるよりも少ない時間で処理
条件を変えた次の処理を行うことが出来る。However, since there is no need to heat the processing liquid itself to a high temperature, there is no possibility of scale formation or material corrosion. In addition, since the temperature of the metal sheet or web itself can be easily changed,
The next process can be performed by changing the process conditions in less time than changing the temperature of the process liquid itself.
第１図は、本発明の化学的処理を行うための装置を示す
。
１：金属ウェブ ２：パスロール３：水切ニッ
プ装置 ４Ａ、４Ｂ：誘導加熱装置５：処理液
６：処理槽
代理人 弁理士（ｇｔｏ７） 佐々木 清 隆第１図
手続補正書
昭和６２年 ９月１８１
１寺Ｈ午庁長官 殿FIG. 1 shows an apparatus for carrying out the chemical treatment of the invention. 1: Metal web 2: Pass roll 3: Draining nip device 4A, 4B: Induction heating device 5: Processing liquid
6: Treatment Tank Agent Patent Attorney (GTO7) Kiyotaka Sasaki Diagram 1 Procedures Amendment Letter September 181, 1981 Mr. 1 Temple Director General
Claims (2)
ブを加熱しながら、化学的処理、又は電気化学的処理を
行うことを特徴とする平版印刷版支持体の製造方法。(1) A method for producing a lithographic printing plate support, which comprises performing chemical treatment or electrochemical treatment while heating a metal sheet or web by induction heating in a treatment liquid.
ブを加熱しながら、化学的処理、並びに電気化学的処理
を行うことを特徴とする平版印刷版支持体の製造方法。(2) A method for producing a lithographic printing plate support, which comprises performing chemical treatment and electrochemical treatment while heating a metal sheet or web by induction heating in a treatment liquid.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3779887A JPH0714671B2 (en) | 1987-02-23 | 1987-02-23 | Method for producing lithographic printing plate support |
| US07/159,086 US4872946A (en) | 1987-02-23 | 1988-02-23 | Method of manufacturing supports for lithographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3779887A JPH0714671B2 (en) | 1987-02-23 | 1987-02-23 | Method for producing lithographic printing plate support |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63205293A true JPS63205293A (en) | 1988-08-24 |
| JPH0714671B2 JPH0714671B2 (en) | 1995-02-22 |
Family
ID=12507519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3779887A Expired - Fee Related JPH0714671B2 (en) | 1987-02-23 | 1987-02-23 | Method for producing lithographic printing plate support |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0714671B2 (en) |
-
1987
- 1987-02-23 JP JP3779887A patent/JPH0714671B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0714671B2 (en) | 1995-02-22 |
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