JPS63170459U - - Google Patents

Info

Publication number
JPS63170459U
JPS63170459U JP6149187U JP6149187U JPS63170459U JP S63170459 U JPS63170459 U JP S63170459U JP 6149187 U JP6149187 U JP 6149187U JP 6149187 U JP6149187 U JP 6149187U JP S63170459 U JPS63170459 U JP S63170459U
Authority
JP
Japan
Prior art keywords
substrate
substrate holder
sputtering apparatus
processed
holds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6149187U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6149187U priority Critical patent/JPS63170459U/ja
Publication of JPS63170459U publication Critical patent/JPS63170459U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例の縦断面図、第2図
は従来装置の一例の縦断面図である。 1……基板ホルダ、2……被処理基板、3……
案内ローラ、4……移送装置、5……ターゲツト
、6……カソードボデイ、7……載置部、8……
開口部。
FIG. 1 is a longitudinal sectional view of an embodiment of the present invention, and FIG. 2 is a longitudinal sectional view of an example of a conventional device. 1...Substrate holder, 2...Substrate to be processed, 3...
Guide roller, 4... Transfer device, 5... Target, 6... Cathode body, 7... Placement section, 8...
Aperture.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 被処理基板を保持する基板ホルダを、概収水平
の姿勢で移動しながら成膜処理を施す方式のスパ
ツタリング装置において、前記基板ホルダを断面
形状が凸型になるように形成し、基板ホルダの移
送装置や案内部分よりも基板の載置部及びターゲ
ツト面が高くなるようにしたことを特徴とするス
パツタリング装置。
In a sputtering apparatus that performs a film forming process while moving a substrate holder that holds a substrate to be processed in a generally horizontal posture, the substrate holder is formed to have a convex cross-sectional shape, and the substrate holder is transferred. A sputtering apparatus characterized in that a substrate mounting part and a target surface are higher than the apparatus and a guide part.
JP6149187U 1987-04-24 1987-04-24 Pending JPS63170459U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6149187U JPS63170459U (en) 1987-04-24 1987-04-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6149187U JPS63170459U (en) 1987-04-24 1987-04-24

Publications (1)

Publication Number Publication Date
JPS63170459U true JPS63170459U (en) 1988-11-07

Family

ID=30894880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6149187U Pending JPS63170459U (en) 1987-04-24 1987-04-24

Country Status (1)

Country Link
JP (1) JPS63170459U (en)

Similar Documents

Publication Publication Date Title
JPS63170459U (en)
JPS63115048U (en)
JPS6411767U (en)
JPS6145868U (en) Morikadai
JPS6436960U (en)
JPS61191467U (en)
JPS6433562U (en)
JPH033744U (en)
JPH01101432U (en)
JPS63103948U (en)
JPS6411768U (en)
JPH0185939U (en)
JPH0474439U (en)
JPH0420327U (en)
JPS6349017U (en)
JPH0198308U (en)
JPS62112151U (en)
JPS631324U (en)
JPS6047524U (en) skin acupuncture
JPS6374301U (en)
JPS61143127U (en)
JPS63111840U (en)
JPS61134096U (en)
JPS6190852U (en)
JPS638586U (en)