JPS6316535A - Thin x-ray beam generator - Google Patents
Thin x-ray beam generatorInfo
- Publication number
- JPS6316535A JPS6316535A JP61159869A JP15986986A JPS6316535A JP S6316535 A JPS6316535 A JP S6316535A JP 61159869 A JP61159869 A JP 61159869A JP 15986986 A JP15986986 A JP 15986986A JP S6316535 A JPS6316535 A JP S6316535A
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- rays
- total reflection
- ray beams
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims abstract description 22
- 230000005284 excitation Effects 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 abstract description 2
- 230000003252 repetitive effect Effects 0.000 abstract 1
- 239000012212 insulator Substances 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
本発明は例えば試料表面の微少部を分析する場合等に用
いるための極めて細くかつ強力なＸ線ビームを得ること
のできるＸ線発生装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an X-ray generator capable of producing an extremely narrow and powerful X-ray beam for use in, for example, analyzing minute parts on the surface of a sample.
例えば試料表面の微小部に強力なＸ線を入射さ仕て、そ
の部分から発生する電子線のエネルギ分析を行うことに
より、上記微小部の物性を分析することができる。この
ような分析に際して従来はＸ線管の平面状あるいは円錐
状ターゲットの比較的広い範囲を電子線で励起して、全
方向へ拡散するＸ線を発生させ、コリメークで極めて細
いＸ線ビームを取り出して試料上の分析しようとする微
小部分に照射していた。従って著しく大容量で大型のＸ
線発生装置を必要とする欠点があった。本発明は例えば
上述のような分析に用いるための、小容量でしかも極め
て強力な小径のＸ線ビームを得ることのできる装置を提
供するものである。For example, the physical properties of the minute portion can be analyzed by directing powerful X-rays to a minute portion on the surface of a sample and analyzing the energy of the electron beam generated from that portion. Conventionally, for such analysis, a relatively wide range of a flat or conical target in an X-ray tube is excited with an electron beam, generating X-rays that diffuse in all directions, and then collimated to extract an extremely narrow X-ray beam. The beam was used to irradiate the tiny area on the sample that was to be analyzed. Therefore, the X
It had the disadvantage of requiring a line generator. The present invention provides an apparatus capable of obtaining a small-capacity, extremely powerful, and small-diameter X-ray beam for use in, for example, the above-mentioned analysis.
すなわち本発明はＸ線を発生させるターゲットに小さい
貫通孔を設け、励起用の電子線を細く絞ってその貫通孔
の一端から内部に入射させる。従って孔の内面、特に電
子線の入射口に近い部分から全方向に向ってＸ線が発生
する。このＸ線の一部は孔の反対側の開口の方向へ放射
されて、その孔の内面に全反射臨界角より小さい角度で
入射するから、この入射点で全反射を生ずる。かつこの
ように一度全反射を生じたＸ線の大部分は次の入射点に
おいても全反射を生ずる。従って上記反対側の開口部に
おいては、このように電子線の人口に近い部分で発生し
て一旦全反射を生じたＸ線が累積されて強力なＸ線ビー
ムに成長すると共にそのビームは全反射角に相当する極
めて小さい拡散角をもった平行Ｘ線ビームを形成する。That is, in the present invention, a small through hole is provided in a target for generating X-rays, and an electron beam for excitation is narrowed down and made to enter the inside from one end of the through hole. Therefore, X-rays are generated in all directions from the inner surface of the hole, particularly from a portion close to the electron beam entrance. A portion of this X-ray is emitted toward the opening on the opposite side of the hole and is incident on the inner surface of the hole at an angle smaller than the critical angle for total reflection, causing total internal reflection at this point of incidence. Moreover, most of the X-rays that have been totally reflected once will also be totally reflected at the next point of incidence. Therefore, at the aperture on the opposite side, the X-rays generated near the electron beam and once totally reflected are accumulated and grow into a powerful X-ray beam, and the beam is totally reflected. A parallel X-ray beam is formed with a very small divergence angle corresponding to the angle.
また孔を通り抜けた電子線は、これを偏向板等によって
Ｘ線ビームと容易に分離することができる。このため本
発明の装置は極めて小容量で、しかも強力な細い平行Ｘ
線ビームを得ることができる。Further, the electron beam passing through the hole can be easily separated from the X-ray beam by a deflection plate or the like. For this reason, the device of the present invention has an extremely small capacity and yet has a powerful thin parallel
You can get a ray beam.
第１図は本発明実施例の縦断面図で、絶縁体真空容ａＺ
１の一端に、ウェーネルト電極２および熱電子放射フ
ィラメント３からなる電子銃を形成した碍子部４を設け
て、この容器の適当な位置に排気口５を形成すると共に
端子板６を取り付けである。また容器ｌ内には、例えば
１０ｃｍ程度の長さの円柱状ターゲット７をウェーネル
ト電極２と同軸的に適当な距離をもって配置し、その外
側に冷却水導管８を添着すると共に軸線に沿って例えば
径か０．５ｎ＋ｎ＋程度の小孔９を形成しである。なお
この孔のウェーネルト側の端部は、孔の径を僅かに拡大
して漏斗状に形成しである。また容器１における重犯碍
子部４と反対側の端部には導体板で形成した有底筒状の
電子線捕捉室１０を取り付けてその底面にＸ線ビーム取
出口１１を形成し、かつターゲット７に近い位置に１対
の電子線偏向板１２を設けて、前記端子板６の各端子に
この偏向板およびターゲット７等を接続しである。また
図面は上述の装置を前述のようなＸ線光電子分析装置等
の真空室１３に連結して用いる場合を示したが、単独で
用いる場合はＸ線ビーム取出口１１を鎖線のようにベリ
リウム板１４等で閉塞する。FIG. 1 is a longitudinal cross-sectional view of an embodiment of the present invention, showing the insulator vacuum volume aZ
At one end of the container, an insulator section 4 having an electron gun formed of a Wehnelt electrode 2 and a thermionic emission filament 3 is provided, and an exhaust port 5 is formed at an appropriate position of the container, and a terminal plate 6 is attached. Further, in the container l, a cylindrical target 7 having a length of, for example, about 10 cm is placed coaxially with the Wehnelt electrode 2 at an appropriate distance, and a cooling water conduit 8 is attached to the outside of the target 7, and a cylindrical target 7 with a length of, for example, about 10 cm is arranged along the axis. A small hole 9 of about 0.5n+n+ is formed. Note that the end of this hole on the Wehnelt side is formed into a funnel shape by slightly enlarging the diameter of the hole. Further, a bottomed cylindrical electron beam capture chamber 10 formed of a conductor plate is attached to the end of the container 1 opposite to the heavy-duty insulator section 4, and an X-ray beam extraction port 11 is formed on the bottom surface of the electron beam capture chamber 10. A pair of electron beam deflecting plates 12 is provided at a position close to the electron beam deflecting plate 12, and the deflecting plates, the target 7, etc. are connected to each terminal of the terminal plate 6. In addition, the drawing shows the case where the above-mentioned device is used in connection with the vacuum chamber 13 of the above-mentioned X-ray photoelectron analyzer, etc., but when used alone, the It will be occluded at 14 mag.
上述の装置において、排気口５を高真空ポンプに連結し
てフィラメント３から熱電子を放射させると、その熱電
子はターゲット７に向かって走行すると共にウェーネル
ト電極２で絞られて細い電子線ｅを形成する。第２図は
第１図におけるターゲット７の一部を拡大した図で、上
記電子線ｅが小孔９の端部に入射する。この端部１５を
必要に応じて漏斗状に拡大しておくことにより電子′ａ
ｅの一部が容易に侵入して孔９の内面を衝撃し、その各
部からＸ線Ｘを発生させる。このＸ線は勿論全方向へ向
かって放射されるから大部分は孔の反対側の内面へ比較
的大きい角度で入射して消滅する。しかし一部のＸａＩ
は孔９の軸に対して比較的小さい角度で走行し、このＸ
線は孔９の反対側の内面へ図のように例えば０．５度程
度以下の充分小さい角度で入射して、全反射を生ずる。In the above-mentioned apparatus, when the exhaust port 5 is connected to a high vacuum pump and the filament 3 emits thermoelectrons, the thermoelectrons travel toward the target 7 and are narrowed by the Wehnelt electrode 2 to form a thin electron beam e. Form. FIG. 2 is an enlarged view of a part of the target 7 in FIG. 1, in which the electron beam e is incident on the end of the small hole 9. By enlarging this end 15 into a funnel shape as necessary, the electron 'a'
A part of the rays e easily enters and impacts the inner surface of the hole 9, generating X-rays X from each part. Of course, since these X-rays are emitted in all directions, most of them enter the inner surface on the opposite side of the hole at a relatively large angle and disappear. However, some XaI
runs at a relatively small angle to the axis of hole 9, and this
The line is incident on the inner surface on the opposite side of the hole 9 at a sufficiently small angle of, for example, about 0.5 degrees or less, as shown in the figure, and total reflection occurs.
このようにして一旦全反射を生じたＸ線は、次にも孔９
の内面へ充分小さい角度で入射して再び全反射する。す
なわち孔９の軸に対して充分小さい角度で発生したＸ線
は孔の内面で全反射を繰り返すから、比較的小さい減衰
量をもって孔９の他端から放出される。これに反し、軸
に対して大きい角度で発生したＸ線は、孔９の内面に大
きい角度で入射するから全反射を生ずることなく消滅す
る。従って孔９の他端から充分小さい拡散角をもった、
はぼ平行でしかも極めて細い高輝度のＸ線Ｘか第１図に
示したように発射される。In this way, once the X-rays have been totally reflected, they are then transmitted to the hole 9.
The light is incident on the inner surface at a sufficiently small angle and is totally reflected again. That is, since X-rays generated at a sufficiently small angle with respect to the axis of the hole 9 undergo repeated total reflection on the inner surface of the hole, they are emitted from the other end of the hole 9 with a relatively small amount of attenuation. On the other hand, X-rays generated at a large angle with respect to the axis enter the inner surface of the hole 9 at a large angle and disappear without causing total reflection. Therefore, with a sufficiently small diffusion angle from the other end of the hole 9,
High-intensity X-rays are emitted as shown in Figure 1, which are nearly parallel and extremely narrow.
また電子線ｅの一部は孔９内を直進して第１図にｅ′で
示したようにその端部から放出される。A portion of the electron beam e travels straight through the hole 9 and is emitted from its end as indicated by e' in FIG.
しかし偏向板１２に適当な直流電圧を加えておくことに
よって、この電子線ｅ°は第１図に点線で示したように
屈曲してＸ線取出口１１の側部に捕□ 捉される。従っ
て電子線かＸ線と共に取出口】Ｊから放出されるような
おそれも除かれる。However, by applying an appropriate DC voltage to the deflection plate 12, this electron beam e° is bent as shown by the dotted line in FIG. 1 and captured at the side of the X-ray extraction port 11. Therefore, the fear that the electron beams and X-rays will be emitted from the outlet [J] is also eliminated.
このように本発明は極めて小電力で小型の装置をもって
、細く強力な平行Ｘ線ビームを効率よく発生させること
ができる。In this manner, the present invention can efficiently generate a narrow and powerful parallel X-ray beam using a compact device with extremely low power.
第１図は本発明実施例の縦断面図、第２図は第１図の一
部を拡大した図である。なお図において、２はウェーネ
ルト電極、３はフィラメント、５は排気口、６は端子板
、７はターゲット、８は冷却水導管、９は小孔、１０は
電子線捕捉室、ＩｆはＸ線取出口、１２は偏向板である
。FIG. 1 is a longitudinal sectional view of an embodiment of the present invention, and FIG. 2 is an enlarged view of a part of FIG. 1. In the figure, 2 is a Wehnelt electrode, 3 is a filament, 5 is an exhaust port, 6 is a terminal board, 7 is a target, 8 is a cooling water conduit, 9 is a small hole, 10 is an electron beam capture chamber, and If is an X-ray capture chamber. The outlet, 12, is a deflection plate.
Claims (1)
孔の内面にその一端からＸ線励起用の電子線を入射させ
る電子銃と、上記貫通孔の内面で全反射を繰り返してそ
の他端から放出される細径のＸ線ビームを外部へ取り出
すためのＸ線窓と、前記ターゲットと上記Ｘ線窓との間
に配置した電子線偏向手段と、よりなることを特徴とす
る細径Ｘ線ビーム発生装置A target having a small linear through hole, an electron gun that injects an electron beam for X-ray excitation into the inner surface of the through hole from one end, and an electron beam that undergoes repeated total reflection on the inner surface of the through hole and is emitted from the other end. A narrow-diameter X-ray beam generator comprising: an X-ray window for extracting a narrow-diameter X-ray beam to the outside; and electron beam deflection means disposed between the target and the X-ray window. Device
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61159869A JPS6316535A (en) | 1986-07-09 | 1986-07-09 | Thin x-ray beam generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61159869A JPS6316535A (en) | 1986-07-09 | 1986-07-09 | Thin x-ray beam generator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6316535A true JPS6316535A (en) | 1988-01-23 |
Family
ID=15702990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61159869A Pending JPS6316535A (en) | 1986-07-09 | 1986-07-09 | Thin x-ray beam generator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6316535A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006524892A (en) * | 2003-04-25 | 2006-11-02 | シーエックスアール リミテッド | X-ray source |
| US9726619B2 (en) | 2005-10-25 | 2017-08-08 | Rapiscan Systems, Inc. | Optimization of the source firing pattern for X-ray scanning systems |
| US10483077B2 (en) | 2003-04-25 | 2019-11-19 | Rapiscan Systems, Inc. | X-ray sources having reduced electron scattering |
| US10901112B2 (en) | 2003-04-25 | 2021-01-26 | Rapiscan Systems, Inc. | X-ray scanning system with stationary x-ray sources |
| US10976271B2 (en) | 2005-12-16 | 2021-04-13 | Rapiscan Systems, Inc. | Stationary tomographic X-ray imaging systems for automatically sorting objects based on generated tomographic images |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58212045A (en) * | 1982-06-02 | 1983-12-09 | Natl Inst For Res In Inorg Mater | Cylindrical twin cathodes for x-ray generator |
-
1986
- 1986-07-09 JP JP61159869A patent/JPS6316535A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58212045A (en) * | 1982-06-02 | 1983-12-09 | Natl Inst For Res In Inorg Mater | Cylindrical twin cathodes for x-ray generator |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006524892A (en) * | 2003-04-25 | 2006-11-02 | シーエックスアール リミテッド | X-ray source |
| JP4832285B2 (en) * | 2003-04-25 | 2011-12-07 | シーエックスアール リミテッド | X-ray source |
| US10483077B2 (en) | 2003-04-25 | 2019-11-19 | Rapiscan Systems, Inc. | X-ray sources having reduced electron scattering |
| US10901112B2 (en) | 2003-04-25 | 2021-01-26 | Rapiscan Systems, Inc. | X-ray scanning system with stationary x-ray sources |
| US11796711B2 (en) | 2003-04-25 | 2023-10-24 | Rapiscan Systems, Inc. | Modular CT scanning system |
| US9726619B2 (en) | 2005-10-25 | 2017-08-08 | Rapiscan Systems, Inc. | Optimization of the source firing pattern for X-ray scanning systems |
| US10976271B2 (en) | 2005-12-16 | 2021-04-13 | Rapiscan Systems, Inc. | Stationary tomographic X-ray imaging systems for automatically sorting objects based on generated tomographic images |
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