JPS63145052A - Thermal recording head - Google Patents
Thermal recording headInfo
- Publication number
- JPS63145052A JPS63145052A JP61294033A JP29403386A JPS63145052A JP S63145052 A JPS63145052 A JP S63145052A JP 61294033 A JP61294033 A JP 61294033A JP 29403386 A JP29403386 A JP 29403386A JP S63145052 A JPS63145052 A JP S63145052A
- Authority
- JP
- Japan
- Prior art keywords
- protective film
- specific resistance
- electrode
- film
- static electricity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001681 protective effect Effects 0.000 claims abstract description 43
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 230000005611 electricity Effects 0.000 abstract description 14
- 230000003068 static effect Effects 0.000 abstract description 14
- 238000005299 abrasion Methods 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 6
- 238000004544 sputter deposition Methods 0.000 abstract description 6
- 230000006378 damage Effects 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 abstract description 4
- 229910052581 Si3N4 Inorganic materials 0.000 abstract description 3
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 11
- 230000035939 shock Effects 0.000 description 4
- -1 silicon nitride compound Chemical class 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000003064 anti-oxidating effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical class [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical class N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
Landscapes
- Electronic Switches (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、感熱記録用プリンタなどに用いる感熱記録用
サーマルヘッドに関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a thermal head for heat-sensitive recording used in a printer for heat-sensitive recording.
従来の技術
感熱記録方式は保守の容易なハードコピーを得る方式と
して、各種の端末記録装置やファクシミリ−等に利用さ
れている。特に近年、熱転写記録方式による多色記録や
フルカラー記録の開発ち活発で、事務機器分野や家庭用
プリンタとして期待されている。The conventional thermal recording method is used in various terminal recording devices, facsimile machines, etc. as a method for obtaining easy-to-maintain hard copies. Particularly in recent years, there has been active development of multi-color recording and full-color recording using thermal transfer recording methods, and they are expected to be used in the field of office equipment and home printers.
従来のこの種の感熱記録用サーマルヘッドは、第２図の
ような断面構造になっている。同図において９はアルミ
ナ基板、１０はグレーズ層、１１は発熱抵抗体、１２．
１３は電極であり、電極１２は密着層及び発熱抵抗体１
１と電極１３の反応防止層として、また電極１３は主導
体層として働く、主導体層１３と発熱抵抗体１１との密
着性が良く、しかも反応が生じない場合には電極１２は
特に設ける必要はない。１４は耐摩耗保護膜であり、窒
化珪素化合物と炭化珪素化合物を混合して形成されてい
る。A conventional thermal head for heat-sensitive recording of this type has a cross-sectional structure as shown in FIG. In the figure, 9 is an alumina substrate, 10 is a glaze layer, 11 is a heating resistor, 12.
13 is an electrode, and the electrode 12 is an adhesive layer and a heating resistor 1
1 and the electrode 13, and the electrode 13 acts as a main conductor layer. If the adhesion between the main conductor layer 13 and the heating resistor 11 is good and no reaction occurs, the electrode 12 must be provided in particular. There isn't. A wear-resistant protective film 14 is formed by mixing a silicon nitride compound and a silicon carbide compound.
耐摩耗保護膜１４は感熱記録用サーマルヘッドが感熱紙
と摺動しながら使用されることから生しる発熱抵抗体１
１及び電極１３の摩耗を防止する目的で形成されており
耐摩耗性に優れていること、又、印字時には、発熱抵抗
体１０に加熱と冷却の温度サイクルが繰り返えされ、発
熱抵抗体上に形成されている耐摩耗保護膜にも大きな熱
衝撃が加わるため、耐熱衝撃性の大きい耐摩耗保護膜が
要求されている。The abrasion-resistant protective film 14 is formed by the heat-generating resistor 1 that is generated when the thermal head for heat-sensitive recording is used while sliding on the heat-sensitive paper.
1 and the electrode 13, and have excellent abrasion resistance. Also, during printing, the heat generating resistor 10 undergoes repeated temperature cycles of heating and cooling. Since a large thermal shock is also applied to the wear-resistant protective film formed on the surface, a wear-resistant protective film with high thermal shock resistance is required.
窒化珪素化合物と炭化珪素化合物の混合により形成され
た耐摩耗保護膜１４は、硬度（ＨＶ＃１８００ ｋｇ／
ｍ” ）が大きくかつ靭性に優れていると共にｌＯυΩ
・（２）以上と絶縁物である。１０”Ω・１以上の膜に
することにより感熱紙を用いて印字時に生じていた電気
化学的反応による摩耗を防止して耐摩耗性を大きく改善
した。さらに、この耐摩耗保護Ｉｔ！！１１４はＴａ２
０５保護膜のように下層にＳ ｒ ０２膜のような酸化
防止層を設ける必要もなく、しかも材料としても低価格
であるという特長がある。The wear-resistant protective film 14 formed by mixing a silicon nitride compound and a silicon carbide compound has a hardness (HV#1800 kg/
m”) is large and has excellent toughness, as well as lOυΩ.
・(2) It is an insulator as above. By creating a film with a resistance of 10"Ω・1 or more, we have greatly improved the abrasion resistance by preventing the abrasion caused by the electrochemical reaction that occurs during printing using thermal paper. Furthermore, this abrasion-resistant protection It!!114 is Ta2
Unlike the 05 protective film, there is no need to provide an anti-oxidation layer such as the S r 02 film underneath, and the material is also inexpensive.
発明が解決しようとする問題点
炭化珪素化合物と窒化珪素化合物（以降、各々をＳ ＋
Ｃ、Ｓ ｉ Ｂ Ｎ ４とする）の混合被膜よりなる
耐摩耗保護膜１４は、耐熱衝撃性および耐摩耗性に優れ
ているが、ポリエステル等の樹脂を保護コートした感熱
紙、あるいは熱転写記録用の転写シート（この２種類の
紙を含めて以降、特殊紙とする。）で印字した場合、発
色形感熱祇での記録寿命に比べて極端に短かくなる場合
があった。このような特殊紙での印字は今後のプリンタ
に多く使用されるようになることが予測されることから
、どのような特殊紙においても、発色形怒熱祇と同程度
の記録寿命を有するような材料および作成方式の開発が
要請されていた。Problems to be Solved by the Invention Silicon carbide compounds and silicon nitride compounds (hereinafter referred to as S +
The abrasion-resistant protective film 14, which is made of a mixed coating of C, S i B N 4), has excellent thermal shock resistance and abrasion resistance. When printing on a transfer sheet (these two types of paper will be referred to as special paper from now on), the recording life may be extremely short compared to the color-forming thermosensitive paper. Since it is predicted that printing on such special paper will be used more often in printers in the future, it is expected that any special paper will have a record lifespan comparable to that of the color-forming type. There was a demand for the development of suitable materials and production methods.
前記Ｓ ｉ ＣＳ ｉ ３ Ｎ ４混合の耐摩耗保護膜
１４の特殊紙による記録寿命の低下は、耐摩耗保護膜１
４の比抵抗が１０１〜１０”Ω・備程度で特殊紙の比抵
抗も１０Ｉ！〜１０１０Ω・備程度と大きいことから、
印字の際に静電気が発生し、耐摩耗保護膜１４の欠陥等
を通して、放電することにより、耐摩耗保護膜１４下の
電極１２．１３及び発熱抵抗体１１を局部的に破壊する
ものであった。The decrease in the recording life due to the special paper of the abrasion-resistant protective film 14 containing S i CS i 3 N 4 is due to the abrasion-resistant protective film 1
4 has a specific resistance of about 101 to 10" Ω・Bi, and the specific resistance of special paper is also large, about 10 I! to 1010 Ω・Bi,
Static electricity was generated during printing and discharged through defects in the wear-resistant protective film 14, causing local destruction of the electrodes 12, 13 and heating resistor 11 under the wear-resistant protective film 14. .
この静電気による破壊防止方法として、本発明者等によ
り特願昭５９−２５９４９２号に示す耐摩耗保護膜の製
造方法に関する発明が出願されており第３図に示す。As a method for preventing damage caused by static electricity, the present inventors have filed an invention relating to a method of manufacturing a wear-resistant protective film as shown in Japanese Patent Application No. 59-259492, which is shown in FIG.
同図において、９はアルミナ基板、１０はグレーズ層、
１１は発熱抵抗体、１２．１３は電極、１４．１５は耐
摩耗保護膜であり、１４は高比抵抗層、１５は低比抵抗
層である。この発明は、耐熱衝撃性の良好な５ｉＣ−３
ｉ３Ｎ４混合の耐摩耗保護膜を、スパッタリング時のガ
ス組成を変えることで特殊紙との接触面のみの比抵抗を
１０８Ω・１程度と小さくし、静電気の発生を防止する
ものであり、具体的には、スパッタリングのガス組成を
、水素・窒素及び不活性ガスの混合ガスとして成膜する
高比抵抗層１４と、それに引き続いて不活性ガスのみで
成膜する低比抵抗層１５の２層構成としたもので、表面
の比抵抗を小さくし、静電気を発生しに＜クシたちので
あるが、転写紙との長時間の走行試験ではやはり静電気
が多少発生している。又膜作成においても１０８〜１０
９Ω・値のバラツキがあり、少し高めの比抵抗のものも
生じることも重なり、耐摩耗膜下の電極及び発熱抵抗体
を局部的に破壊するものも一部生じている。特願昭５９
−２５９４９２号に示す方法による静電気防止法は、抜
本的対策になっていないものである。In the figure, 9 is an alumina substrate, 10 is a glaze layer,
11 is a heating resistor, 12 and 13 are electrodes, 14 and 15 are wear-resistant protective films, 14 is a high resistivity layer, and 15 is a low resistivity layer. This invention utilizes 5iC-3 which has good thermal shock resistance.
By changing the gas composition during sputtering of the i3N4 mixed wear-resistant protective film, the specific resistance of only the contact surface with the special paper is reduced to about 108Ω・1, which prevents the generation of static electricity. The sputtering gas composition is a two-layer structure of a high resistivity layer 14 formed using a mixed gas of hydrogen, nitrogen and an inert gas, and a low resistivity layer 15 subsequently formed using only an inert gas. This was done to reduce the specific resistance of the surface and generate static electricity, but some static electricity was still generated during long-term running tests with transfer paper. Also, in film creation, 108-10
There was a variation in the 9Ω value, and some had a slightly higher specific resistance, and some caused local destruction of the electrode and heating resistor under the wear-resistant film. Special request 1982
The static electricity prevention method shown in No. 259492 is not a drastic countermeasure.
問題点を解決するための手段
本発明は上記問題点を解決するため、耐摩耗保護膜を１
０”Ω・０以上の高比抵抗からなる第１保護膜を形成し
、第１保護膜上及び少なくとも片側の電極上に連続する
ように、１０”Ω・ｃｍ以下の低比抵抗からなる第２保
護膜を形成した構造にしたものである。Means for Solving the Problems In order to solve the above problems, the present invention provides a wear-resistant protective film.
A first protective film made of a high specific resistance of 0"Ω・0 or more is formed, and a first protective film made of a low specific resistance of 10"Ω・cm or less is formed so as to be continuous on the first protective film and on at least one side of the electrode. It has a structure in which two protective films are formed.
作用
本発明は上記した構成のように低比抵抗からなる第２保
護膜を高比抵抗からなる第１保護膜上だけでなく、少な
くとも片側の電極上にまで形成することにより、転写紙
との長時間走行により発生する少量の静電気も、電極に
逃すことができ、電極及び発熱抵抗体の破壊を生じさせ
る静電気の帯電を防止することができるものである。Function The present invention forms the second protective film having a low resistivity not only on the first protective film having a high resistivity as in the above-described configuration, but also on at least one side of the electrode, thereby improving the connection between the transfer paper and the transfer paper. Even a small amount of static electricity generated due to long-term running can be released to the electrodes, and it is possible to prevent static electricity from causing damage to the electrodes and heating resistor.
実施例 以下に本発明の構成を実施例に従って説明する。Example The configuration of the present invention will be explained below according to examples.
発熱抵抗体膜としてＴｉ Ｃ−Ｓ ｉ Ｏ２サーメツト
ｅ、？！ｉとしてＣｒ−Ｃｕ２層膜よりなるヘノド基板
上に、スパッタリングにより１０”Ω・１以上の高比抵
抗のＳ ｌＣＳ ｉ ３ Ｎ ４混合の第１保護膜を形
成し、第１保護膜及び電極上の一部まで、スパッタリン
グにより１０９Ω・１以下の低比抵抗の第２保護膜を形
成した。このように形成した本発明のサーマルヘッドの
発熱部の断面形状を第１図に示す。同図において、１は
アルミナなどからなる絶縁性基板、２はグレーズ層、３
はＴ ｉ ＣＳ ＋ ０２サーメフト膜からなる発熱抵
抗体、４はＣｒからなる電極、５はＣｕからなる電極、
６は高比抵抗の第１保護膜、７は低比抵抗の第２保護膜
である。Ti C-S i O2 cermet e,? as heating resistor film? ! A first protective film of a mixture of S lCS i 3 N 4 having a high specific resistance of 10"Ω·1 or more is formed by sputtering on a henodic substrate made of a Cr-Cu two-layer film as i, and then the first protective film and the electrodes are A second protective film having a low specific resistance of 109 Ω·1 or less was formed by sputtering up to a part of the area.The cross-sectional shape of the heat generating part of the thermal head of the present invention formed in this way is shown in FIG. , 1 is an insulating substrate made of alumina etc., 2 is a glaze layer, 3
is a heating resistor made of T i CS + 02 thermeft film, 4 is an electrode made of Cr, 5 is an electrode made of Cu,
6 is a first protective film with high specific resistance, and 7 is a second protective film with low specific resistance.
本実施例により形成したサーマルヘッドを転写紙と長時
間走行させ静電気の帯電量の測定を行ったが、静電気の
帯電は生じていなかった。又、転写紙と発色形感熱祇に
より印字走行試験を行った結果、充分な記録寿命が得ら
れた。The thermal head formed according to this example was run with a transfer paper for a long time to measure the amount of static electricity, but no static electricity was found. In addition, as a result of a printing running test using transfer paper and color-forming thermosensitive paper, a sufficient recording life was obtained.
発明の効果
以上のように本発明は、耐摩耗保護膜上の静電気の帯電
を防止するもので、発色形感熱紙及び転写紙のどちらに
対しても良好な記録寿命を有する感熱記録用サーマルヘ
ッドが得られる。Effects of the Invention As described above, the present invention prevents static electricity from being charged on the wear-resistant protective film, and provides a thermal head for thermal recording that has a good recording life for both color-forming thermal paper and transfer paper. is obtained.
第１図は本発明の悠然記録用サーマルヘッドの一実施例
を示す断面図、第２図は従来の感熱記録用サーマルヘッ
ドの断面図、第３図は他の従来例の断面図である。
■・・・・・・絶縁性基板、２・・・・・・グレーズ層
、３・・・・・・発熱抵抗体、４．５・・・・・・電極
、６・・・・・・第１保護層、７・・・・・・第２保護
層。
代理人の氏名 弁理士 中尾敏男 はか１名ｌ−−アル
ミτ腹仮
４−ｔχ頚粧看屓）
第１図
第２図
第３図FIG. 1 is a cross-sectional view showing an embodiment of the thermal head for leisurely recording of the present invention, FIG. 2 is a cross-sectional view of a conventional thermal head for thermal recording, and FIG. 3 is a cross-sectional view of another conventional example. ■...Insulating substrate, 2...Glaze layer, 3...Heating resistor, 4.5...Electrode, 6... first protective layer, 7...second protective layer; Name of agent Patent attorney Toshio Nakao (1 person) Figure 1 Figure 2 Figure 3
Claims (1)
護膜よりなり、前記耐摩耗保護膜を、１０＾１＾０Ω・
ｃｍ以上の高比抵抗からなる第１保護膜と、この第１保
護膜上に１０＾９Ω・ｃｍ以下低比抵抗からなる第２保
護膜を形成し、この第２保護膜は、前記電極の少なくと
も片側に接するように設けた熱記録用サーマルヘッド。It consists of a resistor film, an electrode, and a wear-resistant protective film formed on an insulating substrate, and the wear-resistant protective film has a resistance of 10^1^0Ω.
A first protective film having a high specific resistance of 10^9 Ω cm or more is formed on the first protective film, and a second protective film having a low specific resistance of 10^9 Ωcm or less is formed on the first protective film. A thermal head for heat recording installed so as to be in contact with at least one side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61294033A JPS63145052A (en) | 1986-12-10 | 1986-12-10 | Thermal recording head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61294033A JPS63145052A (en) | 1986-12-10 | 1986-12-10 | Thermal recording head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63145052A true JPS63145052A (en) | 1988-06-17 |
Family
ID=17802394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61294033A Pending JPS63145052A (en) | 1986-12-10 | 1986-12-10 | Thermal recording head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63145052A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH045941U (en) * | 1990-04-26 | 1992-01-20 | ||
| EP1057649A3 (en) * | 1999-05-31 | 2001-03-07 | Aoi Electronics Company Limited | Thermal head and method to manufacture thermal head |
| US6336712B1 (en) * | 1993-05-14 | 2002-01-08 | Brother Kogyo Kabushiki Kaisha | Image formation apparatus having a toner flow control member with a protection layer |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61135765A (en) * | 1984-12-07 | 1986-06-23 | Matsushita Electric Ind Co Ltd | Preparation of abrasion resistant protective film of thermal head |
| JPS61154954A (en) * | 1984-12-28 | 1986-07-14 | Tokyo Electric Co Ltd | Thermal head |
-
1986
- 1986-12-10 JP JP61294033A patent/JPS63145052A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61135765A (en) * | 1984-12-07 | 1986-06-23 | Matsushita Electric Ind Co Ltd | Preparation of abrasion resistant protective film of thermal head |
| JPS61154954A (en) * | 1984-12-28 | 1986-07-14 | Tokyo Electric Co Ltd | Thermal head |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH045941U (en) * | 1990-04-26 | 1992-01-20 | ||
| US6336712B1 (en) * | 1993-05-14 | 2002-01-08 | Brother Kogyo Kabushiki Kaisha | Image formation apparatus having a toner flow control member with a protection layer |
| EP1057649A3 (en) * | 1999-05-31 | 2001-03-07 | Aoi Electronics Company Limited | Thermal head and method to manufacture thermal head |
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