JPS63138991U - - Google Patents
Info
- Publication number
- JPS63138991U JPS63138991U JP1987032488U JP3248887U JPS63138991U JP S63138991 U JPS63138991 U JP S63138991U JP 1987032488 U JP1987032488 U JP 1987032488U JP 3248887 U JP3248887 U JP 3248887U JP S63138991 U JPS63138991 U JP S63138991U
- Authority
- JP
- Japan
- Prior art keywords
- excimer laser
- workpiece
- scanning means
- lens
- cylindrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Laser Beam Processing (AREA)
- Mechanical Optical Scanning Systems (AREA)
Description
第１図は本考案の一実施例を示す縦断面図、第
２図ａは第１図のエキシマレーザ発振器から出射
されたレーザビームの断面図、第２図ｂは第１図
の試料上に照射されたレーザビームの断面図、第
３図ａは第２図ａの矩形ビームの短辺方向のレー
ザ光強度分布を示す図、第３図ｂは第２図ａの矩
形ビームの長辺方向のレーザ光強度分布を示す図
、第４図は第１図の円筒状ｆθレンズの斜視図、
第５図ａは本考案の他の実施例の構成を示す平面
図、第５図ｂは第５図ａのＤ―Ｄ方向の断面図、
第６図ａは第５図のエキシマレーザ発振器から出
射されたレーザビームの断面図、第６図ｂは第５
図の試料上に照射されたレーザビームの断面図で
ある。
主要部分の符号の説明、１……エキシマレーザ
発振器、２……スキヤンニングミラー、３……円
筒状ｆθレンズ、６……シリンドリカルレンズ。
FIG. 1 is a longitudinal cross-sectional view showing an embodiment of the present invention, FIG. 2 a is a cross-sectional view of the laser beam emitted from the excimer laser oscillator of FIG. 1, and FIG. A cross-sectional view of the irradiated laser beam, FIG. 3a is a diagram showing the laser light intensity distribution in the short side direction of the rectangular beam in FIG. 2a, and FIG. 3b is a diagram showing the long side direction of the rectangular beam in FIG. 2a. Figure 4 is a perspective view of the cylindrical fθ lens in Figure 1,
FIG. 5a is a plan view showing the configuration of another embodiment of the present invention, FIG. 5b is a sectional view taken along the line DD in FIG. 5a,
FIG. 6a is a cross-sectional view of the laser beam emitted from the excimer laser oscillator in FIG.
FIG. 3 is a cross-sectional view of a laser beam irradiated onto the sample shown in the figure. Explanation of symbols of main parts: 1... Excimer laser oscillator, 2... Scanning mirror, 3... Cylindrical fθ lens, 6... Cylindrical lens.
Claims (1)
うエキシマレーザ加工装置であつて、前記エキシ
マレーザ光を被加工物上で走査する走査手段と、
前記走査手段を通過した前記エキシマレーザ光を
前記被加工物上に集光する円筒状ｆθレンズとを
前記エキシマレーザ光の光軸と直交するように設
け、前記走査手段と前記円筒状ｆθレンズとを介
して前記エキシマレーザ光で前記被加工物上を走
査するようにしたことを特徴とするエキシマレー
ザ加工装置。 (2) 前記走査手段は回動自在な反射鏡と、シリ
ンドリカルレンズとにより構成され、前記反射鏡
の回動動作により前記エキシマレーザ光で前記被
加工物上を走査するようにしたことを特徴とする
実用新案登録請求の範囲第１項のエキシマレーザ
加工装置。[Claims for Utility Model Registration] (1) An excimer laser processing device that performs laser processing using excimer laser light, comprising a scanning means for scanning the excimer laser light on a workpiece;
A cylindrical fθ lens that focuses the excimer laser light that has passed through the scanning means onto the workpiece is provided so as to be perpendicular to the optical axis of the excimer laser light, and the scanning means and the cylindrical fθ lens An excimer laser processing apparatus characterized in that the excimer laser beam scans the workpiece using the excimer laser beam. (2) The scanning means includes a rotatable reflecting mirror and a cylindrical lens, and the excimer laser beam scans the workpiece by rotating the reflecting mirror. An excimer laser processing device according to claim 1 of the utility model registration claim.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987032488U JPS63138991U (en) | 1987-03-05 | 1987-03-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987032488U JPS63138991U (en) | 1987-03-05 | 1987-03-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63138991U true JPS63138991U (en) | 1988-09-13 |
Family
ID=30839210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987032488U Pending JPS63138991U (en) | 1987-03-05 | 1987-03-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63138991U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8686315B2 (en) | 2001-09-25 | 2014-04-01 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation method and laser irradiation device and method of manufacturing semiconductor device |
-
1987
- 1987-03-05 JP JP1987032488U patent/JPS63138991U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8686315B2 (en) | 2001-09-25 | 2014-04-01 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation method and laser irradiation device and method of manufacturing semiconductor device |
| US9748099B2 (en) | 2001-09-25 | 2017-08-29 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation method and laser irradiation device and method of manufacturing semiconductor device |