JPS63128536A - X-ray source - Google Patents
X-ray sourceInfo
- Publication number
- JPS63128536A JPS63128536A JP27477086A JP27477086A JPS63128536A JP S63128536 A JPS63128536 A JP S63128536A JP 27477086 A JP27477086 A JP 27477086A JP 27477086 A JP27477086 A JP 27477086A JP S63128536 A JPS63128536 A JP S63128536A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- efficiency
- target material
- rays
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 21
- 239000013077 target material Substances 0.000 claims abstract description 14
- 239000000470 constituent Substances 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052782 aluminium Inorganic materials 0.000 abstract description 4
- 239000004698 Polyethylene Substances 0.000 abstract description 2
- 230000031700 light absorption Effects 0.000 abstract description 2
- -1 polyethylene Polymers 0.000 abstract description 2
- 229920000573 polyethylene Polymers 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
Landscapes
- X-Ray Techniques (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はレーザー・プラズマＸ線源のターゲット材料構
成に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to target material compositions for laser plasma X-ray sources.
従来、レーザー・プラズマｘ、Ｉｊｌ源のターゲ７）材
としてはアルミニウムが用いられるのが通例であったＯ
〔発明が解決しようとする問題点〕
しかし、上記従来技術によると、アルミニウム材及ヒア
ルミニウム・プラズマのレーザー光線反射率が高＜、ｘ
ｉの発生効率が低いと言う問題点があった。Conventionally, it has been customary to use aluminum as the target material of the laser plasma x, Ijl source.・High plasma laser beam reflectance <, x
There was a problem that the generation efficiency of i was low.
本発明は、かかる従来技術の問題点をなくし、レーザー
・プラズマＸ線源に於て高効率のｘｉを発生し得るター
ゲット材料構成を提供する事を目的とする。It is an object of the present invention to eliminate the problems of the prior art and to provide a target material configuration that can generate xi with high efficiency in a laser plasma X-ray source.
上記問題点を解決するために本発明は、レーザー・プラ
ズマＸ線源に於て、ターゲット材を（１）炭素となす事
、及び
（２）炭素を構成元素とする高分子有機被膜をターゲッ
ト材表面に形成する事（含炭素膜）等の手段をとる。In order to solve the above problems, the present invention provides a laser/plasma X-ray source that (1) uses carbon as the target material, and (2) coats the surface of the target material with a polymeric organic coating containing carbon as a constituent element. (carbon-containing film).
以下、本発明の実施例を第１図により詳述する。 Hereinafter, embodiments of the present invention will be described in detail with reference to FIG.
第１図において、１はレーザー発生源、２はレーザー、
６はレーザー通過窓、４は容器、５はターゲットとして
の炭素、６はＸｉｉ、７はＸ＠通過窓である。In FIG. 1, 1 is a laser source, 2 is a laser,
6 is a laser passing window, 4 is a container, 5 is carbon as a target, 6 is Xii, and 7 is an X@passing window.
レーザー２がターゲットとしての炭素５に照射され、ピ
ンチ現象によりＸｌｌＮ６がＸ線通過窓７より放出され
る。The laser 2 irradiates carbon 5 as a target, and XllN6 is emitted from the X-ray passing window 7 due to the pinch phenomenon.
このように、レーザー・プラズマＸｇ源に於て、ターゲ
ット材に炭素を用いると、炭素及び炭素プラズマの光反
射が低下し、光吸収が増大する事により従来のアルミニ
ウム・ターゲットの場合、波長１Ｘ〜１ｏＸのＸ線が１
０％程度の効率で発生するのに対し、１０Ｘ〜１００Ｘ
の波長のｘｉＩが２０％以上の効率で発生する。In this way, when carbon is used as the target material in a laser plasma Xg source, the light reflection of carbon and carbon plasma is reduced and the light absorption is increased. 1oX of X-rays is 1
While it occurs with an efficiency of about 0%, 10X to 100X
xiI of wavelength is generated with an efficiency of more than 20%.
更に、アルミニウム・ターゲット表面ニ、ポリ・エチレ
ン等の有機高分子膜を被覆するか、あるいは炭素膜を被
覆させると、１〜１００Ｘの波長のＸＳがやはり２０％
以上の効率で発生する＠〔発明の効果〕
本発明の如く、レーザー・プラズマＸｉｌ源に於て、タ
ーゲット材を炭素にするか、あるいはターゲット材に炭
素あるいは有機高分子を被覆する事により、レーザー光
線の吸収効率が上り、ひいてはｘｉの発生効率を上げる
事ができる効果がある。Furthermore, if the aluminum target surface is coated with an organic polymer film such as polyethylene or a carbon film, the XS of wavelengths from 1 to 100X will still be 20%.
[Effects of the Invention] As in the present invention, in a laser plasma Xil source, by using carbon as the target material or coating the target material with carbon or an organic polymer, the laser beam This has the effect of increasing the absorption efficiency of xi, which in turn increases the generation efficiency of xi.
第１図は本発明の実施例によるＸ線源を示す概略図であ
る０
１・・・レーザー発生源 ２・・・レー？ −３・・
・レーザー通過窓 ４・・・容器５・・・炭素
６・・・ｘ＠７・・・Ｘ線通過窓
以 上
出願人 セイコーエプソン株式会社
し・、・。
１、ｌFIG. 1 is a schematic diagram showing an X-ray source according to an embodiment of the present invention.0 1... Laser source 2... Ray? -3...
・Laser passing window 4... Container 5... Carbon
[email protected] passing window or more Applicant: Seiko Epson Corporation... 1, l
Claims (1)
ラズマを発生させると共に、該プラズマのピンチ現象に
よりＸ線を発生させるいわゆるレーザー・プラズマＸ線
源に於て、ターゲット材を炭素となるか、あるいはター
ゲット材に炭素を構成元素とする有機被膜を形成する事
を特徴とするＸ線源。In a so-called laser plasma X-ray source that irradiates a target with a laser beam to generate plasma in the target material and generates X-rays by the pinch phenomenon of the plasma, the target material is converted into carbon or turned into a target material. An X-ray source characterized by forming an organic film containing carbon as a constituent element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27477086A JPS63128536A (en) | 1986-11-18 | 1986-11-18 | X-ray source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27477086A JPS63128536A (en) | 1986-11-18 | 1986-11-18 | X-ray source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63128536A true JPS63128536A (en) | 1988-06-01 |
Family
ID=17546328
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27477086A Pending JPS63128536A (en) | 1986-11-18 | 1986-11-18 | X-ray source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63128536A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004301821A (en) * | 2003-03-19 | 2004-10-28 | Nippon Telegr & Teleph Corp <Ntt> | Generator for x-ray and high energy particle, and generation method therefor |
| US7033296B2 (en) | 2001-12-27 | 2006-04-25 | Aisin Aw Co., Ltd. | Drive unit equipped with electrical motor |
| JP2010003548A (en) * | 2008-06-20 | 2010-01-07 | Komatsu Ltd | Extreme ultraviolet light source device and production method of extreme ultraviolet light |
| WO2011055376A1 (en) * | 2009-11-09 | 2011-05-12 | Tata Institute Of Fundamental Research | Biological laser plasma x-ray point source |
-
1986
- 1986-11-18 JP JP27477086A patent/JPS63128536A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7033296B2 (en) | 2001-12-27 | 2006-04-25 | Aisin Aw Co., Ltd. | Drive unit equipped with electrical motor |
| JP2004301821A (en) * | 2003-03-19 | 2004-10-28 | Nippon Telegr & Teleph Corp <Ntt> | Generator for x-ray and high energy particle, and generation method therefor |
| JP2010003548A (en) * | 2008-06-20 | 2010-01-07 | Komatsu Ltd | Extreme ultraviolet light source device and production method of extreme ultraviolet light |
| WO2011055376A1 (en) * | 2009-11-09 | 2011-05-12 | Tata Institute Of Fundamental Research | Biological laser plasma x-ray point source |
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