JPS6311575U - - Google Patents
Info
- Publication number
- JPS6311575U JPS6311575U JP10304286U JP10304286U JPS6311575U JP S6311575 U JPS6311575 U JP S6311575U JP 10304286 U JP10304286 U JP 10304286U JP 10304286 U JP10304286 U JP 10304286U JP S6311575 U JPS6311575 U JP S6311575U
- Authority
- JP
- Japan
- Prior art keywords
- bell gear
- base
- susceptor
- vapor phase
- phase growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 238000001947 vapour-phase growth Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 1
- 239000012071 phase Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 239000012808 vapor phase Substances 0.000 claims 1
- 239000000498 cooling water Substances 0.000 description 2
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第１図は本考案の一実施例を示す縦型気相成長
装置の概要断面図、第２図および第３図は従来の
縦型気相成長装置のそれぞれ異なる例を示す概要
断面図である。 １……基台、４……気密室、５……サセプタ、
６……回転軸、７……基板、８……ノズル、９…
…ＲＦコイル、１１……排気管、３２……金属ベ
ルジヤ、２０……石英ベルジヤ、２５……空間、
３３……冷却水導入口、３４……冷却水排出口。
装置の概要断面図、第２図および第３図は従来の
縦型気相成長装置のそれぞれ異なる例を示す概要
断面図である。 １……基台、４……気密室、５……サセプタ、
６……回転軸、７……基板、８……ノズル、９…
…ＲＦコイル、１１……排気管、３２……金属ベ
ルジヤ、２０……石英ベルジヤ、２５……空間、
３３……冷却水導入口、３４……冷却水排出口。
Claims (1)
- 基台上に水平に設けられているサセプタ上に載
置した複数の基板の表面に半導体物質のエピタキ
シヤル薄膜を気相成長させる気密室を前記サセプ
タの周囲に前記基台と石英ベルジヤ等とによつて
構成すると共に前記石英ベルジヤの外側に金属ベ
ルジヤを被せてなる気相成長装置において、前記
石英ベルジヤと前記金属ベルジヤの間の空間に冷
却水を流すための冷却水給排手段を備えた気相成
長装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10304286U JPS6311575U (ja) | 1986-07-04 | 1986-07-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10304286U JPS6311575U (ja) | 1986-07-04 | 1986-07-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6311575U true JPS6311575U (ja) | 1988-01-26 |
Family
ID=30975233
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10304286U Pending JPS6311575U (ja) | 1986-07-04 | 1986-07-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6311575U (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8215119B2 (en) | 2007-11-01 | 2012-07-10 | Mitsubishi Electric Corporation | Refrigerant filling apparatus of refrigerating and air conditioning apparatus and refrigerant filling method of refrigerating and air conditioning apparatus |
-
1986
- 1986-07-04 JP JP10304286U patent/JPS6311575U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8215119B2 (en) | 2007-11-01 | 2012-07-10 | Mitsubishi Electric Corporation | Refrigerant filling apparatus of refrigerating and air conditioning apparatus and refrigerant filling method of refrigerating and air conditioning apparatus |