JPS63102143A - Electron bean deflecting plate - Google Patents
Electron bean deflecting plateInfo
- Publication number
- JPS63102143A JPS63102143A JP24774886A JP24774886A JPS63102143A JP S63102143 A JPS63102143 A JP S63102143A JP 24774886 A JP24774886 A JP 24774886A JP 24774886 A JP24774886 A JP 24774886A JP S63102143 A JPS63102143 A JP S63102143A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- deflection
- electron beam
- electrodes
- deflection electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 235000010627 Phaseolus vulgaris Nutrition 0.000 title 1
- 244000046052 Phaseolus vulgaris Species 0.000 title 1
- 239000000853 adhesive Substances 0.000 claims abstract description 24
- 230000001070 adhesive effect Effects 0.000 claims abstract description 24
- 125000006850 spacer group Chemical group 0.000 claims abstract description 15
- 238000010894 electron beam technology Methods 0.000 claims description 42
- 239000000758 substrate Substances 0.000 claims description 19
- 239000011521 glass Substances 0.000 claims description 12
- 239000011810 insulating material Substances 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 241000272517 Anseriformes Species 0.000 description 1
- 240000008620 Fagopyrum esculentum Species 0.000 description 1
- 235000009419 Fagopyrum esculentum Nutrition 0.000 description 1
- 240000003473 Grevillea banksii Species 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011295 pitch Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、カラーテレビジョン受像機、計算機の端末デ
ィスプレイ等に用いる平板形の画像表示装置における電
子ビーム偏向板に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an electron beam deflection plate in a flat image display device used in color television receivers, computer terminal displays, and the like.
従来の技術
最近、平板形画像表示装置が画像、文字等のディスプレ
イ分野で盛んに利用されるようになってきた。これら平
板形画像表示装置として平板形映像管がある。2. Description of the Related Art Recently, flat image display devices have been widely used in the field of displaying images, characters, and the like. These flat image display devices include flat picture tubes.
本出願人は先に特開昭６０−１８９８４８号、特開昭６
０−１９３２４２号として平板形映像管を提案した。The present applicant previously filed Japanese Patent Application Laid-Open Nos. 60-189848 and 60-189848.
A flat picture tube was proposed as No. 0-193242.
以下、第４図を参照してその構成について説明する。実
際は真空外囲器であるガラス容器内に各電極を内蔵した
構成が採られるが、図においては内部電極を明確にする
ため真空外囲器は一部を除いて省略している。また画像
１文字等を表示する画面の水平、垂直方向を明確にする
ため、フェースプレート部に水平方向ＩＩ及び垂直方向
Ｖを図示している。垂直方向に長い線状カソード１０１
が等間隔で独立して複数本配置され、この線状カンード
１０１はタングステン線の表面に酸化物陰極が形成され
ている。線状カンード１０１の本数、並びに配置される
間隔は任意であり、例えば表示画面サイズが１０インチ
であるとすると、配置される間隔は約１０ｍｍで、２０
本の線状カソード１０１が垂直方向に約１６０ｍの長さ
で配置される。線状カソード１０１を挾むように線状カ
ソード１０１と離隔する画面部であるフェースプレート
部１０２と、線状カソード１０１と近接する垂直走査電
極１０３が配置されている。垂直走査電極１０３は水平
方向に細長く、等ピッチで、且つ電気的に分割されて絶
縁支持体１０４上に支持されている。The configuration will be explained below with reference to FIG. In reality, each electrode is housed in a glass container, which is a vacuum envelope, but the vacuum envelope is omitted except for some parts in the figure to make the internal electrodes clear. Further, in order to clarify the horizontal and vertical directions of the screen on which one character, etc. of an image is displayed, a horizontal direction II and a vertical direction V are illustrated on the face plate portion. Vertically long linear cathode 101
A plurality of tungsten wires are arranged independently at equal intervals, and this linear cand 101 has an oxide cathode formed on the surface of the tungsten wire. The number of linear canards 101 and the interval at which they are arranged are arbitrary. For example, if the display screen size is 10 inches, the interval at which they are arranged is approximately 10 mm, and 20 mm.
A book linear cathode 101 is arranged vertically with a length of about 160 m. A face plate portion 102, which is a screen portion separated from the linear cathode 101, and a vertical scanning electrode 103 adjacent to the linear cathode 101 are arranged so as to sandwich the linear cathode 101. The vertical scanning electrodes 103 are elongated in the horizontal direction, and are electrically divided and supported on an insulating support 104 at equal pitches.
これらの垂直走査電極１０３は、例えば通常のテレビジ
ョン画像を表示するのであれば垂直方向に水平走査線の
数（Ｎ Ｔ Ｓ Ｏ方式では約４８０本）と同等の独立
した電極として形成する。なお、垂直走査電極１０３は
水平走査線数の１ ／ ｎ本でも良い。線状カソード１
０１とフェースプレート１０２との間には線状カソード
１０１側より順次第１グリツド電極（以下、Ｇ１電極と
称す）１ｏ５、第２グリツド電極（以下、Ｇ、電極と称
す）１０６、第３グリツド電極（以下、Ｇ、電極と称す
）１ｏ７及び第４グリツド電極（以下、Ｇ４電極と称す
）１ｏ８が配置されている。Ｇ１電極１０５は線状カソ
ード１０１に対応した部分に開孔１ｏ９ （第５図参照
）を有する面状電極が各隣接する線状カソード１０１間
で互いに分割され、個々の電極に映像信号を印加してビ
ーム変調を行なう。Ｇ、電極１０６とＧ、電極１０７は
Ｇ１電極１０５と同様な開孔１１０，１１１（第５図参
照）を有し、垂直方向に分割されていない。Ｇ４電極１
０８はＧ、電極１０６．Ｃｈ電極１０７の開孔１１０，
１１１と同じか、或は垂直方向に比べて水平方向に広い
開孔１１２ （第５図参照）を有する。Ｇ４電極１０８
とフェースプレート１０２の間には水平偏向電極１１３
Ａ、 １１３Ｂ、 １１３Ｃが各線状カソード１０
１からの電子ビーム直進軸と対称で、且つ線状カソード
間隔と同じ間隔で配置されている。各水平偏向電極１１
３Ａ、１１３Ｂ、１１３０は絶縁支持体１１４の表面に
メッキ、或は真空蒸着等の手段により形成され、水平フ
ォーカス、並びに、水平偏向を行なう。フェースプレー
ト１０２の内面には螢光体１１５とメタルバック電極１
１６から成る発光層が形成されている。These vertical scanning electrodes 103 are formed as independent electrodes having the same number of horizontal scanning lines in the vertical direction (approximately 480 in the N T SO system) if, for example, a normal television image is to be displayed. Note that the number of vertical scanning electrodes 103 may be 1/n of the number of horizontal scanning lines. Linear cathode 1
01 and the face plate 102, in order from the linear cathode 101 side, there are a first grid electrode (hereinafter referred to as G1 electrode) 105, a second grid electrode (hereinafter referred to as G electrode) 106, and a third grid electrode. (hereinafter referred to as G electrode) 1o7 and a fourth grid electrode (hereinafter referred to as G4 electrode) 1o8 are arranged. The G1 electrode 105 is a planar electrode having an opening 1o9 (see FIG. 5) in a portion corresponding to the linear cathode 101, and is divided between adjacent linear cathodes 101, and a video signal is applied to each electrode. beam modulation. G, electrode 106 and G, electrode 107 have openings 110, 111 (see FIG. 5) similar to G1 electrode 105, and are not vertically divided. G4 electrode 1
08 is G, electrode 106. Opening 110 of Ch electrode 107,
It has an opening 112 (see FIG. 5) that is the same as 111 or wider in the horizontal direction than in the vertical direction. G4 electrode 108
A horizontal deflection electrode 113 is provided between the face plate 102 and the face plate 102.
A, 113B, 113C are each linear cathode 10
The electrodes are arranged symmetrically with respect to the straight axis of the electron beam from No. 1 and at the same spacing as the linear cathode spacing. Each horizontal deflection electrode 11
3A, 113B, and 1130 are formed on the surface of the insulating support 114 by means such as plating or vacuum deposition, and perform horizontal focusing and horizontal deflection. A phosphor 115 and a metal back electrode 1 are provided on the inner surface of the face plate 102.
A light emitting layer consisting of 16 layers is formed.
螢光体１１５はカラー表示の際に水平方向に順次光（Ｒ
）、緑（Ｇ）、青（川のストライプ、若しくはドツトと
して形成される。The phosphor 115 sequentially emits light (R) in the horizontal direction during color display.
), green (G), blue (formed as river stripes or dots).
次に上記平板形映像管の動作について説明する。Next, the operation of the flat picture tube will be explained.
第５図において線状カソード１０１に電流を流してこれ
を加熱し、Ｇ１電極１０５、垂直走査電極１０３には線
状カソード１０１の電位とほぼ同じ電圧を印加する。こ
の時ＧＩ電極１０５．Ｇ、電極１０６に向って線状カソ
ード１０１から電子ビームが進行し、各電極１０５．１
０６に設けられた開孔１１０，１１１部を電子ビームが
通過するように線状カソード１０１の電位よりも高い電
圧（１００〜５００ｖ程度）をＧ２電極１０６に印加す
る。ここで電子ビームがＧ、、 Ｇ、電極１０５．１０
６の各開孔１１０，１１１を通過する量を制御するには
、Ｇ１電極１０５の電圧を変化させることによって行な
う。Ｇ！電極１０６の開孔部１１１を通過した電子ビー
ムはＧ３電極１０７．０４電極１０８゜電子ビームを挾
んで対向する水平偏向電極１１３Ａ、１１３Ｂ、１１３
０と進むが、これらの電極には螢光面で電子ビームが小
さいスポットとなるように所定の電圧が印加される。こ
こで垂直方向のビームフォーカスはＧ４電極１０８の開
孔１１２の出口で形成される静電レンズで行なわれ、水
平方向のビームフォーカスは水平偏向電極１１３Ａ。In FIG. 5, a current is passed through the linear cathode 101 to heat it, and a voltage approximately the same as the potential of the linear cathode 101 is applied to the G1 electrode 105 and the vertical scanning electrode 103. At this time, the GI electrode 105. G, an electron beam advances from the linear cathode 101 toward the electrode 106, and each electrode 105.1
A voltage (approximately 100 to 500 V) higher than the potential of the linear cathode 101 is applied to the G2 electrode 106 so that the electron beam passes through the openings 110 and 111 provided in the G2 electrode 106. Here, the electron beam is G, G, electrode 105.10
The amount of light passing through each of the openings 110 and 111 of No. 6 is controlled by changing the voltage of the G1 electrode 105. G! The electron beam that has passed through the aperture 111 of the electrode 106 is transferred to the G3 electrode 107, 04 electrode 108°, and the horizontal deflection electrodes 113A, 113B, 113 that face each other with the electron beam in between.
0, a predetermined voltage is applied to these electrodes so that the electron beam forms a small spot on the fluorescent surface. Here, beam focusing in the vertical direction is performed by an electrostatic lens formed at the exit of the aperture 112 of the G4 electrode 108, and beam focusing in the horizontal direction is performed by the horizontal deflection electrode 113A.
１１３Ｂ、１１３Ｃ！に印加される各中心電圧を変化さ
せることによって得ることができる。またこの水平偏向
電極１１３Ａ、１１３Ｂ、１１３０は各々に２系統の共
通母線１１３Ａ−ａ、 ｂ、 １１３Ｂ−ａ、
ｂ、 １１３０−ａ、 ｂによって接続され、これ
らの母線を通じて水平走査周期の鋸歯状波、或は階段状
波の偏向電力が各々の水平フォーカス電圧と同時に重畳
され、各々の電子ビームは所定の幅で水平方向に偏向さ
れる。偏向された電子ビームは螢光体１１５を刺激して
画面上で発光像を形成する。この時、カラー画像等を得
るには、上記のように各電子ビームが螢光体１１５を水
平走査する時、電子ビームが入射している各色の螢光体
と対応した色の変調信号を０１電極１０５に印加すれば
良い。113B, 113C! can be obtained by varying the respective center voltages applied to the . In addition, these horizontal deflection electrodes 113A, 113B, and 1130 each have two systems of common bus lines 113A-a, b, 113B-a,
b, 1130-a, and b, and through these busbars, a sawtooth wave or step wave deflection power with a horizontal scanning period is simultaneously superimposed on each horizontal focus voltage, and each electron beam has a predetermined width. is deflected horizontally. The deflected electron beam stimulates the phosphor 115 to form a luminescent image on the screen. At this time, in order to obtain a color image, etc., when each electron beam horizontally scans the phosphor 115 as described above, the modulation signal of the color corresponding to the phosphor of each color on which the electron beam is incident is 01 The voltage may be applied to the electrode 105.
次に垂直走査について第６図及び第７図を参照して説明
する。上記のように線状カソード１０１を取り囲む空間
の電位を線状カソード１０１の電位よりも正、或は負の
電位となるように垂直走査電極１０３の電圧を制御する
ことにより線状カソード１０１からの電子の発生は制御
される。この時、線状カソード１０１と垂直走査電極１
０３との距離が小さければ線状カソード１０１からの電
子ビームのＯＮ、ＯＦＦを制御する電圧は小さくて済む
。垂直走査電極１０３には、インタレース方式を採用し
ている場合、最初の１フイールド目においては垂直走査
電極の１０３Ａより１水平走査期間（ＩＨ）のみ電子ビ
ームが発生する（以下ＯＮ）信号が、次のＩ Ｈ間には
１０３Ｃに電子ビームがＯＮになる信号が、以下順次、
垂直走査電極１本置きにＩ Ｈ間のみ電子ビームがＯＮ
になる信号が印加され、画面下部に相当する１０３Ｘが
終了すると最初の１フイールドの垂直走査が完了する。Next, vertical scanning will be explained with reference to FIGS. 6 and 7. As described above, by controlling the voltage of the vertical scanning electrode 103 so that the potential of the space surrounding the linear cathode 101 is more positive or negative than the potential of the linear cathode 101, the voltage from the linear cathode 101 is reduced. The generation of electrons is controlled. At this time, the linear cathode 101 and the vertical scanning electrode 1
03, the voltage for controlling ON/OFF of the electron beam from the linear cathode 101 can be small. When the interlace method is adopted for the vertical scanning electrode 103, in the first field, an electron beam is generated from the vertical scanning electrode 103A for one horizontal scanning period (IH) (hereinafter referred to as ON). During the next IH, a signal to turn on the electron beam is sent to 103C, and then
The electron beam is ON only between I and H for every other vertical scanning electrode.
When the signal 103X corresponding to the lower part of the screen is completed, the vertical scanning of the first field is completed.
次の第２フイールド目は垂直走査電極１０３Ｂより、同
時にＩ Ｈ間のみ電子ビームがＯＮとなる信号が印加さ
れ、最終的に１０３Ｙまでの走査によって１フレームの
垂直走査が完了する。In the next second field, a signal is simultaneously applied from the vertical scanning electrode 103B to turn on the electron beam only between I and H, and one frame of vertical scanning is finally completed by scanning up to 103Y.
また上記平板形カラー陰極線管のように水平方向に多数
の電子ビーム発生源を有する陰極線管を用いたテレビ画
像表示のためのＧ、電極に印加する信号処理系統につい
て、第８図、第９図を参照して説明する。テレビ同期信
号１４２をもとにタイミングパルス発生器１４４では後
述する回路ブロックを駆動させるタイミングパルスを発
生させる。Also, FIGS. 8 and 9 show a signal processing system for applying G and electrodes for displaying television images using a cathode ray tube having a large number of electron beam generation sources in the horizontal direction, such as the above-mentioned flat color cathode ray tube. Explain with reference to. Based on the television synchronization signal 142, a timing pulse generator 144 generates timing pulses for driving circuit blocks to be described later.
先ず、その中の１つのタイミングパルスで復調された映
像１４１をＡ／Ｄコンバータ１４３にてディジタル信号
に変換し、ＩＨ間の信号を第１のラインメモＩＪ−１４
５に入力する。ＩＨ間の信号が全て入力されると、その
信号は第２のラインメモＩＪ−１４６に同時に転送され
、次のＩＨの信号がまた第１のラインメモリー１４５に
入力される。First, the video 141 demodulated by one of the timing pulses is converted into a digital signal by the A/D converter 143, and the signal between IH is sent to the first line memo IJ-14.
Enter 5. When all the signals between IHs are input, the signals are simultaneously transferred to the second line memory IJ-146, and the next IH signal is also input to the first line memory 145.
第２のラインメモリー１４６に転送された信号はｌ ８
間記憶保持されると共に、Ｄ／Ａコンバーター（或はパ
ルス幅変換器）１４７に信号を送り、ここで元のアナロ
グ信号（或はパルス幅変調信号）に変換され、これを増
幅して陰極線管の各Ｇ、電極１０５に印加される。ここ
でラインメモリーは時間軸変換のために用いられるもの
で、その具体的な説明を第９図を用いて行なう。表示画
面領域を走査するために用いられる電子ビームの数（即
ちカソード本数）をＡとすると、或ＩＨ間の映像信号１
５１の映像信号挿入時間ＴをＴ／Ａに分割し、分割され
た個々の期間の映像信号の時間軸をＡ倍して１時間に延
長し、この信号１５２をそれぞれの対応するＧ１電極１
０５に印加する。このようにしてＩＨ全全体亘っての画
像が表示され、これを垂直走査によって順次行なうこと
によって、全体の画像を画面上で合成することができる
。The signal transferred to the second line memory 146 is l8
At the same time, the signal is sent to the D/A converter (or pulse width converter) 147, where it is converted to the original analog signal (or pulse width modulation signal), which is amplified and transmitted to the cathode ray tube. G is applied to the electrode 105. Here, the line memory is used for time axis conversion, and its specific explanation will be given using FIG. 9. If the number of electron beams (i.e. the number of cathodes) used to scan the display screen area is A, then the video signal 1 between a certain IH
51 video signal insertion time T is divided into T/A, the time axis of the video signal of each divided period is multiplied by A and extended to 1 hour, and this signal 152 is transmitted to each corresponding G1 electrode 1.
05. In this way, an image covering the entire IH is displayed, and by sequentially performing vertical scanning, the entire image can be synthesized on the screen.
そして従来の平板形画像表示装置の電子ビーム偏向板に
おいては、電子ビームを水平方向に偏向するための各偏
向電極１１３Ａ、 １１３Ｂ、 １１３Ｃとしては、
ガラス基板１１４等に形成された金属薄膜が分割されて
いる。そしてこれらの偏向電極１１３Ａ、１１３Ｂ、１
１３０に電子ビームを偏向するための鋸波状等の偏向電
力、並びに電子ビームを集中するための直流電圧がそれ
ぞれ印加される。In the electron beam deflection plate of the conventional flat panel image display device, each of the deflection electrodes 113A, 113B, and 113C for deflecting the electron beam in the horizontal direction is as follows.
A metal thin film formed on the glass substrate 114 or the like is divided. And these deflection electrodes 113A, 113B, 1
Deflection power such as a sawtooth waveform for deflecting the electron beam and a DC voltage for concentrating the electron beam are applied to 130, respectively.
発明が解決しようとする問題点
しかしながら、上記直流電圧は１〜２０Ｋｖと高電圧な
ため、上記従来の電子ビーム偏向板の構成では、偏向電
極１１３Ａ、１１３Ｂ、１１３Ｃである金属薄膜のエツ
ジ部等で放電が発生し易い。また、偏向電極１１３Ａ、
１１３Ｂ、１１３０間でガラス基板１１４が露出してい
るので、電子ビームのチャージアップ及び放電の原因と
なり、その結果、偏向電極１１３Ａ、１１３Ｂ、１１３
０が破壊されると同時に、これらを駆動するための回路
が破損されるおそれがある。Problems to be Solved by the Invention However, since the above-mentioned DC voltage is a high voltage of 1 to 20 Kv, in the structure of the above-mentioned conventional electron beam deflection plate, the edge portions of the metal thin films, which are the deflection electrodes 113A, 113B, and 113C, Electric discharge is likely to occur. In addition, the deflection electrode 113A,
Since the glass substrate 114 is exposed between 113B and 1130, it causes charge-up and discharge of the electron beam, and as a result, the deflection electrodes 113A, 113B, 113
There is a risk that the circuit for driving these will be damaged at the same time as the 0 is destroyed.
本発明は、上記問題を解決するもので、偏向電極のエツ
ジ部での放電を防止することができ、従って偏向電極、
駆動回路の破壊を防止することができるようにした電子
ビーム偏向板を提供しようとするものである。The present invention solves the above-mentioned problem, and can prevent discharge at the edge portion of the deflection electrode.
It is an object of the present invention to provide an electron beam deflection plate that can prevent damage to a drive circuit.
問題点を解決するための手段
そして上記問題点を解決するための本発明の技術的な手
段は、絶縁性支持基板上に偏向電極が設けられ、この偏
向電極とは電気的に分離された偏向電極が上記偏向電極
と空間を存してオーバラップされて上記絶縁性支持基板
上に接着剤によって接着され、この接着剤により上記偏
向電極の少なくとも一方のエツジ部が被覆されたもので
ある。Means for solving the problems and technical means of the present invention for solving the above problems include a deflection electrode provided on an insulating support substrate, and a deflection electrode electrically separated from the deflection electrode. An electrode overlaps the deflection electrode with a space therebetween and is bonded onto the insulating support substrate with an adhesive, and at least one edge portion of the deflection electrode is covered with the adhesive.
作用 上記技術的手段による作用は次のようになる。action The effects of the above technical means are as follows.
すなわち、偏向電極のエツジ部が接着剤によって被覆さ
れているので、エツジ部での放電が発生しにくくなり、
また上記接着剤部よりも幅の広い偏向電極を絶縁性支持
基板に接着し、絶縁性支持基板上の偏向電極とオーバラ
ップさせているので、接着剤部は電子ビームに対して見
かけ上、影となり、そこでの電子ビームによるチャージ
アップも発生することがない。従って偏向電極部での放
電発生を防止することができるので、偏向電極及び駆動
回路の破損を防止することができる。In other words, since the edges of the deflection electrode are coated with adhesive, it becomes difficult for discharge to occur at the edges.
In addition, since the deflection electrode, which is wider than the adhesive part, is bonded to the insulating support substrate and overlapped with the deflection electrode on the insulating support substrate, the adhesive part apparently casts no shadow on the electron beam. Therefore, charge-up due to the electron beam will not occur there. Therefore, it is possible to prevent the occurrence of discharge in the deflection electrode portion, thereby preventing damage to the deflection electrode and the drive circuit.
実施例
以下、本発明の実施例について図面を参照しながら説明
する。EXAMPLES Hereinafter, examples of the present invention will be described with reference to the drawings.
まず、本発明の第１実施例について説明する。First, a first embodiment of the present invention will be described.
第１図及び第２図は本発明の第１実施例における電子ビ
ーム偏向板を示し、第１図は組立完成状態の斜視図、第
２図は分解斜視図である。1 and 2 show an electron beam deflection plate according to a first embodiment of the present invention, with FIG. 1 being a perspective view of a completed assembled state, and FIG. 2 being an exploded perspective view.
第１図及び第２図に示すようにガラス等の絶縁物からな
る支持基板１の両側部の両面に第１の偏向電極２と第３
の偏向電極３が電気的に分離されて設けられている。こ
れら第１の偏向電極２と第３の偏向電極３として真空蒸
着法、スクリーン印刷法等により金属膜、若しくは酸化
物からなる導電性膜が形成されている。一方、ガラス等
の絶縁物からなる支持体４上には導電性物質からなる第
２の偏向電極５が設けられている。この第２の偏向電極
５は支持体４の一側面と両端面と他側面の両側一部を覆
うように上記第１、第３の偏向電極２．３と同様にして
設けられている。この第２の偏向電極は第１と第３の偏
向電極２と３にオーバラップするように接着により設け
られる。本実施例においては、ガラス等の絶縁物からな
る絶縁スペーサ６を用いて接着されるもので、この絶縁
スペーサ６の両面にはフリットガラス等の接着剤７が形
成されている。この絶縁スペーサ６は第１と第３の偏向
電極２と３の間隔より広く、また第２の偏向電極５の幅
より狭く、第２の偏向電極５の開放部より広くなるよう
に形成されている。そして第１の偏向電極２と第３の偏
向電極３のエツジ部とその間の支持基板１の露出部上に
絶縁スペーサ６が接着剤７により接着され、絶縁スペー
サ６に第２の偏向電極５の両側エツジ部とその間の支持
体４の露出部が接着剤７により接着されている。As shown in FIGS. 1 and 2, a first deflection electrode 2 and a third deflection electrode are provided on both sides of a supporting substrate 1 made of an insulating material such as glass.
Deflection electrodes 3 are provided to be electrically separated. As the first deflection electrode 2 and the third deflection electrode 3, conductive films made of a metal film or an oxide are formed by vacuum evaporation, screen printing, or the like. On the other hand, a second deflection electrode 5 made of a conductive material is provided on a support 4 made of an insulating material such as glass. The second deflection electrode 5 is provided in the same manner as the first and third deflection electrodes 2.3 so as to cover one side, both end surfaces, and a portion of both sides of the support 4. This second deflection electrode is provided by adhesive so as to overlap the first and third deflection electrodes 2 and 3. In this embodiment, bonding is performed using an insulating spacer 6 made of an insulating material such as glass, and an adhesive 7 such as frit glass is formed on both surfaces of this insulating spacer 6. This insulating spacer 6 is formed to be wider than the interval between the first and third deflection electrodes 2 and 3, narrower than the width of the second deflection electrode 5, and wider than the opening of the second deflection electrode 5. There is. Then, an insulating spacer 6 is bonded with an adhesive 7 to the edge portions of the first deflection electrode 2 and the third deflection electrode 3 and the exposed portion of the supporting substrate 1 between them. The edge portions on both sides and the exposed portion of the support 4 between them are bonded with an adhesive 7.
これらの接着は電気炉中にて加熱し、７リツトガラスを
溶解することにより行なうことができる。These bonds can be performed by heating in an electric furnace and melting the 7-litre glass.
これにより支持基板１の両面に第１、第２、第３の偏向
電極２． ５． ３が対称的に設けられ、各偏向電極が
対向する位置における各偏向電極のエツジ部は、空中に
露出しないように接着剤７及び絶縁スペーサ６によって
完全に覆われている。しかも第２の偏向電極５はその両
側部が絶縁スペーサ６を覆って第１及び第３の偏向電極
２及び３側に突出し、空間を存してオーバラップしてい
る。従って絶縁スペーサ６は電子ビーム走行部に露出す
ることはない。As a result, first, second, and third deflection electrodes 2. 5. 3 are provided symmetrically, and the edges of each deflection electrode at opposing positions are completely covered with an adhesive 7 and an insulating spacer 6 so as not to be exposed in the air. Furthermore, both sides of the second deflection electrode 5 cover the insulating spacer 6 and protrude toward the first and third deflection electrodes 2 and 3, so that they overlap with each other with a space between them. Therefore, the insulating spacer 6 is not exposed to the electron beam travel section.
なお、本実施例においては、絶縁スペーサ６の両面に接
着剤７を設けるように説明したが、第１及び第３の偏向
電極２及び３が設けられた支持基板１と第２の偏向電極
５が設けられた支持体４に、それぞれ接着剤を形成して
おき、絶縁スペーサ６を介して両者を接着しても良い。In this embodiment, the adhesive 7 is provided on both sides of the insulating spacer 6, but the support substrate 1 on which the first and third deflection electrodes 2 and 3 are provided and the second deflection electrode 5 An adhesive may be applied to each of the supports 4 provided with the support 4, and the two may be bonded together via the insulating spacer 6.
また、第２の偏向電極５は金属板を使用しても良い。Moreover, a metal plate may be used for the second deflection electrode 5.
次に、本発明の第２実施例について説明する。Next, a second embodiment of the present invention will be described.
第３図は第２実施例における電子ビーム偏向板の組立完
成状態を示す斜視図である。本実施例においては上記第
１実施例と同一部材には同一符号を付し、上記第１実施
例と異なる構成についてのみ説明する。FIG. 3 is a perspective view showing the completed assembly of the electron beam deflection plate in the second embodiment. In this embodiment, the same members as those in the first embodiment are given the same reference numerals, and only the structures different from those in the first embodiment will be described.
第３図に示すように第２の偏向電極５を設けた支持体４
に第２の偏向電極５のエツジ部間で外方への突出部４ａ
が設けられ、この突出部４ａがフリットガラス等の接着
剤８によって、第１及び第３の偏向電極２及び３のエツ
ジ部とその間の支持基板１の露出部上に接着されている
。A support 4 provided with a second deflection electrode 5 as shown in FIG.
The outward protrusion 4a is formed between the edges of the second deflection electrode 5.
The protruding portion 4a is bonded to the edge portions of the first and third deflection electrodes 2 and 3 and the exposed portion of the supporting substrate 1 therebetween using an adhesive 8 such as frit glass.
なお、偏向電極の分割数は３分割以外でも良く、片面で
も良い。また、第２の偏向電極５を支持体４の全面に形
成しても良く、一部に形成しても良い。また、第１、第
３の偏向電極２，３は、金属板を支持基板１上に張り合
わせても良い。更に本発明の電子ビーム偏向板は上記方
式以外の平板形映像管に応用することができる。Note that the number of divisions of the deflection electrode may be other than three, and may be one-sided. Further, the second deflection electrode 5 may be formed on the entire surface of the support body 4 or may be formed on a part thereof. Further, the first and third deflection electrodes 2 and 3 may be formed by laminating metal plates on the support substrate 1. Furthermore, the electron beam deflection plate of the present invention can be applied to flat picture tubes other than those of the above type.
発明の効果
以上述べたように、本発明によれば、絶縁性支持基板上
に偏向電極を設け、この偏向電極とは電気的に分離した
偏向電極を上記偏向電極と空間を存してオーバラップし
、上記絶縁性支持基板上に接着剤により接着し、この接
着剤により、上記偏向電極の少なくとも一方のエツジ部
を被覆している。このように偏向電極に高電圧を印加し
て動作させた時、これら偏向電極で最も放電し易いエツ
ジ部を被覆しているので、耐電圧が増し、放電すること
がなくなる。また、各偏向電極は、オーバラップしてい
るので、支持基板等の絶縁物も電子ビームに対し露出す
ることがなく、電子ビームのチャージアップも防止でき
る。従って偏向電極の破壊を防止し、駆動回路の破壊を
防止することができる。Effects of the Invention As described above, according to the present invention, a deflection electrode is provided on an insulating support substrate, and the deflection electrode electrically separated from the deflection electrode is overlapped with the deflection electrode with a space therebetween. The deflection electrode is bonded onto the insulating support substrate with an adhesive, and the edge portion of at least one of the deflection electrodes is covered with the adhesive. In this manner, when a high voltage is applied to the deflection electrodes for operation, the edge portions that are most likely to discharge are covered with these deflection electrodes, so the withstand voltage is increased and no discharge occurs. Furthermore, since the deflection electrodes overlap each other, insulators such as the support substrate are not exposed to the electron beam, and charge-up of the electron beam can be prevented. Therefore, it is possible to prevent damage to the deflection electrodes and the drive circuit.
第１図及び第２図は本発明の第１実施例における電子ビ
ーム偏向板を示し、第１図は組立完成状態の斜視図、第
２図は分解斜視図、第３図は本発明の第２実施例を示す
組立完成状態の斜視図、第４図は平板形映像管の全体斜
視図、第５図はその水平断面図、第６図は垂直走査電極
部の斜視図、第７図は垂直走査電極の動作説明用のタイ
ミングト・・絶縁性支持基板、２・・・第１の偏向電極
、３・・・第３の偏向電極、４・・・支持体、５・・・
第２の偏向電極、６・・・絶縁スペーサ、７・・・接着
剤。
代理人の氏名 弁理士 中 尾 敏 男ほか１名第１図
笛３／）４句−蕎３
第２図
第 ３ 図
第５図
第７図
「−１
１０３８Ｊ Ｌ−一一一−−−−−−−−−ＩＯ３Ｄ
Ｊ Ｌ−−一−−−−−−−−■
■
７１）３イーー−一一−−−−−−−−−−−−−−−
一−’−Ｌ −第８図
第９図1 and 2 show an electron beam deflection plate according to a first embodiment of the present invention, FIG. 1 is a perspective view of the assembled completed state, FIG. 2 is an exploded perspective view, and FIG. FIG. 4 is a perspective view of the entire flat picture tube, FIG. 5 is a horizontal sectional view thereof, FIG. 6 is a perspective view of the vertical scanning electrode section, and FIG. 7 is a perspective view of the second embodiment in its assembled state. Timing for explaining the operation of the vertical scanning electrode: Insulating support substrate, 2: First deflection electrode, 3: Third deflection electrode, 4: Support, 5...
second deflection electrode, 6... insulating spacer, 7... adhesive; Name of agent Patent attorney Satoshi Nakao and one other person Figure 1 Flute 3/) 4 haiku - Soba 3 Figure 2 Figure 3 Figure 5 Figure 7 "-1 1038J L-111---- ------IO3D
J L−−1−−−−−−−−■ ■ 71) 3E−1−−−−−−−−−−−−−−−
1-'-L -Figure 8Figure 9
Claims (6)
向電極とは電気的に分離された偏向電極が上記偏向電極
と空間を存してオーバーラップされて上記絶縁性支持基
板上に接着剤によって接着され、この接着剤により上記
偏向電極の少なくとも一方のエッジ部が被覆されている
ことを特徴とする電子ビーム偏向板。(1) A deflection electrode is provided on the insulating support substrate, and the deflection electrode electrically separated from the deflection electrode overlaps the deflection electrode with a space therebetween and is bonded to the insulating support substrate. An electron beam deflection plate, characterized in that the electron beam deflection plate is bonded with an adhesive, and at least one edge portion of the deflection electrode is covered with the adhesive.
た偏向電極がガラス等の絶縁物からなるスペーサを介在
して接着されている特許請求の範囲第１項記載の電子ビ
ーム偏向板。(2) The electron beam deflection plate according to claim 1, wherein the deflection electrode overlapped with the deflection electrode on the insulating support substrate is bonded with a spacer made of an insulating material such as glass interposed therebetween.
た偏向電極がガラス等の絶縁性支持体上に設けられてい
る特許請求の範囲第１項または第２項記載の電子ビーム
偏向板。(3) The electron beam deflection plate according to claim 1 or 2, wherein the deflection electrode overlapped with the deflection electrode on the insulating support substrate is provided on an insulating support such as glass.
ている特許請求の範囲第３項記載の電子ビーム偏向板。(4) The electron beam deflection plate according to claim 3, wherein the adhesive side of the insulating support is formed narrowly and protrudes.
１項乃至第４項のいずれかに記載の電子ビーム偏向板。(5) The electron beam deflection plate according to any one of claims 1 to 4, wherein the adhesive is frit glass.
りなる偏向電極が形成されている特許請求の範囲第１項
または第３項または第４項記載の電子ビーム偏向板。(6) The electron beam deflection plate according to claim 1, 3, or 4, wherein a deflection electrode made of a conductive film is formed on the entire surface or a part of the insulating support.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24774886A JPS63102143A (en) | 1986-10-17 | 1986-10-17 | Electron bean deflecting plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24774886A JPS63102143A (en) | 1986-10-17 | 1986-10-17 | Electron bean deflecting plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63102143A true JPS63102143A (en) | 1988-05-07 |
Family
ID=17168078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24774886A Pending JPS63102143A (en) | 1986-10-17 | 1986-10-17 | Electron bean deflecting plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63102143A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009238719A (en) * | 2008-03-05 | 2009-10-15 | Uchihashi Estec Co Ltd | Protection element |
| JP2009283324A (en) * | 2008-05-23 | 2009-12-03 | Uchihashi Estec Co Ltd | Protection element |
-
1986
- 1986-10-17 JP JP24774886A patent/JPS63102143A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009238719A (en) * | 2008-03-05 | 2009-10-15 | Uchihashi Estec Co Ltd | Protection element |
| JP2009283324A (en) * | 2008-05-23 | 2009-12-03 | Uchihashi Estec Co Ltd | Protection element |
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