JPS6292212A - Production of magnetic head - Google Patents

Abstract

PURPOSE:To obtain the magnetic layer of the titled head with the reduced resistance of a conductor layer and having an excellent magnetic characteristic by forming the magnetic layer with a single-layered magnetic film obtained by ion etching and the succeeding lift off method to reduce the level difference. CONSTITUTION:The pattern of a photoresist 2 is formed on a substrate 1 to cover the part other than the desired shape part and then the magnetic film 3 is deposited by a sputtering device. Then the pattern of the photoresist 4 is formed by ion etching so that the vicinity of the gap part of the magnetic layer is made thinner than other parts, and the magnetic film 3 is then etched to a desired depth. Then the resist 2 is removed by a release agent or an org. solvent and the magnetic film 3 on the part other than the desired shape is simultaneously removed. Consequently, the single-layered magnetic film 3 is formed, the level difference is reduced, the resistance of the conductor layer is decreased,and the electrical characteristic of the magnetic head is improved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は磁気へ・・ドの製造方法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a method of manufacturing a magnetic head.

〔発明の概要〕[Summary of the invention]

本発明は、基板上に絶縁層、上部ｍ性層、導体層、上部
磁性層、保８ｉ層？積層千ろことによって成る磁気ヘッ
ドの製造工程において、−ヒ下磁性、゛舅の少なくとも
どちらか一方ｈζギヤツブ近傍で他の部分より意図的に
薄くしである構造のものをイオンエッチソグ法に続いて
り７トオ７法を行うことによって単層の磁性膜で磁性層
を形成することにより、磁性層の磁気特性の向上、磁気
へ・Ｉドに、８ｏ−ける段差の抑制及び製造工程の短縮
な実現したものである。The present invention provides an insulating layer, an upper magnetic layer, a conductive layer, an upper magnetic layer, and an 8i layer on a substrate. In the manufacturing process of a magnetic head consisting of a multi-layered magnetic head, a structure in which at least one part of the lower magnetic head is intentionally thinner near the hζ gear than the other part is manufactured using an ion etching method. By forming the magnetic layer with a single layer of magnetic film by performing the teri7-to-7 method, it is possible to improve the magnetic properties of the magnetic layer, suppress the level difference in magnetic and I-do, and shorten the manufacturing process. This is something that has been realized.

〔従来の技術〕[Conventional technology]

従来、基板上に絶縁層、下部磁性７層、導体層、上部ｍ
性層、保護層を積層することによって成る　　□磁気ヘ
ッドにおいて上下磁性層の少なくともどち　　：らか一
方ｈ；ギャップ部近傍で他の部分より１５図的　　：に
薄くしである構造の磁気ヘッドの磁性層のパターニング
は例えば第２図に示すごとくり７トオフ法を２回行う工
程、あるいけ第３図に示すごとくり７トオフ法の後にイ
オンエツチング法を行うＴ　　：程により形成さハてい
た。第２図及び第３図で示　　□すような、ギヤノブ近
傍で簿〈なっている構造の磁性層では磁気飽和しに（く
かつ発生ｍ界り′−急峻になる。Conventionally, an insulating layer, a lower magnetic layer (7 layers), a conductor layer, and an upper layer (m) were formed on the substrate.
□In a magnetic head, at least one of the upper and lower magnetic layers is thinner in the vicinity of the gap than in other parts. The patterning of the magnetic layer can be done, for example, by performing the 7-off method twice as shown in Figure 2, or by performing an ion etching process after the 7-off method as shown in Figure 3. . In a magnetic layer having a structure in which the magnetic layer is curved near the gear knob, as shown in FIGS. 2 and 3, magnetic saturation tends to occur and the generated m-field becomes steep.

〔発明ｈ；解決しようとする問題点及び目的〕しかし、
前述の従来技術では、筆２図に示し之リフトオフ法によ
る場合、磁性ｆｉｌＥ＆２回堆積しなければならないた
Ｖ）工程ｈ；多くかかり、又、同じ厚みの単層磁性膜に
比較して虫気持性ｈ；劣るという問題点を有する。第３
図に示したりフトオ７法に続いてイオンエツチング法に
より磁性層を形成する場合、前記リフトオフ法による場
合のような欠点は有さない／ｌＳ、す７トオマ後のイオ
ンエツチングにより磁性層以外の場所も同時にエツチン
グさｈる友め段差ｈ；大きくなり、例えば下部ｍ性層形
成後に該下部磁性１−上方に導体層を形成する際には段
差部におけろ導体ｒｆ！ｉ／１″−薄くなることにより
該導体層の電気抵抗ｈ；増し、さらには切断する等の問
題点ｈ″−生じていた。そこで本発明はこのような問題
点な解決するもので、その目的とするところは磁性層の
磁気特性ｈ″−優れ１段差が小ざいことにより導体層の
抵抗ｂｔ小さく従って出力の大きい磁気ヘッドな簡略化
さ′ｈた工程で提供するところにある。[Invention h; Problem and purpose to be solved] However,
In the above-mentioned conventional technology, when using the lift-off method shown in Fig. 2, the magnetic film must be deposited twice (V) step h; it takes a long time, and it is less susceptible to insects than a single-layer magnetic film of the same thickness. h: It has the problem of being inferior. Third
As shown in the figure, when the magnetic layer is formed by the ion etching method following the foot 7 method, it does not have the disadvantages of the lift-off method mentioned above. At the same time, the step h is also etched; the step becomes large; for example, when a conductor layer is formed above the lower magnetic layer after forming the lower magnetic layer, the conductor rf! i/1'' - As the conductor layer becomes thinner, the electrical resistance h of the conductor layer increases, and problems such as breakage h'' occur. Therefore, the present invention is intended to solve these problems, and its purpose is to improve the magnetic properties h'' of the magnetic layer and to reduce the step difference, thereby reducing the resistance bt of the conductor layer and, therefore, producing a magnetic head with a large output. It is provided through a simplified process.

〔問題を解決する几めの手段〕[Elaborate means of solving problems]

本発明の山気へ一、）’！＃ｉ告方法は、基板上尾、絶
縁濁、下部磁性層、導体層、上部磁性層、保護層な積層
することによって成る磁気へ・ドの製造工程において上
下磁性層の少なくともどちらか一方？ｌ：　ｉヤップ近
傍で他の部分より意１Ａ的に薄くしである構造のものな
イオンエ・ｌチング法の後に連続してり７トオフ法を行
い、該磁性層な単層の磁性膜で形成することを特徴とす
るう 〔実施例〕 第１図は本発明の実施例におけるｍ性層の形成工ａｋ示
す図である。（α）において、まず基板１上に所望形状
部分以外な覆うよ５にフォトレジストパターン２ケ形成
する。次に（ｂ）において磁性膜３ｔスバヴタ装（１に
より４μｍ、Ｑ積させる。次に（Ｃ）において、イオン
エツチングにより磁性層のギヤ・ノブ部近傍が仙の部分
に比べ薄くなるようにフォトレジストパターン４を形成
する。次に（力においてイオンエッチ・／グにより磁性
膜３を２μｍだけエツチングする。次Ｋ　（ｅ）におい
て７オトレジスト２をレジスト剥離液又は有鳴溶剤等で
除去し、これと同時に所望形状以外の磁性膜も除去し、
所望の磁性層パターニングな完了する。To Yamaki of the present invention,)'! Is there a way to notify at least one of the upper and lower magnetic layers in the manufacturing process of the magnetic field, which consists of laminating the top and bottom of the substrate, the insulation layer, the bottom magnetic layer, the conductor layer, the top magnetic layer, and the protective layer? 1: Formed with a single magnetic layer by performing continuous 7-off method after ion etching method, which has a structure that is significantly thinner than other parts in the vicinity of i Yap. Embodiment FIG. 1 is a diagram showing a process for forming a m-type layer in an embodiment of the present invention. In step (α), two photoresist patterns are first formed on the substrate 1 so as to cover areas other than the desired shape. Next, in (b), a 3-t magnetic film is deposited (4 μm and Q is multiplied by 1).Next, in (C), photoresist is etched so that the vicinity of the gear knob part of the magnetic layer is thinner than the center part. A pattern 4 is formed. Next, the magnetic film 3 is etched by 2 μm by ion etching / in the next step (e), the photoresist 2 is removed with a resist stripping solution or a squealing solvent, etc. At the same time, magnetic films with shapes other than the desired shape are also removed.
Complete the desired magnetic layer patterning.

〔発明の効果〕〔Effect of the invention〕

以上述べ之ように本発明によれば１Ｍｉ気ヘッドの製造
工程において、磁性層？イオンエツチング法π続いてリ
フトオフ法ケ行うことＫよって、単層ハ懲性嗅で形成す
ることにより、ｍ気持性の優ね、たｉｔｓ性ｊ台ｈ′−
得られ、又、イオンエッチジグ時に＄　ｍ　＊　−’ｆ
Ｊ性嘩以外の箇所ｈ；エツチングされないたぬ、第５図
（ｅ）及び（０に見られるような基板部のエツチングに
よる段差の鉱犬ｈ；なく、段差の大きさ直を最小限に抑
えられ、又、第２図に示したり７トオ７法シ２回行５工
程や、第３図に示したりフトオ７法の後にイオンエツチ
ング法を行う工程では）すトレジストな除去する工８な
２回行わなければならないところ、本発明の方法によれ
ば１回で済むので工程短縮が実現できろという効果を有
する。As described above, according to the present invention, in the manufacturing process of a 1Mi magnetic head, the magnetic layer ? By performing the ion etching method followed by the lift-off method, a single layer is formed with a penetrating odour, which has excellent pleasantness and its properties.
Also, when using an ion etching jig, $ m * -'f
Areas other than the J-type area h: There are no etched areas, and there are no steps due to etching on the substrate as seen in Figures 5(e) and (0), and the size of the steps is minimized. In addition, in the process shown in FIG. 2, where the ion etching method is performed after the step 7, and in the step shown in FIG. The method of the present invention has the effect of shortening the process because it only needs to be done once, whereas the method of the present invention only needs to be done once.

【図面の簡単な説明】[Brief explanation of drawings]

第１図（α）〜（ｅ）は、本発明における磁性層い製造
Ｔ程図を示す。 第２図Ｉｔ１．）〜（ト）及び筆３図危）〜いは従来の
磁性層の製１青工程図を示す。 １・・・・・・基板 ２、４．５．７．８．　１０・・・・・・フォトレジス
ト５、６．９・・・・・・磁性膜 以　　上FIGS. 1(α) to (e) show process diagrams for manufacturing the magnetic layer in the present invention. Figure 2 It1. ) to (G) and Brush 3 Figure 1) to Figure 1A show the manufacturing process diagrams of conventional magnetic layers. 1...Substrate 2, 4.5.7.8. 10... Photoresist 5, 6.9... Magnetic film or more

Claims (1)

【特許請求の範囲】[Claims] 基板上に、絶縁層、下部磁性層、導体層、上部磁性層、
保護層を積層することによって成る磁気ヘッドの製造工
程において上下磁性層の少なくともどちらか一方がギャ
ップ部近傍で他の部分より意図的に薄くしてある構造の
ものをイオンエッチソグ法の後に連続してリフトオフ法
を行い、該磁性層を単層の磁性膜で形成することを特徴
とする磁気ヘッドの製造方法。On the substrate, an insulating layer, a lower magnetic layer, a conductor layer, an upper magnetic layer,
In the manufacturing process of a magnetic head consisting of laminating protective layers, a structure in which at least one of the upper and lower magnetic layers is intentionally made thinner in the vicinity of the gap than the other part is continued after an ion etching process. 1. A method of manufacturing a magnetic head, comprising performing a lift-off method to form the magnetic layer as a single-layer magnetic film.