JPS6284450A - Production of substrate for optical disk - Google Patents
Production of substrate for optical diskInfo
- Publication number
- JPS6284450A JPS6284450A JP22433285A JP22433285A JPS6284450A JP S6284450 A JPS6284450 A JP S6284450A JP 22433285 A JP22433285 A JP 22433285A JP 22433285 A JP22433285 A JP 22433285A JP S6284450 A JPS6284450 A JP S6284450A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- spectral sensitivity
- joule
- irradiation energy
- laser beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、追記型、書換型光ディスク用基板の製造方法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method of manufacturing a substrate for a write-once type, rewritable type optical disc.
本発明は、プリグループの形成方法において、分光感度
の異なる２種類のフォトレジストなガラス板に２層に塗
布して、照射エネルギー密度の異なるレーザビームで露
光、現像すること釦より、グループ深さの異なるプリグ
ループな有する追記型、書換型光ディスク用基板な高精
度に製造可能にしたものである。In the method for forming pre-groups, the present invention involves applying two types of photoresists with different spectral sensitivities to a glass plate in two layers, exposing and developing them with laser beams with different irradiation energy densities. This makes it possible to manufacture substrates for write-once type and rewritable type optical disks with high precision having different pregroups.
現在、光ディスクには記録する位置な制御するに有効な
方法として、あらかじめ同心円状もしくはうず巻状の溝
が形成されている。この溝をプリグループと称しており
、一般＆Ｃけ５ず巻状のプリグループが多く採用されて
いる。プリグループけ単に連続した溝のみではなくて、
セクターフォーマットに従ってあらかじめ記録ビットが
形成されている。記録ビット部と連続溝部は深さｈｔ−
異なり記録ピット部は深さｄｌがλ／４ｎ、連続溝部は
深さｄｌがλ／８ｎになる様に製作される。Currently, concentric or spiral grooves are formed in advance on optical discs as an effective method for controlling the recording position. This groove is called a pre-group, and the general &C-shaped pre-group is often used. The pre-group keel is not just a continuous groove,
Recording bits are formed in advance according to the sector format. The recording bit part and the continuous groove part have a depth ht-
In contrast, the recording pit portion is manufactured so that the depth dl is λ/4n, and the continuous groove portion is manufactured so that the depth dl is λ/8n.
従来、深さの異なるプリグループの形成方法としては、
ガラス原板１にフォトレジスト７ｋｄ＋＝λ／４＊の属
人で塗布し、レーザビームの照射エネルギー密度な替え
て、完全露光部深さがｄ１＝λ／４ｎ。Conventionally, the method of forming pre-groups with different depths is as follows:
A photoresist of 7kd+=λ/4* is coated on the glass original plate 1, and the depth of the fully exposed area is d1=λ/4n, depending on the laser beam irradiation energy density.
ハーフ露光部深ざｈ’ｓ ｄｌｒ ＝λ／８ｎになる様
に露光条件、現像条件な選択していた。The exposure conditions and development conditions were selected so that the half-exposed area depth h's dlr =λ/8n.
〔発明が解決しようとする問題点及び目的〕しかし、帥
述の従来技術では、長時間安定したハーフ露光条件を維
持することは困難であり、そのためグループ深さが変化
し、光ディスクの情報読入数り時のＯ／Ｎ Ｇ−低下さ
せる原因となっている。[Problems and objects to be solved by the invention] However, with the above-mentioned conventional technology, it is difficult to maintain stable half-exposure conditions for a long time. This causes a decrease in O/NG during counting.
′＋！几グループ形状が変化することにより、トラッキ
ング精度な低下させる原因ともなり、高品質な光ディス
クな得る上で大きな問題となっていた。′+! Changes in the shape of the group cause a decrease in tracking accuracy, which has been a major problem in obtaining high-quality optical discs.
そこで本発明はこのような問題点を解決するもので、そ
の目的とするところは、庚申のグループ形状な有する光
ディスク用基板を量産的に提供するところＶＣもる。SUMMARY OF THE INVENTION The present invention is intended to solve these problems, and its purpose is to provide mass-produced optical disc substrates having the same group shape.
本発明による光ディスク用基板の製造方法は。 A method for manufacturing an optical disc substrate according to the present invention.
レジスト原盤作製工程において、ガラス板ＩＫ第１層目
として低分光感廖のフォトレジスト２な所定厚になる様
に塗布する。その属人は通常λ／８ｎである。必要によ
ってプリベークし次後、第２層目として高分光感度のフ
ォトレジスト３を所定厚になる様ＶＣ塗布する。その厚
みは通常λ／８ｎである。In the resist master production process, a photoresist 2 with low spectral sensitivity is applied as the first layer of the glass plate IK to a predetermined thickness. Its genus is usually λ/8n. After prebaking if necessary, a second layer of high spectral sensitivity photoresist 3 is coated with VC to a predetermined thickness. Its thickness is usually λ/8n.
プリベークした後、記録ビット部を形成する場合はレー
ザビーム強度を高エネルギー密度にし露光する。また連
続溝部な形成する場合はレーザビーム強度を低エネルギ
ー密度に１〜露光する。その後現像、ボストベークを行
ないレジスト原盤を完成する。このレジスト原盤から、
スタンパを作製し射出成形法、スタンピング法、７オト
ボリマーによる紫外線重合法等によりプリグループな樹
脂に転写することによって光ディスク用基板を得る。After prebaking, when forming a recording bit portion, exposure is performed by increasing the laser beam intensity to a high energy density. Further, when forming a continuous groove portion, exposure is performed at a laser beam intensity of 1 to low energy density. After that, development and post-bake are performed to complete the resist master. From this resist master,
An optical disk substrate is obtained by preparing a stamper and transferring it to a pregroup resin by injection molding, stamping, ultraviolet polymerization using 7 otobolimer, or the like.
本発明によれば、深さの異なる記録ビット部、連続溝部
とも、非常に安定し突形状で得られる。According to the present invention, both recording bit portions and continuous groove portions having different depths can be obtained in a very stable and convex shape.
２種類のフォトレジストの分光感度を適正に選択すれば
、レーザビームの強度！化、環境温度、湿度の変化、フ
ォトレジストの変化等の影譬をほとんど受けることなく
庚申の深さを有するプリグループが量産的に得られる。If the spectral sensitivities of the two types of photoresists are appropriately selected, the intensity of the laser beam can be increased! A pre-group having a depth of Koshin can be obtained in mass production without being affected by changes in temperature, environmental temperature, humidity, photoresist, etc.
本発明な具体的に図面ケ用いて説明すると、第１図は本
発明によるレジスト原盤作製工程を示す。To specifically explain the present invention with reference to the drawings, FIG. 1 shows a resist master production process according to the present invention.
平滑に研磨されたガラス板ＩＶｃ低分光感度の７オトレ
ジス）２％−スピンナーで約λ／８ｎの厚みになる様に
塗布する。属人はベーキングによる減少分を補正してお
く。プリベークにより溶剤を揮発させた後、第２層目と
して高分光感度のフォトレジスト３１に一スピンナーで
約λ／８ｎの属人になる様に塗布する。この場合も属人
はベーキングによる減少分な補正しておく。この時に使
用する２種類のフォトレジストの照射エネルギー密度に
よる現像特性を第２図（α）に示す。高分光感度のフォ
トレジスト３け照射エネルギー密度ｈｌ Ｊｓジューｌ
Ｌ／ｃｍ”で光分解し、現像深さ／ｌ”−−宇になる。Coat a glass plate IVc (low spectral sensitivity) polished smooth to a thickness of about λ/8n using a 2% spinner. Individuals should compensate for the decrease due to baking. After the solvent is volatilized by pre-baking, a second layer of photoresist 31 with high spectral sensitivity is coated using a spinner so as to have a thickness of about λ/8n. In this case as well, the person in charge should compensate for the decrease due to baking. The development characteristics of the two types of photoresists used at this time, depending on the irradiation energy density, are shown in FIG. 2 (α). High spectral sensitivity photoresist 3 irradiation energy density hl Js joule
It is photodecomposed at a depth of L/cm", resulting in a development depth of /l".
低分光感度のフォトレジスト２け照射エネルギー密度が
Ｊ！ジュー、３Δ−２で光分解し、現惜深さが飽和する
。そこで第１図のレーザビーム４を用いて露光する時に
、記録ビット部はレーザビームｋ Ｊｌｌジュール２の
強度に、連続溝部はレーザビームＪ１ジューｌＬ／ｃｍ
！の強度に設定する。次に現像しレジスト原盤とする。The irradiation energy density of two photoresists with low spectral sensitivity is J! photodecomposition occurs at 3Δ−2, and the current depth is saturated. Therefore, when exposing using the laser beam 4 in FIG.
! Set the intensity to . Next, it is developed and used as a resist master.
この後スタンパな作製し、射出成形法等により樹脂にプ
リグループを転写し光ディスク用基板とする。従来の方
法によれば第２図（ｂ）Ｋ示すような現像特性を有する
フォトレジスト５な用いＪｓジｚ −ｙ／＞”の照射エ
ネルギー密度で１７４％の深さの記録ビ９Ｆ部を形成し
、Ｊ４ジュー４１の照射エネルギー密度でλ／ａｎの深
さの連続溝部を形成するととｋなり、連続溝部の深さを
均一に安定して得ることは非常に困難である。Thereafter, a stamper is prepared, and the pregroup is transferred to a resin by injection molding or the like to obtain an optical disc substrate. According to the conventional method, a recording layer 9F having a depth of 174% is formed using a photoresist 5 having the development characteristics as shown in FIG. However, if a continuous groove with a depth of λ/an is formed with the irradiation energy density of J4 J41, it is extremely difficult to obtain a uniform and stable continuous groove depth.
以上述べたように本発明によれば、グループ深さの異な
るプリグループを有する追記型、書換型光ディスク用基
板を高精度に安中製造が可能になる。As described above, according to the present invention, it is possible to manufacture substrates for write-once and rewritable optical discs having pre-groups with different group depths with high precision.
第１図（ａ）〜（ｅ）は本発明の光ディスク用基板め製
造方法の主要工程であるレジスト原盤作製工程図で、（
ａ）はガラス板、ノ）はレジスト塗布、（Ｃ）けプリベ
ーク、げ）は露光、（ｇ）Ｆｉ現儂の工程である。
第２図（ａ）は第１図で用いるフォトレジストの現像特
性図。
第２図（ｂ）は従来のレジスト原盤作製工程で用いられ
ているフォトレジストの現像特性図。
１・・・・・・ガラス板
２・・・・・・低分光感度フォトレジスト３・・・・・
・高分光感度フォトレジスト４・・・・・・変調された
レーザビーム５・・・・・・従来のフォトレジスト
以 上FIGS. 1(a) to 1(e) are process diagrams for producing a resist master, which is the main process of the method for producing an optical disc substrate of the present invention.
a) is a glass plate, d) is resist coating, (C) is pre-baking, ge) is exposure, and (g) is the process of applying fi. FIG. 2(a) is a development characteristic diagram of the photoresist used in FIG. 1. FIG. 2(b) is a development characteristic diagram of the photoresist used in the conventional resist master production process. 1...Glass plate 2...Low spectral sensitivity photoresist 3...
・High spectral sensitivity photoresist 4...Modulated laser beam 5...More than conventional photoresist
Claims (1)
ビームで露光し、現像することからなるレジスト原盤作
製工程と、導電化、電鋳、裏面研磨、内外径加工からな
るスタンパ作製工程と、樹脂成形からなる転写工程から
なる光ディスク用基板の製造方法において、レジスト原
盤作製工程がガラス板１層目として低分光感度のフォト
レジスト２を所定厚になる様に塗布し、必要によってプ
リベークし、第２層目として高分光感度のフォトレジス
ト３を所定厚になる様に塗布し、プリベークした後、照
射エネルギ密度の異なる変調されたレーザビーム４を用
いて露光し、現像することによってグループ溝深さの異
なるレジスト原盤を作製することを特徴とする光ディス
ク用基板の製造方法。The resist master production process consists of applying photoresist to a glass plate, exposing it to a modulated laser beam, and developing it; the stamper production process consists of conductivity, electroforming, back polishing, inner and outer diameter processing; and resin molding. In the method for manufacturing an optical disc substrate, which includes a transfer process, the resist master production process includes applying a photoresist 2 with low spectral sensitivity to a predetermined thickness as the first layer on a glass plate, prebaking if necessary, and forming the second layer. A photoresist 3 with high spectral sensitivity is applied as an eye to a predetermined thickness, prebaked, exposed using a modulated laser beam 4 with different irradiation energy density, and developed to form group grooves with different depths. A method for manufacturing an optical disc substrate, which comprises producing a resist master.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22433285A JPS6284450A (en) | 1985-10-08 | 1985-10-08 | Production of substrate for optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22433285A JPS6284450A (en) | 1985-10-08 | 1985-10-08 | Production of substrate for optical disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6284450A true JPS6284450A (en) | 1987-04-17 |
Family
ID=16812095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22433285A Pending JPS6284450A (en) | 1985-10-08 | 1985-10-08 | Production of substrate for optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6284450A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0596439A2 (en) * | 1992-11-05 | 1994-05-11 | Matsushita Electric Industrial Co., Ltd. | Method of making a master disc usable for the production of optical discs |
| JPH08227538A (en) * | 1994-10-21 | 1996-09-03 | Nec Corp | Exposing master disk for optical disk and its production |
| US6219330B1 (en) | 1997-09-30 | 2001-04-17 | Samsung Electronics Co., Ltd. | Master disk for optical disk and having first and second photoresist layers |
-
1985
- 1985-10-08 JP JP22433285A patent/JPS6284450A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0596439A2 (en) * | 1992-11-05 | 1994-05-11 | Matsushita Electric Industrial Co., Ltd. | Method of making a master disc usable for the production of optical discs |
| EP0596439A3 (en) * | 1992-11-05 | 1995-02-08 | Matsushita Electric Ind Co Ltd | Method of making a master disc usable for the production of optical discs. |
| JPH08227538A (en) * | 1994-10-21 | 1996-09-03 | Nec Corp | Exposing master disk for optical disk and its production |
| US6219330B1 (en) | 1997-09-30 | 2001-04-17 | Samsung Electronics Co., Ltd. | Master disk for optical disk and having first and second photoresist layers |
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