JPS6277463A - Vacuum roll coater for heat resistant resin film - Google Patents

Vacuum roll coater for heat resistant resin film

Info

Publication number
JPS6277463A
JPS6277463A JP21476385A JP21476385A JPS6277463A JP S6277463 A JPS6277463 A JP S6277463A JP 21476385 A JP21476385 A JP 21476385A JP 21476385 A JP21476385 A JP 21476385A JP S6277463 A JPS6277463 A JP S6277463A
Authority
JP
Japan
Prior art keywords
film
resin film
synthetic resin
thin film
roll coater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21476385A
Other languages
Japanese (ja)
Inventor
Akifumi Katsumura
明文 勝村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP21476385A priority Critical patent/JPS6277463A/en
Publication of JPS6277463A publication Critical patent/JPS6277463A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To bring a synthetic resin film to be laminated with a thin film into uniform and tight contact with the surface of a rotary drum by using a film having a specific thermal deformation temp. and coefft. of linear expansion to said film and preliminarily heating up the film prior to the transfer of the film to the rotary drum. CONSTITUTION:The synthetic resin film 5 is transferred from an un-winding device 6 via guide rolls 7, 8 to the rotary drum 9 and is passed over a thin film generating device 13 so that the thin film is laminated on the surface thereof. The film is passed via guide rolls 10, 11 and is taken up on a take-up device 12. A film (such as polyether sulfone) having heat resistance of >=100 deg.C thermal deformation temp. and >=4X10<-5> deg.C<-1> coefft. of linear expansion is used for the film 5 in this stage. The drum 9 is heated to >=100 deg.C and the film 5 is heated by the heater contained in the guide roll 8 to the temp. higher by about 20-30 deg.C from the temp. of the rotary drum. The film 5 is thus made into uniform and tight contact with the drum 9 and the thin film is formed on the film 5.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、合成樹脂フィルムを案内ローラ一群を介して
回転ドラム上に移送し、該回転ドラム上テ搬送しながら
薄膜を形成させる真空ロールコータ−に関し、詳しくは
、熱変形温度が100’C以上の合成樹脂フィルムを、
100’C以上に加熱された回転ドラムに移送する際に
、あらかじめ該合成樹脂フィルムを100’C以上に昇
温する為の加熱装置を設け、これによって回転ドラムの
表面にフィルムを均一に密着させることが可能となる真
空ロールコータ−に関するものである。
Detailed Description of the Invention [Industrial Application Field] The present invention relates to a vacuum roll coater that transfers a synthetic resin film onto a rotating drum via a group of guide rollers and forms a thin film while conveying it on the rotating drum. Regarding -, in detail, synthetic resin films with a heat deformation temperature of 100'C or higher,
When transferring the synthetic resin film to a rotating drum heated to 100'C or higher, a heating device is installed in advance to raise the temperature of the synthetic resin film to 100'C or higher, thereby uniformly adhering the film to the surface of the rotating drum. The present invention relates to a vacuum roll coater that makes it possible to

〔従来技術〕[Prior art]

従来、合成樹脂フィルム表面に、金属や無機化合物など
の薄膜を形成する技術が盛んに研究開発され、工業的に
も装飾用フィルム、包装材料、キャパシタ用フィルム等
に用いられている。
BACKGROUND ART Conventionally, techniques for forming thin films of metals, inorganic compounds, etc. on the surface of synthetic resin films have been actively researched and developed, and are used industrially for decorative films, packaging materials, capacitor films, and the like.

薄膜の形成方法としては、真空蒸着法が最も一般的であ
るが、最近では、スノぐツタリング、イオンブレーティ
ング、プラズマCVD 、プラズマ重合なども使われて
いる。本発明において述べる真空ロールコータ−とは、
これらの約1 m bor以下の真空中で薄膜を形成す
る為の装置であシ、特に巻物状の合成樹脂フィルムを差
出し、搬送しながら、その表面に薄膜を連続的に積層す
る装置である。
Vacuum deposition is the most common method for forming thin films, but recently, methods such as snogging, ion blasting, plasma CVD, and plasma polymerization have also been used. The vacuum roll coater described in the present invention is
This is an apparatus for forming a thin film in a vacuum of about 1 m bor or less, and in particular, it is an apparatus in which a scroll-shaped synthetic resin film is held out and the thin film is continuously laminated on its surface while being conveyed.

これらの薄膜形成方法は、薄膜を堆積する基板に多量の
熱を与える為に、合成樹脂フィルムを基板とする場合は
、熱で溶融したシ変形したりしない様に、フィルムを支
持し搬送する回転ドラムによって、冷却されることが多
かった。
These thin film forming methods apply a large amount of heat to the substrate on which the thin film is deposited, so when a synthetic resin film is used as the substrate, the film is supported and transported by rotation to prevent it from being melted and deformed by the heat. It was often cooled by a drum.

一方、熱変形等の耐熱性からの制約をあt、6受けない
ガラスやセラミツ゛クスを基板として薄膜を形成する技
術においては、基板を加熱した方が良好な性能の薄膜が
得られる場合が多い。
On the other hand, in techniques for forming thin films using glass or ceramic substrates that are not subject to heat resistance constraints such as thermal deformation, it is often possible to obtain thin films with better performance by heating the substrate.

特に、真空中での薄膜形成において悪影響を及ぼすこと
の多い基板中の水分が関与していると考えられるが、基
板温度を100℃以上好ましくは150℃以上に保持す
ると良好な薄膜が形成されることが多い。
In particular, it is thought that moisture in the substrate, which often has an adverse effect on thin film formation in vacuum, is involved, but good thin films are formed when the substrate temperature is maintained at 100°C or higher, preferably 150°C or higher. There are many things.

これらの知見から、合成樹脂フィルムを基板とする場合
も加熱条件下で薄膜を形成させる技術がいくつか報告さ
れているが、それらは双葉フィルムでの実験であり、ロ
ールコータ−での報告は知られていない。
Based on these findings, some techniques have been reported for forming thin films under heating conditions even when using synthetic resin film as a substrate, but these experiments were conducted using Futaba film, and reports using a roll coater are unknown. It has not been done.

〔発明の目的〕[Purpose of the invention]

本発明者は、実際に、熱変形温度が100℃以上の合成
樹脂フィルムを、100℃以上に加熱した回転ドラムで
搬送しながら真空中で薄膜を形成したところ、回転ドラ
ム上で合成樹脂フィルムが変形し、薄膜の特性が不均一
になったり、真空ロールコータ−の後壁に接触して傷が
付いたシ、フィルムの走行に異常が生じたシする問題が
あることを知った。このフィルムの変形は、加熱力フィ
ルムの熱変形温度よシ低い領域で起きる。
The present inventor actually formed a thin film in vacuum while transporting a synthetic resin film with a heat distortion temperature of 100°C or higher using a rotating drum heated to 100°C or higher. I learned that there are problems such as deformation and non-uniform properties of the thin film, scratches due to contact with the back wall of the vacuum roll coater, and abnormalities in the running of the film. This film deformation occurs in a region lower than the thermal deformation temperature of the heating force film.

そこで本発明者は、この変形の生じる原因を追求し、対
策を鋭意検討した結果、本発明に到達した。
Therefore, the inventor of the present invention pursued the cause of this deformation, and as a result of intensive study of countermeasures, arrived at the present invention.

〔発明の構成〕[Structure of the invention]

すなわち、変形の生じる原因は、合成樹脂フィルムの熱
膨張によシ、回転ドラムに接触した時のフィルム巾が、
加熱されることによって広がり、一方フィルムは真空中
の為、帯電によって横すべりしにくくなっている為、広
がった巾の差に応じた距離だけ回転ドラム表面から不規
則な位置で浮き上がることに因るものであることが分っ
た。この発見に基づいて、加熱された回転ドラムに接触
゛する以前に、合成樹脂フィルムを加熱する装置を設け
、あらかじめ、合成樹脂フィルムを加熱し膨張させたと
ころ、変形は全く生じなくなった。次に、本発明の真空
ロールコータ−を図面を参照にしながら説明する。
In other words, the cause of the deformation is due to thermal expansion of the synthetic resin film, and the width of the film when it comes into contact with the rotating drum is
This is due to the fact that the film spreads due to heating, and since the film is in a vacuum, it is less likely to slide sideways due to electrical charge, so it rises at irregular positions from the surface of the rotating drum by a distance corresponding to the difference in the spread width. It turned out to be. Based on this discovery, a device was installed to heat the synthetic resin film before it came into contact with a heated rotating drum, and when the synthetic resin film was heated and expanded, no deformation occurred at all. Next, the vacuum roll coater of the present invention will be explained with reference to the drawings.

第1図は真空ロールコータ−の概略を説明する断面図の
例である。
FIG. 1 is an example of a sectional view illustrating the outline of a vacuum roll coater.

図面において、真空容器(1)は、分割壁(2)によっ
て上方の搬送室(3)と下方の薄膜形成室(4)に分割
されている。合成樹脂フィルム(5)は、巻出装置(6
)から案内ロール(7)、(81を経て、回転ドラム(
9)に移送され、さらに案内ロールa1、Oυを経て、
巻取装置αのに巻き取られる。合成樹脂フィルム(5)
は、回転ドラム(9)によりて搬送される際に、薄膜源
発生装置Iを通過し、その表面上に薄膜が積層される。
In the drawing, a vacuum container (1) is divided by a dividing wall (2) into an upper transfer chamber (3) and a lower thin film forming chamber (4). The synthetic resin film (5) is fed to the unwinding device (6
) to the rotating drum (
9), and further passes through guide rolls a1 and Oυ,
It is wound up by the winding device α. Synthetic resin film (5)
When being transported by the rotating drum (9), it passes through the thin film source generator I, and a thin film is laminated on its surface.

641、(isはそれぞれ排気口であシ、図示されてい
ない真空排気装置に接続されている。ここで合成樹脂フ
ィルム(5)は、熱変形温度が100℃以上の耐熱性を
有する合成樹脂フィルムであり、例えば、ポリエーテル
サルホン、ポリサルホン、ポリエーテルイミド、ボリア
リレート、ポリカーボネート等の樹脂を押出成膜したフ
ィルムであり、これら1d4X10  ℃ 以上と、比
較的大きな線膨張係数を有している。薄膜源発生装置(
13は、例えば真空蒸着法におけるるつぼと加熱装置で
あり、スノξツタリング法におけるターゲットとプラズ
マ発生装置であシ、プラズマCVD装置における原料ガ
ス供給装置とプラズマ発生装置である。
641, (is is an exhaust port, respectively, and is connected to a vacuum evacuation device (not shown).Here, the synthetic resin film (5) is a synthetic resin film having heat resistance with a heat distortion temperature of 100°C or higher. For example, it is a film formed by extrusion of a resin such as polyether sulfone, polysulfone, polyetherimide, polyarylate, polycarbonate, etc., and has a relatively large coefficient of linear expansion of 1d4×10° C. or more. Thin film source generator (
Reference numeral 13 denotes, for example, a crucible and a heating device in a vacuum evaporation method, a target and a plasma generator in a snow-driving method, and a raw material gas supply device and a plasma generator in a plasma CVD apparatus.

形成される薄膜の種類としては、薄膜形成時に、基板温
度が高い程良好な特性の得られるものであシ、例えば、
酸化インジウム、酸化スズ、酸化ケイ素等の金属酸化物
及びその複合組成物や、アモルファス、シリコン、ゲル
マニウム咎の牛導体ヤ、窒化アルミニウム、シリコンカ
ーバイド等の酸素以外の金属化合物等が特に選ばれるが
、限定されるものではない。
Regarding the type of thin film to be formed, the higher the substrate temperature during thin film formation, the better the characteristics can be obtained.For example,
Metal oxides such as indium oxide, tin oxide, and silicon oxide and composite compositions thereof, metal compounds other than oxygen such as amorphous, silicon, and germanium conductors, aluminum nitride, and silicon carbide are particularly selected. It is not limited.

本発明においては、案内ロール(8)は、ヒーターを内
蔵しており、合成樹脂フィルノ、(5)を100℃以上
に加熱できるようになっている。
In the present invention, the guide roll (8) has a built-in heater and is capable of heating the synthetic resin filler (5) to 100° C. or higher.

回転ドラム(9)は、100℃以上に加熱されており、
案内ロール(8)を加熱して、合成樹脂フィルム(5)
の温度を該フィルムが回転ドラム(9)に接触する以前
にあらかじめ高めておくことによシ、該フィルムは、均
一に回転ドラム(9)K密着し、良好な特性の薄膜を積
層することが可能となる。案内ロール(8)の温度は、
回転ドラム表面上を搬送される合成樹脂フィルムを観察
することによシ、昇温してゆく過程で、変形が消えるこ
とを確認することで容易に決定できる。多くの場合、案
内ロール(8)の温度は、回転ドラム(9)の温度より
20〜30℃高く設定すると良結果が得られた。
The rotating drum (9) is heated to 100°C or more,
Heating the guide roll (8), the synthetic resin film (5)
By raising the temperature of the film before it comes into contact with the rotating drum (9), the film can evenly adhere to the rotating drum (9) and form a thin film with good properties. It becomes possible. The temperature of the guide roll (8) is
This can be easily determined by observing the synthetic resin film being conveyed on the surface of the rotating drum and confirming that the deformation disappears as the temperature increases. In many cases, good results were obtained when the temperature of the guide roll (8) was set 20 to 30° C. higher than the temperature of the rotating drum (9).

なお、第1図に示される加熱方法では、原理的に合成樹
脂フィルム(5)が加熱された案内ロール(8)に接触
することで、案内ロール(8)表面上では変形を生じる
が、この変形は熱膨張によるものであるから案内ロール
(8)を通過し空間を移送する際には消失している。
In addition, in the heating method shown in FIG. 1, deformation occurs on the surface of the guide roll (8) when the synthetic resin film (5) comes into contact with the heated guide roll (8) in principle. Since the deformation is due to thermal expansion, it disappears when it passes through the guide rolls (8) and is transferred through the space.

一時的な変形も問題となる場合には、第2図に示される
様な赤外ヒーターを用いる方法もある。
If temporary deformation is also a problem, there is a method using an infrared heater as shown in FIG.

第2図の(8)は加熱装置のない案内ロールで、合成樹
脂フィルム(5)は、赤外ヒーターQυによって加熱さ
れ、回転ドラム(9)に移送される。第3図は別の赤外
ヒーターによる方法であり、合成樹脂フィルム(5)は
加熱装置のない案内ロール翰と、加熱装置はないが断熱
性の良い材料で構成された案内ロール(至)の間で、赤
外ヒーター0υによって加熱され、温度を維持したま壕
回転ドラム(9)に移送される。
(8) in FIG. 2 is a guide roll without a heating device, and the synthetic resin film (5) is heated by an infrared heater Qυ and transferred to the rotating drum (9). Figure 3 shows a method using another infrared heater, in which the synthetic resin film (5) consists of a guide roll (5) without a heating device and a guide roll (2) that does not have a heating device but is made of a material with good heat insulation properties. In between, it is heated by an infrared heater 0υ and transferred to a rotary drum (9) in which the temperature is maintained.

〔発明の効果〕〔Effect of the invention〕

本発明の装置によれば、合成樹脂フィルムに真空ロール
コータ−によって薄膜を積層する方法において、合成樹
脂フィルムを加熱することが可能となシ、良好な特性を
有する薄膜を形成することができる。
According to the apparatus of the present invention, in the method of laminating a thin film onto a synthetic resin film using a vacuum roll coater, the synthetic resin film can be heated and a thin film having good properties can be formed.

〔実施例〕〔Example〕

実施例 ぼりエーテルサルホン樹脂から製膜された厚さ100μ
の合成樹脂フィルムに第1図に示される真空ロールコー
タ−によって薄膜源発生装置収3として、DCマグネト
ロンスノξツタ用カソード上にインジウムスズ合金から
成るターゲットを配置したものを用い、アルゴンと酸素
の混合ガスプラズマによって、酸化インジウム・酸化ス
ズ複合酸化物(1,T、0.)の薄膜を積層した。案内
ロール(8)の温度は180℃、回転ドラム(9)の温
度は150℃で、合成樹脂フィルムは回転ドラム(9)
の表面に均一に密着しており、得られた薄膜積層フィル
ムは、均一な外観で変形もなく、また、真空ロールコー
タ−の運転においても全く異常は認められなかった。
Example: Film made from ether sulfone resin with a thickness of 100μ
The synthetic resin film is coated with argon and oxygen using a vacuum roll coater as shown in Figure 1, using a thin film source generator (3) in which a target made of indium tin alloy is placed on the cathode for a DC magnetron. Thin films of indium oxide/tin oxide composite oxide (1, T, 0.) were deposited using mixed gas plasma. The temperature of the guide roll (8) is 180°C, the temperature of the rotating drum (9) is 150°C, and the synthetic resin film is on the rotating drum (9).
The obtained thin film laminate film had a uniform appearance and no deformation, and no abnormality was observed during operation of the vacuum roll coater.

得られた1、 T、 O,薄膜の特性は膜厚250人で
光線透過率86%、表面抵抗値300Ω/口と良好であ
った。
The properties of the obtained 1, T, O, thin film were good, with a film thickness of 250 people, a light transmittance of 86%, and a surface resistance value of 300 Ω/mouth.

比較例−1 実施例と同じ方法で、案内ロール(8)についてだけ、
加熱を行なわずに、薄膜を積層したところ、合成樹脂フ
ィルムは、回転ドラム表面上ではげしノ、he厭I  
づaPJ++占嗜店詔団η、鱈−a1斗丁梧−も淡淡の
斑が発生しておシ、また、分割壁(Z−)と接触して生
じたスリキズが全面に分布しており、1.T、O。
Comparative Example-1 Using the same method as in the example, only the guide roll (8) was
When the thin films were laminated without heating, the synthetic resin film was exposed to the surface of the rotating drum.
zuaPJ++ fortune telling store imperial group η, cod - a1 tochogo - also has pale spots, and scratches caused by contact with the dividing wall (Z-) are distributed all over the surface. 1. T.O.

薄膜が分断されている為に、表面抵抗値は測定不可能で
あった。
Since the thin film was divided, the surface resistance value could not be measured.

比較例−2 実施例と同じ方法で、案内ロール(8)と回転ドラム(
9)において、加熱を行なわずに薄膜を積層したところ
合成樹脂フィルムは回転ドラム(9)の表面に均一に密
着しており、得られた薄膜積層フィルムは、均一な外観
で変形もなく、真空ロールコータ−の運転においても全
く異常は認められなかった0しかし、得られた1、 T
、 O,薄膜の特性は膜厚250人で光線透過率76%
、表面抵抗値1500Ω/口と、不満足なものであった
Comparative Example-2 The guide roll (8) and rotating drum (
In 9), when the thin films were laminated without heating, the synthetic resin film adhered uniformly to the surface of the rotating drum (9), and the obtained thin film laminated film had a uniform appearance and no deformation, and it No abnormalities were observed during the operation of the roll coater.
, O, The characteristics of the thin film are 76% light transmittance at a film thickness of 250 people.
The surface resistance value was 1500Ω/mouth, which was unsatisfactory.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明装置の一実施例の断面図である。第2
図、第3図は、本発明装置の別な実施例における合成樹
脂フィルム加熱機構に関わる部分的断面図である。
FIG. 1 is a sectional view of one embodiment of the device of the present invention. Second
3 are partial cross-sectional views relating to a synthetic resin film heating mechanism in another embodiment of the apparatus of the present invention.

Claims (1)

【特許請求の範囲】 1、合成樹脂フィルムを加熱された回転ドラムによって
搬送しながら該フィルム表面上に、連続的に薄膜を積層
する為の真空ロールコーターにおいて、該回転ドラムに
移送される前に該合成樹脂フィルムをあらかじめ昇温す
る為の加熱装置を設けたことを特徴とする耐熱性樹脂フ
ィルム用真空ロールコーター。 2、特許請求の範囲第1項記載の合成樹脂フィルムが、
100℃以上の熱変形温度を有し、かつ4×10^−^
5℃^−^1以上の線膨張係数を有する合成樹脂フィル
ムであり、回転ドラムが100℃以上に加熱可能な機能
を有する耐熱性樹脂フィルム用真空ロールコーター。
[Claims] 1. In a vacuum roll coater for continuously laminating a thin film on the surface of a synthetic resin film while being conveyed by a heated rotating drum, before the synthetic resin film is transferred to the rotating drum. A vacuum roll coater for heat-resistant resin film, characterized in that it is equipped with a heating device for raising the temperature of the synthetic resin film in advance. 2. The synthetic resin film according to claim 1,
Has a heat deformation temperature of 100℃ or higher, and 4×10^-^
A vacuum roll coater for a heat-resistant resin film, which is a synthetic resin film having a linear expansion coefficient of 5°C^-^1 or more, and has a rotating drum that can be heated to 100°C or more.
JP21476385A 1985-09-30 1985-09-30 Vacuum roll coater for heat resistant resin film Pending JPS6277463A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21476385A JPS6277463A (en) 1985-09-30 1985-09-30 Vacuum roll coater for heat resistant resin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21476385A JPS6277463A (en) 1985-09-30 1985-09-30 Vacuum roll coater for heat resistant resin film

Publications (1)

Publication Number Publication Date
JPS6277463A true JPS6277463A (en) 1987-04-09

Family

ID=16661132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21476385A Pending JPS6277463A (en) 1985-09-30 1985-09-30 Vacuum roll coater for heat resistant resin film

Country Status (1)

Country Link
JP (1) JPS6277463A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013517382A (en) * 2010-01-22 2013-05-16 ユーロプラズマ Method for coating adaptive nano-coating by low-pressure plasma process

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60187674A (en) * 1984-03-07 1985-09-25 Matsushita Electric Ind Co Ltd Manufacture of thin metallic film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60187674A (en) * 1984-03-07 1985-09-25 Matsushita Electric Ind Co Ltd Manufacture of thin metallic film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013517382A (en) * 2010-01-22 2013-05-16 ユーロプラズマ Method for coating adaptive nano-coating by low-pressure plasma process

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