JPS6250414B2 - - Google Patents
Info
- Publication number
- JPS6250414B2 JPS6250414B2 JP16697680A JP16697680A JPS6250414B2 JP S6250414 B2 JPS6250414 B2 JP S6250414B2 JP 16697680 A JP16697680 A JP 16697680A JP 16697680 A JP16697680 A JP 16697680A JP S6250414 B2 JPS6250414 B2 JP S6250414B2
- Authority
- JP
- Japan
- Prior art keywords
- mold
- quartz glass
- graphite
- transparent quartz
- molding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 32
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 32
- 229910002804 graphite Inorganic materials 0.000 claims description 32
- 239000010439 graphite Substances 0.000 claims description 32
- 238000000465 moulding Methods 0.000 claims description 19
- 239000004744 fabric Substances 0.000 claims description 9
- 239000000835 fiber Substances 0.000 claims description 9
- 239000011261 inert gas Substances 0.000 claims description 8
- 239000012298 atmosphere Substances 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 239000011810 insulating material Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 9
- 230000001590 oxidative effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B40/00—Preventing adhesion between glass and glass or between glass and the means used to shape it, hold it or support it
- C03B40/005—Fabrics, felts or loose covers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/0013—Re-forming shaped glass by pressing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B40/00—Preventing adhesion between glass and glass or between glass and the means used to shape it, hold it or support it
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/02—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating
- C03B5/033—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating by using resistance heaters above or in the glass bath, i.e. by indirect resistance heating
- C03B5/0334—Pot furnaces; Core furnaces
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/02—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating
- C03B5/033—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating by using resistance heaters above or in the glass bath, i.e. by indirect resistance heating
- C03B5/0336—Shaft furnaces
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Melting And Manufacturing (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Description
【発明の詳細な説明】
本発明は透明石英ガラスの成型を、クラツクの
発生や気泡の混入を伴うことなく、高生産性のも
とで可能ならしめる透明石英ガラスの成型装置に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a transparent quartz glass molding apparatus that allows transparent quartz glass to be molded with high productivity without the occurrence of cracks or the inclusion of air bubbles.
合成石英ガラスの粗塊は主として直径の一様で
ない円柱状の型で製造されるが、これを一定直径
のインゴツトに成型すると、円板を切り出すとき
などに歩留りは大幅に向上する。また、このよう
なインゴツトの型状を要求される型状に成型する
方法は、さらに角型、多角型、異形品などにも応
用できる。 Rough ingots of synthetic quartz glass are mainly manufactured in cylindrical molds with non-uniform diameters, but if this is molded into ingots with a constant diameter, the yield will be greatly improved when cutting out disks. Furthermore, this method of molding an ingot into a required shape can be further applied to square, polygonal, irregularly shaped products, and the like.
従来の透明石英ガラスの成型装置は透明石英ガ
ラス粗塊を収容する黒鉛製の外型と上、下の押型
よりなる箱型の組型と該組型を囲む黒鉛製ヒータ
を備えた抵抗加熱装置およびその外側の断熱材、
水冷手段を備えた炉壁とから構成されている。 Conventional transparent quartz glass molding equipment consists of a box-shaped mold consisting of a graphite outer mold that accommodates a transparent quartz glass lump, an upper and a lower pressing mold, and a resistance heating device equipped with a graphite heater that surrounds the mold. and its outer insulation;
It consists of a furnace wall equipped with water cooling means.
上記箱型内に収容された透明石英ガラス粗塊の
成型加工しやすい温度は、通常1700〜2000℃の範
囲である。それは、透明石英ガラスは1000℃以上
の高温では粘性が指数函数的に低下し、上記温度
範囲では108〜106ポアズの加工成型に適した粘性
を保つことができるからである。特に1850℃を超
えると、１Kg／cm2以下の圧力で容易に成型が可能
であり、この点からは1850〜1900℃が最も好まし
い温度条件となる。しかし従来は加工温度は1830
℃どまりとされている。それは次のような原因に
よる石英ガラスおよび成型装置の汚損が避けられ
なかつたからである。すなわち
(1) 1850℃以上では石英の蒸気圧が高くなり、
SiO2の気化が激しく黒鉛ヒータ，断熱材，炉
内壁などを汚し、また真空ラインの導通弁など
に固着して弁を傷つけ、真空度を低下させかつ
真空ポンプのオイル中にSiO2の微粉末が混入
して正常運転を阻害する原因となる。 The temperature at which the transparent quartz glass coarse lump housed in the box shape can be easily molded is usually in the range of 1700 to 2000°C. This is because the viscosity of transparent quartz glass decreases exponentially at high temperatures of 1000° C. or higher, and can maintain a viscosity of 10 8 to 10 6 poise suitable for processing and molding in the above temperature range. In particular, when the temperature exceeds 1850°C, molding can be easily performed at a pressure of 1 Kg/cm 2 or less, and from this point of view, the most preferable temperature condition is 1850 to 1900°C. However, conventionally the processing temperature was 1830
It is said to remain at ℃. This is because contamination of the quartz glass and molding equipment was unavoidable due to the following causes. In other words, (1) the vapor pressure of quartz increases at temperatures above 1850°C;
SiO 2 vaporizes violently and contaminates the graphite heater, insulation material, furnace inner wall, etc., and also sticks to the vacuum line conduction valve, damaging the valve, lowering the degree of vacuum, and causing fine powder of SiO 2 in the vacuum pump oil. may become mixed in and interfere with normal operation.
(2) 1850℃以上では透明石英ガラス、特にその表
面が解離し、その構成成分であるSiO2は次の
ように熱解離して
SiO2→SiO＋１／２O2
SiOとO2とを生成する。生成したO2は、高温状
態にある黒鉛を酸化し、生成したCO2は気化
し、あるいは軟化している透明石英ガラス中に
侵入して気泡を形成する。(2) At temperatures above 1850°C, transparent quartz glass, especially its surface, dissociates, and its constituent SiO 2 dissociates thermally as follows to generate SiO 2 →SiO+1/2O 2 SiO and O 2 . The generated O 2 oxidizes graphite in a high temperature state, and the generated CO 2 vaporizes or enters the softened transparent quartz glass to form bubbles.
(3) 1850℃以上では、この蒸発したSiO2が組型
の黒鉛と次のように反応して、
SiO2＋Ｃ→SiC＋O2
生成したSiCが製品の表面に付着する。(3) At temperatures above 1850°C, this evaporated SiO 2 reacts with the graphite in the mold as follows, resulting in the formation of SiO 2 +C→SiC+O 2 and the resulting SiC adheres to the surface of the product.
(4) さらに、次の反応も起こり易く、生成したSi
は
SiO2＋2C→Si＋2CO
透明石英ガラス表面に融着し、加圧成型したの
ち常温となつたときに、膨張係数の差により製
品にクラツクが入り、また透明性を低下させ、
汚染の原因となり、歩留が極端に低下する。(4) Furthermore, the following reaction is likely to occur, and the generated Si
SiO 2 +2C→Si+2CO is fused to the surface of transparent quartz glass, and when it comes to room temperature after pressure molding, the product cracks due to the difference in expansion coefficient and also reduces transparency.
This causes contamination and extremely reduces yield.
このような温度と透明石英ガラスの化学的特性
との関係を考慮して、従来透明石英ガラスの成型
温度は1850℃以下とされていた。成型温度が1850
℃以下であれば、石英ガラス粗塊からSiO2が蒸
発したり、組型の黒鉛の酸化消耗やSiC，Siの生
成もあまり問題でないが、その反面1850℃以下で
は石英ガラスの粘性が高く、粗塊を上下の押型で
成型するのに1.0Kg／cm2以上の圧力を必要とし、
そのため黒鉛材質の組型の締付け用ボルトの破損
をまぬがれることはできず、従つて連続成型がで
きず生産性の点で問題があつた。 In consideration of the relationship between temperature and the chemical properties of transparent quartz glass, the molding temperature for transparent quartz glass has conventionally been set at 1850° C. or lower. Molding temperature is 1850
If the temperature is below 1850℃, evaporation of SiO 2 from the silica glass lumps, oxidative consumption of graphite in the mold, and formation of SiC and Si are not much of a problem; Pressure of 1.0Kg/cm2 or more is required to mold the rough lump with the upper and lower molds,
As a result, the bolts used to tighten the graphite molds could not be avoided, and continuous molding was therefore not possible, resulting in problems in terms of productivity.
本発明は上記の従来技術の問題点を解決し、透
明石英ガラスの成型を、クラツクの発生や気泡の
混入を伴うことなく、高生産性のもとで可能なら
しめる透明石英ガラスの成型装置を提供するもの
で、その要旨とするところは、透明石英ガラス粗
塊を収容するそれぞれ黒鉛製の外型および上、下
部押型よりなる組型と該組型を囲む電極を備えた
黒鉛製ヒータと該黒鉛製ヒータを取り巻く断熱材
と水冷ジヤケツトとよりなる透明石英ガラスの成
型装置において、該組型の外型および上、下部押
型のそれぞれの内面に黒鉛質繊維布を内張りし、
かつ該組型を不活性ガス雰囲気で包むことを特徴
とする透明石英ガラスの成型装置、にある。 The present invention solves the above-mentioned problems of the prior art, and provides a transparent quartz glass molding device that enables molding of transparent quartz glass with high productivity without the generation of cracks or the inclusion of air bubbles. The gist of this product is to provide a graphite heater equipped with a mold consisting of an outer mold made of graphite and upper and lower molds, each containing a transparent silica glass lump, and an electrode surrounding the mold. In a transparent quartz glass molding device comprising a heat insulating material surrounding a graphite heater and a water cooling jacket, the outer mold and the inner surfaces of each of the upper and lower molds are lined with graphite fiber cloth,
A transparent quartz glass molding apparatus is characterized in that the mold is surrounded by an inert gas atmosphere.
次に、本発明を図面によつて説明する。図面は
本発明の一実施例の断面図で上部押型による片押
しの場合を示す。 Next, the present invention will be explained with reference to the drawings. The drawing is a sectional view of one embodiment of the present invention, and shows the case of one-sided pressing using an upper mold.
本実施例は、透明石英ガラス粗塊を収容する黒
鉛製の外型６および上、下部押型７，８よりなる
組型と該組型を囲む電極５を備えた黒鉛製ヒータ
４と黒鉛製ヒータ４を取巻く断熱材２と水冷ジヤ
ケツト１とよりなり、該組型の外型６および上、
下部押型７，８のそれぞれの内面には黒鉛質繊維
布１１を内張りし、不活性ガス入口９から不活性
ガス、例えば窒素ガスを導入し、組型全体を不活
性ガス雰囲気で包むという構成をとるものであ
る。なお、図において、３はのぞき窓、１０は組
型レベル固定台である。 In this embodiment, a graphite heater 4 and a graphite heater are provided, each of which includes an outer mold 6 made of graphite that accommodates a transparent silica glass lump, and a mold consisting of upper and lower molds 7 and 8, and an electrode 5 that surrounds the mold. 4, the outer mold 6 and the upper part of the assembled mold,
The inner surfaces of each of the lower molds 7 and 8 are lined with graphite fiber cloth 11, and an inert gas such as nitrogen gas is introduced from an inert gas inlet 9 to surround the entire mold in an inert gas atmosphere. It is something to take. In the figure, 3 is a peephole, and 10 is a mold level fixing stand.
この構成によつて、内張りされた黒鉛質繊維布
１１は透明石英ガラス粗鬼が直接組型の黒鉛材と
反応するのを防止する緩衝帯としての作用をする
とともに上、下部押型７，８の潤滑剤としても作
用し、さらに熱膨張率の差によつて生ずる黒鉛組
型の破損を防止することを可能とし、かつ不活性
ガス雰囲気は黒鉛組型の酸化消耗の防止を可能な
らしめるものである。 With this configuration, the lined graphite fiber cloth 11 acts as a buffer zone to prevent the transparent quartz glass from directly reacting with the graphite material of the mold, and also acts as a buffer zone for the upper and lower molds 7 and 8. It also acts as a lubricant, making it possible to prevent damage to the graphite assembly mold caused by differences in thermal expansion coefficients, and the inert gas atmosphere makes it possible to prevent oxidative wear and tear of the graphite assembly mold. be.
本発明装置の使用によつて、透明石英ガラスの
粘性を低下させるため、成型温度を従来例より高
く1850〜1900℃にしても内張りの黒鉛質繊維布が
蒸発ガスであるSiO2，SiOの逃道となり、製品中
にそれらを気泡として混入させることなく、また
Siが熔着して製品にクラツクを発生させることな
く、歩留を向上させることができる。透明石英ガ
ラスの粘性が低下した関係上、成型圧力を下げる
ことができ、それによつて組型の締付け用ボルト
の破損を防止し、連続成型を可能とする。このよ
うに、歩留の向上と連続成型とによつて、生産性
を大幅に向上させることができる。 By using the device of the present invention, the viscosity of transparent quartz glass is reduced, so even if the molding temperature is increased to 1850 to 1900°C, which is higher than that of conventional examples, the graphite fiber cloth lining will not release evaporated gases such as SiO 2 and SiO. without introducing them into the product as air bubbles.
Yield can be improved without causing cracks in the product due to Si melting. Since the viscosity of transparent quartz glass has been reduced, the molding pressure can be lowered, thereby preventing damage to the bolts used to tighten the molds and making continuous molding possible. In this way, by improving the yield and performing continuous molding, productivity can be greatly improved.
次に、本発明を実施例によつてさらに具体的に
説明するが、本発明はその要旨を超えない限り以
下の実施例によつて限定されるものではない。 Next, the present invention will be explained in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist thereof.
実施例
図面に示す装置の黒鉛製ヒータをオプテイカ
ル・パイロメーターで測温し、1850±５℃にて30
分間保持し、その間黒鉛質繊維布（日本カーボン
社製WGP―Ｌ，WGP―Ｈ）を内張りした組型内
に透明石英ガラス粗塊を収め、N2雰囲気内で0.4
Kg／cm2で加圧成型したところ、黒鉛質繊維布が緩
衝帯となり、透明石英ガラスと組型内面の黒鉛と
が直接反応することなく、組型内面の酸化損耗も
起こらず、また成型された透明石英ガラスはクラ
ツクの原因となるSiの融着もなく所期の成型が行
なわれ、かつ組型の締付け用ボルトの破損も発生
しなかつた。Example The temperature of the graphite heater of the device shown in the drawing was measured using an optical pyrometer, and the temperature was measured at 1850±5℃ for 30
The transparent quartz glass lump was placed in a mold lined with graphite fiber cloth (WGP-L, WGP-H manufactured by Nippon Carbon Co., Ltd.) and heated to 0.4 min in an N2 atmosphere.
When pressure molded at Kg/ cm2 , the graphite fiber cloth acts as a buffer zone, and the transparent quartz glass and the graphite on the inner surface of the mold do not react directly, and the inner surface of the mold does not suffer from oxidative wear and tear. The transparent quartz glass was molded as expected without any Si fusion that would cause cracks, and the bolts used to tighten the mold did not break.
比較例
実施例と同一の装置によつて黒鉛質繊維布を内
張りせず、また不活性ガスを箱型内に導入せずに
実験を行なつた。黒鉛製ヒータをオプテイカル・
パイロメーターで測温し、1830±５℃にて30分間
保持、その間組型内に直接透明石英ガラス粗塊を
収め、0.7Kg／cm2で加圧成型したところ、透明石
英ガラス粗塊と組型枠内面の黒鉛との前記反応が
進行し、組型内面は酸化損耗し、かつ成型された
透明石英ガラスはSiが熔着した表面個所からクラ
ツクが入り、目的とした成型体は得られなかつ
た。Comparative Example An experiment was conducted using the same apparatus as in the example without lining with graphite fiber cloth and without introducing inert gas into the box. Optical graphite heater
The temperature was measured with a pyrometer and held at 1830±5°C for 30 minutes. During that time, the transparent quartz glass coarse lump was placed directly in the assembly mold and pressure molded at 0.7 kg/cm 2. As the reaction with the graphite on the inner surface of the mold progresses, the inner surface of the mold is oxidized and worn, and the molded transparent quartz glass develops cracks from the surface areas where Si is fused, making it impossible to obtain the desired molded product. Ta.
図面は本発明の一実施例の断面図である。
図において、１……水冷ジヤケツト、２……断
熱材、３……のぞき窓、４……黒鉛製ヒータ、５
……電極、６……組型の外型、７……上部押型、
８……下部押型、９……不活性ガス入口、１０…
…組型レベル固定台、１１……黒鉛質繊維布。
The drawing is a sectional view of one embodiment of the present invention. In the figure, 1... Water cooling jacket, 2... Insulating material, 3... Peephole, 4... Graphite heater, 5
...electrode, 6...outer mold of assembled mold, 7...upper press mold,
8...Lower press mold, 9...Inert gas inlet, 10...
...Assembled level fixing stand, 11...Graphite fiber cloth.
Claims (1)
製の外型および上、下部押型よりなる組型と該組
型を囲む電極を備えた黒鉛製ヒータと該黒鉛製ヒ
ータを取り巻く断熱材および水冷ジヤケツトとよ
りなる透明石英ガラスの加熱成型装置において、
該組型の外型および上、下部押型のそれぞれの内
面に黒鉛質繊維布を内張りし、かつ該組型を不活
性ガス雰囲気で包むことを特徴とする透明石英ガ
ラスの成型装置。1. A set of molds each consisting of an outer mold and upper and lower molds made of graphite to accommodate a transparent quartz glass lump, a graphite heater equipped with electrodes surrounding the set, and a heat insulating material and water cooling jacket surrounding the graphite heater. In the transparent quartz glass heating forming equipment,
A transparent quartz glass molding apparatus characterized in that the outer mold and the inner surface of each of the upper and lower molds are lined with graphite fiber cloth, and the mold is surrounded by an inert gas atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16697680A JPS5792528A (en) | 1980-11-27 | 1980-11-27 | Molding device for transparent quartz glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16697680A JPS5792528A (en) | 1980-11-27 | 1980-11-27 | Molding device for transparent quartz glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5792528A JPS5792528A (en) | 1982-06-09 |
| JPS6250414B2 true JPS6250414B2 (en) | 1987-10-24 |
Family
ID=15841092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16697680A Granted JPS5792528A (en) | 1980-11-27 | 1980-11-27 | Molding device for transparent quartz glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5792528A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0690027B1 (en) * | 1994-06-30 | 1998-05-13 | Heraeus Quarzglas GmbH | Method for manufacturing quartz glass components and molding frame therefor |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58128932U (en) * | 1982-02-22 | 1983-09-01 | 日本板硝子株式会社 | Glass plate press bending equipment |
| JPS5935037A (en) * | 1982-08-20 | 1984-02-25 | Shin Etsu Chem Co Ltd | Method for molding quartz glass |
| JPS6114148A (en) * | 1984-06-29 | 1986-01-22 | Toshiba Ceramics Co Ltd | Molding method of quartz glass |
| JPS6183638A (en) * | 1984-09-27 | 1986-04-28 | Asahi Glass Co Ltd | Quartz glass forming |
| JPH08338Y2 (en) * | 1988-11-28 | 1996-01-10 | 信越石英株式会社 | Quartz glass molding equipment |
| JP2000219523A (en) * | 1999-01-28 | 2000-08-08 | Nikon Corp | Forming method of quartz glass, forming device and quartz glass produced by the method |
| KR100450593B1 (en) * | 2003-08-01 | 2004-09-30 | 주식회사 새빛 | A press mold for silica glass |
| GB0800895D0 (en) * | 2008-01-18 | 2008-02-27 | Saint Gobain Quartz Plc | Heat treatment furnaces |
| JP5292994B2 (en) * | 2008-08-21 | 2013-09-18 | 株式会社ニコン | Method and apparatus for forming quartz glass |
| CN107900291A (en) * | 2017-12-12 | 2018-04-13 | 重庆乐迪机车车辆配件有限公司 | A kind of combination die for brake disc casting |
-
1980
- 1980-11-27 JP JP16697680A patent/JPS5792528A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0690027B1 (en) * | 1994-06-30 | 1998-05-13 | Heraeus Quarzglas GmbH | Method for manufacturing quartz glass components and molding frame therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5792528A (en) | 1982-06-09 |
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