JPS6239138A - Xy stage - Google Patents
Xy stageInfo
- Publication number
- JPS6239138A JPS6239138A JP17903485A JP17903485A JPS6239138A JP S6239138 A JPS6239138 A JP S6239138A JP 17903485 A JP17903485 A JP 17903485A JP 17903485 A JP17903485 A JP 17903485A JP S6239138 A JPS6239138 A JP S6239138A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- magnetic
- guides
- opposite sides
- movable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
- B23Q1/28—Means for securing sliding members in any desired position
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Machine Tool Units (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
この発明は精密工作機、精密測定機、半導体製造装置等
に適用し、超精密な位置決めを行うXYステージに関す
る。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to an XY stage that is applied to precision machine tools, precision measuring machines, semiconductor manufacturing equipment, etc. and performs ultra-precise positioning.
〈発明の概要〉
この発明は、XY可動ガイドの交叉部に空気軸受を介し
てステージを支持した静圧浮上XYステージにおいて、
XY可動ガイドの側面には磁性体、ステージには該磁性
体に対向して磁界を発生する励磁コイルを配備してなり
、可動ガイド静止時において、ステージの空気浮上によ
る微動を阻止したものである。<Summary of the Invention> The present invention provides a hydrostatic floating XY stage in which the stage is supported via an air bearing at the intersection of an XY movable guide.
The side of the XY movable guide is equipped with a magnetic material, and the stage is equipped with an excitation coil that generates a magnetic field in opposition to the magnetic material, thereby preventing slight movement due to air levitation of the stage when the movable guide is stationary. .
〈発明の背景〉
従来この種xyステージは、第5図に示す如く、定盤6
上に配備したXY可可動ガイマフ8の交叉部に空気軸受
91を介してステージ9を支持し、両可動ガイド7.8
をリニアモータ等の往復駆動装置にて移行させ、交叉部
のステージ9を目標位置に移行するようになっている。<Background of the Invention> Conventionally, this type of xy stage has a surface plate 6 as shown in FIG.
The stage 9 is supported via an air bearing 91 at the intersection of the XY movable guy muff 8 arranged above, and both movable guides 7.8
is moved by a reciprocating drive device such as a linear motor, and the stage 9 at the intersection is moved to the target position.
ところが、前記X可動ガイド7とX空気軸受91、Y可
動ガイド8とY空気軸受91は、それぞれ軸受隙間にミ
クロン単位の空気膜を介在しており、ステージ9はXY
可可動ガイマフ8に非接触状態にて支持、案内される。However, the X moving guide 7 and the
It is supported and guided by the movable guy muff 8 in a non-contact manner.
斯る従来装置において、ステージ9の位置決めに際しX
Y可可動ガイマフ8を静止したとき、XY空気軸受91
においで対向する空気膜の平衡位置が±0.01μm揺
れを生じる。つまり微動する。ところが、ステージは、
外部の拘束力がな(且つ摩擦要素のない非接触状態のた
め、第7図の測定データに示す如く、同様に10.01
8m微動を生じ、従って、0,01μm以下の高精度な
位置決めを行うとき、空気膜による揺れが外乱として働
き、問題となる。In such a conventional device, when positioning the stage 9,
When the Y movable guy muff 8 is stationary, the XY air bearing 91
The equilibrium position of the air films facing each other due to smell oscillates by ±0.01 μm. In other words, it trembles slightly. However, the stage
As there is no external restraining force (and there is no friction element in the non-contact state, the measurement data in Fig. 7 shows that 10.01
A micro-movement of 8 m occurs, and therefore, when performing highly accurate positioning of 0.01 μm or less, the vibration caused by the air film acts as a disturbance, which poses a problem.
〈発明の目的〉
この発明は、XY可動ガイドとステージとの間に拘束力
を与えることにより、上記の問題を完全に解消し、超精
密な位置決めを実現し得る新規なXYステージを提供す
ることを目的とする。<Purpose of the Invention> The present invention provides a new XY stage that completely eliminates the above problems and realizes ultra-precise positioning by applying a binding force between the XY movable guide and the stage. With the goal.
〈発明の構成および効果〉
上記の目的を達成するため、この発明では、XY可動ガ
イドの交叉部に空気軸受を介してステージを支持したX
Yステージにおいて、XY可動ガイドには両側面に磁性
体、ステージには該磁性体に対向して磁界を発生する励
磁コイルを配備して成る。上記の構成によると、この発
明では、ステージの位置決めに際しXY可動ガイドを静
止し、各コイルに電流を流して磁界を発生させることに
より、各コイルと対応する可動ガイド両側面の磁性体と
が互いに反発し、所定位置にて反発力がつり合う。この
つり合った反発力は可動ガイドに対しステージを一定位
置に留める拘束力として作用し、これにより空気軸受の
空気膜による微動が拘束され、ステージはガイドに対し
定位置を保ち、超精密な位置決めを実現する効果を奏す
る。<Structure and Effects of the Invention> In order to achieve the above object, the present invention provides an
In the Y stage, the XY movable guide is provided with a magnetic material on both sides, and the stage is provided with an excitation coil that generates a magnetic field in opposition to the magnetic material. According to the above configuration, in this invention, when positioning the stage, the XY movable guide is kept stationary, and a current is passed through each coil to generate a magnetic field, so that each coil and the magnetic bodies on both sides of the corresponding movable guide are mutually connected to each other. It rebounds, and the repulsive forces balance out at a predetermined position. This balanced repulsive force acts as a restraining force on the movable guide to keep the stage in a fixed position. This restrains the slight movement caused by the air film of the air bearing, and the stage remains in a fixed position with respect to the guide, allowing ultra-precise positioning. It has the effect of realizing.
〈実施例の説明〉
図面は本発明に係る静圧浮上型xyステージを示す。該
XYステージは、公知の如く、定盤1上に配備したXY
可動ガイド2,3の交叉部に空気軸受41を介してステ
ージ4を支持し、X′Y可動ガイド2,3をリニアモー
タ等の往復駆動装置21.31にて移行させ、交叉部の
ステージ4を目標位置に移行するようになっている。本
発明は上記XY可動ガイド2.3とステージ4との間に
、空気浮上のステージ4を完全制止させる磁気拘束手段
5a、5bを設けてなり、該拘束手段5a、5bは、X
Y可動ガイド2.3には両側面に磁性体51a、51b
、ステージ4には、その磁性体51a、51bにそれぞ
れ対向し且つ磁界を発生する励磁コイル52a、52b
を配備したものである。前記磁性体sta、51bは、
XY可動ガイド2,3の両側面に対し、軸方向に沿って
永久磁石板、或いは磁気テープの貼付け、または励磁し
た磁性体のコーティング等により構成される。<Description of Embodiments> The drawings show a hydrostatic levitation type xy stage according to the present invention. As is well known, the XY stage is an XY stage arranged on a surface plate 1.
A stage 4 is supported at the intersection of the movable guides 2 and 3 via an air bearing 41, and the X'Y movable guides 2 and 3 are moved by a reciprocating drive device 21, 31 such as a linear motor, and the stage 4 at the intersection is moved. is designed to move to the target position. The present invention is provided with magnetic restraining means 5a, 5b between the XY movable guide 2.3 and the stage 4 to completely restrain the stage 4 in air levitation, and the restraining means 5a, 5b are
The Y movable guide 2.3 has magnetic bodies 51a and 51b on both sides.
, the stage 4 includes excitation coils 52a and 52b that respectively face the magnetic bodies 51a and 51b and generate a magnetic field.
It is equipped with The magnetic body sta, 51b is
It is constructed by pasting permanent magnet plates or magnetic tapes along the axial direction on both sides of the XY movable guides 2 and 3, or coating them with an excited magnetic material.
然して、ステージ4の位置決めに際し、XY可動ガイド
2,3を制止し、各コイル52a。Therefore, when positioning the stage 4, the XY movable guides 2 and 3 are stopped and each coil 52a is moved.
52bに電流を流して磁界を発生させるとき、各コイル
52a、52bと対応する可動ガイド2.3の両側面の
磁性体51aと51a、51bと51bとが互いに磁気
反発、或いは磁気吸引し、各々ガイド2,3両側におい
て反発力或いは吸引力がつり合う。このつり合った反発
力或いは吸引力は、XY可動ガイド2,3に対しステー
ジ4を一定位置に留める拘束力として作用し空気浮上の
ステージ4をガイド2.3に完全静止し、従来の空気膜
による“ゆらぎ”の問題を解消する。When a current is passed through 52b to generate a magnetic field, the magnetic bodies 51a and 51a, 51b and 51b on both sides of the movable guide 2.3 corresponding to each coil 52a and 52b magnetically repel or attract each other, respectively. Repulsion or attraction forces are balanced on both sides of the guides 2 and 3. This balanced repulsion or attraction force acts as a restraining force on the XY movable guides 2 and 3 to keep the stage 4 in a fixed position, and the air-levitating stage 4 is brought to a complete standstill on the guide 2.3. This solves the problem of “fluctuation” due to
従って、本発明では、従来限界とされた0、01μm以
下の超精度な位置決めを実現できる効果を有すものであ
る。Therefore, the present invention has the effect of realizing ultra-accurate positioning of 0.01 μm or less, which was the conventional limit.
第1図は本発明にがかるXYステージの斜視図、第2図
は要部の斜面図、第3図は第2図の平面図、第4図は第
3図IV−TV線矢印図、第5図は従来のXYステージ
の斜面図、第6図は第5図の一部拡大図、第7図はガイ
ド静止時におけるステージのゆらぎを測定した波形図で
ある。
2.3・・・・xy可動ガイド
4・・・・ステージ
41・・・・空気軸受
5・・・・磁気拘束手段
51a、51b・・・・磁性体
52a、 52b・・・・励磁コイル
そとト ノ 1ffi y畦、o−かる×
Yステージ″゛、?i+ネtバろ甘2)込 1pつ枡面
因
!4
2.3−−−xY町1+ ry・iド
〃−−−ステーゾ
bl−−−dZjft伽受Fig. 1 is a perspective view of the XY stage according to the present invention, Fig. 2 is an oblique view of the main parts, Fig. 3 is a plan view of Fig. 2, Fig. 4 is a diagram of the IV-TV line arrow in Fig. 3, FIG. 5 is a slope view of a conventional XY stage, FIG. 6 is a partially enlarged view of FIG. 5, and FIG. 7 is a waveform diagram of measured stage fluctuations when the guide is stationary. 2.3...xy movable guide 4...stage 41...air bearing 5...magnetic restraint means 51a, 51b...magnetic bodies 52a, 52b...excitation coil etc. and tono 1ffi y ridge, o-karu×
Y stage ``゛,?i+Network sweet 2) included 1p masumen cause!4 2.3---xY town 1+ ry・i do〃---Stezo bl---dZjft kyake
Claims (2)
ージを支持した静圧浮上XYステージにおいて、XY可
動ガイドとステージとの間に、空気浮上のステージを完
全制止させる磁気拘束手段を設けて成るを特徴とするX
Yステージ。(1) In a statically floating XY stage in which the stage is supported via an air bearing at the intersection of the XY movable guide, magnetic restraint means is provided between the XY movable guide and the stage to completely restrain the air floating stage. X characterized by consisting of
Y stage.
性体、ステージには該磁性体に対向して磁界を発生する
励磁コイルが配備されている特許請求の範囲第1項記載
のXYステージ。(2) The magnetic restraint means is the XY movable guide according to claim 1, wherein the XY movable guide is provided with a magnetic body on both sides, and the stage is provided with an excitation coil that generates a magnetic field in opposition to the magnetic body. stage.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17903485A JPS6239138A (en) | 1985-08-13 | 1985-08-13 | Xy stage |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17903485A JPS6239138A (en) | 1985-08-13 | 1985-08-13 | Xy stage |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6239138A true JPS6239138A (en) | 1987-02-20 |
Family
ID=16058957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17903485A Pending JPS6239138A (en) | 1985-08-13 | 1985-08-13 | Xy stage |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6239138A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH081487U (en) * | 1991-11-07 | 1996-10-18 | 株式会社昭伸精工 | Flexible holding plate |
JP2003133254A (en) * | 2001-08-10 | 2003-05-09 | Semiconductor Energy Lab Co Ltd | Laser annealing device and manufacturing method of thin film transistor using the same |
US7863541B2 (en) | 2001-08-10 | 2011-01-04 | Semiconductor Energy Laboratory Co., Ltd. | Laser annealing apparatus and semiconductor device manufacturing method |
CN107486728A (en) * | 2017-08-24 | 2017-12-19 | 广东工业大学 | A kind of workbench |
-
1985
- 1985-08-13 JP JP17903485A patent/JPS6239138A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH081487U (en) * | 1991-11-07 | 1996-10-18 | 株式会社昭伸精工 | Flexible holding plate |
JP2003133254A (en) * | 2001-08-10 | 2003-05-09 | Semiconductor Energy Lab Co Ltd | Laser annealing device and manufacturing method of thin film transistor using the same |
US7863541B2 (en) | 2001-08-10 | 2011-01-04 | Semiconductor Energy Laboratory Co., Ltd. | Laser annealing apparatus and semiconductor device manufacturing method |
CN107486728A (en) * | 2017-08-24 | 2017-12-19 | 广东工业大学 | A kind of workbench |
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