JPS6237385A - Pickling tank in continuous pickling line - Google Patents
Pickling tank in continuous pickling lineInfo
- Publication number
- JPS6237385A JPS6237385A JP17524385A JP17524385A JPS6237385A JP S6237385 A JPS6237385 A JP S6237385A JP 17524385 A JP17524385 A JP 17524385A JP 17524385 A JP17524385 A JP 17524385A JP S6237385 A JPS6237385 A JP S6237385A
- Authority
- JP
- Japan
- Prior art keywords
- strip
- rolls
- tank
- pickling
- dip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、コールドストリップ用素月のホットコイル（
以下、単にストリップという。）表面に形成されたスケ
ールを除去する連続酸洗ラインにおける酸洗槽に関する
ものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to Sogetsu's hot coil for cold stripping (
Hereinafter, it will simply be referred to as a strip. ) This relates to a pickling tank in a continuous pickling line for removing scale formed on the surface.
従来の酸洗槽では、才５図に示す如く、ピンチロール９
によりストリップ４の出側速度を一定にしながら図示し
２ないテンションプライドルロールによりストリップ４
０入側速度を調整して、槽内のカテナリを一定に保って
おり、ストリップの酸液浸漬時間及び処理速度は一定と
なっていた。In the conventional pickling tank, as shown in Fig. 5, the pinch roll 9
While keeping the exit speed of the strip 4 constant, the strip 4 is
The zero entry speed was adjusted to keep the catenary in the tank constant, and the immersion time of the strip in the acid solution and the processing speed remained constant.
しかし、溶解し易いスケールをもつストリップには酸液
浸漬時間が長すぎることとなり、脱スケール後地金まで
溶解して表面品質が損われるばかりでなく、酸液消費量
が増加し、生産性が悪いという不都合があった。However, the acid solution immersion time is too long for strips with easily soluble scale, which not only dissolves the bare metal after descaling and impairs the surface quality, but also increases acid solution consumption and reduces productivity. There was an inconvenience that it was bad.
本発明の連続酸洗ラインにおける酸洗槽は、酸洗槽タン
クの入側及び出側圧デフレクタロールと、該デフレクタ
ロール間にてストリップを酸液に浸漬支持するディップ
ロールとを設け、該ディップロールの少くとも一方を昇
降可能に設けたことを特徴としており、ディップロール
の昇降操作によりストリップの酸液浸漬長さを調節する
ことによってスケールの性状に応じた酸液浸漬時間（脱
スケール時間）を任意に選択できるようにしたものであ
る。The pickling tank in the continuous pickling line of the present invention is provided with pressure deflector rolls on the inlet and outlet sides of the pickling tank tank, and a dip roll that immerses and supports the strip in an acid solution between the deflector rolls, and the dip roll The feature is that at least one of the strips is movable up and down, and by adjusting the length of the strip immersed in the acid solution by raising and lowering the dip roll, the immersion time in the acid solution (descaling time) can be adjusted according to the properties of the scale. It can be selected arbitrarily.
以下本発明の一実施例を第１図〜才４図により説明する
。An embodiment of the present invention will be described below with reference to FIGS. 1 to 4.
図中１は酸洗槽のタンクで、複数基（実施例では４基）
列設されている。In the figure, 1 is a pickling tank, and there are multiple tanks (4 in the example).
They are arranged in rows.
２はデフレクタロールで、各タンク１の入側及び出側に
配設されている。タンク１間では１本のロールが共用さ
れている。Reference numeral 2 denotes deflector rolls, which are arranged on the inlet and outlet sides of each tank 1. One roll is shared between tanks 1.
３はディップロールで、ストリップ４を各タンク１内の
酸液５に浸漬させるために該タンク１の入側及び出側に
配設されている。Reference numeral 3 denotes dip rolls, which are disposed on the inlet and outlet sides of each tank 1 in order to immerse the strip 4 in the acid solution 5 in each tank 1.
６は昇降装置（実施例ではシリンダ）で、固定フレーム
７に設けられている。Reference numeral 6 denotes a lifting device (a cylinder in the embodiment), which is provided on the fixed frame 7.
酸洗槽出側端のタンク１に設けたディップロール３は、
その軸端に装着した軸受８を介して前記昇降装置６によ
り昇降可能に支持されている０
９はストリップ通板用のピンチロールで、酸洗槽出側端
のタンク１の出側に配設され、デフレクタロールを兼ね
ている。The dip roll 3 installed in the tank 1 at the outlet end of the pickling tank is
Reference numeral 09, which is supported so as to be able to rise and fall by the lifting device 6 via a bearing 8 attached to its shaft end, is a pinch roll for threading the strip, and is disposed on the outlet side of the tank 1 at the outlet end of the pickling tank. It also serves as a deflector roll.
なお、ディップロール３の昇降機構は、酸洗槽出側端の
タンク１の入側及び出側に設けたが、酸洗槽出側端のタ
ンク１に限らず任意のタンク１に設けてもよいし、ある
いは全てのタンク１に設けてもよい。また、タンク１の
入側及び出側の一方に設けてもよい。Note that the lifting mechanism for the dip roll 3 is provided on the inlet and outlet sides of the tank 1 at the outlet end of the pickling tank, but it can be provided in any tank 1, not just the tank 1 at the outlet end of the pickling tank. Alternatively, it may be provided in all tanks 1. Further, it may be provided on either the inlet side or the outlet side of the tank 1.
第６図に示す如く昇降装置６によりディップロール３を
下降限位置（第２図示位置Ａ）まで下げた状態において
は、酸洗槽を通板中のストリップ４は、全てのタンク１
で入側及び出側ディップロール３により酸液５に浸漬支
持され、各タンク１での酸液浸漬長さが第２図示１−ｈ
となっている。このときの脱スケール時間が最長である
。As shown in FIG. 6, when the dip roll 3 is lowered to the lowering limit position (second illustrated position A) by the lifting device 6, the strip 4 passing through the pickling tank is
The length of immersion in the acid solution 5 in each tank 1 is 1-h as shown in the second figure.
It becomes. The descaling time at this time is the longest.
矛２図に示す如く昇降装置６により一方のディップミー
ル３を同図示位置Ａから位置Ｂ１さらに上昇端位置Ｃま
で上昇させたとき、そのタンク１におけるストリップ４
の酸液浸漬長さは、最長のｔムからｔＢＸｔＣと短かく
なる。As shown in Figure 2, when one dip meal 3 is raised by the lifting device 6 from position A to position B1 and then to the rising end position C, the strip 4 in the tank 1
The length of immersion in the acid solution becomes short from the longest tm to tBXtC.
また、牙４図に示す如く両方のディップロール３を上昇
端位置まで上昇させたとき、そのタンク１におけるスト
リップ４の酸液浸漬長さは零となり、該タンク１を使用
しないことも可能である。Further, when both dip rolls 3 are raised to the rising end position as shown in Fig. 4, the length of the strip 4 immersed in the acid solution in the tank 1 becomes zero, and it is also possible to not use the tank 1. .
従って、ディップロール３の昇降機構を設けた各タンク
におけるストリップ４の酸液浸漬長さを０〜ｔムの範囲
で調節することによって、ストリップ４の酸液浸漬時間
（脱スケール時間）を、溶解し易いスケールをもつスト
リップでは短かく、溶解しにくいスケールをもつストリ
ップでは長くと、スケールの性状に応じて選択できる。Therefore, by adjusting the immersion length of the strip 4 in the acid solution in the range of 0 to t in each tank provided with a lifting mechanism for the dip roll 3, the immersion time (descaling time) of the strip 4 in the acid solution can be adjusted. The length can be selected depending on the nature of the scale, such as a shorter length for strips with scale that easily dissolves, and a longer length for strips with scale that is difficult to dissolve.
以上の通り本発明は、ストリップをデフレクタロール間
にてディップロールにより酸液に浸漬支持すると共忙、
少くとも一方のディップロールの昇降によりストリップ
の酸液浸漬長さを任意に調節できるため、スケールの性
状に応じた脱スケール時間を選択可能となるから、表面
品質の優れた酸洗ストリップを得ることができると共に
、酸液とストリップ地金との反応を防いで酸液消費量を
最小限に抑えた経済的な運転条件を得ることができる。As described above, in the present invention, when a strip is immersed and supported in an acid solution between deflector rolls by a dip roll,
Since the length of the strip immersed in the acid solution can be adjusted arbitrarily by raising and lowering at least one of the dip rolls, it is possible to select the descaling time according to the properties of the scale, thereby obtaining a pickled strip with excellent surface quality. At the same time, it is possible to obtain economical operating conditions in which the reaction between the acid solution and the strip metal is prevented and the amount of acid solution consumed is minimized.
牙１図は本発明の一実施例を示す全体概要図、第２図は
矛１図の賛部拡大図、牙３図９才４図は本発明の詳細な
説明するための才２図の旧〜線断面図、全体概９図、第
５図は従来例を示す全体概ｐ図である。
１・・・・・・タンク、２・・・・・・デフレクタロー
ル、３・・・・・・ディップロール、４・・・・・・ス
トリップ、５・・・酸液、６・・・・・・昇降装置、７
・・・・・・固定フレーム、８・・・・・・軸受、９・
・・・・・ピンチロール。
３１頁の続き
多発 明 者 佐 々 木 強 鹿島市鹿島町
大字光３鉄所内Figure 1 is an overall schematic diagram showing one embodiment of the present invention, Figure 2 is an enlarged view of the support part of Figure 1, Figure 3 is an enlarged view of Figure 9, and Figure 4 is a diagram of Figure 2 for detailed explanation of the present invention. The old sectional view, the overall schematic diagram 9, and FIG. 5 are the overall schematic diagram p showing the conventional example. 1... Tank, 2... Deflector roll, 3... Dip roll, 4... Strip, 5... Acid liquid, 6...・・Lifting device, 7
...Fixed frame, 8...Bearing, 9.
...Pinch roll. Many continuations from page 31 Akira Tsuyoshi Sasaki Oaza Hikari 3 Railway Station, Kashima-cho, Kashima City
Claims (1)
デフレクタロール間にてストリップを酸液に浸漬支持す
るディップロールとを設け、該ディップロールの一方を
昇降可能に設けたことを特徴とする連続酸洗ラインにお
ける酸洗槽。A pickling tank is characterized by being provided with deflector rolls on the entry and exit sides of the tank, and a dip roll for immersing and supporting the strip in the acid solution between the deflector rolls, and one of the dip rolls is provided so as to be able to rise and fall. A pickling tank in a continuous pickling line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17524385A JPS6237385A (en) | 1985-08-09 | 1985-08-09 | Pickling tank in continuous pickling line |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17524385A JPS6237385A (en) | 1985-08-09 | 1985-08-09 | Pickling tank in continuous pickling line |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6237385A true JPS6237385A (en) | 1987-02-18 |
Family
ID=15992761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17524385A Pending JPS6237385A (en) | 1985-08-09 | 1985-08-09 | Pickling tank in continuous pickling line |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6237385A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6503669B2 (en) | 2000-02-16 | 2003-01-07 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and method of manufacture |
| US6589699B2 (en) | 2000-04-25 | 2003-07-08 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
| KR101105896B1 (en) | 2004-12-27 | 2012-01-17 | 주식회사 포스코 | Pickling apparatus with device for protecting strip |
| KR101118282B1 (en) | 2003-09-22 | 2012-03-21 | 주식회사 포스코 | Device for controling level of strip in salt tank of pickling line |
-
1985
- 1985-08-09 JP JP17524385A patent/JPS6237385A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6503669B2 (en) | 2000-02-16 | 2003-01-07 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and method of manufacture |
| US6589699B2 (en) | 2000-04-25 | 2003-07-08 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
| KR101118282B1 (en) | 2003-09-22 | 2012-03-21 | 주식회사 포스코 | Device for controling level of strip in salt tank of pickling line |
| KR101105896B1 (en) | 2004-12-27 | 2012-01-17 | 주식회사 포스코 | Pickling apparatus with device for protecting strip |
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