JPS6236530U - - Google Patents
Info
- Publication number
- JPS6236530U JPS6236530U JP12647285U JP12647285U JPS6236530U JP S6236530 U JPS6236530 U JP S6236530U JP 12647285 U JP12647285 U JP 12647285U JP 12647285 U JP12647285 U JP 12647285U JP S6236530 U JPS6236530 U JP S6236530U
- Authority
- JP
- Japan
- Prior art keywords
- oven
- inert gas
- semiconductor wafers
- furnace
- vacuum pump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011261 inert gas Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims 3
- 235000012431 wafers Nutrition 0.000 claims 3
- 238000010586 diagram Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
Landscapes
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
Description
第１図はこの考案の一実施例を示す一部を破断
した正面図、第２図はこの考案の一実施例におけ
る排気および不活性ガス導入の動作説明線図、第
３図は従来のオーブンの一部を破断した正面図で
ある。
図において、１０はオーブン本体、１４は炉、
１６，１８はパイプである。なお、各図中、同一
符号は同一又は相当部分を示す。
Fig. 1 is a partially cutaway front view showing an embodiment of this invention, Fig. 2 is a diagram explaining the operation of exhaust gas and inert gas introduction in an embodiment of this invention, and Fig. 3 is a conventional oven. FIG. 2 is a partially cutaway front view. In the figure, 10 is an oven main body, 14 is a furnace,
16 and 18 are pipes. In each figure, the same reference numerals indicate the same or equivalent parts.
Claims (1)
て、上記オーブンの炉に不活性ガスの導入口と上
記炉内の空気を排気する排出口とを設け、かつ上
記導入口に接続して不活性ガス導入手段を設ける
と共に上記排出口にはパイプを介して真空ポンプ
を設けたことを特徴とする半導体ウエハ用のオー
ブン。 (2) 上記真空ポンプの起動と停止および不活性
ガスの導入をタイマー制御より行うことを特徴と
する実用新案登録請求の範囲第１項記載の半導体
ウエハ用のオーブン。[Claims for Utility Model Registration] (1) In an oven for baking semiconductor wafers, the furnace of the oven is provided with an inert gas inlet and an outlet for exhausting the air in the furnace, and the inlet 1. An oven for semiconductor wafers, characterized in that an inert gas introduction means is connected to the oven, and a vacuum pump is connected to the discharge port via a pipe. (2) The oven for semiconductor wafers according to claim 1, wherein the vacuum pump is started and stopped and the inert gas is introduced by timer control.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12647285U JPS6236530U (en) | 1985-08-21 | 1985-08-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12647285U JPS6236530U (en) | 1985-08-21 | 1985-08-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6236530U true JPS6236530U (en) | 1987-03-04 |
Family
ID=31020302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12647285U Pending JPS6236530U (en) | 1985-08-21 | 1985-08-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6236530U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006253517A (en) * | 2005-03-14 | 2006-09-21 | Dainippon Screen Mfg Co Ltd | Reduced-pressure dryer |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS594031A (en) * | 1982-06-30 | 1984-01-10 | Toshiba Corp | Manufacturing device of semiconductor |
-
1985
- 1985-08-21 JP JP12647285U patent/JPS6236530U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS594031A (en) * | 1982-06-30 | 1984-01-10 | Toshiba Corp | Manufacturing device of semiconductor |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006253517A (en) * | 2005-03-14 | 2006-09-21 | Dainippon Screen Mfg Co Ltd | Reduced-pressure dryer |