JPS62290858A - Heat treating furnace - Google Patents
Heat treating furnaceInfo
- Publication number
- JPS62290858A JPS62290858A JP13533086A JP13533086A JPS62290858A JP S62290858 A JPS62290858 A JP S62290858A JP 13533086 A JP13533086 A JP 13533086A JP 13533086 A JP13533086 A JP 13533086A JP S62290858 A JPS62290858 A JP S62290858A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- heat treatment
- heat
- opening
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims abstract description 19
- 238000012423 maintenance Methods 0.000 abstract description 4
- 238000005255 carburizing Methods 0.000 description 14
- 230000006698 induction Effects 0.000 description 8
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 7
- 238000001816 cooling Methods 0.000 description 5
- 238000010791 quenching Methods 0.000 description 5
- 230000000171 quenching effect Effects 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 230000003028 elevating effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 206010011224 Cough Diseases 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
Description
【発明の詳細な説明】
３、発明の詳細な説明
（産業上の利用分野）
本発明は、例えば浸炭処理及び焼入処理を順次行なうた
めの装置に関するものである。Detailed Description of the Invention 3. Detailed Description of the Invention (Field of Industrial Application) The present invention relates to an apparatus for sequentially performing, for example, carburizing treatment and quenching treatment.
（従来の技術）
従来、第２図に示す如く、加熱チャンバ２１内でガス浸
炭処理を行なった後、冷却セクション２２でのファン２
３による冷却によって被処理物Ｗの結晶粒を微細化し、
しかる後被処理物Ｗを加熱チャンバ２１内に戻して再び
加熱してからタンク２４内に下降させて油焼入処理を行
なっていた。(Prior Art) Conventionally, as shown in FIG. 2, after gas carburizing treatment is performed in a heating chamber 21, a fan 2
Refine the crystal grains of the workpiece W by cooling according to step 3,
Thereafter, the object W to be treated is returned to the heating chamber 21, heated again, and then lowered into the tank 24 to undergo oil quenching treatment.
（発明が解決しようとする問題点）
しかし、密閉された１個の炉２５内の加熱チャンバ２１
及び冷却セクション２２間で台車２６、チェーン２７等
により被処理物Ｗを２度も往復させて加熱と冷却を繰り
返すため、搬送用の台車２６．チェーン２７等も被処理
物Ｗとともに加熱又は冷却され、変形等の悪影響を受け
ると共に、炉内構成が複雑であるため、メンテナンが容
易にできず、作業能率が悪いという不都合を免れなかっ
た。(Problem to be Solved by the Invention) However, the heating chamber 21 in one sealed furnace 25
and the cooling section 22, the workpiece W is reciprocated twice using the trolley 26, chain 27, etc. to repeat heating and cooling. The chain 27 and the like are also heated or cooled together with the workpiece W, and are adversely affected by deformation and the like, and because the furnace interior is complicated, maintenance cannot be easily performed, resulting in poor work efficiency.
（発明の目的）
本発明は、前記従来の問題点を解決するためになしたも
ので、搬送系と熱処理系を分離することで搬送系に対す
る熱影響をなくすと共に、炉内構成をシンプルにしてメ
ンテナンスを容易に能率良くできるようにすることを目
的とする。(Objective of the Invention) The present invention was made to solve the above-mentioned conventional problems, and by separating the conveyance system and the heat treatment system, it eliminates the thermal influence on the conveyance system, and also simplifies the furnace configuration. The purpose is to make maintenance easier and more efficient.
（問題点を解決するための手段）
本発明の熱処理炉は、１個の１．す送室及び該厖送室内
に臨ませて開閉可能な開口部を有する複数個の熱処理室
を設け、前記搬送室に、被処理物の搬入出口と、被処理
物を各熱処理室内に開口部を経て搬送可能な搬送装置と
を設けたことを特徴とするものである。(Means for solving the problems) The heat treatment furnace of the present invention has one 1. A plurality of heat treatment chambers each having a transfer chamber and an opening that can be opened and closed facing into the transfer chamber are provided, and the transfer chamber has an entrance and exit for carrying in and out of the processed material, and an opening in each of the heat treatment chambers for transporting the processed material. The invention is characterized in that it is provided with a conveying device capable of conveying through the .
（実 施 例） 以下、本発明の一実施例を第１図に沿い説明する。(Example) An embodiment of the present invention will be described below with reference to FIG.
図中１はプラズマ浸炭室、２は高周波焼入室で、共通し
た１個の搬送室３の上部に互いに独立し７て並設されて
おり、各炉底壁には、蓋４により開閉可能な開口部５が
設けられている。In the figure, 1 is a plasma carburizing chamber, 2 is an induction hardening chamber, and they are arranged in parallel 7 independently from each other above a common transfer chamber 3, and each furnace bottom wall has a lid 4 that can be opened and closed. An opening 5 is provided.
プラズマ浸炭室１の床面上、開口部５の周りには、図示
しない移動装置により開口部５の中心に向かい進退可能
な陰掻兼用の架台６が設けられ、該架台６の上方には、
網状板又は多孔板等を筒状に形成した陽Ｐｉ８７及び該
陽極７を取り囲む高周波コイル８が開口部５と間怠に配
置されており、架台６及び陽極７には放電用の直流電源
９が接続され、高周波コイル８には図示しない高周波発
生用の交流電源が接続されている。On the floor of the plasma carburizing chamber 1, around the opening 5, there is provided a pedestal 6 that can move forward and backward toward the center of the opening 5 by means of a moving device (not shown), and above the pedestal 6,
An anode Pi 87 made of a cylindrical mesh plate or a perforated plate, and a high-frequency coil 8 surrounding the anode 7 are arranged between the opening 5 and the pedestal 6 and the anode 7, and a DC power source 9 for discharging is connected to the pedestal 6 and the anode 7. The high-frequency coil 8 is connected to an AC power source (not shown) for generating high-frequency waves.
さらに、プラズマ浸炭室１には図示しないガス供給装置
と真空吸引装置と排気装置とが接続されると共に、咳室
上部には、室内に冷気を供給 ゛可能な冷却コイル１０
及びファン１１が設けられている。Furthermore, a gas supply device, a vacuum suction device, and an exhaust device (not shown) are connected to the plasma carburizing chamber 1, and a cooling coil 10 that can supply cold air into the room is provided in the upper part of the cough chamber.
and a fan 11 are provided.
高周波焼入室２の床面上、開口部５の周りには、図示し
ない移動装置により開口部５の中心に向かい進退可能な
架台１２が設けられ、該架台１２の上方には、前記高周
波コイル８と同一電源と接続された高周波コイル１３が
開口部５と間怠に配置されており、高周波コイル１３に
は、コイル内を液供給路に形成し、かつ、多数の細孔を
穿設した焼入液スプレィ装置が組み込まれている。さら
に、高周波焼入室２には図示しないガス供給装置と真空
吸引装置が接続されている。On the floor of the induction hardening chamber 2, around the opening 5, there is provided a pedestal 12 that can move forward and backward toward the center of the opening 5 by means of a moving device (not shown). A high-frequency coil 13 connected to the same power source is arranged between the opening 5 and the high-frequency coil 13. Built-in liquid spray device. Further, a gas supply device and a vacuum suction device (not shown) are connected to the induction hardening chamber 2.
搬送室３の床面には、上部室１，２の開口部５の直下位
置にて図示しないシリンダにより互いに独立して昇降可
能な昇降ラム１４と、搬送室３床面上を走行可能で、か
つ、昇降ラム１４がＭ通可能な台車１５とが設けられる
と共に、ＤＩＭ送室３には図示しないガス供給装置と真
空吸引装置が接続されている。さらに、搬送室３の搬入
出口には、開閉可能な密閉１３１６．１７が設けられる
と共に、その外部には搬送コンベヤ１８．１９が設けら
れている。On the floor of the transfer chamber 3, there is an elevating ram 14 which can be raised and lowered independently of each other by cylinders (not shown) at a position directly below the openings 5 of the upper chambers 1 and 2, and which is movable on the floor of the transfer chamber 3. In addition, a truck 15 through which the elevating ram 14 can pass M is provided, and the DIM feeding chamber 3 is connected to a gas supply device and a vacuum suction device (not shown). Furthermore, a seal 1316.17 that can be opened and closed is provided at the entrance/exit of the transfer chamber 3, and a transfer conveyor 18.19 is provided outside of the seal 1316.17.
（作 用）
搬送室３内で台車１５を自由に走行させて、搬送コンベ
ヤ１８から導電性の支持台２０ごと移載された被処理物
Ｗをプラズマ浸炭室１直下の所定位置に搬送した後、台
車１５を貫通して昇降ラム１４を上昇させて前記被処理
物Ｗをプラズマ浸炭室１の陽極７及び高周波コイル８内
に１般入し架台８で支持した後昇降ラム１４を元の位置
まで下降させ、かつ、蓋４でプラズマ浸炭室１を密閉す
る。(Function) After the cart 15 is freely run in the transfer chamber 3 and the workpiece W, which has been transferred from the transfer conveyor 18 together with the conductive support stand 20, is transferred to a predetermined position directly below the plasma carburizing chamber 1. , the lifting ram 14 is raised through the cart 15, the workpiece W is generally inserted into the anode 7 and the high-frequency coil 8 of the plasma carburizing chamber 1, and is supported by the pedestal 8, after which the lifting ram 14 is returned to its original position. and then seal the plasma carburizing chamber 1 with the lid 4.
次いで、プラズマ浸炭室１において、室内圧を所定真空
度まで減圧し、かつ、室内に窒素ガスを供給した状態で
被処理物Ｗを高周波加熱すると共に、さらに水素ガスと
プロパンを供給し、かつ、負グロー放電を発生させて、
プラズマ浸炭を行ない１．シかる後高周波加熱だけを継
続して拡散を行なう。Next, in the plasma carburizing chamber 1, the chamber pressure is reduced to a predetermined degree of vacuum, and the workpiece W is high-frequency heated while nitrogen gas is supplied into the chamber, and hydrogen gas and propane are further supplied, and Generate a negative glow discharge,
Perform plasma carburizing 1. After that, only high-frequency heating is continued to perform diffusion.
この浸炭処理後、搬送室３および高周波焼入室２内を減
圧し、かつ、窒素ガスで満たした状態で前記搬入手順と
逆の手順で被処理物Ｗを台車１５上に移載し、次の高周
波焼入室２へと！般送し、前記と同様に被処理物Ｗを高
周波コイル１３内に＋ａ人し架台１２で支持した後昇降
ラム１４を元の位置まで下降させ、かつ、蓋４で高周波
焼入室２を密閉する。After this carburizing treatment, the transfer chamber 3 and the induction hardening chamber 2 are depressurized and filled with nitrogen gas, and the workpiece W is transferred onto the trolley 15 in the reverse order of the carrying-in procedure. To induction hardening room 2! After transporting the workpiece W into the high-frequency coil 13 and supporting it on the pedestal 12 in the same manner as above, the lifting ram 14 is lowered to the original position, and the high-frequency hardening chamber 2 is sealed with the lid 4. .
次いで、高周波焼入室２において被加熱物Ｗの高周波焼
入れを行なう。Next, the object W to be heated is subjected to induction hardening in the induction hardening chamber 2 .
この焼入処理後、前記と同様に、処理物Ｗ′を台車１５
上に移載して搬送コンベヤ１つへと送り出す。After this quenching treatment, the workpiece W' is transported to the trolley 15 in the same manner as described above.
Transfer it to the top and send it out to one conveyor.
しかして、浸炭及び焼入処理待台車１５は処理室外の１
股送室３内にあって熱影ツを受けない。Therefore, the carburizing and quenching processing waiting cart 15 is located outside the processing room.
It is located in the transport chamber 3 and is not exposed to heat radiation.
尚、本実施例はプラズマ浸炭及び高閤波焼入処理のため
処理室１．２を搬送室３の上部に配置した例につき説明
したが、熱処理の種類及び処理室と搬送室の位置関係は
何ら例示のものに限定されないと共に、それ故に搬送装
置も例示。In this embodiment, the processing chamber 1.2 is arranged above the transfer chamber 3 for plasma carburizing and high-temperature hardening treatment, but the type of heat treatment and the positional relationship between the processing chamber and the transfer chamber are different. The present invention is not limited to the exemplified one, and therefore the conveying device is also exemplified.
のものに限定されない。It is not limited to those of
（発明の効果）
以上の通り本発明は、複数個の熱処理室に対して共通し
た１個の搬送室を分離して設けたため、熱処理時の熱影
響を搬送装置が受けることはないから、搬送装置の寿命
を大幅に延ばすことができると共に、炉内構成がシンプ
ルとなったから、メンテナンスを容易に能率良く行なう
ことが可能となる。(Effects of the Invention) As described above, in the present invention, since one common transfer chamber is provided separately for a plurality of heat treatment chambers, the transfer device is not affected by heat during heat treatment. The life of the device can be greatly extended, and since the furnace internal configuration is simple, maintenance can be performed easily and efficiently.
第１図は本発明の一実施例を示す概要図、第２図は従来
例を示す概要図である。
■・・プラズマ浸炭室、２・・高周波焼入室、３・・搬
送室、４・・蓋、５・・開口部、６゜１２・・架台、７
・・陽極、８．１３・・高周波コイル、１０・・冷却コ
イル、１１・・ファン、１４・・昇降ラム、１５・・台
車、１６゜１７・・密閉扉、１８．１．９・・搬送コン
ベヤ、２０・・支持台。FIG. 1 is a schematic diagram showing an embodiment of the present invention, and FIG. 2 is a schematic diagram showing a conventional example. ■... Plasma carburizing chamber, 2... Induction quenching chamber, 3... Transfer chamber, 4... Lid, 5... Opening, 6°12... Frame, 7
・・Anode, 8.13・・High frequency coil, 10・・Cooling coil, 11・・Fan, 14・・Elevating ram, 15・・Dolly, 16° 17・・Airtight door, 18.1.9・・Transportation Conveyor, 20...Support stand.
Claims (1)
部を有する複数個の熱処理室を設け、前記搬送室に、被
処理物の搬入出口と、被処理物を各熱処理室内に開口部
を経て搬送可能な搬送装置とを設けたことを特徴とする
熱処理炉。One transfer chamber and a plurality of heat treatment chambers each having an opening facing into the transfer chamber that can be opened and closed are provided, and the transfer chamber has an entrance/exit for loading and unloading the workpiece, and an opening for carrying the workpiece into each heat treatment chamber. A heat treatment furnace characterized in that it is provided with a conveyance device capable of conveying the heat treatment through a section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13533086A JPS62290858A (en) | 1986-06-11 | 1986-06-11 | Heat treating furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13533086A JPS62290858A (en) | 1986-06-11 | 1986-06-11 | Heat treating furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62290858A true JPS62290858A (en) | 1987-12-17 |
Family
ID=15149243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13533086A Pending JPS62290858A (en) | 1986-06-11 | 1986-06-11 | Heat treating furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62290858A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0537952U (en) * | 1991-10-24 | 1993-05-21 | トリニテイ工業株式会社 | Solution heat treatment equipment |
| JP2001220659A (en) * | 2000-02-07 | 2001-08-14 | Chugai Ro Co Ltd | Intermittently driven vacuum carburizing furnace |
| JP2015074818A (en) * | 2013-10-11 | 2015-04-20 | Ｄｏｗａサーモテック株式会社 | Carburization hardening facility |
| CN110129520A (en) * | 2015-09-11 | 2019-08-16 | 光洋热***股份有限公司 | Annealing device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5857481A (en) * | 1981-09-29 | 1983-04-05 | Daicel Chem Ind Ltd | Adhesive |
-
1986
- 1986-06-11 JP JP13533086A patent/JPS62290858A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5857481A (en) * | 1981-09-29 | 1983-04-05 | Daicel Chem Ind Ltd | Adhesive |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0537952U (en) * | 1991-10-24 | 1993-05-21 | トリニテイ工業株式会社 | Solution heat treatment equipment |
| JP2001220659A (en) * | 2000-02-07 | 2001-08-14 | Chugai Ro Co Ltd | Intermittently driven vacuum carburizing furnace |
| JP4537522B2 (en) * | 2000-02-07 | 2010-09-01 | 中外炉工業株式会社 | Intermittently driven vacuum carburizing furnace |
| JP2015074818A (en) * | 2013-10-11 | 2015-04-20 | Ｄｏｗａサーモテック株式会社 | Carburization hardening facility |
| CN110129520A (en) * | 2015-09-11 | 2019-08-16 | 光洋热***股份有限公司 | Annealing device |
| US10866029B2 (en) | 2015-09-11 | 2020-12-15 | Koyo Thermo Systems Co., Ltd. | Heat treatment apparatus |
| CN110129520B (en) * | 2015-09-11 | 2021-09-07 | 光洋热***股份有限公司 | Heat treatment apparatus |
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