JPS62278536A - Liquid crystal element - Google Patents
Liquid crystal elementInfo
- Publication number
- JPS62278536A JPS62278536A JP12162486A JP12162486A JPS62278536A JP S62278536 A JPS62278536 A JP S62278536A JP 12162486 A JP12162486 A JP 12162486A JP 12162486 A JP12162486 A JP 12162486A JP S62278536 A JPS62278536 A JP S62278536A
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- electrode
- liquid crystal
- mask
- signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 43
- 239000000428 dust Substances 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 6
- 230000007257 malfunction Effects 0.000 abstract description 2
- 230000003287 optical effect Effects 0.000 description 6
- 238000001259 photo etching Methods 0.000 description 6
- 239000003566 sealing material Substances 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 101000860173 Myxococcus xanthus C-factor Proteins 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Geometry (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Dot-Matrix Printers And Others (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【発明の詳細な説明】 ３、発明の詳細な説明 ［発明の技術分野］ 本発明は液晶シャッタとして用いる液晶素子に関する。[Detailed description of the invention] 3. Detailed description of the invention [Technical field of invention] The present invention relates to a liquid crystal element used as a liquid crystal shutter.
［発明の技術的背景とその問題点］
近時、光書込み式グリンタにおいては、光書込み手段と
して党の透過全制御する多数のシャ、りｍｔ配列形成し
た液晶シャッタと呼ばれる液晶素子が用いられている・
この液晶シャッタは、多数の信号電極を配列形成した透
明な電極基板と、前記信号電極に対向して共通電極を形
成した透明な基板とを、電極形成面が内側となるように
液晶を介在して対向配置して構成したものである。すな
わち、一方の基板に形成した信号電極の元透過部および
他方の基板に形成した信号電極の元透過部の互いに対向
するもの同士と、これら両方の１！他の間にある液晶と
によって多数のシャ、り部を配列して構成しである。[Technical background of the invention and its problems] Recently, in optical writing type printers, a liquid crystal element called a liquid crystal shutter, which has a large number of shutters arranged in an array that completely controls the transmission of light, has been used as an optical writing means. - This liquid crystal shutter consists of a transparent electrode substrate on which a large number of signal electrodes are arranged, and a transparent substrate on which a common electrode is formed opposite to the signal electrodes, and the liquid crystal is placed so that the electrode forming surface is on the inside. They are arranged so that they are interposed and facing each other. That is, the original transmitting portion of the signal electrode formed on one substrate and the original transmitting portion of the signal electrode formed on the other substrate, which are opposite to each other, and the 1! It is constructed by arranging a large number of shutter parts with a liquid crystal between them.
また、一方の基板には前記シャッタ部列の両端外側に位
置して夫々補助信号１［極を形成し、この補助信号電嬌
金他方の基板の共通電極と対向させて余白消去シャッタ
部を構成している。前記シャッタ部列の各７ヤツタ部は
用紙にドツトの組合により画像を形成するためのもので
あり、余白消去シャッタ部は用紙の両側を余白部として
白く残すためのものである。Further, on one substrate, auxiliary signal 1 [poles are formed, respectively, located outside both ends of the shutter section row, and these auxiliary signal electrodes are opposed to the common electrode of the other substrate to form a margin erasing shutter section. are doing. Each of the seven dots in the shutter array is used to form an image on a sheet of paper by combining dots, and the margin erasing shutter section is used to leave both sides of the sheet white as margins.
そして、この液晶シャ、りは光書込み式プリンタにおけ
る元記録部に設けて用いられる。ここで、液晶シャッタ
におけるシャッタ部列の各シャツタ部毎に信号電臘と共
通電極との間に電圧を印加して液晶分子を挙動させるこ
とにより、各シャッタ部を選択的に「開（光透過）」と
「閉（光不透過）」とする。これにより光源からの元の
透過を液晶シャッタの各シャッタ部で制御し、シャ、り
部を透過した元を感光ドラムの表面に照射して光書込み
を行なう。この様にして感光ドラムに形成した静電潜像
は現像部で現像した後、転写部で用紙に転写して用紙に
ドツトからなる画像を形成する。また、余白消去シャッ
タ部は常に「開」とし、前記感光ドラムの両端部（用紙
の両側の余白部に対応する部分）に元を照射して帯電電
荷全消去することにより、用紙の両側余白部を白く残す
。This liquid crystal screen is used by being provided in the original recording section of an optical writing printer. Here, by applying a voltage between the signal pole and the common electrode to each shutter part of the shutter part row in the liquid crystal shutter to cause the liquid crystal molecules to behave, each shutter part is selectively "opened" (light transmitting). )” and “closed (light opaque)”. Thereby, the original transmission from the light source is controlled by each shutter section of the liquid crystal shutter, and the light transmitted through the shutter section is irradiated onto the surface of the photosensitive drum to perform optical writing. The electrostatic latent image formed on the photosensitive drum in this manner is developed in a developing section and then transferred onto a sheet of paper at a transfer section to form an image consisting of dots on the sheet. In addition, the margin erasing shutter section is always kept open, and by irradiating both ends of the photosensitive drum (portions corresponding to the margins on both sides of the paper) with the source and erasing all the electrical charges, the margin erasure section is kept open. Leave white.
このように構成した液晶シャッタにおいて、基板に設け
る電極を形成するためには、フオトエ。In the liquid crystal shutter configured as described above, a photo-emitting device is required to form the electrodes provided on the substrate.
チング法が採用されている。すなわち、基板の表面全体
に導電材料を形成した後、この導電材料の表面にレジス
トを塗布し、次にマスクを用いて露光を行ない、さらに
現像およびエツチングを行なうことにより導電材料の電
極部分を残して不用部分を除去するものである。Ching method is adopted. That is, after forming a conductive material on the entire surface of the substrate, a resist is applied to the surface of the conductive material, and then exposed using a mask, and then developed and etched, leaving only the electrode portion of the conductive material. This is to remove unnecessary parts.
そして、このフォトエツチング法により基板に信号電極
を形成するためのレジスト材としては・ネガタイプとポ
ジタイプがある。ボッ式のフォトエツチング法は露光時
にマスク全透過した党に照射された部分が現像により除
去されるレジスト材を用いる方法であり、必要な電極部
分に欠落が生じ難い点で有利である。この場合、信号電
極の部分に元が当らないようにしたマスクツ母ターンの
マスクを用いる。しかし、このボッ式フォトエツチング
により信号電極を形成する場合には、信号電極相互の間
隔が大変微小（例えば３０μ）であるために、マスクに
おいて各信号電極を形作るマスクパターンの間の党が透
過する部分にゴミが付着すると、それが小さなものでも
隣り合う両方のマスクパターンに接触してまたがって付
着することが多い。そして、このマスクを用いてｌＩ元
全全行うと、マスク・母ターンとともに前記コ０ミが元
全遮ぎるために、信号電極が短絡された／Ｊパターン露
光が行なわれ、結果として基板上に短絡した信号電極が
形成される。液晶シャ、りは本来各シャッタ部が独宜し
て駆動し光書込みを行なうものであるから、信号電ｉが
短絡状態にあるとシャ、り部に誤動作音生じて正確な光
書込みができなくなる。There are two types of resist materials for forming signal electrodes on a substrate by this photoetching method: negative type and positive type. The photo-etching method is a method using a resist material in which the irradiated portion of the resist material that completely passes through the mask during exposure is removed by development, and is advantageous in that necessary electrode portions are less likely to be missing. In this case, a mask with a mask-to-base turn is used so that the source does not hit the signal electrode portion. However, when signal electrodes are formed by this type of photoetching, because the distance between the signal electrodes is very small (for example, 30μ), particles between the mask patterns that form each signal electrode are transmitted through the mask. When dust adheres to a portion, even if it is small, it often comes into contact with and straddles both adjacent mask patterns. Then, when this mask is used to perform the II pattern exposure, the signal electrode is short-circuited and the J pattern exposure is performed because the mask and mother turn as well as the above-mentioned dust completely block the original.As a result, the signal electrode is short-circuited. A shorted signal electrode is formed. Since each shutter section of a liquid crystal shutter is originally driven independently to perform optical writing, if the signal wire I is short-circuited, a malfunctioning sound will be generated in the shutter section, making it impossible to perform accurate optical writing. .
そこで、従来からポジ式フォトエツチングにより信号電
極を形成する場合には、マスクを用いて１回露光を行な
った後に、マスクを信号電極配列方向に所定ピッチ移動
して２回目の露光全行ない、短絡された信号電極の形成
を防止するようにしている。これはマスクを移動して２
重露光を行なうことにより、基板における同一箇所に２
回共マスクのゴミが位置する確率が大変少ないという考
えによるもので、マスクツ４ターンの移動により１方の
露光時に信号′成極が短絡したパターンで露光された箇
所に対して他方の露光時に光全当てて露光を行ないその
部分全除去する方法である。Conventionally, when forming signal electrodes by positive photoetching, a mask is used to perform one exposure, and then the mask is moved by a predetermined pitch in the direction of the signal electrode arrangement and a second full exposure is performed. This is to prevent the formation of a signal electrode that has been damaged. This moves the mask 2
By performing heavy exposure, two
This is based on the idea that the probability of dust on the recirculating mask being located is very low, and by moving the mask 4 turns, the signal 'polarization is short-circuited during one exposure, and the exposed area is exposed to light during the other exposure. This is a method of exposing the entire area to light and removing that part entirely.
しかしながら、この２重露光においては次のような問題
が発生している。液晶シャッタにおいてシャッタ部列の
両端側て設ける余白消去シャ、り部を構成する補助信号
を極は、余白消去シャ、り部が常に開であり、独豆して
開閉制御する必要がないために大きな面積を有する面形
状の１つの電極として形成している。そして、露光層マ
スクは前記補助信号電極と同じ形状のマスクパターンを
備えている。このマスクを用いて２重露元を行なう場合
において、１回目の露光の後にマスクを信号電極配列方
向に移動させると、前記補助信号電極を形作るマスクパ
ターンが、１回目の７ｘ党時に基板のレジスト上に露光
された前記補助信号電極の部分を覆うことになる。この
ため、１回目に露光された補助信号電極に隣接する信号
電極の間の部分が前記マスクツ４ターンに覆われて元が
透過しない。従って、１回目の露光時に信号電極が橋絡
されたパターンで露光が行なわれた場合に、２回目の露
光時に電極短絡部分に党を当てることができなくなり、
結果として基板上に短絡された信号電極が形成されるこ
とになる。However, the following problems occur in this double exposure. In a liquid crystal shutter, the auxiliary signal that constitutes the margin erasing shutter provided at both ends of the shutter row is used because the margin erasing shutter and margin are always open and there is no need to independently control opening and closing. It is formed as one planar electrode having a large area. The exposure layer mask has a mask pattern having the same shape as the auxiliary signal electrode. When performing double exposure using this mask, if the mask is moved in the direction of the signal electrode array after the first exposure, the mask pattern forming the auxiliary signal electrodes will overlap the resist of the substrate during the first 7x exposure. This will cover the portion of the auxiliary signal electrode that was exposed above. Therefore, the portion between the signal electrodes adjacent to the auxiliary signal electrode exposed for the first time is covered by the four turns of the mask, and the original portion is not transmitted. Therefore, if exposure is performed in a pattern in which the signal electrodes are bridged during the first exposure, it will not be possible to hit the short-circuited portion of the electrodes during the second exposure.
As a result, a shorted signal electrode is formed on the substrate.
第８図は従来の液晶シャッタにおける信号電極の外形形
状を示しており、１はシャ、り部用信号電極、２Ｖｉ余
白消去シャッタ部用補助信号電極である。この信号電極
に応じたマスクツやターンを有するマスクを用いて２重
露光を行なう場合、２回目の露光時にマスクを右方向に
移染すると、補助信号電極２を形作るマスクツやターン
が補助信号電極２とこれに隣接する信号電極１ｈ、１ｂ
の相互間隙を覆って元の透過を阻止することになる。FIG. 8 shows the external shapes of signal electrodes in a conventional liquid crystal shutter, where 1 is a signal electrode for the shutter portion, and 2Vi is an auxiliary signal electrode for the margin erasing shutter portion. When double exposure is performed using a mask having masks and turns corresponding to the signal electrodes, if the mask is dyed to the right during the second exposure, the masks and turns forming the auxiliary signal electrode 2 will be removed from the auxiliary signal electrode. and adjacent signal electrodes 1h, 1b
This will cover the mutual gap between them and prevent the original permeation.
［発明の概要コ
本発明の液晶素子は液晶と、この液晶を介して対向配置
された一対の透明な基板と、この基板の一方の基板の内
面に配列形成された複数の第１の電極と、他方の基板の
内面にこの第１のｔｉと対向して形成された第２の電極
とを具備し、前記複数の電極のうち、その電極列の端部
に位置する電極が互いに電気的に接続されていることを
特徴とするものである。[Summary of the Invention] The liquid crystal element of the present invention includes a liquid crystal, a pair of transparent substrates facing each other with the liquid crystal in between, and a plurality of first electrodes arranged on the inner surface of one of the substrates. , a second electrode formed on the inner surface of the other substrate to face the first ti, and among the plurality of electrodes, the electrodes located at the ends of the electrode row are electrically connected to each other. It is characterized by being connected.
［発明の目的コ
本発明は前記事情に基づいてなされたもので、信号電極
を相互に短絡することなく形成することができる液晶素
子を提供することを目的とする。[Object of the Invention] The present invention was made based on the above-mentioned circumstances, and an object of the present invention is to provide a liquid crystal element in which signal electrodes can be formed without mutually shorting.
［発明の実施例］ 以下本発明を図面で示す一実施例について説明する。[Embodiments of the invention] An embodiment of the present invention illustrated in the drawings will be described below.
第１図ないし第３図は本発明の液晶素子の一実施例であ
る液晶シャ、り全示している。1 to 3 completely illustrate a liquid crystal display which is an embodiment of the liquid crystal element of the present invention.
図中１１．１２は透明ガラス板からなる基板で、この基
板１１．１２は対向配置されて枠形の外部シール材１３
°および線状の内部シール材１４゜１４を介して接着さ
れている。基板１１．１２の間隙における内部シール材
１４．１４に挾まれた部分および外部シール材１３の両
端部には液晶ＬＣ例えばダスト・ホスト効実用液晶が充
填されている。In the figure, reference numeral 11.12 denotes a substrate made of a transparent glass plate, and this substrate 11.12 is arranged opposite to a frame-shaped external sealing material 13.
14° and a linear internal sealing material 14°14. A portion of the gap between the substrates 11 and 12 sandwiched between the internal sealing materials 14 and 14 and both ends of the external sealing material 13 are filled with liquid crystal LC, for example, a dust-host effective liquid crystal.
一方の基板１１の内面には、多数の信号電極Ｓ・・・が
長手方向に間隔全存して配列形成されている。On the inner surface of one of the substrates 11, a large number of signal electrodes S are arranged and formed at intervals in the longitudinal direction.
信号電極Ｓ・・・は透明電極１５と金属膜１６とからな
るもので、透明電極１５は基板１１の内面に被着され、
前記内部シール材１４．１４の内側に位置する元透過部
である２個のシャ、りｗＬ極１７゜１７と外部シール材
１３の外側に導出する端子１８とを一体に形成したもの
で、各透明電極Ｓ・・・の端子１８は左右交互に導出す
るように形成される。金属膜１６は透明電極１５におけ
る７ヤツタ電極１７．１７を除いた他の部分の表面に被
着されている。また、基板１ノの内面には前記信号電極
Ｓ・・・の列の両端側に位置して夫々補助信号電極ｓｐ
、 ｓｐが夫々形成しである。補助信号電極ｓｐ、ｓ
ｐは透明電極１５と金属膜１６とからなるもので、透明
電極１５は面状をなすシャッタ電極１９と、このシャッ
タ電極１９に対し信号電極Ｓ側に位置する２個の分割電
極２０．２０と、シャ、り電極１９と各分割電極２０．
２０を個別に接続する２個の接続リード２１．２１と、
前記シール部材１３の外側に導出する端子２２とを一体
に形成したものである。なお、分割電極２０．２０は信
号電極Ｓのシャ、り電極１７．１７の部分と同一外形形
状をなし且つ信号電極Ｓの相互間隙と同−間１７ｔ−存
して形成されている。金１Ａｈ１６は余白消去シャ、り
部に対応した開口を形成してン５Ｐｙ３’電極ＱＪｉ及
び分割電極２０．２０の透明電極１５の各表面に被着形
成され、また接続リード２１．２１と端子２２の各表面
に被着形成されている。図中２３は基板１１の内面に形
成された配向膜である。The signal electrode S... consists of a transparent electrode 15 and a metal film 16, and the transparent electrode 15 is attached to the inner surface of the substrate 11,
The two shields 17° 17, which are the former transparent parts located inside the internal sealing material 14 and 14, and the terminal 18 led out to the outside of the external sealing material 13 are integrally formed. The terminals 18 of the transparent electrodes S... are formed so as to lead out alternately on the left and right sides. The metal film 16 is adhered to the surface of the transparent electrode 15 except for the seven-layered electrodes 17 and 17. Further, on the inner surface of the substrate 1, auxiliary signal electrodes sp are located at both ends of the rows of the signal electrodes S.
, sp are formed respectively. Auxiliary signal electrodes sp, s
p consists of a transparent electrode 15 and a metal film 16, and the transparent electrode 15 includes a planar shutter electrode 19 and two divided electrodes 20 and 20 located on the signal electrode S side with respect to the shutter electrode 19. , the rear electrode 19 and each divided electrode 20.
two connection leads 21.21 that individually connect 20;
A terminal 22 led out to the outside of the seal member 13 is integrally formed. The divided electrodes 20.20 are formed to have the same external shape as the outer electrode 17.17 of the signal electrode S, and to be spaced from each other by the same distance 17t as the mutual gap between the signal electrodes S. Gold 1Ah16 is deposited on each surface of the transparent electrode 15 of the 5Py3' electrode QJi and the divided electrode 20.20 by forming an opening corresponding to the margin eraser, and the connection lead 21.21 and the terminal 22. is coated on each surface. In the figure, 23 is an alignment film formed on the inner surface of the substrate 11.
他方の基板１２の内面には、帯状上なす２個の共通電極
Ｃ２Ｃが長手方向に沿って形成してあり・この共通電極
Ｃ，Ｃは、前記基板ＩＩの各信号電極Ｓ−・における一
方のシャッタ電極１７・・・の列、および補助信号電極
ＳＰと他方のシャッタｉ極ノア・・・の列、および補助
信号電極ＳＰとに対向している。On the inner surface of the other substrate 12, two strip-like common electrodes C2C are formed along the longitudinal direction.These common electrodes C, C are connected to one of the signal electrodes S-- of the substrate II. It faces a row of shutter electrodes 17, a row of auxiliary signal electrodes SP and the other shutter i-pole, and auxiliary signal electrodes SP.
共通電極Ｃ９Ｃは、基板１２の内面に被着された帯状の
透明電極２３と、この透明電極２３の表面に被着された
金Ｉ４膜２４とで構成されている。この金属膜２４の前
記信号１！極Ｓ・・・のシャッタ電極１７・・・と１７
・・・と対向する部分が夫々開口され、金属膜２４にお
けるこれら開口部に面する透明電極２３の各部分が元透
過部である多数のシャッタ電極２５・・・、２５・・・
として配列形成されており、また前記補助信号電極ｓｐ
、 ｓｐと対向する部分が夫々開口され、金ｆｆｉ膜
２４におけるこれら開口部に面する透明’＠、５．２３
の各部分が元透過部であるシャッタ電極２６．２６が形
成されている。なお、図中２７は基板１２の内面に形成
した配向膜である。The common electrode C9C is composed of a band-shaped transparent electrode 23 attached to the inner surface of the substrate 12 and a gold I4 film 24 attached to the surface of the transparent electrode 23. The signal 1! of this metal film 24! Shutter electrodes 17 and 17 of pole S...
. . , a large number of shutter electrodes 25 . . . , 25 .
The auxiliary signal electrodes sp
, the parts facing sp are opened, respectively, and transparent '@, 5.23 facing these openings in the gold ffi film 24 are opened.
Shutter electrodes 26 and 26, each of which is originally a transparent portion, are formed. Note that 27 in the figure is an alignment film formed on the inner surface of the substrate 12.
そして、前記信号電極Ｓ・・・のシャ、り電極１７・・
・。Then, the signal electrode S... is connected to the signal electrode 17...
・.
１７・・・と、これに対向する前記共通電極Ｃ１Ｃのシ
ャ、り電極２５・・・、２５・・・と、前記液晶ＬＣと
で多数のシャ、り部Ａ・・・、Ａ・・・が配列構成され
ている。また、前記補助信号電極ｓｐ、ｓｐのシイ、り
電極１９．１９と、これに対向する前記共通電極Ｃ９Ｃ
のシャ、り電極２６．２６と、液晶ＬＣとでシャ、り部
Ａ・・・、Ａ・・・列の両端側に位置する余白消去シャ
、り部、４Ｐ、ＡＰが構成されている。17..., the shield electrodes 25..., 25... of the common electrode C1C facing thereto, and the liquid crystal LC form a large number of shield parts A..., A... is composed of an array. Further, the auxiliary signal electrodes sp and the electrodes 19 and 19 of the sp, and the common electrode C9C opposite thereto.
The shutter electrodes 26, 26 and the liquid crystal LC constitute margin erasing shutter sections 4P and AP located at both ends of the columns A, .
このように構成した液晶シャッタにおいて、基板１１ｖ
Ｃ信号電極をフォトエツチングにより形成する場合につ
いて説明する。In the liquid crystal shutter configured in this way, the substrate 11v
The case where the C signal electrode is formed by photoetching will be explained.
まず、基板１ノの表面全体に透明電極材料と金属膜材料
とを層状に形成し、さらにその上にフォトレジストを一
様に塗布した後、第５図で示すマスクツ母ターンのマス
クを用いて２重露光を行なう。First, a transparent electrode material and a metal film material are formed in a layer on the entire surface of the substrate 1, and then a photoresist is uniformly applied thereon. Perform double exposure.
露光用マスクのマスクパターンは、第５図で示すように
基板１１の前記各信号電極Ｓ・・・に夫々対応して配列
された信号電極Ｓの外形を形作る多数の信号電極マスク
部３１と、前記各補助信号′成極ｓｐ、ｓｐに対応して
その外形を形作る一対の補助信号電極マスク部３２．３
２を有するものである。As shown in FIG. 5, the mask pattern of the exposure mask includes a large number of signal electrode mask portions 31 forming the outer shape of the signal electrodes S arranged corresponding to each of the signal electrodes S on the substrate 11, and A pair of auxiliary signal electrode mask portions 32.3 that form the outer shape of each auxiliary signal in accordance with the polarization sp, sp.
2.
補助信号電極マスク部３２は、補助信号電極ｓｐにおけ
るシャッタ電極１９、分割電極２０．２０およびこれら
灸電極１９．２０．２０の相互間隙を全て覆う面ｙ！、
ヲ有する面状をなしている。The auxiliary signal electrode mask portion 32 is a surface y! that covers all of the shutter electrode 19, the divided electrodes 20.20, and the mutual gaps between these moxibustion electrodes 19, 20, 20 in the auxiliary signal electrode sp! ,
It has a surface shape with .
２重ａ元を行なう場合には、マスク全基板１１の上方に
配置し、マスクのマスクパターンヲ第６図で示すように
最終的に電極を形成する箇所より信号電極２個分左側に
寄ったＵ位Ｉｆ（左端の電極位置）に位置させ、光源か
らの光をマスクを透して基板１１のフォトレノスト上に
照射して１回目の露光を行なう。次にマスクを動かしマ
スクツ母ターンｉＵ位置から電極配列方向に沿い信号電
極２個分右方に移動しＶ位置（右端の電極位（ｉｌ）に
位置させて２回目のｉ！元を行なう。この露光によりマ
スクツ母ターンの各マスク部３′１．３２は基板１１の
フォトレジストに対して元を遮ぎり、マスク部３１．３
２以下の部分は前記フォトレジストに対して元を照射す
る。第６図は基板１ノの７オトレノストに対する露光状
態を示す。図中Ｗは１回目の露光時にのみ元が照射され
た箇所（１重露光部）、Ｘは２回目の露光時にのみ光が
照射された箇所（１１露党部）、Ｙは両方の露光時に光
が照射された箇所（２重ｊＩ′ｙｔ、部）、２は両方の
Ｉ！光時共に党が照射されない箇所（電極形成部）であ
る。この第６図から明らかなように基板１１のフォトレ
ジストにおいて各信号電極Ｓ−・の相互間隙は、２１露
元されてマスクに付着したゴミに影響されることなく党
が完全に当る。また、マスクツターンの移動に伴い補助
信号電極マスク部３２゜３２により１重露光部Ｗ、Ｘが
生じるが、この部分は補助信号電極ｓｐ、ｓｐにおける
シャ、りＸ極１９および分割を極２０，２０の間隙であ
るために、信号電極Ｓ・・・の間隙には関係がない。す
なわち、補助信号電極ｓｐをシャッタ電極１９と分割電
極２０，２０とを組合せた構成とすることにより、マス
クの移動に伴う補助４８号電極マスク部３２゜３２の影
響全補助信号電極ｓｐ、ｓｐの範囲に収めて信号電極Ｓ
・・・に影響金与えることがない・露光を終了した後に
現像およびエツチングを行ない、基板１１の材料層にお
ける元が照射されない箇所２を除いて各露光部Ｙ、Ｗ、
Ｘを除去して信号電極Ｓ・・・および補助信号電極ｓｐ
、 ｓｐを形成する。ここで、前記ｔＡ元時における
マスクに付着したゴミの影響によりグヤ、り電極１９お
よび分割’１ｌＮ２０．２０の間隙が各電極を結ぶ短絡
状態で形成されたとしても、シャ、り電極１９と分割電
極２０．２０は補助信号電極ＳＰの一部として接続リー
ド２１．２１ＶＣより予じめ電気的に接続する構成であ
るから、前記短絡状態は電気的に全く無視することがで
き誤動作を生じることがない。When performing a double a source, the mask is placed above the entire substrate 11, and the mask pattern of the mask is placed two signal electrodes to the left of the location where the final electrode will be formed, as shown in FIG. The photorenost on the substrate 11 is irradiated with light from a light source through a mask to perform a first exposure. Next, move the mask and move the mask from the iU position to the right by two signal electrodes along the electrode arrangement direction, position it at the V position (rightmost electrode position (il)), and perform the second i! origin. By exposure, each mask portion 3'1.32 of the mask mother turn blocks the photoresist of the substrate 11, and the mask portion 31.3
The portions below 2 are irradiated with a source onto the photoresist. FIG. 6 shows the exposure state of substrate 1 to 7 otolenose. In the figure, W is the area where the original was irradiated only during the first exposure (single exposure area), X is the area where the original was irradiated only during the second exposure (11th exposure area), and Y is the area where the original was exposed during both exposures. Where the light was irradiated (double jI'yt, part), 2 is both I! This is the part (electrode formation part) where the part is not irradiated with light. As is clear from FIG. 6, the mutual spacing between the signal electrodes S-- in the photoresist of the substrate 11 is completely covered by the exposed particles 21 without being affected by the dust adhering to the mask. In addition, as the mask tsun moves, a single exposure area W, , 20, it has no relation to the gaps between the signal electrodes S.... That is, by forming the auxiliary signal electrode sp in a combination of the shutter electrode 19 and the divided electrodes 20, 20, the influence of the auxiliary No. 48 electrode mask portion 32°32 due to the movement of the mask on all the auxiliary signal electrodes sp, sp is reduced. Signal electrode S within the range
・Development and etching are performed after the exposure is completed, and each exposed area Y, W,
By removing X, the signal electrode S... and the auxiliary signal electrode sp
, forming sp. Here, even if the gap between the negative electrode 19 and the divided '11N20.20 is formed in a short-circuit state connecting each electrode due to the influence of dust attached to the mask at the time of tA, the negative electrode 19 and Since the divided electrode 20.20 is configured to be electrically connected in advance to the connection lead 21.21VC as part of the auxiliary signal electrode SP, the short-circuit condition can be completely ignored electrically and will not cause malfunction. There is no.
第７図は本発明の液晶シャッタにおける信号電極の他の
実施例を示している。この実施例において補助信号電極
ＳＰは、信号電極Ｓのセグメント電極１７．１７と同じ
大きさをなす複数のシャ、り電極４１・・・を信号電極
Ｓの相互間隔と同じ間隔を存して配列し、各シャッタ電
極４１・・・を全てｉ！２的に共通に接続して構成した
ものである。この構成では、フォトエツチングするため
のマスクツ４ターンが同一形状ｔ−繰返見した単純なパ
ターンで形成できるため、マスクの製造が容易になると
共に、余白消去用シャッタの面積がそれぞれ等しくなる
ので、余白消去シャッタ部の液晶に印加される電圧が均
一化するため、むらのない消去が行なえる。FIG. 7 shows another embodiment of the signal electrode in the liquid crystal shutter of the present invention. In this embodiment, the auxiliary signal electrode SP has a plurality of shield electrodes 41 having the same size as the segment electrodes 17, 17 of the signal electrodes S, arranged at the same spacing as the mutual spacing of the signal electrodes S. Then, each shutter electrode 41... is all i! It is constructed by connecting two parts in common. With this configuration, the four turns of the mask for photoetching can be formed with the same shape and a simple pattern that has been repeatedly viewed, making it easy to manufacture the mask, and since the areas of the shutters for blank erasing are the same, Since the voltage applied to the liquid crystal of the margin erasing shutter section is made uniform, even erasing can be performed.
［発明の効果］
以上説明したように本発明によれば、７オトエ、チング
により基板に多数の電極を相互に短絡させることなく正
確に形成することができ・高品質な液晶素子を歩留り良
く得ることができる。[Effects of the Invention] As explained above, according to the present invention, a large number of electrodes can be accurately formed on a substrate by seven etchings and etching without causing mutual short-circuiting, and high-quality liquid crystal elements can be obtained with a high yield. be able to.
第１図ないし第４図は本発明の液晶素子の一実施例を示
し、第１図は信号電極を示す平面図、第２図は一方の基
板の内面を示す平面図、第３図は他方の基板の内面を示
す平面図、第４図は横断面図、第５図は前記実施例の液
晶素子における信号電極を形成する場合の露光に用いる
マスクを示す説明図、第６図は同マスクを用いた露光を
示す説明図、第７図は他の実施例における信号電極を示
す平面図、第８図は従来の液晶素子における信号電極を
示す説明図である。
１１．１２・・・基板、Ｓ・・・信号電極、ｓｐ・・・
補助信号電極、Ｃ・・・共通電極、Ａ・・・シャ、り部
、ＡＰ・・・余白消去シャッタ部、ＬＣ・・・液晶。1 to 4 show an embodiment of the liquid crystal element of the present invention, FIG. 1 is a plan view showing signal electrodes, FIG. 2 is a plan view showing the inner surface of one substrate, and FIG. 3 is a plan view showing the other substrate. FIG. 4 is a plan view showing the inner surface of the substrate, FIG. 4 is a cross-sectional view, FIG. 5 is an explanatory view showing the mask used for exposure when forming the signal electrode in the liquid crystal element of the above embodiment, and FIG. 6 is the same mask. FIG. 7 is a plan view showing signal electrodes in another embodiment, and FIG. 8 is an explanatory view showing signal electrodes in a conventional liquid crystal element. 11.12...Substrate, S...signal electrode, sp...
Auxiliary signal electrode, C... common electrode, A... shutter section, AP... margin erasing shutter section, LC... liquid crystal.
Claims (1)
基板と、この基板の一方の基板の内面に配列形成された
複数の第１の電極と、他方の基板の内面にこの第１の電
極と対向して形成された第２の電極とを具備し、前記複
数の電極のうち、その電極列の端部に位置する電極が互
いに電気的に接続されていることを特徴とする液晶素子
。A liquid crystal, a pair of transparent substrates facing each other with the liquid crystal in between, a plurality of first electrodes arranged on the inner surface of one of the substrates, and a plurality of first electrodes arranged on the inner surface of the other substrate. A liquid crystal element comprising an electrode and a second electrode formed opposite to each other, and among the plurality of electrodes, electrodes located at the ends of the electrode row are electrically connected to each other. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12162486A JPS62278536A (en) | 1986-05-27 | 1986-05-27 | Liquid crystal element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12162486A JPS62278536A (en) | 1986-05-27 | 1986-05-27 | Liquid crystal element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62278536A true JPS62278536A (en) | 1987-12-03 |
Family
ID=14815866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12162486A Pending JPS62278536A (en) | 1986-05-27 | 1986-05-27 | Liquid crystal element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62278536A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58220176A (en) * | 1982-06-17 | 1983-12-21 | シャープ株式会社 | Liquid crystal display |
-
1986
- 1986-05-27 JP JP12162486A patent/JPS62278536A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58220176A (en) * | 1982-06-17 | 1983-12-21 | シャープ株式会社 | Liquid crystal display |
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