JPS6227645A - Gas sampling apparatus - Google Patents
Gas sampling apparatusInfo
- Publication number
- JPS6227645A JPS6227645A JP16714785A JP16714785A JPS6227645A JP S6227645 A JPS6227645 A JP S6227645A JP 16714785 A JP16714785 A JP 16714785A JP 16714785 A JP16714785 A JP 16714785A JP S6227645 A JPS6227645 A JP S6227645A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- measured
- dilution
- ejector
- mixer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Sampling And Sample Adjustment (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
本発明は、希釈用加圧流体の一部によりエゼクタを作動
させて被測定ガスを希釈混合器に送り込むようにしたガ
スサンプリング装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a gas sampling device in which an ejector is actuated by a portion of a pressurized dilution fluid to feed a gas to be measured into a dilution mixer. be.
「従来の技術とその問題点」
火力プラント、化学プラント等から排出されるいわゆる
オフガス等の中に、有害物質、例えば窒素酸化物（ＮＯ
Ｘ）、硫黄酸化物（ＳＯｘ）、粉塵等が含まれている場
合、その排出量等についての厳重な管理が要求される。"Conventional technology and its problems" Harmful substances such as nitrogen oxides (NO
X), sulfur oxides (SOx), dust, etc., strict control is required regarding their emissions.
そしてオフガスは、多くの場合、高温、高湿等の悪条件
下にあるため、オフガスの定量分析を行なうときには、
これを希釈して計測に適した条件の温度、濃度等にする
ことが必要である。Since off-gas is often under adverse conditions such as high temperature and high humidity, when performing quantitative analysis of off-gas,
It is necessary to dilute this to bring the temperature, concentration, etc. to conditions suitable for measurement.
第２図は、ガスサンプリング装置の従来例を示すもので
、電動等のポンプ１を運転したときに、オフガスライン
等のガス挿通系２から、被測定ガスを減圧状態で吸引し
、粗粒子除去器３と流量計４とを経由させた後、ポンプ
Ｉにより被測定ガスを加圧または常圧状態として、希釈
混合器５に送り込む一方、加圧気体供給系６からＮ２ガ
ス等を流量計７を介して希釈混合器５に送り込み、前記
被測定ガスに混合して希釈し、その希釈されたガスの一
部をサンプルガスとして、粒子分級装置８及び凝縮核測
定器９に送り、粒径分布の測定、微粒子の単位体積あた
りの個数測定等の所要の分析を実施するものである。ま
た、混合希釈された残りのガスは、適当な処理装置等に
より処理されるものである。Figure 2 shows a conventional example of a gas sampling device, in which when an electric pump 1 is operated, the gas to be measured is sucked under reduced pressure from a gas passage system 2 such as an off-gas line, and coarse particles are removed. After passing through the gas chamber 3 and the flow meter 4, the gas to be measured is pressurized or at normal pressure by the pump I and sent to the dilution mixer 5, while the N2 gas etc. is supplied from the pressurized gas supply system 6 to the flow meter 7. is sent to the dilution mixer 5 through the gas to be measured, mixed with the gas to be measured and diluted, and a part of the diluted gas is sent as a sample gas to the particle classifier 8 and the condensation nucleus measuring device 9 to measure the particle size distribution. The purpose is to carry out necessary analyzes such as measuring the number of microparticles per unit volume. Further, the remaining mixed and diluted gas is processed by an appropriate processing device or the like.
しかしながら、第２図例であると、減圧状態の被測定ガ
スの中に含まれている微粒子等は、特に、ポンプｌの狭
あい部分等の付近の流路壁に、水分等とともに付着する
現象が頻繁に発生して、微粒子等の一部が希釈混合器５
に送り込まれなくなる等の現象により、測定誤差が大き
くなる等の問題点を生じる。また、測定誤差を少なくす
るためには、被測定ガスの種類によって最適のガスサン
プリング装置を選定して、これらを使い分ける等の必要
性があった。However, in the example shown in Fig. 2, fine particles contained in the gas to be measured in a reduced pressure state adhere to the walls of the flow path, especially in the vicinity of the narrow part of the pump l, along with moisture, etc. occurs frequently, and some of the fine particles are diluted in the mixer 5.
Due to phenomena such as not being fed into the tank, problems such as increased measurement errors occur. Furthermore, in order to reduce measurement errors, it is necessary to select the most suitable gas sampling device depending on the type of gas to be measured and to use these appropriately.
「本発明の目的とその達成手段」
本発明は、このような従来技術の問題点を有効に解決し
て、■正確な希釈倍率を広範囲に得ること、■被測定ガ
スに圧力変動がともなっている場合等においてもサンプ
ルガス圧力を一定にすること、■サンプルガス収集時の
取り扱い性を向上させること等を目的としているもので
ある。``Objects of the present invention and means for achieving the same'' The present invention effectively solves the problems of the prior art as described above. ■ Obtaining an accurate dilution ratio over a wide range; The purpose of this is to keep the sample gas pressure constant even when the sample gas is being collected, and (1) to improve the ease of handling during sample gas collection.
これらの目的を達成するために、本発明は、被測定ガス
と加圧気体とを混合して分析用サンプルガス濃度まで希
釈する希釈混合器を設けるとともに、該希釈混合器と被
測定ガスの供給系との間に、加圧気体供給系から希釈混
合器に送られる希釈用気体の一部を駆動流体として作動
し、被測定ガスを希釈混合器に送り込むエゼクタを配設
し、エゼクタにおいて加圧気体の一部を被測定ガスの駆
動流体として使用することにより、被測定ガスの希釈と
加圧とを行ないながら狭あい部分を形成することなく希
釈混合器に送り込み、また、他の大部分の加圧気体によ
って、さらに混合と希釈を行なって、目的とする分析用
サンプルガスの濃度とするものである。In order to achieve these objectives, the present invention provides a dilution mixer that mixes a gas to be measured and a pressurized gas and dilutes it to a sample gas concentration for analysis, and also provides a dilution mixer that mixes a gas to be measured and a pressurized gas to dilute it to a sample gas concentration for analysis, and also provides a connection between the dilution mixer and the supply of the gas to be measured. A part of the dilution gas sent from the pressurized gas supply system to the dilution mixer is installed between the system and the ejector, which operates as a driving fluid to send the gas to be measured to the dilution mixer. By using a portion of the gas as the driving fluid for the gas to be measured, it is possible to dilute and pressurize the gas to be measured while feeding it into the dilution mixer without forming a constriction, and also to Further mixing and dilution are performed using pressurized gas to obtain the desired concentration of the sample gas for analysis.
「実施例」
以下、本発明のガスサンプリング装置の一実施例を第１
図に基づいて説明する。“Example” Hereinafter, an example of the gas sampling device of the present invention will be described as a first example.
This will be explained based on the diagram.
なお、該−実施例において、前述した従来例と共通する
部分には、同一の符号を付して説明を簡略化する。In addition, in this embodiment, the same reference numerals are given to the parts common to the conventional example described above to simplify the explanation.
第１図において、符号ＩＯはエゼクタであり、該エゼク
タＩＯは、前記ガス挿通系２と希釈混合器５との間に配
設されるとともに、その駆動流体供給系１１が、加圧気
体供給系６に連設されて、希釈用加圧気体の一部を利用
して作動するようになっている。また、前記粗粒子除去
器３とエゼクタＩＯとの間には、オリフィス流量計１２
が配設されて、その部分の小さな圧力の変化を差圧計１
３により電気信号に変換し、Ａ／Ｄ変換器１４を介して
中央処理装置（ＣＰＵ）１５に出力するようになってい
る。該中央処理装置１５には、記憶部１６及び記録部１
７等が接続されている。In FIG. 1, reference numeral IO denotes an ejector, and the ejector IO is disposed between the gas passage system 2 and the dilution mixer 5, and its driving fluid supply system 11 is a pressurized gas supply system. 6, and is operated using a part of the pressurized gas for dilution. Further, an orifice flow meter 12 is provided between the coarse particle remover 3 and the ejector IO.
is installed, and the differential pressure gauge 1 detects small pressure changes in that area.
3, the signal is converted into an electrical signal and output to a central processing unit (CPU) 15 via an A/D converter 14. The central processing unit 15 includes a storage section 16 and a recording section 1.
7 etc. is connected.
また、前記加圧気体供給系６は、Ｎ、ガス中の微粒子を
捕捉するための高性能フィルタ１９、圧力計２０、流量
計７等を備えていて、流量計７のデータは前記Ａ／Ｄ変
換器１４を介して中央処理装置１５に送られる。Further, the pressurized gas supply system 6 includes N, a high-performance filter 19 for capturing particulates in the gas, a pressure gauge 20, a flow meter 7, etc., and the data of the flow meter 7 is transmitted to the A/D. It is sent to the central processing unit 15 via the converter 14.
そして、希釈混合器５と流量計７とを接続、している加
圧気体供給管２１に、前記駆動流体供給系１１が分岐状
態に連結されるとともに、該駆動流体供給系１１には、
電磁バルブ２２が設けられる。The driving fluid supply system 11 is connected in a branched state to the pressurized gas supply pipe 21 that connects the dilution mixer 5 and the flow meter 7, and the driving fluid supply system 11 includes:
A solenoid valve 22 is provided.
該電磁パルプ２２には、中央処理装置１５からの指令信
号がＤ／Ａ変換器２３、増幅器２４を介して伝達され、
エゼクタＩＯの駆動流を調整するようになっている。A command signal from the central processing unit 15 is transmitted to the electromagnetic pulp 22 via a D/A converter 23 and an amplifier 24.
The driving flow of the ejector IO is adjusted.
なお、図中、符号２５は温度調節器、符号２６は複数の
保温器であり、中央処理装置１５の指令信号により、主
として測定用ガスの温度を設定範囲内に調整するもので
ある。In the figure, reference numeral 25 is a temperature regulator, and reference numeral 26 is a plurality of heat insulators, which mainly adjust the temperature of the measurement gas within a set range based on command signals from the central processing unit 15.
このように構成されているガスサンプリング装置におい
て、加圧気体供給系６とエゼクタ【０とを作動させると
、被測定ガスは、保温器２６によってその流路の途中に
おける保温（例えば２０℃ないし７００℃）がなされて
結露防止が図られるとともに、エゼクタＩＯによって吸
引されて、エゼクタ１０の部分でその駆動流体との混合
希釈がなされる。さらに、加圧状態（正圧伏＠）で希釈
混合器５に送り込まれ、加圧気体供給管２１を経由する
Ｎ、ガスにより希釈されて、必要な濃度まで導かれる。In the gas sampling device configured as described above, when the pressurized gas supply system 6 and the ejector 0 are operated, the gas to be measured is kept at a temperature (for example, 20°C to 700°C) in the middle of its flow path by the insulator 26. °C) to prevent condensation, and is also sucked by the ejector IO and mixed and diluted with the driving fluid in the ejector 10. Furthermore, it is fed into the dilution mixer 5 under pressure (positive pressure), diluted with N and gas via the pressurized gas supply pipe 21, and led to the required concentration.
このとき、例えば被測定ガスを２０°ＣのＮ、ガスで１
００倍に希釈する場合であると、オリフィス流量計１２
と流量計７との流量比を中央処理装置１５に設定してお
くことにより、自動的に希釈倍率の維持が行なわれると
ともに、サンプルガスの温度が希釈により低下して約２
７℃となる。At this time, for example, change the gas to be measured to N at 20°C,
In the case of dilution to 00 times, the orifice flow meter 12
By setting the flow rate ratio between the flow rate and the flow meter 7 in the central processing unit 15, the dilution ratio is automatically maintained, and the temperature of the sample gas decreases due to dilution to approximately 2.
The temperature will be 7℃.
エゼクタ１０による希釈作用について補足説明すると、
中央処理装置１５によって二つの流量計７・１２のデー
タを収集してその比を求め、当初の設定希釈倍率との差
があるときには、電磁バルブ２２を駆動してエゼクタ１
０の駆動流体を変えて、被測定ガスの流量を目的とする
流量まで調整するのであるが、加圧気体供給系６から送
り込まれる加圧気体の流量を流量計７で検出し、加圧流
体を駆動流体供給系１１と加圧気体供給管２１とで部分
した状態で希釈混合器５に送り込んでいるから、流量計
７による加圧気体供給系６の加圧気体の総量を一定とし
ておくと、エゼクタ１０の駆動流量をどのように変えて
も、希釈作用には影響を及ぼさない。したがって、エゼ
クタ１０により被測定ガスの吸引虫の調整範囲を極めて
大きなものとすることができる。A supplementary explanation of the dilution effect by the ejector 10 is as follows.
The central processing unit 15 collects data from the two flowmeters 7 and 12 to determine the ratio, and if there is a difference from the initially set dilution ratio, the solenoid valve 22 is driven to control the ejector 1.
The flow rate of the gas to be measured is adjusted to the target flow rate by changing the driving fluid of the pressurized gas supply system 6. Since it is sent to the dilution mixer 5 in a state where it is divided between the driving fluid supply system 11 and the pressurized gas supply pipe 21, if the total amount of pressurized gas in the pressurized gas supply system 6 measured by the flow meter 7 is kept constant, , no matter how the driving flow rate of the ejector 10 is changed, the dilution effect is not affected. Therefore, the ejector 10 allows the adjustment range of the suction of the gas to be measured to be extremely wide.
また、一実施例において、オリフィス流量計１２は、被
測定ガスがオリフィスを通過するときの圧力差を差圧計
１３によって検出する構造であるため、この部分におい
て、微粒子が付着堆積する現象の発生を、保温による結
露防止作用とともに抑制している。Furthermore, in one embodiment, the orifice flow meter 12 has a structure in which the differential pressure gauge 13 detects the pressure difference when the gas to be measured passes through the orifice, so that the occurrence of a phenomenon in which fine particles adhere and accumulate in this part is prevented. This suppresses condensation as well as prevents condensation through heat retention.
なお、一実施例では、中央処理装置Ｉ５によって、記憶
部Ｉ６による各データの収集、記録部１７による記録の
印字、表示、温度調節器５の駆動等がなし得るものであ
るが、本発明はこの技術例に限定するものではない。In one embodiment, the central processing unit I5 can collect each data by the storage unit I6, print and display records by the recording unit 17, drive the temperature regulator 5, etc., but the present invention The present invention is not limited to this technical example.
「発明の効果」
以上説明したように、本発明のガスサンプリング装置に
よれば、次のような優れた効果を奏することができる。"Effects of the Invention" As explained above, according to the gas sampling device of the present invention, the following excellent effects can be achieved.
■希釈ガスの一部をエゼクタの駆動流体として使用し、
この部分において混合と希釈とを行なうとともに、エゼ
クタの下流において正圧となるので、被測定ガス圧力の
変動による影響を受けず一定流棗を希釈混合器に導入し
得る。また、低圧力のサンプリングガスであっても安定
した状態で得ることができる。■Using part of the dilution gas as the driving fluid for the ejector,
Mixing and dilution are performed in this part, and a positive pressure is created downstream of the ejector, so that a constant flow of jujube can be introduced into the dilution mixer without being affected by fluctuations in the gas pressure to be measured. Moreover, even low-pressure sampling gas can be obtained in a stable state.
■エゼクタによって被測定ガスを希釈混合器に送り込む
ようにしているため、流路が円滑となり微粒子等の損失
が少ない。■Since the gas to be measured is sent to the dilution mixer by the ejector, the flow path becomes smooth and there is less loss of particulates, etc.
■前記理由により、被測定ガスの減圧雰囲気で微粒子等
が流路壁に付着する現象や、堆積する現象が起こりにく
くなり、精度を向上させることができる。(2) For the above reasons, it becomes difficult for particles to adhere to or accumulate on the channel wall in the reduced pressure atmosphere of the gas to be measured, and thus accuracy can be improved.
■エゼクタの駆動流体の量を変えろことにより、被測定
流量を調整することが容易であるとともに、エゼクタの
駆動流体は、希釈用加圧気体の一部を使用しており、そ
の量の制限がないため、希釈倍率の設定範囲を拡大し得
て、自動制御化を行なうことができる。■By changing the amount of driving fluid for the ejector, it is easy to adjust the flow rate to be measured, and the driving fluid for the ejector uses a part of the pressurized gas for dilution, so there is no limit to its amount. Therefore, the setting range of the dilution ratio can be expanded and automatic control can be performed.
■エゼクタの部分で被測定ガスと希釈用流体とを混合希
釈し、さらに、希釈混合器で混合希釈を行なうものであ
るから、サンプルガスの濃度の調整が容易であるととも
に、一定の混合希釈比を得ることができる。■The ejector mixes and dilutes the gas to be measured with the dilution fluid, and the dilution mixer further mixes and dilutes it, making it easy to adjust the sample gas concentration and maintain a constant mixing and dilution ratio. can be obtained.
■機械的駆動部分がなく、装置の単純化と故障発生の低
減とを図ることが容易であり、また、被測定流体の種類
を制限しないので、広範囲のガスサンプリング装置に適
用可能である。(2) Since there is no mechanically driven part, it is easy to simplify the device and reduce the occurrence of failures, and since it does not limit the type of fluid to be measured, it can be applied to a wide range of gas sampling devices.
第１図は本発明のガスサンプリング装置の一実施例を示
す配管系統図、第２図はガスサンプリング装置の従来例
を示す配管系統図である。
２・・・・・・ガス挿通系、３・・・・・・粗粒子除去
器、５・・・・・・希釈混合器、６・・・・・・加圧気
体供給系、７・・・・・・流量計、８・・・・・・粒子
分級装置、９・・・・・・凝縮核測定器、１０・・・・
・・エゼクタ、１１・・・・・・駆動流体供給系、１２
・・・・・・オリフィス流量計、１３・・・・・・差圧
計、１４・・・・・・Ａ／Ｄ変換器、１５・・・・・・
中央処理装置（ＣＰＵ）、１６・・・・・・記憶部、１
７・・・・・・記録部、１８・・・・・調圧弁、１９・
・・・・・高性能フィルタ、２ｏ・・・・・・圧力計、
２１・・・・・・加圧気体供給管、２２・・・・・・電
磁バルブ、２３・・・・・・Ｄ／Ａ変換器、２４・・・
・・・増幅器、２５・・・・・・温度調節器、２６・・
・・・・保温器。FIG. 1 is a piping system diagram showing one embodiment of the gas sampling device of the present invention, and FIG. 2 is a piping system diagram showing a conventional example of the gas sampling device. 2... Gas insertion system, 3... Coarse particle remover, 5... Dilution mixer, 6... Pressurized gas supply system, 7... ...Flowmeter, 8...Particle classifier, 9...Condensation nucleus measuring device, 10...
... Ejector, 11 ... Drive fluid supply system, 12
... Orifice flow meter, 13 ... Differential pressure gauge, 14 ... A/D converter, 15 ...
Central processing unit (CPU), 16... Storage section, 1
7... Recording section, 18... Pressure regulating valve, 19...
...High performance filter, 2o...Pressure gauge,
21... Pressurized gas supply pipe, 22... Solenoid valve, 23... D/A converter, 24...
...Amplifier, 25...Temperature controller, 26...
... Warmer.
Claims (1)
濃度まで希釈する希釈混合器を設けるとともに、該希釈
混合器と被測定ガスの供給系との間に、加圧気体供給系
から希釈混合器に送られる希釈用気体の一部を駆動流体
として作動し、被測定ガスを希釈混合器に送り込むエゼ
クタを配設したことを特徴とするガスサンプリング装置
。A dilution mixer that mixes the gas to be measured and the pressurized gas to dilute it to the sample gas concentration for analysis is provided, and a dilution mixer is provided between the dilution mixer and the supply system of the gas to be measured, and the dilution is carried out from the pressurized gas supply system. 1. A gas sampling device comprising an ejector that operates using a part of the dilution gas sent to the mixer as a driving fluid and sends the gas to be measured to the dilution mixer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16714785A JPS6227645A (en) | 1985-07-29 | 1985-07-29 | Gas sampling apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16714785A JPS6227645A (en) | 1985-07-29 | 1985-07-29 | Gas sampling apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6227645A true JPS6227645A (en) | 1987-02-05 |
Family
ID=15844293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16714785A Pending JPS6227645A (en) | 1985-07-29 | 1985-07-29 | Gas sampling apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6227645A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100781193B1 (en) | 2007-03-22 | 2007-11-30 | 이성만 | Microsample analysis device for analyzing density by inletting the microsample of atmosphere |
| JP4720967B2 (en) * | 2001-08-30 | 2011-07-13 | 株式会社Ｉｈｉ | Gas bleeder |
| CN103134903A (en) * | 2011-12-01 | 2013-06-05 | 北京航天试验技术研究所 | Atmosphere hydrogen concentration detector based on injection principle |
| JP2016061648A (en) * | 2014-09-17 | 2016-04-25 | 三菱重工業株式会社 | Gas sampling device and gas analysis method |
-
1985
- 1985-07-29 JP JP16714785A patent/JPS6227645A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4720967B2 (en) * | 2001-08-30 | 2011-07-13 | 株式会社Ｉｈｉ | Gas bleeder |
| KR100781193B1 (en) | 2007-03-22 | 2007-11-30 | 이성만 | Microsample analysis device for analyzing density by inletting the microsample of atmosphere |
| CN103134903A (en) * | 2011-12-01 | 2013-06-05 | 北京航天试验技术研究所 | Atmosphere hydrogen concentration detector based on injection principle |
| JP2016061648A (en) * | 2014-09-17 | 2016-04-25 | 三菱重工業株式会社 | Gas sampling device and gas analysis method |
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