JPS62273428A - Optical test circuit - Google Patents
Optical test circuitInfo
- Publication number
- JPS62273428A JPS62273428A JP11609186A JP11609186A JPS62273428A JP S62273428 A JPS62273428 A JP S62273428A JP 11609186 A JP11609186 A JP 11609186A JP 11609186 A JP11609186 A JP 11609186A JP S62273428 A JPS62273428 A JP S62273428A
- Authority
- JP
- Japan
- Prior art keywords
- optical
- waveguide
- test
- optical pulse
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 193
- 238000012360 testing method Methods 0.000 title claims abstract description 74
- 238000012544 monitoring process Methods 0.000 claims abstract description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 23
- 239000010453 quartz Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 17
- 238000011144 upstream manufacturing Methods 0.000 claims description 15
- 238000005452 bending Methods 0.000 claims description 3
- 238000004891 communication Methods 0.000 abstract description 9
- 238000003780 insertion Methods 0.000 abstract description 3
- 230000037431 insertion Effects 0.000 abstract description 3
- 239000013307 optical fiber Substances 0.000 description 23
- 230000005540 biological transmission Effects 0.000 description 20
- 239000010410 layer Substances 0.000 description 17
- 239000011521 glass Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 238000005253 cladding Methods 0.000 description 5
- 239000000835 fiber Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000008054 signal transmission Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000012792 core layer Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Testing Of Optical Devices Or Fibers (AREA)
- Optical Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
３、発明の詳細な説明
（産業上の利用分野）
本発明は、光伝送方式における送出光信号のモニタと光
フアイバ伝送路の障害点探索を行うための光試験回路に
関するものである。[Detailed Description of the Invention] 3. Detailed Description of the Invention (Field of Industrial Application) The present invention provides an optical test circuit for monitoring a transmitted optical signal in an optical transmission system and searching for a fault point in an optical fiber transmission line. It is related to.
（従来の技術）
第７図は従来の光試験回路の構成図であって、ｌａ、ｌ
ｂは電気信号（下り）、２と１２は電気−光変換器、３
は光信号（下り）、４と７は光合分波器、５は光試験回
路、６は光フアイバ伝送路、８と１４は光−電気変換器
、９は端末装置、１１ａ。(Prior Art) FIG. 7 is a configuration diagram of a conventional optical test circuit, in which la, l
b is an electrical signal (downstream), 2 and 12 are electrical-to-optical converters, 3
is an optical signal (downlink), 4 and 7 are optical multiplexers/demultiplexers, 5 is an optical test circuit, 6 is an optical fiber transmission line, 8 and 14 are optical-to-electrical converters, 9 is a terminal device, and 11a.
１１ｂは電気信号（上り）、１３は光信号（上り）、１
５はモニタ装置、１６は光分岐回路、１７は光パルス試
験器、１８は光合流目路である。11b is an electrical signal (upstream), 13 is an optical signal (upstream), 1
5 is a monitor device, 16 is an optical branch circuit, 17 is an optical pulse tester, and 18 is an optical convergence path.
局側での電話、ファクシミリ、画像などの電気信号（下
り）ｌａは、電気−光変換器２で光信号（下り）３に変
換される。光信号（下り）３は、光合分波器４と光試験
回路５を通過し、光フアイバ伝送路６に送出される。光
ファイバ伝・送路６で伝送された光信号（下り）３は、
加入者側において光合分波器７を通り、光−電気変換器
８て電気信号（下り）ｌｂに変換され、最終的には電話
、ファクシミリ、画像の情報として端末装置９から出力
される。一方、加入者側からの電話、ファクシミリ、画
像の情報は、まず電気信号（上り）１１ａとして電気−
光変換器１２に人力され、光信号（上り）１３に変換さ
れる。光信号（上り）１３は光合分波器７を介して光フ
アイバ伝送路６に送出される。An electrical signal (downstream) la such as a telephone, facsimile, image, etc. at the office side is converted into an optical signal (downstream) 3 by an electrical-to-optical converter 2 . The optical signal (downlink) 3 passes through an optical multiplexer/demultiplexer 4 and an optical test circuit 5, and is sent to an optical fiber transmission line 6. The optical signal (downlink) 3 transmitted through the optical fiber transmission/transmission line 6 is
On the subscriber side, the signal passes through an optical multiplexer/demultiplexer 7, is converted into an electric signal (downstream) lb by an optical-electrical converter 8, and is finally outputted from a terminal device 9 as telephone, facsimile, and image information. On the other hand, telephone, facsimile, and image information from the subscriber side is first sent to the electrical network as an electrical signal (upstream) 11a.
The signal is input to an optical converter 12 and converted into an optical signal (upstream) 13. The optical signal (upstream) 13 is sent to the optical fiber transmission line 6 via the optical multiplexer/demultiplexer 7.
この光信号（上り）１３は、局側において光試験回路５
と光合分波器４を通過し、光−電気変換器１４により電
気信号（上り）１１ｂになり、加入者側からの各種情報
が局側に送られる。This optical signal (upstream) 13 is sent to an optical test circuit 5 at the office side.
The signal passes through the optical multiplexer/demultiplexer 4, becomes an electrical signal (upstream) 11b by the optical-to-electrical converter 14, and various information from the subscriber side is sent to the station side.
障害の発生事例を見てみると、光フアイバ伝送路が完全
に断線する場合よりも、通信は一応可能ではあるが、光
フアイバ伝送路の損失が増加したり、その特性が不安定
になったりする場合が多いので、通信状態を保ったまま
試験を行なえることが望ましい。そのため光試験回路５
が使われる。Looking at cases of failure, we find that communication is still possible, but the loss of the optical fiber transmission line increases or its characteristics become unstable, rather than the case where the optical fiber transmission line is completely disconnected. Therefore, it is desirable to be able to perform tests while maintaining communication status. Therefore, the optical test circuit 5
is used.
これは光信号（下り）３のモニタのための光分岐回路１
６と障害点探索のための光合流目路１８とからなる。This is optical branch circuit 1 for monitoring optical signal (downstream) 3.
6 and a light merging path 18 for searching for a fault point.
従来、光分岐回路１６には１〜数％程度の所要の反射率
を有するバルク形の多層膜反射ミラーが用いられている
。それにより光信号（下り）３の１〜１０％をモニタ光
として取り出し、モニタ回路１５に入力して光信号（下
り）３の送出状況をモニタする。また光合流目路１８に
は反射率５０％のバルク形多層膜反射ミラーが用いられ
ている。障害点探索は、光パルス試験器１７からの試験
光パルスを反射ミラーの光合流目路１８を介して光フア
イバ伝送路６に送出し、この試験光パルスによって生じ
る光フアイバ伝送６路中での後方散乱光を上記光合流目
路１８を介して光パルス試験器１７で受信して行われる
。Conventionally, the optical branching circuit 16 uses a bulk type multilayer reflective mirror having a required reflectance of about 1 to several percent. Thereby, 1 to 10% of the optical signal (downstream) 3 is taken out as monitor light and input to the monitor circuit 15 to monitor the transmission status of the optical signal (downstream) 3. Further, a bulk type multilayer film reflection mirror with a reflectance of 50% is used in the light convergence channel 18. The fault point search is performed by sending a test light pulse from the light pulse tester 17 to the optical fiber transmission line 6 via the optical convergence path 18 of the reflecting mirror, and detecting the damage caused by this test light pulse in the six optical fiber transmission lines. The backscattered light is received by the optical pulse tester 17 via the optical convergence path 18 and performed.
後方散乱光の受信例を第８図に示す。図示のようにコネ
クタ１０や破断点Ａにおいては、受信レベルが不連続に
減少するので、その受光レベルの変動量からコネクタ１
０の不良や光フアイバ破断などの障害を検知する。ここ
で、後方散乱光の戻り時間Ｔと距離りの間には、ｎを光
ファイバの屈折率、Ｃを光速として、Ｌ＝ｃＴ／（２ｎ
）の関係があり、従って障害点の位置を特定できる。FIG. 8 shows an example of receiving backscattered light. As shown in the figure, the reception level decreases discontinuously at the connector 10 and the breaking point A, so the connector 1
Detects failures such as zero defects and optical fiber breaks. Here, between the return time T of the backscattered light and the distance, L=cT/(2n
), and therefore the location of the failure point can be identified.
ところで従来の光試験回路の光合流目路１８は５０％反
射率の反射ミラーで構成されているので、次のような欠
点があった。By the way, since the light convergence path 18 of the conventional optical test circuit is constituted by a reflecting mirror having a reflectance of 50%, it has the following drawbacks.
■光パルス試験時の試験光パルスのＺの光パワーだけが
光フアイバ伝送路６に人力され、残りの２の光パワーが
損失になる。また光フアイバ伝送路６から戻る後方散乱
光についても２の光パワーだけが光パルス試験器１７に
人力され、残りの２の光パワーは光合分波器４側へ漏れ
て損失になる。すなわち反射ミラーを使っているので、
光パルス試験では６ｄＢの損失が避けられず、障害点検
知が困難になっている。(2) Only the Z optical power of the test optical pulse during the optical pulse test is input to the optical fiber transmission line 6, and the remaining 2 optical powers become losses. Also, regarding the backscattered light returning from the optical fiber transmission line 6, only two optical powers are input to the optical pulse tester 17, and the remaining two optical powers leak to the optical multiplexer/demultiplexer 4 side and become a loss. In other words, since a reflective mirror is used,
In optical pulse tests, a loss of 6 dB is unavoidable, making it difficult to detect fault points.
■光信号（下り）３および光信号（上り）１３は、光合
流目路１８で％の光パワーが失われ３ｄＢの損失が避け
られない。そのため伝送距離が短くなる。(2) In the optical signal (downstream) 3 and the optical signal (upstream) 13, % of the optical power is lost in the optical converging path 18, and a loss of 3 dB is unavoidable. Therefore, the transmission distance becomes shorter.
また従来の光試験回路の光分岐回路１６と光合流目路１
８にバルク形の反射ミラーを使っているので、光ファイ
バとの接続部に平行光ビームにするためのレンズ系が不
可欠であり、反射ミラーとレンズ系と光ファイバとの位
置合わせの工程に熟練と長時間を要する欠点があった。In addition, the optical branch circuit 16 and the optical convergence path 1 of the conventional optical test circuit
Since a bulk-type reflective mirror is used in step 8, a lens system to create a parallel light beam is essential at the connection point with the optical fiber, and the process of aligning the reflective mirror, lens system, and optical fiber requires skill. The drawback was that it required a long time.
またバルク形の反射ミラーを使った構成のため小型化で
きない欠点があった。Furthermore, since the structure uses a bulk reflecting mirror, it has the disadvantage that it cannot be miniaturized.
また従来は光パルス試験の波長について特別に配慮され
ておらず、通常使用レーザの仕様を統一して安価にする
ため光信号（上り）または光信号（下り）の波長と一致
させていた。そのため光パルス試験時には、光通信サー
ビスを切断して障害点探索をしなければならない欠点が
あった。Furthermore, in the past, no special consideration was given to the wavelength of the optical pulse test, and the wavelength of the optical signal (upstream) or optical signal (downstream) was made to match the wavelength of the optical signal (upstream) or optical signal (downstream) in order to standardize the specifications of commonly used lasers and make them cheaper. Therefore, during optical pulse testing, there was a drawback that the optical communication service had to be disconnected to search for the point of failure.
（発明が解決しようとする問題点）
本発明は、挿入損失が小さく、かつ光通信サービスの切
断を伴わない、光信号のモニタならびに障害点探索用の
光試験回路を提供することにある。(Problems to be Solved by the Invention) An object of the present invention is to provide an optical test circuit for monitoring optical signals and searching for failure points, which has low insertion loss and does not involve disconnection of optical communication services.
（問題点を解決するための手段）
本発明は、反射ミラーを用いたモニタ用の光分岐回路と
光波長フィルタを用いた光パルス試験用の光合流回路を
組み合わせて光回路を構成し、試験光パルスの波長を光
信号の波長と異なる波長に設定し、光回路を導波路構造
で製作する。(Means for Solving the Problems) The present invention configures an optical circuit by combining an optical branching circuit for monitoring using a reflecting mirror and an optical converging circuit for optical pulse testing using an optical wavelength filter. The wavelength of the optical pulse is set to a wavelength different from that of the optical signal, and the optical circuit is fabricated with a waveguide structure.
すなわち一直線状の導波路と、この導波路に対して折れ
曲がりの向きが反対になるように、かつ互いに位置を離
して配置されたモニタ用導波路と、光試験用導波路とを
基板上に一体に形成する。そして前記一直線状の導波路
とモニタ用導波路の交差点に、モニタ用の反射ミラーを
設置し、また前記一直線状の導波路と試験用導波路の交
差点に、光信号（上り）および光信号（下り）を透過し
、かつこれらの光信号と異なる波長を有する試験光パル
スを反射する光波長フィルタを設置する。In other words, a linear waveguide, a monitoring waveguide whose bending direction is opposite to the waveguide, and an optical test waveguide arranged at a distance from each other are integrated on a substrate. to form. A reflective mirror for monitoring is installed at the intersection of the linear waveguide and the monitoring waveguide, and an optical signal (upstream) and an optical signal ( An optical wavelength filter is installed that transmits a test optical pulse (downstream) and reflects a test optical pulse having a wavelength different from these optical signals.
従来の技術とは、光波長フィルタによる光合流回路の使
用と適切な波長の試験光パルスの使用が異なっており、
それによって、従来避けられなかった光信号に対する３
ｄＢの損失と試験光パルスに対する６ｄＢの損失を除去
でき、低損失の光試験回路を実現できる。また導波路構
造を使った点が従来技術と異なっており、それによって
光試験回路の生産性の向上と小型化が達成される。The difference from conventional technology is the use of an optical combining circuit with an optical wavelength filter and the use of a test optical pulse of an appropriate wavelength.
As a result, 3
A dB loss and a 6 dB loss for the test optical pulse can be removed, and a low-loss optical test circuit can be realized. The present invention also differs from conventional technology in that it uses a waveguide structure, thereby achieving improved productivity and miniaturization of the optical test circuit.
第１図は本発明の第１の実施例の斜視図であって、１９
．２４．２７は光ファイバ、２０は入力ポート、２１ａ
〜２１ｅは導波路、２２はモニタ用の反射ミラー、２３
はモニタポート、２５は光パルス試験用の光波長フィル
タ、２６は出力ポート、２８は光パルス試験ポート、３
３はファイバガイドである。FIG. 1 is a perspective view of a first embodiment of the present invention, 19
．． 24.27 is an optical fiber, 20 is an input port, 21a
~21e is a waveguide, 22 is a reflective mirror for monitoring, 23
is a monitor port, 25 is an optical wavelength filter for optical pulse testing, 26 is an output port, 28 is an optical pulse test port, 3
3 is a fiber guide.
光信号（下り）３は、光合分波器４を通り、光ファイバ
１９により光試験回路５の人力ポート２０に人力され、
導波路２１ａを通り、モニタ用の反射ミラー２２に達す
る。ここで、光信号（下り）３の一部の光パワーが反射
され、モニタ光として導波路２１ｂ１モニタポート２３
、光ファイバ２４を経由してモニタ装置１５に人力され
、光信号（下り）３の送出状態がモニタされる。一方、
大部分の光信号（下り）３は、導波路２１０１光パルス
試験用の光波長フィルタ２５、導波路２１ｄ、出力ポー
ト２６を経由し、光フアイバ伝送路６に送出される。The optical signal (downstream) 3 passes through the optical multiplexer/demultiplexer 4 and is inputted to the manual port 20 of the optical test circuit 5 via the optical fiber 19.
The light passes through the waveguide 21a and reaches the reflective mirror 22 for monitoring. Here, part of the optical power of the optical signal (downstream) 3 is reflected and sent to the waveguide 21b1 monitor port 23 as monitor light.
, is manually input to the monitor device 15 via the optical fiber 24, and the sending state of the optical signal (downlink) 3 is monitored. on the other hand,
Most of the optical signal (downstream) 3 is sent to the optical fiber transmission line 6 via the waveguide 2101, the optical wavelength filter 25 for optical pulse testing, the waveguide 21d, and the output port 26.
光パルス試験器１７からの試験光パルスは、元ファイバ
２７、光パルス試験ポート２８、導波路２１ｅを経由し
、光波長フィルタ２５ですべての光パワーが反射され、
導波路２１ｄ１出力ポート２６を通って光フアイバ伝送
路６に出力される。そして光フアイバ伝送路６中で生じ
た後方散乱光は逆の経路を経て光パルス試験器１７に人
力される。The test light pulse from the light pulse tester 17 passes through the original fiber 27, the light pulse test port 28, and the waveguide 21e, and all the light power is reflected by the light wavelength filter 25.
The signal is output to the optical fiber transmission line 6 through the waveguide 21d1 output port 26. The backscattered light generated in the optical fiber transmission line 6 is inputted to the optical pulse tester 17 via the reverse path.
第１図に示す光試験回路５は、次のようになっている。The optical test circuit 5 shown in FIG. 1 is constructed as follows.
ファイバガイド３３は、導波路形成時に同時に加工して
設けたもので、このガイド間の溝に光ファイバ１９を挿
入するだけで導波路２１ａとの位置合わせが行われるよ
うにして、アライメント工程を簡単化している。The fiber guide 33 is processed and provided at the same time as the waveguide is formed, and alignment with the waveguide 21a is performed simply by inserting the optical fiber 19 into the groove between the guides, simplifying the alignment process. It has become
導波路２１ｂと２１ｅの位置を離すとともに、これらの
導波路の折れ曲がりの向きが反対になるように、これら
の導波路を「ハ」の字状に配置することによ、す、導波
路２１ｅ中を伝搬し、光波長フィルタ２５で完全に反射
しきれなかった試験光パルスおよび光波長フィルタ２５
によって生じた前方散乱光が、クロストーク光としてモ
ニタ用の導波路２１ｂに入らないようにした。測定によ
れば、このクロストークは測定限界の一６５ｄＢ以下と
微小であった。By separating the waveguides 21b and 21e and arranging them in a V-shape so that the bending directions of these waveguides are opposite, the center of the waveguide 21e is The test light pulse that propagated and was not completely reflected by the light wavelength filter 25 and the light wavelength filter 25
The forward scattered light generated by this is prevented from entering the monitoring waveguide 21b as crosstalk light. According to measurements, this crosstalk was minute, less than the measurement limit of 65 dB.
次に８１基板上の石英系先導波路を使った光試験回路に
より、各構成要素の構造を詳しく説明する。Next, the structure of each component will be explained in detail using an optical test circuit using a quartz-based guiding waveguide on an 81 substrate.
導波路２Ｌａ〜２１ｅの構造の断面を第２図に示す。FIG. 2 shows a cross section of the structure of waveguides 2La to 21e.
第２図において、２９はＳｉ基板、３０は石英バッファ
層、３１は石英系コア、３２は石英クラッド層である。In FIG. 2, 29 is a Si substrate, 30 is a quartz buffer layer, 31 is a quartz core, and 32 is a quartz cladding layer.
Ｓｉ基板２９上に、石英バッファ眉、石英系コア層の順
で火炎直接堆積法により形成した平面状の石英系先導波
膜を反応性イオンエツチング法で所定の幅でＳｉ基板の
表面までエツチングし、その後、ＣＶＤ法により石英系
コア３１の上部と側面を石英膜で覆って石英クラッド層
３２とした。各部のガラス組成と形状は以下の通りであ
る。A planar quartz-based waveguide film is formed on the Si substrate 29 by a flame direct deposition method in the order of a quartz buffer layer and a quartz-based core layer, and is etched to the surface of the Si substrate to a predetermined width using a reactive ion etching method. Thereafter, the top and side surfaces of the quartz-based core 31 were covered with a quartz film to form a quartz cladding layer 32 using a CVD method. The glass composition and shape of each part are as follows.
石英バッファ層・・・ＳｉＯ。ガラス、１０μｍ［石英
系コア・・・ＳｌＯ□・ＴｌＯ□ガラス、４５μｍ幅×
４５μｍ厚
石英クラッド層・・・５ｉｎ２ガラス、３μｍ厚なお（
石英系コアと石英バッファ層）および（石英系コアと石
英クラッド層）の比屈折率差はそれぞれ共に１％とした
。Quartz buffer layer...SiO. Glass, 10 μm [quartz core...SlO□・TlO□ glass, 45 μm width×
45μm thick quartz cladding layer...5in2 glass, 3μm thick (
The relative refractive index differences between (the quartz core and the quartz buffer layer) and (the quartz core and the quartz cladding layer) were both 1%.
モニタ用の反射ミラー２２にはＧＧＧまたは高屈折率ガ
ラスの厚さ５０μｍ程度の薄片を用い、導波路中に設け
た反射ミラー用の溝中にこの薄片を挿入し、接着剤で固
定した。ここで、導波路２１ａと２１ｂの間の角θ１は
３０°に設定し、上記反射ミラー用の溝は導波路２１ａ
の軸方向に対して１５°になるように設定した。ＧＧＧ
を用いた場合、約２％のフレネル反射によるモニタ光が
、また屈折率１．８〜２．０のガラスを用いた場合、約
０．８〜２％のモニタ光が得られた。なお１〜数層のＳ
ｌＯ□・Ｔ１０□交互多層膜による多層膜ミラーを用い
てもよい。この場合０〜１０％程度のモニタ光が得られ
る。A thin piece of GGG or high refractive index glass with a thickness of about 50 μm was used as the reflective mirror 22 for monitoring, and this thin piece was inserted into a groove for the reflective mirror provided in the waveguide and fixed with an adhesive. Here, the angle θ1 between the waveguides 21a and 21b is set to 30°, and the groove for the reflective mirror is formed in the waveguide 21a.
The angle was set at 15° with respect to the axial direction. GGG
When a glass with a refractive index of 1.8 to 2.0 was used, a monitor light of about 2% was obtained due to Fresnel reflection, and when a glass having a refractive index of 1.8 to 2.0 was used, a monitor light of about 0.8 to 2% was obtained. In addition, one to several layers of S
A multilayer mirror made of alternating lO□ and T10□ multilayer films may also be used. In this case, approximately 0 to 10% of the monitor light can be obtained.
光パルス試験用の光波長フィルタ２５には、２０層以上
のＳｉＤ□・ＴｌＯ□交互多層膜による長波長通過光波
長フィルタを用いた。この実施例では光信号（下り）に
波長１．２μｍ、光信号（上り）に波長１．３ μｍを
用い、試験光パノνスに０．８５μｍを用いた。そこで
光波長フィルタには、第３図に示すように、力・ｌトオ
フ波長約１μｍのものを用いた。As the optical wavelength filter 25 for the optical pulse test, a long wavelength passing optical wavelength filter made of an alternating multilayer film of 20 or more layers of SiD□ and TlO□ was used. In this example, a wavelength of 1.2 μm was used for the optical signal (downstream), a wavelength of 1.3 μm was used for the optical signal (upstream), and a wavelength of 0.85 μm was used for the test light panosus. Therefore, as shown in FIG. 3, an optical wavelength filter with a power-off wavelength of about 1 μm was used.
この長波長通過光波長フィルタは透過率０％では全反射
するので、前記のように試験光パルスと後方散乱光はす
べて反射され、一方、光信号（上り：下り）はすべて通
過する。この光波長フィルタ２２も厚さ５０μｍ程度の
薄片にし、導波路２１Ｃの軸方向に対して１５°になる
ように形成した光波長フィルタ用の溝中に挿入し、接着
剤で固定した。すなわちここで、導波路２１ｄと２１６
の間の角θ２は３０゜に設定した。Since this long-wavelength passing light wavelength filter causes total reflection when the transmittance is 0%, the test light pulse and backscattered light are all reflected as described above, while all the optical signals (upstream/downstream) are passed through. This optical wavelength filter 22 was also made into a thin piece with a thickness of about 50 μm, inserted into an optical wavelength filter groove formed at an angle of 15° with respect to the axial direction of the waveguide 21C, and fixed with an adhesive. That is, here, the waveguides 21d and 216
The angle θ2 between them was set to 30°.
以上述べたような構成にしたことにより、従来の光試験
器で問題になっていた光信号（上り、下り）の３ｄＢの
損失は無くなり、また光パルス試験での６ｄＢの損失も
無くなる。With the configuration described above, the 3 dB loss of optical signals (up and down), which was a problem with conventional optical testers, is eliminated, and the 6 dB loss in optical pulse testing is also eliminated.
また試験光パルスおよび後方散乱光が局側の光−電気変
換器および電気−光変換器に入らないので、光パルス試
験時においても、局側の光信号送受信は正常に行われる
。加入者側の光合分波器７（第７図）の直前に光波長フ
ィルタ２５（第１図）と同一の光波長フィルタを１枚挿
入しておくことにより、加入者側の光−電気変換器およ
び電気−光変換器に試験パルス光が入らないようにでき
るので、光パルス試験時においても、加入者側の光信号
送受信は正常に行われる。その結果、局側と加入者側で
の光通信サービスを切断することなく、通信状態を保っ
たままで、任意の時に障害点探索ができる。Further, since the test light pulse and the backscattered light do not enter the optical-to-electrical converter and the electrical-to-optical converter at the central office, optical signal transmission and reception at the central office are performed normally even during the optical pulse test. By inserting one optical wavelength filter identical to the optical wavelength filter 25 (Fig. 1) immediately before the optical multiplexer/demultiplexer 7 (Fig. 7) on the subscriber side, optical-to-electrical conversion on the subscriber side can be achieved. Since the test pulse light can be prevented from entering the device and the electro-optical converter, optical signal transmission and reception on the subscriber side can be performed normally even during the optical pulse test. As a result, the point of failure can be searched for at any time while maintaining the communication state without disconnecting the optical communication service between the station and subscriber sides.
第４図は本発明の第２の実施例の斜視図である。FIG. 4 is a perspective view of a second embodiment of the invention.
これは、第１の実施例で述べたモニタ用の反射ミラーの
機能と光パルス試験用の光波長フィルタの機能を、１枚
の光フィルタ３４に持たせることにより、光回路の構成
を簡略化したものである。This simplifies the configuration of the optical circuit by providing a single optical filter 34 with the function of a reflective mirror for monitoring and the function of an optical wavelength filter for optical pulse testing as described in the first embodiment. This is what I did.
光フィルタ３４には、第５図に示すように、基板３４ａ
上に３１０□−ＴｉＯ□交互多層膜フィルタ３４ｂを形
成したものを用いる。ここで基板３４ａにＧＧＧや高屈
折率ガラスを用いることにより、基板の裏面３４Ｃに反
射ミラー機能を、また基板の表面３４ｄに光波長フィル
タ機能を持たせた。Ｓｉ基板上に「×」字状に導波路を
形成し、その交差部に設けた溝中に上記光フィルタ３４
を挿入、固定して光試験回路を製作した。導波路（２１
ａと２１ｂ）および（２１ｅと２１ｄ）のなす角は３０
°にした。この光試験回路の機能は第１の実施例と同様
であるが、試験光パルスが光フィルタ３４を漏れてモニ
タ装置１５に入る恐れがある。As shown in FIG. 5, the optical filter 34 includes a substrate 34a.
A filter on which a 310□-TiO□ alternating multilayer filter 34b is formed is used. By using GGG or high refractive index glass for the substrate 34a, the back surface 34C of the substrate has a reflecting mirror function, and the front surface 34d of the substrate has a light wavelength filter function. A waveguide is formed in the shape of an "X" on the Si substrate, and the optical filter 34 is placed in a groove provided at the intersection of the waveguide.
An optical test circuit was fabricated by inserting and fixing. Waveguide (21
The angle between a and 21b) and (21e and 21d) is 30
I made it to °. Although the function of this optical test circuit is similar to that of the first embodiment, there is a risk that the test light pulse may leak through the optical filter 34 and enter the monitor device 15.
従って、モニタに必要とされるＳ’／Ｎが充分に得られ
るだけのモニタ光パワーが許される場合に、この第２の
実施例は有用である。Therefore, this second embodiment is useful when the monitor optical power is allowed to be sufficient to obtain the S'/N required for the monitor.
なお光フィルタ３４には、第６図に示すように、基板３
４Ｈの上に反射ミラーの機能を有する１〜数層の８１０
□−丁ｌＯ７交互多層膜３４ｅを積層し、その上に波長
の１〜数倍の厚さのＳｉＯ□分離層３４ｆを積層し、そ
の上に光波長フィルタ機能を有する２０層以上のＳｉＯ
□−ＴｉＯ□交互多層膜フィルタ３４ｂを積層したもの
を用いてもよい。この場合にはモニタ光は交互多層膜３
４ｅの層数や膜厚の調整によって０〜ｌＯ％程度の任意
のものが得られる。Note that the optical filter 34 includes a substrate 3 as shown in FIG.
One to several layers of 810 having the function of a reflective mirror on top of 4H
A □-1O7 alternating multilayer film 34e is laminated, a SiO□ separation layer 34f having a thickness of one to several times the wavelength is laminated thereon, and 20 or more SiO layers having an optical wavelength filter function are laminated thereon.
A stack of □-TiO□ alternating multilayer filters 34b may be used. In this case, the monitor light is the alternating multilayer film 3
By adjusting the number of layers and film thickness of 4e, an arbitrary value of about 0 to 10% can be obtained.
（発明の効果）
以上説明したように、本発明の光試験回路は、モニタ用
の反射ミラーと光パルス試験用の光波長フィルタを先導
波回路内に挿入した構造、または反射ミラーと光波長フ
ィルタの機能を兼ね合わせた１枚の光フィルタを光導波
回路に挿入した構造にし、さらに試験光パルスの波長を
光信号（上り、下り）の波長と故意に異なるようにした
光試験回路であるので、光信号（上り、下り）に対する
光試験回路の損失を零にまで低減でき、その結果、伝送
距離を延長できる利点がある。さらに光パルス試験にお
ける損失も零にまで低減できるので、光パルス試験器に
大出力のものを必要とせず、また障害点探索の精度が向
上し、また長距離の障害点探索が可能になる利点がある
。(Effects of the Invention) As explained above, the optical test circuit of the present invention has a structure in which a reflecting mirror for monitoring and an optical wavelength filter for optical pulse testing are inserted into a leading wave circuit, or a reflecting mirror and an optical wavelength filter. This optical test circuit has a structure in which a single optical filter that has the functions of This has the advantage that the loss of the optical test circuit for optical signals (up and down) can be reduced to zero, and as a result, the transmission distance can be extended. Furthermore, the loss in optical pulse testing can be reduced to zero, which eliminates the need for a high-output optical pulse tester, improves the accuracy of failure point detection, and has the advantage of enabling long-distance failure point detection. There is.
また加入者側の光回路の直前に試験光パルスを遮断する
光波長フィルタを１枚設置するだけで、局側と加入者側
の光通信サービスを切断することなく、任意の時に障害
点探索ができる利点がある。In addition, by simply installing a single optical wavelength filter that blocks the test optical pulse just before the optical circuit on the subscriber side, you can search for fault points at any time without disconnecting the optical communication service between the station and subscriber sides. There are advantages that can be achieved.
また光導波路を基本とした光回路構成のため、小型で量
産できる利点がある。Furthermore, since it has an optical circuit configuration based on optical waveguides, it has the advantage of being compact and mass-produced.
第１図は本発明の第１の実施例の斜視図、第２図は石英
系導波路の断面図、
第３図は光波長フィルタの特性を説明するための図、
第４図は本発明の第２の実施例の斜視図、第５および第
６図は光フィルタの構成図、第７図は従来の光試験回路
の構成図、
第８図は光パルス試験を説明するための図である。
ｌａ、 ｌｂ・・・電気信号（下り’） ２．１２・・
・電気−光変換器３・・・光信号（下り）４，７・・・
光合分波器５・・・光試験回路 ６・・・光フ
アイバ伝送路８．１４・・・光−電気変換器 ９・・
・端末装置１０・・・コネクタ
１１ａ、 Ｉｌｂ・・・電気信号（上り）１３・・・光
信号（上り）１５・・・モニタ装置１６・・・光分岐回
路 １７・・・光パルス試験器１８・・・光合
流回路 １９．２４．２７・・・光ファイバ２
０・・・人カポ−） ２１ａ〜２１ｅ・・・
導波路２２・・・反射ミラー ２３・・・モニ
タポート２５・・・光波長フィルタ ２６・・・出
力ポート２８・・・光パルス試験ポート２９・・・Ｓｉ
基板３０・・・石英バッファ層 ３１・・・石英系
コア３２・・・石英クラッド層 ３３・・・ファイ
バガイド３４・・・光フィルタ ３４ａ・・・
基板３４ｂ・・・Ｓ１０□−ＴｌＯ□交互多層膜フィル
タ３４Ｃ・・・基板の裏面 ３４ｄ・・・基板の
表面３４ｅ・・・５ｉＯ７−Ｔｉｎ□交互多層膜３４ｆ
・・・ＳｌＯ□の分離層
第７図
渣１牽（％）Fig. 1 is a perspective view of the first embodiment of the present invention, Fig. 2 is a cross-sectional view of a silica waveguide, Fig. 3 is a diagram for explaining the characteristics of an optical wavelength filter, and Fig. 4 is a diagram of the present invention. 5 and 6 are configuration diagrams of an optical filter, FIG. 7 is a configuration diagram of a conventional optical test circuit, and FIG. 8 is a diagram for explaining an optical pulse test. be. la, lb...electrical signal (downstream') 2.12...
・Electrical-optical converter 3... Optical signal (down) 4, 7...
Optical multiplexer/demultiplexer 5... Optical test circuit 6... Optical fiber transmission line 8.14... Optical-electrical converter 9...
・Terminal device 10... Connector 11a, Ilb... Electric signal (up) 13... Optical signal (up) 15... Monitor device 16... Optical branch circuit 17... Optical pulse tester 18 ...Optical merging circuit 19.24.27...Optical fiber 2
0...person capo) 21a~21e...
Waveguide 22... Reflection mirror 23... Monitor port 25... Optical wavelength filter 26... Output port 28... Optical pulse test port 29... Si
Substrate 30...Quartz buffer layer 31...Quartz core 32...Quartz cladding layer 33...Fiber guide 34...Optical filter 34a...
Substrate 34b...S10□-TlO□Alternating multilayer film filter 34C...Back surface of substrate 34d...Substrate surface 34e...5iO7-Tin□Alternating multilayer film 34f
... Separation layer of SlO□ Fig. 7 residue 1 ratio (%)
Claims (1)
波路と、この導波路に対して折れ曲がりの向きが反対に
なるように、かつ互いに位置を離して配置されたモニタ
用導波路と、光試験用導波路とが基板上に一体に形成さ
れ、前記一直線状の導波路とモニタ用導波路の交差点に
、モニタ用の反射ミラーを設置し、また前記一直線状の
導波路と光試験用導波路の交差点に、光信号（上り）お
よび光信号（下り）を透過し、かつこれらの光信号と異
なる波長を有する試験光パルスを反射する光波長フィル
タを設置したことを特徴とする光試験回路。 ２、入射光信号を受け、出射光信号を送る一直線状の導
波路と、この導波路に交差し、かつこの交差点で互いに
対向して一直線状に配置されたモニタ用導波路と、光試
験用導波路とが基板上に一体に形成され、前記交差点に
、モニタ用の反射ミラーの機能と、光信号（上り）およ
び光信号（下り）を透過し、かつ試験光パルスを反射す
る光波長フィルタ機能とを有する光フィルタを設置した
ことを特徴とする光試験回路。 ３、特許請求の範囲第１項または第２項記載の光試験回
路において、導波路に石英系導波路を用いたことを特徴
とする光試験回路。[Claims] 1. A linear waveguide that receives an incident optical signal and sends an output optical signal, and is arranged so that the bending directions are opposite to the waveguide and are spaced apart from each other. A monitoring waveguide and an optical test waveguide are integrally formed on a substrate, and a reflecting mirror for monitoring is installed at the intersection of the linear waveguide and the monitoring waveguide, and At the intersection of the waveguide and the optical test waveguide, an optical wavelength filter was installed that transmits the optical signal (upstream) and optical signal (downstream) and reflects the test optical pulse having a different wavelength from these optical signals. An optical test circuit characterized by: 2. A straight waveguide that receives an incident optical signal and sends an output optical signal, a monitoring waveguide that intersects this waveguide and is arranged in a straight line facing each other at the intersection, and a waveguide for optical testing. The waveguide is integrally formed on the substrate, and at the intersection, there is an optical wavelength filter that functions as a reflective mirror for monitoring and that transmits the optical signal (upstream) and optical signal (downstream) and reflects the test optical pulse. An optical test circuit characterized by having an optical filter installed therein. 3. An optical test circuit according to claim 1 or 2, characterized in that a quartz-based waveguide is used as the waveguide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11609186A JPS62273428A (en) | 1986-05-22 | 1986-05-22 | Optical test circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11609186A JPS62273428A (en) | 1986-05-22 | 1986-05-22 | Optical test circuit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62273428A true JPS62273428A (en) | 1987-11-27 |
Family
ID=14678486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11609186A Pending JPS62273428A (en) | 1986-05-22 | 1986-05-22 | Optical test circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62273428A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02171997A (en) * | 1988-12-26 | 1990-07-03 | Seiichi Miyazaki | Sensor failure detector |
| JPH055811A (en) * | 1991-06-28 | 1993-01-14 | Nippon Telegr & Teleph Corp <Ntt> | Waveguide type optical coupler |
| JP2016513417A (en) * | 2013-02-22 | 2016-05-12 | ゼットティーイー コーポレイション | Optical transceiver and method |
-
1986
- 1986-05-22 JP JP11609186A patent/JPS62273428A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02171997A (en) * | 1988-12-26 | 1990-07-03 | Seiichi Miyazaki | Sensor failure detector |
| JPH055811A (en) * | 1991-06-28 | 1993-01-14 | Nippon Telegr & Teleph Corp <Ntt> | Waveguide type optical coupler |
| JP2016513417A (en) * | 2013-02-22 | 2016-05-12 | ゼットティーイー コーポレイション | Optical transceiver and method |
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