JPS62215066A - Chemical liquid treatment apparatus - Google Patents
Chemical liquid treatment apparatusInfo
- Publication number
- JPS62215066A JPS62215066A JP61057654A JP5765486A JPS62215066A JP S62215066 A JPS62215066 A JP S62215066A JP 61057654 A JP61057654 A JP 61057654A JP 5765486 A JP5765486 A JP 5765486A JP S62215066 A JPS62215066 A JP S62215066A
- Authority
- JP
- Japan
- Prior art keywords
- chemical
- concentration
- processing
- liquid
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000126 substance Substances 0.000 title claims description 135
- 239000007788 liquid Substances 0.000 title claims description 99
- 238000011282 treatment Methods 0.000 title description 34
- 238000012545 processing Methods 0.000 claims description 74
- 239000000203 mixture Substances 0.000 claims description 19
- 239000000700 radioactive tracer Substances 0.000 claims description 3
- 238000012795 verification Methods 0.000 claims 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 75
- 239000000243 solution Substances 0.000 description 41
- 239000012752 auxiliary agent Substances 0.000 description 22
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 20
- 239000004744 fabric Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 230000033116 oxidation-reduction process Effects 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000007670 refining Methods 0.000 description 5
- 239000004115 Sodium Silicate Substances 0.000 description 4
- 238000009990 desizing Methods 0.000 description 4
- 239000003814 drug Substances 0.000 description 4
- 229940079593 drug Drugs 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 229910052911 sodium silicate Inorganic materials 0.000 description 4
- 238000004061 bleaching Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000007844 bleaching agent Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- -1 polyoxyethylene Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 2
- 229910001948 sodium oxide Inorganic materials 0.000 description 2
- 238000010129 solution processing Methods 0.000 description 2
- SFKTYEXKZXBQRQ-UHFFFAOYSA-J thorium(4+);tetrahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[Th+4] SFKTYEXKZXBQRQ-UHFFFAOYSA-J 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000001153 anti-wrinkle effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 239000008155 medical solution Substances 0.000 description 1
- 150000004812 organic fluorine compounds Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
Classifications
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06B—TREATING TEXTILE MATERIALS USING LIQUIDS, GASES OR VAPOURS
- D06B23/00—Component parts, details, or accessories of apparatus or machines, specially adapted for the treating of textile materials, not restricted to a particular kind of apparatus, provided for in groups D06B1/00 - D06B21/00
- D06B23/24—Means for regulating the amount of treating material picked up by the textile material during its treatment
- D06B23/28—Means for regulating the amount of treating material picked up by the textile material during its treatment in response to a test conducted on the treating material
Landscapes
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Treatment Of Fiber Materials (AREA)
- Accessories For Mixers (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
主−発里至庇胤ム凰里
（産業上の利用分野）
本発明は、複数の薬液からなる処理液を収容した処理槽
内に、プラスチックフィルム、布帛等の被処理物を浸漬
させて薬液処理する装置に関し。DETAILED DESCRIPTION OF THE INVENTION Main Field of Invention (Industrial Field of Application) The present invention provides a method for installing a plastic film, fabric, etc. Concerning equipment for treating objects with chemicals by immersing them in the process.
特に、各薬液の供給量を自動制御し得る薬液処理装置に
関する。In particular, the present invention relates to a chemical liquid processing device that can automatically control the supply amount of each chemical liquid.
（従来の技術）
例えば、プラスチ・ツクフィルム、布帛、繊維等の仕上
げ加工として、糊抜、漂白等の薬液処理が行われる。こ
のような薬液処理は、糊抜剤、漂白剤等の薬液が収容さ
れた処理槽内に布帛等の帯状の被処理物を連続的に浸漬
させることにより行われる。被処理物中の余剰の薬液は
、圧搾ローラにて除去される。薬液処理物の品質を一定
に保つためには、処理槽内の薬液濃度を常時一定に保つ
必要がある。処理液濃度が変化すると、連続的に処理さ
れる被処理物は均一に処理されえず１品質に変動をきた
す。(Prior Art) For example, chemical treatments such as desizing and bleaching are performed as finishing treatments for plastic films, fabrics, fibers, and the like. Such chemical treatment is performed by continuously immersing a strip-shaped object to be treated, such as a fabric, into a treatment tank containing a chemical solution such as a desizing agent or a bleaching agent. Excess chemical liquid in the object to be treated is removed by a squeezing roller. In order to keep the quality of the chemically treated product constant, it is necessary to keep the concentration of the chemical in the treatment tank constant at all times. When the concentration of the processing solution changes, the continuously processed objects cannot be processed uniformly and the quality of the objects varies.
従来、処理液は、複数の薬液を、一旦予備タンク内へ投
入して所定濃度に調整されていた。このような調整方法
では。Conventionally, the treatment liquid has been adjusted to a predetermined concentration by once putting a plurality of chemical solutions into a reserve tank. With this kind of adjustment method.
■処理液濃度を調整するために大型の予備タンクを必要
とする；
■処理槽内にて被処理物を薬液処理するに際し。■A large reserve tank is required to adjust the concentration of the treatment solution; ■When treating objects with chemicals in the treatment tank.
処理液の濃度が変化した場合に、被処理物の処理を中断
させることなく処理液を所定の濃度に調整することは容
易ではない；
■処理条件が変更されて薬液の種類、処方（組成比率）
が変更される場合には、予備タンク内にて新たに処理液
を調整する必要がある；■複数の薬液を混合しなければ
ならないので。When the concentration of the treatment liquid changes, it is not easy to adjust the treatment liquid to a predetermined concentration without interrupting the treatment of the object to be treated; )
If the chemical is changed, it is necessary to prepare a new treatment liquid in the reserve tank; ■ Multiple chemical solutions must be mixed.
混合時に主剤が分解・沈澱等を起こすような場合には、
安定した濃度が得られない。If the main ingredient decomposes or precipitates during mixing,
Stable concentration cannot be obtained.
等の問題があった。There were other problems.
近時、センサーやコンピュータの発達に伴って。With the recent development of sensors and computers.
導電率計、比重計、定電流分極電位差計等を利用して、
処理槽内の薬液濃度を検出し、予め設定された薬液濃度
との偏差を解消するために必要な薬液を、直接処理槽へ
供給するという方法が開発されている。この方法によれ
ば、大型の予備タンクは不要になり、薬液処理中の濃度
変化に対しても濃度調整が可能となる。また、処理条件
の変更に伴い薬液の種類が変更される場合には処理槽内
へ送給する薬液を変更すればよいが、各薬液の組成比率
を変更する場合には容易に対処できない。さらに、薬液
の混合時に主剤が分解・沈澱する場合には、処理液濃度
の安定した調整が困難である。Using a conductivity meter, hydrometer, constant current polarization potentiometer, etc.
A method has been developed in which the concentration of a chemical solution in a processing tank is detected and the necessary chemical solution is directly supplied to the processing tank in order to eliminate a deviation from a preset concentration of the chemical solution. According to this method, there is no need for a large reserve tank, and it becomes possible to adjust the concentration even when the concentration changes during chemical treatment. Further, when the type of chemical liquid is changed due to a change in processing conditions, it is sufficient to change the chemical liquid fed into the processing tank, but this cannot be easily handled when the composition ratio of each chemical liquid is changed. Furthermore, if the base agent decomposes and precipitates during mixing of the chemical solution, it is difficult to stably adjust the concentration of the processing solution.
（発明が解決しようとする問題点）
本発明は、上記従来の問題を解決するものであり、その
目的は、被処理物を薬液処理するに際し。(Problems to be Solved by the Invention) The present invention solves the above-mentioned conventional problems, and its purpose is to treat an object to be treated with a chemical solution.
処理槽内の処理液を所望の濃度に安定的に調整できる薬
液処理装置を提供することにある。本発明の他の目的は
、薬液の組成比率を変更する場合にも容易に処理液の濃
度を調整できる薬液処理装置を提供することにある。It is an object of the present invention to provide a chemical liquid processing device that can stably adjust a processing liquid in a processing tank to a desired concentration. Another object of the present invention is to provide a chemical solution processing apparatus that can easily adjust the concentration of the processing solution even when changing the composition ratio of the chemical solution.
（問題点を解決するための手段）
本発明は、複数の薬液からなる処理液を収容した処理槽
内に、被処理物を連続的に浸漬させて薬液処理する装置
において、各薬液を循環路を介して該処理槽に供給する
薬液供給ポンプと、処理液中の所定の薬液の濃度検出器
と、その薬液の処理液中の濃度を設定する濃度設定器と
、処理液中の各薬液の組成比率を設定する薬液比率設定
器と。(Means for Solving the Problems) The present invention provides an apparatus for chemically processing a workpiece by continuously immersing a workpiece in a processing tank containing processing solutions consisting of a plurality of chemicals, in which each chemical solution is passed through a circulation path. a chemical solution supply pump that supplies the chemical solution to the processing tank via the processing tank; a concentration detector for a predetermined chemical solution in the processing solution; a concentration setting device that sets the concentration of the chemical solution in the processing solution; A chemical ratio setting device to set the composition ratio.
前記濃度検出器による薬液濃度と前記濃度設定器による
設定濃度との偏差を解消するために必要なその薬液の供
給量を演算すると共に、該供給■に基づき、前記薬液比
率設定器の設定組成比率に対応させて他の薬液の供給量
を演算し、前記各薬液供給ポンプをその演算供給量とな
るように制御する演算制御器と、を具備してなり、その
ことにより上記目的が達成される。Calculate the supply amount of the chemical liquid necessary to eliminate the deviation between the chemical liquid concentration determined by the concentration detector and the concentration set by the concentration setting device, and also calculate the set composition ratio of the chemical liquid ratio setting device based on the supply (1). and a calculation controller that calculates the supply amount of another chemical solution in accordance with the calculated supply amount, and controls each of the chemical solution supply pumps so that the calculated supply amount is achieved, thereby achieving the above object. .
（実施例） 以下に本発明の実施例について説明する。(Example) Examples of the present invention will be described below.
本発明の薬液処理装置は、第１図に示すように。The chemical liquid processing apparatus of the present invention is as shown in FIG.
処理槽１１と、薬液タンク２Ｌ ２２．２３と、これら
各タンク内に収容された薬液を処理槽１１へ送給する薬
液ポンプ３１．３２．３３とを有する。It has a processing tank 11, a chemical liquid tank 2L 22, 23, and a chemical liquid pump 31, 32, 33 that feeds the chemical liquid contained in each of these tanks to the processing tank 11.
処理槽１１には、各薬液タンク２１．２２．２３内の薬
液にて構成される処理液が収容される。該処理液は１例
えば布帛を糊抜精錬処理するべく用いられる。この処理
槽１１は、薬液タンク２１．２２および２３とＶＩＩＲ
路１２路弁２て接続されている。該循環路１２には処理
液を循環させるための循環ポンプ５１が配設されている
。循環路１２には、さらに、上記薬液タンク内の薬液が
この循環路１２内で順次均一に混ざるように、ミキサー
４１および４２が配設されている。循環路１２には、ま
た、処理槽１１からの固形分を濾別するためのフィルタ
ー５２が１例えば処理槽１１と循環ポンプ５１との間に
介装されている。循環路１２には、また、処理液中の所
定の薬液（例えば。The processing tank 11 accommodates a processing liquid made up of the chemical liquids in each of the chemical liquid tanks 21, 22, and 23. The treatment liquid is used, for example, to desizing and refining fabrics. This processing tank 11 includes chemical tanks 21, 22 and 23, and VIIR.
The 12-way valve 2 is connected. A circulation pump 51 for circulating the processing liquid is disposed in the circulation path 12. The circulation path 12 is further provided with mixers 41 and 42 so that the chemical liquid in the chemical liquid tank is mixed sequentially and uniformly within the circulation path 12. In the circulation path 12, a filter 52 for filtering solid matter from the processing tank 11 is also interposed, for example, between the processing tank 11 and the circulation pump 51. The circulation path 12 also contains a predetermined chemical solution (for example) in the processing liquid.
本実施例では水酸化ナトリウム）の濃度を連続的に検出
する濃度検出器６０が配設されている。In this embodiment, a concentration detector 60 that continuously detects the concentration of sodium hydroxide (sodium hydroxide) is provided.
薬液タンク２１．２２．２３には、糊板精錬に必要な薬
液が収容され２例えば薬液タンク２１には水酸化ナトリ
ウム２１が、薬液タンク２２および２３には助剤Ａおよ
びＢがそれぞれ収容される。助剤Ａとしては１例えば、
非イオン性のノニオン性化合物（例えばポリオキシエチ
レンアルキルフェニルエーテル）が用いられ、助剤Ｂと
しては１例えば柔軟剤としての非イオン性オルガノシリ
コン化合物が用いられる。The chemical tanks 21, 22, and 23 store chemicals necessary for refining the glue board.2For example, the chemical tank 21 stores sodium hydroxide 21, and the chemical tanks 22 and 23 store auxiliaries A and B, respectively. . As the auxiliary agent A, 1 is used, for example,
A nonionic nonionic compound (for example, polyoxyethylene alkylphenyl ether) is used, and as the auxiliary agent B, for example, a nonionic organosilicon compound as a softener is used.
循環路１２は、余剰の処理液を系外へ排出するためのタ
ンク５４が設けられている。このタンク５４への処理液
の排出は流量制御弁５３を介して行われる。The circulation path 12 is provided with a tank 54 for discharging excess processing liquid out of the system. The processing liquid is discharged into the tank 54 via the flow rate control valve 53.
また、処理槽１１には、流量制御弁５６を介して水が供
給される構成となっており、供給される水量により処理
槽１１内の処理液濃度が調整される。Further, water is supplied to the processing tank 11 via a flow rate control valve 56, and the concentration of the processing liquid in the processing tank 11 is adjusted by the amount of water supplied.
処理槽１１内の処理液濃度は、演算制御装置７０により
連続的に制御される。該演算制御装置７０には処理槽１
１から循環路１２を通って循環される処理液の水酸化ナ
トリウム濃度を検出する濃度検出器６０の出力が入力さ
れている。また、この該演算制御装置７０には、処理液
の水酸化ナトリウム濃度を。The concentration of the processing liquid in the processing tank 11 is continuously controlled by the arithmetic and control device 70 . The arithmetic and control device 70 includes a processing tank 1.
The output of a concentration detector 60 that detects the concentration of sodium hydroxide in the treatment liquid circulated from 1 to 1 through the circulation path 12 is input. The arithmetic and control unit 70 also controls the sodium hydroxide concentration of the treatment liquid.
所望の値に設定するための濃度設定器７２の出力が与え
られている。さらに、この演算制御ｒｉ１０には水酸化
ナトリウムと残りの各助剤ＡおよびＢの処理液における
組成比率を設定する薬液比率設定器７２の出力も与えら
れている。The output of a density setter 72 is provided for setting to a desired value. Furthermore, the arithmetic control ri 10 is also supplied with the output of a chemical liquid ratio setting device 72 that sets the composition ratio of sodium hydroxide and the remaining auxiliary agents A and B in the treatment liquid.
一方、演算制御器７０の出力は薬液タンク２１．２２゜
２３内の各薬液をそれぞれ循環路１２から処理槽ｌｌ内
に供給する薬液ポンプ３１．３２．３３に与えられてい
る。それゆえ、演算制御器７０は各薬液ポンプ３１゜３
２、３３の供給量を制御しうる。また、演算制御器７０
の出力は、処理液を循環させる循環ポンプ５１゜処理槽
１１へ供給される水量を調整する流量制御弁５６、およ
び処理槽１１内の処理液のタンク５４に排出される借を
制御する流量制御弁５３にそれぞれ与えられている。そ
れゆえ、演算制御器７０は、循環ポンプ５１による処理
液の循環流量、各流量制御弁５６および５３の流量をそ
れぞれ制御しうる。On the other hand, the output of the arithmetic controller 70 is given to chemical liquid pumps 31, 32, and 33 that supply each chemical liquid in the chemical liquid tanks 21, 22, and 23 from the circulation path 12 into the processing tank 11, respectively. Therefore, the arithmetic controller 70 controls each chemical pump 31゜3.
It is possible to control the supply amount of 2 and 33. In addition, the arithmetic controller 70
Outputs include a circulation pump 51 that circulates the processing liquid, a flow control valve 56 that adjusts the amount of water supplied to the processing tank 11, and a flow rate control valve that controls the amount of processing liquid discharged into the tank 54 in the processing tank 11. The valves 53 are respectively provided. Therefore, the arithmetic controller 70 can control the circulation flow rate of the processing liquid by the circulation pump 51 and the flow rate of each flow control valve 56 and 53, respectively.
このような構成の薬液処理装置では、演算制御器７０は
、まず、各薬液ポンプ３１．３２．３３および水量調整
のための流量制御弁５６を制御して、水酸化ナトリウム
、助剤Ａ、Ｂおよび水をそれぞれ所定量だけ処理槽ｌｌ
内に供給し、所定の濃度の処理液を調整する。次いで、
該処理液に９例えば布帛を連続的に浸漬させ、該布帛を
糊板精錬処理する。In the chemical liquid processing apparatus having such a configuration, the arithmetic controller 70 first controls each of the chemical liquid pumps 31, 32, 33 and the flow rate control valve 56 for adjusting the amount of water so that sodium hydroxide, auxiliary agents A, B and a treatment tank ll for a specified amount of water.
and adjust the processing liquid to a predetermined concentration. Then,
For example, a fabric is continuously immersed in the treatment solution, and the fabric is subjected to a paste plate refining treatment.
そして、この糊板精錬処理の間に、処理液濃度が変動す
ると、演算制御器７０は濃度調整のための制御を行う。If the concentration of the treatment liquid changes during this glue plate refining process, the arithmetic controller 70 performs control to adjust the concentration.
演算制御器７０による制御は次のように行われる。Control by the arithmetic controller 70 is performed as follows.
演算制御器７０には、濃度設定器７１にて処理液中の水
酸化ナトリウム濃度が予め設定されており、また薬液比
率設定器７２にて水酸化ナトリウムおよび各助剤Ａ、Ｂ
の組成比率が設定されている。この組成比率は１例えば
水酸化ナトリウム１００に対し。In the arithmetic controller 70, the concentration of sodium hydroxide in the treatment liquid is preset by a concentration setting device 71, and the concentration of sodium hydroxide and each of the auxiliaries A and B is preset by a chemical liquid ratio setting device 72.
The composition ratio is set. This composition ratio is 1 to 100 parts of sodium hydroxide, for example.
各助剤ＡおよびＢは、それぞれ１０．１０と設定される
。Each auxiliary agent A and B is each set at 10.10.
演算制御器７０は、まず循環路１２を通流する処理液中
の水酸化ナトリウム濃度を、濃度検出器６０により連続
的に検出し、その検出濃度と、濃度設定器７１にて設定
された水酸化ナトリウム濃度とを比較して検出濃度の設
定濃度に対する偏差を求める。The arithmetic controller 70 first continuously detects the sodium hydroxide concentration in the processing liquid flowing through the circulation path 12 using the concentration detector 60, and compares the detected concentration with the water concentration set by the concentration setting device 71. The deviation of the detected concentration from the set concentration is determined by comparing it with the sodium oxide concentration.
次いで、演算制御器７０はその偏差を解消するために必
要な水酸化ナトリウム量を演算し、その演算量が供給量
となるように薬液ポンプ３１を制御する。Next, the arithmetic controller 70 calculates the amount of sodium hydroxide necessary to eliminate the deviation, and controls the chemical pump 31 so that the calculated amount becomes the supply amount.
さらに、演算制御器７０は、演算された水酸化ナトリウ
ムの供給量に基づいて、薬液比率設定器７２にて設定さ
れた各薬液の組成比率に対応させて、各助剤ＡおよびＢ
の供給量を演算する。つまり、各助剤ＡおよびＢの組成
比率が水酸化ナトリウム１００に対してそれぞれｌＯお
よび１０であるので、演算された水酸化ナトリウムの供
給量に対して、各助剤ＡおよびＢの供給量は、それぞれ
その１／１０および１／１０とされる。演算制御器７０
は、各助剤ＡおよびＢの供給量がその演算量となるよう
に薬液ポンプ３２および３３を連続的に制御する。Further, the arithmetic controller 70 controls each auxiliary agent A and B to correspond to the composition ratio of each chemical solution set by the chemical solution ratio setting device 72 based on the calculated supply amount of sodium hydroxide.
Calculate the supply amount of. In other words, since the composition ratio of each auxiliary agent A and B is 10 and 10, respectively, to 100 parts of sodium hydroxide, the amount of each auxiliary agent A and B supplied is , respectively, are 1/10 and 1/10 of that. Arithmetic controller 70
continuously controls the chemical pumps 32 and 33 so that the amount of each auxiliary agent A and B supplied becomes the calculated amount.
薬液ポンプ３１から送給される水酸化ナトリウムは、循
環路１２内へ送給され、処理液とミキサー４１にて混合
される。そして、水酸化ナトリウムが混入された処理液
は、薬液ポンプ３２および３３から送給される各助剤Ａ
およびＢとミキサー４２にて混合されて処理槽１１内に
投入される。Sodium hydroxide fed from the chemical liquid pump 31 is fed into the circulation path 12 and mixed with the processing liquid in the mixer 41 . The treatment liquid mixed with sodium hydroxide is supplied to each auxiliary agent A from the chemical pumps 32 and 33.
and B in a mixer 42 and put into the processing tank 11.
水酸化ナトリウム、各薬剤ＡおよびＢの処方（組成比率
）が変更された場合には、薬液比率設定器７２にてその
組成比率が新たに設定され、各薬液ポンプ３１〜３３の
供給量はその設定比率に対応して変更されて、処理液は
速やかに所定の組成比率とされる。When the prescription (composition ratio) of sodium hydroxide and each drug A and B is changed, the composition ratio is newly set in the chemical liquid ratio setting device 72, and the supply amount of each chemical liquid pump 31 to 33 is adjusted accordingly. The treatment liquid is changed in accordance with the set ratio, and the composition ratio of the processing liquid is quickly brought to a predetermined composition ratio.
第２図は２本発明の他の実施例の模式図である。FIG. 2 is a schematic diagram of two other embodiments of the present invention.
本実施例は、布帛を過酸化水素漂白処理する装置に関す
る。薬液タンク２４には１例えば過酸化水素（８２０２
）が収容され、薬液タンク２５および２６には。This embodiment relates to an apparatus for bleaching fabric with hydrogen peroxide. The chemical tank 24 contains 1, for example, hydrogen peroxide (8202
) are housed in the chemical solution tanks 25 and 26.
それぞれ助剤ＥおよびＦが収容されている。薬液タンク
２７には、水酸化すトリウムが収容されており薬液タン
ク２８にはケイ酸ナトリウム（ＮａｚＳｉＯｉ）が収容
され、さらに薬液タンク２９には助剤Ｇが収容されてい
る。助剤Ｅとしては１例えば非イオン性のノニオン化合
物が用いられ、助剤Ｆとしては。Auxiliary agents E and F are respectively accommodated. The chemical tank 27 stores thorium hydroxide, the chemical tank 28 stores sodium silicate (NazSiOi), and the chemical tank 29 stores auxiliary agent G. As the auxiliary agent E, for example, a nonionic nonionic compound is used, and as the auxiliary agent F, a nonionic compound is used.
例えば柔軟剤としての、１１−イオン性のオルガノシリ
コン化合物が用いられる。さらに助剤Ｇとしては。For example, 11-ionic organosilicon compounds are used as softeners. Furthermore, as an auxiliary agent G.
例えば撥水剤としての非イオン性の有機フッ素化合物が
用いられる。各薬液タンク２４〜２９内の薬液は、それ
ぞれ、各薬液ポンプ３４〜３９にて循環路１２から処理
槽１１へ送給される。上記各薬液タンク内 ′の薬
液が循環路１２を通って処理槽１１へ供給されるに際し
、各薬液が循環路にて順次均一に混ざるように、循環路
１２にミキサーが適宜配装置されている。For example, a nonionic organic fluorine compound is used as a water repellent. The chemical liquid in each of the chemical liquid tanks 24 to 29 is fed from the circulation path 12 to the processing tank 11 by each of the chemical liquid pumps 34 to 39, respectively. Mixers are appropriately arranged in the circulation path 12 so that when the chemical solutions in each of the chemical solution tanks are supplied to the processing tank 11 through the circulation path 12, the respective chemical solutions are uniformly mixed one after another in the circulation path. .
例えば、薬液ポンプ３４および３５にて送給される薬液
は、循環路１２内の処理液とミキサー４４にて混合され
る。各薬液ポンプ３６〜３９にて送給される薬液は、そ
れぞれミキサー４５〜４８にて循環路１２内の処理液と
それぞれ混合される。これら薬液ポンプ３４〜３９は演
算制御器７０にてそれぞれ制御される。For example, the chemical liquid supplied by the chemical liquid pumps 34 and 35 is mixed with the processing liquid in the circulation path 12 in the mixer 44 . The chemical liquid supplied by each of the chemical liquid pumps 36 to 39 is mixed with the processing liquid in the circulation path 12 by mixers 45 to 48, respectively. These chemical liquid pumps 34 to 39 are each controlled by an arithmetic controller 70.
循環路１２には、該処理液中の水酸化ナトリウム濃度を
連続的に検出する濃度検出器６０のほか、該処理液中の
過酸化水素の濃度を連続的に検出するための酸化還元電
位測定器６１が配設され、該酸化還元電位測定器６１の
検出結果は演算制御器７０゛ に入力される。また演算
制御器７０゛ には、処理液中の水酸化ナトリウムの濃
度を設定するための濃度設定器７１ａのほか、処理液中
の過酸化水素の濃度を設定するための濃度設定器７１ｂ
も接続されている。さらに、演算制御器７０”には、２
つの薬液比°重設定器７２ａおよび７２ｂが接続されて
いる。The circulation path 12 includes a concentration detector 60 that continuously detects the concentration of sodium hydroxide in the treatment liquid, as well as an oxidation-reduction potential measurement device that continuously detects the concentration of hydrogen peroxide in the treatment liquid. A device 61 is provided, and the detection results of the oxidation-reduction potential measuring device 61 are input to an arithmetic controller 70'. The arithmetic controller 70' also includes a concentration setting device 71a for setting the concentration of sodium hydroxide in the processing liquid, and a concentration setting device 71b for setting the concentration of hydrogen peroxide in the processing liquid.
is also connected. Furthermore, the arithmetic controller 70'' has 2
Two chemical liquid specific gravity setting devices 72a and 72b are connected.
本実施例では、水酸化ナトリウムに対して助剤Ｆとケイ
酸ナトリウムの組成比率がそれぞれ設定され、また過酸
化水素に対して各助剤ＥおよびＧの組成比率が設定され
る。例えば、水酸化ナトリウムが５に対して、助剤Ｆが
１０．ケイ酸ナトリウムが１０の割合となるように薬液
比率設定器７２ａにて設定され、また過酸化水素が２０
に対し、助剤Ｅが１０．助剤Ｇが１０の割合となるよう
に薬液設定器７２ｂにて設定される。In this embodiment, the composition ratios of auxiliary agents F and sodium silicate are set for sodium hydroxide, and the composition ratios of each auxiliary agent E and G are set for hydrogen peroxide. For example, sodium hydroxide is 5% and auxiliary agent F is 10%. The chemical liquid ratio setting unit 72a is set so that the ratio of sodium silicate is 10, and the ratio of hydrogen peroxide is 20.
On the other hand, auxiliary agent E was 10. The chemical liquid setting device 72b is set so that the ratio of the auxiliary agent G is 10.
演算制御器７０゛ は、濃度設定器７１ａにて設定され
た水酸化ナトリウム濃度とｒ ｃＬ度検出器６０にて検
出される処理液中の水酸化ナトリウム深度とを比較し、
検出濃度の設定濃度に対する偏差を演算する。そしてそ
の偏差を解消するために必要な水酸化すトリウム撥を演
算し、その演算量が供給量となるように薬液ポンプ３７
を連続的に制御する。The arithmetic controller 70' compares the sodium hydroxide concentration set by the concentration setting device 71a and the sodium hydroxide depth in the processing liquid detected by the r cL degree detector 60,
Calculates the deviation of the detected concentration from the set concentration. The chemical liquid pump 37 then calculates the thorium hydroxide repellency necessary to eliminate the deviation, and adjusts the chemical liquid pump 37 so that the calculated amount becomes the supply amount.
control continuously.
さらに、演算制御器７０′ は、演算された水酸化ナト
リウム供給量に基づき、薬液比率設定器７２ａにて設定
された組成比率に対応させてケイ酸ナトリウムおよび助
剤Ｅの供給量を演算し、その演算量が供給量となるよう
に各薬液ポンプ３８および３９を連続的に制御する。Further, the calculation controller 70' calculates the supply amounts of sodium silicate and auxiliary agent E based on the calculated sodium hydroxide supply amount in accordance with the composition ratio set by the chemical liquid ratio setting device 72a, Each chemical liquid pump 38 and 39 is continuously controlled so that the calculated amount becomes the supply amount.
一方、演算制御器７０′は、酸化還元電位測定器６１に
て測定される処理液中の酸化還元電位から過酸化水素の
濃度を検出し、濃度設定器７１ｂにて設定される濃度と
比較し、検出濃度の設定濃度に対する偏差を演算する。On the other hand, the arithmetic controller 70' detects the concentration of hydrogen peroxide from the oxidation-reduction potential in the processing liquid measured by the oxidation-reduction potential measuring device 61, and compares it with the concentration set by the concentration setting device 71b. , calculate the deviation of the detected concentration from the set concentration.
そして、演算制御器７０°は。And the arithmetic controller 70°.
その偏差を解消するために必要な過酸化水素量を演算し
、その演算量が供給量となるように薬液ポンプ３４を連
続的に制御する。さらに、演算制御器７０”は、演算さ
れた過酸化水素供給量に基づき。The amount of hydrogen peroxide required to eliminate the deviation is calculated, and the chemical liquid pump 34 is continuously controlled so that the calculated amount becomes the supply amount. Furthermore, the calculation controller 70'' calculates the amount of hydrogen peroxide supplied based on the calculation.
薬液比率設定器７２ｂにて設定された組成比率に対応さ
せて助剤ＥおよびＧの供給量を演算し、その各演算量が
それぞれの供給量となるように薬液ポンプ３５および３
６を連続的に制御する。The supply amounts of auxiliary agents E and G are calculated in accordance with the composition ratio set by the chemical liquid ratio setter 72b, and the chemical liquid pumps 35 and 3 are operated so that each calculated amount becomes the respective supply amount.
6 is controlled continuously.
本発明の薬液処理装置に用いられる薬液は、プラスチッ
クフィルム、繊維糸、布帛等の仕上加工に用いられる薬
剤であり１例えば繊維布帛では糊抜処理に用いられる糊
汰剤；精錬漂白に用いられる水酸化ナトリウム、各種漂
白剤、浸透剤；あるいは仕上工程で用いられる防しわ加
工剤；触媒；柔軟剤；帯電防止剤等である。このような
薬液は。The chemical liquid used in the chemical processing apparatus of the present invention is a chemical used for finishing processing of plastic films, fiber threads, fabrics, etc.1 For example, in the case of textile fabrics, sizing agent used for desizing treatment; water used for refining and bleaching. Sodium oxide, various bleaching agents, penetrants; or anti-wrinkle processing agents used in finishing processes; catalysts; softeners; antistatic agents, etc. This kind of drug solution.
原液であっても、ａ当に希釈された溶液であってもよい
。It may be a stock solution or an appropriately diluted solution.
処理液中の薬液濃度の検出器としては、酸化還元電位、
電離度測定等のように、薬液濃度を電気的に検出し得る
ものが用いられる。濃度を検出し得る薬液としては、硫
酸、塩酸、水酸化ナトリウム、炭酸ソーダのように電離
度を検出し得る酸性またはアルカリ性物質；塩化カリウ
ム等の電解質；あるいは過酸化水素等のように酸化還元
電位を検出し得る酸化剤や還元剤が好適である。浸透剤
のように、Ｃ度を直接電気的に検出できない非イオン性
物質等の濃度の検出には、濃度検出用のトレーサー物質
が用いられる。該トレーサー物質の使用量は、検出すべ
き薬液の濃度を検定し得るように、その薬液とは一定の
比率で使用される。Oxidation-reduction potential,
A device capable of electrically detecting the concentration of the chemical solution, such as a measurement of the degree of ionization, is used. Chemical solutions whose concentration can be detected include acidic or alkaline substances whose degree of ionization can be detected, such as sulfuric acid, hydrochloric acid, sodium hydroxide, and soda carbonate; electrolytes, such as potassium chloride; or oxidation-reduction potential substances, such as hydrogen peroxide. Oxidizing agents and reducing agents that can be detected are suitable. A tracer substance for concentration detection is used to detect the concentration of a nonionic substance such as a penetrating agent whose C degree cannot be directly detected electrically. The amount of the tracer substance to be used is in a fixed ratio to the drug solution to be detected so that the concentration of the drug solution to be detected can be assayed.
（発明の効果）
本発明の薬液処理装置は、このように、被処理物を連続
的に薬液処理している間に、処理液の濃度を連続的に制
御し得る。また処理液調整のための予備タンクを必要と
しない。処理槽内における被処理物の薬液処理条件が変
更されても処理液を所定の濃度に速やかにかつ安定的に
調整し得る。(Effects of the Invention) In this way, the chemical treatment apparatus of the present invention can continuously control the concentration of the treatment liquid while continuously treating the object with the chemical liquid. Also, no spare tank is required for adjusting the processing liquid. Even if the chemical treatment conditions for the object to be treated in the treatment tank are changed, the treatment liquid can be quickly and stably adjusted to a predetermined concentration.
各薬液タンクと処理槽とは循環路を介して連結され、各
薬液タンクからの薬液は、該循環路内の処理液と一旦混
合された後処理槽内に投入されるため、相溶性の優れな
い薬液が含まれていても安定的に濃度調整ができる。各
薬液は処理液と十分に混合されるため、被処理物を連続
的に均一に処理し得る。それゆえ、得られた薬液処理物
には品質に変動がない。Each chemical tank and the processing tank are connected via a circulation path, and the chemical solution from each chemical tank is once mixed with the processing liquid in the circulation path and then input into the processing tank, so it has excellent compatibility. The concentration can be stably adjusted even if the chemical solution contains Since each chemical solution is sufficiently mixed with the processing liquid, the object to be processed can be processed continuously and uniformly. Therefore, there is no change in quality of the obtained chemical solution treated product.
第１図は１本発明の薬液処理装置の模式図５第２図は１
本発明の他の実施例における薬液処理装置の模式図であ
る。
１１・・・処理槽、１２・・・循環路、２１〜２９・・
・薬液タンク。
３１〜３９・・・薬液ポンプ、 ４Ｌ ４２．４４〜４
７・・・ミキサー。
６０・・・濃度検出器、６１・・・酸化還元電位測定器
、７０゜７０゛ ・・・演算制御器、 ７１．７１ａ、
７１ｂ・・・濃度設定器。
７２、７２ａ、 ？２ｂ・・・薬液比率設定器。
以上Figure 1 is 1 Schematic diagram of the chemical treatment apparatus of the present invention 5 Figure 2 is 1
It is a schematic diagram of the chemical|medical solution processing apparatus in other Example of this invention. 11... Processing tank, 12... Circulation path, 21-29...
- Chemical tank. 31~39...Medical liquid pump, 4L 42.44~4
7...Mixer. 60...Concentration detector, 61...Redox potential measuring device, 70゜70゛...Arithmetic controller, 71.71a,
71b...Concentration setting device. 72, 72a, ? 2b... Chemical liquid ratio setting device. that's all
Claims (1)
被処理物を連続的に浸漬させて薬液処理する装置におい
て、 各薬液を循環路を介して該処理槽に供給する薬液供給ポ
ンプと、 処理液中の所定の薬液の濃度検出器と、 その薬液の処理液中の濃度を設定する濃度設定器と、 処理液中の各薬液の組成比率を設定する薬液比率設定器
と、 前記濃度検出器による薬液濃度と前記濃度設定器による
設定濃度との偏差を解消するために必要なその薬液の供
給量を演算すると共に、該供給量に基づき、前記薬液比
率設定器の設定組成比率に対応させて他の薬液の供給量
を演算し、前記各薬液供給ポンプをその演算供給量とな
るように制御する演算制御器と、 を具備する薬液処理装置。 ２、前記濃度検出器は、所定の薬液に混入された濃度検
定用のトレーサー物質にて該薬液の濃度を検出し得る特
許請求の範囲第１項に記載の薬液処理装置。 ３、前記循環路には、該循環路内の処理液と薬液との混
合のためのミキサーが配設されている特許請求の範囲第
１項に記載の薬液処理装置。[Claims] 1. In a processing tank containing a processing liquid consisting of a plurality of chemical solutions,
An apparatus for treating an object to be treated with a chemical solution by continuously immersing the object therein, comprising: a chemical solution supply pump that supplies each chemical solution to the processing tank via a circulation path; a concentration detector for a predetermined chemical solution in the processing solution; and the chemical solution. a concentration setting device for setting the concentration in the processing solution; a chemical ratio setting device for setting the composition ratio of each chemical in the processing solution; and a deviation between the chemical concentration determined by the concentration detector and the concentration set by the concentration setting device. In addition to calculating the supply amount of the chemical solution necessary to eliminate the problem, based on the supply amount, the supply amount of other chemical solutions is calculated in correspondence with the set composition ratio of the chemical solution ratio setting device, and the supply amount of each chemical solution is calculated. A chemical liquid processing device comprising: a calculation controller that controls a pump so that the calculated supply amount is achieved; 2. The chemical liquid processing apparatus according to claim 1, wherein the concentration detector is capable of detecting the concentration of a predetermined chemical liquid using a tracer substance for concentration verification mixed in the chemical liquid. 3. The chemical liquid processing apparatus according to claim 1, wherein the circulation path is provided with a mixer for mixing the processing liquid in the circulation path and the chemical liquid.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61057654A JPH0641664B2 (en) | 1986-03-14 | 1986-03-14 | Chemical processing equipment |
| KR1019870001933A KR940007702B1 (en) | 1986-03-14 | 1987-03-04 | Chemical liquid treatment apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61057654A JPH0641664B2 (en) | 1986-03-14 | 1986-03-14 | Chemical processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62215066A true JPS62215066A (en) | 1987-09-21 |
| JPH0641664B2 JPH0641664B2 (en) | 1994-06-01 |
Family
ID=13061890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61057654A Expired - Lifetime JPH0641664B2 (en) | 1986-03-14 | 1986-03-14 | Chemical processing equipment |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH0641664B2 (en) |
| KR (1) | KR940007702B1 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01183570A (en) * | 1988-01-19 | 1989-07-21 | Sando Iron Works Co Ltd | Apparatus for continuous liquid treatment of fabric |
| JPH0753947B2 (en) * | 1990-05-14 | 1995-06-07 | ブルグマン マシーネファブリーク ベスローテン フェンノートシャップ | Method for measuring and adjusting hydroxide and hydrogen peroxide concentration in bleaching bath and woven fabric treating apparatus |
| US7419946B2 (en) | 2001-12-05 | 2008-09-02 | Fujitsu Limited | Chemical solution feeding apparatus and method for preparing slurry |
| JP2009098128A (en) * | 2007-09-26 | 2009-05-07 | Tokyo Electron Ltd | Liquid treatment device and treatment liquid supply method |
| WO2010116930A1 (en) * | 2009-04-07 | 2010-10-14 | セーレン株式会社 | Method and device for padding treatment of fibrous materials |
| JP2014237902A (en) * | 2013-06-06 | 2014-12-18 | 株式会社日阪製作所 | Liquid current-type dyeing equipment |
| CN113136666A (en) * | 2021-04-30 | 2021-07-20 | 广东溢达纺织有限公司 | Cloth finishing method |
-
1986
- 1986-03-14 JP JP61057654A patent/JPH0641664B2/en not_active Expired - Lifetime
-
1987
- 1987-03-04 KR KR1019870001933A patent/KR940007702B1/en not_active IP Right Cessation
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01183570A (en) * | 1988-01-19 | 1989-07-21 | Sando Iron Works Co Ltd | Apparatus for continuous liquid treatment of fabric |
| JPH0753947B2 (en) * | 1990-05-14 | 1995-06-07 | ブルグマン マシーネファブリーク ベスローテン フェンノートシャップ | Method for measuring and adjusting hydroxide and hydrogen peroxide concentration in bleaching bath and woven fabric treating apparatus |
| US7419946B2 (en) | 2001-12-05 | 2008-09-02 | Fujitsu Limited | Chemical solution feeding apparatus and method for preparing slurry |
| US7863195B2 (en) | 2001-12-05 | 2011-01-04 | Fujitsu Semiconductor Limited | Chemical solution feeding apparatus and method for preparing slurry |
| JP2009098128A (en) * | 2007-09-26 | 2009-05-07 | Tokyo Electron Ltd | Liquid treatment device and treatment liquid supply method |
| WO2010116930A1 (en) * | 2009-04-07 | 2010-10-14 | セーレン株式会社 | Method and device for padding treatment of fibrous materials |
| JP2014237902A (en) * | 2013-06-06 | 2014-12-18 | 株式会社日阪製作所 | Liquid current-type dyeing equipment |
| CN113136666A (en) * | 2021-04-30 | 2021-07-20 | 广东溢达纺织有限公司 | Cloth finishing method |
Also Published As
| Publication number | Publication date |
|---|---|
| KR870008611A (en) | 1987-10-19 |
| KR940007702B1 (en) | 1994-08-24 |
| JPH0641664B2 (en) | 1994-06-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |