JPS62198863A - Exposing device - Google Patents

Exposing device

Info

Publication number
JPS62198863A
JPS62198863A JP61040399A JP4039986A JPS62198863A JP S62198863 A JPS62198863 A JP S62198863A JP 61040399 A JP61040399 A JP 61040399A JP 4039986 A JP4039986 A JP 4039986A JP S62198863 A JPS62198863 A JP S62198863A
Authority
JP
Japan
Prior art keywords
masks
mask
frame
cassette
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61040399A
Other languages
Japanese (ja)
Inventor
Masamichi Suzumura
鈴村　雅道
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61040399A priority Critical patent/JPS62198863A/en
Publication of JPS62198863A publication Critical patent/JPS62198863A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To eliminate the labor for exchanging masks and to obviate the sticking of dust onto masks, damage, etc. during the exchange of the masks by integrally constituting and handling plural sheets of the masks as a mask cassette. CONSTITUTION:Four sheets of the masks 10a-10d are parallel disposed to one row on a frame body (mask frame) 11 having a rectangular shape and after the positions between each other are preliminarily aligned, the masks are fixed by mask fixing members 12 using screws 19. The mask cassette 13 constituted by uniting the plural masks and the mask frame 11 to one body in the above-mentioned manner is mounted on an adjusting table of an exposing device and an exposing operation is executed. The masks 10a-10d are once fixed onto the mask frame 11 and after the mask cassette 13 is constituted, the masks are always handled integrally as the mask cassette 13. The damage of the masks with the exchange operation for attaching and detaching the masks is thereby averted. The danger that the dust sticks to the masks is minimized.

Description

【発明の詳細な説明】 ［発明の分野］ 本発明は、マスクを用いてパターンを基板上に焼付ける
露光装置に関し、特に複数のマスクを用いて大型基板上
にパターンを分割して焼付けるための露光装置に関する
。[Detailed Description of the Invention] [Field of the Invention] The present invention relates to an exposure apparatus for printing a pattern on a substrate using a mask, and particularly for printing a pattern on a large substrate by dividing the pattern using a plurality of masks. The present invention relates to an exposure apparatus.

［発明の背景］ 液晶表示デバイスは、低電圧で駆動でき、消費電力が少
なく、また極めて薄形が可能であるため、各種電子装置
と組合せた情報表示手段として用いられ、特に表示面を
大きくしても薄形が保たれるため大型表示デバイスとし
て需要が高まっている。このような液晶表示デバイスの
表示パネルは、透明電極を形成した２枚のガラス基板間
に液晶材料゛を封入して構成される。大型液晶表示用ガ
ラス基板に電極パターンを形成する場合、パターン形成
面を複数領域に分割して各領域毎にマスクを作成し、複
数のマスクを順次露光位置にセットして各領域毎に順番
にパターン焼付けを行う分割パターン方式が用いられて
いる。[Background of the Invention] Liquid crystal display devices are used as information display means in combination with various electronic devices because they can be driven at low voltages, consume little power, and can be made extremely thin. Demand for large-sized display devices is increasing because the device can maintain its thin shape. The display panel of such a liquid crystal display device is constructed by sealing a liquid crystal material between two glass substrates on which transparent electrodes are formed. When forming an electrode pattern on a glass substrate for a large liquid crystal display, the pattern forming surface is divided into multiple regions, a mask is created for each region, and the multiple masks are sequentially set at the exposure position and applied to each region in turn. A divided pattern method is used in which the pattern is printed.

露光方式としては、マスクと基板とを密着させるコンタ
クト方式、マスクと基板との間にわずかのギャップを設
けたプロキシミティ方式、ミラーまたは縮小レンズ等の
光学系を用いたプロジェクション方式等が用いられてい
る。The exposure methods used include the contact method, which brings the mask and substrate into close contact, the proximity method, which leaves a small gap between the mask and the substrate, and the projection method, which uses optical systems such as mirrors or reduction lenses. There is.

［従来の技術］ 従来の露光装置において複数のマスクを用いて分割パタ
ーンの露光を行なう際には各露光工程毎にマスクの交換
が必要でありこの場合手作業でマスクを脱着し、位置決
めを行なっていたため、マスク交換作業は手数のかかる
ものであった。また作業中にマスクへの塵埃の付着やマ
スクの損傷のおそれがあり、マスクに形成されたパター
ンの被露光体（基板）への転写精度を低下させる場合が
あった。さらに、取りはずしたマスクの保管、管理にも
細心の注意を払う必要があり、取り扱い上、不便な点が
多いという欠点があった。[Prior Art] When exposing divided patterns using multiple masks in a conventional exposure apparatus, it is necessary to replace the masks after each exposure process, and in this case, the masks must be manually attached and detached and positioned. Therefore, changing masks was a time-consuming task. Further, there is a risk of dust adhering to the mask or damage to the mask during the operation, which may reduce the accuracy of transferring the pattern formed on the mask to the exposed object (substrate). Furthermore, it is necessary to pay close attention to the storage and management of the removed mask, which is disadvantageous in that it is often inconvenient to handle.

［発明の目的コ 本発明は前記従来技術の欠点に鑑みなされたものであっ
て、マスク交換作業の手間を省きマスク交換作業中のマ
スクへの塵埃付着、損傷等の問題をなくし、またマスク
の取扱いを容易にしてマスクの保管、管理が良好に行な
われる露光装置の提供を目的とする。[Purpose of the Invention] The present invention has been made in view of the drawbacks of the prior art described above, and it eliminates the trouble of replacing the mask, eliminates problems such as dust adhesion and damage to the mask during the replacement work, and improves the quality of the mask. The purpose of the present invention is to provide an exposure device that is easy to handle and allows masks to be stored and managed well.

［実施例］ 本発明の基本となる構成を第１図に示す。図中で、１８
〜１ｄはマスク、２はガラスプレート、３はマスクプレ
ート、４は調整台、５は照明系、６は光学系、７は基板
、８は基板台、９は光軸である。各々異なるパターンを
有する４枚のマスクｌａ、ｌｂ、ｌｃ、Ｉｄはガラスプ
レート２の上面に固定することなく着脱可能に塔載°さ
れ保持枠１８により一定の間隔で保持されマスクプレー
ト３を構成している。従って、マスクを持上げることに
より各マスク１ａ〜１ｄは保持枠１８から容易に取外し
できる。このマスクプレート３は露光装置上の調整台４
に対して着脱自在に取り付けられている。調整台４は装
置本体に対して水平面Ｘ方向とこれに垂直なＹ方向に矢
印Ｐ、Ｑのように移動可能でかつ光軸９（Ｚ軸）を中心
として矢印Ｒのように回転可能であって各マスクの位置
を微調整し光軸９および基板７に対するずれを補正する
。[Example] The basic configuration of the present invention is shown in FIG. In the figure, 18
-1d is a mask, 2 is a glass plate, 3 is a mask plate, 4 is an adjustment table, 5 is an illumination system, 6 is an optical system, 7 is a substrate, 8 is a substrate stand, and 9 is an optical axis. Four masks la, lb, lc, and Id, each having a different pattern, are removably mounted on the top surface of the glass plate 2 without being fixed, and are held at regular intervals by a holding frame 18 to form the mask plate 3. ing. Therefore, each of the masks 1a to 1d can be easily removed from the holding frame 18 by lifting the mask. This mask plate 3 is attached to an adjustment table 4 on the exposure device.
It is detachably attached to the The adjustment table 4 is movable as shown by arrows P and Q in the horizontal plane X direction and in the Y direction perpendicular to this with respect to the main body of the apparatus, and is rotatable as shown by arrow R around the optical axis 9 (Z axis). The position of each mask is finely adjusted to correct the misalignment with respect to the optical axis 9 and the substrate 7.

このマスク１ａ〜１ｄ上のパターンが照明系５からの光
によって光学系６を通り、基板台８上の基板７の上に投
影され焼付けが行なわれる（プロジェクション露光方式
）。マスクプレート３を矢印ＡまたはＢ方向に自動ステ
ップ８動させることにより、所望のマスクを露光位置に
配置し、異なるパターンを順番に焼付可能にしている。The patterns on the masks 1a to 1d are projected by light from the illumination system 5 through the optical system 6 and onto the substrate 7 on the substrate table 8 for printing (projection exposure method). By moving the mask plate 3 in automatic steps 8 in the direction of arrow A or B, a desired mask is placed at the exposure position, and different patterns can be printed in sequence.

このように４枚のマスク１８〜１ｄを同時にガラスプレ
ート２上に載せこのマスクプレート３を移動させること
により、露光工程中のマスク交換作業を省くことができ
る。しかしながら、この構成のマスクプレート３はマス
クを固定することなく容易に着脱可能な構造とし、別の
露光工程では各マスクを入れ換えて使用するものである
。したがって、この着脱作業の際にマスクへの塵埃の付
着およびマスクの損傷の問題が残る。特に本例の場合、
マスク１ａ＝１ｄはガラスプレート２に対してあらかじ
めブリアライメ“ントしてから取付け、マスクプレート
３を調整台４に載せてからは微動のみの位置補正によっ
て光軸９および基板７に対するアライメントを行なおう
とするものである。したがって、マスク１ａ〜１ｄのガ
ラスプレート２に対するプリアライメントの精度が重要
となるが、マスク１８〜１ｄの着脱時にマスクに損傷を
与えると、例えば、位置合わせマークの破損、端面の破
損等により、プリアライメント精度が低下する。By placing the four masks 18 to 1d on the glass plate 2 at the same time and moving the mask plate 3 in this way, it is possible to eliminate the need for mask replacement during the exposure process. However, the mask plate 3 having this structure has a structure in which the masks can be easily attached and detached without fixing them, and each mask is used interchangeably in another exposure process. Therefore, there remains the problem of dust adhesion to the mask and damage to the mask during this attachment/detachment operation. Especially in this example,
The masks 1a and 1d are mounted after being fully aligned with the glass plate 2, and after the mask plate 3 is placed on the adjustment table 4, the alignment with respect to the optical axis 9 and the substrate 7 is performed by position correction using only slight movements. Therefore, the precision of pre-alignment of the masks 1a to 1d with respect to the glass plate 2 is important, but if the masks are damaged when attaching or detaching the masks 18 to 1d, for example, the alignment marks may be damaged or the end faces may be damaged. Prealignment accuracy decreases due to damage etc.

このため調整台４での微動によるアライメント時間が長
くなり露光作業能率が低下し、最悪時にはマスクのプリ
アライメントの誤差が大きいと、調整台の微動範囲外に
ずれてしまい、アライメント不能になるおそれがあった
。For this reason, the alignment time due to the fine movement on the adjustment table 4 becomes longer and the exposure work efficiency decreases, and in the worst case scenario, if there is a large error in mask pre-alignment, the adjustment table may shift outside the fine movement range and alignment may become impossible. there were.

このような点を改良したマスク支持構造の一例を第２図
および第３図に示す。第２図は平面図、第３図は第２図
のＡ−Ａ断面図である。４枚のマスク１０ａ〜１０ｄは
長方形形状の枠体（マスクフレーム）１１上に一列に並
列配置され相互位置をプリアライメントされたのちにネ
ジ１９を用いてマスク固定部材１２で固定される。この
ように複数のマスクとマスクフレームとを一体化してマ
スクカセット１３を構成している。このマスクカセット
１３は第１図のマスクプレート３の場合と同様に露光装
置の調整台上に搭載され露光作業が行なわれる。マスク
１０ａ〜１０ｄをマスクフレーム１１上に一旦固定して
マスクカセット１３を構成したら、特別の場合（マスク
が汚損、破損した時）以外はマスクの着脱を行なわず、
マスクカセット１３として常に一体的に取扱う。これに
より、マスクの着脱交換作業に伴うマスクの損傷を回避
することができ、また、作業者がマスクに近づいて作業
する際のマスクに対する塵埃の付着の危険性も最小限に
抑えることができる。別のパターンのマスクを使用して
露光作業を行なう必要がある場合には、別のマスクで構
成したマスクカセットを別途準備しておき、前述のマス
クカセット１３とカセット全体を交換することにより、
他のパターンの焼付を行なう。装置より取りはずしたマ
スクカセット１３は、第４図に示すようなマスクカセッ
トケース１４内に収納し蓋１４ａを閉じて保管する。こ
れによりマスク単体を直接取扱う必要がなくなり、同一
露光工程で必要な複数のマスクがカセット単位で管理さ
れ、マスクの保全、管理が容易になる。An example of a mask support structure improved in this respect is shown in FIGS. 2 and 3. FIG. 2 is a plan view, and FIG. 3 is a sectional view taken along line AA in FIG. The four masks 10a to 10d are arranged in a row on a rectangular frame (mask frame) 11, and after prealigning their mutual positions, are fixed by a mask fixing member 12 using screws 19. In this way, the mask cassette 13 is constructed by integrating a plurality of masks and a mask frame. This mask cassette 13 is mounted on an adjustment table of an exposure apparatus and an exposure operation is performed in the same manner as the mask plate 3 shown in FIG. Once the masks 10a to 10d are fixed on the mask frame 11 to form the mask cassette 13, the masks are not attached or detached except in special cases (when the masks are soiled or damaged).
It is always handled integrally as a mask cassette 13. Thereby, it is possible to avoid damage to the mask due to the work of attaching and detaching the mask, and it is also possible to minimize the risk of dust adhering to the mask when an operator works close to the mask. If it is necessary to perform exposure work using a mask with a different pattern, prepare a separate mask cassette made up of a different mask, and replace the mask cassette 13 with the entire cassette.
Print another pattern. The mask cassette 13 removed from the apparatus is stored in a mask cassette case 14 as shown in FIG. 4 with the lid 14a closed. This eliminates the need to directly handle individual masks, and allows multiple masks required in the same exposure process to be managed in cassette units, making mask maintenance and management easier.

本発明の他の実施例を第５図に示す。ｌＯａ〜１０ｄは
マスク、１２はマスク固定部材、１５はマスクフレーム
、１６はマスクカセットである。４枚のマスク１０ａ〜
１０ｄは円板形状の枠体（マスクフレーム）　１５上で
中心１７から等距離の位置に相互位置をプリアライメン
トされたのち、ネジ１９を用いてマスク固定部材１２で
固定される。このように複数のマスクとマスクフレーム
とを一体化してマスクカセット１６を構成している。こ
の円形のマスクカセット１６を回転中心１７を中心とし
て所定の角度ずつステップ回転送りすることにより、各
マスクを順次露光位置に配置し焼付けを行なう。本実施
例の場合も前記実施例と同様に４枚のマスクをマスクカ
セット１６として一体的に取扱う。なお、各実施例にお
いてマスクの枚数は４枚に限定されない。Another embodiment of the invention is shown in FIG. 10a to 10d are masks, 12 is a mask fixing member, 15 is a mask frame, and 16 is a mask cassette. 4 masks 10a~
Reference numeral 10d denotes a disc-shaped frame (mask frame).After pre-alignment of mutual positions at positions equidistant from the center 17 on the disk-shaped frame (mask frame) 15, the mask frame is fixed with the mask fixing member 12 using screws 19. In this way, the mask cassette 16 is constructed by integrating a plurality of masks and a mask frame. By rotating this circular mask cassette 16 about a rotation center 17 in steps of a predetermined angle, each mask is sequentially placed at an exposure position and printed. In this embodiment as well, four masks are handled as a mask cassette 16 as in the previous embodiment. Note that in each embodiment, the number of masks is not limited to four.

［発明の効果］ 以上述べたように、同一基板上に分割パターンを連続的
に焼付ける一連の露光工程で必要な複数枚のマスクをマ
スクカセットとして一体的に構成し、取扱うことにより
、分割パターンの各パターン焼付毎にマスクを交換する
必要はなくなりマスク交換の自動化、装置へのマスクの
着脱の容易化、塵埃の付着防止および装置より取りはず
したマスクの保全、管理の容易化が達成される。[Effects of the Invention] As described above, by integrally configuring and handling a plurality of masks as a mask cassette, which are required in a series of exposure steps for sequentially printing divided patterns on the same substrate, divided patterns can be printed. It is no longer necessary to replace the mask every time each pattern is printed, thereby achieving automation of mask replacement, ease of attaching and removing the mask to the device, prevention of dust adhesion, and ease of maintenance and management of the mask removed from the device.

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本発明に係る露光装置の基本構成を示す概略構
成図、第２図は本発明に係るマスクカセットの一例の平
面図、第３図は第２図のＡ−Ａ断面図、第４図は第２図
のマスクカセットの保管時の説明図、第５図は本発明に
係るマスクカセットの別の例の平面図である。 １ａ〜１ｄ：マスク ２ニガラスプレート ３：マスクプレート ７：基板 １０ａ　Ｎ１ｅｄ　：　マスク １１：枠体 １２：マスク固定部材 １３：マスクカセット １５：枠体 １６：マスクカセット。 特許出願人　　　キャノン株式会社 代理人　弁理士　　　伊　東　辰　雄 代理人　弁理士　　　伊　東　哲　也 第１図 １０ａ　　　　Ｓｏｂ　　　１２　　１０ｃ　　　　　
ｊｏｄ第３図FIG. 1 is a schematic configuration diagram showing the basic configuration of an exposure apparatus according to the present invention, FIG. 2 is a plan view of an example of a mask cassette according to the present invention, and FIG. FIG. 4 is an explanatory view of the mask cassette shown in FIG. 2 during storage, and FIG. 5 is a plan view of another example of the mask cassette according to the present invention. 1a to 1d: Mask 2 Glass plate 3: Mask plate 7: Substrate 10a N1ed: Mask 11: Frame 12: Mask fixing member 13: Mask cassette 15: Frame 16: Mask cassette. Patent Applicant Canon Co., Ltd. Agent Patent Attorney Tatsuo Ito Agent Patent Attorney Tetsuya Ito Figure 1 10a Sob 12 10c
jod figure 3

Claims (1)

【特許請求の範囲】 １、複数枚のマスクを順次露光位置に配置して１枚の基
板上にパターンを分割して焼付ける露光装置において、
前記複数枚のマスクを１つの枠体の同一平面上に固定し
てマスクカセットとして一体化したことを特徴とする露
光装置。 ２、前記マスクカセットは、露光位置において一方向に
ステップ送り可能に装着されたことを特徴とする特許請
求の範囲第１項記載の露光装置。 ３、前記マスクカセットの枠体は長方形形状であって各
マスクを一列に並列配置したことを特徴とする特許請求
の範囲第２項記載の露光装置。 ４、前記マスクカセットは、露光位置において、前記枠
体の中心を回転中心として所定角度ずつステップ回転可
能に装着されたことを特徴とする特許請求の範囲第１項
記載の露光装置。 ５、前記マスクカセットの枠体は、円板形状であって、
各マスクを円板中心から等距離の位置に配置したことを
特徴とする特許請求の範囲第４項記載の露光装置。 ６、前記マスクは枠体に対しプリアライメント後にネジ
止めにより該枠体上に固定されたことを特徴とする特許
請求の範囲第１項から第５項までのいずれか１項記載の
露光装置。[Claims] 1. An exposure apparatus that sequentially arranges a plurality of masks at exposure positions and prints a divided pattern on one substrate,
An exposure apparatus characterized in that the plurality of masks are fixed on the same plane of one frame and integrated as a mask cassette. 2. The exposure apparatus according to claim 1, wherein the mask cassette is mounted so that it can be moved in steps in one direction at the exposure position. 3. The exposure apparatus according to claim 2, wherein the frame of the mask cassette has a rectangular shape, and the masks are arranged in a row. 4. The exposure apparatus according to claim 1, wherein the mask cassette is mounted so as to be rotatable in steps of a predetermined angle about the center of the frame at the exposure position. 5. The frame of the mask cassette has a disc shape,
5. The exposure apparatus according to claim 4, wherein each mask is arranged at a position equidistant from the center of the disk. 6. The exposure apparatus according to any one of claims 1 to 5, wherein the mask is fixed on the frame by screws after pre-alignment with the frame.
JP61040399A 1986-02-27 1986-02-27 Exposing device Pending JPS62198863A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61040399A JPS62198863A (en) 1986-02-27 1986-02-27 Exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61040399A JPS62198863A (en) 1986-02-27 1986-02-27 Exposing device

Publications (1)

Publication Number Publication Date
JPS62198863A true JPS62198863A (en) 1987-09-02

Family

ID=12579582

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61040399A Pending JPS62198863A (en) 1986-02-27 1986-02-27 Exposing device

Country Status (1)

Country Link
JP (1) JPS62198863A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63211622A (en) * 1987-02-17 1988-09-02 Yokogawa Hewlett Packard Ltd Multilevel-reticle and pattern transfer method
JPH0223606A (en) * 1988-07-12 1990-01-25 Fujitsu Ltd Reticle moving exchanger
JPH02142112A (en) * 1988-11-24 1990-05-31 Nikon Corp Projection type exposure device
JPH02166717A (en) * 1988-12-21 1990-06-27 Nikon Corp Exposing method
EP0855623A2 (en) * 1997-01-27 1998-07-29 Nikon Corporation Projection exposure method and apparatus
JP2008113046A (en) * 2003-10-27 2008-05-15 Asml Netherlands Bv Assembly of reticle holder and reticle
JP2008218769A (en) * 2007-03-06 2008-09-18 Nikon Corp Mask holding device, mask adjustment method, exposure equipment, and exposure method
US7839489B2 (en) 2003-10-27 2010-11-23 Asml Netherlands B.V. Assembly of a reticle holder and a reticle
US8273179B2 (en) 2003-03-27 2012-09-25 Samsung Mobile Display Co., Ltd. Deposition mask for display device and method for fabricating the same
WO2015013607A1 (en) * 2013-07-26 2015-01-29 Varian Semiconductor Equipment Associates, Inc. Mechanical alignment of substrates to a mask
CN105204295A (en) * 2015-05-29 2015-12-30 中国科学院上海光学精密机械研究所 Arrayed phase mask plate switching device and stepped phase mask plate switching device for etching gratings according to phase mask plate writing method

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63211622A (en) * 1987-02-17 1988-09-02 Yokogawa Hewlett Packard Ltd Multilevel-reticle and pattern transfer method
JPH0223606A (en) * 1988-07-12 1990-01-25 Fujitsu Ltd Reticle moving exchanger
JPH02142112A (en) * 1988-11-24 1990-05-31 Nikon Corp Projection type exposure device
JPH02166717A (en) * 1988-12-21 1990-06-27 Nikon Corp Exposing method
EP0855623A2 (en) * 1997-01-27 1998-07-29 Nikon Corporation Projection exposure method and apparatus
EP0855623A3 (en) * 1997-01-27 2000-05-31 Nikon Corporation Projection exposure method and apparatus
US6327022B1 (en) 1997-01-27 2001-12-04 Nikon Corporation Projection exposure method and apparatus
US6590636B2 (en) 1997-01-27 2003-07-08 Nikon Corporation Projection exposure method and apparatus
US8273179B2 (en) 2003-03-27 2012-09-25 Samsung Mobile Display Co., Ltd. Deposition mask for display device and method for fabricating the same
JP2008113046A (en) * 2003-10-27 2008-05-15 Asml Netherlands Bv Assembly of reticle holder and reticle
US7839489B2 (en) 2003-10-27 2010-11-23 Asml Netherlands B.V. Assembly of a reticle holder and a reticle
JP2008218769A (en) * 2007-03-06 2008-09-18 Nikon Corp Mask holding device, mask adjustment method, exposure equipment, and exposure method
WO2015013607A1 (en) * 2013-07-26 2015-01-29 Varian Semiconductor Equipment Associates, Inc. Mechanical alignment of substrates to a mask
US9490153B2 (en) 2013-07-26 2016-11-08 Varian Semiconductor Equipment Associates, Inc. Mechanical alignment of substrates to a mask
CN105204295A (en) * 2015-05-29 2015-12-30 中国科学院上海光学精密机械研究所 Arrayed phase mask plate switching device and stepped phase mask plate switching device for etching gratings according to phase mask plate writing method
CN105204295B (en) * 2015-05-29 2017-05-31 中国科学院上海光学精密机械研究所 Phase mask plate switching device

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