JPS62174576A - Electron impact type ion thruster - Google Patents
Electron impact type ion thrusterInfo
- Publication number
- JPS62174576A JPS62174576A JP1474686A JP1474686A JPS62174576A JP S62174576 A JPS62174576 A JP S62174576A JP 1474686 A JP1474686 A JP 1474686A JP 1474686 A JP1474686 A JP 1474686A JP S62174576 A JPS62174576 A JP S62174576A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- baffle
- hollow
- ion thruster
- type ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004020 conductor Substances 0.000 claims abstract description 7
- 230000006866 deterioration Effects 0.000 abstract description 5
- 238000001816 cooling Methods 0.000 abstract description 4
- 230000005684 electric field Effects 0.000 abstract description 2
- 150000002500 ions Chemical class 0.000 description 14
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 241000975394 Evechinus chloroticus Species 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H1/00—Using plasma to produce a reactive propulsive thrust
- F03H1/0006—Details applicable to different types of plasma thrusters
- F03H1/0012—Means for supplying the propellant
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H1/00—Using plasma to produce a reactive propulsive thrust
- F03H1/0006—Details applicable to different types of plasma thrusters
- F03H1/0031—Thermal management, heating or cooling parts of the thruster
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Particle Accelerators (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は１人工衛星の軌道側−を行なうα子衝撃型イ
オン・スラスタに関する、
〔発明の技術的背景とその面題点〕
従来の電子衝炸型イオン・スラスタの構成を第３図に示
す。ガス導入系からホローカソードｌ内を通って放電容
器８内に導入されたＸｅガスに。[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to an alpha bombardment type ion thruster for orbiting an artificial satellite. The configuration of the explosive type ion thruster is shown in Figure 3. Xe gas is introduced from the gas introduction system into the discharge vessel 8 through the hollow cathode 1.
ホローカソード１から放出後アノード２によって加速さ
れた電子が衝突して電離プラズマを放′４室内に生成し
、ｘｅ＋イオンが加速電極（３枚）４によって運動エネ
ルギを与えられ、中和器６から放出される電子によりて
中和化された後放出されてイオン・スラスタの推力とな
る。′電離プラズマの放電容器８の壁面からの損失を小
さくするために。Electrons accelerated by the anode 2 after being emitted from the hollow cathode 1 collide to generate ionized plasma in the radiation chamber 4, and xe+ ions are given kinetic energy by the accelerating electrodes (3 pieces) 4, After being neutralized by the emitted electrons, they are released and become the thrust of the ion thruster. 'To reduce the loss of ionized plasma from the wall of the discharge vessel 8.
磁石３でカスプ磁場を構成してＭ１＠閉じ込めを行りて
いる。Ｘｅ＋イオンが３枚の加速電極４の孔を発散角最
小かつ加速電極４に衝突せずに抜けて来る几めには、加
速電極４の放電室１１近傍で第２図破４！９で示すよう
なイオン成製密度の均一性が必要である。ところが、放
電室内のガス圧をＦげて行くと、ガス導入孔下流側でガ
ス濃度が蔓くなりでイオン電流密度が第２図実線１ｏの
ように高くなり均一性がなくなる。この破れた均一性を
回′復するためには、ガス導入孔の数を増加させる必要
がある。ガス導入孔の増加は放電容器８の製作を複雑な
ものにするとともに大幅ζ型針増加を伴う欠点がある。Magnet 3 forms a cusp magnetic field to confine M1@. In order for the Xe+ ions to pass through the holes of the three accelerating electrodes 4 with the minimum divergence angle and without colliding with the accelerating electrodes 4, there is a hole near the discharge chamber 11 of the accelerating electrode 4, as shown in Fig. 2, broken 4!9. Such uniformity of ion formation density is required. However, when the gas pressure in the discharge chamber is increased by F, the gas concentration increases on the downstream side of the gas introduction hole, and the ion current density becomes high as shown by the solid line 1o in FIG. 2, and uniformity is lost. In order to restore this broken uniformity, it is necessary to increase the number of gas introduction holes. The increase in the number of gas introduction holes complicates the manufacture of the discharge vessel 8 and has the drawback of significantly increasing the number of ζ-shaped needles.
又、ホローカソード１から放出される電子を放電室内に
ばらまく九めに設けたバックル７はホローカソード１か
ら１０００ ’Ｃ程度の輻崎寸を受けて強度劣化を起こ
す。上記欠点は低ガス玉数′４を行なう大型イオン・ス
ラスタに於て大キナ問題である。Further, the buckle 7 provided at the ninth position to scatter electrons emitted from the hollow cathode 1 into the discharge chamber is subjected to a convergence dimension of about 1000'C from the hollow cathode 1, causing strength deterioration. The above drawback is a large kina problem in large ion thrusters operating with low gas ball counts.
本発明は、このような事情に鑑みてなされ几もので、ガ
ス導入孔を放電容器につけないで破れた均一性を回復す
るとともに、バッフルを冷却して強度劣化を小さくした
電子衝撃型イオン・スラスタを提供することを目的とす
る。The present invention has been made in view of these circumstances, and is an electron impact type ion thruster that restores the broken uniformity without attaching gas inlet holes to the discharge vessel, and reduces strength deterioration by cooling the baffle. The purpose is to provide
本発明は、バッフルにガス導入機能を持たせて。 In the present invention, the baffle has a gas introduction function.
放゛シ室内に持ち込んだことを特徴とする電子衝撃型イ
オン・スラスタである。It is an electron impact type ion thruster that is unique in that it was brought into the radiation chamber.
本発明によれば、放電容器の複雑化及び大幅な重量増加
を伴なわずに低ガス圧放電時の均一性を満足させるとと
もにガス冷却によりてバッフルの強度劣化を小さくする
ことができる。According to the present invention, it is possible to satisfy uniformity during low gas pressure discharge without complicating the discharge vessel or significantly increasing its weight, and to reduce deterioration in strength of the baffle by gas cooling.
（発明の実施例〕
以下本発明の実施例を詳細に説明する。なお従来装作と
その構成が同一の部分については同一符号を附けてその
説明を省略する。第１図に示すように、バッフル７を中
空導体にして、適当な位置に多数の孔を設けて放電室内
に持ち込む。バッフル７の中空部分ＶＣＸｅガスを導入
すると、Ｘｅガスは孔のあい九方向にふき出す。孔の形
状及び位置を調整することにより放電室内のガス分布を
均一化する。ガス導入孔の数が多い分、均一化の程度Ｆ
ｉ高い。ガス分布が均一である念め、ホローカソード１
とアノード２の間の電場によって加逮された電子がＸｅ
ガスに衝突して生成される′ト離プラズマの分布は均一
になる。第１図のガス導入孔の数、形状及び位置は放電
室内のガス分布が均一になるようなものであれば何でも
よく、第１図のものに限定するものではｕい。又、バッ
フルの形状も中空導体であればよく第１図のものに限？
するものではない。バッフル７へのガス４人管も第１図
では２本あるが、１本でも、３本以上でもよい。このよ
うに構成することによりバッフル７はガス冷却されると
伴にガス導入機能を持つことになる。導入ガスとしてＸ
ｅを用いているが、Ｘｅガスに限定するものではない。(Embodiments of the Invention) Embodiments of the present invention will be described in detail below.The same reference numerals will be given to parts that are the same in structure as the conventional equipment, and the explanation thereof will be omitted.As shown in FIG. The baffle 7 is made into a hollow conductor, and a large number of holes are provided at appropriate positions to bring it into the discharge chamber. When the VCXe gas is introduced into the hollow part of the baffle 7, the Xe gas blows out in the nine directions of the holes. The gas distribution inside the discharge chamber is made uniform by adjusting the position.The degree of uniformity F is increased due to the large number of gas introduction holes.
iIt's expensive. Hollow cathode 1 to ensure uniform gas distribution
The electrons modified by the electric field between Xe and anode 2
The distribution of the separated plasma generated by colliding with the gas becomes uniform. The number, shape, and position of the gas introduction holes shown in FIG. 1 may be any number as long as the gas distribution within the discharge chamber is uniform, and the gas introduction holes are not limited to those shown in FIG. 1. Also, is the shape of the baffle limited to the one shown in Figure 1 as long as it is a hollow conductor?
It's not something you do. Although there are two gas pipes to the baffle 7 in FIG. 1, it may be one, three or more. With this configuration, the baffle 7 is gas-cooled and has a gas introduction function. X as introduced gas
Although Xe gas is used, it is not limited to Xe gas.
本発明は、カスプｉ場で放電室を履り＊’ｇ子衝撃型の
イオン・スラブ、夕を用いて説明したが、電子衝Ｓ型の
放゛亀室を使用しているｆｅ！であればよく、例えば１
俵融合で望用されるプラズマ加熱用中性粒子入射装置の
電子衝撃型のイオン源についても全く同じように適用で
きる。The present invention has been explained using an ion slab of the electron bombardment type, using a discharge chamber in the cusp I field, but an fe! For example, 1
The same applies to the electron impact type ion source of the neutral particle injection device for plasma heating, which is desired in bale fusion.
第１図は本発明の実施クリを示す概要図、第２図はイオ
ン成製密度の分布特性の概要図、第３図は従来の′４電
子撃型イオン・スラスタの構成１図である。
ｌ・・・ホローカソード、２・・・アノード、３・・・
磁石、４・・・加速′ａ他、５・・・ケース、６・・・
中和器、７・・・バッフル、８・・・放電容器。
代理人 弁理士 則 近 考 右
同 竹 花 喜久男
ブ１π”ス
第１図
第２図
乙
第３図FIG. 1 is a schematic diagram showing the implementation of the present invention, FIG. 2 is a schematic diagram of the distribution characteristics of the ion production density, and FIG. 3 is a diagram of the configuration of a conventional '4 electron bombardment type ion thruster. l...Hollow cathode, 2...Anode, 3...
Magnet, 4... Acceleration 'a, etc., 5... Case, 6...
Neutralizer, 7... Baffle, 8... Discharge vessel. Agent Patent Attorney Nori Chika Kou Takehana Kikuo 1π"S Figure 1 Figure 2 Figure B Figure 3
Claims (1)
速電極と中和器と電源等で構成されるイオン・スラスタ
に於いて、中空導体に複数個の穴を設けたバッフルを放
電室内に設けて、中空導体内にガスを流したことを特徴
とする電子衝撃型イオン・スラスタ。In an ion thruster consisting of a gas introduction system, a discharge vessel, a hollow cathode, a baffle, an accelerating electrode, a neutralizer, a power supply, etc., a baffle with multiple holes in a hollow conductor is installed inside the discharge chamber. An electron impact type ion thruster characterized by flowing gas inside a hollow conductor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1474686A JPS62174576A (en) | 1986-01-28 | 1986-01-28 | Electron impact type ion thruster |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1474686A JPS62174576A (en) | 1986-01-28 | 1986-01-28 | Electron impact type ion thruster |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62174576A true JPS62174576A (en) | 1987-07-31 |
Family
ID=11869676
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1474686A Pending JPS62174576A (en) | 1986-01-28 | 1986-01-28 | Electron impact type ion thruster |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62174576A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007288466A (en) * | 2006-04-17 | 2007-11-01 | Meidensha Corp | Pulse power supply |
| JP2007289436A (en) * | 2006-04-25 | 2007-11-08 | Newgin Corp | Game ball intake device and game machine having the same |
-
1986
- 1986-01-28 JP JP1474686A patent/JPS62174576A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007288466A (en) * | 2006-04-17 | 2007-11-01 | Meidensha Corp | Pulse power supply |
| JP4702156B2 (en) * | 2006-04-17 | 2011-06-15 | 株式会社明電舎 | Pulse power supply |
| JP2007289436A (en) * | 2006-04-25 | 2007-11-08 | Newgin Corp | Game ball intake device and game machine having the same |
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