JPS62174189A - Insulating transfer material - Google Patents
Insulating transfer materialInfo
- Publication number
- JPS62174189A JPS62174189A JP61210158A JP21015886A JPS62174189A JP S62174189 A JPS62174189 A JP S62174189A JP 61210158 A JP61210158 A JP 61210158A JP 21015886 A JP21015886 A JP 21015886A JP S62174189 A JPS62174189 A JP S62174189A
- Authority
- JP
- Japan
- Prior art keywords
- island
- layer
- transfer material
- metal
- metal vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 26
- 238000012546 transfer Methods 0.000 title claims abstract description 25
- 239000010410 layer Substances 0.000 claims abstract description 41
- 229910052751 metal Inorganic materials 0.000 claims abstract description 35
- 239000002184 metal Substances 0.000 claims abstract description 35
- 238000007740 vapor deposition Methods 0.000 claims abstract description 11
- 239000011241 protective layer Substances 0.000 claims abstract description 7
- 238000002834 transmittance Methods 0.000 claims description 8
- 239000012790 adhesive layer Substances 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 claims description 4
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- 238000009413 insulation Methods 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 229910052745 lead Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 230000015556 catabolic process Effects 0.000 abstract description 8
- 239000011888 foil Substances 0.000 abstract description 8
- 239000004925 Acrylic resin Substances 0.000 abstract description 5
- 229920000178 Acrylic resin Polymers 0.000 abstract description 5
- 239000011347 resin Substances 0.000 abstract description 5
- 229920005989 resin Polymers 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 4
- 238000012545 processing Methods 0.000 abstract description 4
- 229920006267 polyester film Polymers 0.000 abstract description 3
- 229920000298 Cellophane Polymers 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000002985 plastic film Substances 0.000 abstract description 2
- 229920006255 plastic film Polymers 0.000 abstract description 2
- 239000012528 membrane Substances 0.000 abstract 1
- 239000002932 luster Substances 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
- B41M5/245—Electroerosion or spark recording
Landscapes
- Duplication Or Marking (AREA)
- Decoration By Transfer Pictures (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
この発明は、テレビ等の電気製品の外枠に転写しても通
電することのない絶縁性転写材料に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an insulating transfer material that does not conduct electricity even when transferred to the outer frame of an electrical product such as a television.
（従来の技術）
テレビの外枠等には従来、そとに金属光沢を付与し美麗
さと金属の感じを出すために、ＡＪ箔が粘着剤、接着剤
にて貼られたシあるいはネジで固定密着されたシしてい
る。また、Ａｌ箔にかえて、基材、離型層、保護層、Ａ
Ｉ蒸着層、及び接着層を順次積層した転写材料の転写も
試みられている。(Prior technology) Conventionally, AJ foil was attached to the outer frame of a TV with an adhesive or adhesive, or fixed with screws, in order to give the outer frame a metallic luster and give it a beautiful and metallic feel. I'm in close contact with you. Also, instead of Al foil, the base material, release layer, protective layer,
Attempts have also been made to transfer a transfer material in which an I vapor-deposited layer and an adhesive layer are sequentially laminated.
（発明が解決しようとする問題点）
しかし％ＡＩ箔を使用した場合は、テレビのブラウン管
からの高圧電子線によシＡｌ箔に帯電した電子を速やか
に流すためにアースを設ける必要があシ、また、帯電量
が大きくならないよう、Ａｄ箔の表面積は制限され通常
１（ｌｄ以下とされている。さらに、ＡＪ箔の貼付けや
固定等の工程を要すると共にこれがコスト高に影響を与
えていると共に面積的制限からデザイン上の制約も受け
る。(Problem to be solved by the invention) However, when using %AI foil, it is necessary to provide a ground to quickly flow the charged electrons to the Al foil due to the high-voltage electron beam from the TV's cathode ray tube. Furthermore, in order to prevent the amount of charge from increasing, the surface area of the Ad foil is limited and is usually less than 1 (ld).Furthermore, processes such as pasting and fixing the AJ foil are required, and this has an impact on the cost. At the same time, it is also subject to design constraints due to area limitations.
そこで上記の欠点を除去すべくＡｌ蒸着層を有する転写
材料の転写も試みられているが、この場合は、ブラウン
管からの高圧電子線によ１）ｈｌ蒸着層に帯電した電子
が放電を起こし、またとの放電を防止するためにアース
線を設けても、Ａｌ蒸着層が５００Å〜１ｏｏｏ１と薄
いため機械的な強度がなく実質的なアース線を設けるこ
とは不可能であシ、転写した部分に手などを触れると通
電することがあった。Therefore, in order to eliminate the above-mentioned drawbacks, attempts have been made to transfer a transfer material having an Al vapor deposited layer, but in this case, 1) electrons charged in the HL vapor deposited layer cause discharge by a high voltage electron beam from a cathode ray tube; Even if a ground wire is provided to prevent electrical discharge from occurring, it is impossible to provide a substantial ground wire because the Al vapor deposition layer is as thin as 500 Å to 100 Å and lacks mechanical strength. If you touch it with your hand, it may become energized.
との発明は、これら諸々の欠点を除去するものであシ、
転写した場合の絶縁破壊電圧が１０００Ｖ以上となシ、
テレビの外枠に転写しても何ら通電することもなく安心
して使用でき、また、それと同時に通常の転写材料と同
様美麗な金属光沢を付与することができる転写材料を提
供するものである。The invention is intended to eliminate these various drawbacks,
The dielectric breakdown voltage when transferred must be 1000V or more.
To provide a transfer material that can be safely used without any electricity even when transferred to the outer frame of a television, and at the same time can impart a beautiful metallic luster like a normal transfer material.
（問題点を解決するための手段）
この発明は、基材の片面に離型層、保護層、金属蒸着層
、及び接着層を順次積層してなる転写材料において、金
属蒸着層を島状構造として絶縁性をもたせたことを特徴
とする絶縁性転写材料である０
基材としては、ポリエステルフィルム等のプラスチック
フィルム、セロハン、金属箔、紙弊従来から転写材料の
基材として使用されているものが使用でき、ヘアーライ
ン加工等の凹凸加工を施こしたものももちろん使用でき
る。(Means for Solving the Problems) The present invention provides a transfer material in which a release layer, a protective layer, a metal vapor deposited layer, and an adhesive layer are sequentially laminated on one side of a base material. It is an insulating transfer material characterized by having insulating properties.The base material includes plastic films such as polyester film, cellophane, metal foil, and paper. Of course, it is also possible to use materials with uneven processing such as hairline processing.
離型層はアクリル樹脂等適宜の樹脂にて設ける。The release layer is made of an appropriate resin such as acrylic resin.
保護層はアクリル樹脂等適宜の樹脂にて設は着色をして
もよい。The protective layer may be made of an appropriate resin such as acrylic resin or may be colored.
金属蒸着層は真空蒸着、スパッタリング、イオンブレー
ティング等の従来公知の薄膜生成法によシ設ける。金属
蒸着層は薄膜生成過程でいえば「核生成」から「被結合
」、「初期島状構造」を経た後の島状構造となるように
設ける。The metal vapor deposition layer is provided by a conventionally known thin film forming method such as vacuum deposition, sputtering, or ion blasting. In terms of the thin film production process, the metal vapor deposition layer is provided so as to form an island structure after passing through "nucleation", "bonding", and "initial island structure".
この発明は金属蒸着層の構造を島状構造とすることによ
り、金属を使用しているにもかかわらず絶縁性のものと
したものである。島状構造におけｔＡ）
る島のサイズは２００１〜１μｍ程度とする。島のサイ
ズが２００Ｘよシ小さいと美麗な金属光沢が得られない
。島のサイズが１μｍを超える島と島とが接して一体と
なってきて絶縁性が低下する。In this invention, the structure of the metal vapor deposited layer is made into an island structure, thereby making the layer insulating even though metal is used. The size of the islands in the island-like structure is approximately 2001 to 1 μm. If the size of the island is smaller than 200X, a beautiful metallic luster cannot be obtained. Islands with an island size of more than 1 μm come into contact with each other and become integrated, resulting in a decrease in insulation.
島の間隔は１００Å〜５０００Ａとする。島の間隔が１
００ｘよシ小さいとトンネル電流が流れ絶縁性が悪い。The spacing between the islands is 100 Å to 5000 Å. Island spacing is 1
If it is smaller than 00x, tunnel current will flow and the insulation will be poor.
島の間隔が５００ＯＡよシ大きいと全体としての金属の
量が少なく美麗な金属光沢は得られない。If the spacing between the islands is larger than 500 OA, the overall amount of metal will be small and a beautiful metallic luster will not be obtained.
また、島の間隔が５００ＯＡを超えると、金属蒸着層の
平面方向の密度が粗となり耐摩耗性が低下すると共に、
後に接着層を金属蒸着層上に設ける際に溶剤がこの間隔
から浸透して保護層と金属蒸着層との間に悪影響を与え
転写時の耐熱性が低下して転写時にいわゆる熱ヤケ等に
より外観異常が生じ反射光沢が低下するし、さらに、金
属蒸着層の鉛賠硬度が低下して引掻きに非常に弱くなる
ものである。In addition, when the spacing between the islands exceeds 500 OA, the density of the metal vapor deposited layer in the plane direction becomes coarse, and the wear resistance decreases.
Later, when an adhesive layer is provided on the metal vapor deposited layer, the solvent penetrates through this gap and has an adverse effect on the relationship between the protective layer and the metal vapor deposited layer, reducing the heat resistance during transfer and causing so-called heat discoloration during transfer, resulting in poor appearance. Abnormalities occur and the reflective gloss decreases, and furthermore, the lead hardness of the metal vapor deposited layer decreases, making it extremely susceptible to scratching.
この発明の金属蒸着層の島状構造を得るには、蒸発速度
、基材温度、蒸着膜厚等を制御する必要がある。この発
明の島のサイズや間隔を得るための制御は使用する金属
によシ難易がある。大ざっばにいえば融点の低い金属や
貴金属は制御が比較的容易であり、中でもＳｎ 、 Ｐ
ｂ 、Ｚｎ 、 Ｂｉ等はこの発明には特に好ましい。In order to obtain the island-like structure of the metal vapor deposited layer of this invention, it is necessary to control the evaporation rate, substrate temperature, vapor deposition film thickness, etc. Controlling the size and spacing of the islands in this invention is difficult depending on the metal used. Generally speaking, metals with low melting points and noble metals are relatively easy to control, especially Sn and P.
b, Zn, Bi, etc. are particularly preferred for this invention.
また、Ｔｉ、Ｏｒ％Ｆｅ％Ｃｏ。Also, Ti, Or%Fe%Co.
Ｎ１等の遷移金属やＳｌ、Ｇθ等の半導体金属は制御は
比較的容易でない。Control of transition metals such as N1 and semiconductor metals such as Sl and Gθ is relatively difficult.
この発明の島状構造の金属蒸着層の生成は、金属の凝集
エネルギーと吸着エネルギーとの関係の制御にかかつて
おシ、そのために各種の蒸着条件の制御を要するもので
あるが、一般的には蒸発速度を速く、また基材温度を低
くする程島のサイズは小さくなる傾向にある。しかし蒸
着膜厚の影響は特に大きく、蒸着膜厚を光線透過率で換
算した場合、光線透過率１０％〜１５％がこの発明の金
属蒸着層の島状構造を得るのに最適である。もつともこ
れも金属によシ異なｌ） 、Ｏｎ、Ｐｂ、Ｚｎ、Ｂｉ等
はとれでよいが、その他の金属では必ずしもこの範囲が
最適とはならない場合もある。The formation of a metal vapor deposited layer with an island-like structure according to the present invention involves controlling the relationship between cohesive energy and adsorption energy of the metal, and therefore requires control of various vapor deposition conditions. The island size tends to decrease as the evaporation rate increases and the substrate temperature decreases. However, the influence of the deposited film thickness is particularly large, and when the deposited film thickness is converted into light transmittance, a light transmittance of 10% to 15% is optimal for obtaining the island-like structure of the metal vapor deposited layer of this invention. Of course, this also differs depending on the metal. For On, Pb, Zn, Bi, etc., it is acceptable, but for other metals, this range may not necessarily be optimal.
この発明に使用する代表的金属である８ｎの場合、Ｓｎ
ｉ着層の光線透過率が１０％よシ少ないと絶縁破壊電圧
が１ｏｏｏｖに達せず、光線透過率が１５チを超えると
絶縁破壊電圧は１２０００７以上となるが、美麗な金属
光沢がなくなる。美麗な金属光沢を得るにはＳｎ蒸着層
の場合光沢度で大体５５０％以上を要するのであるが、
Ｓｎ蒸着層の光線透過率が１５−以下であれば光沢度が
３５０ｑｌＪ以上となるものであんしかし、Ｓｎ蒸着層
の光線透過率が１０％よシ少ないと光沢度は４５０チ以
上ともなるのであるが、絶縁破壊電圧は１０００’Ｖに
達しなくなるものである。In the case of 8n, which is a typical metal used in this invention, Sn
If the light transmittance of the i-attached layer is less than 10%, the dielectric breakdown voltage will not reach 100V, and if the light transmittance exceeds 15 cm, the dielectric breakdown voltage will be 120,007 or more, but the beautiful metallic luster will be lost. In order to obtain a beautiful metallic luster, the Sn vapor deposited layer requires a gloss level of approximately 550% or more.
If the light transmittance of the Sn vapor deposited layer is 15 or less, the gloss will be 350 qlJ or more, but if the light transmittance of the Sn vapor deposited layer is less than 10%, the gloss will be 450 qlJ or more. However, the dielectric breakdown voltage does not reach 1000'V.
（実施例）
厚さ２５μｍの長尺なポリエステルフィルムの片面に、
アクリル樹脂を使用して厚さ１μｍの離型層をロールコ
ーティングによシ設け、該離型層上にアクリル−ウレタ
ン樹脂を使用して１．５μｍの厚さの保護層をロールコ
ーティングによシ設け、次に該保護層上に、半連続式真
空蒸着機を使用してＳｎ蒸着層を真空蒸着によシ下記の
蒸着条件にて下記の島状構造に設けて実施例１、実施例
２とし、さらにこれら実施例のＳｎ蒸着層上にアクリル
−塩ビ酢ビ共重合体樹脂を用いて２．５μｍの厚さの接
着層をロールコーティングによシ設けて、この発明の絶
縁性転写材料を２種類得た。(Example) On one side of a long polyester film with a thickness of 25 μm,
A release layer with a thickness of 1 μm is provided by roll coating using an acrylic resin, and a protective layer with a thickness of 1.5 μm is applied on the release layer using an acrylic-urethane resin by roll coating. Example 1, Example 2 Further, on the Sn vapor deposited layer of these Examples, an adhesive layer of 2.5 μm thick was provided by roll coating using an acrylic-vinyl chloride-vinyl acetate copolymer resin to obtain the insulating transfer material of the present invention. I got two types.
東蒸着基材温度としては蒸着機のクーリングキャンの温
度を一１０℃とした
東光線透過率はフィルム巻取スピードの制御−によ）コ
ントロールした
東光線透過率は、全光線透過率を、ｒｌ［に６７１４の
方法によシ測定した
来島のサイズについては電子顕微鏡にて蒸着層を観察し
平均的な大きさを表示した
来島の間隔については電子顕微鏡にて蒸着層を観察し平
均的な間隔を表示した
（比較例）
実施例１におけるＳｎ蒸着層にかえて厚さ５００ Ｘの
ＡＩ！蒸着層としたほかは実施例１と同様にして転写材
料を作成しこれを比較例とした。The temperature of the cooling can of the vapor deposition machine was set to -10°C as the temperature of the substrate for vapor deposition.The light transmittance was controlled by controlling the film winding speed. [For the size of Kurushima measured by the method of 6714, the average size was determined by observing the deposited layer with an electron microscope.As for the spacing of Kurushima, the average size was determined by observing the deposited layer with an electron microscope. (Comparative example) Instead of the Sn vapor deposited layer in Example 1, a 500× thick AI! A transfer material was prepared in the same manner as in Example 1 except that it was a vapor deposited layer, and this was used as a comparative example.
次に、実施例１、実施例２、及び上記比較例で得られた
転写材料を８ｄのスチロール板に転写してそれぞれサン
プルとして絶縁破壊電圧を測定した。測定方法は、サン
プルの表面にｓｏｎｇφノ円柱による電極と７０ｊ１１
７肉厚５Ｍのガードリング電極を接触させ、この両電極
間に電圧を印加し、放電によシ転写部分に孔がおいてス
チロール板が露出したときの電圧を測定した。Next, the transfer materials obtained in Example 1, Example 2, and the above-mentioned comparative example were transferred onto an 8D styrene plate, and the dielectric breakdown voltage was measured for each sample. The measurement method is to use a songφ cylinder electrode and a 70j11 electrode on the surface of the sample.
7 A guard ring electrode with a wall thickness of 5M was brought into contact, a voltage was applied between the two electrodes, and the voltage was measured when a hole was made in the transfer portion due to discharge and the styrene plate was exposed.
このようにして実施例１、実施例２、及び比較例の場合
の絶縁破壊電圧を測定した結果は次の通電である。また
、それぞれのサンプルにつき表面の光沢度釦ついても測
定した。The results of measuring the dielectric breakdown voltage in Example 1, Example 2, and Comparative Example in this manner are as follows. The surface glossiness of each sample was also measured.
（発明の効果）
この発明は、金属蒸着層を島状構造として絶縁性をもた
せたから、転写した場合に１０００７以上もの絶縁破壊
電圧を容易に得ることができるものセあシ、従来の単な
るＡｄ蒸着層等を使用した場合とは異なシ、テレビの外
枠に転写した場合に手を触れても何ら通電するととなく
安心して使用できると共に、金属光沢も従来と同様美麗
なものが得られるものである。(Effects of the Invention) Since the metal vapor deposited layer has an island-like structure and has insulating properties, it is possible to easily obtain a dielectric breakdown voltage of 10,007 or more when transferred, compared to the conventional simple Ad vapor deposition. Unlike when using a layer, etc., when transferred to the outer frame of a TV, there is no electricity even if you touch it, so you can use it with confidence, and you can also obtain the same beautiful metallic luster as before. be.
Claims (4)
接着層を順次積層してなる転写材料において、金属蒸着
層を島状構造として絶縁性をもたせたことを特徴とする
絶縁性転写材料。(1) A transfer material in which a release layer, a protective layer, a metal vapor deposited layer, and an adhesive layer are sequentially laminated on one side of a base material, characterized in that the metal vapor deposit layer has an island-like structure to provide insulation properties. Insulating transfer material.
１μｍ、島の間隔１００Å〜５０００Åである特許請求
の範囲第１項記載の絶縁性転写材料。(2) The island-like structure of the metal vapor deposited layer has an island size of 200 Å or more.
The insulating transfer material according to claim 1, wherein the insulating transfer material has an island spacing of 1 μm and an island spacing of 100 Å to 5000 Å.
なる群から選ばれた一種又は二種以上の金属である特許
請求の範囲第１項又は第２項記載の絶縁性転写材料。(3) The insulating transfer material according to claim 1 or 2, wherein the metal of the metal vapor deposition layer is one or more metals selected from the group consisting of Sn, Pb, Zn, and Bi.
特許請求の範囲第３項記載の絶縁性転写材料。(4) The insulating transfer material according to claim 3, wherein the metal vapor deposited layer has a light transmittance of 10% to 15%.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60-235598 | 1985-10-21 | ||
| JP23559885 | 1985-10-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62174189A true JPS62174189A (en) | 1987-07-30 |
| JPH0325353B2 JPH0325353B2 (en) | 1991-04-05 |
Family
ID=16988374
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61210158A Granted JPS62174189A (en) | 1985-10-21 | 1986-09-05 | Insulating transfer material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62174189A (en) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01192598A (en) * | 1988-01-27 | 1989-08-02 | Reiko Co Ltd | Transfer foil for copying |
| JPH0326540A (en) * | 1989-06-23 | 1991-02-05 | Reiko Co Ltd | Base material partially having insulating metal membrane and method for partially applying insulating metal membrane |
| JPH0327999A (en) * | 1989-06-27 | 1991-02-06 | Reiko Co Ltd | Insulating and microwave permeable transfer material |
| WO2008020482A1 (en) * | 2006-08-18 | 2008-02-21 | Reiko Co., Ltd. | Insulating material excelling in metallic gloss and molded article making use of the same |
| JP2008105179A (en) * | 2006-10-23 | 2008-05-08 | Toray Advanced Film Co Ltd | Metal thin film transfer material and its manufacturing method |
| US7651033B2 (en) | 2005-12-19 | 2010-01-26 | Dai Nippon Printing Co., Ltd. | Noncontract IC tag with non-conductive metal film |
| JP2010240982A (en) * | 2009-04-06 | 2010-10-28 | Reiko Co Ltd | Resin molded product excellent in designability, metallic luster and insulating property, and method for manufacturing the same |
| JP2013523494A (en) * | 2010-03-29 | 2013-06-17 | ピーピージー・インダストリーズ・オハイオ・インコーポレイテッド | Solar control coating with discontinuous metal layer |
| WO2019187929A1 (en) * | 2018-03-30 | 2019-10-03 | ソニー株式会社 | Structure, decorative film, and decorative film manufacturing method |
| US10562812B2 (en) | 2018-06-12 | 2020-02-18 | Guardian Glass, LLC | Coated article having metamaterial-inclusive layer, coating having metamaterial-inclusive layer, and/or method of making the same |
| US10654748B2 (en) | 2010-03-29 | 2020-05-19 | Vitro Flat Glass Llc | Solar control coatings providing increased absorption or tint |
| US10654747B2 (en) | 2010-03-29 | 2020-05-19 | Vitro Flat Glass Llc | Solar control coatings with subcritical copper |
| US10830933B2 (en) | 2018-06-12 | 2020-11-10 | Guardian Glass, LLC | Matrix-embedded metamaterial coating, coated article having matrix-embedded metamaterial coating, and/or method of making the same |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60168689A (en) * | 1984-02-14 | 1985-09-02 | Kyodo Printing Co Ltd | Vapor-deposited type hot stamping film |
| JPS60235598A (en) * | 1984-05-08 | 1985-11-22 | Mitsubishi Electric Corp | Vco for secam encoder |
| JPS61211078A (en) * | 1985-03-16 | 1986-09-19 | Kansai Makitorihaku Kogyo Kk | Magnetic transfer material and transfer method |
-
1986
- 1986-09-05 JP JP61210158A patent/JPS62174189A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60168689A (en) * | 1984-02-14 | 1985-09-02 | Kyodo Printing Co Ltd | Vapor-deposited type hot stamping film |
| JPS60235598A (en) * | 1984-05-08 | 1985-11-22 | Mitsubishi Electric Corp | Vco for secam encoder |
| JPS61211078A (en) * | 1985-03-16 | 1986-09-19 | Kansai Makitorihaku Kogyo Kk | Magnetic transfer material and transfer method |
Cited By (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01192598A (en) * | 1988-01-27 | 1989-08-02 | Reiko Co Ltd | Transfer foil for copying |
| JPH0326540A (en) * | 1989-06-23 | 1991-02-05 | Reiko Co Ltd | Base material partially having insulating metal membrane and method for partially applying insulating metal membrane |
| JPH0737111B2 (en) * | 1989-06-23 | 1995-04-26 | 株式会社麗光 | Substrate partially having insulating metal thin film and method of partially applying insulating metal thin film |
| JPH0327999A (en) * | 1989-06-27 | 1991-02-06 | Reiko Co Ltd | Insulating and microwave permeable transfer material |
| US7651033B2 (en) | 2005-12-19 | 2010-01-26 | Dai Nippon Printing Co., Ltd. | Noncontract IC tag with non-conductive metal film |
| WO2008020482A1 (en) * | 2006-08-18 | 2008-02-21 | Reiko Co., Ltd. | Insulating material excelling in metallic gloss and molded article making use of the same |
| JP2008105179A (en) * | 2006-10-23 | 2008-05-08 | Toray Advanced Film Co Ltd | Metal thin film transfer material and its manufacturing method |
| JP2010240982A (en) * | 2009-04-06 | 2010-10-28 | Reiko Co Ltd | Resin molded product excellent in designability, metallic luster and insulating property, and method for manufacturing the same |
| US10358384B2 (en) | 2010-03-29 | 2019-07-23 | Vitro, S.A.B. De C.V. | Solar control coatings with discontinuous metal layer |
| US10654747B2 (en) | 2010-03-29 | 2020-05-19 | Vitro Flat Glass Llc | Solar control coatings with subcritical copper |
| US11401207B2 (en) | 2010-03-29 | 2022-08-02 | Vitro Flat Glass Llc | Solar control coatings providing increased absorption or tint |
| US11993536B2 (en) | 2010-03-29 | 2024-05-28 | Vitro Flat Glass Llc | Solar control coating with discontinuous metal layer |
| US11891328B2 (en) | 2010-03-29 | 2024-02-06 | Vitro Flat Glass Llc | Solar control coatings providing increased absorption or tint |
| US10654748B2 (en) | 2010-03-29 | 2020-05-19 | Vitro Flat Glass Llc | Solar control coatings providing increased absorption or tint |
| US10654749B2 (en) | 2010-03-29 | 2020-05-19 | Vitro Flat Glass Llc | Solar control coatings providing increased absorption or tint |
| US9932267B2 (en) | 2010-03-29 | 2018-04-03 | Vitro, S.A.B. De C.V. | Solar control coatings with discontinuous metal layer |
| US10703673B2 (en) | 2010-03-29 | 2020-07-07 | Vitro Flat Glass Llc | Solar control coating with discontinuous metal layer |
| US11286200B2 (en) | 2010-03-29 | 2022-03-29 | Vitro Flat Glass Llc | Solar control coatings with subcritical copper |
| JP2013523494A (en) * | 2010-03-29 | 2013-06-17 | ピーピージー・インダストリーズ・オハイオ・インコーポレイテッド | Solar control coating with discontinuous metal layer |
| US10981826B2 (en) | 2010-03-29 | 2021-04-20 | Vitro Flat Glass Llc | Solar control coatings with subcritical copper |
| US11267752B2 (en) | 2010-03-29 | 2022-03-08 | Vitro Flat Glass Llc | Solar control coating with discontinuous metal layer |
| US11078718B2 (en) | 2018-02-05 | 2021-08-03 | Vitro Flat Glass Llc | Solar control coatings with quadruple metallic layers |
| US11885174B2 (en) | 2018-02-05 | 2024-01-30 | Vitro Flat Glass Llc | Solar control coatings with quadruple metallic layers |
| JPWO2019187929A1 (en) * | 2018-03-30 | 2021-04-01 | ソニー株式会社 | Structure, decorative film and manufacturing method of decorative film |
| WO2019187929A1 (en) * | 2018-03-30 | 2019-10-03 | ソニー株式会社 | Structure, decorative film, and decorative film manufacturing method |
| US10830933B2 (en) | 2018-06-12 | 2020-11-10 | Guardian Glass, LLC | Matrix-embedded metamaterial coating, coated article having matrix-embedded metamaterial coating, and/or method of making the same |
| US10562812B2 (en) | 2018-06-12 | 2020-02-18 | Guardian Glass, LLC | Coated article having metamaterial-inclusive layer, coating having metamaterial-inclusive layer, and/or method of making the same |
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|---|---|
| JPH0325353B2 (en) | 1991-04-05 |
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