JPS62172323A - Rubbing method for liquid crystal display plate - Google Patents
Rubbing method for liquid crystal display plateInfo
- Publication number
- JPS62172323A JPS62172323A JP1496486A JP1496486A JPS62172323A JP S62172323 A JPS62172323 A JP S62172323A JP 1496486 A JP1496486 A JP 1496486A JP 1496486 A JP1496486 A JP 1496486A JP S62172323 A JPS62172323 A JP S62172323A
- Authority
- JP
- Japan
- Prior art keywords
- rubbing
- substrate
- liquid crystal
- ionized gas
- destaticizers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 22
- 238000000034 method Methods 0.000 title claims description 15
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 239000011521 glass Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 4
- 230000003068 static effect Effects 0.000 abstract description 21
- 230000005611 electricity Effects 0.000 abstract description 6
- 230000007547 defect Effects 0.000 abstract description 4
- 238000009825 accumulation Methods 0.000 abstract description 2
- 238000007664 blowing Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 9
- 230000008569 process Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 229910006853 SnOz Inorganic materials 0.000 description 1
- 241001122767 Theaceae Species 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 150000001916 cyano esters Chemical class 0.000 description 1
- VBWIZSYFQSOUFQ-UHFFFAOYSA-N cyclohexanecarbonitrile Chemical compound N#CC1CCCCC1 VBWIZSYFQSOUFQ-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical group [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing
Abstract
Description
【発明の詳細な説明】
〔概要〕
配向膜をラビングする配向処理に際し、静電気の放電に
より生ずる表示欠陥を無くする方法としてラビング処理
中にイオン化したガスを基板の表裏面に吹きつけて中和
する方法。[Detailed Description of the Invention] [Summary] During the alignment process of rubbing the alignment film, as a method of eliminating display defects caused by electrostatic discharge, ionized gas is sprayed onto the front and back surfaces of the substrate during the rubbing process to neutralize it. Method.
本発明は静電気の放電により生ずる表示欠陥をなくした
液晶表示板のラビング方法に関する。The present invention relates to a method of rubbing a liquid crystal display panel that eliminates display defects caused by electrostatic discharge.
液晶表示素子はガラス基板上に透明電極パターンを少な
くとも一方に備えた二枚の基板をそれぞれ電極パターン
を内側にして対向せしめ、この間に液晶を封入して選択
的に電界印加ができるようにしたものである。A liquid crystal display element consists of two glass substrates with a transparent electrode pattern on at least one side facing each other with the electrode pattern on the inside, and a liquid crystal sealed between them so that an electric field can be applied selectively. It is.
すなわら、ドツトマトリックス型の場合、平行平板から
なるガラス基板の内側には例えば線幅が２００〜３００
ＩＪｍで線間隔が１００μｍ程度で平行にパターン形
成された多数の透明電極と対向電極とが作られており、
この両電極は厚さが１０μｍ程度のマイラーフィルムな
どからなるセパレータにより微少間隔を隔てて対向する
と共に電極パターンが互いに直交するように配置されて
おり、この隙間に液晶が封入されている。In other words, in the case of a dot matrix type, the line width is, for example, 200 to 300 on the inside of a glass substrate made of parallel flat plates.
A large number of transparent electrodes and counter electrodes are formed in parallel patterns with a line spacing of about 100 μm using IJm.
These two electrodes are opposed to each other with a minute interval separated by a separator made of Mylar film or the like with a thickness of about 10 μm, and are arranged so that the electrode patterns are perpendicular to each other, and liquid crystal is sealed in this gap.
ここで透明電極は酸化１°ンジウム（Ｉｎ２０３ ）と
酸化錫（ＳｎＯｚ ）との固溶体（略称ＩＴＯ）から構
成されており、また対向電極は用途により金（Ａｕ）な
どの反射金属膜或いはＩＴＯなどのる透明寡電膜から形
成されている。Here, the transparent electrode is made of a solid solution (abbreviated as ITO) of 1°dium oxide (In203) and tin oxide (SnOz), and the counter electrode is made of a reflective metal film such as gold (Au) or a reflective metal film such as ITO, depending on the application. It is formed from a transparent oligostatic film.
次に表示素子の駆動は直交するＸ電極とＹ電極に走査パ
ルスと信号パルスとを印加して走査し、選択点に一方の
電圧或いは両方の電圧が重畳して加わるようにし、後者
の場合は液晶の相転移が起こるに必要な電界に達するよ
う構成されている。Next, the display element is driven by scanning by applying a scanning pulse and a signal pulse to the orthogonal X and Y electrodes, so that one voltage or both voltages are superimposed and applied to the selected point. It is configured to reach the electric field necessary for the phase transition of the liquid crystal to occur.
液晶表示素子はこのような素子構成をとり、ＸＹ主電極
交叉点（ドツト）の液晶が一定の電圧値以上で相転移を
生じ、光通過率が変化するのを利用して表示が行われて
いる。A liquid crystal display element has such an element configuration, and displays are performed by utilizing the fact that the liquid crystal at the intersection point (dot) of the XY main electrodes undergoes a phase transition when the voltage exceeds a certain value, and the light transmission rate changes. There is.
ここで、コントラスト比が高い表示を行うには封入した
液晶が電極の間で正しく且つ均一に配向していることが
必要である。Here, in order to perform a display with a high contrast ratio, it is necessary that the enclosed liquid crystal be aligned correctly and uniformly between the electrodes.
本発明は配向処理の際に発生し易い表示欠陥をな（する
処理方法に関するものである。The present invention relates to a processing method for eliminating display defects that tend to occur during alignment processing.
液晶表示素子に使用される液晶には基板に対して垂直配
向性を示すものと水平配向性を示すものとがあり、この
性質を利用してコントラスト比が高い液晶表示が行われ
ている。Liquid crystals used in liquid crystal display elements include those that exhibit vertical alignment with respect to the substrate and those that exhibit horizontal alignment, and these properties are utilized to provide liquid crystal displays with a high contrast ratio.
然し、液晶分子の配向性はこれを挟んで対向している基
板材料の種類と、その表面状態により左もされるので電
極基板上に絶縁性の配向膜を設けて液晶の配向を助けて
いる。However, the orientation of liquid crystal molecules depends on the type of substrate material that faces them and their surface condition, so an insulating alignment film is provided on the electrode substrate to help align the liquid crystal. .
例えば液晶分子を基板と平行な方向に配向さ・仕る（水
平配向）には酸化硅素（ＳｉＯ）の斜方蒸着やポリビニ
ルアルコール（略称ＰＶＡ）或いはポリイミド（略称Ｐ
Ｉ）のラビングが用いられている。For example, to align liquid crystal molecules in a direction parallel to the substrate (horizontal alignment), use of oblique vapor deposition of silicon oxide (SiO), polyvinyl alcohol (abbreviated as PVA), or polyimide (abbreviated as P) is used.
I) rubbing is used.
また垂直配向させるにはシランカップリング剤やクロー
ム錯体の塗布が行われている。Furthermore, in order to achieve vertical alignment, a silane coupling agent or a chromium complex is applied.
さて、本発明に係る液晶表示素子はツイストネマティッ
ク効果を用いるＴＮ表示法をとるために透′明電極基板
と対向電極基板上には水平配向膜が形成されている。Now, since the liquid crystal display element according to the present invention uses the TN display method using the twisted nematic effect, a horizontal alignment film is formed on the transparent electrode substrate and the counter electrode substrate.
そして、この形成法としては量産工程に適する点からＰ
ＶＡ或いはｒ’［のラビング（Ｒｕｂｂｉｎｇ）処理が
用いられている。This formation method is suitable for mass production processes, so P
VA or r' [rubbing processing is used.
第２図と第３図は従来の処理方法を示すものでＩ’ＶＡ
或いはＰＩを約０．１ μｍの厚ざに被覆したガラス基
板１ （以下略して基板）をラビングテーブル２の上に
固定し、このラビングテーブル２を綿布。Figures 2 and 3 show the conventional processing method.
Alternatively, a glass substrate 1 coated with PI to a thickness of about 0.1 μm (hereinafter simply referred to as the substrate) is fixed on a rubbing table 2, and the rubbing table 2 is covered with cotton cloth.
ナイロン、ポリエステルなどの植物繊維或いは化学繊維
を植毛してあり高速で回転するラビングロール３の下を
往復運動させることによりガラス基板１の上に膜形成さ
れている配向膜がラビングされるよう構成されている。The orientation film formed on the glass substrate 1 is rubbed by reciprocating under the rubbing roll 3, which is made of plant fibers such as nylon or polyester or chemical fibers and rotates at high speed. ing.
すなわち、モータ４により一定方向に高速回転するラビ
ングロール３により一定の方向に配向処理される。That is, the rubbing roll 3, which is rotated at high speed in a certain direction by a motor 4, is oriented in a certain direction.
そして配向方向が直交すにようにガラス基板１ヲ配置し
、これにシアノエステル、シアノシクロヘキサンなどの
水平配向性を示す液晶を封入すれば上下の電極間で液晶
分子の配列が９０°連続的に捻れた液晶配列ができるこ
とになる。Then, if the glass substrate 1 is arranged so that the orientation directions are perpendicular to each other, and a liquid crystal exhibiting horizontal orientation such as cyanoester or cyanocyclohexane is filled in it, the alignment of the liquid crystal molecules will be continuous at 90° between the upper and lower electrodes. This results in a twisted liquid crystal alignment.
然し、ｌ’ＶＡやＰＩは絶縁物であることからラビング
処理により帯電が起こり、帯電した静電気により配向膜
の劣化や電極にｗ１害を起こすことが問題であった。However, since l'VA and PI are insulators, they become charged during the rubbing process, and the charged static electricity causes problems such as deterioration of the alignment film and w1 damage to the electrodes.
特にラビング処理により生じた静電気が電極間で放電し
、これにより液晶分子の配向性が破壊されたり、電極バ
タ”−ンが損傷することである。In particular, static electricity generated by the rubbing process is discharged between the electrodes, which destroys the alignment of liquid crystal molecules and damages the electrode patterns.
かかる問題の対策として、
■ 電極パターンの一部に共通電極を設け、これを放電
電極として使用し、ラビング処理後に切り刈す。As a countermeasure for this problem, 1) A common electrode is provided in a part of the electrode pattern, used as a discharge electrode, and cut after rubbing.
■ ラビングロールの近くに除電バーを設け、帯電した
電荷を中和する。■ Install an anti-static bar near the rubbing roll to neutralize the electrical charge.
■ 湿度を高くした状態でラビング処理する。■ Perform rubbing treatment with high humidity.
などの方法が試みられている。Other methods have been tried.
然し、■の場合、は工数を要し、量産的でなく、■の場
合は除電が不完全であり、また■の場合は効果的な条件
は相対湿度が室温で６０％以上であり、配向膜の種類に
よっては劣化すると云う問題があり、何れも充分な効果
を挙げていない。However, in the case of ■, it takes a lot of man-hours and is not suitable for mass production, in the case of ■, static elimination is incomplete, and in the case of ■, the effective conditions are relative humidity of 60% or more at room temperature, and orientation. There is a problem that the film deteriorates depending on the type of film, and none of them are sufficiently effective.
〔発明が解決しようとする問題点〕
以上記したようにラビング処理に当たっては配向膜に帯
電を生じ、この放電により配向性が破壊されたり、電極
パターンが損傷し、製造収率が低下することである。[Problems to be solved by the invention] As described above, during the rubbing process, the alignment film is charged, and this discharge destroys the alignment, damages the electrode pattern, and reduces the production yield. be.
上記の問題ば配向）Ａ料を営布したガラス基板をラビン
グして水平配向処理を行う際に該基板の表裏面にイオン
化したガスを吹きつけ、ラビングにより生じた帯電電荷
を中和することを特徴とする液晶表示板のラビング方法
により解決することができる。For the above problem, when performing horizontal alignment treatment by rubbing a glass substrate coated with orientation) A material, it is recommended to spray ionized gas on the front and back surfaces of the substrate to neutralize the electrical charge generated by rubbing. This problem can be solved by the characteristic rubbing method of the liquid crystal display panel.
本発明は除電バーを使用して摩擦帯電によって生じた表
面電荷を除去するにも拘わらず、帯電電荷を充分に除去
できない対策を研究した結果なされたものである。The present invention was developed as a result of research into countermeasures against the fact that the surface charge generated by frictional charging is removed using a static eliminating bar, but the static charge cannot be removed sufficiently.
すなわら、第２図および第３図に示すラビングロール３
の近傍に除電装置を取付け、イオン化した空気を吹きつ
けると、ラビング直後に数百〜数ＫＶあった静電気を１
００Ｖ以下にまで下げることができる。In other words, the rubbing roll 3 shown in FIGS. 2 and 3
By installing a static eliminator near the machine and blowing ionized air, the static electricity that was several hundred to several KV immediately after rubbing can be removed by 1
It can be lowered to below 00V.
然し、基板１をラビングテーブル２から離すと、その瞬
間に基板１の表面に再び数百〜数ＫＶの亮電圧が発生し
、その時に放電障害が起こることが判明した。However, it has been found that when the substrate 1 is separated from the rubbing table 2, a high voltage of several hundred to several kilovolts is generated again on the surface of the substrate 1 at that moment, and a discharge failure occurs at that moment.
この現象はラビングテーブル２の）Ａ質が導電体の場合
でも誘電体の場合でも同様である。This phenomenon is the same whether the material A of the rubbing table 2 is a conductor or a dielectric.
このことば基板１がコンデンサの誘電体と同様に作用し
、ラビングロール３の摩擦によって帯電が生じた際に、
これと異符号の電荷が基板１の裏面に生じていることに
他ならない。This word substrate 1 acts in the same way as the dielectric of a capacitor, and when it is charged due to the friction of the rubbing roll 3,
This simply means that charges of the opposite sign are generated on the back surface of the substrate 1.
そこで本発明はラビング処理中を通じて基板１のラビン
グ面に除電器でイオン化したガスを吹きつけると同時に
基板１の裏面にもイオン化したガスを吹きつけることに
より、完全な除電を行うものである。Therefore, the present invention completely eliminates static electricity by spraying ionized gas with a static eliminator onto the rubbed surface of the substrate 1 during the rubbing process, and at the same time spraying ionized gas onto the back surface of the substrate 1.
ここで本発明に使用する除電器は高圧電源とガスを吹き
つけるノズル部とから構成されており、清浄な乾燥空気
あるいは窒素などを高電界中で電離させて正負のイオン
などの荷電粒子を作り、これを吹きつける構造になって
いる。The static eliminator used in the present invention is composed of a high-voltage power source and a nozzle part that blows gas, and it ionizes clean dry air or nitrogen in a high electric field to create charged particles such as positive and negative ions. , the structure is such that this can be sprayed on.
第１図は本発明の詳細な説明する断面図であって、第２
〜第３図に示す従来構造と異なる所は基板１が矢印の方
向に回転するラビングロール３の下で矢印５に示すよう
に左右に移動することと、この移動中に上下より除電器
６，７．８によりイオン化したガス（この場合は空気）
を吹きつけていることである。FIG. 1 is a cross-sectional view for explaining the present invention in detail, and FIG.
- The difference from the conventional structure shown in FIG. 3 is that the substrate 1 moves left and right as shown by the arrow 5 under the rubbing roll 3 rotating in the direction of the arrow, and during this movement, the static eliminator 6, 7. Gas ionized by 8 (air in this case)
It is spraying.
図において除電器６．７は送風ダクト１１の先端に内蔵
されており、除電器に設けられているガス流通穴を通じ
てイオン化したガスが基板１に吹きつけられる。In the figure, a static eliminator 6.7 is built in at the tip of the air duct 11, and ionized gas is blown onto the substrate 1 through a gas distribution hole provided in the static eliminator.
また下側の除電器８は筒状の除電器を上の除電器６．７
と直角の方向に配置した状態を示しており、イオン化し
たガスはラビングテーブル９に設けである多数の穴１０
を通じて基板１の裏面に吹きつける構造をとる。In addition, the lower static eliminator 8 is a cylindrical static eliminator that is connected to the upper static eliminator 6.7.
The ionized gas is placed in a direction perpendicular to the rubbing table 9.
A structure is adopted in which the liquid is sprayed onto the back surface of the substrate 1 through the wafer.
このようにするとラビングロール３により基板１の配向
膜の配向が行われる際、静電荷は発生するや否や中和さ
れるため、電荷の石積を生ぜず、そのため従来の放Ｔｉ
、障害を無くすることが可能となる。In this way, when the alignment film on the substrate 1 is aligned by the rubbing roll 3, the static charge is neutralized as soon as it is generated, so that no accumulation of charges occurs.
, it becomes possible to eliminate obstacles.
以上記したように本発明の実施により静電気の石積を無
くすることができるので、ラビング処理に際して生ずる
放電障害がなくなり、これにより製造収率の向上が達成
される。As described above, by carrying out the present invention, it is possible to eliminate static electricity build-up, thereby eliminating discharge disturbances that occur during rubbing treatment, thereby achieving an improvement in production yield.
第１図は本発明を実施したラビング装置の断面図、
第２図はラビング装置の構成を示す斜視図、第３図はラ
ビング機構を説明する断面図、である。
図において、
１はガラス基十反、
２．９はラビングテーブル、
３はラビングロール、 ６，７．８は除電器、１０は穴
、
である。
ラヒ′シク”斗（ｘＩ！′）判１片ξε汀？丁余↑羽Ｌ
ｍ茶２閾FIG. 1 is a sectional view of a rubbing device embodying the present invention, FIG. 2 is a perspective view showing the configuration of the rubbing device, and FIG. 3 is a sectional view illustrating the rubbing mechanism. In the figure, 1 is a glass base plate, 2.9 is a rubbing table, 3 is a rubbing roll, 6, 7.8 is a static eliminator, and 10 is a hole. Rahi'shiku" Dou (xI!') size 1 piece ξε 汀? Ding extra ↑ Feather L
m tea 2 threshold
Claims (1)
処理を行う際に該基板の表裏面にイオン化したガスを吹
きつけ、ラビングにより生じた帯電電荷を中和すること
を特徴とする液晶表示板のラビング方法。A liquid crystal display board characterized in that when a glass substrate coated with an alignment material is rubbed to perform a horizontal alignment treatment, ionized gas is blown onto the front and back surfaces of the substrate to neutralize the electrical charges generated by the rubbing. Rubbing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61014964A JPH0750271B2 (en) | 1986-01-27 | 1986-01-27 | LCD display rubbing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61014964A JPH0750271B2 (en) | 1986-01-27 | 1986-01-27 | LCD display rubbing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62172323A true JPS62172323A (en) | 1987-07-29 |
| JPH0750271B2 JPH0750271B2 (en) | 1995-05-31 |
Family
ID=11875660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61014964A Expired - Lifetime JPH0750271B2 (en) | 1986-01-27 | 1986-01-27 | LCD display rubbing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0750271B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02106720A (en) * | 1988-10-14 | 1990-04-18 | Mitsubishi Electric Corp | Rubbing device for liquid crystal display element |
| JPH0323420A (en) * | 1989-06-20 | 1991-01-31 | Semiconductor Energy Lab Co Ltd | Device and method for scattering spacer |
| JPH0495924A (en) * | 1990-08-07 | 1992-03-27 | Stanley Electric Co Ltd | Manufacture of liquid crystal display element |
| US5406397A (en) * | 1992-12-26 | 1995-04-11 | Canon Kabushiki Kaisha | Rubbing apparatus, apparatus for producing liquid crystal device and method for producing liquid crystal device |
| US7047984B2 (en) * | 2000-06-27 | 2006-05-23 | Brooks Automation, Inc. | Device and method for cleaning articles used in the production of semiconductor components |
| CN105204233A (en) * | 2015-10-26 | 2015-12-30 | 京东方科技集团股份有限公司 | Display substrate rubbing alignment method and device and display substrate manufacturing method and system |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5646226A (en) * | 1979-09-21 | 1981-04-27 | Oki Electric Ind Co Ltd | Manufacture of mask for integrated circuit |
| JPS59178532U (en) * | 1983-05-17 | 1984-11-29 | 小田島 茂 | Air shower device with static electricity removal |
| JPS60237429A (en) * | 1984-05-09 | 1985-11-26 | Sharp Corp | Production of liquid crystal display element |
-
1986
- 1986-01-27 JP JP61014964A patent/JPH0750271B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5646226A (en) * | 1979-09-21 | 1981-04-27 | Oki Electric Ind Co Ltd | Manufacture of mask for integrated circuit |
| JPS59178532U (en) * | 1983-05-17 | 1984-11-29 | 小田島 茂 | Air shower device with static electricity removal |
| JPS60237429A (en) * | 1984-05-09 | 1985-11-26 | Sharp Corp | Production of liquid crystal display element |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02106720A (en) * | 1988-10-14 | 1990-04-18 | Mitsubishi Electric Corp | Rubbing device for liquid crystal display element |
| JPH0323420A (en) * | 1989-06-20 | 1991-01-31 | Semiconductor Energy Lab Co Ltd | Device and method for scattering spacer |
| JPH0495924A (en) * | 1990-08-07 | 1992-03-27 | Stanley Electric Co Ltd | Manufacture of liquid crystal display element |
| US5406397A (en) * | 1992-12-26 | 1995-04-11 | Canon Kabushiki Kaisha | Rubbing apparatus, apparatus for producing liquid crystal device and method for producing liquid crystal device |
| US7047984B2 (en) * | 2000-06-27 | 2006-05-23 | Brooks Automation, Inc. | Device and method for cleaning articles used in the production of semiconductor components |
| CN105204233A (en) * | 2015-10-26 | 2015-12-30 | 京东方科技集团股份有限公司 | Display substrate rubbing alignment method and device and display substrate manufacturing method and system |
| CN105204233B (en) * | 2015-10-26 | 2019-03-15 | 京东方科技集团股份有限公司 | Display base plate friction orientation method and device, display base plate preparation method and system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0750271B2 (en) | 1995-05-31 |
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