JPS6216525A - Supporting structure - Google Patents

Supporting structure

Info

Publication number
JPS6216525A
JPS6216525A JP60154283A JP15428385A JPS6216525A JP S6216525 A JPS6216525 A JP S6216525A JP 60154283 A JP60154283 A JP 60154283A JP 15428385 A JP15428385 A JP 15428385A JP S6216525 A JPS6216525 A JP S6216525A
Authority
JP
Japan
Prior art keywords
slit
supported
solar slit
main body
solar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60154283A
Other languages
Japanese (ja)
Inventor
Yutaka Tanaka
裕 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60154283A priority Critical patent/JPS6216525A/en
Publication of JPS6216525A publication Critical patent/JPS6216525A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Connection Of Plates (AREA)
  • Mathematical Physics (AREA)

Abstract

PURPOSE:To enable microscopically the adjustment of the position of the material to be supported as well as to prevent the circulation of air coming from the material or the part other than the material to be supported by a method wherein, in the supporting structure with which the position of the material to be supported can be microscopically adjusted, the material to be supported is retained by an airtight elastic body, and the elastic body is airtightly fixed to the body to be supported and the main body of the supporting structure. CONSTITUTION:A solar slit 5 is supported by an exchanger main body 7 using a supporting structure, the exchanger main body can be moved leftwards or rightwards by a linear guide and a driving mechanism. The solar slit 5 is airtightly fixed to a Soller slit holder 6 excluding slit holes using the vacuum sealing material 9 such as O-ring and the like, for example. Also, a plate spring 8 is airtightly fixed to the Soller slit holder 6 and an exchanger main body 7 by welding and the like, for example. Accordingly, no air is circulated to the upper and the lower parts of the exchanger from the material other than the slit holes. When an adjusting screw 4 is turned into the above-mentioned condition, the position of the solar slit 5 can be finely adjusted, and the circulation of air coming from the part other than the slit holes can be prevented.

Description

【発明の詳細な説明】 ［発明の属する分野〕 本発明は保持機構、特に半導体集積回路の微細パターン
を軟Ｘ線を用いて転写形成するＸ　１ｍ　Ｂ光装置にお
けるＸ線コリメータ保持機構に、関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to a holding mechanism, particularly to an X-ray collimator holding mechanism in an X 1m B optical device that transfers and forms fine patterns of semiconductor integrated circuits using soft X-rays. It is something.

［従来の技術］ Ｘ線露光装置においてはいろいろな照射方法があるが、
最良の結果を得るにはコリメートした（平行化した）Ｘ
線を用いることが望ましい。これは、コリメ、−卜する
ことによりＸ線がマスクおよびウェハに対し斜めに入射
するような場合に生じる幾何的広がりや歪をさけること
ができるためである。このようなＸ線コリメートの方法
として例えばソーラスリットを用いる方法が提案されて
いる。ｘ＄９コリメータを使用する際、Ｘ線コリメータ
自体の姿勢をマスクおよびウェハに対し正しく調整して
おく必要があり、ソーラスリツｌ〜をＸ線コリメータと
した場合も、その保持機構にはソーラスリット自体の姿
勢を正しく調整する機能を有していなくてはならない。[Prior art] There are various irradiation methods in X-ray exposure equipment.
Collimated (parallelized) X for best results
It is preferable to use lines. This is because by collimating, it is possible to avoid geometric spread and distortion that occur when X-rays are obliquely incident on the mask and wafer. As a method of collimating X-rays, a method using a solar slit, for example, has been proposed. When using the x$9 collimator, the posture of the X-ray collimator itself must be adjusted correctly relative to the mask and wafer. must have the ability to properly adjust the posture of the person.

さらに、Ｘ線露光装置において、従来のように３ｅ等の
Ｘ線取出し窓や１−１ｅ等のステージ収納室置換ガスを
使用せず、Ｘ線源収納室とステージ収納室とをソーラス
リット等を介して接続し、−かつステージ収納室の圧力
をＸ線源収納室の圧力より高い圧力となるように排気し
く以下、差動排気という）、ステージ収納室における潤
滑油の蒸発等を軽減する方式が提案されている。この場
合ソーラスリット等が適麿な流体抵抗となり両数納室に
差圧を与えることができる。この方式の場合保持機構は
、ソーラスリット等の被保持物以外からは空気の流通が
ない様な機構でなくてはならない。Furthermore, in the X-ray exposure apparatus, instead of using an X-ray extraction window such as 3e or a stage storage chamber replacement gas such as 1-1e as in the past, a solar slit etc. is used to separate the X-ray source storage chamber and the stage storage chamber. (hereinafter referred to as differential pumping) to reduce the evaporation of lubricating oil in the stage storage chamber. is proposed. In this case, solar slits etc. provide suitable fluid resistance and can provide a differential pressure between both compartments. In the case of this method, the holding mechanism must be a mechanism that prevents air from flowing from other than the object to be held, such as a solar slit.

ところで、被保持物の姿勢を微調する保持機構として例
えば第３図のような機構が考えられる。By the way, as a holding mechanism for finely adjusting the posture of the object to be held, a mechanism as shown in FIG. 3 can be considered, for example.

第３図において、４は調整ねじ、５はソーラスリット、
１２はソーラスリットホルダ、１３．１４は保持機構本
体、１５は支持ばねである。ソーラスリット５はソーラ
スリットホルダ１２に、スリット孔以外は気密になる様
固定されている。このような機構でスリット５の姿勢を
変化させようとすると、ソーラスリットホルダ１２と保
持機構本体１３との間にすきまが生じ、圧力差が維持で
きない。逆にソーラスリットホルダ１２と保持機構本体
１３との間を気密にして圧力差を維持しようとすると、
ソーラスリット５の姿勢を変化させることができない。In Fig. 3, 4 is an adjustment screw, 5 is a solar slit,
12 is a solar slit holder, 13 and 14 are holding mechanism bodies, and 15 is a support spring. The solar slit 5 is fixed to the solar slit holder 12 so as to be airtight except for the slit hole. If an attempt is made to change the attitude of the slit 5 using such a mechanism, a gap will be created between the solar slit holder 12 and the holding mechanism main body 13, making it impossible to maintain the pressure difference. On the other hand, if you try to maintain the pressure difference by making the space between the solar slit holder 12 and the holding mechanism body 13 airtight,
The attitude of the solar slit 5 cannot be changed.

このように第３図に示す従来の保持機構は、Ｘ線源収納
室とステージ収納室とをソーラスリット等のＸａコリメ
ータを介して差動排気するＸ線露光装置が要求する、姿
勢微調機構と気密性との両方を満たづものではなかった
。As described above, the conventional holding mechanism shown in FIG. 3 is a fine posture adjustment mechanism required for an X-ray exposure apparatus that differentially pumps the X-ray source storage chamber and stage storage chamber through an Xa collimator such as a solar slit. It was not possible to satisfy both airtightness and airtightness.

［発明の目的１ 本発明は、上述従来例の欠点を除去して、被保持物の姿
勢の微調が可能で、かつ被保持物以外からの空気の流通
がないような保持機構を提供することを目的とする。[Objective of the Invention 1] An object of the present invention is to provide a holding mechanism that eliminates the drawbacks of the above-mentioned conventional examples, allows fine adjustment of the posture of an object to be held, and prevents air from flowing from other than the object. With the goal.

［実施例］ 第１図は本発明の一実施例に係るソーラスリット交換機
を用いたＸ線露光装置の要部断面図であり、第２図はツ
ーラスリット保持機構の拡大図である。第１図および第
２図において、１はＸ線源収納室、２はステージ収納室
、３ａ、３ｂはベローズシール、４は調整ねじ、５はソ
ーラスリット、６はソーラスリットホルダ、７は交換機
本体、８は板ばね、９は真空シール、１０ａ、１０ｂは
吸排孔、１１ａ、１１ｂはベローズである。[Embodiment] FIG. 1 is a sectional view of a main part of an X-ray exposure apparatus using a solar slit exchanger according to an embodiment of the present invention, and FIG. 2 is an enlarged view of a solar slit holding mechanism. In Figures 1 and 2, 1 is an X-ray source storage chamber, 2 is a stage storage chamber, 3a and 3b are bellows seals, 4 is an adjustment screw, 5 is a solar slit, 6 is a solar slit holder, and 7 is an exchanger body. , 8 is a leaf spring, 9 is a vacuum seal, 10a, 10b are suction holes, and 11a, 11b are bellows.

ソーラスリットを用いてＸ線をコリメートするｘｌ！露
光装置において、線幅制御笠を行なうため開口内の異な
るソーラスリット数種類を交換して露光を行う方式が提
案されている。第１図のソーラスリット交換機は、前記
ソーラスリット交換を行い、さらにＸ線源収納室１とス
テージ収納室２の差動排気を可能にしたものである。Collimate X-rays using a solar slitxl! In an exposure apparatus, a method has been proposed in which exposure is performed by exchanging several different types of solar slits within an aperture in order to perform line width control. The solar slit exchanger shown in FIG. 1 performs the solar slit exchange described above and also enables differential pumping of the X-ray source storage chamber 1 and the stage storage chamber 2.

第１図において、ソーラスリット５は本発明による保持
機構により交換機本体７に保持されている。交換機本体
は直線案内および駆動機構（不図示）により、第１図に
おいて左右に移動可能となっている。さらに交換機移動
の際には、吸排孔１０ａ、１０ｂよりベローズシール３
ａ　　３ｂのベローラ ズ１１ａ、”１１ｂ内の空気を扱いて内圧を減少させ交
換機を開放する。そして、所定の位置へ交換機が移動し
た後、再びベローズシール３ａ、３ｂのベローズ１１ａ
、　１１ｂ内に吸排孔１０ａ、　１０ｂより空気を入れ
て内圧をかけてシールする。この時、Ｘ線源収納室１と
ステージ収納室２に、ゲートバルブ（不図示）等を設置
すれば、ソーラスリット交換の際の前記二室の圧力上昇
を避けることができる。In FIG. 1, a solar slit 5 is held in an exchanger body 7 by a holding mechanism according to the present invention. The main body of the exchanger is movable left and right in FIG. 1 by a linear guide and drive mechanism (not shown). Furthermore, when moving the exchanger, the bellows seal 3
The air in the bellows seals 11a and 11b of the bellows seals 3a and 3b is handled to reduce the internal pressure and open the exchanger.Then, after the exchanger is moved to a predetermined position, the bellows 11a of the bellows seals 3a and 3b are closed again.
, Air is introduced into 11b through suction and exhaust holes 10a and 10b, and internal pressure is applied to seal it. At this time, if a gate valve (not shown) or the like is installed in the X-ray source storage chamber 1 and the stage storage chamber 2, an increase in pressure in the two chambers can be avoided when replacing the solar slit.

第２図は、本発明によるソーラスリット保持機構の拡大
図である。ソーラスリット５はツーラスリフトホルダ６
に例えばＯリング等による真空シール９により、スリッ
ト孔以外は気密になる様固定されている。また、板ばね
８はソーラスリットホルダ６と交換機本体７に、例えば
溶接等により気密に固定されている。従ってスリット孔
以外からは交換機の上下に空気の流通はない。この状態
で調整ねじ４を回すとソーラスリット５の姿勢の微調が
可能であり、かつスリット孔以外からは空気の流通を許
さない。FIG. 2 is an enlarged view of the solar slit retention mechanism according to the present invention. Solar slit 5 is tool lift holder 6
The parts other than the slit holes are fixed airtight by a vacuum seal 9 using, for example, an O-ring. Further, the leaf spring 8 is airtightly fixed to the solar slit holder 6 and the exchanger main body 7 by, for example, welding. Therefore, there is no air circulation between the top and bottom of the exchanger from other than through the slit holes. By turning the adjusting screw 4 in this state, the attitude of the solar slit 5 can be finely adjusted, and air is not allowed to flow from any other than the slit hole.

［実施例の変更例］ 前記実施例中、ソーラスリットホルダを支持する弾性体
として板ばねを用いたが、気密な弾性体であり圧力隔壁
となる材料であれば、例えばダイアフラムの様なもので
も同様の効果が得られる。[Modification of the embodiment] In the above embodiment, a leaf spring was used as the elastic body supporting the solar slit holder, but any material such as a diaphragm may be used as long as it is an airtight elastic body and serves as a pressure barrier. A similar effect can be obtained.

また、微調手段としてねじを用いたが、例えば圧電素子
の様なものを使用しても構わない。Further, although a screw is used as the fine adjustment means, for example, a piezoelectric element may also be used.

また、前記実施例において被保持物としてソーラスリッ
トであるＸ線コリメータを使ったが、他のＸ線コリメー
タであっても良く、またＸ線コリメータ以外にも、例え
ばマスクがＸ線源収納苗に気密接合され、ウェハおよび
マスク合せステージは大気あるいはＨｅ等のガス体雰囲
気に置かれる様な場合のマスク保持機構としても使用可
能である。Furthermore, although an X-ray collimator, which is a solar slit, was used as the object to be held in the above embodiments, other X-ray collimators may be used. The wafer and mask alignment stage, which are hermetically sealed together, can also be used as a mask holding mechanism when placed in the atmosphere or a gas atmosphere such as He.

［発明の効果］ 以上説明したように、本発明によれば非常に簡単な構造
であるにもかかわらず、被保持物の姿勢の微調が可能で
、かつ被保持物以外から空気の流通を許さない保持機構
が得られる。[Effects of the Invention] As explained above, according to the present invention, although it has a very simple structure, it is possible to finely adjust the posture of the object to be held, and it also allows air to flow from other than the object to be held. No retention mechanism is obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は、本発明の実施例に係るソーラスリット交換機
を用いたＸ線露光装置の要部断面図、第２図は、第１図
におけるソーラスリット保持機構の拡大図、 第３図は、従来のソーラスリット保持機構の構造を示す
断面図である。 ４：ｉｌ整ねじ、５：ソーラスリット、６：ソーラスリ
ットホルダ、７：交換機本体、８：板ばね、９：真空シ
ール。 第１図 第２図FIG. 1 is a sectional view of main parts of an X-ray exposure apparatus using a solar slit exchanger according to an embodiment of the present invention, FIG. 2 is an enlarged view of the solar slit holding mechanism in FIG. 1, and FIG. FIG. 2 is a cross-sectional view showing the structure of a conventional solar slit holding mechanism. 4: IL setting screw, 5: Solar slit, 6: Solar slit holder, 7: Exchanger body, 8: Leaf spring, 9: Vacuum seal. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】 １、被保持物の姿勢が微調可能な保持機構において、被
保持物を気密な弾性体により支持し、かつ該弾性体は被
保持物および保持機構本体に気密に固定されていること
を特徴とする保持機構。 ２、前記弾性体が板ばねである特許請求の範囲第１項記
載の保持機構[Claims] 1. In a holding mechanism in which the posture of an object to be held can be finely adjusted, the object to be held is supported by an airtight elastic body, and the elastic body is airtightly fixed to the object to be held and the main body of the holding mechanism. A retention mechanism characterized by: 2. The holding mechanism according to claim 1, wherein the elastic body is a leaf spring.
JP60154283A 1985-07-15 1985-07-15 Supporting structure Pending JPS6216525A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60154283A JPS6216525A (en) 1985-07-15 1985-07-15 Supporting structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60154283A JPS6216525A (en) 1985-07-15 1985-07-15 Supporting structure

Publications (1)

Publication Number Publication Date
JPS6216525A true JPS6216525A (en) 1987-01-24

Family

ID=15580761

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60154283A Pending JPS6216525A (en) 1985-07-15 1985-07-15 Supporting structure

Country Status (1)

Country Link
JP (1) JPS6216525A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002054153A1 (en) * 2001-01-03 2002-07-11 Koninklijke Philips Electronics N.V. Illumination system with vacuum chamber wall having transparent structure
CN105304533A (en) * 2015-11-07 2016-02-03 成都聚合科技有限公司 Vacuum fixed platform for concentrating photovoltaic photoelectric conversion receiver
CN105336658A (en) * 2015-10-24 2016-02-17 成都聚合科技有限公司 Optically-focused photovoltaic photoelectric conversion receiver general fixing platform

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002054153A1 (en) * 2001-01-03 2002-07-11 Koninklijke Philips Electronics N.V. Illumination system with vacuum chamber wall having transparent structure
CN105336658A (en) * 2015-10-24 2016-02-17 成都聚合科技有限公司 Optically-focused photovoltaic photoelectric conversion receiver general fixing platform
CN105304533A (en) * 2015-11-07 2016-02-03 成都聚合科技有限公司 Vacuum fixed platform for concentrating photovoltaic photoelectric conversion receiver

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