JPS62138834A - Active matrix type liquid crystal display device - Google Patents

Active matrix type liquid crystal display device

Info

Publication number
JPS62138834A
JPS62138834A JP60279931A JP27993185A JPS62138834A JP S62138834 A JPS62138834 A JP S62138834A JP 60279931 A JP60279931 A JP 60279931A JP 27993185 A JP27993185 A JP 27993185A JP S62138834 A JPS62138834 A JP S62138834A
Authority
JP
Japan
Prior art keywords
substrate
liquid crystal
mim
display device
crystal display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60279931A
Other languages
Japanese (ja)
Inventor
Kiyohiro Uehara
上原 清博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP60279931A priority Critical patent/JPS62138834A/en
Publication of JPS62138834A publication Critical patent/JPS62138834A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To permit formation of films by a simple method such as coating and to simplify stages by using an org. polycrystal film to constitute a MIM element. CONSTITUTION:The MIM element is constituted by continuously providing the org. polycrystal film 17 on electrodes 15 provided on a transparent substrate 13 and further forming picture element electrodes 19 thereon. The 1st substrate 21 formed with an oriented film 23 and the 2nd substrate 31 are spaced from each other and are disposed on the MIM substrate 11. A liquid crystal 33 is sealed therebetween. Transparent electrodes 35 are formed in a stripe shape on the 2nd substrate 31 and further an oriented film 39 is formed thereon.

Description

【発明の詳細な説明】 技術分野 本発明は、アクティマトリクス型の液晶表示装置に関す
る。
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to an acti-matrix liquid crystal display device.

従来技術 液晶表示装置の各画素にアクティブ素子を形成して駆動
するアクティブマトリクス表示は、表示品質の向上と大
容量化を可能にするものとして注目され、小型カラーテ
レビからOA用ドツトマトリクス用表示装置へと展開し
つつある。
Prior Art Active matrix displays, in which active elements are formed and driven in each pixel of a liquid crystal display device, have attracted attention as a means of improving display quality and increasing capacity. It is developing into

液晶駆動用アクティブ素子としては、TFT(Thin
 Film Transistor :薄膜トランジス
タ)やM I M (Metal In5ulator
 Metal)素子が知られているが、いずれも金属お
よびその酸化物で形成するため、一般に蒸着、スパッタ
等の真空系を必要とし生産性が悪い。
As an active element for driving liquid crystal, TFT (Thin
Film Transistor (Thin Film Transistor) and MIM (Metal In5ulator)
Metal) elements are known, but since they are all formed from metals and their oxides, they generally require vacuum systems such as vapor deposition and sputtering, resulting in poor productivity.

見訓勿且孜 本発明は、製造工程を簡略化することが可能で、生産性
に優れたアクティダマ1−リクス型液晶表示装置を提供
するものである。
DISCLOSURE OF THE INVENTION The present invention provides an actidamerix type liquid crystal display device that can simplify the manufacturing process and has excellent productivity.

升豆立直處 本発明のアクティブマトリクス型液晶表示装置は、基板
上にストライプ状に電極を形成し。
The active matrix liquid crystal display device of the present invention has electrodes formed in stripes on a substrate.

その上面に有機多結晶体膜を形成し、さらにその上に画
素電極を形成してM I M構造とした第1の基板と、
ストライプ状の対向電極を有する第2の基板とを離間、
対向して配設し、これら基板間に液晶を収納したことを
特徴とする特以下、添付図面に治って本発明をさらに詳
細に説明する。
a first substrate having an M I M structure by forming an organic polycrystalline film on its upper surface and further forming a pixel electrode thereon;
separated from a second substrate having a striped counter electrode;
The present invention will now be described in more detail with reference to the accompanying drawings.

第1図は、MIM基板11の構成例を示す断面図、第2
図は平面図であり、透明基板13上に設けられた電極1
5上に有機多結晶体膜17が連続して設けられ、さらに
その上に画素電極19が形成されてMIM素子を構成し
ている。電極15はストライプ状を呈しており、銅など
の高導電性材料から形成されてい2゜画素電極19はI
T○などの透明導電膜から形成されている。なお、電極
15を透明電極としたり、画素電極19を不透明電極と
することもできる。基板としてはガラス基板、プラスチ
ックフィルム基板などが用いられる。
FIG. 1 is a sectional view showing an example of the configuration of the MIM board 11;
The figure is a plan view, and the electrode 1 provided on the transparent substrate 13
An organic polycrystalline film 17 is continuously provided on the organic polycrystalline film 17, and a pixel electrode 19 is further formed on the organic polycrystalline film 17 to constitute an MIM element. The electrode 15 has a striped shape and is made of a highly conductive material such as copper.
It is formed from a transparent conductive film such as T○. Note that the electrode 15 may be a transparent electrode, and the pixel electrode 19 may be an opaque electrode. As the substrate, a glass substrate, a plastic film substrate, etc. are used.

有機多結晶体膜17は、電極15と画素電極19との間
に電圧が印加された際に、MIM構造をとって第6図に
示すような降伏特性を示すものが選択される。電極15
、有機絶縁体膜17および画素電極19はMIM素子を
形成し、第6図に示したようにしきい値を有する。電極
15と画素電極X9との間に電圧を印加すると、ある電
圧以上で急峻に電圧が増加する。有機多結晶体としては
テトラシアノキノジメタン(TCNQ)などが用いられ
る。有機多結晶体膜は塗布法などにより容易に形成する
ことができ、金属酸化物薄膜と異なり真空雰囲気を必要
としない。また、有機多結晶体は誘電率が大きいので、
比較的膜厚が厚くてもMIM構造を形成することができ
るために、有機多結晶体膜をストライプ状の電極15に
合わせてパターニングすることを省略できる。この結果
、さらに生産性を改善し、歩留りを向上することができ
る。従来のMIM素子基板では電極表面(上面)に絶縁
性を持たせるとともにMIMを構造を実現するために、
電極の上面に厚く酸化物層を設けるとともに側面に薄い
酸化物層を形成し、側面の酸化物を介してMIM構造と
していた。そのため、側面の酸化物層を形成するための
、パターニング工程が必要であった。また、電極側面を
利用するために、電極と画素電極とを離間して基板上に
形成することが必要となる。これに対して本発明では、
電極15の上に有機多結晶体膜17を介して重ねるよう
にして画素電極を形成することもでき、設計上の自由度
が向上する。
The organic polycrystalline film 17 is selected to have an MIM structure and exhibit breakdown characteristics as shown in FIG. 6 when a voltage is applied between the electrode 15 and the pixel electrode 19. Electrode 15
, the organic insulator film 17 and the pixel electrode 19 form an MIM element and have a threshold as shown in FIG. When a voltage is applied between the electrode 15 and the pixel electrode X9, the voltage increases sharply above a certain voltage. Tetracyanoquinodimethane (TCNQ) or the like is used as the organic polycrystal. Organic polycrystalline films can be easily formed by coating methods and do not require a vacuum atmosphere, unlike metal oxide thin films. In addition, organic polycrystals have a large dielectric constant, so
Since the MIM structure can be formed even if the film is relatively thick, patterning the organic polycrystalline film to match the striped electrodes 15 can be omitted. As a result, it is possible to further improve productivity and increase yield. In conventional MIM element substrates, in order to provide insulation on the electrode surface (top surface) and to realize the MIM structure,
A thick oxide layer was provided on the top surface of the electrode, and a thin oxide layer was formed on the side surfaces, forming an MIM structure with the oxide on the side surfaces interposed. Therefore, a patterning process was required to form an oxide layer on the side surfaces. Furthermore, in order to utilize the side surfaces of the electrodes, it is necessary to form the electrodes and the pixel electrodes on the substrate apart from each other. In contrast, in the present invention,
The pixel electrode can also be formed so as to overlap the electrode 15 with the organic polycrystalline film 17 interposed therebetween, increasing the degree of freedom in design.

第3図は、第1図に示したMIM基板11を基板を用い
たアクティブマトリクス型液晶表示装置の構成例を示す
一部断面図である。MIM基板11上に配向膜23を形
成した第1の基板21と第2の基′Fi31とが離間、
対向して配設され、その間に液晶33が封入されている
。第2の基板31にはス[・ライブ状に透明電極35が
形成されており、さらにその上に配向膜が形成されてい
る。
FIG. 3 is a partial cross-sectional view showing a configuration example of an active matrix liquid crystal display device using the MIM substrate 11 shown in FIG. 1 as a substrate. The first substrate 21 on which the alignment film 23 is formed on the MIM substrate 11 and the second base 'Fi31 are separated,
They are arranged to face each other, and a liquid crystal 33 is sealed between them. A transparent electrode 35 is formed in the shape of a strip on the second substrate 31, and an alignment film is further formed thereon.

M 工M素子部41と液晶43との等価回路は第7図に
示した通りであり、電圧によりMIM素子部41の抵抗
が変化し、駆動信号により選択された画素には、電荷が
チャージされて表示が保持されるため、走査信号印加時
間の短いマトリクス型液晶表示装置においても、十分な
コントラストが得られる。
The equivalent circuit between the MIM element section 41 and the liquid crystal 43 is as shown in FIG. Since the display is maintained, sufficient contrast can be obtained even in a matrix type liquid crystal display device in which the scanning signal application time is short.

第4図は、本発明で用いられるMIM基板11の他の構
成例を示す断面図である。有機多結晶体膜が、連続的で
はなくパターニングされている以外は、第1図に示した
ものと同様である。
FIG. 4 is a sectional view showing another configuration example of the MIM substrate 11 used in the present invention. It is similar to that shown in FIG. 1, except that the organic polycrystalline film is patterned rather than continuous.

第5図は、第4図に示したMIM基板11を基板に用い
た液晶表示装置の構成例を示す一部断面図である。MI
M基板11上に配向膜23を形成した第1の基板21と
第2の基板31とが離間、対向して配設され、その間に
液晶33が封入されている。第2の基板31にはストラ
イプ状に透明電極35が形成されており、さらにその上
に配向膜が形成されている。
FIG. 5 is a partial cross-sectional view showing a configuration example of a liquid crystal display device using the MIM substrate 11 shown in FIG. 4 as a substrate. M.I.
A first substrate 21 having an alignment film 23 formed on the M substrate 11 and a second substrate 31 are arranged facing each other and separated from each other, and a liquid crystal 33 is sealed between them. Transparent electrodes 35 are formed in stripes on the second substrate 31, and an alignment film is further formed thereon.

発明の効果 本発明によれば、有機多結晶体膜を用いてMIM素子を
構成しているので、塗布法などの簡便な方法により膜形
成ができ、工程が簡略化されるとともに歩留りも向上す
る。
Effects of the Invention According to the present invention, since the MIM element is constructed using an organic polycrystalline film, the film can be formed by a simple method such as a coating method, which simplifies the process and improves the yield. .

実施例 厚さ300μmのガラス板上に、巾30μm、ピッチ2
00μmのストライプ状に銅の電極を形成した。
Example: On a glass plate with a thickness of 300 μm, a width of 30 μm and a pitch of 2
Copper electrodes were formed in stripes of 00 μm.

この透明基板を、アセトニトリル中にテトラシアノキシ
ジメタンを溶解した液に浸漬し、厚さ1μmのテトラシ
アノキノジメタン膜を形成した。さらにこの上面にIT
O膜を形成し、エツチングにより画素電極を形成してM
IM基板を作成した。
This transparent substrate was immersed in a solution of tetracyanoxydimethane dissolved in acetonitrile to form a 1 μm thick tetracyanoquinodimethane film. Furthermore, on the top of this
Form an O film, form a pixel electrode by etching, and
An IM board was created.

一方、同様のガラス基板上にIT○膜を形成し、エツチ
ングによりストライプ状の透明電極を形成して対向基板
とした。
On the other hand, an IT◯ film was formed on a similar glass substrate, and striped transparent electrodes were formed by etching to form a counter substrate.

これら2つの基板にそれぞれポリイミド配向膜を形成し
たのちラビング処理したのち、10μmのギャップ幅で
対向させ、この中にネマティック液晶ZLI 1505
(メルク社製)を封入し周囲をシールして、MIMアク
ティブマトリクス型液晶表示装置(セル)を作成した。
After forming a polyimide alignment film on each of these two substrates and subjecting them to a rubbing treatment, they were placed facing each other with a gap width of 10 μm, and a nematic liquid crystal ZLI 1505 was placed between them.
(manufactured by Merck & Co., Ltd.) and the periphery was sealed to create an MIM active matrix liquid crystal display device (cell).

このセルを2枚の偏光板に挟み、線順次駆動方式により
駆動したところ、デユーティ比1/256程度までほぼ
スタティック駆動と同様のコントラスト視覚特性が得ら
れた。
When this cell was sandwiched between two polarizing plates and driven using a line-sequential driving method, contrast visual characteristics almost the same as those obtained with static driving were obtained up to a duty ratio of about 1/256.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明のMIM基板の構成例を示す一部断面図
、第2図はその平面図である。第3図は本発明の液晶表
示装置の構成例を示す一部断面図である。 第4図は本発明のMIM基板の他の構成例を示す一部断
面図、第5図はこの基板を用いた本発明の液晶表示装置
の構成例を示す一部断面図である。 第6図はMIM素子の電圧−電流特性を示すグラフであ
り、第7図は、液晶表示装置の等価回路を示す図である
。 13・・・MIM基板    15・・・電  極17
・・・有機多結晶体膜  19・・画素電極21・・・
第1の基板    31・・第2の基板35・・・透明
電極
FIG. 1 is a partial sectional view showing an example of the configuration of an MIM board according to the present invention, and FIG. 2 is a plan view thereof. FIG. 3 is a partial cross-sectional view showing an example of the structure of a liquid crystal display device of the present invention. FIG. 4 is a partial sectional view showing another example of the configuration of the MIM substrate of the present invention, and FIG. 5 is a partial sectional view showing an example of the configuration of the liquid crystal display device of the invention using this substrate. FIG. 6 is a graph showing voltage-current characteristics of an MIM element, and FIG. 7 is a diagram showing an equivalent circuit of a liquid crystal display device. 13... MIM board 15... Electrode 17
...Organic polycrystalline film 19...Pixel electrode 21...
First substrate 31... Second substrate 35... Transparent electrode

Claims (1)

【特許請求の範囲】[Claims] 1、基板上にストライプ状に電極を形成し、その上面に
有機多結晶体膜を形成し、さらにこの有機多結晶体を介
して画素電極を形成してMIM構造とした第1の基板と
、ストライプ状の対向電極を有する第2の基板とを離間
、対向して配設し、これら基板間に液晶を収納したこと
を特徴とするアクティブマトリクス型液晶表示装置。
1. A first substrate having an MIM structure by forming electrodes in a stripe shape on the substrate, forming an organic polycrystalline film on the upper surface thereof, and further forming a pixel electrode through the organic polycrystalline body; An active matrix type liquid crystal display device, characterized in that a second substrate having a striped counter electrode is arranged to be spaced apart and facing each other, and a liquid crystal is housed between these substrates.
JP60279931A 1985-12-12 1985-12-12 Active matrix type liquid crystal display device Pending JPS62138834A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60279931A JPS62138834A (en) 1985-12-12 1985-12-12 Active matrix type liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60279931A JPS62138834A (en) 1985-12-12 1985-12-12 Active matrix type liquid crystal display device

Publications (1)

Publication Number Publication Date
JPS62138834A true JPS62138834A (en) 1987-06-22

Family

ID=17617906

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60279931A Pending JPS62138834A (en) 1985-12-12 1985-12-12 Active matrix type liquid crystal display device

Country Status (1)

Country Link
JP (1) JPS62138834A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0417852A2 (en) * 1989-09-15 1991-03-20 Philips Electronics Uk Limited Active matrix display devices and methods of fabricating such
JP2006520478A (en) * 2003-01-17 2006-09-07 ダイオード・ソリューションズ・インコーポレーテッド Display using organic materials
US7898042B2 (en) 2006-11-07 2011-03-01 Cbrite Inc. Two-terminal switching devices and their methods of fabrication
US8222077B2 (en) 2006-11-07 2012-07-17 Cbrite Inc. Metal-insulator-metal (MIM) devices and their methods of fabrication
US8807926B2 (en) 2008-11-05 2014-08-19 Ihi Corporation Turbocharger
US9528386B2 (en) 2011-05-26 2016-12-27 Ihi Corporation Nozzle blade
US9741901B2 (en) 2006-11-07 2017-08-22 Cbrite Inc. Two-terminal electronic devices and their methods of fabrication

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0417852A2 (en) * 1989-09-15 1991-03-20 Philips Electronics Uk Limited Active matrix display devices and methods of fabricating such
JP2006520478A (en) * 2003-01-17 2006-09-07 ダイオード・ソリューションズ・インコーポレーテッド Display using organic materials
US8253910B2 (en) 2003-01-17 2012-08-28 Cbrite Inc. Display employing organic material
US7898042B2 (en) 2006-11-07 2011-03-01 Cbrite Inc. Two-terminal switching devices and their methods of fabrication
US8193594B2 (en) 2006-11-07 2012-06-05 Cbrite Inc. Two-terminal switching devices and their methods of fabrication
US8222077B2 (en) 2006-11-07 2012-07-17 Cbrite Inc. Metal-insulator-metal (MIM) devices and their methods of fabrication
US9741901B2 (en) 2006-11-07 2017-08-22 Cbrite Inc. Two-terminal electronic devices and their methods of fabrication
US8807926B2 (en) 2008-11-05 2014-08-19 Ihi Corporation Turbocharger
US9528386B2 (en) 2011-05-26 2016-12-27 Ihi Corporation Nozzle blade

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