JPS62132161A - Hand washing monitor unit - Google Patents

Hand washing monitor unit

Info

Publication number
JPS62132161A
JPS62132161A JP60272438A JP27243885A JPS62132161A JP S62132161 A JPS62132161 A JP S62132161A JP 60272438 A JP60272438 A JP 60272438A JP 27243885 A JP27243885 A JP 27243885A JP S62132161 A JPS62132161 A JP S62132161A
Authority
JP
Japan
Prior art keywords
pure water
hand washing
specific resistance
resistance value
hands
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60272438A
Other languages
Japanese (ja)
Other versions
JPH0675047B2 (en
Inventor
Motonori Yanagi
基典 柳
Hayaaki Fukumoto
福本 隼明
Masaharu Hama
浜 正治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP27243885A priority Critical patent/JPH0675047B2/en
Publication of JPS62132161A publication Critical patent/JPS62132161A/en
Publication of JPH0675047B2 publication Critical patent/JPH0675047B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Domestic Plumbing Installations (AREA)
  • Body Washing Hand Wipes And Brushes (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

PURPOSE:To enable positive checking for washing of hands in hand washing which is conducted in the entry into a highly purified chamber for semiconductor plants or the like, by setting specific resistance value of purifying solution above a specified value while a pure water specific resistance value measuring sensor is provided in a hand washing tank. CONSTITUTION:A hand washing tank 1 is provided with a pure water supply pipe 2 and a sensor 7 is mounted to measure the specific resistance value of the pure water. Then, pure water is always supplied from a valve 3 or 4 to replace the water in the hand washing tank 1 while pure water is kept above 1kOMEGAcm. After the end of washing hands in the hand washing tank 1, hands are immersed into the purifying solution for about 20-30sec. At this point, dissolving of matters attached to the hands into the pure water lower the specific resistance value. When this specific resistance value falls below the lower limit set value, a buzzer at a control section 10 sounds. Mounting the specific resistance value sensor to the hand washing tank assures positive checking for the purification after the washing of the hands.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 乙の発明は、半導体工場等高清浄な雰囲室に入室する際
に行う手洗いにおいて、その効果の確認に関するもので
ある。
[Detailed Description of the Invention] [Industrial Application Field] The invention of Party B relates to confirming the effectiveness of hand washing when entering a room with a highly clean atmosphere such as a semiconductor factory.

〔従来の技術〕[Conventional technology]

従来(゛よ手を洗うだけで、その効果の確認については
実施されていなかった。
Previously, people simply washed their hands, but no tests were conducted to confirm its effectiveness.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

半導体工場では、その製造に悪影響を及ぼすしん埃はミ
クロフィルターによる集塵で高清浄度が保たれており、
また、人体から分泌するあぜ、あか等に含まれるNa、
 K、 Ca、 CIなども悪影響があるので、工uj
Ilと入る前には必ず手洗いが実施されている。しかし
ながら、その結果の確認がなされていないため、手洗い
不充分のまま工場に入りトラブルのなることがしばしば
あった。
In semiconductor factories, dust that has a negative impact on manufacturing is collected using microfilters to maintain a high level of cleanliness.
In addition, Na contained in furrows, grime, etc. secreted from the human body,
K, Ca, CI, etc. also have a negative effect, so
Hands must be washed before entering the premises. However, because the results were not confirmed, workers often entered the factory without washing their hands properly, causing trouble.

この発明はこのような問題点を解決するためになされた
もので、手洗いによる付着物の除去が充分か否かを簡単
に確認できる装置を提供することを目的としている。
The present invention was made to solve these problems, and it is an object of the present invention to provide a device that can easily confirm whether or not the removal of deposits by hand washing is sufficient.

〔問題点を解決するための手段〕[Means for solving problems]

この発明は上記のような問題点を解決するためになされ
たもので、 (11使用する洗浄水は、比抵抗値がIKQ帥以上の純
水であること、 (2)手洗いを行う水洗槽を備えていること、(3)純
水の比抵抗値を測定するセンサーを手洗槽の純水排水管
中に備えていること、 を特徴とする手洗いモニター装置を提供するものである
This invention was made in order to solve the above-mentioned problems. (3) A sensor for measuring the specific resistance value of pure water is provided in the pure water drain pipe of the hand washing tank.

〔作用〕[Effect]

人体から分泌されろあぜ、あか等にはNa、 K、 C
a。
Na, K, and C are secreted from the human body in cold spots and grime.
a.

CI等が含まれている。これ等は水中に溶は込むとイオ
ン化し水の抵抗値を低下させるので、この発明による装
置は上記原理を利用して、手洗いの効果を確認しうるよ
うにしたものである。
Contains CI etc. When these substances dissolve in water, they ionize and lower the resistance of the water. Therefore, the device according to the present invention utilizes the above-mentioned principle to enable confirmation of the effectiveness of hand washing.

〔発明の実施例〕[Embodiments of the invention]

以下この発明の実施例を図により説明する。第1図は本
装置の側面図である。(1)は手洗い水槽、(2)は手
洗い水槽(1)に純水を供給するため純水供給配管、(
3)は手動弁、(4)は自動弁で、共に純水供給量をW
Q整する。(5)は手洗い水槽(1)の下方に取り付け
られた排水配管、(6)はエアー開放口で、サイフオン
現象の発生防止装置である。(7)は純水の比抵抗値を
測定する比抵抗計セル、(8)は比抵抗計本体である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a side view of the device. (1) is a hand washing tank, (2) is a pure water supply pipe for supplying pure water to the hand washing tank (1), (
3) is a manual valve, and (4) is an automatic valve, both of which control the amount of pure water supplied to W.
Q Adjust. (5) is a drainage pipe installed below the hand washing tank (1), and (6) is an air opening, which is a device for preventing the occurrence of the siphon phenomenon. (7) is a resistivity meter cell for measuring the resistivity value of pure water, and (8) is a resistivity meter main body.

(9)は本装置を稼動させるためのフ・ソトスイッチ、
(lO)は純水供給用自動弁(4)、比抵抗計セル(7
)、比抵抗計(8)、フットスイッチ(9)の制御を行
うための制御部である。また手洗い効果の良否の判定は
ブザーによって行う。(11)は手洗いの架台である。
(9) is a switch for operating this device;
(lO) is automatic valve for pure water supply (4), resistivity meter cell (7)
), a resistivity meter (8), and a foot switch (9). Also, the effectiveness of hand washing is determined by a buzzer. (11) is a hand washing stand.

なお、比抵抗計(7)、比抵抗計(8)は人的イオン成
分としてNa”4オン電極やに1イオン電極と置きかえ
ろことも可能である。
Note that the resistivity meter (7) and the resistivity meter (8) may be replaced with a Na''4-on electrode or a 1-ion electrode as the human ion component.

まず、本装置の手洗い水f! filの構造について説
明する。手洗い水槽(1)は、第1図に示すように中央
底部を高(したW構造で、第2図に示すよう槽内の純水
の置換効率を向上させるため、ひし心構造をあわせもっ
た構造とした。本構造をとることにより、手洗い実施後
、手の付着物が溶は込んだ純水が効率よく下流方向に流
れ、手洗い水槽(1)の中の純水の置換効率の向上と検
出時間の短縮がはかられろ。また、水面を一定高さに保
持するため排水配管は逆U字形とし、かつサイフオン現
象の発生を防ぐためエアー開放口(6)を設けた。
First of all, this device's hand washing water f! The structure of fil will be explained. The hand-washing tank (1) has a W structure with a raised center bottom as shown in Figure 1, and has a rhombus structure as shown in Figure 2 to improve the efficiency of replacing pure water in the tank. With this structure, after hand washing, the pure water with dissolved hand substances efficiently flows downstream, improving the efficiency of replacing pure water in the hand washing tank (1). The detection time should be shortened.In addition, the drainage pipe was made in an inverted U-shape to maintain the water surface at a constant height, and an air release port (6) was provided to prevent the occurrence of the siphon phenomenon.

次に、手洗い効果確認を実施するための本装置の動作に
ついて、第3図のフローチャー1・により説明する。先
ず、本装置の初期状態(装置が作動していない状態)を
示すと、自動弁(4)は閉、手動弁(3)は開で、常時
11! / win以上の純水が手洗い水槽(1)に供
給され、中の純水が少しづつ置換されろ状態となってい
る。この場合手洗い水槽の容量154以上である。なお
、供給する純水の比抵抗値は1M0cm以上のものとす
る。初期状態からフットスイッチをONすること装置が
測定状態に入り、この時点で自動弁(4)が開き手洗い
水槽+11に5#/a+in以上の純水が供給される。
Next, the operation of this device for checking the effectiveness of hand washing will be explained using flowchart 1 in FIG. 3. First, the initial state of this device (the state in which the device is not operating) is that the automatic valve (4) is closed, the manual valve (3) is open, and it is always 11! /Win or more pure water is supplied to the hand washing tank (1), and the pure water inside is being replaced little by little. In this case, the capacity of the hand washing tank is 154 or more. Note that the specific resistance value of the supplied pure water is 1M0cm or more. By turning on the foot switch from the initial state, the device enters the measurement state, and at this point the automatic valve (4) opens and supplies 5 #/a+in or more of pure water to the hand washing tank +11.

これと並行して手洗水槽t1)の中で、手洗いを終了し
た手を20秒〜30秒つけてお(。この時、手の付着物
が純水中に溶は込むことで比抵抗値が徐々に低下してい
く。ここで比抵抗値が下限設定値より低下するとブザー
が鳴り、手洗い不足であるという判定を下す。この下限
設定値については任意設定でき使用条件によって定める
こととする。
At the same time, soak your washed hands for 20 to 30 seconds in the hand-washing water tank t1). It gradually decreases.When the specific resistance value falls below the lower limit set value, a buzzer sounds and it is determined that hand washing is insufficient.This lower limit set value can be set arbitrarily and is determined according to the conditions of use.

なお、上記実施例では、手洗い水槽(1)を槽内の純水
の置換効率のよい形状としたが、手洗い水槽(1)の形
状については限定しない。
In the above embodiment, the hand-washing tank (1) has a shape that allows for efficient replacement of pure water in the tank, but the shape of the hand-washing tank (1) is not limited.

〔発明の効果〕〔Effect of the invention〕

この発明によれば、手洗い水槽の排水管中に比抵抗セン
サーを取付けた構造であり、安価に簡単に作成すること
ができ、従来実施されていない手洗い後の清浄度の確認
が可能となる。
According to this invention, the structure is such that a resistivity sensor is installed in the drain pipe of the hand-washing tank, and it can be easily manufactured at low cost, and it becomes possible to check the cleanliness after hand-washing, which has not been done in the past.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例による手洗いモニター装置
を示す側面図、第2図はこの発明の一実施例による手洗
いモニター装置を示す平面図、第3図はこの発明の一実
施例による手洗いモニター装置の制御用ブローチヤード
である。 図において(11・・・手洗い水槽、(2)・・・純水
供給配管、(3)−・手動弁、(4)・・・自動弁、(
5)排水管、(6)エアー開放口、(7)・比抵抗計セ
ル、(8)・比抵抗計本体、(9)・フットスイッチ、
(10)・・制御部、(11)・架台で、同一符号は同
一、又は相当部分を示す。 代理人 弁理士 佐 藤 正 年 第1図 第3図
FIG. 1 is a side view showing a hand-washing monitor device according to an embodiment of the present invention, FIG. 2 is a plan view showing a hand-washing monitor device according to an embodiment of the present invention, and FIG. 3 is a side view showing a hand-washing monitor device according to an embodiment of the present invention. This is a broach yard for controlling the monitoring device. In the figure (11...hand washing tank, (2)...pure water supply piping, (3)--manual valve, (4)...automatic valve, (
5) Drain pipe, (6) Air opening, (7)・Resistivity meter cell, (8)・Resistivity meter body, (9)・Foot switch,
(10) Control unit, (11) Frame, the same reference numerals indicate the same or equivalent parts. Agent: Patent Attorney Tadashi Sato Figure 1 Figure 3

Claims (1)

【特許請求の範囲】 クリーンルーム入室直前に行う手洗いにおいて、(1)
使用する洗浄水は比抵抗値が1KΩcm以上の純水であ
ること、 (2)手洗いを行う水洗槽を備えていること、(3)純
水の比抵抗値を測定するセンサーを手洗槽の純水排水管
中に備えていること、 を特徴とする手洗いモニター装置。
[Claims] In hand washing immediately before entering the clean room, (1)
The washing water used must be pure water with a resistivity of 1KΩcm or more; (2) it must be equipped with a wash tank for hand washing; and (3) the sensor for measuring the resistivity of pure water must be connected to the pure water in the hand wash tank. A hand washing monitor device characterized by: being provided in a water drain pipe.
JP27243885A 1985-12-05 1985-12-05 Hand wash monitor-device Expired - Lifetime JPH0675047B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27243885A JPH0675047B2 (en) 1985-12-05 1985-12-05 Hand wash monitor-device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27243885A JPH0675047B2 (en) 1985-12-05 1985-12-05 Hand wash monitor-device

Publications (2)

Publication Number Publication Date
JPS62132161A true JPS62132161A (en) 1987-06-15
JPH0675047B2 JPH0675047B2 (en) 1994-09-21

Family

ID=17513914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27243885A Expired - Lifetime JPH0675047B2 (en) 1985-12-05 1985-12-05 Hand wash monitor-device

Country Status (1)

Country Link
JP (1) JPH0675047B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05176214A (en) * 1991-12-20 1993-07-13 Art Denshi Kogyo Kk Remote control television camera device
US7755494B2 (en) 2007-06-08 2010-07-13 University Of Florida Research Foundation, Inc. Hand washing compliance detection system
US9000930B2 (en) 2010-05-24 2015-04-07 Georgia-Pacific Consumer Products Lp Hand hygiene compliance system
US9672726B2 (en) 2010-11-08 2017-06-06 Georgia-Pacific Consumer Products Lp Hand hygiene compliance monitoring system

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05176214A (en) * 1991-12-20 1993-07-13 Art Denshi Kogyo Kk Remote control television camera device
US7755494B2 (en) 2007-06-08 2010-07-13 University Of Florida Research Foundation, Inc. Hand washing compliance detection system
US7978083B2 (en) 2007-06-08 2011-07-12 University Of Florida Research Foundation, Inc. Hand washing compliance detection system
US8525666B2 (en) 2007-06-08 2013-09-03 University Of Florida Research Foundation, Inc. Handwashing compliance detection system
US9000930B2 (en) 2010-05-24 2015-04-07 Georgia-Pacific Consumer Products Lp Hand hygiene compliance system
US9672726B2 (en) 2010-11-08 2017-06-06 Georgia-Pacific Consumer Products Lp Hand hygiene compliance monitoring system
US9965943B2 (en) 2010-11-08 2018-05-08 Gpcp Ip Holdings Llc Hand hygiene compliance monitoring system

Also Published As

Publication number Publication date
JPH0675047B2 (en) 1994-09-21

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