JPS62113007A - Absorption x-ray analyzer - Google Patents
Absorption x-ray analyzerInfo
- Publication number
- JPS62113007A JPS62113007A JP60254575A JP25457585A JPS62113007A JP S62113007 A JPS62113007 A JP S62113007A JP 60254575 A JP60254575 A JP 60254575A JP 25457585 A JP25457585 A JP 25457585A JP S62113007 A JPS62113007 A JP S62113007A
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- Prior art keywords
- ray
- rays
- intensity
- layer
- transmitted
- Prior art date
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- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、各層が夫々異なる単一元素からなる２層以上
の積層体の各層の厚みを定量する吸収Ｘ線分析装置に関
する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an absorption X-ray analyzer for quantifying the thickness of each layer of a laminate of two or more layers, each layer consisting of a different single element.
Ｘ線分析により試料厚みを求める方式の１つに、吸収Ｘ
線分析方式がある。この方式は、試料にＸ線を照射して
透過Ｘ線の強度を測定し、そのときの照射Ｘ線強度と透
過Ｘ線強度との差、即ちＸ線強度減衰量に基づき厚みを
測定する方式である。One method for determining sample thickness using X-ray analysis is absorption
There is a line analysis method. This method irradiates the sample with X-rays and measures the intensity of the transmitted X-rays, and then measures the thickness based on the difference between the irradiated X-ray intensity and the transmitted X-ray intensity, that is, the amount of X-ray intensity attenuation. It is.
従って、上記方法により測定する場合は一層である試料
に測定対象が限定され、２層以上からなる積層体につい
ては測定できなかった。つまり、吸収Ｘ線分析方式は、
減衰量に基づいて厚みを測定する方式であって、分析試
料がＩＭの場合には分析可能であるが、２層以上の積層
体を分析する場合には各層が夫々複数の元素からなると
きは勿論、単一元素からなるときであっても各層の元素
と厚みとにより透過Ｘ線強度が影響を受けるため、分析
できなかった。Therefore, when measuring by the above method, the measurement target is limited to a single-layer sample, and it is not possible to measure a laminate consisting of two or more layers. In other words, the absorption X-ray analysis method is
This method measures the thickness based on the amount of attenuation, and is possible when the analysis sample is IM. However, when analyzing a laminate with two or more layers, when each layer is composed of multiple elements, Of course, even when the layer is composed of a single element, the transmitted X-ray intensity is affected by the element and thickness of each layer, so analysis could not be performed.
本発明は斯かる事情に鑑みてなされたものであり、各層
が異なる単一元素からなる積層体の各層厚を測定する装
置であって、上記層の総数に応じた数の各波長での透過
Ｘ線の強度を検出し、その検出値と積層体に照射し７た
Ｘ線の強度との差が各層の厚みに関連性を有するという
現象を利用して上記層の総数に応じた数の連立方程式を
解くことにより、各層の厚みを測定し得る吸収Ｘ線分析
装置を提供することを目的とする。The present invention has been made in view of the above circumstances, and is an apparatus for measuring the thickness of each layer of a laminate in which each layer is made of a different single element, and the present invention is an apparatus for measuring the thickness of each layer of a laminate in which each layer is made of a different single element. The intensity of X-rays is detected, and the difference between the detected value and the intensity of the X-rays irradiated to the laminate is related to the thickness of each layer. An object of the present invention is to provide an absorption X-ray analyzer that can measure the thickness of each layer by solving simultaneous equations.
本発明に係る吸収Ｘ線分析装置は、各層が夫々異なる単
一元素からなる積層体の各層の厚みを吸収Ｘ線分析法に
より測定する装置であって、上記積層体の暦数に応じた
数の異なる波長で透過Ｘ線強度を検出し、各波長での透
過Ｘ線強度と、その時の照射Ｘ線強度と、両強度及び厚
みの関係を規定している関係式とに基づき各層の厚みを
算出する構成としていることを特徴とする。更には、特
性Ｘ線を発生するＸ線源としては、ターゲツト板を複数
備えてあり、これを選択的に用いて特性Ｘ線を発生する
方式、ターゲツト板の種類が異なるＸ線管球を複数備え
た方式、またはターゲツト板を複数備えた２次ターゲッ
ト方式であってもよく、また連続波長の透過Ｘ線より特
定波長のＸ線を取り出す場合は波長分散方式又はエネル
ギー分散方式のどちらを使用してもよい。The absorption X-ray analyzer according to the present invention is an apparatus for measuring the thickness of each layer of a laminate, each layer consisting of a different single element, by absorption The transmitted X-ray intensity is detected at different wavelengths, and the thickness of each layer is calculated based on the transmitted X-ray intensity at each wavelength, the irradiated X-ray intensity at that time, and the relational expression that defines the relationship between both intensities and thickness. The present invention is characterized in that it is configured to calculate. Furthermore, the X-ray source that generates characteristic X-rays is equipped with multiple target plates, which are selectively used to generate characteristic X-rays, and multiple X-ray tubes with different types of target plates are used. It may be a secondary target method with multiple target plates, or a wavelength dispersion method or an energy dispersion method may be used when extracting X-rays of a specific wavelength from transmitted X-rays of continuous wavelengths. It's okay.
まず、本発明の原理について以下に説明する。 First, the principle of the present invention will be explained below.
第１図は夫々単一の元素からなるｍ層の多層膜を有する
積層体１に例えばその上方から波長λ。FIG. 1 shows a laminate 1 having m multilayer films each made of a single element, for example, at a wavelength λ from above.
（ｉ＝１〜ｍ）、強度ＩＯ（λ１）の励起Ｘ線を、積層
体１を透過する強度で垂直方向より照射し、その透過Ｘ
線強度Ｉ （λ１）を測定する状態を示す模式図である
。(i = 1 to m), excitation X-rays of intensity IO (λ1) are irradiated from the vertical direction with an intensity that transmits through the laminate 1, and the transmitted
FIG. 2 is a schematic diagram showing a state in which line intensity I (λ1) is measured.
このとき、強度１ｏ （λ１）と１ （λＩ）との間
には下記＋ｉ＋式が成り立つ。At this time, the following +i+ formula holds between the intensities 1o (λ1) and 1 (λI).
■ （λ＋）−Ｉｎ（λ１） ・ｎｅｘｐ（１ｉｆ＝
ＩＩｊ −ｔＪ）ｊ＝１
・・・（１）
但し、ｊ：上から１番目の被膜（−１〜ｍ）μｆｌ：被
映ｊの元素に対する波長λ１のＸ線質量吸収係数
ρｊ ：被膜ｊの密度
ｔ、：被膜ｊの厚み
１記（１）〕−（のり１数をとって整理すると下記（２
）式が得られる。■ (λ+)-In(λ1) ・nexp(1if=
IIj −tJ)j=1 (1) where, j: the first film from the top (-1 to m) μfl: the X-ray mass absorption coefficient at wavelength λ1 for the element of the film j ρj: the coefficient of the X-ray mass absorption coefficient of the film j Density t,: Thickness of coating j 1 (1)] - (Taking the number of glue 1 and rearranging it, the following (2
) formula is obtained.
・・・（２）
斯かる（２）式において、左辺は照射Ｘ線強度と透過Ｘ
線強度と等測定してその測定値を（２）式に代入するこ
とにより定まり、また、右辺についてはρ。...(2) In this equation (2), the left side is the irradiation X-ray intensity and the transmitted X
It is determined by measuring the same as the line strength and substituting the measured value into equation (2), and the right side is ρ.
が単一元素の物性定数表より読取るか又は実測すること
により定まり、メ１り１が質量吸収体数表より読取るか
又は被膜厚さ既知の標準試料を用いて実測することによ
り定まる。このため、（２）式にお６プる未知数は１．
のみである。is determined by reading from a table of physical property constants of a single element or by actual measurement, and 1 is determined by reading from a table of mass absorber numbers or by actual measurement using a standard sample with a known coating thickness. Therefore, the unknown number added to equation (2) is 1.
Only.
未知数ｔａ （ｊ＝１〜ｍ）の数は被膜の総数、つま
り０１個であるから、式の数がｍの連立方程式をたてて
、つまり波長を異ならせてｒｎ回透過Ｘ線強度を測定し
て、各測定値Ｉ （λ１）と照射Ｘ線強度Ｉｏ （λ１
）とを（２）式に代入し、これを解くことにより算出で
きる。Since the number of unknowns ta (j = 1 to m) is the total number of coatings, that is, 01, a simultaneous equation with the number of equations is set up, that is, the wavelength is different, and the transmitted X-ray intensity is measured rn times. Then, each measured value I (λ1) and the irradiated X-ray intensity Io (λ1
) and can be calculated by substituting them into equation (2) and solving this.
Ｌ実施例１〕 以下に本発明を図面に基づき具体的Ｑこ説明する。L Example 1] The present invention will be specifically explained below based on the drawings.
第２図は本発明装置の実施例を示〕−模式図であり、図
中１は積層体を示す。積層体１は例えば上からＮｉ板、
Ｃｕ扱、 ｐ＋・板を１８合した３層となっており、
ホルダ（図示−１１Ｊ’＞Ｌこ支１４されている。積層
体１の上方には特性Ｘ線を積層体１に向けて垂直に照射
するＸ線源２が図示（−７ないＸ線源用支持装置にて支
持されて設巳１ちれており、Ｘ線源２は特（！ｌｘ Ｘ
線を発］１するターゲ・７１、扱く陰極）を複数、例え
ば八ｕ、 Ｍｏ、 Ｃｕの３種類を有Ｌ７、これが１個
のフィラメン１−（陽極）に対して対向するよ・うに回
転せしめられ、複数の特性Ｘ線のうらの１つを８層体１
に選択的に、Ｘ線源２の１１６射面側番こ設けたスリン
１〜娠３を介して１１！１射できる。なお、その照射Ｘ
線の強度は積層体１を透過するレベルに定める。FIG. 2 is a schematic diagram showing an embodiment of the apparatus of the present invention, and numeral 1 in the figure indicates a laminate. The laminate 1 includes, for example, a Ni plate from above,
It is made of 3 layers of 18 Cu-treated p+ plates.
A holder (-11J'>L as shown) is supported 14. Above the laminate 1 is an X-ray source 2 that vertically irradiates characteristic X-rays toward the laminate 1 (- The X-ray source 2 is supported by a support device, and the X-ray source 2 is
[Emit a line] 1 target 71, handle cathode), for example, 3 types of 8U, Mo, Cu L7, rotate so that it faces one filament 1- (anode) One of the backs of the plurality of characteristic X-rays is
The X-ray source 2 can selectively emit 11!1 radiation through Surin 1 to Surin 3 provided on the 116 radiation surface side. In addition, the irradiation
The intensity of the line is set at a level that allows it to pass through the laminate 1.
積層体】に特性Ｘ線が１１＜１射されると積層体Ｉの下
面よりＸ線が透ｉＩ！ＪＬ、、その透過Ｘ線の光路上に
はエネルギー分散型のＸ線検出器・１が図示しないＸ線
検出器用支持装置にて支持されて設けられており、検出
器４にて検出された透過Ｘ線はここで電気信号に変換さ
れ、電気信号は増幅器５へ送られた後に、波高弁別器６
及び積算器７によって全層の所定の金属元素の透過Ｘ線
強度に変換される。When characteristic X-rays (11<1) are irradiated onto the laminate I, the X-rays are transmitted through the bottom surface of the laminate I! JL, an energy dispersive X-ray detector 1 is supported by an X-ray detector support device (not shown) on the optical path of the transmitted X-rays, and the transmitted X-rays detected by the detector 4 are The X-rays are converted into electrical signals here, and the electrical signals are sent to an amplifier 5 and then to a pulse height discriminator 6.
The integrator 7 converts the intensity into the transmitted X-ray intensity of a predetermined metal element in the entire layer.
積算器７の透過Ｘ線強度に対応する出力は演算制御装置
８に導かれる。この演算制御装置８には前記（２）式が
設定されており、演算制御装置８は（２）式並びに入力
信号、即ち透過Ｘ線強度Ｉ （λ１）及び入力されたそ
の測定条件たる照射Ｘ線強度■。The output of the integrator 7 corresponding to the transmitted X-ray intensity is led to an arithmetic and control unit 8. The above-mentioned equation (2) is set in this arithmetic and control device 8, and the arithmetic and control device 8 receives the equation (2) and the input signals, that is, the transmitted X-ray intensity I (λ1) and the irradiation X that is the input measurement condition. Line strength■.
（λ１）、更には予め設定しであるμり１．ρ、に基づ
いて各層の厚みを算出してその算出値を表示器（図示せ
ず）に表示させる。(λ1), and furthermore, the preset μ 1. The thickness of each layer is calculated based on ρ, and the calculated value is displayed on a display (not shown).
また、演算制御装置８は予め各層の厚みについての測定
順序及び特性Ｘ線の波長分布、つまり使用するターゲツ
ト板の種類、検出すべき透過Ｘ線の波長が設定されてお
り、ある層の厚みを算出すると、次層の厚みを分析する
準備をすべく、Ｘ線源２用のＸ線、角度制御装置１０へ
所定の信号を出力する。In addition, the arithmetic and control unit 8 has the measurement order for the thickness of each layer and the wavelength distribution of characteristic X-rays, that is, the type of target plate to be used and the wavelength of transmitted X-rays to be detected, set in advance, and the thickness of a certain layer can be determined. Once calculated, a predetermined signal is output to the X-ray and angle control device 10 for the X-ray source 2 in preparation for analyzing the thickness of the next layer.
これによりＸ線、角度制御装置１０は入力信号に基づい
てＸ１ｊｌ源２を回転させてフィラメントと所定のター
ゲソ］・板Ａｕ、 Ｍｏ又はＣｕ等とを対向せしめ、特
性Ｘ線の波長を変更する。As a result, the X-ray and angle control device 10 rotates the X1jl source 2 based on the input signal to make the filament and a predetermined target plate (Au, Mo, Cu, etc.) face each other, thereby changing the wavelength of the characteristic X-ray.
このようにして準備がなされると次の測定が開始され、
以下これが繰り返される。Once preparations have been made in this way, the next measurement begins.
This is repeated below.
このように構成された分析装置は、連続的に、単一元素
からなる２層以上の積層体の各層の定量分析が可能であ
り、また測定準備時間を大幅に短縮でき、迅速分析が可
能である。The analyzer configured in this way is capable of continuous quantitative analysis of each layer of a laminate of two or more layers made of a single element, and can also significantly shorten measurement preparation time and enable rapid analysis. be.
なお、上記実施例ではＸ線源としてターゲツト板を複数
備え、これを選択的に用いて特性Ｘ線を発生せしめてい
るが、本発明装置はこれに限るものではなく第３図に示
す如くターゲツト板の種類が夫々異なるＸ線管球を複数
備えたＸ線源を用いても、また第４図に示す如くターゲ
ツト板２ａ＋２ａ＋２ａを複数備えた２次ターゲソＩ一
方式のＸ線源２を用いても同様に実施できることは勿論
である。Incidentally, in the above embodiment, a plurality of target plates are provided as X-ray sources, and these are selectively used to generate characteristic X-rays, but the present invention is not limited to this. Even if an X-ray source equipped with a plurality of X-ray tubes with different types of plates is used, or a secondary target type X-ray source 2 equipped with a plurality of target plates 2a+2a+2a as shown in FIG. Of course, it can also be implemented in the same way.
また、上記実施例では明記していないが、照射Ｘ線強度
Ｔｏ （λ１）は、各波長別の測定の都度実測したも
のでも、又は予め測定していたものでも使用できる。Further, although not specified in the above embodiments, the irradiated X-ray intensity To (λ1) may be measured each time each wavelength is measured, or may be measured in advance.
〔実施例２〕
第５図は本発明装置の他の実施例を示す模式図であり、
連続Ｘ線を積層体に照射し、連続波長たる透過Ｘ線より
固有Ｘ線を分光させて各層の厚みを測定する場合を示す
。図中１１は積層体であり、積層体１１は例えば上から
Ａｕ板、Ａｌ板＋ Ａｇ板を接合した３層となっており
、ホルダ（図示せず）に支持されている。[Example 2] FIG. 5 is a schematic diagram showing another example of the device of the present invention,
A case is shown in which the thickness of each layer is measured by irradiating continuous X-rays onto the laminate and spectrally spectrographing the characteristic X-rays from the transmitted X-rays, which are continuous wavelengths. In the figure, reference numeral 11 denotes a laminate, and the laminate 11 has three layers, for example, an Au plate, an Al plate + an Ag plate joined from above, and is supported by a holder (not shown).
積層体】１の上方にはＸ線源１２が固設されており、Ｘ
線源１２はＷ対陰極のＸ線管球であり、積層体１に向け
て連続Ｘ線Ａを垂直に照射するようになっている。該連
＠Ｘ線Ａの強度は積層体１を透過するレベルに調整され
ており、連続波長の透過Ｘ線Ｂの光路上には分光結晶２
１が設けられている。[Laminated body] An X-ray source 12 is fixedly installed above the X-ray
The radiation source 12 is an X-ray tube with a W anticathode, and is configured to vertically irradiate continuous X-rays A toward the stacked body 1 . The intensity of the continuous X-rays A is adjusted to a level that allows it to pass through the laminate 1, and a spectroscopic crystal 2 is placed on the optical path of the transmitted X-rays B with continuous wavelengths.
1 is provided.
分光結晶２１は透過Ｘ線のスポット位置を軸中心として
図示しない回転装置にて回転でき、入射角θの変更が可
能になっている。分光結晶２１の周りにはＸ線検出器、
例えばシンチレーションカウンタ２２が上記軸中心を中
心とする円弧上を回転可能に図示しない回転支持装置に
て支持されており、シンチレーションカウンタ２２は入
射角θと同一の取出角θとなるように移動せしめられ、
固有の波長をもつ回折Ｘ線（透過Ｘ線）Ｃの強度を検出
できるようになっている。The spectroscopic crystal 21 can be rotated by a rotating device (not shown) about the spot position of the transmitted X-ray as the axis, and the incident angle θ can be changed. Around the spectroscopic crystal 21 is an X-ray detector,
For example, the scintillation counter 22 is supported by a rotation support device (not shown) so as to be rotatable on an arc centered on the axis, and the scintillation counter 22 is moved so that the take-out angle θ is the same as the incident angle θ. ,
The intensity of diffracted X-rays (transmitted X-rays) C having a unique wavelength can be detected.
検出強度に関する信号は、前記（２）式が設定されてい
る演算制御装置２０へ与えられ、演算制御装置２０は（
２）式並びに入力（ｉ号たる回折Ｘ線強度、即ち固有Ｘ
線強度Ｉ （λ１）及び入力されたその測定条件たる連
続Ｘ線強度、即ち照射Ｘ線強度１゜（λＩ）、μ？、ρ
」に基づいて各層の厚みを算出する。ところで、この例
の場合の算出は、入射角θ、取出角θを層の総数に応じ
て３通り変更し、例えば分光結晶２１にＩ、１Ｆ２００
を用いて波長が１．５人。The signal regarding the detection intensity is given to the arithmetic and control unit 20 in which the above-mentioned equation (2) is set, and the arithmetic and control unit 20 expresses (
2) Equation and input (diffraction X-ray intensity of number i, i.e. characteristic
Ray intensity I (λ1) and continuous X-ray intensity that is the input measurement condition, that is, irradiated X-ray intensity 1° (λI), μ? , ρ
Calculate the thickness of each layer based on By the way, in the calculation in this example, the incident angle θ and the extraction angle θ are changed in three ways depending on the total number of layers.
Using , the wavelength is 1.5 people.
１．０人、０．５人の３固有Ｘ線を取り出す場合には、
θを夫々２１．８６°、１４．３８°、 ７．１３“に
変更し、その都度、固有Ｘ線強度■ （λ：）を検出す
ることにより可能である。When extracting 3 unique X-rays of 1.0 person and 0.5 person,
This is possible by changing θ to 21.86°, 14.38°, and 7.13″, respectively, and detecting the characteristic X-ray intensity (λ:) each time.
なお、実施例２では波長分散型のＸ線検出器を用いてい
るが、本発明は次に示すようにエネルギー分散型のＸ線
検出器を用いることも可能である。Although the second embodiment uses a wavelength-dispersive X-ray detector, the present invention can also use an energy-dispersive X-ray detector as described below.
〔実施例３〕
第６図は、エネルギー分散型のＸ線検出器を用いた場合
の本発明装置の実施例を示す模式図であり、第５図と同
一部分には同一の番号を付している。Ｘ線源１２は連続
Ｘ線Ａを積層体１１に照射し、連続波長たる透過Ｘ線Ｂ
から、Ｘ線検出器たる５ｉ（Ｌｉ）半導体検出器１４に
てエネルギーレベルが異なる３波長、例えば１．５人、
１．０人、０．５人の固有透過Ｘ線についての強度を電
気信号として検出する。[Example 3] Figure 6 is a schematic diagram showing an example of the apparatus of the present invention when an energy dispersive X-ray detector is used, and the same parts as in Figure 5 are given the same numbers. ing. The X-ray source 12 irradiates the stacked body 11 with continuous X-rays A, and transmits transmitted X-rays B with continuous wavelengths.
From the 5i (Li) semiconductor detector 14, which is an X-ray detector, three wavelengths with different energy levels are detected, for example, 1.5 people,
The intensity of the uniquely transmitted X-rays of 1.0 and 0.5 people is detected as an electrical signal.
その電気信号は増幅器１５にて増幅された後、多重波高
弁別器１６へ与えられ、弁別器１６は各波長の電圧値を
弁別、検出して検出値を（２）式が設定されている演算
制御装置３０へ出力する。After the electrical signal is amplified by the amplifier 15, it is given to the multiple wave height discriminator 16, and the discriminator 16 discriminates and detects the voltage value of each wavelength, and calculates the detected value using equation (2). Output to the control device 30.
演算制御装置３０は、多重波高弁別器１６より同時的に
入力された３波長についての信号に基づき、各層の厚み
を前同様にして算出できる。The arithmetic and control device 30 can calculate the thickness of each layer in the same manner as before based on the signals for three wavelengths inputted simultaneously from the multiplex height discriminator 16.
第１表及び第２表は夫々実施例１の本発明装置にて３波
長１．５人、１．０人、０．５人の透過Ｘ線強度を検出
し、前記積層体１の各層の厚みを測定した結果、実施例
２の本発明装置にて前記積層体１１の各層の厚みを測定
した結果をまとめた表であり、画表とも比較のために化
学分析により測定した各層の厚みを併せて示している。Tables 1 and 2 show the transmitted X-ray intensity of three wavelengths of 1.5, 1.0, and 0.5 people detected using the apparatus of the present invention of Example 1, and This is a table summarizing the results of measuring the thickness of each layer of the laminate 11 using the device of the present invention in Example 2, and the table also shows the thickness of each layer measured by chemical analysis for comparison. Also shown.
第１表
第２表
これら画表より理解される如く本発明による場合は、特
性Ｘ線を積層体に照射するときであっても、また連続Ｘ
線を積層体に照射してその透過Ｘ線より特定波長のＸ線
を取出すときであっても各層の厚みを正確に検出できる
。Table 1 Table 2 As can be understood from these charts, in the case of the present invention, even when irradiating a laminate with characteristic X-rays, continuous X-ray
Even when a laminate is irradiated with X-rays and X-rays of a specific wavelength are extracted from the transmitted X-rays, the thickness of each layer can be accurately detected.
以上詳述した如く本発明は、積層体の各層の総数に応し
た数の各波長での透過Ｘ線の強度を検出し、その検出値
と積層体に照射したＸ線の強度とを関係式に代入してそ
の連立方程式を解くので、各層が夫々異なる単一元素か
らなる２層以上の積層体の各層の厚みを１蒲に測定でき
る優れた効果を奏する。As described in detail above, the present invention detects the intensity of transmitted X-rays at each wavelength corresponding to the total number of each layer of a laminate, and calculates the detected value and the intensity of X-rays irradiated to the laminate using a relational expression. Since the simultaneous equations are solved by substituting , it is possible to measure the thickness of each layer in one layer of a laminate of two or more layers, each layer consisting of a different single element.
第１図は本発明の原理説明図、第２図は本発明の実施例
を示す模式図、第３．４図は夫々その他の使用可能なＸ
線源を示す模式図、第５，６図は夫々本発明の他の実施
例を示す模式図である。
】２月・・・積層体 ２．１２・・・ＸＩＪｉｌ源 ４
．】４・・・Ｘ線検出器 ８．２０．３０・・・演算制
御装置 ２１・・・分光結晶 ２２・・・シンチレーシ
ョンカウンタ特 許 出願人 住友金属工業株式会社
代理人 弁理士 河 野 登 夫第１図
カ２０
茅３図
第４Ｆ
第５図
第６（２）Fig. 1 is a diagram explaining the principle of the present invention, Fig. 2 is a schematic diagram showing an embodiment of the present invention, and Figs.
A schematic diagram showing a radiation source, and FIGS. 5 and 6 are schematic diagrams showing other embodiments of the present invention, respectively. ]February...Laminated body 2.12...XIJil source 4
．． ]4... X-ray detector 8.20.30... Arithmetic control device 21... Spectroscopic crystal 22... Scintillation counter patent Applicant Sumitomo Metal Industries Co., Ltd. Agent Patent attorney Noboru Kono No. Figure 1 Ka20 Figure 3 No. 4F Figure 5 No. 6 (2)
Claims (1)
厚みを吸収Ｘ線分析法により測定する装置において、 前記積層体の層数に対応する数の特性Ｘ線 のうちの１つを、積層体を透過するに要する強度で選択
的に照射するＸ線源と、 積層体からの透過Ｘ線の光路上に設けてあ り、その強度を検出するＸ線検出器と、 Ｘ線検出器からの入力信号と、照射Ｘ線強 度と、これらと各層の厚みの関係を規定している関係式
とに基づき各層の厚みを算出する演算部と を具備することを特徴とする吸収Ｘ線分析 装置。 ２、各層が夫々異なる単一元素からなる積層体の各層の
厚みを吸収Ｘ線分析法により測定する装置において、 積層体を透過するに要する強度で連続Ｘ線 を照射するＸ線源と、 積層体からの透過Ｘ線の光路上に設けてあ り、積層体の層数に対応する数の異なる波長のうちの１
つに透過Ｘ線を選択的に分光する分光器と、 該分光器にて分光された透過Ｘ線の光路上 に設けてあり、その強度を検出するＸ線検出器と、 Ｘ線検出器からの入力信号と、照射Ｘ線強 度と、これらと各層の厚みの関係を規定している関係式
とに基づき各層の厚みを算出する演算部と を具備することを特徴とする吸収Ｘ線分析 装置。 ３、各層が夫々異なる単一元素からなる積層体の各層の
厚みを吸収Ｘ線分析法により測定する装置において、 積層体を透過するに要する強度で連続Ｘ線 を照射するＸ線源と、 積層体からの透過Ｘ線の光路上に設けてあ り、積層体の層数に対応する数の異なる波長での透過Ｘ
線の強度を電気信号として検出するＸ線検出器と、 該Ｘ線検出器の検出レベルを各波長別に捉 える波高分析器と、 波高分析器からの入力信号と、照射Ｘ線強 度と、これらと各層の厚みの関係を規定している関係式
とに基づき各層の厚みを算出する演算部と を具備することを特徴とする吸収Ｘ線分析 装置。[Scope of Claims] 1. In an apparatus for measuring the thickness of each layer of a laminate in which each layer is made of a different single element by absorption X-ray analysis, the number of characteristic X-rays corresponding to the number of layers in the laminate is An X-ray source that selectively irradiates one of the X-rays with the intensity required to pass through the laminate, and an X-ray detector that is installed on the optical path of the transmitted X-rays from the laminate and detects the intensity. , comprising a calculation unit that calculates the thickness of each layer based on the input signal from the X-ray detector, the irradiated X-ray intensity, and a relational expression that defines the relationship between these and the thickness of each layer. Absorption X-ray analyzer. 2. In an apparatus for measuring the thickness of each layer of a laminate, each layer consisting of a different single element, by absorption X-ray analysis, an X-ray source that irradiates continuous X-rays with an intensity required to penetrate the laminate; It is provided on the optical path of transmitted X-rays from the body, and one of the different wavelengths corresponds to the number of layers of the laminate.
a spectrometer that selectively separates transmitted X-rays; an X-ray detector that is installed on the optical path of the transmitted X-rays separated by the spectrometer and detects the intensity; An absorption X-ray analysis device comprising: an input signal of . 3. In an apparatus for measuring the thickness of each layer of a laminate, each layer consisting of a different single element, by absorption X-ray analysis, an X-ray source that irradiates continuous X-rays with an intensity necessary to transmit through the laminate; It is installed on the optical path of transmitted X-rays from the body, and transmits X-rays at different wavelengths corresponding to the number of layers in the laminate.
An X-ray detector that detects the intensity of rays as an electrical signal, a pulse height analyzer that detects the detection level of the X-ray detector for each wavelength, an input signal from the pulse height analyzer, the irradiated X-ray intensity, and these An absorption X-ray analysis apparatus comprising: a calculation unit that calculates the thickness of each layer based on a relational expression that defines the relationship between the thicknesses of each layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60254575A JPS62113007A (en) | 1985-11-12 | 1985-11-12 | Absorption x-ray analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60254575A JPS62113007A (en) | 1985-11-12 | 1985-11-12 | Absorption x-ray analyzer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62113007A true JPS62113007A (en) | 1987-05-23 |
Family
ID=17266948
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60254575A Pending JPS62113007A (en) | 1985-11-12 | 1985-11-12 | Absorption x-ray analyzer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62113007A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011519031A (en) * | 2008-04-24 | 2011-06-30 | クロメック リミテッド | Method and apparatus for inspecting substances |
| JP2011196753A (en) * | 2010-03-18 | 2011-10-06 | Yokogawa Electric Corp | Radiation measurement method |
-
1985
- 1985-11-12 JP JP60254575A patent/JPS62113007A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011519031A (en) * | 2008-04-24 | 2011-06-30 | クロメック リミテッド | Method and apparatus for inspecting substances |
| JP2011196753A (en) * | 2010-03-18 | 2011-10-06 | Yokogawa Electric Corp | Radiation measurement method |
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