JPS6210279A - Electroless plating bath - Google Patents

Electroless plating bath

Info

Publication number
JPS6210279A
JPS6210279A JP14798685A JP14798685A JPS6210279A JP S6210279 A JPS6210279 A JP S6210279A JP 14798685 A JP14798685 A JP 14798685A JP 14798685 A JP14798685 A JP 14798685A JP S6210279 A JPS6210279 A JP S6210279A
Authority
JP
Japan
Prior art keywords
ions
magnetic
electroless plating
magnetic film
plating bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14798685A
Other languages
Japanese (ja)
Inventor
Kazuyuki Ikemoto
池本　一幸
Kanji Watanabe
渡辺　寛二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14798685A priority Critical patent/JPS6210279A/en
Publication of JPS6210279A publication Critical patent/JPS6210279A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/48—Coating with alloys
    • C23C18/50—Coating with alloys with alloys based on iron, cobalt or nickel

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE:To improve the uniformity of a magnetic film formed by electroless plating by adding Zn ions to an aqueous soln. contg. Co ions, Ni ions, a reducing agent and a complexing agent. CONSTITUTION:Zn ions are added to an electroless plating bath contg. Co ions, Ni ions, a reducing agent for the metallic ions, a pH buffer, a pH adjusting agent and a complexing agent for the metallic ions. The coercive force Hc of a magnetic Co-Ni-P film is changed by regulating the amount of Zn ions added, so a magnetic film having controlled desired magnetic characteristics is formed. Since Zn ions smoothen the plated surface, the uniformity of the magnetic film is improved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は磁気ディスク等の磁気記録体に用いられる磁
気記憶媒体（磁性膜）を作製する無電解めっき浴に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an electroless plating bath for producing a magnetic storage medium (magnetic film) used in a magnetic recording medium such as a magnetic disk.

〔従来の技術〕[Conventional technology]

近年、高密度磁気記録体として、記憶媒体をめっき法に
より作製しためっき磁気ディスク等が用いられ始めた。In recent years, plated magnetic disks, etc., in which storage media are manufactured by plating, have begun to be used as high-density magnetic recording bodies.

磁気記録装置は記録再生ヘッド。A magnetic recording device is a recording/reproducing head.

および記憶媒体の主構成部から構成され、要求される記
録密度、記録再生速度などにより使用されるヘッドの性
能及び記憶媒体の特性が決定される。and the main components of the storage medium, and the performance of the head used and the characteristics of the storage medium are determined by the required recording density, recording/reproducing speed, etc.

記録密度及び出力は同一ヘッドを用いる場合。Recording density and output are when using the same head.

記憶媒体の磁気特性（保磁力（Ｈｃ　）　、残留磁束密
度（Ｂｒ＋）と膜厚（δ）により決まり９次の様な関係
がある。It is determined by the magnetic properties of the storage medium (coercive force (Hc), residual magnetic flux density (Br+), and film thickness (δ)), and there is a 9th-order relationship.

（記録密度）　ｃｃ（Ｈｃ／Ｂｒ、δ）”　　　　　　
＋１１（出力）　”　（Ｅ３ｒ、δ・Ｈｃ）′Ａ（２）
従って、要求される記録密度及び出力に適する磁性膜を
得るためには、磁性膜の磁気特性及び膜厚を一定の許容
されうる範囲内に保つ必要がある。(Recording density) cc (Hc/Br, δ)”
+11 (output) ” (E3r, δ・Hc)′A(2)
Therefore, in order to obtain a magnetic film suitable for the required recording density and output, it is necessary to maintain the magnetic properties and film thickness of the magnetic film within a certain allowable range.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところが無電解めっき法を用いて磁性膜を作製する場合
、ある一定組成で調製した無電解めっき浴から得られる
磁性膜の磁気特性を変化させることは容易でない。電気
めっき法の場合は電流密度を変えることにより得られる
磁気特性を容易に変化させることができるが、無電解め
っき法では浴のＰＨ，浴温などのめっき電性を大幅〈変
動させる操作が必要であり、これらの操作は浴寿命の低
下２作業性の低下などを伴うことが多く実用上問題があ
る。従って所要の磁気特性の磁性膜を得るにはその特性
に応じて別個の無電解めっき浴を開発しなければならな
いという問題があったっこの発明は、これらの問題点を
改善し、磁性膜の均一性を良くシ、所要の特性を有する
磁性膜を得ることのできる無電解めりき浴を提供するこ
とを目的とする。However, when producing a magnetic film using an electroless plating method, it is not easy to change the magnetic properties of the magnetic film obtained from an electroless plating bath prepared with a certain composition. In the case of electroplating, the magnetic properties obtained can be easily changed by changing the current density, but in the case of electroless plating, it is necessary to significantly change the electroplating properties such as bath pH and bath temperature. These operations are often accompanied by a decrease in bath life and workability, which poses practical problems. Therefore, in order to obtain a magnetic film with the required magnetic properties, separate electroless plating baths had to be developed according to the properties.This invention improves these problems and provides a uniform magnetic film. It is an object of the present invention to provide an electroless plating bath capable of obtaining a magnetic film having good properties and desired characteristics.

〔問題点を解決するための手段〕[Means for solving problems]

この発明による無電解めっき浴は、コバルトイオンおよ
びニッケルイオン、これら金属イオンの還元剤、ＰＨ緩
衝剤、ＰＨ調節剤、前記金属イオンの錯化剤を含む水溶
液に、亜鉛イオンを加えることを特徴としている。The electroless plating bath according to the present invention is characterized in that zinc ions are added to an aqueous solution containing cobalt ions and nickel ions, a reducing agent for these metal ions, a PH buffer, a PH regulator, and a complexing agent for the metal ions. There is.

〔作用〕[Effect]

この発明における亜鉛イオンは、めっき面を平滑にする
働きがあり、磁性膜の均一性が向上する。The zinc ions in this invention have the function of smoothing the plating surface, improving the uniformity of the magnetic film.

〔発明の実施例〕 以下この発明による無電解めっき浴の特長を実施例によ
り説明する。[Embodiments of the Invention] The features of the electroless plating bath according to the present invention will be explained below with reference to Examples.

非磁性基板上に下記のめ、つき浴組成及びめっき条件に
てＧｏ−Ｎｉ−Ｐ磁性膜（δ−＝　５０ＯＡ　）を形成
した。A Go-Ni-P magnetic film (δ-=50OA) was formed on a non-magnetic substrate using the following bath composition and plating conditions.

〔めっき組成〕[Plating composition]

硫酸コバルト　　　　　　０．０４８〜０．０７２ｍｏ
７Ｉ／Ａ’硫酸ニッケル　　　　　　０．０３１〜０．
０５３ｍｏ！！／Ｊ次亜リン酸ナトリウム　　０．１５
８〜０２７７ｍａｌ／１硫酸アンモニウム　　　　０．
０８〜（Ｌ！２６ｍｏＪ／ｊｔマロン酸ナトリウム　　
　０２３８−→３５８ｍｏｌ／ｌ！リンゴ酸ナトリウム
　　　０３２４〜０３０　ｍｏｌ／１コハク酸ナトリウ
ム　　　０．４０−０．６　　ｍａｔ／を亜鉛イオン　
　　　　　　　Ｏ−０，１８ｍａｔ／１（硫酸亜鉛とし
て添加） 〔めっき条件〕 浴のＰＨ＝９．ｚ　（２５℃の時ＮＨ４ＯＨで調節）浴
温８０℃ 班の値の亜鉛イオン濃度依存性を調べた結果を図に示す
。亜鉛イオン濃度が０の時のルけＳＯＯエルステッドで
あるが添加する亜鉛イオン濃度の多少によりＨｃが変化
する。亜鉛イオン濃度がＯｊ）ＱｍｏＪ力ではＨｃがＩ
ＪＯＯｚルステッドと高（、０，１５ｍｏＡ’／７では
６２０エルステツドと低くなり、　０．１８ｍｏｌ／ｌ
の濃度でけめっきの析出が起らなくなったっこの様にあ
る範囲内で亜鉛イオンを加えることによりＣ６−Ｎ１−
Ｐ磁性膜のＨｃの値を変化させることができる。Cobalt sulfate 0.048-0.072mo
7I/A' Nickel sulfate 0.031-0.
053mo! ! /J sodium hypophosphite 0.15
8-0277mal/1 ammonium sulfate 0.
08~(L!26moJ/jt Sodium malonate
0238-→358mol/l! Sodium malate 0324-030 mol/1 sodium succinate 0.40-0.6 mat/ with zinc ion
O-0.18mat/1 (added as zinc sulfate) [Plating conditions] Bath pH = 9. z (Adjusted with NH4OH at 25°C) Bath temperature 80°C The results of investigating the dependence of the group value on zinc ion concentration are shown in the figure. Ruke SOO Oersted when the zinc ion concentration is 0, but Hc changes depending on the added zinc ion concentration. When the zinc ion concentration is Oj)QmoJ force, Hc is I
JOOz rsted and high (0.15 moA'/7 is as low as 620 ersted, 0.18 mol/l
By adding zinc ions within a certain range, C6-N1-
The Hc value of the P magnetic film can be changed.

以上、示された様に、この発明によれば、コバルトイオ
ンおよびニッケルイオン、これら金属イオンの還元剤　
ｐＨ緩衝剤、ｐＨ調節剤、前記金属イオンの錯化剤を含
む水溶液に硫酸亜鉛を加えることにより、磁気特性が制
御され所要の特性を有する磁性膜が得られる。As shown above, according to the present invention, cobalt ions and nickel ions, reducing agents for these metal ions,
By adding zinc sulfate to an aqueous solution containing a pH buffer, a pH adjuster, and a complexing agent for the metal ions, magnetic properties can be controlled and a magnetic film having desired properties can be obtained.

〔発明の効果〕〔Effect of the invention〕

この発明によれば亜鉛イオンは、めっき面を平滑にする
働きがあり、磁性膜の均一性が向上する。According to this invention, zinc ions have the function of smoothing the plating surface, improving the uniformity of the magnetic film.

したがって電磁変換特性上特に、出力電圧の安定性（モ
ジーレーションという）を良くシ、欠陥も少なくなると
いうことがあり、高密度でかつ欠陥の少ない円板を製造
することができる。Therefore, in terms of electromagnetic conversion characteristics, the stability of the output voltage (called modulation) is particularly improved, and the number of defects is reduced, making it possible to manufacture a disk with high density and fewer defects.

【図面の簡単な説明】[Brief explanation of drawings]

図は、この発明の一実施例に用いためつき浴における亜
鉛イオン濃度と保磁力Ｈｃの関係を示す図である。 亜鈴濃度（仇ＯｙりThe figure is a diagram showing the relationship between the zinc ion concentration and the coercive force Hc in the soaking bath used in an example of the present invention. Adian Oyuri

Claims (1)

【特許請求の範囲】[Claims] コバルトイオンおよびニッケルイオン、これら金属イオ
ンの還元剤、ＰＨ緩衝剤、ＰＨ調節剤、前記金属イオン
の錯化剤を含む水溶液に亜鉛イオンを加えたことを特徴
とする無電解めっき浴。An electroless plating bath characterized in that zinc ions are added to an aqueous solution containing cobalt ions and nickel ions, a reducing agent for these metal ions, a PH buffer, a PH regulator, and a complexing agent for the metal ions.
JP14798685A 1985-07-05 1985-07-05 Electroless plating bath Pending JPS6210279A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14798685A JPS6210279A (en) 1985-07-05 1985-07-05 Electroless plating bath

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14798685A JPS6210279A (en) 1985-07-05 1985-07-05 Electroless plating bath

Publications (1)

Publication Number Publication Date
JPS6210279A true JPS6210279A (en) 1987-01-19

Family

ID=15442576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14798685A Pending JPS6210279A (en) 1985-07-05 1985-07-05 Electroless plating bath

Country Status (1)

Country Link
JP (1) JPS6210279A (en)

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