JPS6191354A - Wear resistant multi-layered film - Google Patents

Wear resistant multi-layered film

Info

Publication number
JPS6191354A
JPS6191354A JP21145184A JP21145184A JPS6191354A JP S6191354 A JPS6191354 A JP S6191354A JP 21145184 A JP21145184 A JP 21145184A JP 21145184 A JP21145184 A JP 21145184A JP S6191354 A JPS6191354 A JP S6191354A
Authority
JP
Japan
Prior art keywords
film
layer
wear
layer film
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21145184A
Other languages
Japanese (ja)
Other versions
JPH0576537B2 (en
Inventor
Tetsuo Kuwabara
鉄夫 桑原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP21145184A priority Critical patent/JPS6191354A/en
Publication of JPS6191354A publication Critical patent/JPS6191354A/en
Publication of JPH0576537B2 publication Critical patent/JPH0576537B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D

Abstract

PURPOSE:To provide a multi-layered film having good adhesiveness and high wear resistance by depositing the film of the 2nd layer by evaporation on the 1st layer film formed by ion plating then providing the wear-resistant 3rd layer film thereon in plasma discharge. CONSTITUTION:The film 2 of the 1st layer consisting of metal such as Ti, Co, Cr or Fe is formed to about <=1,000Angstrom film thickness by ion plating onto a base material 4 for a cutting tool, forming die, etc. The film 2 of the 2nd layer consisting of the same material as the material of the film 1 of the 1st layer is formed thereon by vapor deposition. The 2nd film 2 has tensile stress. The highly wear-resistant film 3 of the 3rd layer consisting of TiN, BN, Si3N4, SiC, Al2O3 or diamond-like carbon or the mixture composed thereof is formed by ion plating in reactive gaseous plasma on said layer. However, the film thickness of the 2nd film 2 is preferably equal to or larger than the thickness of the film 3. The film 3 has compressive stress.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は耐摩耗性を有する多層膜に関し、特に該膜力５
付与される部材（以下「母材」という）との密着性の良
好な耐摩純性多ＰＲ膜に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a multilayer film having wear resistance, and particularly to a multilayer film having wear resistance.
The present invention relates to an abrasion-resistant multi-PR film that has good adhesion to the member to which it is applied (hereinafter referred to as "base material").

［従来の技術］ 従来、工具等の各種の母材の表面に耐摩耗性を有する膜
を付与１することが行なわれている。この耐彦耗性膜の
材質としてはＴ　ｉ　ＮやＴｉＣ等が用いられ、これら
は一般に窒素、アンモニア、アセチレン、メタン等の反
応ガスのプラズマ放電中においてＴｉをイオン化させて
、負の電圧に保たれている母材表四へと加速してイオン
プレーティングする。ことにより付与せしめられる。こ
こで、母材への膜の声着性を確保するためにはイオンを
十分に加速することが必要であり、このため母材には高
い電圧を印加することが行なわれる。[Prior Art] Conventionally, a film having wear resistance has been applied to the surface of various base materials such as tools. The material used for this wear-resistant film is TiN, TiC, etc., and these are generally made by ionizing Ti during plasma discharge of a reactive gas such as nitrogen, ammonia, acetylene, or methane, and maintaining it at a negative voltage. Accelerate ion plating onto the sagging base material. It is given by this. Here, in order to ensure the adhesion of the film to the base material, it is necessary to sufficiently accelerate the ions, and for this reason a high voltage is applied to the base material.

［発明が解決しようとする問題点］ とこ、ろが、イオンプレーティングにより形成される上
記の様な耐摩耗性膜は大きな内部応力（圧縮応力）を有
し、ｎ９厚の増加とともにこの内部応力は次第に大きく
なる。従って、耐摩耗性を向上させるために、より厚い
耐摩耗性膜を付与しようとする場合には内部応力の増・
加のために膜の密着性が低下する。[Problems to be Solved by the Invention] The above-mentioned wear-resistant film formed by ion plating has a large internal stress (compressive stress), and this internal stress increases as the n9 thickness increases. gradually becomes larger. Therefore, when trying to apply a thicker wear-resistant film to improve wear resistance, internal stress increases and
The adhesion of the film decreases due to the addition.

かくして、耐摩耗性膜が付与される母材たとえば工具は
温度及び圧力の過酷な条件下で使用されるため、膜の内
部応力が大きい場合には使用中に膜が剥離するという問
題があった。Thus, since the base material to which the wear-resistant film is applied, such as a tool, is used under severe conditions of temperature and pressure, there is a problem that the film may peel off during use if the internal stress of the film is large. .

［問題点を解決するための手段］ 本発明によれば、と記の如き問題点を解決するため、母
材表面−Ｆにイオンプレーティングにより形成された第
１層目の膜が設けられており、該第１層目の膜の上に蒸
着により形成された第２層目の膜が設けられており、該
第２層目の膜の上に反応ガスプラズマ放電中でイオンプ
レーティングにより形成された耐摩耗性の高い第３層目
の膜が設けられていることを特徴とする、耐摩耗性多層
膜が提供される。[Means for Solving the Problems] According to the present invention, in order to solve the following problems, a first layer film formed by ion plating is provided on the base material surface -F. A second layer film is provided on the first layer film by vapor deposition, and a second layer film is formed on the second layer film by ion plating in a reactive gas plasma discharge. Provided is a wear-resistant multilayer film characterized in that a third layer film having high wear resistance is provided.

［作用］ 本発明の耐摩耗性多層膜において、第１層目の膜は母材
と第２層目の膜との密着性を向上させる。第２層目の膜
は引プリ応力を有し、−実弟３層目の高耐摩耗性膜は圧
縮応力を示し、これにより第２層目の膜と第３層目の膜
とで応力が打消され、第３層目の高耐摩耗性膜の膜厚を
大きくしても多層膜全体の内部応力は大きくならない。[Function] In the wear-resistant multilayer film of the present invention, the first layer film improves the adhesion between the base material and the second layer film. The second layer of film has tensile stress, and the third layer of highly wear-resistant film shows compressive stress, which causes stress between the second and third layers. Even if the thickness of the third layer of highly wear-resistant film is increased, the internal stress of the entire multilayer film does not increase.

［実施例］ 以下、実施例により本発明を更に詳細に説明する。[Example] Hereinafter, the present invention will be explained in more detail with reference to Examples.

第１図は本発明による耐摩耗性多層膜の概略断面図であ
る０図において、４は母材であり、ｌは第１層目の膜で
あり、２は第２層目の膜であり、３は第３層目の膜であ
る。FIG. 1 is a schematic cross-sectional view of the wear-resistant multilayer film according to the present invention. In FIG. 0, 4 is the base material, l is the first layer film, and 2 is the second layer film. , 3 is the third layer film.

母材４としては、切削工具、成形用金型、あるいは装飾
品等が用いられ、その材質としては高速度鋼、超鋼合金
、５ＫＩｊ材あるいはステンレス鋼などが例示される。As the base material 4, a cutting tool, a molding die, a decorative item, or the like is used, and examples of the material thereof include high speed steel, super steel alloy, 5KIj material, and stainless steel.

第１層目の膜１の材質としては、Ｔｉ、Ｃｏ、Ｃｒまた
はＦｅ等のイオン化しやすい金属あ゛るいはこれらの合
金が用いられる。第１層目のｊｉｌｔは母材４に負の高
電圧を印加した状態にて上記材質をイオンプレーティン
グすることにより付与することができる。第１層目の膜
１の膜厚はｔｏ’ｏ。As the material of the first layer film 1, easily ionized metals such as Ti, Co, Cr, or Fe, or alloys thereof are used. The first layer of jilt can be provided by ion plating the above material while applying a negative high voltage to the base material 4. The film thickness of the first layer film 1 is to'o.

Å以下であるのが好ましく、これにより第１層目のｌｌ
！Ｊｌの全応力を小さく維持することができる。It is preferable that it is less than Å, so that the ll of the first layer
! The total stress in Jl can be kept small.

第２層［１の膜２の材質としては第１層口のＩＦ５１と
同じものが用いられる。第２の１１９２は通常の蒸着に
より付与することができる。これにより第２層目の膜２
は引っ張り応力を有する様になる。The material of the membrane 2 of the second layer [1 is the same as that of the IF 51 of the first layer. The second 1192 can be applied by conventional vapor deposition. As a result, the second layer of film 2
comes to have tensile stress.

第３層目の高耐摩耗性Ｉｌ！２３の材質としてはＴｉＮ
、Ｔｉｃ、ｄＮ、Ｓｉ３　Ｎ４．ＳｉＣ，Ａｌ２Ｏ３ま
たはダイヤモンドライクカーボンあるいはこれらの混合
体が用いられる。第３層目のｖ３は反応ガスプラズマ放
電中でイオンプレーティングを行なうことにより付与す
ることができる。これにより第３層目の膜３は圧縮応力
を有する様になる。High wear resistance of the third layer! The material of 23 is TiN.
, Tic, dN, Si3 N4. SiC, Al2O3, diamond-like carbon, or a mixture thereof is used. The third layer v3 can be applied by performing ion plating in reactive gas plasma discharge. As a result, the third layer film 3 comes to have compressive stress.

以上の説明においては第１層目の膜１、第２層口゛の膜
゛２及び第３層目の膜３はそれぞれ単層膜である様に説
明したが、これらは異なる材質からなる複′数層の−で
あってもよい。In the above explanation, the first layer film 1, the second layer film 2, and the third layer film 3 are each described as being a single layer film, but these are composite films made of different materials. 'It may be several layers of -.

第１層目の膜ｌ゛の材質としてＴｉが使用され、その膜
厚が約２００人の場合、第１層目の膜ｌの内部応力は２
０ｋｇ／ｍｍ″程度の圧縮応力となると考えられる。When Ti is used as the material of the first layer film l and its thickness is approximately 200, the internal stress of the first layer film l is 2.
It is thought that the compressive stress will be about 0 kg/mm''.

第２層目の膜２の材質としてＴｆが使用され。Tf is used as the material for the second layer film 2.

その膜厚が約１００００人の場合、第２層目の膜２の内
部応力は数１０ｋｇ／ｍｒｎ’程度の引っ張り応力とな
る。If the film thickness is about 10,000, the internal stress of the second layer film 2 will be a tensile stress of about several tens of kg/mrn'.

第３層目の膜３の材質としてＴｉＮが使用され、その膜
厚が約１００００人の場合、第３層目の膜の内部応力は
１４０ｋｇ／ｍｍ″程度の圧縮応力となる。If TiN is used as the material for the third layer film 3 and its thickness is about 10,000 people, the internal stress of the third layer film will be a compressive stress of about 140 kg/mm''.

３層膜の内部応力σは、第１層目のｎ！Ｊ　１の内部応
力をσｌ、第２層目の膜２の内部応力をσ２、第３層［
１の膜３の内部応力をσ３とし、第１層Ｉ＋、第２層１
１及び第３層［１の膜のＤＡ厚をそれぞれｄ、　、ｄ２
及びｄ３として、大路次の式で与えられると考えられる
（Ａｎｔｈｏｎｙ　　Ｅ、　　Ｅｎｎｏｓ、Ａｐｐｌｉ
ｅｄ　　０ｐｔｉｃｓ　　　Ｖ。The internal stress σ of the three-layer film is n! of the first layer. The internal stress of J1 is σl, the internal stress of the second layer film 2 is σ2, and the third layer [
1, the internal stress of the film 3 is σ3, the first layer I+, the second layer 1
1 and 3 [DA thickness of film 1 is d, , d2, respectively]
and d3 are considered to be given by Ohji's following formula (Anthony E, Ennos, Appli
ed 0ptics V.

１．５．Ｎｏ、１　（１９６６）ｐ、５１〜６１参照）
。1.5. No. 1 (1966) p. 51-61)
.

尚、１−記式中、σ１、σ２、σ３及びσは引っ張り応
力のときを正とし、圧縮応力のときを負とする。In the formula 1, σ1, σ2, σ3, and σ are positive when tensile stress is applied, and negative when compressive stress is applied.

従ッテ、Ｌ記のσ１が約２０ｋｇ／ｍｒｎ’、σ２が約
４０ｋｇ／ｍｔｎ’及びσ３が約１４０ｋｇ／ｍｍ″テ
、ｄｌが約２００人、ｄ２が約１００００人及びｄ３が
約ｔｏｏｏｏ人の場合には、σが約５０　ｋ　ｇ　／　
ｍ　ｔｎ’となる。これは膜厚１ｏｏｏｏ人のＴｉＮの
耐摩耗性単層膜の内部応力１４０ｋｇ／ｍｍ’よりも著
るしく小さい。According to L, σ1 is about 20 kg/mrn', σ2 is about 40 kg/mtn', and σ3 is about 140 kg/mm''te, dl is about 200 people, d2 is about 10,000 people, and d3 is about toooo people. In this case, σ is about 50 kg/
m tn'. This is significantly smaller than the internal stress of 140 kg/mm' in a TiN wear-resistant single layer film with a film thickness of 100 mm.

この様な傾向は、第１層［ｌの膜ｌ及び第２層目のｌｌ
Ｉ２２としてＴｉ以外の材質を使用し、第３層１１の膜
３の材質としてＴｉＮ以外の材質を使用した場合にも同
様に表われる。Such a tendency is observed in the film l of the first layer [l and the ll of the second layer].
The same phenomenon occurs when a material other than Ti is used as I22 and a material other than TiN is used as the material for the film 3 of the third layer 11.

尚、：ＪＳｚ層目の［２の膜厚とｆｔ５３層目の膜３の
膜厚が同じ場合には第３層目のｖ３の内部応力が第２層
目の膜２の内部応力よりも大きいので、第２Ｆｖ目の膜
の膜厚をｄ２とし、第３層［１の膜の１１！２厚をｄ３
とした場合、ｄ２／ｄ３≧１であるのが好ましい。In addition, if the film thickness of [2 of the JSz layer and the film thickness of the film 3 of the ft53rd layer are the same, the internal stress of v3 of the third layer is larger than the internal stress of the film 2 of the second layer. Therefore, the thickness of the second Fv film is d2, and the thickness of the third layer [11!2 of the first film is d3]
In this case, it is preferable that d2/d3≧1.

［発明の効果］ 以上の様な本発明によれば、比較的厚く従って耐摩耗性
が高く且つ母材との密着性が良好で剥離しにくい耐摩耗
性多層膜が提供される。[Effects of the Invention] According to the present invention as described above, a wear-resistant multilayer film is provided which is relatively thick and therefore has high wear resistance, has good adhesion to the base material, and is difficult to peel off.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明による耐摩耗性多層膜の概略断面図であ
る。 ｌ：第１層目の膜　　２：第２層目の膜３：第３層目の
膜　　４：母材FIG. 1 is a schematic cross-sectional view of a wear-resistant multilayer film according to the present invention. l: First layer film 2: Second layer film 3: Third layer film 4: Base material

Claims (5)

【特許請求の範囲】[Claims] （１）母材表面上にイオンプレーティングにより形成さ
れた第１層目の膜が設けられており、該第１層目の膜の
上に蒸着により形成された第２層目の膜が設けられてお
り、該第２層目の膜の上に反応ガスプラズマ放電中でイ
オンプレーティングにより形成された耐摩耗性の高い第
３層目の膜が設けられていることを特徴とする、耐摩耗
性多層膜。(1) A first layer film formed by ion plating is provided on the surface of the base material, and a second layer film formed by vapor deposition is provided on the first layer film. A highly wear-resistant third layer film formed by ion plating in a reactive gas plasma discharge is provided on the second layer film. Abradable multilayer film. （２）第１層目の膜の膜厚が１０００Å以下である、第
１項の耐摩耗性多層膜。(2) The wear-resistant multilayer film according to item 1, wherein the first layer has a thickness of 1000 Å or less. （３）第２層目の膜の膜厚が第３層目の膜の膜厚に等し
いかまたは第３層目の膜の膜厚よりも大きい、第１項の
耐摩耗性多層膜。(3) The wear-resistant multilayer film according to item 1, wherein the thickness of the second layer film is equal to or greater than the thickness of the third layer film. （４）第１層目の膜及び第２層目の膜の材質がＴｉ、Ｃ
ｏ、ＣｒまたはＦｅ等の金属あるいはこれらの合金であ
る、第１項の耐摩耗性多層膜。(4) The materials of the first layer film and second layer film are Ti and C.
The wear-resistant multilayer film according to item 1, which is a metal such as O, Cr, or Fe, or an alloy thereof. （５）第３層目の膜の材質がＴｉＮ、ＴｉＣ、ＢＮ、Ｓ
ｉ＿３Ｎ＿４、ＳｉＣ、Ａｌ＿２Ｏ＿３またはダイヤモ
ンドライクカーボンあるいはこれらの混合体である、第
１項の耐摩耗性多層膜。(5) The material of the third layer film is TiN, TiC, BN, S
The wear-resistant multilayer film according to item 1, which is i_3N_4, SiC, Al_2O_3, diamond-like carbon, or a mixture thereof.
JP21145184A 1984-10-11 1984-10-11 Wear resistant multi-layered film Granted JPS6191354A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21145184A JPS6191354A (en) 1984-10-11 1984-10-11 Wear resistant multi-layered film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21145184A JPS6191354A (en) 1984-10-11 1984-10-11 Wear resistant multi-layered film

Publications (2)

Publication Number Publication Date
JPS6191354A true JPS6191354A (en) 1986-05-09
JPH0576537B2 JPH0576537B2 (en) 1993-10-22

Family

ID=16606162

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21145184A Granted JPS6191354A (en) 1984-10-11 1984-10-11 Wear resistant multi-layered film

Country Status (1)

Country Link
JP (1) JPS6191354A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62222054A (en) * 1986-03-20 1987-09-30 Fujitsu Ltd Formation of thin metallic film on sintered silicon carbide body
JPS62283258A (en) * 1986-05-31 1987-12-09 Riken Corp Piston ring
JPH01172558A (en) * 1987-12-26 1989-07-07 Raimuzu:Kk Al member coated with wear-resistant layer
JPH01294855A (en) * 1988-05-23 1989-11-28 Seikosha Co Ltd Surface hardening method
WO1992006234A1 (en) * 1990-09-28 1992-04-16 Citizen Watch Co., Ltd. Reed for high speed loom
US5277939A (en) * 1987-02-10 1994-01-11 Semiconductor Energy Laboratory Co., Ltd. ECR CVD method for forming BN films
US5511587A (en) * 1990-09-28 1996-04-30 Citizen Watch Co., Ltd. Wear-resistant reed for a high-speed loom
WO2000053397A1 (en) * 1999-03-09 2000-09-14 Zuiko Corporation Method and device for heat seal
KR100321613B1 (en) * 1999-09-15 2002-01-31 권문구 Multilayer ion-coating method being fluorine compound on metal surface
DE102008054982A1 (en) 2008-12-19 2010-07-01 Carl Zeiss Smt Ag Wafer chuck for EUV lithography

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54139891A (en) * 1978-04-24 1979-10-30 Nagaoka Kk Specific work metal material and its manufacturing method
JPS5913067A (en) * 1982-07-13 1984-01-23 Matsushita Electric Ind Co Ltd Formation of thin film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54139891A (en) * 1978-04-24 1979-10-30 Nagaoka Kk Specific work metal material and its manufacturing method
JPS5913067A (en) * 1982-07-13 1984-01-23 Matsushita Electric Ind Co Ltd Formation of thin film

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62222054A (en) * 1986-03-20 1987-09-30 Fujitsu Ltd Formation of thin metallic film on sintered silicon carbide body
JPS62283258A (en) * 1986-05-31 1987-12-09 Riken Corp Piston ring
US5277939A (en) * 1987-02-10 1994-01-11 Semiconductor Energy Laboratory Co., Ltd. ECR CVD method for forming BN films
JPH0553864B2 (en) * 1987-12-26 1993-08-11 Surface High Performance Res
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