JPS6174234A - Dielectric plate having grids - Google Patents
Dielectric plate having gridsInfo
- Publication number
- JPS6174234A JPS6174234A JP59195531A JP19553184A JPS6174234A JP S6174234 A JPS6174234 A JP S6174234A JP 59195531 A JP59195531 A JP 59195531A JP 19553184 A JP19553184 A JP 19553184A JP S6174234 A JPS6174234 A JP S6174234A
- Authority
- JP
- Japan
- Prior art keywords
- grid
- dielectric plate
- grids
- loaded
- dielectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/46—Control electrodes, e.g. grid; Auxiliary electrodes
Landscapes
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は、マイクロ波およびミリ波で用いるグリッド
装荷誘電体板の改善に関するものである。DETAILED DESCRIPTION OF THE INVENTION TECHNICAL FIELD OF THE INVENTION This invention relates to improvements in grid-loaded dielectric plates for use in microwave and millimeter waves.
第１図は、グリッド装荷誘電体板の斜視図であり１図中
、（ｌ）は誘電体板、（２）は金属薄膜からなるグリッ
ドである。FIG. 1 is a perspective view of a grid-loaded dielectric plate, in which (l) is a dielectric plate and (2) is a grid made of a metal thin film.
８ このグリッド装荷誘電体板は、グリッド（２）のピ
ッチｐ１と幅ｄ１とを波長に対し適当な数値に選定する
ことで、グリッド（２）に平行な向きに偏波した偏波Ａ
の波長を１−１とんと反射し、グリッド（２）に垂直な
向きに偏波゛した偏波Ｂの波をほとんど透過する性質を
有する。8 This grid-loaded dielectric plate can generate polarized light A that is polarized in a direction parallel to the grid (2) by selecting the pitch p1 and width d1 of the grid (2) to be appropriate values for the wavelength.
It has the property of reflecting wavelengths of 1-1 and transmitting almost all waves of polarized wave B, which are polarized in the direction perpendicular to the grid (2).
従来からこの性質をフィルタや反射鏡面などに利用しで
いた。This property has traditionally been used in filters, reflective mirrors, etc.
なお、グリッド（２）はたとえば、フォトエツチング法
等により製作されることが多い。グリッド（２）を加工
するフォトエツチング法とは、たとえは。Note that the grid (2) is often manufactured by, for example, a photo-etching method. What is the photo-etching method for processing grid (2)?
銅を蒸着した誘電体板（１）に、グリッド（２）に対応
する耐食性皮膜を写真技法を用いて形成させ、被加工材
の露出部を化学的に溶解させる技法である。This is a technique in which a corrosion-resistant film corresponding to the grid (2) is formed using a photographic technique on a dielectric plate (1) on which copper is vapor-deposited, and the exposed parts of the workpiece are chemically dissolved.
このフォトエツチング法は、誘電体板ｆｉ＋が平板の場
合写真原版も平板でよく、容易に原版の加工が可能であ
る。しかし、誘電体板（］）が曲面の場合となると写真
原版も曲面になり、高精度を保つため１種々の工夫が成
されている。In this photoetching method, when the dielectric plate fi+ is a flat plate, the photographic original plate may also be a flat plate, and the original plate can be easily processed. However, when the dielectric plate ( ) has a curved surface, the photographic original plate also has a curved surface, and various measures have been taken to maintain high accuracy.
第２図はその一例を示すシャドウマスクの斜視図であり
、 ｆ３１ｉ’ｔシャドウマスク、（４）はスリットで
ある。スリット（４）はピッチ９２９幅ｄ２で前記グリ
ッド（２）のピッチＰ１．幅ｄ１とほぼ同等である。ス
リン）＋４＋Ｕ長さ１であり、またグリッド（２）の長
さ方向（図中のｙ軸方向）と同じ方向にＷの間隔をおい
て配置される。FIG. 2 is a perspective view of a shadow mask showing an example of the shadow mask, and (4) is a slit. The slit (4) has a pitch of 929 and a width d2, and the pitch of the grid (2) is P1. It is approximately equal to the width d1. +4+U length 1, and are arranged at intervals of W in the same direction as the length direction of the grid (2) (y-axis direction in the figure).
このシャドウマスク（３）はたとえば厚み０．１５１ｍ
のスチール板から成り、これに第２図に示す多数のスリ
ットをあけたものでスリット加工後、所要の曲面にプレ
ス成形される。This shadow mask (3) has a thickness of 0.151 m, for example.
It is made of a steel plate with a number of slits shown in Fig. 2, and after the slits are processed, it is press-formed into the desired curved surface.
プレス成形されたシャドウマスク（３）を用いる場合、
誘電体板（１）と密着させて露光、現象するとスリット
（４）相当に切断されたグリッド（２）となってしまう
。そこで、このシャドウマスク（３）は誘電体板（１）
と所定間隔だけ隔てて露光する。さらに露光する場合、
ｙ軸方向に長い光源を用（・、光源をｙ軸方向に沿って
往復運動をさせる。こうすることにより、スリット（４
）から斜めに光が入射し、光源の移動範囲を制御すれば
等価的にｗ−０のシャドウマスクを用（・たとさと四等
のものが得られる。When using a press-molded shadow mask (3),
If the dielectric plate (1) is exposed and exposed in close contact with the dielectric plate (1), the grid (2) will be cut to correspond to the slits (4). Therefore, this shadow mask (3) is connected to the dielectric plate (1).
and are exposed at a predetermined interval. For further exposure,
Use a long light source in the y-axis direction (・, make the light source reciprocate along the y-axis direction. By doing this, the slit (4
), and by controlling the moving range of the light source, an equivalent shadow mask of w-0 can be obtained.
しかし、従来のフォトエツチング法では、使用周波数を
高くしたり、！気持性の改善を図ろうとするとｐ２と共
に（ｐ２−ｄ２ ）寸法が小さくなり、そのためシャド
ウマスク（３）をプレス成形したとき。However, in the conventional photoetching method, the frequency used is high, or! When trying to improve the feel, the dimension (p2-d2) becomes smaller along with p2, so when the shadow mask (3) is press-molded.
所定強度を保つことができず、成形ができな−・と（・
う欠点があった。Unable to maintain the specified strength and unable to form.
There were some drawbacks.
この発明は、かかる欠点を改善する目的で成されたもの
で、薄し・誘電体板の両面に２倍のピッチで、かつ両面
のパターンが１ならぬようにエツチングし、この誘電体
薄板に全体で所定の厚みとなるだめの誘電体板を接層し
たグリッド装荷誘電体＆を提案するものでろる。This invention was made with the aim of improving this drawback, and involves etching patterns on both sides of a thin dielectric plate at twice the pitch and so that the patterns on both sides are not uniform. It proposes a grid-loaded dielectric layer in which additional dielectric plates having a predetermined overall thickness are layered.
第３図は、この発明の一実施例を示す斜視図である。同
一面上に配置されたグリッド（２）の幅ｄ１は変わらな
いがピッチ間隔ｐ３は従来のピッチ間隔ｐ１の２倍にな
っている。このだめ、シャドウマスク（３）の（ｐ２−
ｅＬ２ ）寸法が太き（とれ、したがってシャドウマス
ク（３）を問題なくプレス成形できる。ここで両面に配
置されたグリッドはこれを投影したとき互いに重ならな
いようにしている。FIG. 3 is a perspective view showing an embodiment of the present invention. The width d1 of the grid (2) arranged on the same plane remains unchanged, but the pitch interval p3 is twice the conventional pitch interval p1. This is useless, shadow mask (3) (p2-
eL2) is thick, so the shadow mask (3) can be press-molded without any problem.The grids arranged on both sides are made so that they do not overlap each other when projected.
シャドウマスク（３）の加工が可能であることから。Because shadow mask (3) processing is possible.
この発明によるフォトエツチング法では、誘電体板（１
）への両面エツチングする際の位置合わせが残された問
題である。これについては、被エツチング材料に基準穴
を設けたり、光学的原理による測定器を用（・れば０．
０１ ｍｒｎ程度の精度は容易に得られ。In the photoetching method according to this invention, a dielectric plate (1
) The remaining problem is alignment when etching both sides of the image. For this purpose, a reference hole is provided in the material to be etched, or a measuring device based on optical principles is used (if 0.
Accuracy on the order of 0.01 mrn can be easily obtained.
したがってこの発明によるフォトエツチングはこの精度
の範囲で問題なくおこなえる。Therefore, photoetching according to the present invention can be performed without problems within this precision range.
一方、この発明のグリッド装荷誘電体板の電気特性は、
グリッド（２）を装荷する誘電体板（１）の厚みを波長
に比較して十分小さくとれは、グリッド（２）が同一平
面上にらるものと考えられ、したがって従来のものと同
じく良好な特性が得られる。On the other hand, the electrical properties of the grid-loaded dielectric plate of this invention are as follows:
If the thickness of the dielectric plate (1) on which the grid (2) is loaded is sufficiently small compared to the wavelength, it is considered that the grid (2) will be placed on the same plane, and therefore it will be as good as the conventional one. characteristics are obtained.
なお、上記実施例では両面にグリッドを装荷した誘電体
板を用いているが１片面にグリッドを装荷した誘電体板
を２枚用いてもよく１両者を併用してもよい。さらにグ
リッドのない誘電体板を併用してもよい。また、ピッチ
は２倍としたが、この発明はこれに限らず、グリッドを
装荷する誘電体薄板の数を増加してピッチを２倍以上と
することもできる。グリッドは直線以外の形状でもよい
。In the above embodiment, a dielectric plate loaded with a grid on both sides is used, but two dielectric plates each loaded with a grid on one side may be used, or both may be used in combination. Furthermore, a dielectric plate without a grid may be used in combination. Further, although the pitch is doubled, the present invention is not limited to this, and the pitch can be doubled or more by increasing the number of dielectric thin plates loaded with grids. The grid may have a shape other than straight lines.
この発明は以上説明したとおり、誘電体薄板の両面にお
互いが重ならないようにグリッドを設け。As explained above, in this invention, grids are provided on both sides of a dielectric thin plate so that they do not overlap.
全体の厚みを所要の値とする他の誘電体板を接着するこ
とで小さなピッチのグリッドを加工でき。Grids with small pitches can be fabricated by gluing other dielectric plates with the required overall thickness.
特にミリ波帯なと波長の短い周波数で使用する場合や電
気特性の改善を図るためピッチを小さくする場合などに
特別に効果がある。It is especially effective when used at frequencies with short wavelengths such as the millimeter wave band, or when reducing the pitch to improve electrical characteristics.
第１図は誘電体板に金属薄膜から成るグリッドを密着さ
せた従来のグリッド装荷誘電体板の斜視図７第２図はフ
ォトエツチング法に用いるシャドウマスクの斜視図、第
３図はこの発明によるグリッド装荷誘電体板の斜視図で
ある。
図にお（・て（］）は誘電体板、（２）はグリッド、（
３）はシャドウマスク、（４）はスリットである。
なお１図中同一符号は同一または相当部分を示すＯFig. 1 is a perspective view of a conventional grid-loaded dielectric plate in which a grid made of a metal thin film is adhered to a dielectric plate. Fig. 2 is a perspective view of a shadow mask used in the photoetching method, and Fig. 3 is a perspective view of a shadow mask according to the present invention. FIG. 2 is a perspective view of a grid-loaded dielectric plate. In the figure, (・te()) is a dielectric plate, (2) is a grid, (
3) is a shadow mask, and (4) is a slit. In addition, the same reference numerals in each figure indicate the same or corresponding parts.
Claims (3)
着させたグリッド装荷誘電体板において、誘電体板の両
面にグリッドを設け、かつこれを投影したとき両面のグ
リッドが互いに重ならないように各面のグリッドを配置
したことを特徴とするグリッド装荷誘電体板。(1) In a grid-loaded dielectric plate in which a grid made of a metal thin film is closely attached to the surface of a dielectric plate, grids are provided on both sides of the dielectric plate, and when projected, the grids on both sides do not overlap with each other. A grid-loaded dielectric board characterized by having grids arranged on each side.
着させたグリッド装荷誘電体板において、誘電体板の片
面のみにグリッドを密着させたグリッド装荷誘電体板と
誘電体板の両面にグリッドを密着させたグリッド装荷誘
電体板をグリッドが平行となるように組み合せ、かつ全
てのグリッド装荷誘電体板を投影したとき各面のグリッ
ドが互いに重ならないように各面のグリッドを配置した
ことを特徴とするグリッド装荷誘電体板。(2) In a grid-loaded dielectric plate with a grid made of a metal thin film in close contact with the surface of the dielectric plate, a grid-loaded dielectric plate with a grid in close contact with only one side of the dielectric plate and a grid on both sides of the dielectric plate. The grid-loaded dielectric plates that are brought into close contact with each other are combined so that the grids are parallel, and the grids on each side are arranged so that when all the grid-loaded dielectric plates are projected, the grids on each side do not overlap with each other. Grid-loaded dielectric plate with features.
着させたグリッド装荷誘電体板において、グリッドを装
荷しない誘電体板と誘電体板の片面のみにグリッドを密
着させたグリッド装荷誘電体板と誘電体板の両面にグリ
ッドを密着させたグリッド装荷誘電体板をグリッドが平
行となるように組み合せ、かつ全てのグリッド装荷誘電
体板を投影したとき各面のグリッドが互いに重ならない
ように各面のグリッドを配置したことを特徴とするグリ
ッド装荷誘電体板。(3) A grid-loaded dielectric plate in which a grid made of a metal thin film is closely attached to the surface of a dielectric plate, a dielectric plate without a grid, and a grid-loaded dielectric plate in which a grid is attached only to one side of the dielectric plate. A grid-loaded dielectric plate with grids closely attached to both sides of the dielectric plate is combined so that the grids are parallel, and when all grid-loaded dielectric plates are projected, the grids on each side do not overlap each other. A grid-loaded dielectric plate characterized by having a surface grid arranged thereon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59195531A JPS6174234A (en) | 1984-09-18 | 1984-09-18 | Dielectric plate having grids |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59195531A JPS6174234A (en) | 1984-09-18 | 1984-09-18 | Dielectric plate having grids |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6174234A true JPS6174234A (en) | 1986-04-16 |
Family
ID=16342636
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59195531A Pending JPS6174234A (en) | 1984-09-18 | 1984-09-18 | Dielectric plate having grids |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6174234A (en) |
-
1984
- 1984-09-18 JP JP59195531A patent/JPS6174234A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20090136777A1 (en) | Wire-grid metal sheet, wire grid, and method for making the wire-grid metal sheet | |
| US4707059A (en) | Integrated optical circuit element and method of making the same | |
| JPS59230302A (en) | Method of regulating electric properties of distributed constant print type filter and filter unit used therefor | |
| JP2000304933A (en) | Polarizing filter and its manufacture | |
| WO2014005521A1 (en) | Antenna reflector phase correction film and reflector antenna | |
| JPH05346514A (en) | Optical device | |
| JP2011109312A (en) | High frequency attenuator and high frequency device using the same | |
| KR20030007949A (en) | Two-layer wide-band meander-line polarizer | |
| JPS6174234A (en) | Dielectric plate having grids | |
| JPS5958907A (en) | Electrode constituting method of surface acoustic wave filter | |
| GB1594980A (en) | Tuning fork-type quartz crystal vibrator and method of forming the same | |
| US4682130A (en) | Filter functioning with acoustic waves | |
| US4403202A (en) | Surface acoustic wave device and method for producing the same | |
| JPH07142755A (en) | Method for forming inverse pyramid type texture | |
| JPS63194406A (en) | Surface acoustic wave resonator | |
| US4151492A (en) | Surface acoustic wave grating | |
| JPS6162205A (en) | Processing method of grid loading dielectric board | |
| JP2001285002A (en) | Frequency-adjustsing method for electronic component | |
| CN106681099B (en) | Mask plate and array substrate | |
| JPS5986917A (en) | Surface wave device | |
| JPH09246693A (en) | Circuit board and manufacture thereof | |
| JP2000201041A (en) | Manufacture of surface acoustic wave element | |
| JP2001156535A (en) | Plane antenna and is manufacturing method | |
| JPH09219608A (en) | Nrd guide circuit element and positioning and fixing method therefor | |
| JPS61148819A (en) | Structure for mask alignment pattern |