JPS6168396U - - Google Patents
Info
- Publication number
- JPS6168396U JPS6168396U JP15265384U JP15265384U JPS6168396U JP S6168396 U JPS6168396 U JP S6168396U JP 15265384 U JP15265384 U JP 15265384U JP 15265384 U JP15265384 U JP 15265384U JP S6168396 U JPS6168396 U JP S6168396U
- Authority
- JP
- Japan
- Prior art keywords
- arm
- liquid ejection
- ejection mechanisms
- holder
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 6
- 230000007246 mechanism Effects 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims 1
- 238000011084 recovery Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
第１図ａは本考案の一実施例を示す斜視図、第
１図ｂはホルダ回転機構を示す斜視図、第２図は
従来の洗浄装置の一例を示す斜視図、である。図
において、
２，３は液体噴出筒、４はノズル、６は回転軸
、７はホルダ、８はウエーハ、１１は基板、１２
は回収孔、１３は腕部、１４はカバー、１５は羽
根車、１６は孔、をそれぞれ示す。
FIG. 1a is a perspective view showing an embodiment of the present invention, FIG. 1b is a perspective view showing a holder rotation mechanism, and FIG. 2 is a perspective view showing an example of a conventional cleaning device. In the figure, 2 and 3 are liquid ejection tubes, 4 is a nozzle, 6 is a rotating shaft, 7 is a holder, 8 is a wafer, 11 is a substrate, and 12
13 indicates a recovery hole, 13 indicates an arm, 14 indicates a cover, 15 indicates an impeller, and 16 indicates a hole, respectively.
Claims (1)
の液体噴出機構と、該液体噴出機構を保持し該液
体噴出機構が噴出した液体を、それぞれ別個に回
収する機構を有する基板と、一端を該基板に回動
自在に保持された腕部と、該腕部と共に回動する
カバーからなり、且つ該腕部の他端に複数枚のウ
エーハを収納するホルダを保持すると共に、該ホ
ルダを回転させる機構を具えてなることを特徴と
する洗浄装置。 a plurality of liquid ejection mechanisms that eject different types of liquids; a substrate that holds the liquid ejection mechanisms and separately collects the liquid ejected by the liquid ejection mechanisms; and one end attached to the substrate. It consists of an arm that is rotatably held and a cover that rotates together with the arm, and the other end of the arm holds a holder that stores a plurality of wafers and has a mechanism that rotates the holder. A cleaning device characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15265384U JPS6168396U (en) | 1984-10-09 | 1984-10-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15265384U JPS6168396U (en) | 1984-10-09 | 1984-10-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6168396U true JPS6168396U (en) | 1986-05-10 |
Family
ID=30710706
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15265384U Pending JPS6168396U (en) | 1984-10-09 | 1984-10-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6168396U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05347289A (en) * | 1991-12-11 | 1993-12-27 | Enya Syst:Kk | Wafer cleaning method and device |
| JP4484342B2 (en) * | 2000-09-04 | 2010-06-16 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
-
1984
- 1984-10-09 JP JP15265384U patent/JPS6168396U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05347289A (en) * | 1991-12-11 | 1993-12-27 | Enya Syst:Kk | Wafer cleaning method and device |
| JP4484342B2 (en) * | 2000-09-04 | 2010-06-16 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
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