JPS6167917A - X-ray lead-out cylinder - Google Patents
X-ray lead-out cylinderInfo
- Publication number
- JPS6167917A JPS6167917A JP59188867A JP18886784A JPS6167917A JP S6167917 A JPS6167917 A JP S6167917A JP 59188867 A JP59188867 A JP 59188867A JP 18886784 A JP18886784 A JP 18886784A JP S6167917 A JPS6167917 A JP S6167917A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- mask
- gas
- holder
- extraction tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、Ｘ線を利用して、半導体ＬＳＩ等の微細パタ
ーンを転写するＸ線露光装置等において。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to an X-ray exposure apparatus, etc. that uses X-rays to transfer a fine pattern of a semiconductor LSI or the like.
真空室で発生するｘｍを大気中に取り出すＸ線取り出し
筒に関する。This invention relates to an X-ray extraction tube that extracts xm generated in a vacuum chamber into the atmosphere.
Ｘ線露光装置は、一般に、Ｘ線を発生させるためのＸ線
源と、マスクとウェハを相対的に位置合せするためのア
ライナから構成される。Ｘ線は真空室内で発生させるが
、アライナは、真空中でマスクやウェハを装着、移送し
たり、マスクとウェハを位置合せする機構・検出系を真
空内に実装したりするためにはガスの発生防止や気密な
ど特別の工夫が必要になるので、大気中に置かれる。An X-ray exposure apparatus generally includes an X-ray source for generating X-rays and an aligner for relatively aligning a mask and a wafer. X-rays are generated in a vacuum chamber, but aligners require gas to attach and transport masks and wafers in a vacuum, and to implement mechanisms and detection systems for aligning masks and wafers in a vacuum. Since special measures are required to prevent generation and airtightness, they are placed in the atmosphere.
このため、Ｘ線を真空室内から大気中へ導く。For this reason, the X-rays are guided from the vacuum chamber into the atmosphere.
Ｘ線取り出し筒が必要であり、第１図（Ａ）、（Ｂ）に
示すような筒が、従来から使用されてきた。第１図（Ａ
）は従来のＸ線取り出し筒を示す断面図、第１図（Ｂ）
は第１図（Ａ）の要部拡大図である。Ｘ線を発生する手
段を備えた真空室１から発するＸ線束２は、真空室１と
の隔壁となり、Ｘ線取り出しｍ３に接着されたベリリウ
ム等からなるＸ線透過率が大きい膜厚約１０−の第１の
Ｘ線透過窓４を透過し、さらに、Ｘ線取り出し筒３内に
充填された例えばＨｅガス等のＸ線吸収率の小さいガス
５を封止するために、Ｘ線取り出し筒３の他端に設けら
れた例えばマイラーからなる膜厚約１／／Ｉｌ＋の第２
のＸ線透過窓６を透過して、マスクホルダ７に真空吸着
されるマスク８上に形成されたタンタル、金等のＸ線吸
収体からなるパターン９に照射され、該パターン９が、
ウェハホルダ１０上に真空吸着されたウェハ１１面に塗
布されたレジスト上にパターン転写される。なお、１６
はマスク８に設けた位置合わせマークである。An X-ray extraction tube is required, and tubes such as those shown in FIGS. 1(A) and 1(B) have conventionally been used. Figure 1 (A
) is a sectional view showing a conventional X-ray extraction tube, Figure 1 (B)
is an enlarged view of the main part of FIG. 1(A). The X-ray flux 2 emitted from the vacuum chamber 1 equipped with means for generating X-rays is separated from the vacuum chamber 1 by a film made of beryllium or the like with a high X-ray transmittance and having a thickness of about 10- The X-ray extraction tube 3 is configured to pass through the first X-ray transmission window 4 of the X-ray extraction tube 3 in order to further seal off a gas 5 with a low X-ray absorption rate, such as He gas, which is filled in the X-ray extraction tube 3. A second film made of, for example, Mylar and having a thickness of about 1//Il+ is provided at the other end.
The pattern 9 made of an X-ray absorber such as tantalum or gold formed on the mask 8 which is vacuum-adsorbed to the mask holder 7 is irradiated through the X-ray transmission window 6, and the pattern 9 is
A pattern is transferred onto the resist coated on the surface of the wafer 11 vacuum-adsorbed onto the wafer holder 10 . In addition, 16
are alignment marks provided on the mask 8.
上記ｘｉ取り出し筒３には、Ｘ線吸収率の小さいガス５
を導入する手段１２と、該ガス５を大気圧の一定圧力に
保ち、且つＸ線源からＸ線と同時に発生する赤外線等を
吸収することによって第１のＸ線透過窓４に生じる温度
上昇を防ぐために、該ガス５を少量づつ大気中へ排出す
るガス通気口１３とが取り付けられている。また、腋部
３の外周部に近接して、マスク８とウェハ１１との相対
的位置ずれ量とギャップ量を検出するために、アライメ
ント顕微鏡１４が設けられ、さらに、マスク８とウェハ
１１を位置合せするために、マスクホルダ７を微小上下
、あおり及び回転変位させるマスクステージ１５が備え
られている。The xi extraction cylinder 3 contains a gas 5 with a low X-ray absorption rate.
means 12 for introducing a To prevent this, a gas vent 13 is installed to discharge the gas 5 into the atmosphere little by little. Further, an alignment microscope 14 is provided close to the outer periphery of the armpit portion 3 in order to detect the relative positional deviation amount and gap amount between the mask 8 and the wafer 11. In order to align the masks, a mask stage 15 is provided that allows the mask holder 7 to be slightly moved up and down, tilted, and rotated.
従来のＸ線取り出し筒は、上記のような構造となってい
るため、第２のＸ線透過窓６とマスク８の裏面間には空
気層２５が生じてしまう、なお、真空室１には、電子線
励起形Ｘ線源に用いられる水冷回転ターゲットによって
、振動が発生し、この振動からアライナを分離するため
、また１トン以上の大重量のＸ線源とアライナをドツキ
ングする際のセツティング誤差を考慮すると、この空気
層２５の厚さは、１．５ｍ程度までにしか短かくできな
い。このため、例えば１２人の波長のＸ線を用いた場合
、該空気層２５によってＸ線減衰率４９％と、きわめて
大きなＸ線減衰を生じる問題があった。また、アライメ
ント顕微鏡１４は、上記真空室１の振動が伝わらないよ
うにＸ線取り出し筒３から離して設置しなければならな
いため、ｘｉ露光領域２６に近接できず、マスク上の位
置合せマーク１６は露光領域か４”ａ＜離れた位置に形
成せざるを得なかった。このため位置合せマーク１６の
箇所でマスク８とウェハ１１が完全に位置合せされてい
ても、マスク８のたねみやウェハ１１の凹凸により、露
光領域のパターン９とウェハ１１上の転写パターンは位
置ずれやギャップ誤差を生じ、高精度の位置合せができ
ない問題があった。さらに、露光領域を拡大するために
は、Ｘ線取り出し筒３を内法寸法の大きいものに取り換
える必要があり、大重量のＸ線源の持ち上げや移動を行
なわなければならず。Since the conventional X-ray extraction tube has the above-described structure, an air layer 25 is created between the second X-ray transmission window 6 and the back surface of the mask 8. The water-cooled rotating target used in the electron beam excited X-ray source generates vibrations, and in order to isolate the aligner from this vibration, it is also necessary to set up the aligner when docking the aligner with the X-ray source, which weighs more than 1 ton. Considering the error, the thickness of this air layer 25 can only be reduced to about 1.5 m. For this reason, when X-rays having the wavelength of 12 people are used, for example, there is a problem in that the air layer 25 causes extremely large X-ray attenuation with an X-ray attenuation rate of 49%. In addition, since the alignment microscope 14 must be installed away from the X-ray extraction tube 3 so that the vibrations of the vacuum chamber 1 are not transmitted, it cannot approach the xi exposure area 26, and the alignment mark 16 on the mask is Therefore, even if the mask 8 and the wafer 11 are perfectly aligned at the alignment mark 16, the mask 8 may sag or the wafer 11 may sag. Due to the unevenness of the exposure area, the pattern 9 in the exposure area and the transferred pattern on the wafer 11 cause misalignment and gap errors, making it impossible to align them with high precision.Furthermore, in order to enlarge the exposure area, It is necessary to replace the extraction tube 3 with one having a larger internal dimension, and the heavy X-ray source must be lifted and moved.
取り換え作業に長時間を要する開運があった。Fortunately, the replacement work took a long time.
本発明の目的は、これらの欠点を解決するために、Ｘ線
取り出し筒をマスク支持機構に直結させて、従来マスク
裏面上に存在した空気層をなくすことにより、Ｘ線強度
の減衰を低減させ得るＸ線取り出し筒を提供することに
ある。The purpose of the present invention is to solve these drawbacks by directly connecting the X-ray extraction tube to the mask support mechanism and eliminating the air layer that conventionally existed on the back surface of the mask, thereby reducing the attenuation of the X-ray intensity. An object of the present invention is to provide an X-ray extraction tube that obtains the desired results.
この目的を達成するため１本発明は当該Ｘ線取り出し筒
内にＸ線吸収率の小さいガスを導入するガス導入手段と
、マスク近傍に設けられ、Ｘ線透過窓と上記ガスの通気
口とを有するＸ線透過窓ホルダと、該Ｘ線透過窓ホルダ
と上記マスクとの間の空間から外気へ通しる上記ガスの
排気手段とを具備し、Ｘ線を発生させる真空室と上記マ
スク裏面間を上記ガスで満たすようになしたことを特徴
とする。In order to achieve this object, the present invention includes a gas introduction means for introducing a gas having a low X-ray absorption rate into the X-ray extraction cylinder, an X-ray transmission window and a vent port for the gas, which is provided near the mask. an X-ray transmitting window holder having an It is characterized in that it is filled with the above gas.
第２図（Ａ）は本発明の一実施例を示す断面図、第２図
（Ｂ）は第１図（Ａ）の要部拡大図、゛第２図（Ｃ）は
マスクホルダ及び透過窓ホルダの平面図である。１はＸ
線を発生する手段を備えた真空室、２はＸ線束、３はＸ
線取り出し筒、４．６はＸ線透過窓、５はＸ線吸収率の
小さいガス、７はマスクホルダ、８はマスク、９はＸ線
吸収体からなるパターン、１０はウェハホルダ、１１は
ウェハ、１２はガス導入手段、 １３はガス通気口、１
４はアライメント顕微鏡、１５はマスクステージ、 １
６は位置合せマーク、１７．２０．２４は○リング、１
８はその軸方向に対して垂直に２分割されたＸ線取り出
し筒３を接続する可撓性接続手段、１９は可撓性封止手
段、２１は着脱マグネット、２２はガス排気手段、２３
はＸ線透過窓ホルダである。FIG. 2(A) is a sectional view showing one embodiment of the present invention, FIG. 2(B) is an enlarged view of the main part of FIG. 1(A), and FIG. 2(C) is a mask holder and a transmission window. FIG. 3 is a plan view of the holder. 1 is X
a vacuum chamber equipped with means for generating radiation; 2 is an X-ray flux; 3 is an X-ray beam;
A radiation extraction tube, 4.6 is an X-ray transmission window, 5 is a gas with low X-ray absorption rate, 7 is a mask holder, 8 is a mask, 9 is a pattern consisting of an X-ray absorber, 10 is a wafer holder, 11 is a wafer, 12 is a gas introduction means; 13 is a gas vent; 1
4 is an alignment microscope, 15 is a mask stage, 1
6 is alignment mark, 17.20.24 is ○ ring, 1
8 is a flexible connection means for connecting the X-ray extraction tube 3 divided into two parts perpendicular to its axial direction; 19 is a flexible sealing means; 21 is a detachable magnet; 22 is a gas exhaust means; 23
is an X-ray transparent window holder.
Ｘ線取り出し筒３は、Ｘ線を発生する真空室１と、マス
クホルダ７に真空吸着されるマスク８とウェハホルダｌ
Ｏに真空吸着されるウェハ１１を位置合せするマスクス
テージ１５にそれぞれ０リング１７．２４を介して連結
され、真空室１との境界にベリリウム等からなるＸ線透
過率の大きい膜厚的１０−の第１のＸ線透過窓４を有し
、またマスク８近傍にポリプロピレン等からなるＸ線透
過率の大きい膜厚的０．５〜ＩＩＩｍの第２のＸ線透過
窓６を有する。The X-ray extraction cylinder 3 includes a vacuum chamber 1 that generates X-rays, a mask 8 and a wafer holder l that are vacuum-suctioned to a mask holder 7.
They are connected to the mask stage 15 for positioning the wafer 11 vacuum-suctioned to the O through O rings 17 and 24, respectively, and at the boundary with the vacuum chamber 1 there is formed a film 10-, which is made of beryllium or the like and has a large X-ray transmittance. In addition, near the mask 8, there is a second X-ray transmitting window 6 made of polypropylene or the like having a high X-ray transmittance and having a film thickness of 0.5 to III m.
該○リング１７とＸ線透過窓４により真空室１の真空度
は良好に保たれ、該０リング２４によりＸ線取り出し筒
３内のＸ線吸収率の小さいガス５（例えばＨｅ等）は密
閉される。The O-ring 17 and the X-ray transmission window 4 maintain a good degree of vacuum in the vacuum chamber 1, and the O-ring 24 seals the gas 5 with a low X-ray absorption rate (for example, He, etc.) in the X-ray extraction tube 3. be done.
マスクステージ１５に着脱マグネット２１により吸着さ
れるマスクホルダ７内には、マスク８の交換時、上記ガ
ス５の大気への拡散を防ぐためにステンレス等の薄板で
作製されたＸ線透過窓ホルダ２３に接着された第２のＸ
線透過窓６があり、該ホルダ２３のＸ線透過窓６の周辺
には、Ｘ線取り出し筒３内に充填するガス５をＸ線透過
ｇ６とマスク８との空間へ流入させるための通気口１３
が複数個設けられる。該通気口は、マスク８とウェハｌ
ｌを位置合せするためのアライメント顕微ｆｉ１４から
出射されるアライメントビーム（破線で示す）の通過穴
としても使用される。したがって、アライメントビーム
は減衰することなく、マスク面まで到達することができ
る。また、マスクホルダ７は○リング２０を介してマス
クステージ１５に１着脱マグネット２１の吸引力により
固定されるので、上記ガス５は密閉される。Inside the mask holder 7, which is attracted to the mask stage 15 by a removable magnet 21, there is an Glued second X
There is a radiation transmitting window 6, and around the X-ray transmitting window 6 of the holder 23, there is a vent hole for allowing the gas 5 filled in the X-ray extraction cylinder 3 to flow into the space between the X-ray transmitting g6 and the mask 8. 13
A plurality of are provided. The vent hole connects the mask 8 and the wafer l.
It is also used as a passage hole for an alignment beam (indicated by a broken line) emitted from the alignment microscope fi14 for aligning the fi1. Therefore, the alignment beam can reach the mask surface without being attenuated. Further, since the mask holder 7 is fixed to the mask stage 15 via the circle ring 20 by the suction force of the detachable magnet 21, the gas 5 is sealed.
さらに、マスクホルダ７にはＸ線透過窓６とマスク８と
の空間と、外部大気とを連絡するガス排気手段２２（本
実施例では細い孔道）が設けられ、Ｘ線透過窓６とマス
ク８の間の空間のガスを大気中へ排出する。このような
構造になっているので、ガス導入手段１２から大気より
若干大きい圧力で、Ｈｅガス等をＸ線取り出し筒３内へ
導入すると、上記導入圧力差に応じて、導入ガスと空気
の混合ガスが、マスクホルダ７内１通気ロ１３．Ｘ線透
過窓ホルダ２３とマスク８との空間、ガス排気手段２２
を通って大気へ排出され９．また、露光時は第１のＸ線
透過窓４の温度上昇を防止するために、該ガス排気手段
２２からガス５を少量づつ大気中へ排出するが、このと
き、ガスはマスク８の裏面上を流れるので、吸収体９の
温度上昇を低減することができる。Furthermore, the mask holder 7 is provided with a gas exhaust means 22 (a narrow hole in this embodiment) that communicates the space between the X-ray transparent window 6 and the mask 8 with the outside atmosphere. The gas in the space between them is discharged into the atmosphere. With this structure, when He gas or the like is introduced into the X-ray extraction tube 3 from the gas introduction means 12 at a pressure slightly higher than atmospheric pressure, the introduced gas and air are mixed according to the above-mentioned introduction pressure difference. Gas flows through the mask holder 7 through 1 ventilation hole 13. Space between X-ray transparent window holder 23 and mask 8, gas exhaust means 22
9. Emitted into the atmosphere through Further, during exposure, in order to prevent the temperature of the first X-ray transmission window 4 from rising, the gas 5 is discharged into the atmosphere from the gas exhaust means 22 little by little. , the temperature rise in the absorber 9 can be reduced.
Ｉ［ｅガスの比Ｉ］【は、空気よりも小さいので、Ｘ線
取り出し筒３の上部から徐々に空気と置き換わり、最終
的にＸ線取り出し筒３の内部、およびＸ線透過窓ホルダ
２３とマスク８の空間は高純度のＨｅで満たされる。Since I[e gas ratio I][ is smaller than air, it gradually replaces air from the upper part of the X-ray extraction tube 3, and finally the inside of the X-ray extraction tube 3 and the X-ray transmission window holder 23. The space of the mask 8 is filled with high purity He.
また、上記のようにＸ線取り出し筒３内に満たされ、大
気中へ排出されるガス５は、大気よりほんのわずかたけ
圧力が高いだけでよいので、第２のＸ線透過窓６には、
膜厚の薄いポリプロピレン等を用いても、たわみ等を生
じることはなく、開口の大きなものをリム等を必要とせ
ずに用いることができ、露光領域の大きいＸ線転写を行
なうことが可能になる。Furthermore, as mentioned above, the gas 5 filled in the X-ray extraction tube 3 and discharged into the atmosphere needs to have only a slightly higher pressure than the atmosphere, so the second X-ray transmission window 6 has
Even if a thin film such as polypropylene is used, there will be no bending, and a large opening can be used without the need for a rim, making it possible to perform X-ray transfer with a large exposure area. .
したがって、第２のＸ線透過窓６を通過することによる
Ｘ線束２の；減衰は小さく、且つ、真空室１からマスク
８裏面間は完全にＨｅ等のＸ線吸収の小さいガス５で満
たされるため、該Ｘ線束２の減衰はきわめて小さい。Therefore, the attenuation of the X-ray flux 2 due to passing through the second X-ray transmission window 6 is small, and the space between the vacuum chamber 1 and the back surface of the mask 8 is completely filled with a gas 5 such as He that has low X-ray absorption. Therefore, the attenuation of the X-ray flux 2 is extremely small.
上記Ｘ線取り出し筒３は、真空室１に固定される筒と、
マスクステージ１５に固定される筒に分割してあり、そ
の間は可撓性接続手段１８、例えばＳｉゴム等を用いた
ベローズにより接続される。The X-ray extraction tube 3 includes a tube fixed to the vacuum chamber 1;
It is divided into cylinders fixed to the mask stage 15, and the cylinders are connected by a flexible connecting means 18, for example, a bellows made of Si rubber or the like.
このような構造になっているので、ｘｕ、ｇで発生する
振動等は、アライナにほとんど伝達されず、且つ、ドツ
キング時における大重量のＸ線源とアライナ相互の高さ
調整や、位置調整を容易に行なうことができる。With this structure, vibrations generated in xu and g are hardly transmitted to the aligner, and it is easy to adjust the height and position between the heavy X-ray source and the aligner during docking. It can be done easily.
つぎに、アライメント顕微鏡１４は、可撓性封止手段１
９、例えばＳｉゴム等を用いたベローズを用いて、Ｘ線
取り出し筒３内に設置されるので、該筒中のＨｅガス等
は完全に封止され、且つ、アライメント顕微鏡１４はＸ
ｉ取り出し筒３内で自由に可動できる。したがって、該
顕微鏡１４を位置合せマーク１６上に容易に設定するこ
とができ、且つ位置合せ用アライメントビーム（破線）
を露光領域付近に近付けた、すなわち第２図（Ａ）、（
Ｂ）中のＱの長さの小さいアライメント顕微鏡１４を用
いれば、位置合せマーク１６を露光領域のパターン９に
近接して設けることができる。さらに、露−光領域の変
更に際しては、アライメント顕微鏡１４の設定位置を変
更し、着脱マグネット２１を動作させてマスクホルダ７
をマスクステージ１５からはずし。Next, the alignment microscope 14 moves the flexible sealing means 1
9. Since it is installed in the X-ray extraction tube 3 using a bellows made of Si rubber or the like, He gas etc. in the tube is completely sealed, and the alignment microscope 14 is
i It can be moved freely within the take-out cylinder 3. Therefore, the microscope 14 can be easily set on the alignment mark 16, and the alignment beam (broken line)
2 (A), (
If the alignment microscope 14 in B) with a small length Q is used, the alignment mark 16 can be provided close to the pattern 9 in the exposure area. Furthermore, when changing the exposure area, the setting position of the alignment microscope 14 is changed and the detachable magnet 21 is operated to hold the mask holder 7.
Remove from mask stage 15.
Ｘ線透過窓ホルダ２３を、Ｘ線透過窓寸法の大きいもの
に取り換えるのみで、簡単に行なうことができるので、
露光領域変更の作業時間を大幅に短縮できる。This can be easily done by simply replacing the X-ray transparent window holder 23 with one with a larger X-ray transparent window size.
The work time for changing the exposure area can be significantly reduced.
本実施例では、可撓性接続手段１８をＸ線取り出し筒３
の中間に設けた例について説明したが、真空室１との境
界もしくはマスクステージ１５との境界に設けてもよい
。また、本実施例ではＸ線取り出し筒３をマスクステー
ジ１５に連結し、マスクホルダ７を取り外して、容易に
Ｘ線透過窓ホルダ２３を取り換えられる例について述べ
たが、核部３をマスクホルダ７に直結してもよい、また
、マスクホルダ７の着脱手段はマグネット２１でなく、
嵌合によってもよい。In this embodiment, the flexible connection means 18 is connected to the X-ray extraction tube 3.
Although an example has been described in which it is provided in the middle, it may also be provided at the boundary with the vacuum chamber 1 or the mask stage 15. Furthermore, in this embodiment, an example has been described in which the X-ray extraction tube 3 is connected to the mask stage 15, the mask holder 7 is removed, and the X-ray transmission window holder 23 is easily replaced. Also, the attachment/detachment means for the mask holder 7 is not the magnet 21;
It may also be done by fitting.
以上の実施例は、Ｘ線透過窓ホルダ２３を露光中も、第
２図（Ａ）、（Ｂ）に示す状態のまま使用する場合に関
して述べたもので、マスク８吸着後に、該ホルダ２３を
第２図（Ａ）、（Ｂ）の一点鎖線で示すように、矢印の
方向にはね上げる等の方法により、Ｘ線通過領域から退
避させる機構系を付加してもよい。このことにより、第
２のＸ線透過ｇ６によるＸ線の吸収をなくすことができ
、且つ、該Ｘ線透過窓６とマスク８との間の空間がなく
なるため、Ｘ線吸収率の小さいガスを上記実施例により
さらに短時間で大気と置換できるとともに、アライメン
ト系をマスク裏面にさらに近付けることができ、解像度
、倍率の向上およびレンズ径の縮小を図ることができる
利点がある。The above embodiments have been described with respect to the case where the X-ray transmission window holder 23 is used in the state shown in FIGS. 2(A) and 2(B) even during exposure. As shown by the dashed-dotted lines in FIGS. 2(A) and 2(B), a mechanical system for retracting from the X-ray passing region may be added by a method such as flipping up in the direction of the arrow. This eliminates the absorption of X-rays by the second X-ray transmission window g6, and eliminates the space between the X-ray transmission window 6 and the mask 8, so that gas with a low X-ray absorption rate can be removed. The embodiment described above has the advantage of being able to replace the atmosphere with the atmosphere in a shorter time, and also allowing the alignment system to be brought closer to the back surface of the mask, improving resolution and magnification, and reducing the lens diameter.
以上説１り丁したように１本発明によれば、Ｘ線を発生
させる真空室から転写パターンを形成したマスクまで、
Ｘ線吸収率の小さいガスで完全に満たされるため、Ｘ線
強度の減衰が小さくなり、転写時間の短縮が図れる効果
がある。また、Ｘ線取り出し筒内に位置合せ用のアライ
メント顕微鏡を配置できる構造とすることによって１位
置合せマークを露光領域近辺に設けることが可能になり
、高精度の位置合せが可能になる。さらに、従来、露光
領域変更のためには、Ｘ線取り出し筒そのものの取り換
えが必要であったが１本発明では、Ｘ線透過窓ホルダを
取り換えるだけでよく、その上。As described above, according to the present invention, from the vacuum chamber that generates X-rays to the mask on which the transferred pattern is formed,
Since it is completely filled with gas having a low X-ray absorption rate, the attenuation of the X-ray intensity is reduced, which has the effect of shortening the transfer time. Further, by adopting a structure in which an alignment microscope for positioning can be placed inside the X-ray extraction cylinder, it becomes possible to provide one positioning mark near the exposure area, and highly accurate positioning becomes possible. Furthermore, conventionally, in order to change the exposure area, it was necessary to replace the X-ray extraction tube itself, but in the present invention, it is only necessary to replace the X-ray transmission window holder.
取り換えに際しては、Ｘ線源等を動かす必要はなく、マ
スクホルダのみを取り外すことによって簡単に且つ短時
間で変更が行なえる効果がある。このように１本発明の
効果は顕著である。When replacing the mask, there is no need to move the X-ray source or the like, and the change can be easily and quickly made by removing only the mask holder. As described above, the effects of the present invention are remarkable.
第１図（Ａ）、（Ｂ）は従来のＸ線取り出し筒を示す図
、第２図（Ａ）〜（Ｃ）は本発明の一実施例を示す図で
ある。
■・・・真空室 ２・・・Ｘ線束３・・・Ｘ
線取り出し筒 ４．６・・・Ｘ線透過窓５・・・ガス
７・・・マスクホルダ８・・・マスク
９・・・吸収体パターン１０・・・ウェハホ
ルダ １１・・・ウェハ１２・・・ガス導入手段
１３・・・ガス通気口１４・・・アライメント顕微
鏡FIGS. 1A and 1B are views showing a conventional X-ray extraction tube, and FIGS. 2A to 2C are views showing an embodiment of the present invention. ■...Vacuum chamber 2...X-ray flux 3...X
Ray extraction tube 4.6...X-ray transmission window 5...Gas 7...Mask holder 8...Mask
9...Absorber pattern 10...Wafer holder 11...Wafer 12...Gas introducing means
13... Gas vent 14... Alignment microscope
Claims (5)
置し、上記マスクにＸ線を照射して該マスクのパターン
を大気中で上記レジストに転写するＸ線露光装置に用い
られるＸ線取り出し筒において、該Ｘ線取り出し筒内に
Ｘ線吸収率の小さいガスを導入するガス導入手段と、上
記マスク近傍に設けられ、Ｘ線透過窓と上記ガスの通気
口とを有するＸ線透過窓ホルダと、該Ｘ線透過窓ホルダ
と上記マスクとの間の空間から外気へ通じる上記ガスの
排気手段とを具備し、Ｘ線を発生させる真空室と上記マ
スク裏面間を上記ガスで満たすようになしたことを特徴
とするＸ線取り出し筒。(1) An X-ray extraction tube used in an X-ray exposure device that places a mask and a resist-coated wafer in close proximity and irradiates the mask with X-rays to transfer the pattern of the mask onto the resist in the atmosphere. , a gas introducing means for introducing a gas having a low X-ray absorption rate into the X-ray extraction cylinder; an X-ray transparent window holder provided near the mask and having an X-ray transparent window and a vent for the gas; , comprising means for exhausting the gas from a space between the X-ray transmitting window holder and the mask to the outside air, so that the space between the vacuum chamber for generating X-rays and the back surface of the mask is filled with the gas. An X-ray extraction tube characterized by:
相対的位置検出手段を設けたことを特徴とする特許請求
の範囲第１項記載のＸ線取り出し筒。(2) The X-ray extraction tube according to claim 1, further comprising means for detecting the relative position of the mask and the wafer within the X-ray extraction tube.
スクとウェハの相対的位置検出手段から出射されるアラ
イメントビームを通過させるようにしたことを特徴とす
る特許請求の範囲第１項記載のＸ線取り出し筒。(3) The alignment beam emitted from the mask and wafer relative position detection means is made to pass through the ventilation hole provided in the X-ray transmission window holder. The X-ray extraction tube described.
スクホルダ内に設け、且つ該マスクホルダを着脱可能に
したことを特徴とする特許請求の範囲第１項記載のＸ線
取り出し筒。(4) The X-ray extraction tube according to claim 1, wherein the X-ray transmission window holder is provided within the mask holder for adsorbing the mask, and the mask holder is detachable.
に少なくとも２つに分割してあり、それぞれの分割部分
が可撓性接続手段により接続されていることを特徴とす
る特許請求の範囲第１項記載のＸ線取り出し筒。(5) The X-ray extraction tube is divided into at least two parts in a direction substantially perpendicular to its axis, and each divided part is connected by a flexible connecting means. The X-ray extraction tube according to scope 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59188867A JPS6167917A (en) | 1984-09-11 | 1984-09-11 | X-ray lead-out cylinder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59188867A JPS6167917A (en) | 1984-09-11 | 1984-09-11 | X-ray lead-out cylinder |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6167917A true JPS6167917A (en) | 1986-04-08 |
Family
ID=16231254
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59188867A Pending JPS6167917A (en) | 1984-09-11 | 1984-09-11 | X-ray lead-out cylinder |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6167917A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62237727A (en) * | 1986-04-09 | 1987-10-17 | Hitachi Ltd | Mask for x-ray exposure |
| JPH0217627A (en) * | 1988-07-06 | 1990-01-22 | Fujitsu Ltd | X-ray aligner |
| JP2009302536A (en) * | 2008-06-13 | 2009-12-24 | Asml Netherlands Bv | Lithography device and device manufacturing method |
| US10464002B2 (en) | 2014-07-21 | 2019-11-05 | Edwards Limited | Centrifugal abatement separator |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57169242A (en) * | 1981-04-13 | 1982-10-18 | Hitachi Ltd | X-ray transferring device |
-
1984
- 1984-09-11 JP JP59188867A patent/JPS6167917A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57169242A (en) * | 1981-04-13 | 1982-10-18 | Hitachi Ltd | X-ray transferring device |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62237727A (en) * | 1986-04-09 | 1987-10-17 | Hitachi Ltd | Mask for x-ray exposure |
| JPH0588534B2 (en) * | 1986-04-09 | 1993-12-22 | Hitachi Ltd | |
| JPH0217627A (en) * | 1988-07-06 | 1990-01-22 | Fujitsu Ltd | X-ray aligner |
| JP2009302536A (en) * | 2008-06-13 | 2009-12-24 | Asml Netherlands Bv | Lithography device and device manufacturing method |
| US8289498B2 (en) | 2008-06-13 | 2012-10-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US10464002B2 (en) | 2014-07-21 | 2019-11-05 | Edwards Limited | Centrifugal abatement separator |
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