JPS6130183Y2 - - Google Patents
Info
- Publication number
- JPS6130183Y2 JPS6130183Y2 JP16275481U JP16275481U JPS6130183Y2 JP S6130183 Y2 JPS6130183 Y2 JP S6130183Y2 JP 16275481 U JP16275481 U JP 16275481U JP 16275481 U JP16275481 U JP 16275481U JP S6130183 Y2 JPS6130183 Y2 JP S6130183Y2
- Authority
- JP
- Japan
- Prior art keywords
- pyroelectric
- metal ring
- vapor deposited
- pyroelectric film
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002184 metal Substances 0.000 claims description 16
- 230000035945 sensitivity Effects 0.000 description 5
- 101100138725 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) PUF2 gene Proteins 0.000 description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910001120 nichrome Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Radiation Pyrometers (AREA)
Description
【考案の詳細な説明】
本考案は赤外線焦電素子に関するもので、高感
度の焦電素子を得ることを目的とする。[Detailed Description of the Invention] The present invention relates to an infrared pyroelectric element, and aims to obtain a highly sensitive pyroelectric element.
第１図は従来の焦電素子の断面図である。図中
１はPUF2等の高分子焦電フイルム、２，２′は
前記焦電フイルム１の前面に蒸着されたNi，
NiCr等の金属からなる蒸着層、３は前記蒸着層
の片面に接着固定された金属リングを示す。 FIG. 1 is a cross-sectional view of a conventional pyroelectric element. In the figure, 1 is a polymer pyroelectric film such as PUF2, 2 and 2' are Ni deposited on the front surface of the pyroelectric film 1,
A vapor deposited layer made of a metal such as NiCr, and 3 indicate a metal ring adhesively fixed to one side of the vapor deposited layer.
第２図は第１図に示す焦電素子の概略等価回路
図であり、Coは焦電フイルム１の起電力に対す
る有効な素子容量、Csは金属リング３付近の浮
遊容量を示す。図からも明らかなように赤外線に
より生じる起電力は前記容量CoとCsにより分割
されるので感度（出力電圧）が低下する。この浮
遊容量Csによる感度低下は、素子面積が大きい
場合は無視できるが、小型の素子の場合は感度の
低下が数dBとなり無視できなくない。 FIG. 2 is a schematic equivalent circuit diagram of the pyroelectric element shown in FIG. 1, where Co represents the effective element capacitance with respect to the electromotive force of the pyroelectric film 1, and Cs represents the stray capacitance near the metal ring 3. As is clear from the figure, the electromotive force generated by infrared rays is divided by the capacitances Co and Cs, resulting in a decrease in sensitivity (output voltage). The decrease in sensitivity due to this stray capacitance Cs can be ignored if the element area is large, but in the case of a small element, the decrease in sensitivity becomes several dB and cannot be ignored.
本考案はこのような欠点を除去したものであり
小型でも高感度を得ることができる焦電素子を提
供するものである。以下、本考案の一実施例を第
３図を用いて説明する。 The present invention eliminates these drawbacks and provides a pyroelectric element that is small but can provide high sensitivity. An embodiment of the present invention will be described below with reference to FIG.
第３図は本考案の一実施例である焦電素子の断
面図である。図中１はPUF2等からなる高分子の
焦電フイルム、２，２′はNi，NiCr等からなる蒸
着層、３は金属リング、Coは素子容量、Csは浮
遊容量である。 FIG. 3 is a cross-sectional view of a pyroelectric element that is an embodiment of the present invention. In the figure, 1 is a polymeric pyroelectric film made of PUF2 or the like, 2 and 2' are vapor deposited layers made of Ni, NiCr, etc., 3 is a metal ring, Co is an element capacitance, and Cs is a stray capacitance.
第１図に示す従来の焦電素子と違つている点は
金属リング３と対向する位置には金属蒸着層が形
成されていないということである。すなわち、対
面に設けられた蒸着層２′の大きさを金属リング
３の開口面積と同程度若しくはやや大きくし、そ
の位置を金属リング３の開口部と対向する位置に
設けている。そのため、感度を低下させる浮遊容
量Csを極端に減少できる。 The difference from the conventional pyroelectric element shown in FIG. 1 is that no metal vapor deposition layer is formed at the position facing the metal ring 3. That is, the size of the vapor deposited layer 2' provided on the opposite side is made to be the same as or slightly larger than the opening area of the metal ring 3, and its position is provided at a position facing the opening of the metal ring 3. Therefore, stray capacitance Cs that reduces sensitivity can be extremely reduced.
また、第４図に示すように焦電フイルム１に金
属リング３を直接接着し、その後焦電フイルム１
に両面に蒸着層２，２′を設けてもよい。 Further, as shown in FIG. 4, the metal ring 3 is directly attached to the pyroelectric film 1, and then the pyroelectric film 1 is
Alternatively, vapor deposited layers 2, 2' may be provided on both sides.
以上のように本考案によれば、高感度の焦電素
子を提供することができる。また、本考案によれ
ば焦電フイルムを金属リングにそつて切断した場
合、両面に形成された蒸着層がシヨートしたり、
切断面の汚れ等によりリーク電流が大きくなり、
ノイズが発生するなどの問題も解消できる。 As described above, according to the present invention, a highly sensitive pyroelectric element can be provided. Further, according to the present invention, when the pyroelectric film is cut along the metal ring, the vapor deposited layers formed on both sides may be shot.
Leakage current increases due to dirt on the cutting surface, etc.
Problems such as noise generation can also be resolved.
第１図は従来の焦電素子の断面図、第２図は同
素子の概略等価回路図、第３図は本考案の一実施
例における赤外線焦電素子の断面図、第４図は本
考案の他の実施例である焦電素子を示す断面図で
ある。
１……焦電フイルム、２，２′……蒸着層、３
……金属リング。
Fig. 1 is a cross-sectional view of a conventional pyroelectric element, Fig. 2 is a schematic equivalent circuit diagram of the same element, Fig. 3 is a cross-sectional view of an infrared pyroelectric element according to an embodiment of the present invention, and Fig. 4 is a cross-sectional view of the infrared pyroelectric element according to the present invention. FIG. 3 is a cross-sectional view showing a pyroelectric element as another example. 1...Pyroelectric film, 2,2'...Vapor deposited layer, 3
...Metal ring.
Claims (1)
焦電フイルムの一方の面に金属リングを設けると
ともに前記焦電フイルムの他方の面に設けられた
前記金属蒸着層を前記金属リングの開口部と対向
する位置に設けるとともに、その寸法を前記金属
リングの内径寸法と同程度若しくはやや大きくし
たことを特徴とする赤外線焦電素子。 A metal vapor deposited layer is provided on both sides of a pyroelectric film, a metal ring is provided on one surface of the pyroelectric film, and the metal vapor deposited layer provided on the other surface of the pyroelectric film is connected to an opening of the metal ring. 1. An infrared pyroelectric element, characterized in that it is provided at opposing positions and has dimensions comparable to or slightly larger than the inner diameter dimension of the metal ring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16275481U JPS5866335U (en) | 1981-10-30 | 1981-10-30 | infrared pyroelectric element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16275481U JPS5866335U (en) | 1981-10-30 | 1981-10-30 | infrared pyroelectric element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5866335U JPS5866335U (en) | 1983-05-06 |
| JPS6130183Y2 true JPS6130183Y2 (en) | 1986-09-04 |
Family
ID=29955061
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16275481U Granted JPS5866335U (en) | 1981-10-30 | 1981-10-30 | infrared pyroelectric element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5866335U (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| JP5542635B2 (en) * | 2010-11-29 | 2014-07-09 | 京セラ株式会社 | Infrared element mounting structure and infrared element mounting substrate |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
-
1981
- 1981-10-30 JP JP16275481U patent/JPS5866335U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5866335U (en) | 1983-05-06 |
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