JPS61287226A - Heat treatment furnace - Google Patents

Heat treatment furnace

Info

Publication number
JPS61287226A
JPS61287226A JP12926585A JP12926585A JPS61287226A JP S61287226 A JPS61287226 A JP S61287226A JP 12926585 A JP12926585 A JP 12926585A JP 12926585 A JP12926585 A JP 12926585A JP S61287226 A JPS61287226 A JP S61287226A
Authority
JP
Japan
Prior art keywords
furnace
heat
wall
pipe
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12926585A
Other languages
Japanese (ja)
Inventor
Mikio Takagi
幹夫 高木
Mamoru Maeda
守 前田
Haruo Shimoda
下田 春夫
Yoichi Mizushina
水品 陽一
Kenzaburo Hayashi
健三郎 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DENKOO KK
Fujitsu Ltd
Denkoh Co Ltd
Original Assignee
DENKOO KK
Fujitsu Ltd
Denkoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DENKOO KK, Fujitsu Ltd, Denkoh Co Ltd filed Critical DENKOO KK
Priority to JP12926585A priority Critical patent/JPS61287226A/en
Publication of JPS61287226A publication Critical patent/JPS61287226A/en
Pending legal-status Critical Current

Links

Landscapes

  • Furnace Details (AREA)

Abstract

PURPOSE:To accelerate the temperature rising and falling speeds of a heat treating furnace by providing a heat pipe on the outer periphery of a cylindrical housing or the inner periphery of a furnace outer wall, and projecting the cold heat end of the pipe out of the outer wall. CONSTITUTION:A heat treating furnace of coaxial double tube construction is formed of a cylindrical housing 2 and a furnace outer wall 4. A heat pipe 8 secured to the outer periphery of the housing 2 or the inner periphery of the outer wall 4 is disposed in a cavity 6 between the housing 2 and the outer wall 4. The pipe 8 is disposed radially at an equal angle to the furnace body to uniformly transport the quantity of heat in the furnace core. The cold heating portion 9 of the pipe 9 is projected externally from the end through the outer wall 4 and provided with a heat sink blade 10. Since the pipe 8 having large heat transporting amount is provided in the furnace, the furnace temperature rising and falling speeds can be accelerated.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 ・ 本発明は半導体装置等の製造設備に用いる熱処理炉
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] - The present invention relates to a heat treatment furnace used in manufacturing equipment for semiconductor devices and the like.

この種の熱処理炉は、半導体ウェーハの熱酸化処理、拡
散処理、あるいは化学的気相成長処理に際して不可欠と
される所謂、電気炉である。
This type of heat treatment furnace is a so-called electric furnace that is indispensable for thermal oxidation treatment, diffusion treatment, or chemical vapor deposition treatment of semiconductor wafers.

特に炉軸方向に長い均一加熱部が取得され、同時に大量
のウェーハが処理され且つ炉心内への挿入または引き出
しが容易な横型熱処理炉である。
In particular, it is a horizontal heat treatment furnace that has a uniform heating section that is long in the furnace axis direction, can process a large number of wafers at the same time, and can be easily inserted into or withdrawn from the reactor core.

係る熱処理炉は、一般に前記夫々の処理プロセスに応じ
炉温制御用のプログラムを設定して行う。
Such a heat treatment furnace is generally operated by setting a program for controlling the furnace temperature in accordance with each of the above-mentioned treatment processes.

例えばウェーハの酸化処理では、乾燥酸素または湿酸素
中で温度1000℃程度の高温加熱処理が必要とされる
。この場合、炉内体の加熱・冷却能力に見合う制御プロ
グラムを予設定し、所定の処理温度ならびに時間を与え
てプロセスの自動制御がおこなわれる。
For example, wafer oxidation treatment requires high-temperature heat treatment at a temperature of about 1000° C. in dry oxygen or wet oxygen. In this case, a control program suitable for the heating and cooling capacity of the furnace interior is preset, and a predetermined processing temperature and time are given to automatically control the process.

ところで、炉温度及び処理時間の制御に当り従来の熱処
理炉は、炉温の上昇時は50℃/min、また下降時は
10℃/minの能力(水冷方式)を有するが1特にあ
る処理が完了した後における前記炉温降下時の水冷能力
が不十分である。これに伴い炉隆温時は2例えば850
℃に下がったところでつ工−ハの炉外取出しと以後の自
然冷却を行う。
By the way, in controlling the furnace temperature and treatment time, conventional heat treatment furnaces have a capacity of 50°C/min when the furnace temperature is rising and 10°C/min when decreasing the furnace temperature (water cooling method), but 1 In particular, certain treatments The water cooling capacity during the furnace temperature drop after completion is insufficient. Along with this, when the furnace temperature is 2, for example, 850
When the temperature drops to ℃, the furnace is taken out of the furnace and then allowed to cool naturally.

即ち、プロセスの自動制御下におかれる熱処理炉は温度
応答性の高いことが要請されており特に高温からの冷却
能力の改善が要請されていた。
That is, heat treatment furnaces that are subject to automatic process control are required to have high temperature responsiveness, and in particular, are required to have improved cooling ability from high temperatures.

〔従来の技術〕[Conventional technology]

第3図は従来の熱処理炉の概略構成を示す断面図である
FIG. 3 is a sectional view showing a schematic configuration of a conventional heat treatment furnace.

図中、1はカンクル線等の抵抗発熱体を筒状に巻回した
加熱体、2は加熱体1を内設する筒状筐体、3は筒状筐
体の内壁に設けた断熱材、4は筒状筐体2の外周におか
れ且つ炉軸を共有(同軸)する配置になる炉外壁体、及
び5は炉外壁体4と筒状筐体2の空間に配管された炉冷
加用通水管である。
In the figure, 1 is a heating element made by winding a resistance heating element such as a cankle wire into a cylindrical shape, 2 is a cylindrical housing in which the heating element 1 is installed, 3 is a heat insulating material provided on the inner wall of the cylindrical housing, Reference numeral 4 denotes a furnace outer wall body placed on the outer periphery of the cylindrical case 2 and arranged to share (coaxially) the furnace axis, and 5 a furnace cooling pipe piped into the space between the furnace outer wall body 4 and the cylindrical case 2. It is a water pipe.

炉は筒状筐体2と炉外壁体4が二重になっている熱遮蔽
機能を有することから、炉軸7にそって長い均一加熱部
分が形成され、また加熱効率が良い特長がある。
Since the furnace has a heat shielding function in which the cylindrical casing 2 and the furnace outer wall 4 are doubled, a long uniform heating section is formed along the furnace axis 7, and the heating efficiency is high.

然しなから、プロセスの自動制御下におかれた熱処理炉
は、温度応答性の特に炉温降下時の水冷能力が不十分な
ため、工程能力が低下するのみならず、ウェーハの酸化
処理等成膜品質のバラツキも生ずると云う不都合がある
However, heat treatment furnaces that are placed under automatic process control not only have insufficient temperature responsiveness, especially water cooling capacity when the furnace temperature drops, but also have problems with oxidation processing of wafers. There is also the disadvantage that variations in film quality occur.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

前記従来の二重管構成熱処理炉に対して炉の冷却能力を
高めることである。
The objective is to increase the cooling capacity of the furnace compared to the conventional double tube heat treatment furnace.

〔問題点を解決するための手段〕[Means for solving problems]

前記問題点は、炉心加熱体と該加熱体の断熱層とを内周
辺に配置する筒状筐体と、前記筒状筐体の周辺に配置さ
れた該筒状筐体の炉心軸を共有する炉外壁体とからなる
同軸二重管構成の熱処理炉において、筒状筐体の外周も
しくは炉外壁体の内周にヒートバイブが配設すること、
且つ炉外壁体の外部に該ヒートパイプの冷熱端部を形成
させた本発明の熱処理炉とすることにより達成される。
The problem is that the core heating element and the heat insulating layer of the heating element are arranged around the inner periphery of the cylindrical casing, and the cylindrical casing arranged around the cylindrical casing shares a core axis. In a heat treatment furnace having a coaxial double tube configuration consisting of a furnace outer wall, a heat vibrator is disposed on the outer periphery of the cylindrical casing or on the inner periphery of the furnace outer wall;
This is achieved by providing the heat treatment furnace of the present invention in which the cold end of the heat pipe is formed outside the furnace outer wall.

〔作 用〕[For production]

従来の水冷却に替わって、同温度差に対して数倍の熱量
輸送を行い得るヒートパイプが設けられた炉構成である
ことから炉の降温(冷却)速度が向上する。
Instead of conventional water cooling, the furnace is configured with a heat pipe that can transport several times as much heat for the same temperature difference, improving the temperature drop (cooling) speed of the furnace.

〔実施例〕〔Example〕

以下、第1図と第2図の実施例図を参照して本発明の熱
処理炉の構成を詳細に説明する。
Hereinafter, the structure of the heat treatment furnace of the present invention will be explained in detail with reference to the embodiment diagrams of FIGS. 1 and 2.

第1図は本発明の熱処理炉の断面図、第2図は第1図指
標線A−A切断の矢視方向断面図である。
FIG. 1 is a cross-sectional view of the heat treatment furnace of the present invention, and FIG. 2 is a cross-sectional view taken along index line AA in FIG. 1 in the direction of arrows.

第1図の同軸二重管構成炉に於いて、ステンレス等を円
筒形状に成形した筒状筐体2は、筐体内面側に熱遮蔽用
断熱材3が張り付けられ、さらに断熱材の内壁に接して
カンタル線等の抵抗発熱体1がコイル状に巻回固定され
る。斯くして、筺体2の炉心軸部7が形成される。
In the coaxial double tube furnace shown in Fig. 1, a cylindrical casing 2 made of stainless steel or the like has a heat shielding insulating material 3 attached to the inner surface of the casing, and a heat shielding insulating material 3 is attached to the inner wall of the insulating material. In contact therewith, a resistance heating element 1 such as a Kanthal wire is wound and fixed in a coil shape. In this way, the core shaft portion 7 of the housing 2 is formed.

前記筒状筺体2と炉心軸部7を共有する同軸配置になる
前記ステンレス等を円筒形状に成形した炉外壁体4と、
前記筒状筺体2との間は、熱遮蔽空洞部6が形成される
A reactor outer wall body 4 formed of the stainless steel or the like into a cylindrical shape and arranged coaxially with the cylindrical casing 2 and the reactor core shaft 7;
A heat shielding cavity 6 is formed between the cylindrical housing 2 and the cylindrical housing 2 .

該空洞部6は、炉外壁体4の内周面に鑞付は手段等によ
り固定されたヒートパイプ8が配管される。しかし、前
記ヒートパイプ8は筒状筐体2の外周面側に鑞付けして
配管するも構わない。
A heat pipe 8 fixed to the inner circumferential surface of the furnace outer wall 4 by brazing or the like is piped into the cavity 6 . However, the heat pipe 8 may be brazed to the outer peripheral surface of the cylindrical casing 2.

配管のヒートパイプ8は、炉心内熱量を筒状炉体2の外
周面から均等に輸送する如く炉心部に対し半径方向に等
角度に配置される。前記配置の円筒軸方向の配管状態は
第2図円筒軸方向の断面図に示される。
The heat pipes 8 are arranged at equal angles in the radial direction with respect to the core so as to evenly transport the heat inside the core from the outer peripheral surface of the cylindrical furnace body 2 . The state of the piping in the axial direction of the cylinder in the above arrangement is shown in a sectional view in the axial direction of the cylinder in FIG.

第2図は、炉外壁体4の内周面に鑞付けされたヒートパ
イプ8の高温受熱部と、該高温受熱熱量を輸送して炉外
に放散するヒートパイプ8の冷熱部9が示される。
FIG. 2 shows the high-temperature heat-receiving part of the heat pipe 8 that is brazed to the inner peripheral surface of the furnace outer wall 4, and the cold-heat part 9 of the heat pipe 8 that transports the high-temperature received heat and radiates it outside the furnace. .

冷熱部9は炉外壁体4を通して高熱ヒートバイブの端部
を外壁体外に突出させ、該突出のパイプ端に多数の放熱
翼板10を設けて形成される。冷熱部9は水冷又は空冷
手段によって炉内高温受熱部の熱量を高速度で外部に排
出することが出来る。
The cold/heat section 9 is formed by protruding the end of a high-temperature heat vibrator outside the outer wall through the furnace outer wall 4, and providing a large number of heat dissipating vanes 10 at the pipe end of the protrusion. The cold heat section 9 can discharge the amount of heat in the high temperature heat receiving section in the furnace to the outside at a high speed by water cooling or air cooling means.

併し、ヒートパイプ8の前記冷熱部9からの熱量放散は
、同時に炉心加熱時(炉温度上昇時)に於ける加熱効率
の低下を来すおそれがある。このため炉外部のパイプ端
9は、必要により外部加熱の補助ヒータを設けるも構わ
ない。
However, the heat dissipated from the cold section 9 of the heat pipe 8 may also cause a decrease in heating efficiency during core heating (furnace temperature rise). For this reason, the pipe end 9 outside the furnace may be provided with an auxiliary heater for external heating if necessary.

ヒートバイブ8内に充填される熱輸送媒体としては1例
えば前記例示せるウェーハ酸化処理の場合、最高120
0℃であることから水銀もしくは水を使用する。
The heat transport medium filled in the heat vibe 8 is 1, for example, in the case of the wafer oxidation treatment mentioned above, a maximum of 120
Since the temperature is 0°C, mercury or water is used.

斯くして、従来1問題とされた熱処理時の炉冷動機能が
高められ、炉降温速度として20℃/minの能力が実
現される。
In this way, the furnace cooling function during heat treatment, which has been a problem in the past, is improved, and a furnace cooling rate of 20° C./min is achieved.

〔発明の効果〕〔Effect of the invention〕

以上、詳細に説明した炉軸方向に長い均−加熱部を有す
る本発明の熱処理炉によれば、目的とするプロセス制御
の冷却能力かえられる為、これを半導体装置等の生産工
程に用いることによりその生産性を顕著に向上すること
ができる。
As described above, according to the heat treatment furnace of the present invention having a long uniform heating section in the furnace axis direction, the cooling capacity for the target process control can be changed, so that it can be used in the production process of semiconductor devices, etc. Its productivity can be significantly improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明熱処理炉の構成実施例図とする断面図。 第2図は第1図のノル−A線(折れ線)で切った炉側断
面図である。 第3図は従来の熱処理炉の断面図。 図中、1は電熱加熱体、2は筒状筐体。 3は断熱層、   4は炉外壁体。 5は冷却管、   7は炉軸部。 8はヒートパイプ。 9はヒートパイプの冷熱部である。 第7図        第2g 第3 腎
FIG. 1 is a sectional view showing an embodiment of the structure of the heat treatment furnace of the present invention. FIG. 2 is a sectional view of the furnace side taken along the Nor-A line (broken line) in FIG. 1. FIG. 3 is a cross-sectional view of a conventional heat treatment furnace. In the figure, 1 is an electric heating element, and 2 is a cylindrical casing. 3 is the heat insulation layer, 4 is the furnace outer wall. 5 is a cooling pipe, and 7 is a furnace shaft. 8 is a heat pipe. 9 is a cooling/heating part of a heat pipe. Fig. 7 Fig. 2g Third kidney

Claims (1)

【特許請求の範囲】[Claims] 炉心加熱体と該加熱体の断熱層とを内周辺に配置する筒
状筐体と、前記筒状筐体の周辺に配置された該筒状筐体
の炉心軸を共有する炉外壁体とからなる同軸二重管構成
の熱処理炉において、筒状筐体の外周もしくは炉外壁体
の内周にヒートパイプが配設され且つ炉外壁体の外部に
該ヒートパイプの冷熱端部を形成してなることを特徴と
する熱処理炉。
A cylindrical casing in which a core heating body and a heat insulating layer of the heating body are arranged around the inner periphery, and a reactor outer wall body disposed around the cylindrical casing and sharing the core axis of the cylindrical casing. In a heat treatment furnace having a coaxial double tube configuration, a heat pipe is disposed on the outer periphery of the cylindrical casing or the inner periphery of the furnace outer wall, and the cold end of the heat pipe is formed on the outside of the furnace outer wall. A heat treatment furnace characterized by:
JP12926585A 1985-06-14 1985-06-14 Heat treatment furnace Pending JPS61287226A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12926585A JPS61287226A (en) 1985-06-14 1985-06-14 Heat treatment furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12926585A JPS61287226A (en) 1985-06-14 1985-06-14 Heat treatment furnace

Publications (1)

Publication Number Publication Date
JPS61287226A true JPS61287226A (en) 1986-12-17

Family

ID=15005297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12926585A Pending JPS61287226A (en) 1985-06-14 1985-06-14 Heat treatment furnace

Country Status (1)

Country Link
JP (1) JPS61287226A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104121777A (en) * 2014-07-23 2014-10-29 泰州市艾克森电热仪表设备有限公司 Constant-temperature energy-saving electric furnace

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104121777A (en) * 2014-07-23 2014-10-29 泰州市艾克森电热仪表设备有限公司 Constant-temperature energy-saving electric furnace
CN104121777B (en) * 2014-07-23 2016-01-20 泰州市艾克森电热仪表设备有限公司 Isothermal energy-saving electric furnace

Similar Documents

Publication Publication Date Title
US5059770A (en) Multi-zone planar heater assembly and method of operation
JPH03224217A (en) Heat-treating device
JP2002158178A (en) Substrate processing apparatus and method of manufacturing semiconductor device
GB1304771A (en)
US4348580A (en) Energy efficient furnace with movable end wall
JP3471100B2 (en) Vertical heat treatment equipment
TW200405415A (en) Wafer batch processing system and method
KR20050031058A (en) Thermal treating apparatus
CN105222597A (en) A kind of horizontal diffusion furnace fast cooling body of heater
KR100712170B1 (en) Cooling device and heat treating device using the same
JPS61287226A (en) Heat treatment furnace
JP2001156008A (en) Heat treatment equipment for semiconductor wafer
TW200407946A (en) Forced convection assisted rapid thermal furnace
JP2005286051A (en) Substrate processing equipment
JPS5923464B2 (en) Semiconductor heat treatment equipment
CN108088247A (en) Furnace tube apparatus
JP3180920B2 (en) High temperature heating system for chemicals
JPH0997765A (en) Substrate processing device
JPH0770491B2 (en) Ceramics heater for heating semiconductor wafers
CN115938995B (en) Wafer heating device and semiconductor processing equipment
US11127607B2 (en) Heat processing system
JPH0534103Y2 (en)
JPH0484420A (en) Heat treatment equipment
JPS6337494B2 (en)
JP4618920B2 (en) Heater heater connection method and heat treatment apparatus