JPS61284576A - Method for controlling vacuum evaporating apparatus - Google Patents

Abstract

PURPOSE:To improve the respondense of the temp. of a bath by adding heater power calculated so as to regulate the temp. of the bath to a prescribed value to heater power corresponding to the extent of evaporation in a system for controlling the extent of evaporation and by raising the temp. of the bath. CONSTITUTION:A comparator 18 for comparing the temp. of a bath calculates heater power B so as to regulate the temp. of a bath measured by a temp. sensor 20 to a prescribed value E and outputs the heater power B. A heater power controller 13 controls heater power so that the power is made equal to the sum of heater power A corresponding to the extent of evaporation and the heater power B calculated by the comparator 18. Other factors are controlled as controlled in a conventional control system. The respondense of the temp. of the bath can be improved by the heater power B, and the temp. of the bath can be well adapted to the following change in the extent of evaporation.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は真空蒸発装置に関し、特に走行する金属ストリ
ップにメッキ材を蒸着する連続式真空蒸発装置における
蒸発量制御方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a vacuum evaporator, and more particularly to a method for controlling the amount of evaporation in a continuous vacuum evaporator that deposits a plating material onto a moving metal strip.

〔従来の技術〕[Conventional technology]

特願昭５９−１０６３９６号によれば第３図のような連
続式真空蒸発装置の蒸発槽構成例が提案されている。第
３図において、ヒータ４によって蒸発浴槽２内の金属浴
１を加熱すれば、浴温に対する飽和圧力と浴槽２上の雰
囲気圧力との差に比例して金属蒸気３が蒸発する。蒸発
した金属蒸気３は蒸気流通口５．チャンネル６を通シ巻
付ロー−／ｌ／１１を通るストリップ７に付着する。According to Japanese Patent Application No. 59-106396, an example of the construction of an evaporator tank of a continuous vacuum evaporator as shown in FIG. 3 has been proposed. In FIG. 3, when the metal bath 1 in the evaporating bath 2 is heated by the heater 4, the metal vapor 3 evaporates in proportion to the difference between the saturation pressure with respect to the bath temperature and the atmospheric pressure above the bath 2. The evaporated metal vapor 3 is passed through the vapor distribution port 5. The channel 6 is passed through and attached to the strip 7 which passes through the winding row/l/11.

そして、蒸発量は次のように制御する。金属蒸気３はヒ
ータ４による加熱量と浴槽などの壁からの放熱量との差
に見合う分だけ蒸発する。The amount of evaporation is controlled as follows. The metal vapor 3 evaporates in an amount corresponding to the difference between the amount of heating by the heater 4 and the amount of heat radiated from the wall of the bathtub or the like.

したがって、蒸発量目標値に応じてヒートバランス上決
まる必要ヒータパワを与える必要がある。そこで、演算
装置１２は蒸発量目標値（ｑに応じてヒートバランス上
必要なヒータパワ（Ａ）　全演算し、ヒータパワ制御器
１且に出力する。ところが、金属浴１の熱容量が大きい
ためヒータパワ変化に対する浴温の応答時間は非常に長
い。いいかえれば前述の金属蒸気３の飽和圧力の上昇に
時間がかかるため蒸発量の応答もおそい。そこで、蒸気
流通口５の開口面積を変えて蒸気通過流量を調整する高
応答性のシャッタ８を設け。Therefore, it is necessary to provide the necessary heater power determined by the heat balance according to the target value of evaporation amount. Therefore, the calculation device 12 calculates the heater power (A) necessary for heat balance according to the target evaporation amount (q) and outputs it to the heater power controller 1. However, since the heat capacity of the metal bath 1 is large, The response time of the bath temperature is very long. In other words, it takes time for the saturation pressure of the metal vapor 3 to rise, so the response of the evaporation amount is also slow. Therefore, the opening area of the vapor flow port 5 is changed to increase the vapor passing flow rate. A highly responsive shutter 8 is provided for adjustment.

金属浴１の蓄熱を利用して、たとえば蒸発量目標Ｍ（ｑ
が増加する場合にはシャッタ８を急速に開けることによ
って蒸発量の急速変化を実現させる。すなわち、シャッ
タ開度調節計１５によりシャツタ開度検出器１６で検出
したシャッタ開度が所定の設定値に等しくなるようにシ
ャッタ駆動装置１７でシャッタ８を操作する。演算装置
、２２は蒸発１目標値（Ｃ）に応じてシャッタ開度設定
値を演算する。また、膜厚計２３で検出したメッキ厚が
膜厚目標値（ＤＪになるように演算装置２４でシャッタ
開度設定値付加量を演算し、前述の演算装置２２の出力
と加算してシャッタ開度設定値とシテシャッタ開度調節
計１５に与える。By utilizing the heat storage in the metal bath 1, for example, the target evaporation amount M(q
When the amount of evaporation increases, the shutter 8 is opened rapidly to achieve a rapid change in the amount of evaporation. That is, the shutter 8 is operated by the shutter drive device 17 so that the shutter opening detected by the shutter opening detector 16 by the shutter opening controller 15 becomes equal to a predetermined set value. A calculation device 22 calculates a shutter opening degree setting value according to the evaporation 1 target value (C). Further, the calculation device 24 calculates the additional amount of the shutter opening setting value so that the plating thickness detected by the film thickness meter 23 becomes the film thickness target value (DJ), and adds it to the output of the calculation device 22 described above to open the shutter. The degree setting value and the shutter opening degree controller 15 are provided.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

以上の蒸発量制御系において２次の問題がある。蒸発浴
槽壁や金属浴１の熱容量があるためヒータパワ（Ａ）の
変化によって金属浴１に入る熱量の変化速度よりもシャ
ッタ開度操作による蒸発量変化、すなわち出熱量の変化
速度の方が速いため、たとえば蒸発量増加量が大きけれ
ば一時的に浴温か下ることがある。前述のように浴温は
蒸発の駆動源であるだめ、浴温か下れば蒸発量が下る。There is a secondary problem in the above evaporation amount control system. Due to the heat capacity of the evaporation bath wall and the metal bath 1, the change in the amount of evaporation due to the shutter opening, that is, the rate of change in the amount of heat output, is faster than the rate of change in the amount of heat entering the metal bath 1 due to changes in heater power (A). For example, if the amount of increase in evaporation is large, the bath temperature may drop temporarily. As mentioned above, the bath temperature is the driving source for evaporation, and the lower the bath temperature, the lower the amount of evaporation.

そこで、演算装置２２は蒸発量目標値（ｑだけでなく浴
温検出器２０で検出した浴温に応じて所期の蒸発量を得
るに必要なシャッタ開度の演算を行なう。しかし、金属
浴１などの熱容量は大きいので浴温か元にもどるには長
い時間がかかる。浴温か元にもどるまでに次の蒸発量目
標値（ｑは増加要求であればシャッタ８を現在値よシさ
らに開ける操作を行なう。これを〈シ返せば、第４図に
示すようにたとえシャック開度を１００％まで開けたと
しても、十分な熱を補なわない限り蒸発量の駆動力不足
で、必要な蒸発量が得られない事態となる。Therefore, the calculation device 22 calculates the shutter opening degree necessary to obtain the desired amount of evaporation according to not only the target value of evaporation (q) but also the bath temperature detected by the bath temperature detector 20. 1 has a large heat capacity, so it takes a long time for the bath temperature to return to its original value. Before the bath temperature returns to its original value, the next evaporation amount target value (q is an operation to open the shutter 8 further than the current value if an increase is requested) To put this in perspective, as shown in Figure 4, even if the shack is opened to 100%, unless sufficient heat is supplied, the driving force for evaporation will be insufficient and the required evaporation will not be achieved. This will result in a situation where you will not be able to obtain

〔問題点を解決するだめの手段〕[Failure to solve the problem]

本発明は上述のような従来の問題点を解消するだめに提
案するもので、蒸発槽出口に設けたシャッタで蒸発量の
瞬間的な制御を行ない１次いでと一ドパランス上の制御
をヒータパワ（Ａ）で行なう真空蒸発装置の蒸発量制御
系において。The present invention has been proposed to solve the above-mentioned conventional problems, and uses a shutter installed at the outlet of the evaporator to instantaneously control the amount of evaporation, and controls the primary and primary doparances using heater power (A). ) in the evaporation amount control system of a vacuum evaporator.

蒸発槽内の浴温を検出し、該検出値が所定値になるよう
に演算されたヒータパワ（Ｂ）を前記ヒータパワ（Ａ）
に付加することを特徴とする真空蒸発装置の制御方法で
ある。The bath temperature in the evaporation tank is detected, and the heater power (B) calculated so that the detected value becomes a predetermined value is used as the heater power (A).
This is a method for controlling a vacuum evaporator, characterized in that the method includes the following:

〔作用〕[Effect]

すなわち９本発明は浴温の高応答化をはかるため、蒸発
量に見合うヒータパワ（Ａ）にさらに浴温を所定値（均
にするべく演算されたヒータノくワ（Ｂ）を加えて浴温
を上げるものである。In other words, in order to increase the responsiveness of the bath temperature, the present invention increases the bath temperature by adding a heater power (B) calculated to equalize the bath temperature to a predetermined value (A) to the heater power (A) corresponding to the amount of evaporation. It is something to raise.

〔実施例〕〔Example〕

第１図は本発明を実現する蒸発量制御系の一構成例であ
る。第１図において、浴温比較計１８により浴温検出器
２０で検出した浴温か所定値（Ｅ）となるようにヒータ
パワ（Ｂ）を演算し、出力する。FIG. 1 shows an example of the configuration of an evaporation amount control system that implements the present invention. In FIG. 1, the heater power (B) is calculated and output by the bath temperature comparator 18 so that the bath temperature reaches a predetermined value (E) detected by the bath temperature detector 20.

演算方法はたとえば通常のＰＩＤ制御演算を行なえばよ
い。また、ヒータパワ制御器１３はヒータパワが蒸発量
に見合うヒータパワ（Ａ）と前記ヒータパワＣＢ）との
和になるように制御する。上記以外は従来の制御系と同
様である。第２図は本発明の制御法による浴温の応答を
示したものである。ヒータパワ（Ｂ）により浴温の高応
答化をはか５ことができ１次の蒸発量変化に十分備える
ことができる。The calculation method may be, for example, a normal PID control calculation. Further, the heater power controller 13 controls the heater power so that it becomes the sum of the heater power (A) corresponding to the amount of evaporation and the heater power CB). Other than the above, the control system is the same as the conventional control system. FIG. 2 shows the bath temperature response according to the control method of the present invention. Heater power (B) can increase the responsiveness of the bath temperature, making it possible to sufficiently prepare for the first-order evaporation amount change.

〔発明の効果〕〔Effect of the invention〕

以上述べたように１本発明によれば蒸発量変化に対する
シャッタの急速変化による高応答性を常時確保する際に
問題となる浴温の恰応答性が改善され、たとえば１コイ
ルごとに連続的に蒸発量の増加が要求される場合でも有
効なシャッタ開度の急変操作が可能となり高応答の蒸発
量制御が可能となる。As described above, according to the present invention, the constant response of the bath temperature, which is a problem when constantly ensuring high responsiveness due to rapid shutter changes in response to changes in evaporation amount, is improved. Even when an increase in the amount of evaporation is required, it is possible to perform an effective sudden change in the shutter opening degree, making it possible to control the amount of evaporation with high response.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明の真空蒸発装置の蒸発量制御系の例を示
す説明図、第２図は本発明の制御法による蒸発量制御例
を示すグラフ、第３図は従来の真空蒸発装置の蒸発量制
御系の例を示す説明図、第４図は従来の制御法による蒸
発量制御例を示すグラフである。 ４・・・ヒータ、８・・・シャッタ、　１２．２２．２
４・・・演算装置、１３・・・制御器、１５・・・調節
計、１６・・・検出器。 １７・・・駆動装置、１８・・・比較計、２０・・・検
出器、２３・・・膜厚計。 朝１曙引Ｄ） 栗１悶 埼聞 桶２閃 言上ｒノブキ厚（Ｄ） 第３閃Fig. 1 is an explanatory diagram showing an example of the evaporation amount control system of the vacuum evaporator of the present invention, Fig. 2 is a graph showing an example of evaporation amount control by the control method of the present invention, and Fig. 3 is an explanatory diagram showing an example of the evaporation amount control system of the vacuum evaporator of the present invention. An explanatory diagram showing an example of an evaporation amount control system, and FIG. 4 is a graph showing an example of evaporation amount control using a conventional control method. 4... Heater, 8... Shutter, 12.22.2
4... Arithmetic device, 13... Controller, 15... Controller, 16... Detector. 17... Drive device, 18... Comparator, 20... Detector, 23... Film thickness meter. Morning 1 Akeboniki D) Chestnut 1 Keisai Mumoke 2 Flash words on r Nobuki thick (D) 3rd flash

Claims (1)

【特許請求の範囲】[Claims] 蒸発槽出口に設けたシャッタで蒸発量の瞬間的な制御を
行ない、次いでヒートバランス上の制御をヒータパワ（
Ａ）で行なう真空蒸発装置の蒸発量制御系において、蒸
発槽内の浴温を検出し、該検出値が所定値になるように
演算されたヒータパワ（Ｂ）を前記ヒータパワ（Ａ）に
付加することを特徴とする真空蒸発装置の制御方法。The shutter installed at the outlet of the evaporator tank instantaneously controls the amount of evaporation, and then the heat balance is controlled by the heater power (
In the evaporation amount control system of the vacuum evaporator performed in A), the bath temperature in the evaporation tank is detected, and a heater power (B) calculated so that the detected value becomes a predetermined value is added to the heater power (A). A method for controlling a vacuum evaporator, characterized in that: