JPS6124135A - Plasma x-ray generator - Google Patents
Plasma x-ray generatorInfo
- Publication number
- JPS6124135A JPS6124135A JP14405284A JP14405284A JPS6124135A JP S6124135 A JPS6124135 A JP S6124135A JP 14405284 A JP14405284 A JP 14405284A JP 14405284 A JP14405284 A JP 14405284A JP S6124135 A JPS6124135 A JP S6124135A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- plasma
- mass
- rays
- ratio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、／４ルス放電によって高温高密度のプラズマ
を形成し、ここから放射される軟Ｘｉを利用するプラズ
マＸ線源に係り、特にプラズマフォーカスあるいはこれ
に類する装宜に関するものである。プラズマＸ線源に、
サブミクロンのＩＣをＩ１）！造するＸ、＠露光装置な
どの線源として用いられる。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a plasma X-ray source that forms a high-temperature, high-density plasma by a /4 Luss discharge and utilizes soft Xi emitted from the plasma. It relates to plasma focus or similar devices. For plasma X-ray source,
I1) submicron IC! It is used as a radiation source for X, @ exposure equipment, etc.
（従来技術）
プラズマフォーカスは、同軸状に虻されたコ本の円筒状
電極の一端をガラスなどの絶縁物で支持し、他端を開放
のまオ放電容器に収納し、水素、重水素などを封入して
、コンデンサからパルス電圧を印加し放電を起し、中性
子を発生する線源として、従来主に検討がなされてきた
。放電に際してＸ線が発生することは、公知であり、そ
の動作を診断する目的で、水素、重水素に比較的少量の
Ａｒ 等を混ぜることも行かれている。これらのこと
は、Ｗ、Ｈ，Ｂｏｓｔｌｃｋ 、 Ｖ、Ｎａｙｄｌ ａ
ｎｄ Ｗ、Ｐｒ１ｏｒ ：Ｘ−ｒａｙ ｆｉｎｅ ５
ｔｒｕｃｔｕｒｅ ｏｆ ｄｅｎｓｅ ｐｌａｓｍａ
Ｉｎ ａ ｃｏ−ａｘｌａｌ ａｃｃｅｌｅｒａｔ
ｏｒ 、Ｊ、Ｐｌａｓｍａ、Ｐｈｙｓｌｃｓ ｖｏ
ｌｇ。(Prior art) Plasma focus uses an insulating material such as glass to support one end of a coaxial cylindrical electrode, and the other end is housed in an open discharge vessel to collect hydrogen, deuterium, etc. In the past, research has mainly been conducted as a radiation source that generates neutrons by enclosing a capacitor and applying a pulse voltage from the capacitor to cause discharge. It is well known that X-rays are generated during discharge, and for the purpose of diagnosing its operation, hydrogen and deuterium are mixed with a relatively small amount of Ar, etc. These are W, H, Bostlck, V, Naydla.
nd W, Pr1or: X-ray fine 5
structure of dense plasma
In a co-axlal acceleration
or, J, Plasma, Physlcs vo.
lg.
ｐｔ ／ ＊ ｐｐワク−０＜／９クコ）に記載されて
いる。しかし、プラズマフォーカスで強い軟Ｘ線を発生
する目的をもって、混合気体に関して系統的に実験検討
がなされた例はみられず、′その特性は不明確である。pt/*pp waku-0</9 However, there have been no systematic experimental studies on mixed gases for the purpose of generating strong soft X-rays with plasma focus, and their characteristics are unclear.
（発明の目的）
本発明の目的は、気体の元素が発生する特性Ｘ線を利用
するプラズマＸ線源において、−回の放電で放射される
Ｘ線の強度を増加し、効率を改善し、線源の輝度を高め
ることにある。(Object of the Invention) The object of the present invention is to increase the intensity of the X-rays emitted in - times of discharge and improve the efficiency in a plasma X-ray source that utilizes characteristic X-rays generated by gaseous elements. The purpose is to increase the brightness of the radiation source.
（発明の構成）
上記の目的を達成するために、本゛発明はプラズマフォ
ーカスのように気体を放電管に充填して、これをプラズ
マ化し、プラズマをフォーカスあるいはピンチして、高
温高密度のプラズマを形成し、Ｘ線を発生するプラズマ
Ｘ線源において、放電管に充填する気体を、特性Ｘ＠を
放射する元素からなる主気体と、原子番号の低い元素で
構成される従気体との混合気体とし、混合気体に占める
質量の割合を主気体に光分高く従−剰体は光分低くする
ことによって、最大のｘｌｓ強度を得るものである。(Structure of the Invention) In order to achieve the above object, the present invention fills a discharge tube with gas like a plasma focus, turns it into plasma, focuses or pinches the plasma, and generates a high-temperature, high-density plasma. In a plasma X-ray source that generates The maximum XLS intensity can be obtained by setting the mass ratio of the main gas to a light amount higher and the minor mass to a light amount lower in the mixed gas.
本発明にプラズマフォーカスによるＸ線発生装置におい
て、種々の混合気体と圧力について、Ｘ線強度とフォー
カスする条件を調べた結果、二種類の混合気体では組成
（二種の気体の分圧の割合）を変えたとき、放電Ｖにつ
める気体の圧力は混合気体の質量が一定になるよう（組
成を変化しても質量が変化しないよう）ｖＩ４整した場
合に最適のフォーカスが得られるという発見と、混合気
体の質量が同じでも特に強いＸ線を放射する混合比が存
在するという発見から生まれた。ここで、主気体とはネ
オン、アルゴン、クリプトンなど、求める波長の特性Ｘ
線を放射する元素の気体を意味し、従気体とは水素、ヘ
リウムなど原子番号が低い元素の気体を意味している。As a result of investigating the X-ray intensity and focusing conditions for various gas mixtures and pressures in the X-ray generator using plasma focus according to the present invention, we found that the composition (ratio of partial pressures of two gases) of two types of gas mixtures The discovery that optimal focus can be obtained when the pressure of the gas filled in the discharge V is adjusted so that the mass of the mixed gas remains constant (so that the mass does not change even if the composition changes) when changing the It was born from the discovery that there is a mixing ratio that causes particularly strong X-rays to be emitted even if the mass of the gas mixture is the same. Here, the main gas is neon, argon, krypton, etc., with the characteristics of the desired wavelength
It refers to a gas of an element that emits radiation, and a subordinate gas refers to a gas of an element with a low atomic number, such as hydrogen or helium.
上にのべた理由から、放電管につめる混合気体の質量を
一定にして組成を変えるとすれば、主気体の重い原子を
比較的少数減ら丁ことによって、従気体の軽い原子を質
量数の比だけ多数増やすことができる。For the reasons stated above, if we change the composition while keeping the mass of the gas mixture filled in the discharge tube constant, by reducing the number of heavy atoms in the main gas by a relatively small number, the light atoms in the secondary gas will increase in mass number ratio. Only a large number can be increased.
プラズマがフォーカスするまでは、低電離であり、生気
体の原子は高々ｌ−２価イオンにしかならないので、混
合気体の質量に占める従気体の質量の割合が光分に低く
ても、フォーカスする時点呼での電子密度は大巾に増加
する。一方、求める波長の特性Ｘ線は高温の電子によっ
て主気体イオンの内殻の電子が、励起させることによっ
て生じるが、この特性Ｘ線の強度は電子密度とイオン密
度の積に比例する。従って、混合気体の質量に占める従
気体の質量の割合が主気体の質量の割合に比べ充分低く
ても一フォーカスのときのプラズマの電子温度および電
子密度の上昇により１．Ｘ線強度が最大となる最適の組
“成が存在するのである。混合気体の質ｔに対する従気
体の質量が占める割合が７５％以下であることが高輝度
Ｘ線を得るために必要な条件とされるが、３％以上で−
あることがより好ましい。Until the plasma is focused, the ionization is low, and the living gas atoms only become l-2 valent ions at most, so even if the mass ratio of the secondary gas to the mass of the gas mixture is small, it will focus. The electron density at the instant call increases greatly. On the other hand, characteristic X-rays of the desired wavelength are generated by exciting electrons in the inner shell of main gas ions by high-temperature electrons, and the intensity of these characteristic X-rays is proportional to the product of electron density and ion density. Therefore, even if the mass ratio of the secondary gas to the mass of the mixed gas is sufficiently lower than the mass ratio of the main gas, the increase in the electron temperature and electron density of the plasma during one focus will cause 1. There is an optimal composition that maximizes the X-ray intensity. A necessary condition for obtaining high-intensity X-rays is that the ratio of the mass of the secondary gas to the quality t of the gas mixture is 75% or less. However, at 3% or more -
It is more preferable that there be.
（実施例）
す、下、本発明を実施例により説明する。第１図ニ、プ
ラズマフォーカスでネオン、アルゴン、クリプトンをそ
れぞれ主気体とし、水素を従気体として、組成すなわち
混合気体の全圧力に対する生気体の分圧の割合（体積百
分率）いいかえれば混合気体の全分子数に対する主気体
の分子数の割合を変えて、最適のフォーカスを結ぶ混合
気体の全圧力を測定した結果である。同図には、組成に
対し混合気体の質量が一定となる混合気体の全圧力が実
線で示されている。測定値にほぼ実線に一致しており、
混合気体の組成を変えても、放電管につめる混合気体の
質量が一定になるように圧力を調整すれば、最適のフォ
ーカスが得られるという事実を証明している。(Example) Below, the present invention will be explained with reference to an example. Figure 1 d. With plasma focus, neon, argon, and krypton are used as the main gases, and hydrogen is used as the secondary gas. This is the result of measuring the total pressure of the mixed gas that achieves optimal focus by changing the ratio of the number of molecules of the main gas to the number of molecules. In the same figure, the total pressure of the mixed gas at which the mass of the mixed gas is constant with respect to the composition is shown by a solid line. It almost corresponds to the measured value as a solid line,
This proves that even if the composition of the gas mixture is changed, optimal focus can be obtained by adjusting the pressure so that the mass of the gas mixture filled in the discharge tube remains constant.
即ち、放電管に充填あるいは注入される気体。In other words, the gas that is filled or injected into the discharge tube.
（充填ガス）が主気体のみからなる場合において最大の
輝度を生じる際の充填ガスの質量とほぼ同一の質量にな
るように、従気体を含んだ充填ガスの圧力を調整すると
、各混合比における最大の輝度を得ることができるとい
うことが理解される。If the pressure of the filling gas containing the secondary gas is adjusted so that the mass of the filling gas that produces the maximum brightness is approximately the same as the mass of the filling gas that produces the maximum brightness when the filling gas consists only of the main gas, It is understood that maximum brightness can be obtained.
もちろん、充填ガスの質量の絶対値はコンデンサパンク
のエネルギーおよび放電空間の容積によって変化するが
、これらコンデンサパンクのエネルギー、放電空間の容
積等の装置的な条件が変化しない限りにおいて、上述し
た混合比を門化した場められた。
゛゛第２図は、第１図と同じく、ネオン、アル
コ５ン、クリプトンをそれぞれ主気体とし、水素を従気
体として、組成を変え、最適のフォーカスを結ぶ混合気
体の圧力のもとでいいかえれば、第１図の実線上の圧力
のもとで、特性Ｘ線の強度を測定したものである。特性
Ｘ線の波長は、主にネオンがにの線の／、ｌｌｇｎｍ、
アルゴンがにの線の０、’１２ｎｒｎ、クリプトンがＬ
線のθ、７ｇｎｍである。測定値は厚さが３０μｍのベ
リリウムの窓を透過したＸ線を、ｐｕｎフォトダイオー
ドで受けて、その電流を積分して求めた値である。測定
値には、かなりのバラツキが見られるし、ベリリウムの
窓の透過率は、波長によって、アルゴンが最も高く、ク
リプトンがこれにつぎ、ネオンが最も低いなどの差があ
るために、このまま相互に比較することは適切でにない
が、それぞれの混合気体でｘｇ強度が最大になる組成が
あることがわかる。その組成は、この測定結果から見る
限り、ネオンが７０％、アルゴンがダθ％、クリプトン
が２Ｓ％となっている。Of course, the absolute value of the mass of the filling gas changes depending on the energy of the capacitor puncture and the volume of the discharge space, but as long as the equipment conditions such as the energy of the capacitor puncture and the volume of the discharge space do not change, the above-mentioned mixing ratio He was criticized for making it a gate.
゛゛Figure 2, like Figure 1, uses neon, alkone, and krypton as the main gases, and hydrogen as the subordinate gas, changing the composition and adjusting the pressure of the mixture to achieve the optimal focus. , the intensity of characteristic X-rays was measured under the pressure indicated by the solid line in FIG. The wavelength of characteristic X-rays is mainly neon radiation /, llgnm,
Argon crab line 0, '12nrn, krypton is L
The line θ is 7 gnm. The measured value was obtained by receiving X-rays transmitted through a beryllium window with a thickness of 30 μm by a PUN photodiode, and integrating the current. There is considerable variation in the measured values, and the transmittance of beryllium windows varies depending on the wavelength, with argon being the highest, krypton being the second, and neon being the lowest. Although it is not appropriate to compare, it can be seen that there is a composition in which the xg intensity is maximum for each gas mixture. As far as the results of this measurement are concerned, its composition is 70% neon, Daθ% argon, and 2S% krypton.
この組成は、混合気体の全分子数に対する主気体の分子
量の割合であるから、各気体の分子量を考脆して混合気
体の質量に占める主気体の質量の割合を計算すると、ネ
オンでは９６％、アルゴンでｔｒＪｑ３％、クリプトン
ではｑ３にとなる。このように、プラズマフォーカスあ
るいはこれに類するプラズマＸ線源において、特性Ｘ線
を放射する元素からなる主気体と、原子番号の低い元素
か、らなる従気体との混合気体を使用し、混合気体の質
量に従気体の質量が占める割合を光分に低くすることに
よって、最大のｘ＃Ｊ強度が得られる。このように、本
発明を実施することによって得られるＸ線の強度に主気
体のみによる場合に比べて、２倍あるいはそれ以上にな
ることが第２図から明らかである。This composition is the ratio of the molecular weight of the main gas to the total number of molecules of the mixed gas, so if we consider the molecular weight of each gas and calculate the ratio of the mass of the main gas to the mass of the mixed gas, it is 96% for neon. , trJq3% for argon and q3 for krypton. In this way, in a plasma focus or a similar plasma X-ray source, a mixture of a main gas consisting of an element that emits characteristic X-rays and a secondary gas consisting of an element with a low atomic number is used. The maximum x#J intensity can be obtained by reducing the proportion of the mass of the secondary gas to the mass of . As described above, it is clear from FIG. 2 that the intensity of X-rays obtained by implementing the present invention is twice or more than that obtained by using only the main gas.
また、第２図からはＸ線輝度増大の効果を得られる混合
気体の質量に対する従気体の質量が占める割合に７５％
以下であることがわかるが、この割合は３″Ｘ以上であ
ることがＸ線輝度増大の効果の点からより好ましい。In addition, from Figure 2, it can be seen that the mass of the secondary gas accounts for 75% of the mass of the mixed gas, which provides the effect of increasing X-ray brightness.
Although it can be seen that the ratio is below, it is more preferable that this ratio is 3″X or more from the viewpoint of the effect of increasing the X-ray brightness.
なお、主気体および従気体はいずれも複数の種゛−の元
素からなるものであってもよく、この場合においても、
上述した質量の関係および生気体と従気体の混合関係を
満足するものであれば、高輝度Ｘ線を得られることも見
い出された。In addition, both the main gas and the subordinate gas may be composed of a plurality of types of elements, and in this case,
It has also been found that high-intensity X-rays can be obtained as long as the above-mentioned mass relationship and mixing relationship between living gas and secondary gas are satisfied.
（発明の効果）
以上にのべたごとく、本発明によれば、プラズマフォー
カスのように気体を充填あるいは注入して、これをプラ
ズマ化し、プラズマをピンチあるいはフォーカスしてＸ
線を発生するプラズマＸ線源において、充填あるいは注
入する気体を、特性Ｘ線を発生する元素からなる生気体
と、原子番号の低い元素からなる従気体の混合気体とし
、混合気体に占める主気体の質量の割合を光分大きく、
従気体の質量の割合を充分に低くした組成において、発
生するＸ線の強度を最大にできることが明らかである。(Effects of the Invention) As described above, according to the present invention, gas is filled or injected like a plasma focus, the gas is turned into plasma, the plasma is pinched or focused, and the
In a plasma X-ray source that generates rays, the gas to be filled or injected is a mixture of a live gas consisting of an element that generates characteristic X-rays and a secondary gas consisting of an element with a low atomic number, and the main gas accounts for the main gas in the mixture. The proportion of the mass of is increased by the amount of light,
It is clear that the intensity of the generated X-rays can be maximized at a composition in which the proportion of the mass of the secondary gas is sufficiently low.
このようにして得られるＸ線の強度は生気体のみの場合
に比べて一倍あるいはそれ以上に及ぶことが明らかであ
る。′It is clear that the intensity of the X-rays obtained in this way is one or more times that of the case of only living gas. ′
第１図は本発明の一実施例について混合気体の組成と最
適のフォーカスを結ぶ混合気体の全圧力の関係を示すグ
ラフ、第２図は本発明の一実施例において、混合気体の
組成と発生するＸ線の強度の関係を示すグラフである。
第１図FIG. 1 is a graph showing the relationship between the composition of the gas mixture and the total pressure of the gas mixture that connects the optimum focus in one embodiment of the present invention, and FIG. It is a graph showing the relationship between the intensity of X-rays. Figure 1
Claims (3)
注入し、電極間に高電圧パルスを印加して、気体をプラ
ズマ化し、プラズマをピンチあるいはフォーカスしてＸ
線を発生するプラズマＸ線発生装置において、 充填あるいは注入される気体は、特性Ｘ線を放射する元
素からなる主気体と、この主気体よりも小さい原子番号
を有する元素からなる従気体との混合気体であり、混合
気体の質量に対する従気体の質量が占める割合が１５％
以下であることを特徴とするプラズマＸ線発生装置。(1) Fill or inject gas into a sealed space containing electrodes, apply a high voltage pulse between the electrodes to turn the gas into plasma, and pinch or focus the plasma to
In a plasma X-ray generator that generates rays, the gas that is filled or injected is a mixture of a main gas consisting of an element that emits characteristic X-rays and a secondary gas consisting of an element with an atomic number smaller than that of the main gas. It is a gas, and the mass of the secondary gas accounts for 15% of the mass of the mixed gas.
A plasma X-ray generator characterized by the following:
占める割合が３％以上であることを特徴とする特許請求
の範囲第（１）項記載のプラズマＸ線発生装置。(2) The plasma X-ray generating apparatus according to claim (1), wherein a ratio of the mass of the secondary gas to the mass of the mixed gas is 3% or more.
ちの少なくとも一種を用いることを特徴とする特許請求
の範囲第（１）項または第（２）項記載のプラズマＸ線
発生装置。(3) The plasma X-ray generator according to claim 1 or 2, wherein at least one of neon, argon, and krypton is used as the main gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14405284A JPS6124135A (en) | 1984-07-11 | 1984-07-11 | Plasma x-ray generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14405284A JPS6124135A (en) | 1984-07-11 | 1984-07-11 | Plasma x-ray generator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6124135A true JPS6124135A (en) | 1986-02-01 |
Family
ID=15353192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14405284A Pending JPS6124135A (en) | 1984-07-11 | 1984-07-11 | Plasma x-ray generator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6124135A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999048343A1 (en) * | 1998-03-18 | 1999-09-23 | Plex Llc | Z-pinch soft x-ray source using diluent gas |
| WO2002076157A1 (en) * | 2001-03-15 | 2002-09-26 | Safe Food Technologies, Inc. | X-ray method, system, and apparatus |
| US6630799B2 (en) | 2001-03-15 | 2003-10-07 | Safe Food Technologies, Inc. | Resonant power supply and apparatus for producing vacuum arc discharges |
-
1984
- 1984-07-11 JP JP14405284A patent/JPS6124135A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999048343A1 (en) * | 1998-03-18 | 1999-09-23 | Plex Llc | Z-pinch soft x-ray source using diluent gas |
| US6075838A (en) * | 1998-03-18 | 2000-06-13 | Plex Llc | Z-pinch soft x-ray source using diluent gas |
| WO2002076157A1 (en) * | 2001-03-15 | 2002-09-26 | Safe Food Technologies, Inc. | X-ray method, system, and apparatus |
| US6630799B2 (en) | 2001-03-15 | 2003-10-07 | Safe Food Technologies, Inc. | Resonant power supply and apparatus for producing vacuum arc discharges |
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| Beg et al. | Effect of insulator sleeve material on neutron emission from a plasma focus | |
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| Gill et al. | Soft X-ray measurements of the impurity density in DITE | |
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| Kitaoka et al. | Enhanced soft X-ray emission in a dense plasma focus with additional high Z gas puff | |
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| Austin et al. | Analysis of positive ions in CO2 gas laser systems | |
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