JPS61224254A - Charged particle beam device - Google Patents
Charged particle beam deviceInfo
- Publication number
- JPS61224254A JPS61224254A JP60064852A JP6485285A JPS61224254A JP S61224254 A JPS61224254 A JP S61224254A JP 60064852 A JP60064852 A JP 60064852A JP 6485285 A JP6485285 A JP 6485285A JP S61224254 A JPS61224254 A JP S61224254A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- charged particle
- particle beam
- voltage
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、荷電粒子を試料上に正確にフォーカスさせる
ことができるイオンマイクロアナライザ等の如き荷電粒
子線装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a charged particle beam device such as an ion microanalyzer that can accurately focus charged particles onto a sample.
［従来の技術］
イオンマイクロアナライザ等においては、イオン源から
のイオンを加速し、アインツエル型等の静電レンズによ
って該イオンビームを試料上に細く収束するようにして
いる。該静電レンズに印加される電圧はイオンビームの
加速電圧にリンクしており、該加速電圧を変化させた場
合にもイオンビームが正確に試料に収束されるように構
成している。該試料へのイオンビームの照射に基づいて
該試料から発生した２次イオンは質量分析計に導かれて
分析される。[Prior Art] In an ion microanalyzer or the like, ions from an ion source are accelerated and the ion beam is narrowly focused onto a sample using an electrostatic lens such as an Einzel type. The voltage applied to the electrostatic lens is linked to the acceleration voltage of the ion beam, and the ion beam is configured to be accurately focused on the sample even when the acceleration voltage is changed. Secondary ions generated from the sample upon irradiation of the sample with the ion beam are guided to a mass spectrometer and analyzed.
［発明が解決しようとする問題点］
通常、該質量分析計の前部には、イオン収集電極が配置
され、該試料からの２次イオンを該分析側内に導くよう
にしているが、該試料の電位は通常接地電位であり、該
試料表面から飛び出ず２次イオンのエネルギは比較的弱
く効率的に該分析計に導くことができない。このことは
イオンマイクロアナライザのみならず、走査電子顕微鏡
においても同様であり、試料への電子線の照射に基づい
て発生する２次電子を効率的に成る方向に収集すること
はなかなか困難である。[Problems to be Solved by the Invention] Usually, an ion collection electrode is placed at the front of the mass spectrometer to guide secondary ions from the sample into the analysis side. The potential of the sample is usually ground potential, and the energy of secondary ions that do not jump out of the sample surface is relatively weak and cannot be efficiently guided to the analyzer. This is true not only for ion microanalyzers but also for scanning electron microscopes, and it is quite difficult to efficiently collect secondary electrons generated when a sample is irradiated with an electron beam.
このため、該試料に電圧を印加し、該試料から発生する
２次イオン、２次電子等のエネルギを高くし、効率的に
イオ゛ン分析系、イオン検出器あるいは２次電子検出器
にイオン、電子を導くことが考えられる。しかしながら
、試料に電圧を印加するとビームポテンシャル（加速電
圧−試料電圧）が変動し、１次ビームはもはや正確に試
料上でフォーカスされなくなる。Therefore, by applying a voltage to the sample and increasing the energy of secondary ions, secondary electrons, etc. generated from the sample, ions can be efficiently transferred to the ion analysis system, ion detector, or secondary electron detector. , it is possible to guide electrons. However, applying a voltage to the sample changes the beam potential (acceleration voltage - sample voltage) and the primary beam is no longer accurately focused on the sample.
このため、試料に印加する電圧と荷電粒子線の加速電圧
の差電圧に応じて荷電粒子線の収束レンズを制御し、試
料上に荷電粒子線をフォーカスさせることも行われてい
るが、その場合でも、接地電圧で加速された荷電粒子線
は試料に印加された高電圧によって減速されるため、レ
ンズアクションを受け、収束性が損われてしまう。For this reason, the charged particle beam is focused on the sample by controlling the converging lens of the charged particle beam according to the voltage difference between the voltage applied to the sample and the accelerating voltage of the charged particle beam. However, since the charged particle beam accelerated by the ground voltage is decelerated by the high voltage applied to the sample, it is subject to lens action and convergence is impaired.
本発明は上述した点に鑑みてなされたもので、試料に電
圧を印加して試料からのイオン、電子のエネルギを高く
してイオン、電子等の収集効率を良くすることを基本と
し、試料に電圧を印加した際にも正確に試料上に１次ビ
ームを正確にフォーカスすることのできる荷電粒子線装
置を提供することを目的としている。The present invention has been made in view of the above points, and is based on applying a voltage to the sample to increase the energy of ions and electrons from the sample to improve the collection efficiency of ions and electrons. It is an object of the present invention to provide a charged particle beam device that can accurately focus a primary beam onto a sample even when a voltage is applied.
［問題点を解決するための手段］
本発明に基づく荷電粒子線装置は、荷電粒子源と、該荷
電粒子源から発生した荷電粒子を加速するための加速電
極と、該荷電粒子源と加速電極との間に高電圧を印加す
るだめの加速電源と、該加速された荷電粒子線を試料上
に細く収束するための収束レンズと、該試料に高電圧を
印加するための手段と、該収束レンズと該試料との間に
設けられ、該試料への高電圧の印加に基づく荷電粒子線
の収束の乱れを補正するための補正レンズとを備えたこ
とを特徴としている。[Means for Solving the Problems] A charged particle beam device based on the present invention includes a charged particle source, an accelerating electrode for accelerating charged particles generated from the charged particle source, and the charged particle source and the accelerating electrode. an accelerating power source for applying a high voltage between the two, a converging lens for converging the accelerated charged particle beam onto a sample, a means for applying a high voltage to the sample, and a converging lens for narrowly converging the accelerated charged particle beam onto the sample; The present invention is characterized by comprising a correction lens provided between the lens and the sample for correcting disturbances in convergence of the charged particle beam due to application of high voltage to the sample.
［作用］
荷電粒子線が照射される試料には電圧が印加され、試料
からのイオンあるいは電子のエネルギは高くされてそれ
らの収集効率の向上がはかられる。[Function] A voltage is applied to the sample to which the charged particle beam is irradiated, and the energy of ions or electrons from the sample is increased to improve their collection efficiency.
該荷電粒子線を収束する収束レンズと試料の間には、補
正レンズが設けられ、この補正レンズに該試料への印加
電圧より低い電圧が印加される。この結果、試料近傍の
電界が緩和され、荷電粒子線は徐々に減速され、試料の
極く近傍で急速に減速されることがないため、１次荷電
粒子線の収束性が高められる。A correction lens is provided between the converging lens that converges the charged particle beam and the sample, and a voltage lower than the voltage applied to the sample is applied to the correction lens. As a result, the electric field in the vicinity of the sample is relaxed, the charged particle beam is gradually decelerated, and the convergence of the primary charged particle beam is improved because it is not rapidly decelerated in the very vicinity of the sample.
［実施例］ 以下本発明の一実施例を添附図面に基づいて詳述する。[Example] An embodiment of the present invention will be described in detail below with reference to the accompanying drawings.
添付図面は本発明に基づくイオンマイクロアナライザを
示しており、１はイオン発生エミッタ。The accompanying drawings show an ion microanalyzer based on the present invention, in which 1 is an ion generating emitter.
２はイオン引出し電極、３は引出されたイオンを加速す
るための接地電位の加速電極であり、該エミッタ１と加
速型ｔｔｉ３との間には、加速電源４から例えば、１０
０ｋＶの電圧が印加されている。該加速されたイオンは
収束レンズ５．最終段収束レンズ（対物レンズ）６によ
って、光軸に対し４５６傾けて配置された分析試料７上
に細く収束される。2 is an ion extraction electrode; 3 is an acceleration electrode at a ground potential for accelerating the extracted ions; for example, 10
A voltage of 0 kV is applied. The accelerated ions pass through a converging lens 5. The final stage converging lens (objective lens) 6 narrowly converges the light onto the analysis sample 7 arranged at an angle of 456 with respect to the optical axis.
該収束レンズ５．対物レンズ６は共にアインツエル型の
静電レンズであり、該収束レンズ６には収束レンズ電源
８から電圧が印加され、該対物レンズ６には対物レンズ
電＋１ｉ９から電圧が印加されている。該試料７へのイ
オンビームの照射に基づいて発生した２次イオンは、イ
オン収集電極１０によって質量分析計１１に導かれる。The converging lens5. Both objective lenses 6 are Einzel-type electrostatic lenses, and a voltage is applied to the convergent lens 6 from a convergent lens power supply 8, and a voltage is applied to the objective lens 6 from an objective lens power supply +1i9. Secondary ions generated upon irradiation of the sample 7 with the ion beam are guided to a mass spectrometer 11 by an ion collection electrode 10.
該試料７には高圧電Ｉｔ！１２から、例えば３０ｋＶの
電圧が印加されており、該試料から発生した２次イオン
は高いエネルギを有することになり、質量分析計の方向
に勢い良く進行する。該加速電極４からの加速電圧に対
応した信号と、高圧電源１２からの試＃１電圧に対応し
た信号は演算回路１３に供給され、該演算回路１３によ
ってその差電圧が求められる。The sample 7 has a high voltage electric It! 12, a voltage of 30 kV, for example, is applied, and the secondary ions generated from the sample have high energy and move vigorously toward the mass spectrometer. The signal corresponding to the accelerating voltage from the accelerating electrode 4 and the signal corresponding to the test #1 voltage from the high-voltage power supply 12 are supplied to an arithmetic circuit 13, and the arithmetic circuit 13 determines the difference voltage between them.
該差電圧は制御回路１４に供給されるが、該制御回路１
４は供給される差電圧に応じて収束レンズ電８！８と対
物レンズ雷？１ｉｉｉ９を制御する。尚、試料７上のイ
オンビームの照射、位置は静電偏向板１５に印加される
偏向電源１６がらの電圧に応じて変えられる。The differential voltage is supplied to the control circuit 14, but the control circuit 1
4 is a converging lens electric 8!8 and an objective lens lightning depending on the supplied voltage difference? Control 1iii9. Note that the irradiation and position of the ion beam on the sample 7 can be changed according to the voltage from the deflection power source 16 applied to the electrostatic deflection plate 15.
更に、該試料７の周囲には、補正レンズを構成する２枚
の電極１７．１８が設けられている。該電極１７には電
源１２から試料７への印加電圧と等しい電圧が印加され
、又、該電極１８には該電源１２からの電圧を抵抗１９
．２０によって分割された電圧、例えば、１５ｋＶが印
加されている。Furthermore, two electrodes 17 and 18 constituting a correction lens are provided around the sample 7. A voltage equal to the voltage applied to the sample 7 from the power source 12 is applied to the electrode 17, and the voltage from the power source 12 is applied to the electrode 18 through a resistor 19.
．． A voltage divided by 20, for example 15 kV, is applied.
該電極１７．１８は光軸Ｏに沿って荷電粒子線の通過口
１７ａ、１８ａを有しているが、該通過口１７ａの径は
、通過口１８ａの径に比べて小さくされている。更に、
該電極１７．１８は、質Ｍ分析計１１に向う２次イオン
の光路に沿って２次イオンの通過口１７ｂ、１８ｂを有
しているが、該通過口１７ｂの径は、通過口１８ｂの径
に比べて大きくされている。The electrodes 17, 18 have passage holes 17a, 18a for the charged particle beam along the optical axis O, and the diameter of the passage holes 17a is smaller than the diameter of the passage hole 18a. Furthermore,
The electrodes 17 and 18 have secondary ion passage ports 17b and 18b along the secondary ion optical path toward the quality M analyzer 11, and the diameter of the passage hole 17b is equal to that of the passage hole 18b. It is larger than the diameter.
上述した如き構成において、エミッタ１から発生し、加
速電圧１００ｋＶによって加速されたイオンビームは、
収束レンズ５と対物レンズ６によって収束される。該試
料７には３０ｋＶの高電圧が印加されており、該試料へ
のイオンビームの照射に基づいて該試料から発生した２
次イオンは、勢い良く質量分析計１１の方向に進行する
ことから、効率良く該分析計内にイオンを導くことがで
きる。In the configuration as described above, the ion beam generated from the emitter 1 and accelerated by an acceleration voltage of 100 kV is
It is converged by a converging lens 5 and an objective lens 6. A high voltage of 30 kV is applied to the sample 7, and 2
Since the next ions move vigorously toward the mass spectrometer 11, the ions can be efficiently guided into the spectrometer.
ここで、加速電源４からの加速電圧に応じた信号と電源
１２からの試料電圧に応じた信号とは、演算回路１３に
供給され、両信号の差信号が求められる。該差信号は制
御回路１４に供給されるが、該制御回路内には、加速電
圧と試料電圧との間の各差電圧に応じた最適な収束レン
ズ電圧、対物レンズ電圧がテーブルの形で記憶されてお
り、該制御回路は、該供給される差信号に基づいて該チ
ープルから両レンズの電圧信号を読み出し、この電圧信
号に基づいて収束レンズ電源８と対物レンズ電源９を制
ｔｉｌｌする。その結果、該収束レンズ５と対物レンズ
６には、イオンビームの加速電圧と試料７に印加される
高電圧の値に応じた、イオンビームを該試料上に正確に
フォーカスさせ得る最適な電圧が印加される。Here, the signal corresponding to the accelerating voltage from the accelerating power supply 4 and the signal corresponding to the sample voltage from the power supply 12 are supplied to an arithmetic circuit 13, and a difference signal between the two signals is obtained. The difference signal is supplied to the control circuit 14, in which the optimum converging lens voltage and objective lens voltage corresponding to each difference voltage between the accelerating voltage and the sample voltage are stored in the form of a table. The control circuit reads voltage signals of both lenses from the temple based on the supplied difference signal, and controls the converging lens power source 8 and the objective lens power source 9 until based on this voltage signal. As a result, the converging lens 5 and the objective lens 6 are provided with an optimal voltage that can accurately focus the ion beam onto the sample, depending on the acceleration voltage of the ion beam and the high voltage applied to the sample 7. applied.
さて、収束レンズ５と対物レンズ６に最適な電圧が印加
されても、荷電粒子線は高電圧が印加された試料に接近
する従って急速に減速され、この減速電場にＪ：るレン
ズアクションによって収束性が損われることは前に述べ
た。そのため、この実施例では、試料７の前面に補正レ
ンズを構成する２枚の電極１７．１８を設け、該電極に
試料電圧より低い電圧を印加することによって試料近傍
の電界を緩和し、イオンビームを徐々に減速して急激な
発散を防止し、減速電場によるイオンビームの収束性の
悪化を防止している。更に、該電極１７の１次イオンビ
ーム通過ロ１７ａの径は電極１８の１次イオンビーム通
過口１８ａの径に比べて小さくされており、この１次イ
オンビーム通過口の近傍には、図中点線で示す如きすり
ばち状の電界が形成される。この結果、該１次イオンビ
ームは、試料に印加された高電圧によってレンズアクシ
ョンを受けて発散する分、該すりばち状電界によって収
束され、該イオンビームは極めて細く試料上にフォーカ
スされる。更に、該２枚の電極１７．１８の２次イオン
通過口１７ｂ、１８ｂの近傍には、該通過口１７ｂの径
が通過口１８ｂの径より大きいために、図中点線で示す
すりばち状電界が形成されることから、試料７から発生
した２次イオンは該電界によって収束され、効率良く質
量分析計１１に導かれる。Now, even if an optimal voltage is applied to the converging lens 5 and the objective lens 6, the charged particle beam is rapidly decelerated as it approaches the sample to which a high voltage is applied, and is converged by the lens action caused by this decelerating electric field. I mentioned earlier that sexuality is impaired. Therefore, in this embodiment, two electrodes 17 and 18 constituting a correction lens are provided in front of the sample 7, and by applying a voltage lower than the sample voltage to the electrodes, the electric field near the sample is relaxed, and the ion beam is The ion beam is gradually decelerated to prevent sudden divergence, thereby preventing deterioration of the convergence of the ion beam due to the deceleration electric field. Further, the diameter of the primary ion beam passage hole 17a of the electrode 17 is made smaller than the diameter of the primary ion beam passage hole 18a of the electrode 18, and in the vicinity of this primary ion beam passage hole there is a A cone-shaped electric field is formed as shown by the dotted line. As a result, the primary ion beam is diverged by the lens action due to the high voltage applied to the sample, and is focused by the cone-like electric field, so that the ion beam is focused very narrowly onto the sample. Furthermore, near the secondary ion passage ports 17b and 18b of the two electrodes 17 and 18, a cone-shaped electric field is generated as shown by the dotted line in the figure because the diameter of the passage hole 17b is larger than the diameter of the passage hole 18b. Because of this formation, secondary ions generated from the sample 7 are focused by the electric field and efficiently guided to the mass spectrometer 11.
尚、上述した補正レンズを構成する電極は２枚である必
要はなく、１枚あるいは３枚以上であっても良い。又、
各電極に印加する電圧値は、上述した値に限定されず、
加速電圧や試料との間の距離等に応じて任意に変えても
良く、むしろ、イオンビームを最適にフォーカスさせる
ために、該電圧値を調整し得るように構成することは望
ましい。Note that the number of electrodes constituting the above-mentioned correction lens does not need to be two, and may be one or three or more. or,
The voltage value applied to each electrode is not limited to the above values,
It may be arbitrarily changed depending on the accelerating voltage, the distance to the sample, etc., but it is preferable to configure the voltage value so that it can be adjusted in order to optimally focus the ion beam.
更に、補正レンズの形状は図示の形状に限定されない。Furthermore, the shape of the correction lens is not limited to the illustrated shape.
例えば、２次イオンの取出し方向に、２次イオン通過口
を有した電極１７．１８を設けることは必ずしも必要で
はなく、２次イオンは試料に印加した電圧のみ、あるい
は収集電極等の補助的手段とによって分析計あるいは検
出器に導くようにしても良い。For example, it is not necessarily necessary to provide an electrode 17, 18 with a secondary ion passage port in the direction in which the secondary ions are taken out, and the secondary ions can be collected only by the voltage applied to the sample, or by auxiliary means such as a collecting electrode. It may also be guided to an analyzer or detector by
このように、上述した実施例では、試料への高電圧の印
加にもかかわらず、試料へ正確にイオンビームをフＡ−
カスさせることができ、試料の微細部分の分析を行うこ
とができる。尚、本発明は上述し実施例に限定されるこ
となく幾多の変形が可能である。例えば、イオンを質量
分析計に導く場合を例に本発明を説明したが、２次イオ
ンをマイクロチャンネルプレートによって検出すると共
に、試料上のイオンビームの照射位置を走査し、走査イ
オン像を表示する装置に本発明を適用することができる
。又、試料にイオンを照射し、試料からの２次電子を検
出して２次電子像を表示する装置にも本発明を適用する
ことができるが、その場合、試料へは負の高電圧が印加
される。更に、走査電子顕微鏡等の電子線を電磁レンズ
によって収束するタイプの荷電粒子線装置に本発明を適
用しても良い。更に又、本発明は、単に２次イオンや２
次電子の収集効率を向上させる目的で試料に電圧を印加
する場合にのみ適用されるものではなく、各種電圧を印
加させた状態での試料の観察。In this way, in the embodiment described above, the ion beam can be accurately focused on the sample despite the application of a high voltage to the sample.
This allows analysis of minute parts of the sample. Note that the present invention is not limited to the embodiments described above, and can be modified in many ways. For example, the present invention has been explained using a case in which ions are guided to a mass spectrometer, but secondary ions are detected by a microchannel plate, and the irradiation position of the ion beam on the sample is scanned to display a scanned ion image. The present invention can be applied to devices. The present invention can also be applied to a device that irradiates a sample with ions, detects secondary electrons from the sample, and displays a secondary electron image, but in that case, a high negative voltage is applied to the sample. applied. Furthermore, the present invention may be applied to a type of charged particle beam device such as a scanning electron microscope in which an electron beam is focused by an electromagnetic lens. Furthermore, the present invention simply uses secondary ions and secondary ions.
It is not only applied when voltage is applied to the sample for the purpose of improving the collection efficiency of secondary electrons, but also observation of the sample with various voltages applied.
分析を行うために試料に電圧を印加する場合にも本発明
を適用することができる。The present invention can also be applied to the case where a voltage is applied to a sample for analysis.
［効果］
以上詳述した如く、本発明によれば、試料への高電圧の
印加にもかかわらず、正確に試料上に荷電粒子線をフォ
ーカスさせることができる。又、２次荷電粒子線を特定
の方向に導く事が出来る。[Effects] As described in detail above, according to the present invention, a charged particle beam can be accurately focused on a sample despite the application of a high voltage to the sample. Furthermore, the secondary charged particle beam can be guided in a specific direction.
添付図面は本発明の一実施例であるイオンマイクロアナ
ライザを示す図である。
１・・・イオン発生エミッタ
２・・・イオン引出し電極
３・・・加速電極 ４・・・加速電源５・・・収
束レンズ ６・・・対物レンズ７・・・試料
８・・・収束レンズ電源
９・・・対物レンズ電源
１０・・・イオン収集電極
１１・・・質量分析計 １２・・・高電圧電源１３・
・・演算回路 １４・・・制御回路１５・・・静電
偏向板 １６・・・偏向電源１７、’１８・・・電極The accompanying drawing is a diagram showing an ion microanalyzer that is an embodiment of the present invention. 1... Ion generation emitter 2... Ion extraction electrode 3... Accelerating electrode 4... Acceleration power source 5... Converging lens 6... Objective lens 7... Sample 8... Converging lens power source 9...Objective lens power supply 10...Ion collection electrode 11...Mass spectrometer 12...High voltage power supply 13.
... Arithmetic circuit 14 ... Control circuit 15 ... Electrostatic deflection plate 16 ... Deflection power supply 17, '18 ... Electrode
Claims (4)
子を加速するための加速電極と、該荷電粒子源と加速電
極との間に高電圧を印加するための加速電源と、該加速
された荷電粒子線を試料上に細く収束するための収束レ
ンズと、該試料に高電圧を印加するための手段と、該収
束レンズと該試料との間に設けられ、該試料への高電圧
の印加に基づく荷電粒子線の収束の乱れを補正するため
の補正レンズとを備えた荷電粒子線装置。(1) A charged particle source, an acceleration electrode for accelerating charged particles generated from the charged particle source, an acceleration power supply for applying a high voltage between the charged particle source and the acceleration electrode, and the acceleration a converging lens for finely converging the charged particle beam onto the sample; a means for applying a high voltage to the sample; and a means provided between the converging lens and the sample to apply the high voltage to the sample. A charged particle beam device comprising a correction lens for correcting disturbance in convergence of a charged particle beam due to application of the charged particle beam.
くとも２枚の電極より成り、収束レンズ側の電極の荷電
粒子線通過口の大きさは、試料側のそれに比べて大きく
されている特許請求の範囲第１項記載の荷電粒子線装置
。(2) The correction lens consists of at least two electrodes each having a charged particle beam passage opening, and the size of the charged particle beam passage opening of the electrode on the converging lens side is larger than that on the sample side. A charged particle beam device according to claim 1.
子線の収束作用も兼ねている特許請求の範囲第１〜２項
記載の荷電粒子線装置。(3) The charged particle beam device according to any one of claims 1 to 2, wherein the correction lens also functions to converge the secondary charged particle beam generated from the sample.
少なくとも２枚の電極より成り、試料側の電極の２次荷
電粒子線通過口の大きさは、その外側の電極の２次荷電
粒子線通過口の大きさに比べて大きくされている特許請
求の範囲第３項記載の荷電粒子線装置。(4) The correction lens is composed of at least two electrodes each having a secondary charged particle beam passage opening, and the size of the secondary charged particle beam passage opening of the electrode on the sample side is the same as that of the secondary charged particle beam passage of the outer electrode. The charged particle beam device according to claim 3, which is larger than the size of the charged particle beam passage opening.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60064852A JPS61224254A (en) | 1985-03-28 | 1985-03-28 | Charged particle beam device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60064852A JPS61224254A (en) | 1985-03-28 | 1985-03-28 | Charged particle beam device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61224254A true JPS61224254A (en) | 1986-10-04 |
Family
ID=13270136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60064852A Pending JPS61224254A (en) | 1985-03-28 | 1985-03-28 | Charged particle beam device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61224254A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63216257A (en) * | 1987-03-04 | 1988-09-08 | Jeol Ltd | Ion beam device |
| JPH0218848A (en) * | 1988-07-06 | 1990-01-23 | Jeol Ltd | Charged particle beam device |
-
1985
- 1985-03-28 JP JP60064852A patent/JPS61224254A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63216257A (en) * | 1987-03-04 | 1988-09-08 | Jeol Ltd | Ion beam device |
| JPH0582695B2 (en) * | 1987-03-04 | 1993-11-22 | Nippon Electron Optics Lab | |
| JPH0218848A (en) * | 1988-07-06 | 1990-01-23 | Jeol Ltd | Charged particle beam device |
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