JPS61211820A - Magnetic recording medium - Google Patents

Magnetic recording medium

Info

Publication number
JPS61211820A
JPS61211820A JP5273485A JP5273485A JPS61211820A JP S61211820 A JPS61211820 A JP S61211820A JP 5273485 A JP5273485 A JP 5273485A JP 5273485 A JP5273485 A JP 5273485A JP S61211820 A JPS61211820 A JP S61211820A
Authority
JP
Japan
Prior art keywords
film
layer
carbonized
resin
compd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5273485A
Other languages
Japanese (ja)
Inventor
Atsutaka Yamaguchi
山口 温敬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxell Ltd
Original Assignee
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Maxell Ltd filed Critical Hitachi Maxell Ltd
Priority to JP5273485A priority Critical patent/JPS61211820A/en
Publication of JPS61211820A publication Critical patent/JPS61211820A/en
Pending legal-status Critical Current

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  • Lubricants (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To improve durability by forming a thin ferromagnetic metallic film on a substrate, forming a film consisting of an org. compd. of a resin, etc. on the thin ferromagnetic metallic film and carbonizing the surface of the film by a method for implanting ions, etc. thereby providing a top coat layer consisting of the org. compd. having the carbonized surface. CONSTITUTION:The C-C bond on the film surface consisting of the org. compd. of the resin, etc. is severed by high energy ions and the carbonized amorphous carbon is formed when the ions are implanted to the film consisting of the org. compd. of the resin, etc. formed on the thin ferromagnetic metallic film layer by using an ion implanting device in a vacuum atmosphere. The carbonized layer is thus formed. The carbonized layer consisting of the amorphous carbon formed on the surface of the film consisting of the org. compd. of the resin, etc. is hard and has a lubricating function as well and therefore if the top coat layer consisting of the org. compd. formed with the carbonized layer on the surface is provided on the thin ferromagnetic metallic film layer, the wear resistance is improved and the durability is substantially improved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は強磁性金属薄膜層を記録層とする磁気記録媒
体に関し、さらに詳しくは耐久性に優れた前記の磁気記
録媒体に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic recording medium having a ferromagnetic metal thin film layer as a recording layer, and more particularly to the above-mentioned magnetic recording medium having excellent durability.

〔従来の技術〕[Conventional technology]

一般に、強磁性金属またはそれらの合金などを真空蒸着
等によって基体上に被着してつくられる磁気記録媒体は
、高密度記録特性に優れる反面、磁気ヘッドとの摩擦係
数が大きくて摩耗や損傷を受は易い。
In general, magnetic recording media made by depositing ferromagnetic metals or their alloys on a substrate by vacuum deposition, etc., have excellent high-density recording characteristics, but have a high coefficient of friction with the magnetic head and are susceptible to wear and damage. It's easy to accept.

このため、磁性層上に各種の樹脂からなるトップコート
層を形成するなどして耐久性を改善することが従来から
行われており、たとえば、ニトロセルロースからなるI
・ノブコート層を形成したり(特開昭56−14353
9号、特開昭58−130436号)、ポリビニルブチ
ラール樹脂からなるトップコート層を形成したり(特開
昭57−176530号、特開昭56−68927号)
、あるいは塩化ビニル−酢酸ビニル系共重合体からなる
トップコート層を形成したり(特開昭56−68927
号、特開昭58−141442号)、さらにはポリイミ
ド系樹脂のスパッタリング膜を形成する(特開昭58−
1.22622号)ことが提案されている。
For this reason, it has been conventionally attempted to improve the durability by forming a top coat layer made of various resins on the magnetic layer.
- Forming a knob coat layer (Japanese Patent Application Laid-open No. 14353/1983)
9, JP-A-58-130436), and forming a top coat layer made of polyvinyl butyral resin (JP-A-57-176530, JP-A-56-68927).
Alternatively, a top coat layer made of vinyl chloride-vinyl acetate copolymer may be formed (Japanese Patent Laid-Open No. 56-68927).
No. 58-141442), and furthermore, forming a sputtering film of polyimide resin (Japanese Patent Application Laid-open No. 58-141442).
1.22622) has been proposed.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところが、これらの樹脂のみからなるトップコート層で
は、耐久性が改善されるものの、いまひとつ充分に満足
できるものではなかった。
However, although the top coat layer consisting only of these resins has improved durability, it is still not completely satisfactory.

〔問題点を解決するための手段〕[Means for solving problems]

この発明は、かかる現状に鑑み種々検討を行った結果な
されたもので、基体」二に強磁性金属薄膜層を形成し、
この強磁性金属薄膜層上に樹脂等の有機化合物からなる
被膜を形成した後、この樹脂等の有機化合物からなる被
膜の表面を、真空雰囲気下でイオン注入装置を用いてイ
オンを注入するなどの方法で炭化し、表面が炭化された
有機化合物からなるトソプコーl一層を設けることによ
って、耐久性を充分に向上させたものである。
This invention was made as a result of various studies in view of the current situation.
After forming a film made of an organic compound such as a resin on this ferromagnetic metal thin film layer, the surface of the film made of an organic compound such as a resin is implanted with ions using an ion implantation device in a vacuum atmosphere. By providing a single layer of Tosopkor made of an organic compound whose surface has been carbonized by a method of carbonization, durability has been sufficiently improved.

以下、図面を参照しながらこの発明について説明する。The present invention will be described below with reference to the drawings.

第1図はイオン注入装置の概略断面図を示したもので、
このイオン注入装置は、イオン源ガス導入口1を設けた
イオン発生室2と、イオン発生室2で発生させたイオン
を加速して所定の方向に導く加速器3と、加速器3で加
速されたイオンを質量によって分離し、必要なイオンを
取り出す質量分離器4と、質量分離器4で分離されたイ
オンをビーム走査するビーム走査室5と、イオン注入室
6とから構成され、イオン注入室6内に七ソトした磁気
記録媒体7の強磁性金属薄膜層上に被着した有機化合物
からなる被膜に、イオンが打ち込まれ、有機化合物から
なる被膜の表面が炭化されて、炭化層が形成される。8
はヒーム走査室5を真空排気するだめの排気系であり、
9はイオン注入室6を真空排気するための排気系である
Figure 1 shows a schematic cross-sectional view of the ion implanter.
This ion implantation apparatus includes an ion generation chamber 2 provided with an ion source gas inlet 1, an accelerator 3 that accelerates ions generated in the ion generation chamber 2 and guides them in a predetermined direction, and ions accelerated by the accelerator 3. It consists of a mass separator 4 that separates the ions by mass and takes out the necessary ions, a beam scanning chamber 5 that beam-scans the ions separated by the mass separator 4, and an ion implantation chamber 6. Ions are implanted into the film made of an organic compound deposited on the ferromagnetic metal thin film layer of the magnetic recording medium 7, which has been subjected to a heat treatment, and the surface of the film made of the organic compound is carbonized to form a carbonized layer. 8
is an exhaust system for evacuating the heam scanning chamber 5,
Reference numeral 9 denotes an exhaust system for evacuating the ion implantation chamber 6.

このようにイオン注入装置を使用して、強磁性金属薄膜
層上に形成された樹脂等の有機化合物からなる′$、膜
に、真空雰囲気下でイオンが注入されると、樹脂等の有
機化合物からなる被膜表面のC−C結合が高エネルギー
イオンにより切断され、炭化されてアモルファスカーボ
ンが生成され、炭化層が形成される。この樹脂等の有機
化合物からなる被膜の表面に形成されたアモルファスカ
ーボンからなる炭化層は、硬くて潤滑機能も有するため
、この表面に炭化層が形成された有機化合物からなるト
ソプコー1一層を強磁性金属薄II!i!層トに設ジノ
ると、耐摩耗性が改善されて、耐久性が充分に向」ニさ
れる。
When ions are implanted in a vacuum atmosphere into a film made of organic compounds such as resin formed on a thin ferromagnetic metal layer using an ion implantation device, the organic compounds such as resin The C--C bonds on the surface of the coating are cut by high-energy ions and carbonized to produce amorphous carbon and form a carbonized layer. The carbonized layer made of amorphous carbon formed on the surface of the coating made of organic compounds such as resin is hard and has a lubricating function. Metal Thin II! i! When installed in layers, the abrasion resistance is improved and the durability is sufficiently increased.

このような有機化合物からなる被膜へのイオンの注入は
、lXl0−5〜lXl0−’程度の真空中で行われ、
イオン種は特に限定されることなく、たとえば、Ar+
、N2+、Ti+、Si十等のイオンがいずれも好適に
使用される。またイオン注入の際の加速電圧は50〜5
000KVで行うのが好ましく、50KVより低い加速
電圧ではイオンに与えられるエネルギーが小さずぎ、被
膜の表面部が良好に炭化されないため耐久性が充分に向
上されず、また5000KVより高い加速電圧ではイオ
ンに与えられるエネルギーが大きすぎ、被膜を通過して
しまって耐久性の向上効果が得られない。このような条
件下でのイオン注入量は、1010個/ Ca〜102
°個/ cJの範囲内であることが好ましく、1014
個/cml〜1017個/ cJの範囲内となるように
するのがより好ましい。
Ion implantation into a film made of such an organic compound is performed in a vacuum of about 1X10-5 to 1X10-',
The ion species is not particularly limited, and for example, Ar+
, N2+, Ti+, Si+, and the like are preferably used. Also, the acceleration voltage during ion implantation is 50~5
000 KV is preferable. If the acceleration voltage is lower than 50 KV, the energy given to the ions is too small and the surface of the film is not carbonized well, so the durability cannot be sufficiently improved. If the acceleration voltage is higher than 5000 KV, the ion The energy given to the film is too large and passes through the film, making it impossible to improve durability. The ion implantation amount under these conditions is 1010/Ca~102
It is preferably within the range of ° pieces/cJ, 1014
It is more preferable to set it within the range of 1017 pieces/cml to 1017 pieces/cJ.

なお、有機化合物からなる被膜表面の炭化はこのように
イオンを注入して行われる他、電子線、ラジカル線など
の高速エネルギー線によっても行うことができ、これら
の電子線、ラジカル線などの高速エネルギー線によって
、有機化合物からなる被膜表面を炭化した場合も、前記
のイオンを注入して炭化を行う場合と同様に炭化層が形
成されて同様な効果が得られる。
Carbonization of the surface of a coating made of organic compounds can be done by implanting ions as described above, but it can also be done by high-speed energy beams such as electron beams and radical beams. Even when the surface of a coating made of an organic compound is carbonized by energy rays, a carbonized layer is formed and the same effect can be obtained as in the case where carbonization is performed by implanting ions.

このようにして有機化合物からなる被膜表面の炭化によ
って形成される炭化層の厚みは、50〜1000人の範
囲内であることが好ましく、薄ずぎると所期の効果が得
られず、厚ずぎるとスペーシングロスが大きくなりすぎ
て電磁変換特性が劣下するおそれがある。
The thickness of the carbonized layer thus formed by carbonization of the surface of the coating made of organic compounds is preferably within the range of 50 to 1000. If it is too thin, the desired effect will not be obtained, and if it is too thick, the desired effect will not be obtained. There is a risk that the spacing loss will become too large and the electromagnetic conversion characteristics will deteriorate.

強磁性金属薄膜層上に形成される樹脂等の有機化合物か
らなる被膜は、塩化ビニル−酢酸ビニル系共重合体、繊
維素系樹脂、ポリビニルブチラール樹脂、ポリウレタン
系樹脂、ポリエステル系樹脂等の被膜性の良好な樹脂を
使用し、これらの樹脂を有機溶剤で溶解して得られた樹
脂溶液を磁性層上に塗布するなどの方法で形成される。
The film formed on the ferromagnetic metal thin film layer is made of organic compounds such as vinyl chloride-vinyl acetate copolymer, cellulose resin, polyvinyl butyral resin, polyurethane resin, polyester resin, etc. The magnetic layer is formed using a method such as using a resin having a good quality and dissolving these resins in an organic solvent and applying a resin solution obtained on the magnetic layer.

このようにして形成される被膜の厚みは50〜1000
人の範囲内であるのが好ましく、薄すぎると所期の効果
が得られず、厚ずぎるとスペーシングロスが大きくなり
すぎて電磁変換特性が劣下するおそれがある。
The thickness of the film formed in this way is 50 to 1000
It is preferable that the thickness be within the range of a human being; if it is too thin, the desired effect will not be obtained, and if it is too thick, the spacing loss will become too large and the electromagnetic conversion characteristics may deteriorate.

基体上に形成される強磁性金属薄膜層は、C0、 Ni
、  Fe、、 Co−Ni  、、 Co−Cr、 
 Co−P、Co−N1−Pなどの強磁性相を真空蒸着
、イオンブレーティング、スパッタリング、メッキ等の
手段によって基体」二に被着するなどの方法で形成され
る。
The ferromagnetic metal thin film layer formed on the substrate consists of C0, Ni
, Fe, Co-Ni, Co-Cr,
It is formed by depositing a ferromagnetic phase such as Co--P or Co--N1-P on a substrate by means such as vacuum evaporation, ion blasting, sputtering, or plating.

また、磁気記録媒体としては、ポリエステルフィルムな
どの合成樹脂フィルムを基体とする磁気テープ、円盤や
ドラムを基体とする磁気ディスクや磁気ドラムなど、磁
気ヘッドと摺接する構造の種々の形態を包含する。
Further, the magnetic recording medium includes various types of structures that come into sliding contact with a magnetic head, such as a magnetic tape having a synthetic resin film such as a polyester film as a base, a magnetic disk or a magnetic drum having a disk or drum as a base.

〔実施例〕〔Example〕

次に、この発明の実施例について説明する。 Next, embodiments of the invention will be described.

実施例1 厚さ12μmのポリエステルフィルムにアルゴンガスボ
ンバード処理を施した後、これを真空蒸着装置に装填し
、5X10−’)−ルの残留ガス圧下でコバルトとニッ
ケルとを重量比で9:1の割合で溶解混合したコバルト
−ニッケル合金を加熱蒸発させてポリエステルフィルム
」二に厚さ0.177mのコバルト−ニッケル合金から
なる強磁性金属薄膜層を形成した。次いで、この強磁性
金属′4膜層−にに、セルツバBTH−](旭化成工業
社製ニトロセルロース)の5重里%シクロへキサノン−
1−ルエン混合溶液を、乾燥厚が0.07x1mとなる
ように塗布、乾燥した。次ぎに、この強磁性金属薄膜層
上にセルツバB T H−1からなる被膜を被着して得
た磁気記録媒体7を、第1図に示すイオン注入装置のイ
オン注入室6内に七ソトし、1×1O−6)・−ルの真
空雰囲気下に、加速電圧300に■でAr+イオンを1
016個/ c+1打ち込め、所定の中に裁断して磁気
テープをつくった。
Example 1 A polyester film with a thickness of 12 μm was subjected to argon gas bombardment treatment, and then loaded into a vacuum evaporation apparatus, and cobalt and nickel were mixed in a weight ratio of 9:1 under a residual gas pressure of 5×10−1. The cobalt-nickel alloy melted and mixed at a ratio of 0.177 m thick was formed on the polyester film by heating and evaporating the cobalt-nickel alloy to form a 0.177 m thick ferromagnetic metal thin film layer made of the cobalt-nickel alloy. Next, this ferromagnetic metal layer was coated with 5% cyclohexanone of Seltsuba BTH (nitrocellulose manufactured by Asahi Kasei Industries, Ltd.).
A 1-toluene mixed solution was applied and dried to a dry thickness of 0.07 x 1 m. Next, the magnetic recording medium 7 obtained by depositing a film made of Seltsuba BTH-1 on this ferromagnetic metal thin film layer was placed in the ion implantation chamber 6 of the ion implantation apparatus shown in FIG. Then, in a vacuum atmosphere of 1×1O-6)・-1, 1 Ar+ ion was added at an acceleration voltage of 300 and
016 pieces/c+1 were implanted and cut into the specified size to create a magnetic tape.

実施例2 実施例Jにおけるトップコート層の形成において、セル
ツバBTII−1の5重量%シクロへキザノンートルエ
ン混合溶液に代えて、エスレソクA(積水化学T業社製
塩化ビニルー酢酸ビニル−ビニルアルコール共重合体)
の5重量%シクロへキザノンートルエン混合溶液を使用
した以外は実施例1と同様にして磁気テープをつくった
Example 2 In the formation of the top coat layer in Example J, instead of the 5% by weight cyclohexanone-toluene mixed solution of Seltsuba BTII-1, Esresoku A (vinyl chloride-vinyl acetate-vinyl alcohol manufactured by Sekisui Chemical T Gyo Co., Ltd.) was used. copolymer)
A magnetic tape was prepared in the same manner as in Example 1 except that a 5% by weight cyclohexanone-toluene mixed solution was used.

実施例3 実施例1におけるl・ツブコート層の形成において、セ
ルツバB T H−1の5重量%シクロへギザノン−ト
ルエン混合溶液に代えて、エスレソクBLS(積木化学
工業社製ポリビニルブチラール樹脂)の5重量%シクロ
へキサノン−トルエン混合溶液を使用した以外は実施例
1と同様にして磁気テープをつくった。
Example 3 In the formation of the L-Tub coat layer in Example 1, 5% by weight of cyclohegizanone-toluene mixed solution of Seltsuba BTH-1 was replaced with 5% of Esresoku BLS (polyvinyl butyral resin manufactured by Block Chemical Industry Co., Ltd.). A magnetic tape was prepared in the same manner as in Example 1, except that a weight percent cyclohexanone-toluene mixed solution was used.

比較例1 実施例Iにおけるトップコート層の形成において、イオ
ンの注入を省いた以外は実施例1と同様にして磁気テー
プをつ(った。
Comparative Example 1 A magnetic tape was manufactured in the same manner as in Example 1 except that ion implantation was omitted in the formation of the top coat layer in Example I.

比較例2 実施例2におけるトップコート層の形成において、イオ
ンの注入を省いた以外は実施例2と同様にして磁気テー
プをつくった。
Comparative Example 2 A magnetic tape was produced in the same manner as in Example 2 except that ion implantation was omitted in the formation of the top coat layer in Example 2.

比較例3 実施例3におけるトップコート層の形成において、イオ
ンの注入を省いた以外は実施例3と同様にして磁気テー
プをつくった。
Comparative Example 3 A magnetic tape was produced in the same manner as in Example 3 except that ion implantation was omitted in the formation of the top coat layer in Example 3.

各実施例および各比較例で得られた磁気テープを松下電
器産業社製ビデオデツキN V−820(1に装填して
、ビデオS/Nを測定し、またS/Nが3dB低下する
までの走行回数を測定して耐久性を試験した。
The magnetic tape obtained in each example and each comparative example was loaded into a video deck NV-820 (1 manufactured by Matsushita Electric Industrial Co., Ltd.), the video S/N was measured, and the tape was run until the S/N decreased by 3 dB. Durability was tested by measuring the number of times.

下表はその結果である。The table below shows the results.

表 〔発明の効果〕 上表から明らかなように、この発明で得られた磁気テー
プ(実施例1〜3)は、いずれも従来の磁気テープ(比
較例1〜3)に比し、ビデオS/Nが同等以上で、耐久
性がよく、このことからこの発明によって(Mられる磁
気記録媒体は耐久性が一段と向」二されていることがわ
かる。
Table [Effects of the Invention] As is clear from the above table, the magnetic tapes obtained by the present invention (Examples 1 to 3) all have video S /N is the same or higher, and the durability is good. This shows that the durability of the magnetic recording medium (M) has been further improved by this invention.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はイオン注入装置の概略断面図である。 FIG. 1 is a schematic cross-sectional view of an ion implantation device.

Claims (1)

【特許請求の範囲】[Claims] 1、基体上に強磁性金属薄膜層を形成し、この強磁性金
属薄膜層上に表面が炭化された有機化合物からなるトッ
プコート層を設けたことを特徴とする磁気記録媒体
1. A magnetic recording medium characterized in that a ferromagnetic metal thin film layer is formed on a substrate, and a top coat layer made of an organic compound whose surface is carbonized is provided on the ferromagnetic metal thin film layer.
JP5273485A 1985-03-16 1985-03-16 Magnetic recording medium Pending JPS61211820A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5273485A JPS61211820A (en) 1985-03-16 1985-03-16 Magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5273485A JPS61211820A (en) 1985-03-16 1985-03-16 Magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS61211820A true JPS61211820A (en) 1986-09-19

Family

ID=12923157

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5273485A Pending JPS61211820A (en) 1985-03-16 1985-03-16 Magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS61211820A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19856295C2 (en) * 1998-02-27 2002-06-20 Fraunhofer Ges Forschung Process for the production of carbon electrodes and chemical field effect transistors and carbon electrodes and chemical field effect transistors produced thereby and their use

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19856295C2 (en) * 1998-02-27 2002-06-20 Fraunhofer Ges Forschung Process for the production of carbon electrodes and chemical field effect transistors and carbon electrodes and chemical field effect transistors produced thereby and their use

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