JPS6119283Y2 - - Google Patents
Info
- Publication number
- JPS6119283Y2 JPS6119283Y2 JP10559081U JP10559081U JPS6119283Y2 JP S6119283 Y2 JPS6119283 Y2 JP S6119283Y2 JP 10559081 U JP10559081 U JP 10559081U JP 10559081 U JP10559081 U JP 10559081U JP S6119283 Y2 JPS6119283 Y2 JP S6119283Y2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- primary
- deaeration chamber
- deaeration
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 54
- 239000007788 liquid Substances 0.000 claims description 49
- 238000007872 degassing Methods 0.000 claims description 41
- 238000005192 partition Methods 0.000 claims description 19
- 239000007921 spray Substances 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000008239 natural water Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Physical Water Treatments (AREA)
Description
【考案の詳細な説明】
本考案は、水中に溶存している空気又は炭酸ガ
ス等を、水中から脱気除去するための脱気器の改
良に関するものである。[Detailed Description of the Invention] The present invention relates to an improvement of a deaerator for degassing and removing air, carbon dioxide, etc. dissolved in water from water.
ボイラ、蒸気装置等に使用する給水は天然水の
ほかに水蒸気を凝縮して得られる溜出水などであ
つて、この給水中には空気、炭酸ガス等が含ま
れ、このままでは加熱時にガスを分離し殊に給水
中に溶存する酸素は加熱管その他の関連機器等を
腐食させる原因となるため、予めこれらのガスを
脱気除去することが必要である。 The feed water used for boilers, steam equipment, etc. is not only natural water but also distilled water obtained by condensing water vapor, and this feed water contains air, carbon dioxide, etc., and if left as it is, the gas will be separated during heating. In particular, since oxygen dissolved in the water supply causes corrosion of heating pipes and other related equipment, it is necessary to remove these gases by degassing in advance.
従来、この種の脱気器には、密閉型のケーシン
グ内を隔壁にて上部の一次脱気室と下部の二次脱
気室とに区成し、前記一次脱気室内には、その上
部に給水のスプレーノズルを、下部に環状トレー
を設ける一方、前記二次脱気室内には、二次脱気
室と一次脱気室の両方に連通する気液接触装置を
設けると共に加熱蒸気導入管を開口して成る脱気
器が一般的に使用されている。 Conventionally, in this type of deaerator, the inside of a closed casing is divided by a partition wall into an upper primary deaeration chamber and a lower secondary deaeration chamber, and the primary deaeration chamber has an upper part. A spray nozzle for water supply is provided at the bottom, and an annular tray is provided at the bottom, while a gas-liquid contact device communicating with both the secondary deaeration chamber and the primary deaeration chamber is provided in the secondary deaeration chamber, and a heated steam introduction pipe is provided in the secondary deaeration chamber. A deaerator consisting of an opening is commonly used.
そして、この種の脱気器は、一次脱気室内にス
プレーノズルから噴出供給される給水を、二次脱
気室から一次脱気室に上昇する蒸気に接触させて
一次脱気し、この一次脱気後の給水を、二次脱気
室内の気液接触装置において二次脱気室に最初に
供給される加熱用蒸気と接触させて二次脱気を行
なわせるものである。 This type of deaerator performs primary deaeration by bringing the water supplied into the primary deaeration chamber into contact with the steam rising from the secondary deaeration chamber to the primary deaeration chamber. The degassed feed water is brought into contact with the heating steam initially supplied to the secondary deaeration chamber in a gas-liquid contact device in the secondary deaeration chamber to perform secondary deaeration.
従つて大量の蒸気が二次脱気室内の気液接触装
置を通過するため、孔のあいた棚または鋸歯状に
縁を切つた樋を重ねて、そこに水を流し薄い膜に
して加熱蒸気との接触面積を大きくして脱気を行
なわせるいわゆるトレー式の気液接触装置におい
ては、例えば器内圧力0.45Kg/cm2G、給水入口温
度15℃、給水量45T/Hrに対して蒸気流量が5450
Kg/Hrのとき、トレーにおける蒸気の通過面積
が狭ければ、上昇する蒸気のために給水が下降で
きないという“フラツデイング現象”を生じ、円
滑な脱気作用が阻害されることになるが、これを
避けるためにはトレーにおける蒸気の通過面積を
不必要に大きくしなければならず、そのために脱
気器の大型化が避けられないのである。 Therefore, a large amount of steam passes through the gas-liquid contacting device in the secondary degassing chamber, so perforated shelves or serrated-edged troughs are stacked through which water is poured to form a thin film that connects to the heated steam. In a so- called tray-type gas-liquid contact device, which performs deaeration by increasing the contact area of is 5450
Kg/Hr, if the area through which the steam passes through the tray is narrow, a "flattening phenomenon" occurs in which the supply water cannot descend due to the rising steam, which impedes smooth deaeration. In order to avoid this, the area through which the steam passes in the tray must be made unnecessarily large, and as a result, the size of the deaerator is unavoidable.
本考案は、前記のフラツデイング現象の発生を
抑えながら効率よく給水の脱気を行ない得る脱気
を得ようとするもので、その要旨とするところ
は、密閉型のケーシング内を略水平状の隔壁にて
上部の一次脱気室と下部の二次脱気室とに区成
し、前記一次脱気室内には、その上部に給水のス
プレーノズルを、下部に環状トレーを設ける一
方、前記二次脱気室内には、二次脱気室と一次脱
気室の両方に連通する気液接触装置を設けると共
に加熱蒸気導入管を開口して成る脱気器におい
て、前記気液接触装置を前記隔壁より二次脱気室
内に向つて下向きに垂設した筒状側壁内に設ける
一方、前記隔壁には、二次脱気室を一次脱気室に
連通するための立上り管を、当該隔壁の上面から
一次脱気室内に向つて上向きに突出するように設
けたことにある。 The present invention aims to achieve deaeration that can efficiently deaerate the water supply while suppressing the occurrence of the above-mentioned flattening phenomenon. The primary deaeration chamber is divided into an upper primary deaeration chamber and a lower secondary deaeration chamber, and the primary deaeration chamber is provided with a water supply spray nozzle in the upper part and an annular tray in the lower part. In a deaerator, a gas-liquid contact device communicating with both the secondary deaeration chamber and the primary deaeration chamber is provided in the deaeration chamber, and a heated steam introduction pipe is opened. A riser pipe for communicating the secondary deaeration chamber with the primary deaeration chamber is provided in the cylindrical side wall extending downwardly toward the secondary deaeration chamber, and a riser pipe for communicating the secondary deaeration chamber with the primary deaeration chamber is provided in the upper surface of the partition wall. The primary degassing chamber is provided so as to protrude upward from the primary deaeration chamber.
以下本考案の一実施例を添付図面に基いて説明
する。 An embodiment of the present invention will be described below with reference to the accompanying drawings.
脱気水貯溜タンク22の上面に取付け用脚25
を介して載置された密閉型のケーシング1内は、
中央に水滴および蒸気の通路となる開口2を有す
る略水平状の隔壁3を境として、上部を一次脱気
室4に、下部を二次脱気室5に各々区成され、一
次脱気室4内の上部には、複数のスプレーノズル
6を配設し且つ給水管7を接続して成るヘツダー
8が設けられていると共に、このヘツダー8と前
記隔壁3との中間においては中央に水滴および蒸
気の通路10を有する環状トレー11がケーシン
グ1内面に固着して設けられ、該環状トレー11
の内周縁にはリング状の堰板18が設けられてい
る。更に、一次脱気室4にはベント管9が設けら
れている。 Mounting legs 25 on the top surface of the deaerated water storage tank 22
Inside the closed casing 1 placed through the
The upper part is divided into a primary deaeration chamber 4 and the lower part is divided into a secondary deaeration chamber 5, with a substantially horizontal partition wall 3 having an opening 2 in the center as a passage for water droplets and steam. At the upper part of the header 4, a header 8 is provided, in which a plurality of spray nozzles 6 are arranged and a water supply pipe 7 is connected. An annular tray 11 having a steam passage 10 is fixedly provided on the inner surface of the casing 1.
A ring-shaped weir plate 18 is provided on the inner peripheral edge of the pipe. Furthermore, the primary deaeration chamber 4 is provided with a vent pipe 9.
前記二次脱気室5内には、前記隔壁3の内周開
口2の周縁から筒状側壁15を二次脱気室5内に
向つて下向きに垂設し、その内部に気液接触装置
16を設ける。この気液接触装置16は、第2図
に例示したように、例えば通路12が千鳥状をな
すように多数のトレー13を上下に間隔14を置
いて配設し、その上端開口17を前記隔壁3の内
周開口2と略合致するように一次脱気室4内に臨
ませ、下端開口19を二次脱気室5への開放状態
としている。 Inside the secondary degassing chamber 5, a cylindrical side wall 15 is vertically disposed downward from the periphery of the inner circumferential opening 2 of the partition wall 3 toward the inside of the secondary degassing chamber 5, and a gas-liquid contact device is installed inside the cylindrical side wall 15. 16 will be provided. As illustrated in FIG. 2, this gas-liquid contacting device 16 has a large number of trays 13 arranged vertically at intervals 14 so that the passages 12 form a staggered pattern, and an upper end opening 17 of the trays 13 is arranged in a staggered manner. It faces into the primary degassing chamber 4 so as to substantially coincide with the inner peripheral opening 2 of No. 3, and the lower end opening 19 is open to the secondary degassing chamber 5.
そして、この二次脱気室5内には脱気用加熱蒸
気導入管20を接続開口し、前記隔壁3には二次
脱気室5を一次脱気室4に連通するための立上り
管21を、当該隔壁3の上面から一次脱気室4内
に向つて上向きに突出するように設ける。 A heating steam introduction pipe 20 for deaeration is connected and opened in the secondary deaeration chamber 5, and a riser pipe 21 is provided in the partition wall 3 for communicating the secondary deaeration chamber 5 with the primary deaeration chamber 4. is provided so as to protrude upward from the upper surface of the partition wall 3 into the primary degassing chamber 4.
従つて、加熱蒸気導入管20から二次脱気室5
に最初に供給された脱気用加熱蒸気の一部は二次
脱気室5の気液接触装置16を経て一次脱気室4
に導入されるとともに、他の一部は気液接触部1
6を経ないで前記立上り管21を通つて一次脱気
室4へ直接的に導入することができるようになつ
ている。 Therefore, from the heated steam introduction pipe 20 to the secondary deaeration chamber 5
A part of the heated steam for degassing initially supplied to the primary degassing chamber 4 passes through the gas-liquid contact device 16 in the secondary degassing chamber 5.
The other part is introduced into the gas-liquid contact part 1.
6, it can be directly introduced into the primary degassing chamber 4 through the riser pipe 21.
なお、この立上り管21の数や総面積は所望に
応じ適宜定められ、また、前記二次脱気室5内の
底部は降水管23を介して前記脱気水貯溜タンク
22に連通しており、図中符号24は、二次脱気
室5内と脱気水貯溜ダンク22内とを連通するた
めの均圧管である。 The number and total area of these riser pipes 21 are determined as desired, and the bottom of the secondary deaeration chamber 5 is connected to the deaerated water storage tank 22 via a downcomer pipe 23. , numeral 24 in the figure is a pressure equalizing pipe for communicating the inside of the secondary deaeration chamber 5 and the inside of the deaerated water storage dunk 22.
しかして、給水管7を通つてヘツダー8に導入
された給水はスプレーノズル6により霧状となつ
て一次脱気室4内の全体に広がり、その一部は気
液接触装置16におけるトレー13に直接落下し
て溜る一方、一次脱気室4の周壁面を伝つて流下
する給水および環状トレー11の上面に落下した
給水は堰板18から膜状で溢流して、その下部の
隔壁3の上面を介して、当該隔壁3の上面より下
方の気液接触装置16へ流下する。このようにし
て気液接触装置16のトレー13に溜つた給水は
さらに該トレー13から溢流して、第2図に示す
ように膜状をなして通路12を流下し、下方のト
レーに溜り、以下これを繰り返しつつ下方に流下
する。 The water introduced into the header 8 through the water supply pipe 7 is atomized by the spray nozzle 6 and spreads throughout the primary degassing chamber 4, and a part of it is transferred to the tray 13 in the gas-liquid contact device 16. While the water that falls directly and accumulates, the water that flows down along the peripheral wall of the primary deaeration chamber 4 and the water that falls onto the top surface of the annular tray 11 overflows from the weir plate 18 in the form of a film and reaches the top surface of the partition wall 3 below. It flows down to the gas-liquid contact device 16 below the upper surface of the partition wall 3. The feed water thus accumulated in the tray 13 of the gas-liquid contacting device 16 further overflows from the tray 13, flows down the passage 12 in the form of a film as shown in FIG. 2, and accumulates in the lower tray. This process is then repeated as it flows downward.
一方、蒸気導入管20から二次脱気室5内に最
初に導入された加熱脱気用蒸気の一部は、気液接
触装置16の下端開口19から当該接触装置16
に入り、各トレー13間の通路12及び間隔14
を上昇して、膜状をなして流下する前記給水と接
触し加熱脱気させたのち、上部開口17を通つて
一次脱気室4内に上昇し、他の一部は気液接触装
置16に入らないで立上り管21を通つて直接一
次脱気室4内に入り、前記気液接触装置16を通
過したのちになお残存する余剰蒸気と混合して、
スプレーノズル6から噴出して霧状に微細化され
た給水と接触し、給水を高温に加熱して脱気させ
る。 On the other hand, a part of the heating deaeration steam initially introduced into the secondary deaeration chamber 5 from the steam introduction pipe 20 is transferred from the lower end opening 19 of the gas-liquid contact device 16 to the contact device 16.
passage 12 and spacing 14 between each tray 13.
The water rises and comes into contact with the water supply flowing down in the form of a film to be heated and degassed, and then rises into the primary degassing chamber 4 through the upper opening 17, and the other part flows into the gas-liquid contact device 16. without entering the primary degassing chamber 4 through the riser pipe 21, and mixing with the surplus steam still remaining after passing through the gas-liquid contact device 16,
It comes into contact with the atomized feed water ejected from the spray nozzle 6, heats the feed water to a high temperature, and degasses the water.
かくして一次脱気室4及び二次脱気室5の気液
接触装置16において2回にわたり脱気された給
水は、脱気水として二次脱気室5の底部に溜り、
降水管23を経て脱気水貯溜タンク22に流下す
る一方、給水から分離した空気、炭酸ガス等はベ
ント管9から外部へ放出される。 The feed water thus degassed twice in the gas-liquid contact devices 16 of the primary deaeration chamber 4 and the secondary deaeration chamber 5 accumulates at the bottom of the secondary deaeration chamber 5 as deaeration water.
The degassed water flows down through the downcomer pipe 23 into the deaerated water storage tank 22, while air, carbon dioxide, etc. separated from the water supply are discharged to the outside from the vent pipe 9.
なお、上記の実施例では、気液接触装置16を
トレー式としたがその他の形成のものも採用で
き、蒸気分岐口の数や総面積も所望に応じて任意
に設定できることは言うまでもない。 In the above embodiment, the gas-liquid contact device 16 is of a tray type, but it goes without saying that other configurations may also be used, and the number of vapor branch ports and the total area can be arbitrarily set as desired.
前記のようにスプレーノズル6を有する一次脱
気室4と、気液接触装置16を有し且つ脱気用の
加熱蒸気が最初に供給される二次脱気室5とから
なる脱気器において、本考案では、加熱蒸気の一
部を二次脱気室5内の気液接触装置16を経由し
て一次脱気室4内へ導入する一方、他の一部を立
上り管21を介して直接的に一次脱気室4内へ導
入するから、一次脱気室4内で消費される蒸気
は、気液接触装置16を経て一次脱気室4に流入
するものが少なくなり、換言すると気液接触装置
16を通過して一次脱気室4に入る蒸気の量が少
なくなることにより、当該気液接触装置16にお
ける蒸気通路を狭くしてもフラツデイング現象を
発生することができないのであり、一方、一次脱
気室4には、加熱蒸気の一部が前記立上り管21
を介して直接的に導入されることにより、一次脱
気室4内での脱気効率を、加熱蒸気の総てが前記
気液接触装置16を経て導入する場合よりも向上
できるのである。 In a deaerator consisting of a primary deaeration chamber 4 having a spray nozzle 6 as described above, and a secondary deaeration chamber 5 having a gas-liquid contact device 16 and to which heated steam for deaeration is first supplied. In the present invention, part of the heated steam is introduced into the primary deaeration chamber 4 via the gas-liquid contact device 16 in the secondary deaeration chamber 5, while the other part is introduced into the primary deaeration chamber 4 through the riser pipe 21. Since the steam is directly introduced into the primary degassing chamber 4, less of the steam consumed in the primary degassing chamber 4 flows into the primary degassing chamber 4 via the gas-liquid contact device 16. Since the amount of steam that passes through the liquid contact device 16 and enters the primary degassing chamber 4 is reduced, the flooding phenomenon cannot occur even if the steam passage in the gas-liquid contact device 16 is narrowed. , a part of the heated steam is transferred to the primary deaeration chamber 4 through the riser pipe 21.
By directly introducing the heated steam through the gas-liquid contact device 16, the deaeration efficiency within the primary deaeration chamber 4 can be improved compared to when all of the heated steam is introduced through the gas-liquid contact device 16.
この場合において、二次脱気室5内の加熱蒸気
の一部を一次脱気室4に直接導くための立上り管
21が、隔壁3に穿設した単なる連通孔であると
か、横向きの管路である場合には、隔壁3の上面
を気液接触装置16に向つて流れる給水の一部
が、この連通孔又は横向き管路内に流入し二次脱
気室5に向つて下向きに流下することにより、給
水の一部が二次脱気作用を行う気液接触装置16
を通ることなくこれをバイパスするので、このバ
イパスした給水に対する脱気が不良になつて脱気
性能が低下するのである。 In this case, the riser pipe 21 for directing a part of the heated steam in the secondary degassing chamber 5 to the primary degassing chamber 4 may be a mere communication hole bored in the partition wall 3 or a horizontal pipe. In this case, a part of the feed water flowing on the upper surface of the partition wall 3 toward the gas-liquid contacting device 16 flows into this communication hole or horizontal pipe and flows downward toward the secondary degassing chamber 5. As a result, a part of the supplied water performs a secondary deaeration effect in the gas-liquid contact device 16.
Since the water is bypassed without passing through the water, the deaeration of the bypassed water becomes inadequate and the deaeration performance deteriorates.
また、このように連通孔又は横向き管路から流
下する給水の流れは、当該連通孔又は横向き管路
内を一次脱気室4に向つて上昇する加熱蒸気の流
れを阻害することになる。 Moreover, the flow of the feed water flowing down from the communication hole or the horizontal pipe in this way obstructs the flow of heated steam rising toward the primary degassing chamber 4 through the communication hole or the horizontal pipe.
そして、このように連通孔又は横向き管路内を
流下する給水による加熱蒸気の流れ阻害は、すな
わち、二次脱気室5から一次脱気室4に直接導入
する加熱蒸気の量が減少することになり、この減
少分だけ前記気液接触装置16を通過する加熱蒸
気の量が多くなるから、気液接触装置16におい
てフラツデイング現象が発生し易くなるのであ
る。これに対して本考案は、前記のように二次脱
気室5内の加熱蒸気の一部を一次脱気室4に直接
導くための立上り管21を、一次脱気室4から流
下する給水を、二次脱気室5内の気液接触装置1
6に導くための隔壁3の上面から一次脱気室に4
内に向つて上向きに突出するように形成したもの
で、一次脱気室4内にスプレーノズル6から噴出
された給水が隔壁3の上面を介して気液接触装置
16に流れるとき、給水の一部が当該立上り管2
1内を通つて二次脱気室5側に流下することがな
いから、給水の一部が気液接触装置16をバイパ
スすることはなくなると共に、立上り管21内に
おいて当該立上り管21内を下から上向きに流れ
る加熱蒸気に対する流れ阻害が発生することはな
いのである。すなわち、一次脱気室4から二次脱
気室5に流れる給水の全量を、気液接触装置16
を通すことができるのであり、しかも、前記立上
り管21を介して一次脱気室4内に直接に導入す
る加熱蒸気の量の変動がないから、二次脱気室5
から一次脱気室4に直接導入する加熱蒸気量と、
気液接触装置16を通過して一次脱気室4に流れ
る加熱蒸気量との比率を、当該立上り管21の通
路面積の設定によつて任意に設定できると共に、
この比率を一定に維持できて、気液接触装置16
を通過して一次脱気室4に流れる加熱蒸気量が変
動することを確実に防止できるのである。 In this way, the flow of heated steam is obstructed by the feed water flowing down through the communication hole or the horizontal pipe, which means that the amount of heated steam directly introduced from the secondary deaeration chamber 5 to the primary deaeration chamber 4 is reduced. Since the amount of heated steam passing through the gas-liquid contact device 16 increases by this decrease, the flooding phenomenon becomes more likely to occur in the gas-liquid contact device 16. In contrast, in the present invention, as described above, the riser pipe 21 for directly guiding a part of the heated steam in the secondary deaeration chamber 5 to the primary deaeration chamber 4 is connected to the water supply flowing down from the primary deaeration chamber 4. , the gas-liquid contact device 1 in the secondary degassing chamber 5
4 from the upper surface of the partition wall 3 to the primary degassing chamber
It is formed so as to protrude inwardly and upwardly, and when the feed water jetted from the spray nozzle 6 into the primary degassing chamber 4 flows to the gas-liquid contact device 16 via the upper surface of the partition wall 3, one part of the feed water is Part is the riser pipe 2
1 to the secondary deaeration chamber 5 side, a part of the supplied water will not bypass the gas-liquid contact device 16, and will not flow down inside the riser pipe 21. There is no flow obstruction to the heated steam flowing upwards from the top. That is, the entire amount of water flowing from the primary degassing chamber 4 to the secondary degassing chamber 5 is transferred to the gas-liquid contact device 16.
Moreover, since there is no change in the amount of heated steam directly introduced into the primary degassing chamber 4 through the riser pipe 21, the secondary degassing chamber 5
The amount of heated steam directly introduced into the primary deaeration chamber 4 from
The ratio of the amount of heated steam flowing through the gas-liquid contact device 16 to the primary deaeration chamber 4 can be arbitrarily set by setting the passage area of the riser pipe 21, and
This ratio can be maintained constant and the gas-liquid contact device 16
This makes it possible to reliably prevent the amount of heated steam flowing into the primary degassing chamber 4 from fluctuating.
以上の通り本考案は、密閉型のケーシング内を
略水平状の隔壁にて上部の一次脱気室と下部の二
次脱気室とに区成し、前記一次脱気室内には、そ
の上部に給水のスプレーノズルを、下部に環状ト
レーを設ける一方、前記二次脱気室内には、二次
脱気室と一次脱気室の両方に連通する気液接触装
置を設けると共に加熱蒸気導入管を開口して成る
脱気器において、二次脱気室内に供給した加熱蒸
気の一部を、給水が最初に供給される一次脱気室
に立上り管を介して直接的に導くものであるか
ら、気液接触装置を通過する加熱蒸気量が少なく
なつて気液接触装置でのフラツデイング現象の発
生を防止できるのである。 As described above, in the present invention, the inside of a closed casing is divided into an upper primary deaeration chamber and a lower secondary deaeration chamber by a substantially horizontal partition wall, and the primary deaeration chamber has an upper part. A spray nozzle for water supply is provided at the bottom, and an annular tray is provided at the bottom, while a gas-liquid contact device communicating with both the secondary deaeration chamber and the primary deaeration chamber is provided in the secondary deaeration chamber, and a heated steam introduction pipe is provided in the secondary deaeration chamber. In a deaerator with an opening, a part of the heated steam supplied into the secondary deaeration chamber is directly led to the primary deaeration chamber, where feed water is initially supplied, via a riser pipe. Since the amount of heated steam passing through the gas-liquid contact device is reduced, the occurrence of a flooding phenomenon in the gas-liquid contact device can be prevented.
しかも、二次脱気室内に供給した加熱蒸気の一
部を一次脱気室に立上り管を介して直接的に導く
に際して、この立上り管を、一次脱気室と二次脱
気室とを区成し、且つ一次脱気室に供給した給水
を気液接触装置に導くための略水平状の隔壁の上
面から一次脱気室内に向つて上向きに突出したこ
とにより、一次脱気室から二次脱気室に流れる給
水の全量を気液接触装置に通すことができ、且
つ、二次脱気室から一次脱気室に直接導入する加
熱蒸気量と、気液接触装置を通過して一次脱気室
に流れる加熱蒸気量との比率を、当該立上り管の
通路面積の設定によつて任意に設定できると共
に、この比率を一定に維持できて、気液接触装置
を通過して一次脱気室に流れる加熱蒸気量が変動
することを防止できるから、前記立上り管を介し
て一次脱気室に流れる加熱蒸気量の変動によつ
て、気液接触装置にフラツデイング現象が発生し
たり、脱気不良が発生したりすることを確実に回
避することができるのである。 Moreover, when directing a portion of the heated steam supplied into the secondary deaeration chamber through the riser pipe to the primary deaeration chamber, the riser pipe is used to separate the primary deaeration chamber from the secondary deaeration chamber. By protruding upward into the primary degassing chamber from the top surface of the substantially horizontal partition wall for guiding the water supplied to the primary degassing chamber to the gas-liquid contact device, the water from the primary degassing chamber to the secondary degassing chamber is The entire amount of feed water flowing into the degassing chamber can be passed through the gas-liquid contact device, and the amount of heated steam introduced directly from the secondary degassing chamber to the primary degassing chamber and the amount of heated steam passing through the gas-liquid contact device being The ratio of the amount of heated steam flowing to the air chamber can be set arbitrarily by setting the passage area of the riser pipe, and this ratio can be maintained constant, allowing the steam to pass through the gas-liquid contact device and to the primary deaeration chamber. This prevents fluctuations in the amount of heated steam flowing into the primary deaeration chamber via the riser pipe, which may cause a flattening phenomenon in the gas-liquid contact device or cause poor deaeration. It is possible to reliably prevent this from occurring.
従つて本考案によると、二次脱気室に供給した
加熱蒸気の一部を加熱蒸気の消費を多く必要とす
る一次脱気室に直接導入すること、一次脱気室か
ら二次脱気室に流れる給水の全量を二次脱気作用
を行う気液接触装置に通すことができること、及
び、二次脱気室から気液接触装置を通過して一次
脱気室に流れる加熱蒸気量の変動を防止できるこ
との三者が相俟つて、脱気器全体としての脱気性
能を著しく向上できるのであり、しかも、二次脱
気室内における気液接触装置の蒸気通路を狭くで
きることと、前記立上り管をケーシングに内蔵で
きることとが相俟つて脱気器を、著しく小型・軽
量化できる効果を有する。 Therefore, according to the present invention, a part of the heated steam supplied to the secondary deaeration chamber is directly introduced into the primary deaeration chamber which requires large consumption of heating steam, and a part of the heated steam supplied to the secondary deaeration chamber is directly introduced into the primary deaeration chamber, which requires a large amount of heating steam to be consumed. It is possible to pass the entire amount of feed water flowing into the secondary deaeration chamber through the gas-liquid contact device that performs secondary deaeration, and the amount of heated steam flowing from the secondary deaeration chamber through the gas-liquid contact device to the primary deaeration chamber is variable. The combination of these three factors makes it possible to significantly improve the deaeration performance of the deaerator as a whole.Moreover, the vapor passage of the gas-liquid contact device in the secondary deaeration chamber can be narrowed, and the riser pipe can be prevented. This combined with the fact that the deaerator can be built into the casing has the effect of significantly reducing the size and weight of the deaerator.
図面は本考案の一実施例を示し、第1図は縦断
正面図、第2図は気液接触装置の部分的な拡大断
面図である。
1……ケーシング、2……開口、3……隔壁、
4……一次脱気室、5……二次脱気室、6……ス
プレーノズル、7……給水管、8……ヘツダー、
10……通路、11……環状トレー、16……気
液接触装置、20……脱気用加熱蒸気導入管、2
1……立上り管。
The drawings show an embodiment of the present invention, with FIG. 1 being a longitudinal sectional front view and FIG. 2 being a partially enlarged sectional view of the gas-liquid contact device. 1... Casing, 2... Opening, 3... Partition wall,
4... Primary deaeration chamber, 5... Secondary deaeration chamber, 6... Spray nozzle, 7... Water supply pipe, 8... Header,
10... Passage, 11... Annular tray, 16... Gas-liquid contact device, 20... Heated steam introduction pipe for deaeration, 2
1...Rise pipe.
Claims (1)
部の一次脱気室と下部の二次脱気室とに区成し、
前記一次脱気室内には、その上部に給水のスプレ
ーノズルを、下部に環状トレーを設ける一方、前
記二次脱気室内には、二次脱気室と一次脱気室の
両方に連通する気液接触装置を設けると共に加熱
蒸気導入管を開口して成る脱気器において、前記
気液接触装置を前記隔壁より二次脱気室内に向つ
て下向きに垂設した筒状側壁内に設ける一方、前
記隔壁には、二次脱気室を一次脱気室に連通する
ための立上り管を、当該隔壁の上面から一次脱気
室内に向つて上向きに突出するように設けたこと
を特徴とする脱気器。 The inside of the closed casing is divided into an upper primary deaeration chamber and a lower secondary deaeration chamber by a substantially horizontal partition.
The primary deaeration chamber is provided with a water supply spray nozzle at the top and an annular tray at the bottom, while the secondary deaeration chamber is provided with air that communicates with both the secondary deaeration chamber and the primary deaeration chamber. In a deaerator which is provided with a liquid contact device and has a heated steam introduction pipe opened, the gas-liquid contact device is provided in a cylindrical side wall hanging downward from the partition wall toward the secondary degassing chamber, The degassing device is characterized in that the partition wall is provided with a riser pipe for communicating the secondary deaeration chamber with the primary deaeration chamber so as to protrude upward from the top surface of the partition wall into the primary deaeration chamber. Air.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10559081U JPS6119283Y2 (en) | 1981-07-15 | 1981-07-15 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10559081U JPS6119283Y2 (en) | 1981-07-15 | 1981-07-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5736404U JPS5736404U (en) | 1982-02-26 |
JPS6119283Y2 true JPS6119283Y2 (en) | 1986-06-11 |
Family
ID=29466960
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10559081U Expired JPS6119283Y2 (en) | 1981-07-15 | 1981-07-15 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6119283Y2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101184616B1 (en) | 2010-12-24 | 2012-09-21 | 비에이치아이 주식회사 | Difference pressur equalizing of deaerator for generating boiler |
-
1981
- 1981-07-15 JP JP10559081U patent/JPS6119283Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5736404U (en) | 1982-02-26 |
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