JPS61189683A - Discharge-excited short pulse laser device - Google Patents

Discharge-excited short pulse laser device

Info

Publication number
JPS61189683A
JPS61189683A JP2979585A JP2979585A JPS61189683A JP S61189683 A JPS61189683 A JP S61189683A JP 2979585 A JP2979585 A JP 2979585A JP 2979585 A JP2979585 A JP 2979585A JP S61189683 A JPS61189683 A JP S61189683A
Authority
JP
Japan
Prior art keywords
discharge space
main
discharge
electrode
main discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2979585A
Other languages
Japanese (ja)
Inventor
Hitoshi Wakata
若田　仁志
Takeo Haruta
春田　健雄
Yukio Sato
行雄 佐藤
Haruhiko Nagai
治彦 永井
Hideki Kita
喜多　秀樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2979585A priority Critical patent/JPS61189683A/en
Publication of JPS61189683A publication Critical patent/JPS61189683A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To enable the obtaining of laser beams of good quality and high output, by a method wherein a current restriction element restricting the current to the second main discharge space is provided, and a good-quality laser beam resonated in this discharge space is amplified in the first main discharge space. CONSTITUTION:When the difference in potential between both ends of a capacitor 5 increases, first discharge is generated in the second main discharge space 19 of short discharge gap length. Since a coil 20 as the current restriction element is series-connected to this discharge space 19, the difference in potential between both ends of the capacitor 5 keeps on increasing, and finally discharge is started in the first main discharge space 12 of long discharge gap length. At this time, the laser beam is led to the discharge space 12 by a mirror 24; then, the enlargement in beam diameter is corrected by a convex mirror 25, and the dispersion angle by a concave mirror 26. Further, laser beams of uniform phase obtained by the discharge space 19 are amplified during reciprocation through the discharge space 12. This process can offer well-convergent laser beams of high output and uniform phase.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は気体レーザ装置のうち、放電励起短パルスレ
ーザ装置、特にその放電励起部の構造に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a discharge-excited short pulse laser device among gas laser devices, and particularly to a structure of a discharge-excited portion thereof.

〔従来技術〕[Prior art]

従来、放電励起短パルスレーザの一つとしてエキシマレ
ーザが知られている。第５図はこのエキシマレーザを例
とした放電励起短パルスレーザ装置を示すものである。Excimer lasers are conventionally known as one type of discharge-excited short-pulse lasers. FIG. 5 shows a discharge-excited short pulse laser device using this excimer laser as an example.

図において、符号１は高電圧電源、２はコンデンサ、３
は充電用のコイル、４はスイッチ、５はコンデンサ、６
はコイルであシ、これらは図示のように接続されている
。符号７はレーザ媒質（レーザガス）、８は開孔電極、
９は主電極、１０は誘電体、１１は補助電極、１２は主
放電空間、１３は熱交換器、１４はファン、１５はレー
ザ筐体を示すものであシ、このレーザ筺体に上記したレ
ーザ媒質が封入され、かつ該レーザ筐体に上記の開孔電
極８、主電極９、誘電体１０、補助電極１１、熱交換器
１３およびファン１４が収納されている。上記主放電空
間１２での主放電は開孔電極８と主電極９この間に生ず
るものである。尚、符号１６はファン１４によシ生ずる
ガス流を示すものであシ、これは熱交換器１６を経て冷
却され友媒質の流動状態を示す。In the figure, 1 is a high voltage power supply, 2 is a capacitor, and 3 is a high voltage power supply.
is a charging coil, 4 is a switch, 5 is a capacitor, 6
are coils, and these are connected as shown. 7 is a laser medium (laser gas), 8 is an aperture electrode,
9 is a main electrode, 10 is a dielectric, 11 is an auxiliary electrode, 12 is a main discharge space, 13 is a heat exchanger, 14 is a fan, and 15 is a laser housing. A medium is enclosed, and the above-described aperture electrode 8, main electrode 9, dielectric 10, auxiliary electrode 11, heat exchanger 13, and fan 14 are housed in the laser housing. The main discharge in the main discharge space 12 occurs between the aperture electrode 8 and the main electrode 9. Incidentally, reference numeral 16 indicates a gas flow generated by the fan 14, which is cooled through the heat exchanger 16 and indicates the flow state of a friendly medium.

次に、上記のように構成された放電励起短パルスレーザ
装置の動作について説明する。上記したスイッチ４が開
放された状態では、高電圧電源１・　　から供給される
電荷はコンデンサ２に蓄積される。Next, the operation of the discharge-excited short pulse laser device configured as described above will be explained. When the above-mentioned switch 4 is open, the charge supplied from the high voltage power supply 1 is accumulated in the capacitor 2.

次いで、上記スイッチ４が閉成されると、上記コンデン
サ２からスイッチ４、コンデンサ５、コイル６を経た回
路が形成され、これによシコンデンサ２に蓄積されてい
た電荷がコンデンサ５へ移行する。この移行の際に、上
記開孔電極８に設けられた開孔部における誘電体１０の
表面に補助放電（沿面放電）を生ずる。この補助放電に
よシ生成される電子の一部、およびこの補助放電によシ
発生する紫外光によって光電離されて生成される電子が
種となって、主放電空間１２における主放電をグロー状
の均一な放電にする。このグロー状の均一な放電に次い
で、主放電空間１２にはパルス的な主放電を生じ、これ
によりレーザ媒質７が励起され、その結果レーザ光が取
り出される。このレーザ光のパルス幅は上記主放電のパ
ルス幅によって決まり、例えばエキシマレーザでは数十
ｎ５ｅｃである。スイッチ４としては一般にはサイラト
ロンが用いられ、数百Ｈ２での繰シ返し放電がなされる
。主放電空間１２で生じた熱は、熱交換器１３によシ取
シ除かれる。また、この熱交換器で冷却されたレーザ媒
体７はファン１４により数十−の流速で流動され、繰り
返し動作を可能ならしめている。Next, when the switch 4 is closed, a circuit is formed from the capacitor 2 through the switch 4, the capacitor 5, and the coil 6, whereby the charge stored in the capacitor 2 is transferred to the capacitor 5. During this transition, an auxiliary discharge (creeping discharge) is generated on the surface of the dielectric 10 in the aperture provided in the aperture electrode 8. Some of the electrons generated by this auxiliary discharge and electrons generated by photoionization by ultraviolet light generated by this auxiliary discharge serve as seeds, causing the main discharge in the main discharge space 12 to become glow-like. to ensure uniform discharge. Following this glow-like uniform discharge, a pulsed main discharge is generated in the main discharge space 12, which excites the laser medium 7, and as a result, laser light is extracted. The pulse width of this laser beam is determined by the pulse width of the above-mentioned main discharge, and is, for example, several tens of nanoseconds in the case of an excimer laser. Generally, a thyratron is used as the switch 4, and discharge is repeatedly performed at several hundred H2. The heat generated in the main discharge space 12 is removed by a heat exchanger 13. Further, the laser medium 7 cooled by this heat exchanger is flowed by a fan 14 at a flow rate of several tens of degrees, making it possible to perform repeated operations.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記したような放電励起短パルスレーザ装置では、レー
ザのパルス幅は数十ｎ５ｅｃであシ、その間のレーザ共
振器での光の往復は数回に留まる。従つて、レーザ光の
位相は完全には揃わず、この九め取り出されるビームは
集光性能の悪いものとなるという欠点があった。この集
光性能の劣化を防止するために、従来では共振器長が短
く、かつ開孔の小さいアパーチャを用いる等の方法を講
じていた。しかしながら、この方法では、大出力のレー
ザビームを得ることができないという欠点があった。In the discharge-excited short-pulse laser device as described above, the laser pulse width is several tens of nanoseconds, and the light travels back and forth in the laser resonator only a few times during that period. Therefore, the phases of the laser beams are not completely aligned, and the beam extracted at the third point has a disadvantage in that the focusing performance is poor. In order to prevent this deterioration of light collection performance, conventional methods have been taken such as using an aperture with a short resonator length and a small opening. However, this method has the disadvantage that a high-output laser beam cannot be obtained.

この発明は上記した従来の問題点を解決するためになさ
れたもので、位相の揃ったレーザビームが得られ、従っ
て集光性能が良く、かつ大出力のレーザビームを取り出
すことができる放電励起短パルスレーザ装置を得ること
を目的とする。This invention was made in order to solve the above-mentioned conventional problems, and it is possible to obtain a laser beam with a uniform phase, thus having good focusing performance, and a discharge excitation shortcut that can extract a high-output laser beam. The purpose is to obtain a pulsed laser device.

〔問題点を解決するための手段〕[Means for solving problems]

この発明に係わる放電励起短パルスレーザ装置は、放電
ギャップの長い第１の主放電空間の他に、コイル等の電
流制限素子を介した放電ギャップの短い第２の主放電空
間を設け、この第２の放電空間から得られたレーザビー
ムを上記第１の放電空間へ導き、これを増幅するもので
ある。The discharge-excited short-pulse laser device according to the present invention includes a first main discharge space with a long discharge gap and a second main discharge space with a short discharge gap via a current limiting element such as a coil. The laser beam obtained from the second discharge space is guided to the first discharge space and amplified.

〔作用〕[Effect]

この発明においては、持続時間の長い第２の放電空間に
て光を共振させ、この結果得られる良質のレーザビーム
を、放電長が長く、かつ入力エネルギーの大きな第１の
放電空間に導いて増幅するので、集光性能が良く、出力
の大きなレーザビームが得られる。In this invention, light is resonated in a second discharge space with a long duration, and the resulting high-quality laser beam is guided and amplified in a first discharge space with a long discharge length and a large input energy. Therefore, a laser beam with good focusing performance and high output can be obtained.

〔実施例〕〔Example〕

以下、この発明の一実施例を図について説明する。第１
図は放電励起短パルスレーザ装置の断面図である。図に
おいて、符号１は高電圧電源、２はコンデンサ、３は充
電用のコイル、４はスイッチ、５はコンデンサ、６はコ
イル、７はレーザ媒質、８は第１の開孔電極、９は第１
の主電極、１０は開孔電極８に接している誘電体、１１
は補助電極、１２は放電ギャップ長の長い第１の主放電
空間であシ、この第１の主放電空間はレーザ光軸方向を
長手方向とする上記開孔電極８と主電極９とにより構成
されている。１６は熱交換器、１４はファン、１５はレ
ーザ筐体、１６はガス流であり、これらは前記した従来
の装置について同一符号で説明したものと同様のもので
ある。符号１７は第２の主電極、１８は上記開孔電極８
と電気的に接続された第２の開孔電極、１９は放電ギャ
ップ長の短い第２の主放電空間であシ、この第２の主放
電空間はレーザ光軸を長手方向とする上記第２の主電極
と第２の開孔電極１８とによシ構成されている。２０は
コイルであシ、第２の主放電空間１９に流れる電流を制
限する素子となるものである。An embodiment of the present invention will be described below with reference to the drawings. 1st
The figure is a cross-sectional view of a discharge-excited short pulse laser device. In the figure, 1 is a high voltage power supply, 2 is a capacitor, 3 is a charging coil, 4 is a switch, 5 is a capacitor, 6 is a coil, 7 is a laser medium, 8 is a first aperture electrode, and 9 is a first aperture electrode. 1
10 is a dielectric material in contact with the aperture electrode 8, 11 is the main electrode of
12 is an auxiliary electrode, and 12 is a first main discharge space with a long discharge gap length, and this first main discharge space is composed of the apertured electrode 8 and the main electrode 9 whose longitudinal direction is the laser optical axis direction. has been done. 16 is a heat exchanger, 14 is a fan, 15 is a laser housing, and 16 is a gas flow, which are the same as those explained with the same reference numerals in the conventional device described above. Reference numeral 17 is the second main electrode, and 18 is the aperture electrode 8.
19 is a second main discharge space with a short discharge gap length, and this second main discharge space is connected to the second aperture electrode electrically connected to It is composed of a main electrode and a second aperture electrode 18. A coil 20 serves as an element for limiting the current flowing into the second main discharge space 19.

この実施例における光学系は第２図に示すように構成さ
れている。第２図において、第１図と同一符号は同一ま
たは相当部分？示す。符号２１゜２２はミラーであり、
レーザ共振器を構成するものである。２３はアパーチャ
、２４はレーザビームの方向を変えるためのミラー、２
５はレーザビームを広げるための凸面鏡、２６は凹面鏡
、２７は増幅されたレーザ光を示すものである。The optical system in this embodiment is constructed as shown in FIG. In Figure 2, are the same symbols as in Figure 1 the same or equivalent parts? show. Symbols 21° and 22 are mirrors,
This constitutes a laser resonator. 23 is an aperture, 24 is a mirror for changing the direction of the laser beam, 2
5 is a convex mirror for spreading the laser beam, 26 is a concave mirror, and 27 is an amplified laser beam.

次に、この実施例の動作について説明する。上記の高電
圧電源１からは充電用コイル６を介してコンデンサ２に
電荷が供給され、該コンデンサが充電される。次に、ス
イッチ４が閉成されると、上記コンデンサ２に蓄積され
ていた電荷はスイッチ４およびコイル５を経てコンデン
サ５に移行される。このコンデンサ５の両端の電位差は
第３図のようになる。図において、点ＡＨスイッチ４の
閉成された瞬間であり、この点Ａをｔ＝Ｑとしている。Next, the operation of this embodiment will be explained. Charge is supplied from the high voltage power supply 1 to the capacitor 2 via the charging coil 6, and the capacitor is charged. Next, when the switch 4 is closed, the charge stored in the capacitor 2 is transferred to the capacitor 5 via the switch 4 and the coil 5. The potential difference across the capacitor 5 is as shown in FIG. In the figure, point AH is the moment when switch 4 is closed, and this point A is set to t=Q.

時間が経過して、コンデンサ５への電荷の移行が進行す
ると、電位差は大きくなり、これによシ、先ず上記した
放電ギャップ長の短い第２の主放電空間１９での放電を
生ずる。この放電を生ずる点が第３図の点Ｂである。第
２の主放電空間１９には、電流制限素子としてのコイル
２０が直列に接続されているため、コンデンサ５の両端
の電位差は更に大きくなシ続け、最紙的には放電ギャッ
プ長の長い第１の主放電空間１２での放電が開始される
。この放電開始点が第３図の点Ｃである。この第６図に
も示すように、第２の主放電空間１９では１００ｎａｅ
ｅ　、第１の主放電空間１２では５０　ｎ５ｅｃに亙っ
て放電が続く。As time passes and the transfer of charge to the capacitor 5 progresses, the potential difference increases, which causes a discharge in the second main discharge space 19 having a short discharge gap length. The point where this discharge occurs is point B in FIG. Since a coil 20 as a current limiting element is connected in series to the second main discharge space 19, the potential difference between both ends of the capacitor 5 continues to increase, and in terms of paper, the second main discharge space 19 has a longer discharge gap length. Discharge in one main discharge space 12 is started. This discharge starting point is point C in FIG. As shown in FIG. 6, in the second main discharge space 19, 100 nae
e, discharge continues for 50 n5ec in the first main discharge space 12.

放電時間の長い上記第２の主放電空間１９を挾んで第２
図にも示すように、レーザ共振器が形成されている。ミ
ラー２１は全反射鐘、ミラー２２は半透鏡であり、透過
率は５〜６０％である。アパーチャ２３は低次の横モー
ドを得る次めのものであり、直径は５■φ以下である。The second main discharge space 19 is sandwiched between the second main discharge space 19 having a long discharge time.
As shown in the figure, a laser resonator is formed. The mirror 21 is a total reflection mirror, and the mirror 22 is a semi-transparent mirror, and the transmittance is 5 to 60%. The aperture 23 is the next one for obtaining a low-order transverse mode, and has a diameter of 5 .phi. or less.

この実施例における共振器長は３０ｃｒｎであり、放電
期間中に光は５０回以上往復し、略位相の揃ったレーザ
光が取り出される。また、発振した光の出力は０．５ｍ
ｊ程度である。The resonator length in this example is 30 crn, the light reciprocates more than 50 times during the discharge period, and laser light with substantially uniform phase is extracted. In addition, the output of the oscillated light is 0.5m
It is about j.

このレーザ光はミラー２４により、第１の主放電空間１
２に導かれ、凸面鏡２５によりビーム径の拡大が、また
凹面鏡２６によシ、発散角が補正される。更に、第１の
主放電空間１２を往復する際に、第２の主放電空間１９
よシ得られた、位相の揃ったレーザビームが増幅される
。これにより、出力が１００　ｍｊ以上で、位相の揃っ
た集光性能の良いレーザビームが得られる。This laser beam is directed to the first main discharge space 1 by the mirror 24.
2, the beam diameter is expanded by the convex mirror 25, and the divergence angle is corrected by the concave mirror 26. Furthermore, when reciprocating in the first main discharge space 12, the second main discharge space 19
The obtained well-phased laser beam is amplified. As a result, a laser beam with an output of 100 mj or more and a well-aligned phase and good focusing performance can be obtained.

尚、上記実施例では、第１の主放電空間１２と、第２の
主放電空間１９とをガス流１６の方向に配置したが、第
４図に示すように、第１の主放電空間１２と、第２の主
放電空間１９とをガス流１６の方向に対して並列に配置
しても良い。第４図において、第１図と同一符号は同一
または相当部分を示すものである。In the above embodiment, the first main discharge space 12 and the second main discharge space 19 are arranged in the direction of the gas flow 16, but as shown in FIG. and the second main discharge space 19 may be arranged in parallel with the direction of the gas flow 16. In FIG. 4, the same reference numerals as in FIG. 1 indicate the same or corresponding parts.

また、上記実施例では、予備電離のために沿面放電を用
い九が、この予備放電として、通常用いられるスパーク
、コロナ放電によるＵＶ光、またはＸ線等を用いても同
等の効果が得られる。Further, in the above embodiments, a creeping discharge is used for preliminary ionization, but the same effect can be obtained by using commonly used sparks, UV light from corona discharge, X-rays, etc. as the preliminary discharge.

また、上記実施例では、電流制限素子としてコイルを用
いたが、抵抗を用いても良い。この電流制限素子の接続
箇所は、上記実施例のものに限られるものではなく、例
えば開孔電極８と開孔電極１８この間に挿入しても良い
。Further, in the above embodiment, a coil is used as the current limiting element, but a resistor may also be used. The connection point of this current limiting element is not limited to that of the above embodiment, and may be inserted between the aperture electrode 8 and the aperture electrode 18, for example.

また、上記の実施例では、エキシマレーザにこの発明を
適用したものＫついて説明したが、Ｃ０２゜Ｎ２等のレ
ーザでも同様の効果がある。Furthermore, in the above embodiment, the invention was applied to an excimer laser (K), but a C02°N2 laser or the like can also have similar effects.

〔発明の効果〕〔Effect of the invention〕

この発明は以上説明したとおり、第１の主放電空間１２
と第２の主放電空間１９と全備え、第２の主放電空間１
９への電流を制限する電流制限素子（コイル２０）を設
け、該第２０主放を空間１９で共振された良質のレーザ
ビームを第１の主放電空間１２で増幅するようにしたか
ら、良質でかつ大出力のレーザビームを得ることができ
る。As explained above, the present invention provides the first main discharge space 12
and a second main discharge space 19 and a second main discharge space 1
A current limiting element (coil 20) is provided to limit the current to the 20th main discharge space 19, and the high quality laser beam resonated in the 20th main discharge space 19 is amplified in the first main discharge space 12. A large and high output laser beam can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図はこの発明の一実施例を示す放電励起短パルスレ
ーザ装置の断面図、第２図はこの発明の一実施例の光学
系を示す断面図、第３図はこの発明の一実施例における
要所の時間経過に対する電位差を例示するグラフ、第４
図は他の実施例を示す断面図、第５図は従来知られてい
る放電励起短パルスレーザ装置の断面図である。 １：高電圧電源、２：コンデンサ、３：コイル、４：ス
イッチ、５：コンデンサ、６：コイル、７：レーザ媒質
、８：第１の開孔電極、９：第１の主電極、１０：誘電
体、１１：補助電極、１２：第１の主放電空間、１３：
熱交換器、１４：ファン、１７：第２の主電極、１日：
第２の開孔電極、１９：第２の主放電空間。 なお、図中同一符号は同−又は相当部を示すものとする
。 代理人　弁理士　　木　村　三　朗 寅　４ｆ！！ｒ 第５図 １頁の続き 発明者　喜　多　　　秀　樹　尼崎市塚口本町８丁目作
所内FIG. 1 is a sectional view of a discharge-excited short pulse laser device showing an embodiment of the invention, FIG. 2 is a sectional view of an optical system of an embodiment of the invention, and FIG. 3 is an embodiment of the invention. Graph illustrating the potential difference over time at important points in the fourth graph.
The figure is a sectional view showing another embodiment, and FIG. 5 is a sectional view of a conventionally known discharge excited short pulse laser device. 1: High voltage power supply, 2: Capacitor, 3: Coil, 4: Switch, 5: Capacitor, 6: Coil, 7: Laser medium, 8: First aperture electrode, 9: First main electrode, 10: Dielectric, 11: Auxiliary electrode, 12: First main discharge space, 13:
Heat exchanger, 14: Fan, 17: Second main electrode, 1st:
Second aperture electrode, 19: second main discharge space. Note that the same reference numerals in the figures indicate the same or equivalent parts. Agent Patent Attorney San Akira Kimura 4f! ! r Continuation of Figure 5, page 1 Inventor: Hideki Kita Inside the factory, 8-chome, Tsukaguchi Honmachi, Amagasaki City

Claims (2)

【特許請求の範囲】[Claims] （１）レーザガス中においてレーザ軸方向を長手方向と
する一対の電極で構成される放電ギャップの長い第１の
主放電空間と、他の一対の電極で構成される放電ギャッ
プの短い第２の主放電空間とを有し、第１の主放電空間
を形成する電極と第２の主放電空間を形成する電極と該
第２の主放電空間を形成する電極への電流を制限する電
流制限素子とを有する電極系と、該電極系にパルス電圧
を印加するパルス回路と、第２の主放電空間に設けられ
たレーザ共振器と、該レーザ共振器から取り出された光
を第１の主放電空間に導く光学系とを備え、該第１の主
放電空間で光を増幅することを特徴とする放電励起短パ
ルスレーザ装置。(1) A first main discharge space with a long discharge gap consisting of a pair of electrodes whose longitudinal direction is in the laser axis direction in the laser gas, and a second main discharge space with a short discharge gap consisting of another pair of electrodes. a discharge space, an electrode forming a first main discharge space, an electrode forming a second main discharge space, and a current limiting element for limiting current to the electrode forming the second main discharge space; a pulse circuit that applies a pulse voltage to the electrode system; a laser resonator provided in a second main discharge space; and a laser resonator that directs light extracted from the laser resonator to the first main discharge space. What is claimed is: 1. A discharge-excited short-pulse laser device, comprising: an optical system for guiding the light to the first main discharge space; （２）主放電空間を形成する電極として主電極と、該主
電極と対向して配置され、かつ複数の開孔部を有する開
孔電極とを備え、この開孔電極の背面に密着して配設さ
れた誘電体と、この誘電体に密着しかつ上記開孔電極と
対向する位置に配設された補助電極を有することを特徴
とする特許請求の範囲第１項に記載の放電励起短パルス
レーザ装置。(2) The electrode forming the main discharge space includes a main electrode and an aperture electrode disposed opposite to the main electrode and having a plurality of apertures, and the aperture electrode is in close contact with the back surface of the aperture electrode. The discharge excitation short circuit according to claim 1, characterized in that the discharge excitation short circuit has a dielectric material disposed thereon, and an auxiliary electrode disposed in close contact with the dielectric material and at a position facing the aperture electrode. Pulsed laser equipment.
JP2979585A 1985-02-18 1985-02-18 Discharge-excited short pulse laser device Pending JPS61189683A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2979585A JPS61189683A (en) 1985-02-18 1985-02-18 Discharge-excited short pulse laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2979585A JPS61189683A (en) 1985-02-18 1985-02-18 Discharge-excited short pulse laser device

Publications (1)

Publication Number Publication Date
JPS61189683A true JPS61189683A (en) 1986-08-23

Family

ID=12285931

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2979585A Pending JPS61189683A (en) 1985-02-18 1985-02-18 Discharge-excited short pulse laser device

Country Status (1)

Country Link
JP (1) JPS61189683A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01140856U (en) * 1988-03-22 1989-09-27

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01140856U (en) * 1988-03-22 1989-09-27

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