JPS61145718A - Composite thin film magnetic head - Google Patents
Composite thin film magnetic headInfo
- Publication number
- JPS61145718A JPS61145718A JP26783884A JP26783884A JPS61145718A JP S61145718 A JPS61145718 A JP S61145718A JP 26783884 A JP26783884 A JP 26783884A JP 26783884 A JP26783884 A JP 26783884A JP S61145718 A JPS61145718 A JP S61145718A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film magnetic
- layer
- magnetic pole
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3967—Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
磁気ディスク装置、磁気テープ装置、７０ツビデイスク
装置等に用いられる薄膜磁気ヘッドに関する０
（従来技術とその問題点）
近年、磁気ディスク装置の高密度化が着実に向上してい
るロセして高トランスファーレートを達成するために、
イン？クタンスの小さい薄膜磁気ヘッドが用いられる様
になりてきた口最近は、ディスク径が小さい（５インチ
、３インチ等）装置も多く使用される様になりて亀たり
しかしディスク径が小さくなると、ディスクとヘッドの
相対速度が小さくなるために、薄膜磁気ヘッドを用いた
場合、再生出力が非常に小さくなるという欠点を有し、
ＮｉＦｅ合金ヤＮ１ｃｅ合金に見られる磁気抵抗効果素
子を用いたいわゆるＭＲヘッドが再生効率の高さから必
須のものと考えられているコ一方ＭＲヘッドは再生機能
だけであるので、記録ヘッドが必要である口記録と再生
を別々のヘッドで行なう場合、高密度記録時には記録へ
、ドと再生ヘッドとのアジマス損失が顕在化し、高密度
記録が達成出来ないという欠点が生じていた。従って記
録ヘッドと再生ヘッドの一体化が必要となる。Detailed Description of the Invention (Industrial Field of Application) 0 Regarding Thin Film Magnetic Heads Used in Magnetic Disk Devices, Magnetic Tape Devices, 70-Tubi Disk Devices, etc. (Prior Art and Problems thereof) In recent years, magnetic disk devices have become highly dense. In order to achieve high transfer rates, the transfer rate has been steadily improving.
in? Recently, thin-film magnetic heads with small ductance have been used, and devices with small disk diameters (5 inches, 3 inches, etc.) are also being used. Since the relative speed of the head becomes small, when a thin film magnetic head is used, the reproduction output becomes very small.
So-called MR heads that use magnetoresistive elements found in NiFe alloys and N1CE alloys are considered indispensable due to their high reproduction efficiency.On the other hand, MR heads only have a reproduction function, so they do not require a recording head. When recording and reproducing are performed using separate heads, azimuth loss between the recording, decoding, and reproducing heads becomes apparent during high-density recording, resulting in the disadvantage that high-density recording cannot be achieved. Therefore, it is necessary to integrate the recording head and the reproducing head.
従来、記録ヘッドとしての誘導型ｔ４１１Ｘｍ気ヘッド
と再生ヘッドとしての磁気抵抗効果型ヘッドとを複合化
するに際し、特開昭５２−１１９２１号公報や％開昭５
９−３０２２３号公報で述べられているように誘導盤薄
膜ヘッド素子の磁極間に磁気抵抗効果素子を形成する構
造（第２図）が提案されている。Conventionally, when combining an inductive t411Xm head as a recording head and a magnetoresistive head as a reproducing head, there has been a
As described in Japanese Patent No. 9-30223, a structure (FIG. 2) has been proposed in which a magnetoresistive element is formed between the magnetic poles of an induction disk thin film head element.
第２図においては、２１は非磁性基板、２２は誘導型薄
膜磁気ヘッドを形成する薄膜磁極、２３はそのコイル部
、２４，２５は該誘導盤へラドギャップ内に形成された
薄い磁気シールド層及び磁気抵抗効果素子をそれぞれ示
す。ところが１ｇ２図に示した構造のヘッドにおいては
、誘導を磁気ヘッドのギヤツブｇ内に磁気シールド層２
４及び磁気抵抗効果素子２５があるために記録時の磁界
分布は急峻ではなくなり、記録効率は大幅に低下すると
いう欠点があった。In FIG. 2, 21 is a non-magnetic substrate, 22 is a thin film magnetic pole forming an induction type thin film magnetic head, 23 is a coil portion thereof, and 24 and 25 are thin magnetic shield layers formed in the rad gap to the induction disk. and a magnetoresistive element, respectively. However, in the head with the structure shown in Figure 1g2, the induction is caused by a magnetic shield layer 2 inside the gear g of the magnetic head.
4 and the magnetoresistive element 25, the magnetic field distribution during recording is no longer steep, resulting in a disadvantage that the recording efficiency is significantly reduced.
又％開昭５８−１８９８１８号で述べられている様に、
磁気記録媒体対向部で膜厚が小さくなっている上部？４
膜磁極を有する誘導型薄膜磁気ヘッドの上に、さらに！
気的絶嫌層を介して磁気抵抗素子部を有した構造（３ｇ
３図）が提案されている。Also, as stated in % Kai No. 58-189818,
The upper part where the film thickness is smaller in the area facing the magnetic recording medium? 4
On top of the inductive thin film magnetic head with film magnetic poles, and more!
Structure (3g
Figure 3) has been proposed.
第３図において上部薄膜磁極３２の磁気記録媒体対向部
で膜厚が小さくなりている部分の上に磁気抵抗効果素子
部３５が絶縁層３４ｔ−介して構成され、さらに該磁気
抵抗効果素子部３５の上に磁気シールドが付与される場
合もある。この様な構成では誘導源薄膜磁気ヘッドの記
録磁場は磁気抵抗効果素子３５及び磁気シールド層の存
在にょシ急峻ではなくなシ、記録効率は大幅に低下する
という欠点があった０又磁気抵抗効果素子を形成するた
めには上部薄膜磁極３２の膜厚が小さくなっている部分
の表面粗さを非常に小さくする必要があるが、第３図に
示される構成では表面粗さを小さくすることはプロセス
技術上非常に困難であった。In FIG. 3, a magnetoresistive effect element part 35 is formed on the part of the upper thin film magnetic pole 32 where the film thickness is reduced in the part facing the magnetic recording medium with an insulating layer 34t interposed therebetween, and further the magnetoresistive effect element part 35 In some cases, a magnetic shield is added on top of the . In such a configuration, the recording magnetic field of the induction source thin film magnetic head is not steep due to the presence of the magnetoresistive element 35 and the magnetic shield layer, and the recording efficiency is significantly reduced. In order to form an element, it is necessary to make the surface roughness of the thin part of the upper thin film magnetic pole 32 extremely small, but in the configuration shown in FIG. This was extremely difficult due to process technology.
（発明の目的）
本発明の目的は前述の問題点を改善した複合型薄膜磁気
ヘッドを提供することにある＠（本発明の構成）
本発明の複合薄膜磁気ヘッドは下部薄膜磁極の磁気記録
媒体対向部分の中に磁気抵抗効果素子を内蔵する構成を
有している。すなわち本発明は誘導盤薄膜磁気ヘッドと
磁気抵抗効果型磁気ヘッドを結合した複合薄ＭＷＩｉ気
ヘッドであつて、非磁性基板と、該非磁性基板上に形成
された下部薄膜磁極層と、該下部薄膜磁極層中に絶縁層
を介して形成され、しかもその一端が当該ヘッドの一側
面に露出する位置に配置された磁気抵抗効果素子と、前
記下部薄膜磁極層上に形成される絶縁層と、該絶縁層上
にさらに絶縁層を介して形成されたコイルと、該コイル
上に形成された絶縁層と、該絶縁層上く形成された上部
薄膜磁極と、この上に形成された保護層とを備えたこと
ｔｌ−特徴とする複合薄膜ヘッドである。(Object of the Invention) An object of the present invention is to provide a composite thin film magnetic head that improves the above-mentioned problems. It has a configuration in which a magnetoresistive element is built in the opposing portion. That is, the present invention is a composite thin MWIi head combining an induction disk thin film magnetic head and a magnetoresistive magnetic head, which comprises a nonmagnetic substrate, a lower thin film magnetic pole layer formed on the nonmagnetic substrate, and a lower thin film magnetic head. a magnetoresistive element formed in the magnetic pole layer with an insulating layer interposed therebetween, one end of which is disposed at a position exposed to one side surface of the head; an insulating layer formed on the lower thin film magnetic pole layer; A coil formed on an insulating layer via an insulating layer, an insulating layer formed on the coil, an upper thin film magnetic pole formed on the insulating layer, and a protective layer formed on this. It is a composite thin film head with tl-characteristics.
（発明の構成の詳細な説明）
本発明の複合薄膜磁気ヘッドは、非磁性基板と、該非磁
性基板の上に形成された下部薄膜磁極と、該下部薄膜磁
極の上に形成した絶縁層と、該絶縁層の上く形成した磁
気抵抗効果素子と、該磁気抵抗効果素子の上に形成され
た絶縁層と、該絶縁層の上に前記磁気抵抗効果素子を内
蔵する様にさらに形成された下部薄膜＠極と、該下部薄
膜磁極の上に絶縁層を介して形成されたコイルと、該コ
イルの上に形成された絶縁層と、該絶縁層の上に前記コ
イルを内蔵する様に形成された上部薄膜磁極と、該上部
薄膜磁極の上に形成された保護膜とを備えている０
非磁性基板には表面に人１２０．が付与され研摩された
基板を用い、上部及び下部薄膜磁極はＮｉ−ＦｅやＣｏ
−Ｚｒ等の軟磁性１ｔ−１絶縁看はＡｌ！０．又はＳｉ
Ｏ＊スパッタ膜やレジスト膜を、磁気抵抗効果素子はＮ
ｉＦｅ ’Ｐ ＮｉＣｏ ｋ 、コイルにはＣｕｔ−、
保護膜にはＡｌ、Ｏ，を用いることができる。前記材料
をスパッタ法、メッキ法、スピンコード、イオンミリン
グ等の製造方法を用いて作製し、その後切断、別工、研
摩及びアラ七ンプリーを行ない複合薄膜ヘッドが田米る
。以下本発明による複合型薄膜磁気ヘッド及びその製造
方法を実施例によフ説明する〇（実施例）
第１図に実施例の複合薄膜磁気ヘッドの断面構造を示す
。非磁性基板１ （Ａ／ＴｉＣ基板の上に人／、 ＯＳ
膜をスパッタで付与し、該ｈｔｔｏｓＭｔ−研摩した基
板）の上に下部薄膜磁極２ （ＮｉＦｅ、膜厚１ｕｍ）
をスパッタ法による成膜及びイオンミリングによるパタ
ーンエツチングによ多形成し、該下部薄膜磁極の上に人
ｌ、０．の絶縁層３をスパッタ法によシ０．１５μｍ形
成し、該絶縁層３の上に磁気抵抗効果素子４を蒸着法に
よる成膜と化学エッチ法によるパターン全形成し、さら
に該磁気抵抗効果素子４の上に絶縁層（Ａ／宜０．）
５ ｔ” ０．１５μｍだけスパッタ法により形成した
後、下部薄膜磁極の上の前記磁気抵抗効果素子以外の部
分に形成されている人ｚｔｏｓ絶縁層をイオンミリング
によシ除去し、該下部薄膜磁極及びＡｊ’、Ｏｓ絶縁層
の上に同じく下部薄膜磁極をスパッタ法による成膜及び
イオンミリング法によるパターンエツチングによ多形成
し九〇次に該下部薄膜磁極２の上に記録ギャップ長Ｑ、
５Ｊ’ｍのＡＪ！’！Ｏ，絶縁層６をスパッタ法によ多
形成し、該Ａｌ、 Ｏ，絶縁層６の上にレジスト１０を
形成し、該レジストｌＯ上にコイル（Ｃｕ）８ｔ−メッ
キ法によ多形成し、さらに該コイル８の上にレジストＮ
。(Detailed Description of the Structure of the Invention) The composite thin film magnetic head of the present invention includes a nonmagnetic substrate, a lower thin film magnetic pole formed on the nonmagnetic substrate, an insulating layer formed on the lower thin film magnetic pole, A magnetoresistive element formed on the insulating layer, an insulating layer formed on the magnetoresistive element, and a lower part further formed on the insulating layer to house the magnetoresistive element. a thin film@pole, a coil formed on the lower thin film magnetic pole via an insulating layer, an insulating layer formed on the coil, and a coil formed on the insulating layer to house the coil. The non-magnetic substrate includes an upper thin-film magnetic pole with an upper thin-film magnetic pole and a protective film formed on the upper thin-film magnetic pole. The upper and lower thin film magnetic poles are made of Ni-Fe or Co.
- Soft magnetic 1t-1 insulation such as Zr is Al! 0. or Si
O* sputtered film or resist film, magnetoresistive element is N
iFe'P NiCo k,Cut- for the coil,
Al, O, or the like can be used for the protective film. The above-mentioned material is manufactured using a manufacturing method such as sputtering, plating, spin cord, ion milling, etc., and then cutting, machining, polishing, and arranging are performed to form a composite thin film head. The composite thin-film magnetic head and the manufacturing method thereof according to the present invention will be explained below with reference to examples. (Example) FIG. 1 shows a cross-sectional structure of a composite thin-film magnetic head according to an example. Non-magnetic substrate 1 (A/person on TiC substrate/, OS
A film was applied by sputtering and a lower thin film magnetic pole 2 (NiFe, film thickness 1 um) was deposited on the httosMt-polished substrate).
is formed by sputtering and pattern etching by ion milling, and a layer of 1,0 . An insulating layer 3 with a thickness of 0.15 μm is formed by sputtering, a magnetoresistive element 4 is formed on the insulating layer 3 by vapor deposition, and a pattern is entirely formed by chemical etching. Insulating layer on top of 4 (A/Y 0.)
5t'' by sputtering to a thickness of 0.15 μm, and then remove the insulating layer formed on the lower thin-film magnetic pole in a portion other than the magnetoresistive element by ion milling, and remove the lower thin-film magnetic pole by ion milling. A lower thin film magnetic pole is similarly formed on the Aj', Os insulating layer by sputtering and pattern etching by ion milling, and then a recording gap length Q,
5J'm AJ! '! O, an insulating layer 6 is formed by a sputtering method, a resist 10 is formed on the Al, O, insulating layer 6, a coil (Cu) is formed on the resist 10 by a plating method, Furthermore, a resist N is placed on the coil 8.
.
を形成し％該しジスト１０の上に上部薄膜磁極７（Ｎｉ
−ＦｅＸ”スパッタ法による成膜及びイオンミリング法
ニよるパターンエツチングによ多形成し、該上部薄膜磁
極７の上にＡ４０．保護膜を形成した後、切断、加工、
研摩及びアツセンブリーヲ行ない複合薄膜磁気ヘッドを
作製した０
前記構成を有する複合薄膜磁気ヘッドの記録効率は上部
薄膜磁極の側の記録磁場によシ磁気記録媒体に記録され
るために、第２．３図に示す従来例に比して記録効率の
低下は小さく、又第１の下部薄膜磁極２１の表面粗さを
小さくできたＯこのことから第３図に示す従来例に比し
て磁気抵抗効果素子４の磁気特性への影響が少なくなっ
た。The upper thin film magnetic pole 7 (Ni
After forming an A40 protective film on the upper thin film magnetic pole 7, cutting, processing,
A composite thin film magnetic head was fabricated by polishing and assembly. The recording efficiency of the composite thin film magnetic head having the above configuration is as shown in Fig. 2.3 because recording is performed on the magnetic recording medium by the recording magnetic field on the side of the upper thin film magnetic pole. The decrease in recording efficiency was smaller than that of the conventional example shown in FIG. 3, and the surface roughness of the first lower thin-film magnetic pole 21 was reduced. 4 has less influence on the magnetic properties.
（発明の効果）
このように本発明の複合薄膜磁気ヘッドによシ従来よシ
記録効率が改善され、再生機能も優れたヘッドが得られ
たり(Effects of the Invention) As described above, the composite thin film magnetic head of the present invention has improved recording efficiency compared to the conventional one, and a head with excellent playback function can be obtained.
第１図は本発明の複合薄膜磁気ヘッドの実施例の断面構
造を示す図。第２及び第３図は従来の複合薄膜磁気ヘッ
ドの断面構造を示す図＠第１図において１は非磁性基板
、２は下部薄膜磁極、３は絶縁層、６は絶縁層、７は上
部薄膜磁極、８は；イル、１０はレジスト、９は保護膜
を示す。第２図において、２１は非磁性基板、２２は誘
導温薄膜磁気ヘッドを形成する薄膜磁極、２３はコイル
部、２４．２５は該誘導型薄膜磁気へラドギャップ内に
形成された磁気シールド及び磁気抵抗効果素子をそれぞ
れ示す。第３図において３３．３３’。
３３“、３３′は導体コイル、３１は強磁性基板。
３２は強磁性合金薄膜磁極、３４． ３４’、 ３４
“は非磁性層、３５は磁気抵抗効果素子であるロ２：下
部清展索劾
ｌ：非磁辻婆扱FIG. 1 is a diagram showing a cross-sectional structure of an embodiment of a composite thin-film magnetic head of the present invention. Figures 2 and 3 are diagrams showing the cross-sectional structure of a conventional composite thin film magnetic head. In Figure 1, 1 is a nonmagnetic substrate, 2 is a lower thin film magnetic pole, 3 is an insulating layer, 6 is an insulating layer, and 7 is an upper thin film. A magnetic pole, 8 is a mirror, 10 is a resist, and 9 is a protective film. In FIG. 2, 21 is a non-magnetic substrate, 22 is a thin film magnetic pole forming an induction hot thin film magnetic head, 23 is a coil portion, and 24 and 25 are magnetic shields and magnetic fields formed within the induction type thin film magnetic head gap. Each resistive effect element is shown. 33.33' in Figure 3. 33", 33' are conductor coils, 31 is a ferromagnetic substrate. 32 is a ferromagnetic alloy thin film magnetic pole, 34. 34', 34
" is a non-magnetic layer, and 35 is a magnetoresistive element. 2. Lower part of the screen is treated as a non-magnetic layer.
Claims (1)
合した複合薄膜磁気ヘッドであって、非磁性基板と、該
非磁性基板上に形成された下部薄膜磁極層と、該下部薄
膜磁極層中に絶縁層を介して形成され、しかもその一端
が当該ヘッドの一側面に露出する位置に配置された磁気
抵抗効果素子と、前記下部薄膜磁極層上に形成される絶
縁層と、該絶縁層上にさらに絶縁層を介して形成された
コイルと、該コイル上に形成された絶縁層と、該絶縁層
上に形成された上部薄膜磁極と、この上に形成された保
護層とを備えたことを特徴とする複合薄膜磁気ヘッド。A composite thin film magnetic head combining an induction temperature thin film magnetic head and a magnetoresistive magnetic head, comprising a nonmagnetic substrate, a lower thin film magnetic pole layer formed on the nonmagnetic substrate, and an insulating layer in the lower thin film magnetic pole layer. a magnetoresistive element formed through a layer and disposed at a position where one end thereof is exposed on one side of the head; an insulating layer formed on the lower thin film magnetic pole layer; It is characterized by comprising a coil formed through an insulating layer, an insulating layer formed on the coil, an upper thin film magnetic pole formed on the insulating layer, and a protective layer formed on this. Composite thin film magnetic head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26783884A JPS61145718A (en) | 1984-12-19 | 1984-12-19 | Composite thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26783884A JPS61145718A (en) | 1984-12-19 | 1984-12-19 | Composite thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61145718A true JPS61145718A (en) | 1986-07-03 |
Family
ID=17450322
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26783884A Pending JPS61145718A (en) | 1984-12-19 | 1984-12-19 | Composite thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61145718A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62214507A (en) * | 1986-03-14 | 1987-09-21 | Fujitsu Ltd | Thin film magnetic head |
| EP0340882A2 (en) * | 1988-04-25 | 1989-11-08 | Seagate Technology International | Thin film magnetic data transducer |
| US5471349A (en) * | 1991-04-15 | 1995-11-28 | Nec Corporation | Drive circuit for a dual-element magnetic head assembly which includes an encodor, flip-flop circuit, record bit adding circuit, and record amplifier |
| US5822159A (en) * | 1993-07-14 | 1998-10-13 | Sony Corporation | Thin-film magnetic head, magnetoresistance effect magnetic head and composite magnetic head |
| US5930077A (en) * | 1993-06-17 | 1999-07-27 | Nec Corporation | Magnetic head for recording and reproducing a signal and comprising a slider provided with a protective film including an intermediate layer and an amorphous hard carbon layer |
| WO2000025306A1 (en) * | 1998-10-23 | 2000-05-04 | Seagate Technology Inc. | A merged read/write head for a disk drive |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51148411A (en) * | 1975-06-02 | 1976-12-20 | Ibm | Magnetic converter |
| JPS58114321A (en) * | 1981-12-26 | 1983-07-07 | Fujitsu Ltd | Thin film magnetic head for vertical magnetic recording and reproduction |
| JPS58128022A (en) * | 1982-01-27 | 1983-07-30 | Hitachi Ltd | Incorporated thin film multi-track magnetic head |
-
1984
- 1984-12-19 JP JP26783884A patent/JPS61145718A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51148411A (en) * | 1975-06-02 | 1976-12-20 | Ibm | Magnetic converter |
| JPS58114321A (en) * | 1981-12-26 | 1983-07-07 | Fujitsu Ltd | Thin film magnetic head for vertical magnetic recording and reproduction |
| JPS58128022A (en) * | 1982-01-27 | 1983-07-30 | Hitachi Ltd | Incorporated thin film multi-track magnetic head |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62214507A (en) * | 1986-03-14 | 1987-09-21 | Fujitsu Ltd | Thin film magnetic head |
| EP0340882A2 (en) * | 1988-04-25 | 1989-11-08 | Seagate Technology International | Thin film magnetic data transducer |
| US5471349A (en) * | 1991-04-15 | 1995-11-28 | Nec Corporation | Drive circuit for a dual-element magnetic head assembly which includes an encodor, flip-flop circuit, record bit adding circuit, and record amplifier |
| US5930077A (en) * | 1993-06-17 | 1999-07-27 | Nec Corporation | Magnetic head for recording and reproducing a signal and comprising a slider provided with a protective film including an intermediate layer and an amorphous hard carbon layer |
| US5822159A (en) * | 1993-07-14 | 1998-10-13 | Sony Corporation | Thin-film magnetic head, magnetoresistance effect magnetic head and composite magnetic head |
| US5872691A (en) * | 1993-07-14 | 1999-02-16 | Sony Corporation | Thin film magnetic head, magnetoresistance effect magnetic head and composite magnetic head |
| WO2000025306A1 (en) * | 1998-10-23 | 2000-05-04 | Seagate Technology Inc. | A merged read/write head for a disk drive |
| GB2370683A (en) * | 1998-10-23 | 2002-07-03 | Seagate Technology Llc | A merged read/write head for a disk drive |
| GB2370683B (en) * | 1998-10-23 | 2003-04-02 | Seagate Technology Llc | A merged read/write head for a disk drive |
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