JPS6093758U - Variable position mechanism for substrate holder in sputtering equipment - Google Patents

Variable position mechanism for substrate holder in sputtering equipment

Info

Publication number
JPS6093758U
JPS6093758U JP18579783U JP18579783U JPS6093758U JP S6093758 U JPS6093758 U JP S6093758U JP 18579783 U JP18579783 U JP 18579783U JP 18579783 U JP18579783 U JP 18579783U JP S6093758 U JPS6093758 U JP S6093758U
Authority
JP
Japan
Prior art keywords
substrate holder
rod
variable position
position mechanism
sputtering equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18579783U
Other languages
Japanese (ja)
Inventor
保彦 佐藤
Original Assignee
クラリオン株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by クラリオン株式会社 filed Critical クラリオン株式会社
Priority to JP18579783U priority Critical patent/JPS6093758U/en
Publication of JPS6093758U publication Critical patent/JPS6093758U/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来のカーセル型スパッタ装置を一部省略して
示す斜視図、第２図はこの考案に係るスパッタ装置にお
ける基板ホルダーの位置可変機構を示す平面図、第３図
は同上実施例における要部を取り出して示す斜視図、第
４図〜第６図は基板上における軸方向の膜厚分布を示す
曲線図で、第４図および第５図は従来装置による膜厚分
布、第６図は第２図の実施例による膜厚分布を示すもの
である。 １ａ〜１ｄ：基板ホルダー、２：基板、３：ターゲット
、６ａ〜６ｄ：ロッド、７：支持枠、９ａ〜９ｄ：ギヤ
、１１：チェーン、１２：駆動ギヤ、１４：溝付アーム
、１４ａ：溝、１５：ピン、Ｕ：回動・直線運動変換手
段。FIG. 1 is a partially omitted perspective view of a conventional Kerr cell type sputtering device, FIG. 2 is a plan view showing a position variable mechanism for a substrate holder in the sputtering device according to the invention, and FIG. 4 to 6 are curve diagrams showing the film thickness distribution in the axial direction on the substrate. 2 shows the film thickness distribution according to the embodiment shown in FIG. 1a to 1d: board holder, 2: board, 3: target, 6a to 6d: rod, 7: support frame, 9a to 9d: gear, 11: chain, 12: drive gear, 14: grooved arm, 14a: groove , 15: Pin, U: Rotation/linear motion conversion means.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 基板ホルダーの背面にロッドを垂設し、該ロッドを支持
枠に移動自在に支持させ、回動運動を前記ロッドの直線
移動運動に変換する回動・直線運動変換手段を配設し、
当該ロッドを移動させることにより前記基板ホルダーの
位置を可変することを特徴とするスパッタ装置における
基板ホルダーの位置可変機構。A rod is vertically disposed on the back side of the substrate holder, the rod is movably supported by a support frame, and rotational/linear motion converting means for converting the rotational motion into a linear movement of the rod is provided,
A mechanism for changing the position of a substrate holder in a sputtering apparatus, characterized in that the position of the substrate holder is changed by moving the rod.
JP18579783U 1983-12-02 1983-12-02 Variable position mechanism for substrate holder in sputtering equipment Pending JPS6093758U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18579783U JPS6093758U (en) 1983-12-02 1983-12-02 Variable position mechanism for substrate holder in sputtering equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18579783U JPS6093758U (en) 1983-12-02 1983-12-02 Variable position mechanism for substrate holder in sputtering equipment

Publications (1)

Publication Number Publication Date
JPS6093758U true JPS6093758U (en) 1985-06-26

Family

ID=30401492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18579783U Pending JPS6093758U (en) 1983-12-02 1983-12-02 Variable position mechanism for substrate holder in sputtering equipment

Country Status (1)

Country Link
JP (1) JPS6093758U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023036155A (en) * 2021-09-02 2023-03-14 キヤノンアネルバ株式会社 Vacuum treatment apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023036155A (en) * 2021-09-02 2023-03-14 キヤノンアネルバ株式会社 Vacuum treatment apparatus

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