JPS609137A - Travelling stage - Google Patents

Travelling stage

Info

Publication number
JPS609137A
JPS609137A JP11586583A JP11586583A JPS609137A JP S609137 A JPS609137 A JP S609137A JP 11586583 A JP11586583 A JP 11586583A JP 11586583 A JP11586583 A JP 11586583A JP S609137 A JPS609137 A JP S609137A
Authority
JP
Japan
Prior art keywords
guide
ceramic
guide bars
stage
fixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11586583A
Other languages
Japanese (ja)
Inventor
Ryuichi Funatsu
隆一 船津
Motoya Taniguchi
素也 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11586583A priority Critical patent/JPS609137A/en
Publication of JPS609137A publication Critical patent/JPS609137A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Machine Tool Units (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To improve the processing accuracy, to reduce the differential friction and to contrive improvement in the travelling accuracy of the stage by a method wherein the cross-sectional form of a guide is constituted by a simple and plane surface, and the member of the guide is formed using material such as ceramic and the like. CONSTITUTION:Ceramic guide bars 12, 12' and 13, 13' are fixed on a base 11, a ceramic bar 15 is fixed to tables 14 and 14' located below said guide bars in parallel with the guide bars, and the ceramic bar 15 is supported by the base 11 through the intermediary of a plurality of steel balls 16. Besides, rollers 18 and 18' are fixed to the tables 14 and 14' through the intermediaries of plate springs 17 and 17', and the tables 14 and 14' are pressed to guide bars 13 and 13' by the recoiling force of the plate springs, thereby enabling to remove the clearance between the guide bars 12 and 12', 14 and 14' and the steel balls 16.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、特に高い走行精度を必要とする寸ある。[Detailed description of the invention] [Field of application of the invention] The present invention requires particularly high running accuracy.

〔発明の背景〕[Background of the invention]

従来、平面度測定機や、フォトマスクや半導体ウェハの
位置決めを行なう半導体製造装置においては、矛1図に
示すような球と■溝を組み合せたガイド機構やガスベア
リングガイド(図示せず。)が使もれている。
Conventionally, in flatness measuring machines and semiconductor manufacturing equipment that positions photomasks and semiconductor wafers, guide mechanisms that combine balls and grooves as shown in Figure 1 and gas bearing guides (not shown) have been used. Overused.

ペース1にはV形の溝を有する2本のガイドバー2,6
が固定されており、それらと対向し、同様にV形の溝を
有するガイドバー5.5′が鋼球6をはさんで設けられ
、テーブル4に固定されている。ガイドバー5′はその
側面をネジで押され、ガイド面と鋼球とのクリアランス
が除去される。さらにボールネジとナツトの送り機構7
によりテーブルは位置決めされる。
The pace 1 has two guide bars 2 and 6 with V-shaped grooves.
A guide bar 5.5', which also has a V-shaped groove, is provided opposite to the steel balls 6, and is fixed to the table 4. The side surface of the guide bar 5' is pushed by a screw to remove the clearance between the guide surface and the steel ball. Furthermore, the ball screw and nut feeding mechanism 7
The table is positioned by

一般にこの構造のステージは熱処理で硬化されたガイド
バーと鋳物構造のペースやテーブルで構成されるが、軽
量化が困難であり、かつ環境温度の変化などに対する寸
法精度の安定化が困難である。
Generally, a stage with this structure is composed of a guide bar hardened by heat treatment and a cast plate or table, but it is difficult to reduce the weight and it is difficult to stabilize dimensional accuracy against changes in environmental temperature.

更にガイドとなるV溝と鋼球との間には差動マサツが生
じ、鋼球およびガイド面の摩耗が問題となる欠点を有し
ていた。− 〔発明の目的〕 本発明の目的は上記従来技術の欠点をなくし、温度変動
や経時変化に対して高い走行精度を有する走行ステージ
を提供することにある。
Furthermore, differential massing occurs between the V-groove serving as a guide and the steel ball, resulting in a problem of wear of the steel ball and the guide surface. - [Object of the Invention] An object of the present invention is to eliminate the drawbacks of the above-mentioned prior art and to provide a traveling stage that has high running accuracy against temperature fluctuations and changes over time.

〔発明の概要〕[Summary of the invention]

本発明は上記目的を達成するために、テーブルを走行さ
せるガイドの断面形状をV形ではな(全て単純な平面で
構成することによって上記ガイド部材をセラミックス等
の加工しにくい材料で形成することを可能にし、更にガ
イド面の加工精度を向上させ、かつ鋼球とガイド面との
差動マサツを減少させろことによりステージの走行精度
の向上をはかったものである。
In order to achieve the above object, the present invention has the cross-sectional shape of the guide for moving the table not in a V-shape (all of them are made of a simple plane), thereby making it possible to avoid forming the guide member with a material that is difficult to process, such as ceramics. The aim is to improve the running accuracy of the stage by making it possible, further improving the machining accuracy of the guide surface, and reducing the differential mass between the steel balls and the guide surface.

〔発明の実施例〕[Embodiments of the invention]

以下本発明の一実施例を第2図により具体的に説明する
。11はセラミック材又は石材で形成されたベース、1
2(12’)および13(13’)はベース11の上に
固定されたセラミックスのガイドバーである。14(1
4’ )は、その下方にガイドバー12(12’)、1
3(13’)と平行にセラミックスパー15が固定され
たテーブルであり、複数個の鋼球16を介してベース1
1(テーブル14)に保持すれている。なお、ローラ1
8(1B’)は牙4図に示すように板バネ17(17’
)を介してテーブル14(14’)に固定されており、
その板バネ17(17’)の反力によってテーブル14
(1/l/)はガイドバー1+(13’)に押し付けら
れ、ガイドバー12(12’) 、14(11’)と鋼
球16の間のクリアランスを除去している。
An embodiment of the present invention will be explained in detail below with reference to FIG. 11 is a base made of ceramic material or stone, 1
2 (12') and 13 (13') are ceramic guide bars fixed on the base 11. 14 (1
4') has guide bars 12 (12'), 1
3 (13') is a table on which a ceramic spar 15 is fixed in parallel to the base 1 through a plurality of steel balls 16.
1 (table 14). In addition, roller 1
8 (1B') is a plate spring 17 (17') as shown in Fig. 4.
) is fixed to the table 14 (14') via
Due to the reaction force of the leaf spring 17 (17'), the table 14
(1/l/) is pressed against the guide bar 1+(13'), eliminating the clearance between the guide bars 12 (12'), 14 (11') and the steel ball 16.

テーブル走行ガイドとなる鋼球は、ガイドバーより構成
される2つの平面の間に設けられたリテーナ19.20
に保持されている。また、テーブル走行のヨーな決める
鋼球に関しては、球の落下を防ぐためリテーナの鋼球保
持穴にはテーパ又は段差が設けられている。(]・33
図参照。
A steel ball serving as a table traveling guide is attached to a retainer 19.20 provided between two planes composed of a guide bar.
is maintained. Further, regarding the steel balls that determine the yaw of table travel, the steel ball holding hole of the retainer is provided with a taper or step to prevent the balls from falling. (]・33
See diagram.

イスレモ鋼球が接触している面はセラミックスで形成さ
れた平面で形成されている。
The surface in contact with the ISLEMO steel ball is a flat surface made of ceramic.

一方、ガイドバー12(12’)、1ろ(13’)、は
牙3図に示すようにベース11(テーブル14)に対し
てそれぞれネジによって締結され、この取り付は部には
固定用金属ブツシュ21が埋め込ま汽ガイドバー取り付
は面を平面度の良いセラミックスとすることでネジ締め
によるガイドバーの変形をおさえている。
On the other hand, as shown in Figure 3, the guide bars 12 (12'), 13', and 13' are each fastened to the base 11 (table 14) with screws, and this attachment is done with fixing metal parts. When mounting the steam guide bar in which the bushing 21 is embedded, the surface is made of ceramic with good flatness to prevent deformation of the guide bar due to screw tightening.

同様にガイドバー15(15’)は牙6図に示すように
テーブル14(テーブル14′)に対してネジによって
締結され、この取り付は部には固定用金属プツシ=21
が埋め込まれ、ガイドバー取り付は面を平面度の良いセ
ラ2ツクスとすることでネジ締めによるガイドバーの変
形ン押えている。
Similarly, the guide bar 15 (15') is fastened to the table 14 (table 14') with screws as shown in FIG.
is embedded, and the guide bar mounting surface is made of ceramic with good flatness to prevent deformation of the guide bar due to screw tightening.

第14図は、矛2図及び矛3図に示すステージを2層に
重ねたX、Xステージを示したものである。即ちガイド
の構造は上下反転しているが基本的な考え方は同じであ
る。また上層のXステージは、Yテーブル14′の側面
および下面なガイド面とする構造であり、Yテーブル1
4′は単板のセラミックである。これも構成は才2図と
異なるが基本的には同じ方式である。
FIG. 14 shows an X, X stage in which the stages shown in Figures 2 and 3 are stacked in two layers. That is, although the structure of the guide is upside down, the basic idea is the same. In addition, the upper X stage has a structure in which it serves as a guide surface on the side and lower surfaces of the Y table 14'.
4' is a single ceramic plate. This also has a different configuration from Figure 2, but is basically the same system.

ベース11はセラミック又は石の定盤であり、カイトバ
ー141ろはセラミックである。石V、Jセラミックの
組み合せの場合、両者の熱膨張率に差があるが、ベース
11の調性を高(とれるため−1そりを小さくすること
ができる。上層のXステージ14′においてはガイドバ
ー12’、13’と共に全てセラミックとする。下層の
Xステージ(テーブル)14もセラミックスとする。共
に剛性を高くできないため、材質を同一にしてそりを低
減させる必要がある。
The base 11 is a ceramic or stone surface plate, and the kite bar 141 is made of ceramic. In the case of a combination of ceramic stones V and J, there is a difference in the coefficient of thermal expansion between the two, but since the tonality of the base 11 can be kept high, warpage can be reduced by -1.In the upper X stage 14', the guide The bars 12' and 13' are all made of ceramic.The lower X stage (table) 14 is also made of ceramic.Since both cannot have high rigidity, it is necessary to use the same material to reduce warpage.

駆動部の構造に関しては、上層のXステージの図で説明
する。パルスモータ22.送りネジ26゜ナツト24よ
り構成されるが、ステージ走行軸と送りネジ26の軸の
平行度の誤差を吸収するため、ナツト24は板バネ2式
ヲ介してテーブル21に固定されている。
The structure of the drive section will be explained with reference to the diagram of the upper X stage. Pulse motor 22. The feed screw 26 is composed of a nut 24, and the nut 24 is fixed to the table 21 via two sets of leaf springs in order to absorb errors in parallelism between the stage traveling axis and the axis of the feed screw 26.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明によればセラミックスででき
た走行ガイド面と転動球との間の差動マサッによる摩耗
を減少させ、これに伴ないテーブルの、走行精度を向上
させることができる効果を有する。特に本発明によれば
転動体ガイドのステージとしてセラミックス材料を使用
したので、従来の如く金属(鉄)ステージに見られる残
留加工歪による精度の経時変化を防止して小さくするこ
とができ、更に材料の硬度が高いため球と接触するガイ
ド面を表面硬化処理をする必要がなく、しかも鉄材等に
比べ比重が小さいため軽量化がはかれ、慣性も小さく位
置決め精度を向上させることができる効果も奏する。
As explained above, according to the present invention, the wear caused by the differential massing between the ceramic running guide surface and the rolling balls can be reduced, and the running accuracy of the table can be improved accordingly. has. In particular, according to the present invention, since a ceramic material is used as the stage of the rolling element guide, it is possible to prevent the accuracy from changing over time due to residual machining distortion, which is seen in conventional metal (iron) stages, and to reduce the accuracy. Because of its high hardness, there is no need to surface harden the guide surface that comes into contact with the ball.Moreover, it has a lower specific gravity than steel materials, etc., so it is lighter in weight, has less inertia, and has the effect of improving positioning accuracy. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の走行テーブルを示す正面図、第2図は本
発明の走行テーブルの一実施例ヲ示す正面図、第3図は
矛2図に示すガイドバーおよびリテーナ部を拡大して示
した断面図、牙4図は牙2図に示す本発明の走行テーブ
ルを重ね合せて構成したX−Yテーブルを示した図であ
る。 11・・・ベース、12.12’、 13.13’、1
5.15’・・・セラミックスの走行ガイドバー、14
.14’・・・テーブル、16・・・鋼球、18.18
’・・・ローラ、19.20・・・リテーナ。
FIG. 1 is a front view showing a conventional traveling table, FIG. 2 is a front view showing an embodiment of the traveling table of the present invention, and FIG. 3 is an enlarged view of the guide bar and retainer shown in FIG. The sectional view shown in FIG. 4 is a diagram showing an X-Y table constructed by overlapping the travel tables of the present invention shown in FIG. 2. 11...Base, 12.12', 13.13', 1
5.15'... Ceramic running guide bar, 14
.. 14'...Table, 16...Steel ball, 18.18
'...Roller, 19.20...Retainer.

Claims (1)

【特許請求の範囲】[Claims] 1、 テーブル走行のローリング、ピッチングを押さえ
る2ケのガイドと、ヨーを押さえる1ケのガイドとを有
し、更にそれらのガイドが2 上記ガイド平面をセラミ
ックス材で形成し
1. It has two guides for suppressing rolling and pitching during table travel, and one guide for suppressing yaw, and furthermore, these guides 2. The above-mentioned guide plane is formed of a ceramic material.
JP11586583A 1983-06-29 1983-06-29 Travelling stage Pending JPS609137A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11586583A JPS609137A (en) 1983-06-29 1983-06-29 Travelling stage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11586583A JPS609137A (en) 1983-06-29 1983-06-29 Travelling stage

Publications (1)

Publication Number Publication Date
JPS609137A true JPS609137A (en) 1985-01-18

Family

ID=14673059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11586583A Pending JPS609137A (en) 1983-06-29 1983-06-29 Travelling stage

Country Status (1)

Country Link
JP (1) JPS609137A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61109637A (en) * 1984-10-31 1986-05-28 Hitachi Ltd Table device
JPH0681048U (en) * 1993-04-26 1994-11-15 株式会社三協精機製作所 Card guide device
US5518550A (en) * 1993-10-15 1996-05-21 Canon Kabushiki Kaisha Stage apparatus for an exposure apparatus including a contant tension spring for canceling out a gravitational force of a movable stage by a tensile force
JP2016516601A (en) * 2013-05-03 2016-06-09 ドク ミン,ビョン Numerically controlled machine tool

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61109637A (en) * 1984-10-31 1986-05-28 Hitachi Ltd Table device
JPH0681048U (en) * 1993-04-26 1994-11-15 株式会社三協精機製作所 Card guide device
US5518550A (en) * 1993-10-15 1996-05-21 Canon Kabushiki Kaisha Stage apparatus for an exposure apparatus including a contant tension spring for canceling out a gravitational force of a movable stage by a tensile force
JP2016516601A (en) * 2013-05-03 2016-06-09 ドク ミン,ビョン Numerically controlled machine tool

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