JPS60182012A - Thin film magnetic recording medium - Google Patents

Abstract

PURPOSE:To provide high coercive force and squareness ratio on a nonmagnetic base body even in the case when a diagonal vapor deposition is not used and to make the magnetic characteristic isotropic within the plane thereof by constituting a bismuth alloy of bismuth and specific weight % of a metal of >=1 kinds selected from Pb, Sn, Cd, In, Sb, Ga and Zn. CONSTITUTION:A bismuth alloy is constituted of Bi and a metal of >=1 kinds selected from Pb, Sn, Cd, In, Sb, Ga and Zn and the ratio of the metal except Bi is selected within a 5-45wt% range. A nonmagnetic underlying layer 2 of the bismuth alloy and a magnetic metallic layer is formed on a nonmagnetic base body 1 to obtain a thin film magnetic recording medium. A high polymer film consisting of, for example, polyethylene terephthalate, etc. are used for the nonmagnetic base body and the underlying layer 2 consisting of the bismuth alloy is deposited by sputtering on the base body 1. The reason for selecting the bismuth alloy lies in that said alloy contg. >=55wt% Bi has the property to expand in volume, unlike ordinary metals, during solidification. The layer 3 is formed by depositing any of Co, Fe and Ni or the alloy thereof by ordinary vapor deposition.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は磁気テープ、磁気シート等に適用して好適なＲ
Ｖ、Ｍ磁気記録媒体に関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention is suitable for application to magnetic tapes, magnetic sheets, etc.
V, M relates to magnetic recording media.

♂ｒ景技術とその問題点 近年、磁気記録の１１°（ｆ密度化の１−」的０６月（
目１ｔ１．１１１；ｌＬ型の磁気記録媒体即ち非磁性基
体」−に真空蒸着、ヌバソタリング等の方法によりＣｏ
、　Ｆｅ、　Ｎｉ等の＆＋　１！１金属、或いはこれら
の合金による数白へ〜略１μのＩＶさの強磁性金属薄膜
を形成させた磁気記録媒体についての伺究が盛んである
。♂r technology and its problems In recent years, the 11° (1-) of magnetic recording
1t1.111: Co is applied to a L-type magnetic recording medium, i.e., a non-magnetic substrate, by a method such as vacuum evaporation or nuba sottering.
There has been much research into magnetic recording media in which a ferromagnetic metal thin film with an IV diameter of approximately 1 μm is formed using &+1!1 metals such as , Fe, and Ni, or alloys thereof.

しかしながら、この種の薄１１￥型の磁気記録媒体にお
い”ζ、そのＣｏ等の磁性金属を単に非磁性基体−１−
に例えば蒸着しただけＣは、充分ｌｌ］１い抗磁ノ月１
ｃを有する磁性ｊ−を得ることは困難である。このよう
な薄膜型磁気記録媒体において、Ｉ口ｆい抗磁ノ月ＩＣ
を有する磁性１＠をｉυる方法としては、非磁性基体に
対しζ、上述の磁性金属の蒸発粒子を斜めに入射させる
斜め蒸着法が提案され′Ｃいる。とごろがごのような斜
め蒸着法による場合、蒸着効率が低く生産ｆ！Ｉ＋に劣
るという欠点がある。However, in this type of thin 11-inch magnetic recording medium, the magnetic metal such as Co is simply used as a non-magnetic substrate.
For example, the amount of C deposited on the surface is sufficient
It is difficult to obtain magnetic j- with c. In such a thin-film magnetic recording medium, an antimagnetic IC with a large diameter
As a method for producing magnetic 1@ having iυ, an oblique vapor deposition method has been proposed in which evaporated particles of the above-mentioned magnetic metal are obliquely incident on a non-magnetic substrate. When using the diagonal deposition method, the deposition efficiency is low and the production f! It has the disadvantage of being inferior to I+.

発明の目的 本発明は、斜め蒸着法によらない場合にＡ６いＣも、非
磁性基体上に商い抗磁力及び角形比を有し、その面内Ｃ
磁気特性が等人的とされた薄膜磁気記録媒体を青ようと
するものである。Purpose of the Invention The present invention provides that A6 C has a coercive force and a squareness ratio on a non-magnetic substrate when not using an oblique vapor deposition method, and the in-plane C
This is an attempt to create a thin film magnetic recording medium whose magnetic properties are considered to be uniform.

発明の４汎要 本発明は、非磁性基体」二にヒスマス系合金のト地層と
金属磁性ＩＨを積層形成してなる磁気記録媒体である。4. Summary of the Invention The present invention is a magnetic recording medium comprising a non-magnetic substrate, a hismuth-based alloy layer, and a metal magnetic IH layered thereon.

ヒスマス系合金としＣは、旧とＰｌｙ、　Ｓｎ、　Ｃｄ
、　Ｉｎ。Hismuth-based alloys include C, Old, Ply, Sn, and Cd.
, In.

Ｓｂ、　Ｇａ、　Ｚｎから選ばれた１種以−１−の金属
とから構成され、その旧以外の金属の−）す合は５〜４
５市量％の範囲内に選ばれる。It is composed of one or more metals selected from Sb, Ga, and Zn, and the sum of the other metals is 5 to 4.
Selected within 5% of market volume.

この発明の磁気記録媒体では、磁気的に面内等力１？ｌ
をイ１し、１１つ高い抗磁力及び角型比が得られる。ま
た製造に際しても：ＩＦｉｉ’ｊ蒸着であるから生産性
も良好である。In the magnetic recording medium of this invention, the in-plane magnetic force is 1? l
1, and 11 higher coercive force and squareness ratio can be obtained. Also, during manufacturing: IFii'j vapor deposition is used, so productivity is also good.

実施例′ 本発明においＣは第１図に示すように非磁性基体（１）
上にビスマス系合金の非磁性−ト地Ｊｆ４　（２１と金
属ｌａ４’、Ｉ層を形成してン１シ股磁気記録媒体を得
る。Example' In the present invention, C is a non-magnetic substrate (1) as shown in FIG.
A bismuth-based alloy non-magnetic substrate Jf4 (21) and a metal la4', I layer are formed on top to obtain a one-piece magnetic recording medium.

非磁性基体としζは例えばポリエチレンテレフタレー１
−、ポリアミド、ポリ゛〆ミドイミド、ポリイミド等の
高分子フィルム、ガラス、セラミック、９・ファイア或
いは表面を酸化した金属扱等を用いることができる。The non-magnetic substrate is ζ, for example, polyethylene terephthalate 1
Polymer films such as -, polyamide, polyimide-imide, polyimide, glass, ceramic, 9-fire, or metal treated with an oxidized surface can be used.

ビスマス系合金の土地層（２）は基体ｆｉｔ−，１：に
スパッタリングによって被着するもので、ＩＩ４と５〜
４５重量％のＰｂ、　Ｓｎ、　Ｃｄ、　Ｉｎ、　Ｓｂ、
　Ｇ８．　Ｚｎから選ばれた１種以上の金属から成る二
元系、三ノじ系或いは四ノじ系合金によって構成され、
そのｊソさは５０〜３００人に選定される。ヒスマス系
合金を選択したのは８ｋが５５重量％以」−のものは凝
固時に通常の金属と異なり体積が膨張する（ＩＩ　＊を
存するためである。The ground layer (2) of bismuth-based alloy is deposited on the substrate fit-, 1: by sputtering, and II4 and 5-
45% by weight of Pb, Sn, Cd, In, Sb,
G8. Consisting of a binary, three-way or four-way alloy consisting of one or more metals selected from Zn,
The number of participants will be selected between 50 and 300 people. The reason why a hismuth-based alloy was selected is that a hismuth-based alloy containing 55% by weight or more of 8k expands in volume during solidification (exists II*), unlike ordinary metals.

金属磁性層（３）は通１贋の蒸着によ−Ｊ　’ＣＣｏ、
　Ｒｅ、　Ｎｉのいずれか、或いはその合金例えばＣｏ
−Ｎｉ合金等を５０〜６００人好ましくは２００〜３０
０人の厚さに被着するごとによっ°ζＪｊ宅成し得る。The metal magnetic layer (3) is formed by evaporation of 1-J'CCo,
Either Re, Ni, or an alloy thereof such as Co
-Ni alloy etc. 50-600 people preferably 200-30 people
°ζJj can be made by applying each layer to a thickness of 0.

第２図は上地層（２）、金属磁性ｌ＠ｆ３１を形成する
装置の一例Ｃある。図中（４ンは真空容器で、この内部
が４つの室、ずなわら供給ロール（５）が配された供給
室（６八巻き取りロール（力が配された巻き取り室（８
）、スパッタリング室（９）及び蒸着室００１に仕切ら
れ、供給ロール（５）から繰り出された非磁性基体［１
，）が金属キ中ン（１１）及び（！２）を繞っ゛ζスパ
ッタリング室（９）及び蒸着室００１に移送され、これ
より巻き取りロール（７）に巻き取られるようになされ
る。FIG. 2 shows an example C of an apparatus for forming the upper layer (2) and the metal magnetic l@f31. In the figure (4) is a vacuum container, which has four chambers inside, a supply chamber (6) in which the Zunawara supply roll (5) is arranged (6) and a winding chamber (8) in which the winding roll (force is arranged).
), a sputtering chamber (9) and a deposition chamber 001, and a non-magnetic substrate [1
, ) is transported over the metal pins (11) and (!2) to the sputtering chamber (9) and the vapor deposition chamber 001, from where it is wound onto a winding roll (7).

スパッタリング室（９）の金１ｊＡキャン（１１）に対
向する］・方には金属クーケノ１−（１３）が配置され
、このターゲット（１３）と金属キャン（Ｉｆ）間に１
１１■周波？ｌｉ源よりの高周波が印加されるようにな
される。また蒸着室θ０）の金１７Ｍキャン（１２）に
対向するド方位置には蒸着源（１４）が配置される。８
石綿（１４）は図刀マしないが例えば電子銃からの電子
ビームご加熱される。（１５）は非硼１１１基体を所定
温度に加熱Ｊるための赤外線ランプ、（１６）はＪＪＩ
気目である。A metal 1jA can (11) in the sputtering chamber (9) is placed on the opposite side, and a metal 1-(13) is placed between the target (13) and the metal can (If).
11 ■ Frequency? A high frequency wave from an li source is applied. Further, a vapor deposition source (14) is arranged at a position facing the gold 17M can (12) in the vapor deposition chamber θ0). 8
Asbestos (14) is heated by an electron beam from an electron gun, for example. (15) is an infrared lamp for heating the non-boron 111 substrate to a predetermined temperature, (16) is JJI
It's a mood.

実施例１ 第２図の装置を使用し、２　Ｘ　１Ｏ−２Ｔｏｒｒの真
空Ｉ・で厚さ５０μのポリイミドフィルムよりなる非磁
性基体＋１＋を走行させ、先ずスパッタリング室（９）
で旧５７．５ｍｊｆ％、５ｎ１７．３ｍ１量％、Ｉｎ２
５．２車量％からなる合金ターゲット（１３）を用い′
Ｃスパッタ条件を適度に調節した１１１１周波スパッタ
リング処理にょっ−（厚さ２００人の旧−５ｎ−Ｉｎ合
金１・地層（２）を被着した。引き続き蒸着室００１に
おい゛Ｃ非磁性基体（１）の基体温度をＢ１−５ｎ−Ｉ
ｎ合金１・地１ｍ　（２１の凝固点７９℃以上の１５０
℃に保持した状態で蒸着源（１４）よりＧｏ−３５％Ｎ
＋合金を２５０人の厚さに蒸着して旧−３ｎ−Ｉｎ合金
１・“地１ｔｉｉ（２１ｊ−にＣｏ−Ｎｉ合金磁性１ｍ
　（３１を被着した。このようにして得られた薄般磁気
記録媒体を実施例１とした。Example 1 Using the apparatus shown in Fig. 2, a non-magnetic substrate +1+ made of a polyimide film with a thickness of 50 μm was run in a vacuum I of 2 × 10-2 Torr, and first the sputtering chamber (9) was opened.
Old 57.5mjf%, 5n17.3m1 volume%, In2
Using an alloy target (13) consisting of 5.2 car mass%'
A layer (2) of the former -5n-In alloy 1 with a thickness of 200 mm was deposited using a 1111 frequency sputtering process in which C sputtering conditions were appropriately adjusted. ) is the substrate temperature of B1-5n-I
n alloy 1・ground 1m (150
Go-35%N from the evaporation source (14) while maintained at ℃
+ alloy was evaporated to a thickness of 250 mm and Co-Ni alloy magnetic 1 m was deposited on the old -3n-In alloy 1.
(31) was deposited. The thin general magnetic recording medium thus obtained was referred to as Example 1.

比較例１ 基体温度をＢ１−５ｎ−Ｉｎ合金ト地Ｉｎ　ｆ２１の凝
固点以上の５０℃とし、その他は実施例１と同じにして
作！Ｉ１１メジた薄膜磁気記録媒体を比較例１とした。Comparative Example 1 The substrate temperature was set to 50°C above the freezing point of the B1-5n-In alloy substrate Inf21, and the other conditions were the same as in Example 1! Comparative Example 1 was a thin film magnetic recording medium with an I11 deviation.

」二記各例の磁気記録媒体の抗研〕月１Ｇ及び角型非Ｒ
ｓを下記表に不ず。” 2. Resistant grinding of magnetic recording media of each example] Moon 1G and square non-R
s is shown in the table below.

表 この表より明らかなように１−地層のｎ、；４度をその
凝固温度以上に＋ｌ］ｉ　くすると磁気特性の改善が顕
著である。一方、−１−地層の温度がその凝固ｌｉ＋！
１度より低いと上地層の効果がなく好ましくない。Table As is clear from this table, when the n,; On the other hand, the temperature of the -1- formation is the solidification li+!
If it is lower than 1 degree, the upper layer will not be effective and it is not preferable.

実施例２ 実施例１と同様の方法をとるも、１・地層用物餉とし′
ζ旧５０市量％、Ｐｂ３１．２市９％、５ｎｌｌ＋、８
ｍｌ；ｔ％の合金ターゲット（１３）を用い′ζ基体ｄ
、１４度を１５０　”Ｃとし′ζ旧−３ｎ−Ｉｎ合金１
〜地層（２）を形成した薄ｎＡ磁気記録媒体を実施例２
とした。なおこの旧−３ｎ−Ｉｎ合金１・地層の凝固点
は９４℃である。Example 2 The same method as Example 1 was used, but 1.
ζ Old 50 market weight%, Pb31.2 city 9%, 5nll+, 8
ml; t% alloy target (13) was used for ′ζ substrate d
, 14 degrees is 150 "C'ζ old-3n-In alloy 1
~Example 2 of a thin nA magnetic recording medium with a geological layer (2) formed
And so. Note that the freezing point of this former -3n-In alloy 1 layer is 94°C.

比較例２ 基体６１１Ｌ度を５０℃とし、その他は実施例迄と同様
にして作製した薄膜磁気記録媒体を比較例２としＡｍ。Comparative Example 2 Comparative Example 2 is a thin film magnetic recording medium manufactured in the same manner as in the examples up to the examples except that the temperature of the substrate 611L is 50° C. and the temperature is Am.

この実ｈ１シ例２及び比較例２の抗磁力及び角型比の結
果はほぼ実施例１及び比較例１と同様ごあっノこ。The results of the coercive force and squareness ratio of Example 2 and Comparative Example 2 are almost the same as those of Example 1 and Comparative Example 1.

面、合金ターゲット（１３）としＣは、例えば第３図に
示すようにビスマス基４１ｉ（２１）上に合金を構成」
る成分基鈑例えば実ｈｉ！］例２の場合にはＰｂ基扱（
２２）とＳｎ基板（２３）を所定の割合となるように、
１１つ各成分、基板（２２）　（２３）が非磁性基体（
１，１の幅方向に延在Ｊ−るように配列し、しかもこの
クーゲノ１−（１３）のリツｉｆ　（ｌ　Ｉが非磁ＩＩ
［基体（１）の’Ｉ’ｆｔｌρ２．１り人（ｊ！２＞ｊ
！１　）となるよ）に構成する。このような合金ターゲ
ットを用いれは、非磁イ１１基体＋１１のｌｌ’ｉｉｉ
方向に膜質の均一化が図れる。For example, as shown in FIG. 3, C constitutes an alloy on a bismuth base 41i (21).
For example, real hi! ] In the case of Example 2, Pb-based treatment (
22) and Sn substrate (23) in a predetermined ratio,
Each of the 11 components, the substrate (22) (23) is a non-magnetic substrate (
1, 1 are arranged so as to extend in the width direction of J-.
['I'ftlρ2.1 of base (1) (j!2>j
! 1). When such an alloy target is used, a non-magnetic 11 base + 11 ll'iii
The film quality can be made uniform in both directions.

また金属（Ｍ　Ｍ：　ＩＮ　（：（＋は一層に１９１！
られるものではなく上述のト地層を介在さセた多層構造
とすることもできる。Also metal (M M: IN (:(+ is even more 191!
It is also possible to have a multi-layered structure with the above-mentioned strata interposed therebetween.

発明の効果 」−述したように本発明によれば、凝固時に体積膨張す
るビスマス系合金の土地層を介して金ｊだ磁性層を形成
することにより、このド地１ｔ４の体積膨張に因る磁性
層の被着面の表向性によってこれの１−に形成する金属
磁（！１゛屓が、はぼ東向方向からの蒸着Ｃも微細化さ
れ、ＪＪｉ＋、）抗磁力１１ｃを２１マし、また１目１
い角型比Ｒｓを示す薄膜磁気記録媒体が１！Ｉられる。Effects of the Invention - As described above, according to the present invention, by forming a gold magnetic layer through a layer of bismuth-based alloy that expands in volume during solidification, Due to the superficiality of the surface to which the magnetic layer is adhered, the metal magnetic layer formed on this 1- (!1゛ layer, but the vapor deposition C from the eastward direction is also made finer, JJi+,) coercive force 11c is 21 mm. , also 1 eye 1
A thin film magnetic recording medium exhibiting a high squareness ratio Rs is 1! I get caught.

この磁気記録媒体は面内で磁気特性が等人的となされる
ものである。また、製造に際し゛てもほぼ中−直Ｆｉ着
であるから生産性も良好である。This magnetic recording medium has uniform magnetic properties within the plane. In addition, since the manufacturing process is almost straight-to-center firing, the productivity is also good.

【図面の簡単な説明】[Brief explanation of drawings]

第１し１は本発明によるηシ膜磁気ＩｉＬ！録媒体の断
面し１、第２図は本発明の一ト地層と金属磁性層を形成
する装置の一例をボず路線的構成図、第３図はその合金
クーゲソ１−の例を不ず）Ｖ−面図である。 （１）は非磁性基体、（２）はビスマス系合金のド地１
−１（３）は金属（ククｌ’ｌ　ｌｔ！！ｉ（ある。 代理人　炉層　貞 同　松隈秀盛 第１図 １１３図 ２１　囚 第２図The first is η film magnetism IiL! according to the present invention! Figures 1 and 2 are cross-sectional diagrams of a recording medium, and Figure 3 shows an example of an apparatus for forming a magnetic layer and a metal magnetic layer according to the present invention, and Figure 3 shows an example of the alloy. It is a V-plane view. (1) is a non-magnetic substrate, (2) is a bismuth alloy base 1
-1 (3) is a metal (kuku l'l lt!!i). Agent Furnace Teido Matsukuma Hidemori Figure 1 113 Figure 21 Prisoner Figure 2

Claims (1)

【特許請求の範囲】 非磁性基体上にビスマス系合金の１・地１督と、金属磁
性層が積層形成され、該ビスマス系合金はビスマスと５
−４ｓ車量％のＰｂ、　Ｓｎ、　Ｃｄ、　Ｉｎ＋　Ｓｂ
、　Ｇａ。 Ｚｎから選ばれた１種以上の金属とから構成されてなる
薄膜磁気記録媒体。[Claims] A bismuth-based alloy of 1 and 5 and a metal magnetic layer are laminated on a non-magnetic substrate, and the bismuth-based alloy contains bismuth and 5
-4s vehicle volume% Pb, Sn, Cd, In+ Sb
, Ga. A thin film magnetic recording medium composed of one or more metals selected from Zn.