JPS60162218A - Shutter device - Google Patents

Shutter device

Info

Publication number
JPS60162218A
JPS60162218A JP59016158A JP1615884A JPS60162218A JP S60162218 A JPS60162218 A JP S60162218A JP 59016158 A JP59016158 A JP 59016158A JP 1615884 A JP1615884 A JP 1615884A JP S60162218 A JPS60162218 A JP S60162218A
Authority
JP
Japan
Prior art keywords
light
shutter
pulses
rotation
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59016158A
Other languages
Japanese (ja)
Other versions
JPH0262940B2 (en
Inventor
Hideki Ine
秀樹 稲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59016158A priority Critical patent/JPS60162218A/en
Publication of JPS60162218A publication Critical patent/JPS60162218A/en
Publication of JPH0262940B2 publication Critical patent/JPH0262940B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/04—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light by periodically varying the intensity of light, e.g. using choppers

Abstract

PURPOSE:To easily control the quantity of transmitted light of light pulses by rotating a disk which has specific opening parts across the optical path of light pulses synchronously with light pulses of pulse oscillation laser light. CONSTITUTION:The rotating shutter disk 1 is provided with light transmission windows 2-4 whose area ratio is, for example, 4:2:1. On the other hand, light 7 from a light emitting diode 6 is made parallel to a shaft 10 and light incident on a photodetecting element 8 through an opening part of the shutter is detected, so that a controller 9 controls the rotation of the rotating shaft 10, therefore, the shutter disk 1 on the basis of the photodetection output. The rotation of the shutter disk 1 is synchronized to the light emission timing of pulses of the laser light 5. Consequently, the quantity of light is adjusted easily and accurately.

Description

【発明の詳細な説明】 〔技術分野〕 本発明はパルス発振レーザー光の照射光量可変シャッタ
ー装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a shutter device with variable irradiation amount of pulsed laser light.

〔従来技術〕[Prior art]

従来、リングラフィの光源として紫外線用ではＨ２ラン
プを、またディープ紫外線用では超高圧Ｘ　ｅ　−Ｈｔ
を使用している。しかし、かかる光ではレジスト感度が
弱く、このため長い露光時間を必要とし、作業性に乏し
かった。そこで輝度が高く多モード発振の為コヒーレン
シイの悪いエキシマレ−ザー（Ｅｘｃｔｍｅｒ−Ｌａｓ
ｅｒ　）が使用されるが、高出力にするとワンショット
パルスでも露光オーバニとなる場合がある。勿論、レー
ザー出力を適度に落して複数のショットパルスによって
露光す′ることも可能であるが、レーザー出力自体を制
御することは複雑であるとともに、レーザー性能の劣化
および耐久性が低下する。Conventionally, the light source for phosphorography was an H2 lamp for ultraviolet rays, and an ultra-high pressure X e -Ht for deep ultraviolet rays.
are using. However, resist sensitivity is low with such light, requiring a long exposure time and resulting in poor workability. Therefore, excimer lasers with high brightness and poor coherency due to multi-mode oscillation are used.
er ) is used, but when the output is high, even one-shot pulses may result in overexposure. Of course, it is also possible to reduce the laser output to an appropriate level and perform exposure using a plurality of shot pulses, but controlling the laser output itself is complicated, and the laser performance deteriorates and the durability decreases.

またレーザー出力自体が、動作中に経時変化する。この
出力変化を検知してレーザー出力をコントロール、特に
高速にコントロールすることは極めて難しい。Additionally, the laser output itself changes over time during operation. It is extremely difficult to detect this output change and control the laser output, especially at high speed.

〔発明の目的〕[Purpose of the invention]

本発明は上記従来例の欠点に鑑みて提案されたものであ
り、エキシマレーザ−等のパルス発振レーザー光の照射
光量を簡便に可変可能とするシャッター装置の提供を目
的とする。The present invention has been proposed in view of the above-mentioned drawbacks of the conventional example, and an object of the present invention is to provide a shutter device that can easily vary the amount of irradiation of pulsed laser light such as an excimer laser.

〔実施例〕〔Example〕

以下、図面を参照しながら本発明の実施例に係るシャッ
ター装置について説明する。第１図は実施例に係るシャ
ッター装置の回転シャッター１でちシ、光量変更用の開
口部２．３．４を有する。開口部２．３．４の面積比は
１　：４：　／４である。第２欄は射出されたパルス状
レーザー光５がシャッター１の所定の開口部に入射する
ようにシャッター１を回転制御する制御の原理を示す図
である。６は発光ダイオード、８は開口部を介して入射
するダイオード６の光７を検知する受光素子、９は受光
素子８の出力信号を検知してレーザー光５が所定の開口
部に照射するようにシャッター１の回転軸の回転量を制
御する制御装置である。Hereinafter, a shutter device according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 shows a rotary shutter 1 of a shutter device according to an embodiment, which has an opening 2.3.4 for changing the amount of light. The area ratio of the openings 2.3.4 is 1:4:/4. The second column is a diagram showing the principle of controlling the rotation of the shutter 1 so that the emitted pulsed laser beam 5 enters a predetermined opening of the shutter 1. 6 is a light emitting diode; 8 is a light receiving element that detects the light 7 of the diode 6 incident through the aperture; 9 is a light receiving element that detects the output signal of the light receiving element 8 so that the laser beam 5 irradiates a predetermined aperture. This is a control device that controls the amount of rotation of the rotation shaft of the shutter 1.

第３図は開口部２．３．４を介して照射されたレーザー
光の光量に対応する信号を示す図であシ、図においてパ
ルス２．３．４はそれぞれ開口部２．３．４をレーザー
光によるリング２フイー装置の概略構成図である。工１
はエキシマレーザ−光源、１は本実施例のシャッター装
置、１２はレーザー光を分割する半透鏡アレイ、１３は
半透鏡アレイによって分割された光をそれぞれ集光して
配光特性を均一化するハエの目レンズ、１４はハエの目
レンズからの各党を集光して平行光にするコリメータレ
ンズ、１５はマスク、１６はウニノ＼−である。FIG. 3 is a diagram showing signals corresponding to the amount of laser light irradiated through the aperture 2.3.4, in which pulses 2.3.4 each FIG. 2 is a schematic configuration diagram of a ring 2 fee device using laser light. Engineering 1
1 is an excimer laser light source, 1 is a shutter device of this embodiment, 12 is a semi-transparent mirror array that splits the laser beam, and 13 is a fly that collects the light split by the semi-transparent mirror array to make the light distribution characteristics uniform. 14 is a collimator lens that condenses each particle from the fly's eye lens into parallel light, 15 is a mask, and 16 is a unicorn.

なお゛、“実施例に係るシャッター装置のシャッターの
直径を２５４ｍ＋回転数は３０回／分とし、シャッター
中心から平均１００ｍｍの位置に開口部を設けると、開
口の速さは３１４．１６■／％である。一方、ビーム径
３０１ｒｍ　＋発光時間５０直でレーザー光を発光させ
ると、この発光時間ではシャッターの開口の位置は０．
０１５７μｍしか移動せず、シャッターは実質的に静止
していると考えてよい。このような前提においてシャッ
ターの回転とノくルスの発光タイミングを同期させるこ
とにより、容易にかつ正確に光量を調節することができ
る。Furthermore, "If the diameter of the shutter of the shutter device according to the embodiment is 254 m + the rotation speed is 30 times/min, and the opening is provided at an average position of 100 mm from the center of the shutter, the opening speed is 314.16 /%. On the other hand, if a laser beam is emitted with a beam diameter of 301 rm and a light emission time of 50, the position of the shutter aperture will be 0.
The shutter can be considered to be substantially stationary, having moved only 0.157 μm. Under such a premise, by synchronizing the rotation of the shutter and the timing of light emission of the Norculus, the amount of light can be easily and accurately adjusted.

次に実施例の動作について説明する０エキシマレーザ−
光源１−１から射出されたレーザー光はシャッター１の
所定の開口部、半透鏡アレイ１２゜ハエの目レンズ１３
およびコリメータレンズ１４ヲ介してマスク１５および
ウニノー−１６に入射する。このレーザーパルスの光量
がオーバー気味のとき、制御装置９は第３図に示す信号
を演算処理し、開口面積のより小さい開口部を選択する
ようにシャッター１の回転を制御する。これによシ、露
光光量の適正化が容易に行われる。Next, we will explain the operation of the 0 excimer laser.
The laser beam emitted from the light source 1-1 passes through a predetermined opening of the shutter 1, a semi-transparent mirror array 12, and a fly's eye lens 13.
The light then enters the mask 15 and Uni-No-16 via the collimator lens 14. When the amount of light of this laser pulse is a little excessive, the control device 9 processes the signals shown in FIG. 3 and controls the rotation of the shutter 1 so as to select an aperture with a smaller aperture area. This makes it easy to optimize the amount of exposure light.

なお、実施例では開口部を３種類設けたがそれ以上設け
ることも可能である。また第５図は別の実施例に係るシ
ャッターであるが、１７は円形状くさび型の開口部であ
る。この場合は回転タイミングを変えることにより透過
光量の連続的変化が“可能ムなる。Although three types of openings are provided in the embodiment, it is also possible to provide more than three types of openings. Further, FIG. 5 shows a shutter according to another embodiment, in which reference numeral 17 is a circular wedge-shaped opening. In this case, by changing the rotation timing, it becomes possible to continuously change the amount of transmitted light.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によればパルス発振レーザ
ー光の照射光量を簡便に可変することができる。また構
成が簡単であるから経済的である。As described above, according to the present invention, the amount of irradiation of pulsed laser light can be easily varied. Moreover, since the structure is simple, it is economical.

さらにレーザー光源の駆動源は一定条件に保持した状態
にあるからレーザー光源の長寿命化を図れる効果がある
。Furthermore, since the driving source of the laser light source is maintained under a constant condition, there is an effect that the life of the laser light source can be extended.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明の実施例に係るシャッター装置の上面図
、第２図は射出されたパルス状レーザー光がシャッター
の所定の開口部に入射するようにシャッターを回転制御
する制御の原理を示す図、第３図は各開口部を介して照
射されたレーザー光の光ソゲラフイー装置の概略構成図
、第５図は別の実施例に係るシャッターの上面図である
。 １、・・・シャッター ２．３，４．１７・・・開口部 ５・・・レーザー光 ６・・・発光ダイオードの光 ８・・・受光素子 ９・・・制御装置 １０・・・回転軸 １１・・・レーザー光源 １２・・・半透鏡アレイ １３・・・ハエの目レンズ １４・・・、コリメータレンズ エ５・・・マスク １６・・・ウエハ 第３図 第４図 第５図Fig. 1 is a top view of a shutter device according to an embodiment of the present invention, and Fig. 2 shows the principle of controlling the rotation of the shutter so that the emitted pulsed laser beam enters a predetermined opening of the shutter. FIG. 3 is a schematic configuration diagram of an optical soger-fi device for emitting laser light through each opening, and FIG. 5 is a top view of a shutter according to another embodiment. 1. Shutter 2.3, 4.17 Opening 5 Laser light 6 Light emitting diode light 8 Light receiving element 9 Control device 10 Rotation axis 11...Laser light source 12...Semi-transparent mirror array 13...Fly's eye lens 14...Collimator lens 5...Mask 16...Wafer Fig. 3 Fig. 4 Fig. 5

Claims (1)

【特許請求の範囲】[Claims] パルス発振レーザー光の光パルスに同期して該光パルス
の光路上に所定の開口部を位置移動させ、該光パルスの
透過光量を制御することを特徴とするシャッター装置。A shutter device characterized in that a predetermined aperture is moved in synchronization with a light pulse of a pulsed laser beam on the optical path of the light pulse to control the amount of transmitted light of the light pulse.
JP59016158A 1984-02-02 1984-02-02 Shutter device Granted JPS60162218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59016158A JPS60162218A (en) 1984-02-02 1984-02-02 Shutter device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59016158A JPS60162218A (en) 1984-02-02 1984-02-02 Shutter device

Publications (2)

Publication Number Publication Date
JPS60162218A true JPS60162218A (en) 1985-08-24
JPH0262940B2 JPH0262940B2 (en) 1990-12-27

Family

ID=11908695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59016158A Granted JPS60162218A (en) 1984-02-02 1984-02-02 Shutter device

Country Status (1)

Country Link
JP (1) JPS60162218A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947047A (en) * 1987-02-05 1990-08-07 Canon Kabushiki Kaisha Exposure system with exposure controlling acoustooptic element
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
US5597670A (en) * 1990-03-09 1997-01-28 Canon Kabushiki Kaisha Exposure method and apparatus
JP2010089094A (en) * 2008-10-03 2010-04-22 Disco Abrasive Syst Ltd Laser beam machining apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50766A (en) * 1973-05-02 1975-01-07
JPS5046080A (en) * 1973-08-28 1975-04-24
JPS5347825A (en) * 1976-10-12 1978-04-28 Toshiba Corp Photoresist exposure
JPS56119646U (en) * 1980-02-15 1981-09-11

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50766A (en) * 1973-05-02 1975-01-07
JPS5046080A (en) * 1973-08-28 1975-04-24
JPS5347825A (en) * 1976-10-12 1978-04-28 Toshiba Corp Photoresist exposure
JPS56119646U (en) * 1980-02-15 1981-09-11

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947047A (en) * 1987-02-05 1990-08-07 Canon Kabushiki Kaisha Exposure system with exposure controlling acoustooptic element
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
US5463497A (en) * 1989-06-08 1995-10-31 Canon Kabushiki Kaisha Illumination device including an optical integrator defining a plurality of secondary light sources and related method
US5597670A (en) * 1990-03-09 1997-01-28 Canon Kabushiki Kaisha Exposure method and apparatus
US5661547A (en) * 1990-03-09 1997-08-26 Canon Kabushiki Kaisha Exposure method and apparatus and device produced thereby in which a stop includes an opening which is variable to substantially compensate for a change in bandwidth of a laser beam
JP2010089094A (en) * 2008-10-03 2010-04-22 Disco Abrasive Syst Ltd Laser beam machining apparatus

Also Published As

Publication number Publication date
JPH0262940B2 (en) 1990-12-27

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