JPS60119744U - Wafer holder used in the epitaxial layer formation process - Google Patents

Wafer holder used in the epitaxial layer formation process

Info

Publication number
JPS60119744U
JPS60119744U JP848484U JP848484U JPS60119744U JP S60119744 U JPS60119744 U JP S60119744U JP 848484 U JP848484 U JP 848484U JP 848484 U JP848484 U JP 848484U JP S60119744 U JPS60119744 U JP S60119744U
Authority
JP
Japan
Prior art keywords
epitaxial layer
wafer holder
formation process
layer formation
holder used
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP848484U
Other languages
Japanese (ja)
Inventor
渡辺　尚俊
Original Assignee
ロ−ム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ロ−ム株式会社 filed Critical ロ−ム株式会社
Priority to JP848484U priority Critical patent/JPS60119744U/en
Publication of JPS60119744U publication Critical patent/JPS60119744U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案のウェハ用ホルダーを具備したエピタキ
シャル層の形成装置の説明図、第２図はウェハ用ホルダ
ーの断面図である。 ３・・・・・・ウェハ用ホルダー、３１・・間開口、３
２・・・・・・段部、３３・・・・・・傾斜面。FIG. 1 is an explanatory diagram of an epitaxial layer forming apparatus equipped with a wafer holder according to the present invention, and FIG. 2 is a sectional view of the wafer holder. 3... Wafer holder, 31... opening, 3
2...Stepped portion, 33...Slanted surface.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ウェハの裏面にもエピタキシャル層が形成しうるように
開口したことを特徴とするエピタキシャル層の形成工程
に使用するウェハ用ホルダー。A wafer holder used in an epitaxial layer forming process, characterized by having an opening so that an epitaxial layer can also be formed on the back side of the wafer.
JP848484U 1984-01-24 1984-01-24 Wafer holder used in the epitaxial layer formation process Pending JPS60119744U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP848484U JPS60119744U (en) 1984-01-24 1984-01-24 Wafer holder used in the epitaxial layer formation process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP848484U JPS60119744U (en) 1984-01-24 1984-01-24 Wafer holder used in the epitaxial layer formation process

Publications (1)

Publication Number Publication Date
JPS60119744U true JPS60119744U (en) 1985-08-13

Family

ID=30487812

Family Applications (1)

Application Number Title Priority Date Filing Date
JP848484U Pending JPS60119744U (en) 1984-01-24 1984-01-24 Wafer holder used in the epitaxial layer formation process

Country Status (1)

Country Link
JP (1) JPS60119744U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4856581A (en) * 1971-10-27 1973-08-08

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4856581A (en) * 1971-10-27 1973-08-08

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