JPS60100418A - Manufacture of magnetic thin film - Google Patents
Manufacture of magnetic thin filmInfo
- Publication number
- JPS60100418A JPS60100418A JP20803683A JP20803683A JPS60100418A JP S60100418 A JPS60100418 A JP S60100418A JP 20803683 A JP20803683 A JP 20803683A JP 20803683 A JP20803683 A JP 20803683A JP S60100418 A JPS60100418 A JP S60100418A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- composite target
- substrate
- thin film
- magnetic thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は主として垂直熱磁気記録方式において記録媒体
として用いられる磁性薄膜のＩｌｌｌｌ決方法するもの
である。DETAILED DESCRIPTION OF THE INVENTION The present invention is primarily concerned with a method for determining a magnetic thin film used as a recording medium in a perpendicular thermomagnetic recording system.
垂直熱磁気記録方式とはガラス、セラミックス。Vertical thermomagnetic recording method uses glass and ceramics.
プラスチック等の非磁性体からなる基材上に磁性薄膜か
らなる垂直磁化可能な記録媒体を形成せしめ、該記録媒
体表面にレーザ光線を照射して照射部分をキュリ一点近
傍、もしくは補償点近傍に加熱し、この部分を含む該記
録媒体領域にバイアス磁界をかけることＫよってこの部
分の磁化を他の部分とは逆の方向に配向せしめることＫ
より熱磁気的に情報の書き込みを行い、原情報の読み出
しには別の直線偏向したレーザ光線を該記録媒体表面に
あて、該表面からの反射光を検光子を介して光学的に検
出することによる。即ち該レーザ光線は情報が書き込ま
れている該記録媒***置においてカー効果によって偏光
面が回転するので、読み出しの際は上記偏光面の回転を
検出することになる。上記偏光面の回転角度をカー回転
角ｅｋと言う。A perpendicularly magnetizable recording medium made of a magnetic thin film is formed on a base material made of a non-magnetic material such as plastic, and the surface of the recording medium is irradiated with a laser beam to heat the irradiated area to near the Curie point or near the compensation point. However, by applying a bias magnetic field to the recording medium area including this part, the magnetization of this part is oriented in the opposite direction to that of other parts.
Information is written more thermomagnetically, and another linearly polarized laser beam is applied to the surface of the recording medium to read the original information, and the reflected light from the surface is optically detected via an analyzer. by. That is, since the plane of polarization of the laser beam rotates due to the Kerr effect at the position of the recording medium where information is written, the rotation of the plane of polarization is detected during reading. The rotation angle of the plane of polarization is called the Kerr rotation angle ek.
従来から上記記録媒体を構成する磁性薄膜の材料として
Ｇｄ−Ｆｅ非晶質合金が用いられている。最近該Ｇｄ−
Ｆｅ非晶質合金に更にＢｉを添加してＧｄ −Ｆｅ−Ｂ
ｉ非晶質合金とするｅｋが増大して良好なＳＮ比が得ら
れることが判明した。該Ｇｄ−Ｆｅ−Ｂ１非晶質合金か
らなる磁性薄膜を形成するには第１図に示すようにＦｅ
基板（１）上にＧｄ小片（２）およびＢｉ小片（３）を
適宜配置した複合ターゲット０１を用い、これに荷電し
てＧｄ−Ｆｅ−Ｂ１合金をスパッタリングし基材上にＧ
ｄ−Ｆｅ−Ｂ１非晶質合金層を作製する方法が考えられ
る。しかしＢｉの融点は低く （２７１，８℃）、該複
合ターゲットＯＱを用いればスパッタリング中にＢｉが
溶−してしまって所定の組成のＧｄ−Ｆｅ−Ｂ１非晶質
合金層が得られない。しかしＧｄ−Ｆｅ−Ｂ１合金は極
めて脆く単独のターゲットとして用いることは出来ない
。史にＧｄ−Ｆｅ合金も同様に脆くターゲットの一要素
として用いることは出来ない。Conventionally, a Gd-Fe amorphous alloy has been used as a material for the magnetic thin film constituting the recording medium. Recently the Gd-
By further adding Bi to Fe amorphous alloy, Gd-Fe-B
It was found that the ek of the i-amorphous alloy increased and a good S/N ratio was obtained. To form a magnetic thin film made of the Gd-Fe-B1 amorphous alloy, as shown in FIG.
Using a composite target 01 in which small pieces of Gd (2) and small pieces of Bi (3) are appropriately arranged on a substrate (1), this is charged and a Gd-Fe-B1 alloy is sputtered to deposit G on the base material.
A method of producing a d-Fe-B1 amorphous alloy layer is considered. However, the melting point of Bi is low (271.8 DEG C.), and if the composite target OQ is used, Bi will melt during sputtering, making it impossible to obtain a Gd-Fe-B1 amorphous alloy layer with a predetermined composition. However, the Gd-Fe-B1 alloy is extremely brittle and cannot be used as a single target. Historically, Gd-Fe alloys are similarly brittle and cannot be used as a target element.
本発明は上記従来の問題点を解決することを目的とし、
Ｇｄ、 Ｆｅ、 Ｂｉからなる複合ターゲットを基材上
にスパッタリングしてＧｄ−Ｆｅ−Ｂ１非晶質合金から
なる磁性薄膜を形成するに際し、該複合ターゲットの一
要素をＧｄ−Ｂ１合金、もしくはＦｅ−Ｂ１合金とし、
Ｂｉ単独からなる要素およびＧｄ−Ｆｅ合金からなる要
素を存在せしめないことを骨子とするものである。The present invention aims to solve the above conventional problems,
When sputtering a composite target consisting of Gd, Fe, and Bi onto a base material to form a magnetic thin film consisting of a Gd-Fe-B1 amorphous alloy, one element of the composite target is Gd-B1 alloy or Fe- B1 alloy,
The main point is not to have elements made of Bi alone and elements made of Gd-Fe alloy.
本発明においては上記骨子によりＧｄ、Ｆｅ、Ｂｉから
なる複合ターゲ、、、トにおいて、その−要素をＧｄ−
Ｂ１合金もしくはＦｅ−Ｂ１合金とし、これら合金は融
点が高くかつ脆くないから取扱かい易く、また融点の低
いＢｉ単独要素や脆くて取扱かい困１’［かに−Ｆｅ合
金要素は全く存在せず、所定の組成のＧｄ−Ｆｅ−Ｂ１
非晶質合金からなる磁性薄膜がスパッタリングによって
容易に得られるのである。In the present invention, according to the above-mentioned outline, in a composite target consisting of Gd, Fe, and Bi, the - element is replaced with Gd-
B1 alloy or Fe-B1 alloy is used, and these alloys have a high melting point and are not brittle, so they are easy to handle. , Gd-Fe-B1 with a predetermined composition
A magnetic thin film made of an amorphous alloy can be easily obtained by sputtering.
本発明を以下に詳細に説明する。The invention will be explained in detail below.
本発明の複合ターゲットの一実施例を第２図に示す。該
複合ターゲラｌ）は内釜状の基板α力と、該基板０１）
上に配置される小片（２）の各要素からなる。An embodiment of the composite target of the present invention is shown in FIG. The composite target layer l) has an inner pot-shaped substrate α force and the substrate 01).
Consists of each element of the piece (2) placed on top.
そして本発明において各要素は下記の組成を有する。In the present invention, each element has the following composition.
基板αＤ 小片（イ）
ケース１ＦｅＧｄ−Ｂｉ
２Ｇｄ−ＢｉＦｅ
８ＧｄＦｅ−Ｂｉ
４Ｆｅ−ＢｉＧｄ
上記のようＫいづれのケースにおいても融点の低いＢｉ
単独要素、あるいは脆いＧｄ−Ｆｅ要素は存在しない。Substrate αD Small piece (A) Case 1 FeGd-Bi 2Gd-BiFe 8GdFe-Bi 4Fe-BiGd As shown above, in both cases, Bi has a low melting point.
There are no single elements or brittle Gd-Fe elements.
そしてＧｄ−Ｂ１合金は脆くなく融点は９７５℃以上で
あり、Ｆｅ−Ｂ１合金もまた脆くなく倣点けほぼＦｅと
同じであり、したがって本発明にかかる複合ターゲット
（イ）を第８図に示すようにスパッタリング室（ロ）の
電極（イ）の背板（イ）Ａ上に記載しシャッタ勢を介し
てホルダー（財）に支持される基板（２）と相対させ、
通気孔（ホ）を介してアルゴンガス、ネオンガス等の不
活性ガスによって室（財）内を置換した上で電極勾を介
して該複合ターゲラｌ）に荷電してシャッタ（至）を開
けば基材（ハ）の表面には所定の組成のＧｄ−Ｆｅ−Ｂ
１非晶質合金層がスパッタリングされる。なお基材（２
）としてはプラスチック、セラミツ片ガラス等の材料が
用いられる。The Gd-B1 alloy is not brittle and has a melting point of 975°C or higher, and the Fe-B1 alloy is also not brittle and has almost the same melting point as Fe. Therefore, the composite target (a) according to the present invention is made as shown in FIG. is written on the back plate (A) of the electrode (A) in the sputtering chamber (B) and is placed opposite to the substrate (2) supported by the holder (goods) via the shutter mechanism,
After replacing the inside of the chamber with an inert gas such as argon gas or neon gas through the ventilation hole (e), the composite target layer (l) is charged through the electrode gradient and the shutter (l) is opened. The surface of the material (c) is coated with Gd-Fe-B of a predetermined composition.
1 amorphous alloy layer is sputtered. Note that the base material (2
), materials such as plastic, ceramic glass pieces, etc. are used.
上記実施例の他、複合ターゲットにおいて基板（２）表
面に所定の個数の嵌合孔を設け、該嵌合孔に小片（２）
を密′嵌すれば基板（１１）上で小片（２）がずれるこ
となく、有利にスパッタリングを行い得る。In addition to the above embodiments, in a composite target, a predetermined number of fitting holes are provided on the surface of the substrate (2), and a small piece (2) is inserted into the fitting hole.
If they are tightly fitted, sputtering can be advantageously performed without the small piece (2) shifting on the substrate (11).
第１図は従来の複合ターゲットの斜視図、第２図は本発
明の複合ターゲットの一実施例の斜視図、第８図はスパ
ッタリング説明図である。
図中、α力・・・・基板、（２）・・・・小片、（イ）
・・・・複合ターゲット
特許出願人 大同特殊鋼株式会社FIG. 1 is a perspective view of a conventional composite target, FIG. 2 is a perspective view of an embodiment of the composite target of the present invention, and FIG. 8 is an explanatory diagram of sputtering. In the figure, α force...Substrate, (2)...Small piece, (A)
...Composite target patent applicant Daido Steel Co., Ltd.
Claims (1)
にスパッタリングしてＧｄ−Ｆｅ−Ｂ１非晶質合金から
なる磁性薄膜を形成するに際し、該複合ターゲットの一
要素をＧｄ −Ｂ ｉ合金、もしくはＦｅ−Ｂ１合金と
しＢｉ単独からなる要素およびＧｄ−Ｆｅ合金からなる
要素を存在せしめないことを特徴とする磁性薄膜の製造
方法When sputtering a composite target consisting of Gd, Fe, and Bi onto a base material to form a magnetic thin film consisting of a Gd-Fe-B1 amorphous alloy, one element of the composite target is a Gd-Bi alloy or a Fe alloy. - A method for producing a magnetic thin film characterized in that the B1 alloy is used and no element consisting of Bi alone or an element consisting of a Gd-Fe alloy is present.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20803683A JPS60100418A (en) | 1983-11-04 | 1983-11-04 | Manufacture of magnetic thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20803683A JPS60100418A (en) | 1983-11-04 | 1983-11-04 | Manufacture of magnetic thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60100418A true JPS60100418A (en) | 1985-06-04 |
| JPH056334B2 JPH056334B2 (en) | 1993-01-26 |
Family
ID=16549590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20803683A Granted JPS60100418A (en) | 1983-11-04 | 1983-11-04 | Manufacture of magnetic thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60100418A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6118107A (en) * | 1984-07-04 | 1986-01-27 | Ricoh Co Ltd | Non-crystalline magneto-optical layer |
| JP2007169779A (en) * | 2005-11-24 | 2007-07-05 | Ricoh Co Ltd | Sputtering target and manufacturing method therefor, and optical recording medium and manufacturing method therefor |
-
1983
- 1983-11-04 JP JP20803683A patent/JPS60100418A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6118107A (en) * | 1984-07-04 | 1986-01-27 | Ricoh Co Ltd | Non-crystalline magneto-optical layer |
| JP2007169779A (en) * | 2005-11-24 | 2007-07-05 | Ricoh Co Ltd | Sputtering target and manufacturing method therefor, and optical recording medium and manufacturing method therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH056334B2 (en) | 1993-01-26 |
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