JPS5987742A - Lens for charged particle - Google Patents
Lens for charged particleInfo
- Publication number
- JPS5987742A JPS5987742A JP19796682A JP19796682A JPS5987742A JP S5987742 A JPS5987742 A JP S5987742A JP 19796682 A JP19796682 A JP 19796682A JP 19796682 A JP19796682 A JP 19796682A JP S5987742 A JPS5987742 A JP S5987742A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- iris
- magnetic
- ion
- electrostatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/145—Combinations of electrostatic and magnetic lenses
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、イメンヒーム露光装Ｆｔ俸イオン源を用いた
分析装置等のイオン及び電子ビームを使用した装置のレ
ンズに関する新規な改良を行ｔｒうものである。DETAILED DESCRIPTION OF THE INVENTION The present invention provides a novel improvement regarding a lens for an apparatus using ion and electron beams, such as an analyzer using an Ft-balance ion source of the Immenheem exposure system.
イオンヒーム露光装置又は２次イオン賀爬分Ｍｉ装置ｉ
Ｍでは細く絞った１次イオンビームにより試料光１ｒＩ
ｉを走査し、試料を加工［たり、試料から得られる２次
但嘱を分析したりする。Ion beam exposure device or secondary ion beam exposure device
In M, sample light 1rI is generated by a narrowly focused primary ion beam.
i is scanned, the sample is processed, and the secondary properties obtained from the sample are analyzed.
イオンビームの収束には静電レンズが使用感れることか
多い、これは静電レンズが質量数の弄なったイオンに対
しても同じ電圧で収束できる特色がある。Electrostatic lenses are often used to focus ion beams, and this is because electrostatic lenses can focus ions with different mass numbers with the same voltage.
一方電、子ビームをイオンビームと同一軸上から試料に
照射できると数々の有利な点が生れる、例えばイオンと
電子の物理的な特徴の差を利用して電子ビームにより表
面形状を観察しイオンビームにより微細加工を行ったり
することができるし分析装置においてはイオンビームに
より２次イオン質歇分析を行ない？■電子ビームよりオ
ージェ電子分光を行ったりできる。この場合試料面にお
ける加工、分析領域が微細であるから特に同一軸上から
電子及びイメンを照射できることが重要である。電子ビ
ームを収束ζせる場合静電レンズを使用しマもよいが、
数十オン〃゛ストロームまで収束させようとするとレン
ズの工作精度がむすかくなる。そこで通常磁気レンズが
使用される。On the other hand, being able to irradiate a sample with an electron beam and an ion beam from the same axis provides a number of advantages.For example, it is possible to observe surface topography with an electron beam by taking advantage of the differences in the physical characteristics of ions and electrons. The ion beam can be used to perform fine processing, and the analyzer uses the ion beam to perform secondary ion quality analysis. ■Auger electron spectroscopy can be performed using an electron beam. In this case, since the processing and analysis area on the sample surface is minute, it is particularly important to be able to irradiate electrons and electrons from the same axis. If you want to converge the electron beam, you can use an electrostatic lens, but
If you try to converge down to several tens of angstroms, the precision of the lens manufacturing will be difficult. Therefore, magnetic lenses are usually used.
本発明では前述のようなイオンと電子を共用する様な装
置において極めて幼芽的な手段を枡供することを目的と
している。The purpose of the present invention is to provide an extremely primitive means for the above-mentioned device that uses both ions and electrons.
荷！１粒子をＩＩＶ束ζせるためのレンズは静電レンズ
でも磁気レンズでも光学レンズと同様１／σ＋１／ｂ＝
１／ｆ の式が成立する。ここでαけ光源からレンズ中
心までの距離、ｂｈレンズ中心から結像点までの距離１
．ｆけ焦点距離である。load! The lens for making one particle into IIV flux ζ is either an electrostatic lens or a magnetic lens, and it is the same as an optical lens, 1/σ + 1/b =
The formula 1/f holds true. Here, α is the distance from the light source to the lens center, bh is the distance from the lens center to the imaging point 1
．． f is the focal length.
即ちなるべく １１１ ＜ ｉニーるためにはレンズ中
心から結像点（試料位置）までの距離を短くした方が良
い。That is, in order to satisfy 111 < i as much as possible, it is better to shorten the distance from the lens center to the imaging point (sample position).
しかしながら試料から得られる各種の情報の検出器を試
料近回に設置し、効率を上はるためできるだけ試料に近
すけようとすると試料とレンズ下面までの距離（ワーキ
ングディスタンス・動作距離という）がある程度必要と
なってぐる。そこで動作距離をある程度とり、なお静電
レンズと磁気レンズの両者を試料面に近ずけるには双方
をうまく結合せねばならない。However, if you install a detector for various information obtained from the sample near the sample and try to get it as close to the sample as possible to increase efficiency, the distance between the sample and the bottom surface of the lens (called the working distance) will increase to a certain extent. It becomes necessary. Therefore, in order to maintain a certain operating distance and bring both the electrostatic lens and the magnetic lens close to the sample surface, it is necessary to combine them well.
以下第１図により本発明による荷電粒子レンズの好適な
実施例について詳細に説明する。A preferred embodiment of the charged particle lens according to the present invention will be described in detail below with reference to FIG.
第１図において、磁気レンズ巻線１．ふ・よび磁気回路
２により磁気レンズを構成する、この場合４−レンズ絞
りの役目をする。まｆＣ３及び５け、静ｍ゛レンズの上
下電極で通常接地電位になる。又４ｉ１１中間電椿とし
て高常圧をかける。ヌ絶縁物乙により高圧を浮かし外部
から真空中に電圧をもたらす役目をする。In FIG. 1, magnetic lens winding 1. The magnetic circuit 2 constitutes a magnetic lens, which in this case serves as a 4-lens diaphragm. At C3 and C5, the upper and lower electrodes of the static m lens are normally at ground potential. Also, high normal pressure is applied as a 4i11 intermediate electric camellia. It plays the role of floating high voltage through the insulator and bringing voltage into the vacuum from the outside.
図中４のレンズ絞り又は中間電極は、磁りｉレンズの場
合１００μから数百μの穴径で静電レンズの場合は１１
１１Ｌから数龍であるから複数の穴をあけ真空列から移
動させ目的により最適の穴径を選択できるようにする。The lens diaphragm or intermediate electrode 4 in the figure has a hole diameter of 100μ to several hundred μ in the case of a magnetic i-lens, and 11μ in the case of an electrostatic lens.
Since it is a number from 11L, multiple holes are drilled and moved from the vacuum row so that the optimum hole diameter can be selected depending on the purpose.
又静電レンズを構成する３枚のｉ、４１Ｆ３，４．５は
磁性体ではない材料、例えばタンタルとかモリブテン等
をイリ１用寸ればイオンによる１ｉＪ傷も少なくでよい
。又、磁気レンズとして使用する場合は中間型′！１ｉ
４ｆ′ｉ接地するかこれに近い電位にする。Furthermore, if the three lenses i, 41F3, and 4.5 constituting the electrostatic lens are made of a non-magnetic material, such as tantalum or molybdenum, scratches caused by ions can be reduced. Also, when using it as a magnetic lens, use an intermediate type! 1i
4f'i Ground or set to a potential close to this.
図面は本発明による荷電粒子゛用レンズを示す構成図で
ある。
１・・・・・・磁気レンズ巻線
２・・・・・・磁り（回路
３・・・・・・士電榛
４・・・・・・中間電極
５・・・・・・下１１枠
ｌｉｔ上
出願人 株伏会社 第二粋工舎
イ（゛押入 弁理士 最上 務The drawing is a configuration diagram showing a lens for charged particles according to the present invention. 1... Magnetic lens winding 2... Magnetism (circuit 3... Shidenshi 4... Intermediate electrode 5... Lower 11 Applicant in the frame lit: Daini-Isikosha Co., Ltd. (Mr. Oshiri, Patent Attorney Tsutomu Mogami)
Claims (1)
磁気レンズ中心に設Ｈられた絞りを共用し上下に静電、
レンズ用電罹を配置り、絞りに高電圧を印加することに
より静電レンズを構成したことを％徴とする荷電粒子用
複合レンズ。It is composed of a hexamagnetic father lens consisting of coil windings and magnetic poles, and a diaphragm installed at the center of the magnetic lens.
A composite lens for charged particles that is characterized by an electrostatic lens constructed by arranging an electrostatic lens for the lens and applying a high voltage to the aperture.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19796682A JPS5987742A (en) | 1982-11-11 | 1982-11-11 | Lens for charged particle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19796682A JPS5987742A (en) | 1982-11-11 | 1982-11-11 | Lens for charged particle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5987742A true JPS5987742A (en) | 1984-05-21 |
| JPH0332852B2 JPH0332852B2 (en) | 1991-05-15 |
Family
ID=16383280
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19796682A Granted JPS5987742A (en) | 1982-11-11 | 1982-11-11 | Lens for charged particle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5987742A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS535962A (en) * | 1976-07-06 | 1978-01-19 | Matsushita Electric Ind Co Ltd | Electron microscope |
-
1982
- 1982-11-11 JP JP19796682A patent/JPS5987742A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS535962A (en) * | 1976-07-06 | 1978-01-19 | Matsushita Electric Ind Co Ltd | Electron microscope |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0332852B2 (en) | 1991-05-15 |
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