JPS5984249A - Organic coat - Google Patents
Organic coatInfo
- Publication number
- JPS5984249A JPS5984249A JP57194349A JP19434982A JPS5984249A JP S5984249 A JPS5984249 A JP S5984249A JP 57194349 A JP57194349 A JP 57194349A JP 19434982 A JP19434982 A JP 19434982A JP S5984249 A JPS5984249 A JP S5984249A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- coating
- laser
- charge
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 6
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- 125000000732 arylene group Chemical group 0.000 claims abstract description 3
- 150000001450 anions Chemical group 0.000 claims abstract 2
- 125000005504 styryl group Chemical group 0.000 claims abstract 2
- 150000001875 compounds Chemical class 0.000 claims description 26
- 125000001424 substituent group Chemical group 0.000 claims description 10
- 238000000576 coating method Methods 0.000 abstract description 45
- 239000011248 coating agent Substances 0.000 abstract description 28
- 230000003287 optical effect Effects 0.000 abstract description 21
- 108091008695 photoreceptors Proteins 0.000 abstract description 20
- 239000011230 binding agent Substances 0.000 abstract description 13
- 230000035945 sensitivity Effects 0.000 abstract description 11
- 229910052782 aluminium Inorganic materials 0.000 abstract description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 10
- 239000000020 Nitrocellulose Substances 0.000 abstract description 5
- 229920001220 nitrocellulos Polymers 0.000 abstract description 5
- 238000000151 deposition Methods 0.000 abstract description 3
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 125000001624 naphthyl group Chemical group 0.000 abstract description 2
- 229920006267 polyester film Polymers 0.000 abstract 1
- 239000010408 film Substances 0.000 description 35
- 230000032258 transport Effects 0.000 description 30
- -1 diphenylamino, phenylamino, phenylbenzylamine Chemical group 0.000 description 28
- 229920005989 resin Polymers 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- 239000000126 substance Substances 0.000 description 15
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 230000010355 oscillation Effects 0.000 description 10
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 229920002678 cellulose Polymers 0.000 description 8
- 239000002800 charge carrier Substances 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
- 239000001913 cellulose Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000004372 Polyvinyl alcohol Substances 0.000 description 5
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 5
- 239000005018 casein Substances 0.000 description 5
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 5
- 235000021240 caseins Nutrition 0.000 description 5
- 238000003618 dip coating Methods 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 239000004033 plastic Substances 0.000 description 5
- 229920002451 polyvinyl alcohol Polymers 0.000 description 5
- 229910052711 selenium Inorganic materials 0.000 description 5
- 239000011669 selenium Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 239000004952 Polyamide Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 4
- 229920002647 polyamide Polymers 0.000 description 4
- 229920001230 polyarylate Polymers 0.000 description 4
- 125000004076 pyridyl group Chemical group 0.000 description 4
- 229910052714 tellurium Inorganic materials 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 3
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 3
- 229920002301 cellulose acetate Polymers 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229920002401 polyacrylamide Polymers 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical group ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229940126062 Compound A Drugs 0.000 description 2
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000007611 bar coating method Methods 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 2
- 229920001727 cellulose butyrate Polymers 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000007766 curtain coating Methods 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 2
- 150000007857 hydrazones Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- 239000011118 polyvinyl acetate Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 2
- 150000003219 pyrazolines Chemical class 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 238000007761 roller coating Methods 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 150000003462 sulfoxides Chemical class 0.000 description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 2
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
- SGIKAVNBVLFQSG-UHFFFAOYSA-N 1,1-diethyl-2,2-dimethylhydrazine Chemical compound CCN(CC)N(C)C SGIKAVNBVLFQSG-UHFFFAOYSA-N 0.000 description 1
- 125000004958 1,4-naphthylene group Chemical group 0.000 description 1
- LFKNYYQRWMMFSM-UHFFFAOYSA-N 1-ethyl-9h-carbazole;formaldehyde Chemical compound O=C.N1C2=CC=CC=C2C2=C1C(CC)=CC=C2 LFKNYYQRWMMFSM-UHFFFAOYSA-N 0.000 description 1
- VDFKURANQKCOAI-UHFFFAOYSA-N 1-nitrofluoren-9-one Chemical compound C12=CC=CC=C2C(=O)C2=C1C=CC=C2[N+](=O)[O-] VDFKURANQKCOAI-UHFFFAOYSA-N 0.000 description 1
- FKNIDKXOANSRCS-UHFFFAOYSA-N 2,3,4-trinitrofluoren-1-one Chemical compound C1=CC=C2C3=C([N+](=O)[O-])C([N+]([O-])=O)=C([N+]([O-])=O)C(=O)C3=CC2=C1 FKNIDKXOANSRCS-UHFFFAOYSA-N 0.000 description 1
- VEUMBMHMMCOFAG-UHFFFAOYSA-N 2,3-dihydrooxadiazole Chemical compound N1NC=CO1 VEUMBMHMMCOFAG-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- MNFZZNNFORDXSV-UHFFFAOYSA-N 4-(diethylamino)benzaldehyde Chemical compound CCN(CC)C1=CC=C(C=O)C=C1 MNFZZNNFORDXSV-UHFFFAOYSA-N 0.000 description 1
- LLLVZDVNHNWSDS-UHFFFAOYSA-N 4-methylidene-3,5-dioxabicyclo[5.2.2]undeca-1(9),7,10-triene-2,6-dione Chemical compound C1(C2=CC=C(C(=O)OC(=C)O1)C=C2)=O LLLVZDVNHNWSDS-UHFFFAOYSA-N 0.000 description 1
- LSZJZNNASZFXKN-UHFFFAOYSA-N 9-propan-2-ylcarbazole Chemical compound C1=CC=C2N(C(C)C)C3=CC=CC=C3C2=C1 LSZJZNNASZFXKN-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 101100005306 Mus musculus Ctso gene Proteins 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920000305 Nylon 6,10 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- FPEUXBBAUNHJQB-UHFFFAOYSA-N butoxy-ethoxy-methoxy-lambda3-chlorane Chemical group COCl(OCCCC)OCC FPEUXBBAUNHJQB-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 229920003086 cellulose ether Polymers 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 125000004914 dipropylamino group Chemical group C(CC)N(CCC)* 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 229920006242 ethylene acrylic acid copolymer Polymers 0.000 description 1
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- IPCSVZSSVZVIGE-UHFFFAOYSA-M hexadecanoate Chemical compound CCCCCCCCCCCCCCCC([O-])=O IPCSVZSSVZVIGE-UHFFFAOYSA-M 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229940105132 myristate Drugs 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 150000002916 oxazoles Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 125000003395 phenylethylamino group Chemical group [H]N(*)C([H])([H])C([H])([H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 229920002382 photo conductive polymer Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001485 poly(butyl acrylate) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229920002717 polyvinylpyridine Polymers 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- 125000002112 pyrrolidino group Chemical group [*]N1C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 1
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 1
- TUNFSRHWOTWDNC-UHFFFAOYSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCCC(O)=O TUNFSRHWOTWDNC-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0664—Dyes
- G03G5/0666—Dyes containing a methine or polymethine group
- G03G5/0672—Dyes containing a methine or polymethine group containing two or more methine or polymethine groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0664—Dyes
- G03G5/0666—Dyes containing a methine or polymethine group
- G03G5/0672—Dyes containing a methine or polymethine group containing two or more methine or polymethine groups
- G03G5/0674—Dyes containing a methine or polymethine group containing two or more methine or polymethine groups containing hetero rings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6576—Polycyclic condensed heteroaromatic hydrocarbons comprising only sulfur in the heteroaromatic polycondensed ring system, e.g. benzothiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/654—Aromatic compounds comprising a hetero atom comprising only nitrogen as heteroatom
Abstract
Description
【発明の詳細な説明】
本発明は、レーザ特に長波長側に発振波長を有する半導
体レーザを効果的に吸収し、別のエネルギーに変換しう
る有機被膜に関し、詳しくは半導体レーザを光源とした
電子写真方式プリンターの電子写真用感光被膜、半導体
レーザによる書込みと再生が可能な光デイスク用被膜あ
るいけ赤外線カットフィルターなどに適用できる新規な
有機被膜に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an organic coating that can effectively absorb a laser, particularly a semiconductor laser having an oscillation wavelength on the long wavelength side, and convert it into another energy. This invention relates to a novel organic coating that can be applied to electrophotographic photosensitive coatings for photographic printers, coatings for optical disks that can be written and reproduced by semiconductor lasers, and infrared cut filters.
レーザを光源とした電子写真方式プリンターは、画像情
報に応じた電気信号によって、レーザの変調を行なわせ
、この変調されたレーザをガルバノミラ−などによって
感光体上に光走査して静電潜像を形成した後、トナー現
像および転写を順次施すことにより、所望の再生画像を
形成することができる。この際に用いられていたレーザ
け、一般にヘリウム−カドミウム（発振波長＋４４１．
６ｎｍ）やヘリウム−ネオン（発振波長：６３２．８ｎ
ｍ）などのガスレーザであった。An electrophotographic printer that uses a laser as a light source modulates the laser using an electrical signal that corresponds to image information, and scans the modulated laser light onto a photoreceptor using a galvano mirror or the like to form an electrostatic latent image. After formation, a desired reproduced image can be formed by sequentially performing toner development and transfer. The laser beam used at this time was generally helium-cadmium (oscillation wavelength +441.
6nm) and helium-neon (oscillation wavelength: 632.8n)
It was a gas laser such as m).
従って、この様な光源に対して用いられる感光体は、６
５０ｎｍ程度までに分光増感されていればよく、例えば
ポリビニルカルバゾールとトリニトロフルオレノンとの
電荷移動錯体を感光層に用いたもの、セレンによって増
感させたテルル蒸着層を感光体に用いたもの、電荷輸送
層としてセレン蒸着層を導電層上に形成し、とのセレン
蒸着層上にセレン−テルル蒸着層を形成させたことから
なる感光層を用いたもの、増感色素によって分光増感さ
せた硫化カドミウムを感光層に用いたもの、捷だ有機顔
料を含有した電荷発生層と電荷輸送層に機能分離し、そ
の感光波長域を長波長側まで増感した感光層を用いたも
のなどが知られている。Therefore, the photoreceptor used for such a light source is 6
It only needs to be spectrally sensitized to about 50 nm, such as those using a charge transfer complex of polyvinylcarbazole and trinitrofluorenone in the photosensitive layer, those using a tellurium vapor-deposited layer sensitized by selenium as the photoreceptor, A photosensitive layer consisting of a selenium vapor deposited layer formed on a conductive layer as a charge transport layer and a selenium-tellurium vapor deposited layer formed on the selenium vapor deposited layer, and spectrally sensitized with a sensitizing dye. Some examples include those that use cadmium sulfide as a photosensitive layer, and those that use a photosensitive layer that is functionally separated into a charge generation layer and a charge transport layer that contain crushed organic pigments, and whose photosensitive wavelength range is sensitized to the long wavelength side. It is being
一方、光デイスク技術で用いる記録被膜は、光学的に検
出可能な小さな（例えば、約１μ）ピットをらせん状又
は円形のトラック形態にして、高密度情報を記憶するこ
とができる。この様なディスクに情報を書込むには、レ
ーザ感応層の表面に集束したレーザを走査し、とのレー
ザ光線が照射された表面のみがピットを形成し、このビ
ラトラらせん状又は円形トラックの形態で形成する。レ
ーザ感応層は、レーザ・エネルギーを吸収して光学的に
検出可能なピットを形成できる。例えば、ヒートモード
記録方式では、レーザ感応層は熱エネルギーを吸収し、
その個所に蒸発又は融解により小さな凹部（ピット）を
形成できる。また、別のヒートモード記録方式では、照
射されたレーザ・エネルギーの吸収により、その個所に
光学的に検出可能な濃度差を有するピットを形成できる
。On the other hand, recording coatings used in optical disk technology can store high-density information using optically detectable small (eg, about 1 micron) pits in the form of spiral or circular tracks. To write information on such a disk, a focused laser is scanned over the surface of the laser-sensitive layer, and only the surface irradiated with the laser beam forms pits, which form a spiral or circular track. to form. The laser sensitive layer can absorb laser energy to form optically detectable pits. For example, in the heat mode recording method, the laser sensitive layer absorbs thermal energy,
A small recess (pit) can be formed at that location by evaporation or melting. In another heat mode recording method, absorption of irradiated laser energy can form pits having an optically detectable density difference at that location.
この光ディスクに記録された情報は、レーザをトラック
に沿って走査し、ピットが形成された部分とピットが形
成されていない部分の光学的変化を読み取ることによっ
て検出される。例えば、レーザがトラックに沿って走査
され、ディスクにより反射されたエネルギーがフォトデ
ィテクターによってモニターされる。ピットが形成され
ていない時、フォトディテクターの出力は低下し、一方
ピットが形成されている時はレーザ光線は下層の反射面
によって充分に反射されフォトディテクターの出力は犬
きくなる。Information recorded on this optical disk is detected by scanning a laser along a track and reading optical changes in areas where pits are formed and areas where pits are not formed. For example, a laser is scanned along a track and the energy reflected by the disk is monitored by a photodetector. When no pits are formed, the output of the photodetector is reduced, while when pits are formed, the laser beam is sufficiently reflected by the underlying reflective surface and the output of the photodetector becomes weaker.
この様な光ディスクに用いる記録媒体として、これまで
アルミニウム蒸着膜などの金属薄膜、ビスマスｉ［、酸
化テルル薄膜やカルコゲナイド系非晶質ガラス膜などの
無機物質を主に用いたものが提案されている。As recording media for such optical discs, media that mainly use metal thin films such as aluminum vapor deposited films, bismuth i[, tellurium oxide thin films, and chalcogenide amorphous glass films] have been proposed. .
ところで、近年レーザとして小型でしかも低コストの上
、直接変調が可能な半導体レーザが開発されているが、
とのレーザの発振波長が７５０ｎｍ以上の波長を有して
いることが多い。Incidentally, in recent years, semiconductor lasers have been developed that are small, low-cost, and capable of direct modulation.
The oscillation wavelength of the laser often has a wavelength of 750 nm or more.
従って、この様な半導体レーザを用いて記録及び（又は
）再生を行なう場合には、レーザ感応被膜の吸収特性は
長波長側に吸収ピーク（一般に７５０ｎｍ〜８５０ｎｍ
の領域）を有する必要がある。Therefore, when recording and/or reproducing using such a semiconductor laser, the absorption characteristics of the laser sensitive coating have an absorption peak on the long wavelength side (generally between 750 nm and 850 nm).
area).
しかし、これまでのレーザ感応被膜、特に無機材料を主
成分として形成した被膜は、レーザ光に対する反射率が
高いため、レーザの利用率が低くなり、高感度特性が得
られない欠点を有しており、しかも感応波長域ｔ７５０
ｎｍ以上とすることは、レーザ感応被膜の層構成を複雑
化したり、特に電子写真用感光被膜の場合では使用した
増感染料が繰り返し帯電−露光を行なっているうちに、
退色してしまうなどの欠点を有している。However, conventional laser-sensitive coatings, especially those formed mainly of inorganic materials, have a high reflectance to laser light, resulting in a low laser utilization rate and the disadvantage that high sensitivity characteristics cannot be obtained. Moreover, the sensitive wavelength range is t750.
If it is more than 1 nm, the layer structure of the laser-sensitive coating becomes complicated, and especially in the case of electrophotographic photosensitive coatings, the sensitizing dye used is repeatedly charged and exposed to light.
It has drawbacks such as fading.
この様なことから、近年７５０ｎｍ以上の波長光に対し
て高感度特性を示す有機被膜が提案されている。例えば
、米国特許第４３１５９８３号、［Ｒｅ５ｅａｃｈ Ｄ
ｉｓｃｌｏｓｕｒｅ Ｊ ２０５１７ （１９８１，５
）に開示のビリリウム系染料やｒ Ｊ、 Ｖａｃ、 Ｓ
ｃ１． Ｔ−ｅｃｈｏｌ、 、 １８（ＩＬ Ｊａｎ、
／Ｆｅｂ、 １９８１． Ｐ １０５〜Ｐ１０９に開
示のスクェアリリウム染料を含有した有機被膜が７５０
ｎｍ以上のレーザに対して感応性であることが知られて
いる。For this reason, in recent years, organic coatings have been proposed that exhibit high sensitivity to light with a wavelength of 750 nm or more. For example, U.S. Pat. No. 4,315,983, [Re5each D
isclosure J 20517 (1981, 5
) and the biryllium-based dyes disclosed in r J, Vac, S
c1. T-echol, , 18 (IL Jan,
/Feb, 1981. The organic film containing the square lylium dye disclosed in P 105 to P109 is 750
It is known that it is sensitive to lasers of nm or more.
しかし、一般に有機化合物は吸収特性が長波長領域にな
るほど不安定で、わずかの温度上昇によって分解されや
すいなどの問題点を有すると同時に電子写真方式プリン
ターあるいは光ディスクで要求される各種の特性を満足
する必要があるため、必ずしも実用性の点で十分に満足
できる有機被膜が開発されているものとは言えないのが
現状である。However, in general, organic compounds have problems such as their absorption characteristics becoming unstable in the longer wavelength region and being easily decomposed by a slight temperature rise.At the same time, they do not satisfy the various characteristics required for electrophotographic printers or optical disks. At present, it cannot be said that organic coatings that are fully satisfactory in terms of practicality have been developed because of the necessity.
従って、本発明の第１の目的は、新規且つ有用な有機被
膜を提供することにある。Accordingly, a first object of the present invention is to provide a new and useful organic coating.
本発明の＠２の目的は、長波長側、特に７５０ｎｍ以上
に吸収帯をもつ有機被膜を提供することにある。The object of the present invention @2 is to provide an organic coating having an absorption band on the long wavelength side, particularly at 750 nm or more.
本発明の第３の目的は、熱と昇華に対して安定な有機被
膜を提供することにある。A third object of the present invention is to provide an organic coating that is stable to heat and sublimation.
本発明の第４の目的は、レーザを光源とした電子写真方
式プリンターの電子写真用感光被膜を提供することにあ
る。A fourth object of the present invention is to provide an electrophotographic photosensitive coating for an electrophotographic printer using a laser as a light source.
本発明の第５の目的は、７５０ ｎｍ以上の波長域で高
感度な特性を有する電子写真用感光被膜を提供すること
にある。A fifth object of the present invention is to provide a photosensitive film for electrophotography that has high sensitivity in a wavelength range of 750 nm or more.
本発明の第６の目的は、光デイスク記録用被膜を提供す
ることにある。A sixth object of the present invention is to provide a coating for optical disc recording.
本発明の第７の目的は、７５０ ｎｍ以上の波長域で高
感度であり、しかも十分なＳ／Ｎ比を有する光デイスク
記録用被膜を提供することにある。A seventh object of the present invention is to provide an optical disc recording film that is highly sensitive in a wavelength range of 750 nm or more and has a sufficient S/N ratio.
本発明のかかる目的は、下記一般式（１）で示される化
合物を含有する有機被膜に達成される。This object of the present invention is achieved by an organic film containing a compound represented by the following general formula (1).
式中Ｒ，Ｈメチル、エチル、プロピル、イングロビル、
ブチル、ヘキシル等のアルキル基、置換基を有していて
も良いフェニル基又はステリル基を表わす。置換基とし
てはメトキシ、エトキシ、ブトキシ等のアルコキシ基、
塩素、臭素。In the formula, R, H methyl, ethyl, propyl, inglovir,
It represents an alkyl group such as butyl or hexyl, a phenyl group which may have a substituent, or a steryl group. Substituents include alkoxy groups such as methoxy, ethoxy, butoxy,
Chlorine, bromine.
ヨウ１等のハロゲン原子、メチル、エチル、プロピル、
イソプロピル等のアルキル基、ニトロ基、があげられる
。Ｒｔけｐ−７エニレン、１．４−ナフチレン等の隣接
した２つの−ＣＨ−ロト基と共役二重結合系を形成する
置換基を有していても良いアリーレン基を示す。置換基
としては塩素、臭素、ヨウ素等のハロゲン原子、メチル
。Halogen atoms such as iodine, methyl, ethyl, propyl,
Examples include alkyl groups such as isopropyl, and nitro groups. Rt indicates an arylene group which may have a substituent that forms a conjugated double bond system with two adjacent -CH-roto groups, such as p-7 enylene and 1,4-naphthylene. Substituents include halogen atoms such as chlorine, bromine, and iodine, and methyl.
エチル等のアルキル基、メトキシ、エトキシ等のアルコ
キシ基があげられる。Ｒ３Ｖｉ置換基を有していても良
いフェニル基又はナフチル基を示す。置換基としてはジ
メチルアミノ、ジエチルアミン、ジプロピルアミノ、ジ
プチルアミノ。Examples include alkyl groups such as ethyl, and alkoxy groups such as methoxy and ethoxy. R3Vi represents a phenyl group or naphthyl group which may have a substituent. Substituents include dimethylamino, diethylamine, dipropylamino, and diptylamino.
ジフェニルアミノ、フェニルアミノ、フェニルベンジル
アミン、フェニルエチルアミノ等の置換アミン基、モル
ホリノ、ピペリジニル、ピロリジノ等の環状アミン基、
メトキシ、エトキシ。Substituted amine groups such as diphenylamino, phenylamino, phenylbenzylamine, and phenylethylamino; cyclic amine groups such as morpholino, piperidinyl, and pyrrolidino;
Methoxy, ethoxy.
ブトキシ等のアルコキシ基があげられる。炉はＢＦ？、
ｃｔＯ？、ＣＦ、Ｃ００°、ＰＦ′ｌ）、ｃ ｔｅ、Ｂ
ｒ０、Ｉｏ、ｃｚｓｏ？ 、ＣＨｓＳＯ（？、Ｃ，Ｈ，
Ｓ Ｏ♀、Ｃｓ Ｈ？ Ｓｏ？、ｃ、ｎ、ｓｏ？。Examples include alkoxy groups such as butoxy. Is the furnace BF? ,
ctO? , CF, C00°, PF′l), c te, B
r0, Io, czso? ,CHsSO(?,C,H,
S O♀, Cs H? So? , c, n, so? .
０５Ｈ＋、ｓｏ？、Ｃａ Ｈａｓ ＳＯ２、ＣＨｓＣＨ
ｃｔｓｏ？、ｃｔＣＬ ＣＨｔ ｓｏ？、０Ｈ’ ＞
ＣＨ−ｓＯ（？、工ＣＨ２５Ｏ♀、悔ｃｎｔｓｏ？、Ｃ
Ｈ。05H+, so? , Ca Has SO2, CHsCH
ctso? , ctCL CHt so? ,0H'>
CH-sO(?, 工CH25O♀, regret cntso?, C
H.
ｃｔ＋ｃＨ，ｓｏ？’、條ＣＨ，ＣＨ，ＳＯ♀、ＣＦ）
Ｏｓ Ｓ Ｃルｓｏ？、”Ｏｓ Ｓ ＣＨ２ＣＨｔ Ｓ
Ｏ２，００ＩＩＳＣルＣＨ−ＣＨ，ＳＯ２、％３ＳＣＨ
，ＣＴ（、ＣＨ，ＳＯ２、ＣＨ。ct+cH, so? ', Jo CH, CH, SO♀, CF)
Os S C le so? ,”Os S CH2CHt S
O2,00IISC-CH-CH,SO2,%3SCH
,CT(,CH,SO2,CH.
％ｊｓｃＨ，ＣＨＩＣＨＩＣＨＩＣＨ２ＣＨ，ＳＯ２、
θ０ｓＳＣＨｔＣＨｔ −ｏ−ＣＨｔＣＨ，Ｓ♂オン残
基′ｆｒ表わす。%jscH, CHICHICHICH2CH, SO2,
θ0sSCHtCHt -o-CHtCH, S♂on residue 'fr is represented.
具体的な化合物例
本発明の有機被膜は、光デイスク記録に用いることがで
きる。例えば、第１図に示すような基板１の上に前述の
有機被膜２を形成し７た記録媒体とすることができる。Specific Compound Examples The organic film of the present invention can be used for optical disc recording. For example, a recording medium can be obtained in which the above-mentioned organic film 2 is formed on a substrate 1 as shown in FIG.
かかる有機被膜２は、前述の化合物を真空蒸着によって
形成でき、またバインダー中に前述のナフトチオピリリ
ウム化合物を含有させた塗工液を塗布することによって
も形成することができる。塗工によって被膜を形成する
際、前述の化合物はバインダー中に分散状態で含有され
ていてもよく、あるいは非晶質状態で含有されていても
よい。好適なバインダーとしては、広範な樹脂から選択
することができる。具体的Ｖｃｌ−１、ニトロセルロー
ス。Such an organic film 2 can be formed by vacuum deposition of the above-mentioned compound, or by applying a coating liquid containing the above-mentioned naphthothiopyrylium compound in a binder. When forming a film by coating, the above-mentioned compound may be contained in the binder in a dispersed state or in an amorphous state. Suitable binders can be selected from a wide variety of resins. Specific Vcl-1, nitrocellulose.
リン酸セルロース、硫酸セルロース、 酢酸セルロース
、フロピオン酸セルロース、酪酸セルロース、ミリスチ
ン酸セルロース、パルミチン酸セルロース、酢酸・プロ
ピオン酸セルロース。Cellulose phosphate, cellulose sulfate, cellulose acetate, cellulose fropionate, cellulose butyrate, cellulose myristate, cellulose palmitate, cellulose acetate/propionate.
酢酸・酪酸セルロースなどのセルロースエステル類、メ
チルセルロース、エチルセルロー ス。Cellulose esters such as cellulose acetate and butyrate, methylcellulose, and ethylcellulose.
プロピルセルロース、ブチルセルロースなどのセルロー
スエーテル類、ポリスプレン、ポリ塩化ヒニル、ポリ酢
酸ビニル、ポリビニルブチラール、ポリビニルアセター
ル、ポリビニルアルコール、ポリビニルピロリドンな戸
のビニル樹脂類、スチレン−ブタジェンコポリマー、ス
チレン−アクリロニトリルコポリマー、スチレンブタジ
ェン−アクリロニトリルコポリマー、塩化ビニル−酢酸
ビニルコポリマーなどの共重合樹脂類、ポリメチルメタ
クリレート、ポリメチルアクリレート、ポリブチルアク
リレート、ポリアクリル酸、ポリメタクリル酸、ポリア
クリルアミド、ポリアクリロニトリルなどのアクリル樹
脂類、ポリエ、チレンテレフタレートなどのポリエステ
ル類、ポリ（４，４’−イソブロピリデンジフエニレン
ーコー１．４−シクロヘキシレンジメチレンカーボネー
ト）、ポリ（エチレンジオキシ−３，３′−）ユニレン
チオカーボネート）。Cellulose ethers such as propyl cellulose and butyl cellulose, polysprene, polyvinyl chloride, polyvinyl acetate, polyvinyl butyral, polyvinyl acetal, polyvinyl alcohol, vinyl resins such as polyvinylpyrrolidone, styrene-butadiene copolymer, styrene-acrylonitrile copolymer, Copolymer resins such as styrene-butadiene-acrylonitrile copolymer, vinyl chloride-vinyl acetate copolymer, acrylic resins such as polymethyl methacrylate, polymethyl acrylate, polybutyl acrylate, polyacrylic acid, polymethacrylic acid, polyacrylamide, and polyacrylonitrile. , polyester, polyesters such as ethylene terephthalate, poly(4,4'-isopropylidene diphenylene-1,4-cyclohexylene dimethylene carbonate), poly(ethylenedioxy-3,3'-)unylenchio carbonate).
ポリ（４，４’−インプロビリデンジフエニレンカーボ
ネートーローテレ７タレート）、ポリ（４゜４′−イソ
プロピリデンジフエニレンカーボネート）、ポリ（４，
４’−気一ブチリデンジフェニレンカーボネート）、ポ
リ（４，４’−イソプロピリデンジフェニレンカーボネ
ート−ブロック−オキシエチレン）などのボリアリレー
ト樹脂類、あるいけポリアミド類、ポリイミド類、エポ
キシ樹脂類、フェノール樹脂類、ポリエチレン。Poly(4,4'-impropylidene diphenylene carbonate torotele 7 tallate), poly(4゜4'-isopropylidene diphenylene carbonate), poly(4,4'-isopropylidene diphenylene carbonate),
Polyarylate resins such as 4'-butylidene diphenylene carbonate), poly(4,4'-isopropylidene diphenylene carbonate block-oxyethylene), polyamides, polyimides, epoxy resins, phenolic resins Class, polyethylene.
ポリプロピレン、塩素化ポリエチレンなどのポリオレフ
ィン類などを用いることができる。Polyolefins such as polypropylene and chlorinated polyethylene can be used.
塗工の際に使用できる有機溶剤は、バインダーの種類や
前述の化合物をバインダー中に含有させる際、分散状態
とするか、あるいは非晶質状態とするかによって異なっ
てくるが、一般には、メタノール、エタノール、イソプ
ロパツールなどのアルコール類、アセトン、メチルエチ
ルケトン、シクロヘキサノンなどのケトン類、Ｎ、Ｎ−
ジメチルホルムアミド、Ｎ、Ｎ−ジメチルアセトアミド
などのアミド類、ジメチルスルホキシドなどのスルホキ
シド類、テトラヒドロフラン、ジオキサン、エチレング
リコールモノメチルエーテルなどのエーテル類、酢酸メ
チル。The organic solvent that can be used during coating varies depending on the type of binder and whether the above-mentioned compound is contained in the binder in a dispersed or amorphous state, but in general, methanol is used. , alcohols such as ethanol and isopropanol, ketones such as acetone, methyl ethyl ketone, and cyclohexanone, N, N-
Amides such as dimethylformamide and N,N-dimethylacetamide, sulfoxides such as dimethyl sulfoxide, ethers such as tetrahydrofuran, dioxane, and ethylene glycol monomethyl ether, and methyl acetate.
酢酸エチル、酢酸ブチルなどのエステル類、クロロホル
ム、塩化メチレン、ジクロルエチレン。Esters such as ethyl acetate and butyl acetate, chloroform, methylene chloride, dichloroethylene.
四塩化炭素、トリクロルエチレンなどの脂肪族ハロゲン
化炭化水素類あるいはベンゼン、トルエン、キシレン、
リグロイン、モノクロルベンゼン、ジクロルベンゼンな
どの芳香族類などを用いることができる。Aliphatic halogenated hydrocarbons such as carbon tetrachloride and trichloroethylene, or benzene, toluene, xylene,
Aromatics such as ligroin, monochlorobenzene, dichlorobenzene, etc. can be used.
塗工ば、浸漬コーティング法、スプレーコーティング法
、スピンナーコーティング法、ビードコーティング法、
マイヤーバーコーティング法、ブレードコーティング法
、ローラーコーティング法、カーテンコーティング法な
どのコーティング法を用いて行なうことができる。For coating, dip coating method, spray coating method, spinner coating method, bead coating method,
This can be carried out using a coating method such as a Mayer bar coating method, a blade coating method, a roller coating method, or a curtain coating method.
バインダーとともに有機被膜２を形成する際、前述のナ
フトチオビＩＪ ＩＪウム化合物の含有量は、有機被膜
２中において１〜９０重景％重量ましくは２０〜７０重
量％である。寸だ、有機被膜２の乾燥膜厚あるいは蒸着
膜厚は、１０ミクロン以下、好ましくは２ミクロン以下
である。When forming the organic film 2 together with the binder, the content of the above-mentioned naphthothiobium compound is 1 to 90% by weight or 20 to 70% by weight in the organic film 2. In fact, the dry film thickness or vapor deposited film thickness of the organic film 2 is 10 microns or less, preferably 2 microns or less.
基板１としては、ポリエステル、アクリル樹脂、ポリオ
レフィン樹脂、フェノール樹脂、エポキシ樹脂、ポリア
ミド、ポリイミドなどのプラスチック、ガラスあるいけ
金属類などを用いることができる。As the substrate 1, plastics such as polyester, acrylic resin, polyolefin resin, phenol resin, epoxy resin, polyamide, polyimide, glass, metals, etc. can be used.
また、本発明け、第２図に示す様に基板１と有機被膜２
の間に反射層３を設けることができる。反射層３は、ア
ルミニウム、銀、クロムなどの反射性金属の蒸着層又は
ラミネート層とすることができる、
有機被膜２け、第３図に示す集束されたレーザ光線４の
照射によってビット５を形成することができる。ビット
５の深さを有機被膜２の膜厚と同一にすると、ビット領
域における反射率を増加させることができる。読み出し
の際、書込みに用いｔレーザ光線と同一の波長を有する
が、強度の小さいレーザ光線を用いれば、読み出し光が
ビット領域で大きく反射されるが、非ビット領域におい
ては吸収される。また、別の方法は有機被膜２が吸収す
る第１の波長のレーザ光線で実時間書込みを行ない、読
み出しに有機被膜２を実質的に透過する第２の波長のレ
ーザ光線を用いることである。読み出しレーザ光線は、
ビット領域と非ピット領域における異なる膜厚によって
生じる反射層の変化に応答することができる。Further, according to the present invention, as shown in FIG.
A reflective layer 3 can be provided between them. The reflective layer 3 can be a deposited or laminated layer of a reflective metal such as aluminium, silver, chromium, etc. Two organic coatings are formed to form the bits 5 by irradiation with a focused laser beam 4 as shown in FIG. can do. By making the depth of the bit 5 the same as the thickness of the organic coating 2, the reflectance in the bit region can be increased. When reading, if a laser beam having the same wavelength as the t laser beam used for writing but with lower intensity is used, the reading light is largely reflected in the bit area, but is absorbed in the non-bit area. Another method is to perform real-time writing with a laser beam of a first wavelength, which is absorbed by the organic coating 2, and to use a laser beam of a second wavelength, which is substantially transmitted through the organic coating 2, for reading. The readout laser beam is
It is possible to respond to changes in the reflective layer caused by different film thicknesses in bit areas and non-pit areas.
本発明の有機被膜は、アルゴンレーザ（発振波長４８８
ｎｍ）、ヘリウム−ネオンレーザ（発振波長６３３ｎｍ
）、ヘリウム−カドミウムレーザ（発振波長４４２ ｎ
ｍ ）などのガスレーザーの照射によって記録すること
も可能であるが、好ましくけ７５０ ｎｍ以上の波長を
有するレーザ、外領域に発振波長を有するレーザ光線の
照射によって記録する方法が適している。寸た、読み出
しのためには、前述のレーザ光線を用いることができる
。この際、書込みと読み出しを同一波長のレーザで行な
うことができ、また異なる波長のレーザで行なうことが
できる。The organic coating of the present invention can be used with argon laser (oscillation wavelength 488
nm), helium-neon laser (oscillation wavelength 633 nm)
), helium-cadmium laser (oscillation wavelength 442n
It is also possible to record by irradiation with a gas laser such as 750 nm), but it is preferable to record by irradiation with a laser beam having a wavelength of 750 nm or more, or a laser beam having an oscillation wavelength in the outer region. In fact, for readout, the aforementioned laser beam can be used. At this time, writing and reading can be performed using a laser of the same wavelength, or can be performed using lasers of different wavelengths.
本発明の別の具体例では、電子写真感光体の感光層とし
て適用することができる。また、かかる感光層を電荷発
生層と電荷輸送層に機能分離した電子写真感光体におけ
る電荷発生層としても適用することができる、
電荷発生層は、十分な吸光度を得るために、できる限り
多くの前述の光導電性を示す化合物を含有し、且つ発生
した電荷キャリアの飛程を短かくするために薄膜層、例
えば５ミクロン以下、軽重しくは０．０１ミクロン〜１
ミクロンの膜厚をもつｉ１Ｆ膜層とすることが好ましい
。このことは、入射光量の大部分が電荷発生層で吸収さ
れて、多くの電荷キャリアを生成すること、さらに発生
した電荷キャリアを再結合や捕獲（トラップ）により失
活することなく電荷輸送層に注入する必要があることに
帰因している。In another embodiment of the present invention, it can be applied as a photosensitive layer of an electrophotographic photoreceptor. Furthermore, such a photosensitive layer can be applied as a charge generation layer in an electrophotographic photoreceptor in which the functions are separated into a charge generation layer and a charge transport layer. A thin film layer, for example, 5 microns or less, preferably 0.01 micron to 1 micron, contains the above-mentioned photoconductive compound and shortens the range of the generated charge carriers.
It is preferable to use an i1F film layer having a film thickness of microns. This means that most of the incident light is absorbed by the charge generation layer, generating many charge carriers, and that the generated charge carriers are not deactivated by recombination or trapping, but are transferred to the charge transport layer. This is due to the need for injection.
電荷発生層は、前述の化合物を適当なバインダーに分散
させ、これを基体の上に塗工することによって形成でき
、また真空蒸着装置により蒸着膜全形成することによっ
て得ることができる、電荷発生層を塗工によって形成す
る際に用いうるバインダーとしては広範な絶縁性樹脂か
ら選択でき、またポＩＪ−Ｎ−ビニルカルバゾール、ポ
リビニルアントラセンやポリビニルピレンなどの有機光
導電性ポリマーから選択できる、軽重しくハ、ポリビニ
ルブチラール、ボリアリレート（ビスフェノールＡとフ
タル酸の縮重合体など）、ポリカーボネート、ポリエス
テル、フェノキシ樹脂、ポリ酢酸ビニル、アクリル樹脂
、ポリアクリルアミド樹脂、ポリアミド、ポリビニルピ
リジン、セルロース系樹脂、ウレタン樹脂、エポキシ樹
脂、カゼイン、ポリビニルアルコール、ポリビニルピロ
リドンなどの絶縁性樹脂を挙げることができる。電荷発
生層中に含有する樹脂は、８０重量％以下、好ましくは
４０重量％以下が適している。The charge generation layer can be formed by dispersing the above-mentioned compound in a suitable binder and coating it on the substrate, or can be obtained by forming the entire vapor deposition film using a vacuum evaporation device. The binder that can be used to form the film by coating can be selected from a wide range of insulating resins, as well as organic photoconductive polymers such as polyvinylcarbazole, polyvinylanthracene, and polyvinylpyrene. , polyvinyl butyral, polyarylate (condensation polymer of bisphenol A and phthalic acid, etc.), polycarbonate, polyester, phenoxy resin, polyvinyl acetate, acrylic resin, polyacrylamide resin, polyamide, polyvinylpyridine, cellulose resin, urethane resin, epoxy Examples include insulating resins such as resin, casein, polyvinyl alcohol, and polyvinylpyrrolidone. The resin contained in the charge generation layer is suitably 80% by weight or less, preferably 40% by weight or less.
これらの樹脂を溶解する溶剤は、樹脂の種類によって異
なり、また下達の電荷輸送層や下引層を溶解しないもの
から選択することが好ましい。具体的な有機溶剤として
は、メタノール、エタノール、イソプロパツールなどの
アルコール類、アセトン、メチルエチルケトン、シクロ
ヘキサノンなどのケトン類、Ｎ、Ｎ−ジメチルホルムア
ミド、Ｎ、Ｎ−ジメチルアセトアミドなどのアミド類、
ジメチルスルホキシドなどのスルホキシド類、テトラヒ
ドロフラン、ジオキサン、二手レンゲリコールモノメチ
ルエーテルナトＦ）エーテル類、酢酸メチル、酢酸エチ
ルなどのエステル類、クロロホルム、塩化メチレン、ジ
クロルエチレン、四塩化炭素、トリクロルエチレンなど
の脂肪族ハロゲン化炭化水素類あるいはベンゼン、トル
エン、キシレン、リフロイン、モノクロルベンゼン、ジ
クロルエンゼンｌｋト（Ｄ芳香族類などを用いることが
できる。The solvent that dissolves these resins varies depending on the type of resin, and is preferably selected from those that do not dissolve the underlying charge transport layer or subbing layer. Specific organic solvents include alcohols such as methanol, ethanol and isopropanol; ketones such as acetone, methyl ethyl ketone and cyclohexanone; amides such as N,N-dimethylformamide and N,N-dimethylacetamide;
Sulfoxides such as dimethyl sulfoxide, tetrahydrofuran, dioxane, dicarboxylated monomethyl ether, ethers, esters such as methyl acetate and ethyl acetate, and fats such as chloroform, methylene chloride, dichloroethylene, carbon tetrachloride, and trichloroethylene. Group halogenated hydrocarbons or benzene, toluene, xylene, refloin, monochlorobenzene, dichlorobenzene (D aromatics, etc.) can be used.
塗工は、浸漬コーティング法、スプレーコーティング法
、スピンナーコーティング法、ビードコーティング法、
マイヤーバーコーティング法、ブレードコーティング法
、ローラーコーティング法、カーテンコーティング法な
どのコーティング法を用いて行なうことができる。乾燥
は、室温における指触乾燥後、加熱乾燥する方法が好ま
しい。加熱乾燥は、３０°Ｃ〜２００°Ｃの温度で５分
〜２時間の範囲の時間で、静止または送風下で行なうこ
とができる。Coating methods include dip coating, spray coating, spinner coating, bead coating,
This can be carried out using a coating method such as a Mayer bar coating method, a blade coating method, a roller coating method, or a curtain coating method. For drying, it is preferable to dry to the touch at room temperature and then heat dry. Heat drying can be carried out at a temperature of 30° C. to 200° C. for a period of time ranging from 5 minutes to 2 hours, either stationary or under ventilation.
電荷輸送層は、前述の電荷発生層と電気的に接続されて
おり、電界の存在下で電荷発生層から注入された電荷キ
ャリアを受は取るとともに、これらの電荷キャリアを表
面１で輸送できる機能を有している、この際、この電荷
輸送層は、電荷発生層の上に積層されていてもよく、ま
たその下に積層されていてもよい。しかし、電荷輸送層
は、電荷発生層の上に積層されていることが望ましい。The charge transport layer is electrically connected to the charge generation layer described above, and has the function of receiving and taking charge carriers injected from the charge generation layer in the presence of an electric field and transporting these charge carriers on the surface 1. In this case, the charge transport layer may be laminated on or under the charge generation layer. However, it is desirable that the charge transport layer is laminated on the charge generation layer.
電荷輸送層における電荷キャリアを輸送する物質（以下
、単に電荷輸送物質という）６−ｉ、前述の電荷発生層
が感応する電磁波の波長域に実質的に非感応性であるこ
とが好ましい。ここで言う「電磁波」とは、γ線、Ｘ線
、紫外線、可視光線、近赤外線、赤外線、遠赤外線など
を包含する広義の「光線」の定義を包含する。電荷輸送
層の光感応性波長域が電荷発生層のそれと一致またはオ
ーバーラツプする時には、両者で発生した電荷キャリア
が相互に捕獲し合い、結果的には感度の低下の原因とな
る。The substance 6-i that transports charge carriers in the charge transport layer (hereinafter simply referred to as charge transport substance) is preferably substantially insensitive to the wavelength range of electromagnetic waves to which the charge generation layer is sensitive. The term "electromagnetic waves" used herein includes a broad definition of "light rays" that includes gamma rays, X-rays, ultraviolet rays, visible light, near infrared rays, infrared rays, far infrared rays, and the like. When the photosensitive wavelength range of the charge transport layer coincides with or overlaps that of the charge generation layer, charge carriers generated in both layers trap each other, resulting in a decrease in sensitivity.
電荷輸送物質としては電子輸送性物質と正孔輸送性物質
があり、電子輸送性物質としては、クロルアニル、ブロ
モアニル、テトラシアノエチレン、テトラシアノキノジ
メタン、２，４．７−ドリニトロー９−フルオレノン、
２．４．５．７−テトラニトロ−９−フルオレノン、２
．４．７−）ジニトロ−９−ジシアノメチレンフルオレ
ノン、２、４．５．７−チトラニトロキサントン、２，
４．８−やこれら電子吸引物質を高分子化したもの等が
へ
ある。Charge transporting substances include electron transporting substances and hole transporting substances, and electron transporting substances include chloranil, bromoanil, tetracyanoethylene, tetracyanoquinodimethane, 2,4.7-dolinitro-9-fluorenone,
2.4.5.7-tetranitro-9-fluorenone, 2
．． 4.7-) dinitro-9-dicyanomethylenefluorenone, 2, 4.5.7-titranitroxanthone, 2,
4.8- and polymerized materials of these electron-withdrawing substances.
正孔輸送性物質としては、ピレン、Ｎ−−ｒ−ｆルカル
バゾール、Ｎ−イソプロピルカルバソール、Ｎ−メチル
−Ｎ−フェニルヒドラジノ−３−メテリテン−９−エチ
ルカルバソール、Ｎ、Ｎ−ジフェニルヒドラジノ−３−
メチリデン−９−エチルカルバゾール、Ｎ、Ｎ−ジフェ
ニルヒドラジノ−３−メチリデン−１０−エチルフェノ
チアジン、Ｎ、Ｎ−ジフェニルヒドラジノ−３−メチリ
ゾンーｌＯ−エチルフェノキサジン、Ｐ−ジエチルアミ
ノベンズアルデヒド−Ｎ、 Ｎ−ジフェニルヒドラゾン
、Ｐ−ジエチルアミノベンズアルデヒドーＮ−α−ナフ
チル−Ｎ−フェニルヒドラゾン、Ｐ−ピロリジノベンズ
アルデヒド−Ｎ、Ｎ−ジフェニルヒドラゾン、１，３．
３−）リメチルインドレニンーω−アルデヒ）”−Ｎ、
Ｎ−ジフェニルヒドラゾン、Ｐ−ジエチルベンズアルデ
ヒド−３−メチルベンズチアゾリノン−２−ヒドラゾン
等のヒドラゾン類、２．５−ビス（Ｐ−ジエチルアミノ
フェニル）−Ｌ３，４−オキサジアゾール、１−フェニ
ル−３−（Ｐ−ジエチルアミノスチリル）−５−（Ｐ−
ジエチルアミノフェニル）ピラゾリン、１−〔キノリル
（２）］−３−（Ｐ−ジエチルアミノスチリル）−５−
（Ｐ−ジエチルアミノフェニル）ピラゾリン、１−〔ピ
リジル（２） ］ −３−（Ｐ−ジエチルアミノスチリ
ル）−５−（Ｐ−ジエチルアミノフェニル）ピラゾリン
、１−［６−メドキシービリジル（２）］−］３ｉＰ−
ジエチルアミノスチリル−５−（Ｐ−ジエチルアミノフ
ェニル）ピラゾリン、１−〔ピリジル（８＞ ） −３
−（Ｐ −ジエチルアミノスチリル）−５−（Ｐ−ジエ
チルアミノフェニル）ピラゾリン、１−〔レビジル（２
） ） −３−（Ｐ−ジエチルアミノスチリル）−５−
（Ｐ−ジエチルアミノフェニル〕ピラゾリン、１−〔ピ
リジル（２）３−３−（Ｐ−ジエチルアミノスチリル）
−４−メチル−５−（Ｐ−ジエチルアミノフェニル）ピ
ラゾリン、１−〔ピリジル（２） ］ −３−（α−メ
チル−Ｐ−ジエチルアミノステリル）−５−（Ｐ−ジエ
チルアミノフェニル）ピラゾリン、１−フェニル−３−
（Ｐ−ジエチルアミノスチリル）−４−メチル−５−（
Ｐ−ジエチルアミノフェニル）ピラゾリン、１−フェニ
ル−３−（α−ベンジル−Ｐ−ジエチルアミノスチリル
）−５−（Ｐ−ジエチルアミノフェニル）ピラゾリン、
スピロピラゾリンなどのピラゾリン類、２−（Ｐ−ジエ
チルアミノスチリル）−６−ジニチルアミノペンズオキ
サゾール、２−（Ｐ−ジエチルアミンフェニル）−４−
（Ｐ−ジメチルアミノフェニル）−５−（２−クロロフ
ェニル）オキサゾール等のオキサゾール系化合物、２−
（Ｐ−ジエチルアミノスチリル）−６−ジニチルアミノ
ベンゾチアゾール等のチアゾール系化合物、ビス（４−
ジエチルアミノ−２−メチルフェニル）−フェニルメタ
ン等のトリアリールメタン系化合物、１，１−ビス（４
−Ｎ、Ｎ−ジエチルアミノ−２−メチルフェニル）へブ
タン、１．１，２．２−テトラキス（４−Ｎ、Ｎ−ジメ
チルアミン−２−メチル７エ二ル）エタン等のボリアリ
ールアルカン類、トリフェニルアミン、ポリ−Ｎ−ビニ
ルカルバゾール、ポリとニルピレン、ポリビニルアント
ラセン、ポリビニルアクリジン、ポリ−９−ビニルフェ
ニルアントラセン、ヒレンーホルムアルデヒ）”ｍ 脂
、エチルカルバゾールホルムアルデヒド樹脂等がある。Examples of hole-transporting substances include pyrene, N-r-f-carbazole, N-isopropylcarbazole, N-methyl-N-phenylhydrazino-3-metherithen-9-ethylcarbazole, N,N-diphenyl hydrazino-3-
Methylidene-9-ethylcarbazole, N,N-diphenylhydrazino-3-methylidene-10-ethylphenothiazine, N,N-diphenylhydrazino-3-methylison-IO-ethylphenoxazine, P-diethylaminobenzaldehyde-N,N- Diphenylhydrazone, P-diethylaminobenzaldehyde N-α-naphthyl-N-phenylhydrazone, P-pyrrolidinobenzaldehyde-N,N-diphenylhydrazone, 1,3.
3-) Limethylindolenine-ω-aldehyde)”-N,
Hydrazones such as N-diphenylhydrazone, P-diethylbenzaldehyde-3-methylbenzthiazolinone-2-hydrazone, 2,5-bis(P-diethylaminophenyl)-L3,4-oxadiazole, 1-phenyl- 3-(P-diethylaminostyryl)-5-(P-
diethylaminophenyl)pyrazoline, 1-[quinolyl(2)]-3-(P-diethylaminostyryl)-5-
(P-diethylaminophenyl)pyrazoline, 1-[pyridyl(2)]-3-(P-diethylaminostyryl)-5-(P-diethylaminophenyl)pyrazoline, 1-[6-medoxybilidyl(2)]- ]3iP-
Diethylaminostyryl-5-(P-diethylaminophenyl)pyrazoline, 1-[pyridyl(8>)-3
-(P-diethylaminostyryl)-5-(P-diethylaminophenyl)pyrazoline, 1-[Levidil (2
) ) -3-(P-diethylaminostyryl)-5-
(P-diethylaminophenyl]pyrazoline, 1-[pyridyl (2) 3-3-(P-diethylaminostyryl)
-4-Methyl-5-(P-diethylaminophenyl)pyrazoline, 1-[pyridyl(2)] -3-(α-methyl-P-diethylaminosteryl)-5-(P-diethylaminophenyl)pyrazoline, 1- Phenyl-3-
(P-diethylaminostyryl)-4-methyl-5-(
P-diethylaminophenyl)pyrazoline, 1-phenyl-3-(α-benzyl-P-diethylaminostyryl)-5-(P-diethylaminophenyl)pyrazoline,
Pyrazolines such as spiropyrazoline, 2-(P-diethylaminostyryl)-6-dinithylaminopenzuoxazole, 2-(P-diethylaminophenyl)-4-
Oxazole compounds such as (P-dimethylaminophenyl)-5-(2-chlorophenyl)oxazole, 2-
Thiazole compounds such as (P-diethylaminostyryl)-6-dinithylaminobenzothiazole, bis(4-
Triarylmethane compounds such as diethylamino-2-methylphenyl)-phenylmethane, 1,1-bis(4
-N,N-diethylamino-2-methylphenyl)hebutane, polyarylalkanes such as 1.1,2,2-tetrakis(4-N,N-dimethylamine-2-methyl7enyl)ethane, Examples include triphenylamine, poly-N-vinylcarbazole, polypyrene, polyvinylanthracene, polyvinylacridine, poly-9-vinylphenylanthracene, helene-formaldehyde resin, and ethylcarbazole formaldehyde resin.
これらの有機電荷輸送物質の他に、セレン、セレン−テ
ルルアモルファスシリコン、硫化カドミウムなどの無機
材料も用いることができる。In addition to these organic charge transport materials, inorganic materials such as selenium, selenium-tellurium amorphous silicon, and cadmium sulfide can also be used.
また、これらの電荷輸送物質は、１種または２種以上組
合せて用いることができる。Further, these charge transport substances can be used alone or in combination of two or more.
電荷輸送物質に成膜性を有していない時には、適当なバ
インダーを選択することによって被膜形成できる。バイ
ンダーとして使用できる樹脂は、例えばアクリル樹脂、
ボリアリレート、ポリエステル、ポリカーボネート、ポ
リスチレン、アクリロニトリル−スチレンコポリマー、
アクリロニトリル−ブタジェンコポリマー、ポリビニル
ブチラール、ポリビニルホルマール、ポリスルホン、ポ
リアクリルアミド、ポリアミド、塩素化ゴムなどの絶縁
性樹脂、あるいけポリ−Ｎ−ビニルカルバゾール、ポリ
ビニルアントラセン、ポリビニルピレンなどの有機光導
電性ポリ！−を挙げることができる。When the charge transport material does not have film-forming properties, a film can be formed by selecting an appropriate binder. Examples of resins that can be used as binders include acrylic resin,
polyarylate, polyester, polycarbonate, polystyrene, acrylonitrile-styrene copolymer,
Insulating resins such as acrylonitrile-butadiene copolymer, polyvinyl butyral, polyvinyl formal, polysulfone, polyacrylamide, polyamide, chlorinated rubber, organic photoconductive polyesters such as poly-N-vinylcarbazole, polyvinylanthracene, polyvinylpyrene, etc. − can be mentioned.
電荷輸送層は、電荷キャリアを輸送できる限界があるの
で、必要以上に膜厚を厚くすることかで＠ない。一般的
には、５ミクロン〜３０ミクロンであるが、好まし論範
囲ｔ／ｉ８ミクロン〜２０ミクロンである。塗工によっ
て電荷輸送層を形成する際には、前述した様な適当なコ
ーティング法を用いることができる。Since the charge transport layer has a limit in its ability to transport charge carriers, it is not necessary to make the film thicker than necessary. Generally, t/i is 5 microns to 30 microns, but preferably the theoretical range t/i is 8 microns to 20 microns. When forming the charge transport layer by coating, an appropriate coating method as described above can be used.
この様な電荷発生層と電荷輸送層の積層構造からなる感
光層は、導電層を有する基体の上に設けられる。導電層
を有する基体としては、基体自体が導電性をもつもの、
例えばアルミニウム、アルミニウム合金、銅、亜鉛、ス
テンレス、バナジウム、モリブデン、クロム、チタン、
ニッケル、インジウム、金や白金などを用いることがで
き、その他にアルミニウム、アルミニウム合金、酸化イ
ンジウム、酸化錫、酸化インジウム−酸化錫合金などを
真空蒸着法によって被膜形成された層を有するプラスチ
ック（例えばポリエチレン、ポリプロピレン、ポリ塩化
ビニル、ポリエチレンテレフタレート、アクリル樹脂、
ポリフッ化エチレンなど）、導電性粒子（例えば、カー
ボンブラック、銀粒子など）を適当なバインダーととも
にプラスチックの上に被覆した基体、導電性粒子をプラ
スチックや紙に含浸した基体や導電性ポリマーを有する
プラスチックなどを用いることができる。A photosensitive layer having such a laminated structure of a charge generation layer and a charge transport layer is provided on a substrate having a conductive layer. Examples of substrates having a conductive layer include those in which the substrate itself is conductive;
For example, aluminum, aluminum alloy, copper, zinc, stainless steel, vanadium, molybdenum, chromium, titanium,
Nickel, indium, gold, platinum, etc. can be used, and plastics (for example, polyethylene , polypropylene, polyvinyl chloride, polyethylene terephthalate, acrylic resin,
(polyfluorinated ethylene, etc.), substrates made of plastic coated with conductive particles (e.g. carbon black, silver particles, etc.) together with a suitable binder, substrates made of plastic or paper impregnated with conductive particles, and plastics with conductive polymers. etc. can be used.
導電層と感光層の中間に、バリヤー機能と接着機能をも
つ下引層を設けることもできる。下引層ハ、カゼイン、
ポリビニルアルコール、ニトロセルロース、エチレン−
アクリル酸コホリマー、ポリアミド（ナイロン６、ナイ
ロン６６、ナイロン６１０、共重合ナイロン、アルコキ
シメチル化ナイロンなど）、ポリウレタン、ゼラチン、
酸化アルミニウムなどによって形成できる。A subbing layer having barrier and adhesive functions can also be provided between the conductive layer and the photosensitive layer. Subbing layer, casein,
Polyvinyl alcohol, nitrocellulose, ethylene-
Acrylic acid copolymer, polyamide (nylon 6, nylon 66, nylon 610, copolymerized nylon, alkoxymethylated nylon, etc.), polyurethane, gelatin,
It can be formed from aluminum oxide, etc.
下引層の膜厚は、０．１ミクロン〜５ミクロン、好まし
くけ０．５ミクロン〜３ミクロンが適当である。The thickness of the undercoat layer is suitably 0.1 micron to 5 micron, preferably 0.5 micron to 3 micron.
導電層、電荷発生層、電荷輸送層の順に積層した感光体
を使用する場合において電荷輸送物質が電子輸送性物質
からなるときは、電荷輸送層表面を正に帯電する必要が
あり、帯電後露光すると露光部では電荷発生層において
生成した電子が電荷輸送層に注入され、そのあと表面に
達して正電荷を中和し、表面電位の減衰が生じ未露光部
との間に静電コントラストが生じる。When using a photoreceptor in which a conductive layer, a charge generation layer, and a charge transport layer are laminated in this order, and the charge transport material is an electron transport material, the surface of the charge transport layer must be positively charged, and exposure after charging is required. Then, in the exposed area, electrons generated in the charge generation layer are injected into the charge transport layer, and then reach the surface and neutralize the positive charge, causing a decrease in surface potential and creating an electrostatic contrast with the unexposed area. .
この様にしてできた静電潜像を負荷電性のトナーで現像
すれば可視像が得られる。これを直接定着するか、ある
いけトナー像を紙やプラスチックフィルム等に転写後、
現像し定着することができる、
また、感光体上の静電潜像を転写紙の絶縁層上に転写後
現像し、定着する方法もとれる。現像剤の種類や現像方
法、定着方法は公知のものや公知の方法のいずれを採用
して吃良く、特定のものに限定されるものではない。A visible image can be obtained by developing the electrostatic latent image thus formed with a negatively charged toner. Either fix this directly or transfer the toner image to paper or plastic film, etc.
Alternatively, the electrostatic latent image on the photoreceptor may be transferred onto an insulating layer of transfer paper, then developed and fixed. The type of developer, developing method, and fixing method may be any known one or any known method, and are not limited to any particular one.
一方、電荷輸送物質が正孔輸送物質から成る場合、電荷
輸送層表面を負に帯電する必要があり、帯電後、露光す
ると露光部でｆ′ｉ電荷発生層において生成した正孔が
電荷輸送層に注入され、その後表面に達して負電荷を中
和し、表面電位の減衰が生じ未露光部との間に静電コン
トラストが生じる。現像時には電子輸送物質を用いた場
合とは逆に正電荷性トナーを用いる必要がある。On the other hand, when the charge transport material is a hole transport material, it is necessary to charge the surface of the charge transport layer negatively, and when exposed to light after charging, the holes generated in the f'i charge generation layer in the exposed area are transferred to the charge transport layer. After that, it reaches the surface and neutralizes the negative charges, resulting in attenuation of the surface potential and an electrostatic contrast between it and the unexposed area. During development, it is necessary to use a positively charged toner, contrary to the case where an electron transport material is used.
また、本発明の別の具体例では、前述のヒドラゾン類、
ピラゾリン類、オキサゾール類、チアゾール類、トリア
リールメタン類、ポリアリールアルカン類、トリフェニ
ルアミン、ポリ−Ｎ−ビニルカルバゾール類など有機光
導電性物質や酸化亜鉛、硫化カドミウム、セレンなどの
無機光導電性物質の増感剤として前述のナフトチオピＩ
Ｊ リウム化合物を含有させた有機被膜とすることがで
きる。この有機被膜は、これらの光導電性物質と前述の
化合物をバインダーとともに塗工によって被膜形成され
る。また、別の具体例では、前述のナフトチオピリリウ
ム化合物を含有する有機被膜を感光層として用すること
かできる。Further, in another specific example of the present invention, the above-mentioned hydrazones,
Organic photoconductive substances such as pyrazolines, oxazoles, thiazoles, triarylmethanes, polyarylalkanes, triphenylamine, poly-N-vinylcarbazoles, and inorganic photoconductive substances such as zinc oxide, cadmium sulfide, and selenium. The above-mentioned naphthothiopi I as a sensitizer for the substance
It can be an organic coating containing a J lium compound. This organic film is formed by coating these photoconductive substances and the above-mentioned compound together with a binder. In another embodiment, an organic film containing the above-mentioned naphthothiopyrylium compound can be used as the photosensitive layer.
いずれの感光体においても、用いる顔料は一般式（］）
で示される化合物から選ばれる少なくとも１種類の顔料
を含有し、必要に応じて光吸収の異なる顔料を組合せて
使用した感光体の感度を高めたり、パンクロマチックな
感光体を得るなどの目的で一般式（１）で示される化合
物を２種類以上組合せたり、または公知の染料、顔料か
ら選ばれた電荷発生物質と組合せて使用することも可能
である。In both photoreceptors, the pigment used is of the general formula (])
It contains at least one type of pigment selected from the compounds shown in the following, and is generally used for the purpose of increasing the sensitivity of a photoreceptor or obtaining a panchromatic photoreceptor using a combination of pigments with different light absorption as necessary. It is also possible to use a combination of two or more types of compounds represented by formula (1), or a combination with a charge generating substance selected from known dyes and pigments.
本発明の有機被膜は、前述の光デイスク記録体や電子写
真感光体のレーザ感応被膜として用いる他に、赤外線カ
ットフィルター、太陽電池あるいは光センサーなどに１
ｉ、用いることができる。太陽電池は、例えば酸化イン
ジウムとアルミニウムを電極として、これらの間に前述
の有機被膜をサンドイッチ構造とすることによって調製
できる。The organic coating of the present invention can be used as a laser-sensitive coating for optical disc recording bodies and electrophotographic photoreceptors as described above, as well as for infrared cut filters, solar cells, optical sensors, etc.
i, can be used. A solar cell can be prepared, for example, by using indium oxide and aluminum as electrodes and sandwiching the above-mentioned organic film therebetween.
本発明の有機被膜は、従来のレーザ用電子写真感光体と
比較して７５０ ｎｍ以上の波長域で著しく高感度とす
ることができ、また従来の光デイスク記録体と比較して
も高感度でしかも十分に改善されたＳ／Ｎ比を与えるこ
とができる。さらに、本発明で用いる化合物は、７５０
ｎｒｎ以上に吸収ピークを有しているにもかかわらず
、熱に対して極めて安定している利点を有している。The organic film of the present invention can have significantly higher sensitivity in the wavelength range of 750 nm or more compared to conventional electrophotographic photoreceptors for lasers, and can also have higher sensitivity than conventional optical disk recording materials. Moreover, a sufficiently improved S/N ratio can be provided. Furthermore, the compound used in the present invention has 750
Although it has an absorption peak above nrn, it has the advantage of being extremely stable against heat.
以下、本発明を実施例に従って説明する。Hereinafter, the present invention will be explained according to examples.
実施例１゜
アルミニウムシリンダー上にカゼインのアンモニア水溶
液（カゼイン１１．２ｇ、２８％アンモニア水１ｇ、水
’２２２ｍｔ）ｆｆｉ浸清コ・−ティング法で塗工し、
乾燥して塗工量１．０ｇ／ｍ″の下引層を形５’ｉ、
した。Example 1 An ammonia aqueous solution of casein (11.2 g of casein, 1 g of 28% ammonia water, 222 mt of water) was coated on an aluminum cylinder using the ffi immersion coating method.
After drying, form a subbing layer with a coating weight of 1.0 g/m''.
did.
次に、前述の化合物Ａ（１）の化合物１重量部、ブチラ
ール樹脂（エスレツクＢＭ−２：積水化学■製）１重量
部とイソプロピルアルコール３０重量部をボールミル分
散機で４時間分散した。Next, 1 part by weight of the aforementioned compound A(1), 1 part by weight of butyral resin (Eslec BM-2, manufactured by Sekisui Chemical Co., Ltd.), and 30 parts by weight of isopropyl alcohol were dispersed for 4 hours using a ball mill disperser.
この分散液を先に形成した下引層の上に浸漬コーティン
グ法で塗工し、乾燥して電荷発生層を形成した。この時
の膜厚は０．３μであった。This dispersion was applied onto the previously formed subbing layer by a dip coating method and dried to form a charge generating layer. The film thickness at this time was 0.3μ.
次に、Ｐ−ジエチルアミノベンズアルデヒド−Ｎ−フェ
ニル−Ｎ−α−ナフチルヒドラゾン１重量部、ポリスル
ホン樹脂（Ｐ１７００ ：ユニ ′オンカーバイド社
製、）１重量部とモノクロルパフ９フ６重量ａｔ混合し
、攪拌機で攪拌溶解した。この液を電荷発生層の上に浸
漬コーティング法で塗工し、乾燥して電荷輸送層を形成
した。Next, 1 part by weight of P-diethylaminobenzaldehyde-N-phenyl-N-α-naphthylhydrazone, 1 part by weight of polysulfone resin (P1700, manufactured by Uni'on Carbide Co., Ltd.) and 6 parts by weight of 9 puffs of monochlor were mixed, and the mixture was mixed with a stirrer. Stir and dissolve. This liquid was applied onto the charge generation layer by dip coating and dried to form a charge transport layer.
この時の膜厚け、１２μであった。The film thickness at this time was 12 μm.
こうして調製した感光体に一５ＫＶのコロナ放電を行な
った。この時の表面電位を測定した（初期電位Ｖ。）。A corona discharge of 15 KV was applied to the photoreceptor thus prepared. The surface potential at this time was measured (initial potential V).
さらに、この感光体を５秒間暗所で放置した後の表面電
位を測定した（暗減衰Ｖａ ）。感度は、暗減衰した後
の電位Ｖ、を１／２に減衰するに必要な露光量（Ｅｌ／
２マイクロジュール／ｃＩＡ）を測定することによって
評価した。Furthermore, the surface potential of this photoreceptor was measured after it was left in a dark place for 5 seconds (dark decay Va). Sensitivity is defined as the amount of exposure (El/
2 microjoules/cIA).
この際、光源としてガリウム、アルミニウム・ヒ素半導
体レーザー（発振波長７８０ ｎｍ ）を用いた、これ
らの結果は、次のとおりであった。At this time, a gallium and aluminum arsenide semiconductor laser (oscillation wavelength: 780 nm) was used as a light source, and the results were as follows.
ＶＯ： −４８０ボルト
Ｖ６： ４６５ボルト
Ｅ、イ： ９．８マイクロジユ一ル／ｃＩＡ実施例２
．〜１０
実施例１で用いた化合物Ａ （１）の化合物に代えて、
第１表に示す化合物をそれぞれ用いたほかは、実施例１
と全く同様の方法で感光体を調製し、この感光体の特性
を測定した。これらの結果を第１表に示す。VO: -480 volts V6: 465 volts E, I: 9.8 micro units/cIA Example 2
．． ~10 Compound A used in Example 1 In place of compound (1),
Example 1 except that each compound shown in Table 1 was used.
A photoreceptor was prepared in exactly the same manner as described above, and the characteristics of this photoreceptor were measured. These results are shown in Table 1.
第１表
２ ４９０ ４７０ １０．３
３ ４７５ ４５０ ９．５
４ ４９０ ４６５ ８．８
５ ４８０ ４５５ １１．０
６ ５００ ４８０ １０．１
７ ４７０ ４４５ ８．５
８ ４８５ ４６０ ９．５
９ ４８０ ４６０ １１．２
１０ ４９０ ４８０ １０．８実施例１１゜
厚さ１００ミクロン厚のアルミ板上にカゼインのアンモ
ニア水溶液全塗布し、乾燥して膜厚１．１ミクロンの下
引層を形成した。Table 1 2 490 470 10.3 3 475 450 9.5 4 490 465 8.8 5 480 455 11.0 6 500 480 10.1 7 470 445 8.5 8 485 460 9.5 9 480 460 11. 2 10 490 480 10.8 Example 11 An ammonia aqueous solution of casein was completely coated on an aluminum plate with a thickness of 100 microns and dried to form a subbing layer with a thickness of 1.1 microns.
次［，２，４，７−トＩＪニトロ−９−フルオレノン５
ｇとポリ−Ｎ−ビニルカルバゾール（数平均分子量３０
０，０００ ）５ ｇｅテトラヒドロフラン７０ ｍｌ
に溶かして電荷移動錯化合物を形成した。Next[,2,4,7-toIJ nitro-9-fluorenone 5
g and poly-N-vinylcarbazole (number average molecular weight 30
0,000 ) 5 ge tetrahydrofuran 70 ml
to form a charge transfer complex.
この電荷移動錯化合物と前述の化合物＆（Ｂ）の化合物
１ｇをポリエステル樹脂（バイロン：東洋紡製）５ｇを
テトラヒドロフラン７０ ｍｌに溶がした液に加え、分
散した。との分散液を下引層の上に乾燥後の膜厚が１２
ミクロンとなる様にて
塗布し、乾燥した。こうし為調製した感光体の帯電特性
を実施例１と同様の方法で測定した。This charge transfer complex compound and 1 g of the above-mentioned compound &(B) were added to a solution of 5 g of polyester resin (Vylon, manufactured by Toyobo) dissolved in 70 ml of tetrahydrofuran, and dispersed. The film thickness after drying is 12.
It was applied to a micron thickness and dried. Therefore, the charging characteristics of the photoreceptor thus prepared were measured in the same manner as in Example 1.
これの結果は、次のとおりであった。但し、帯電極性は
のとした。The results of this were as follows. However, the charging polarity was set as .
Ｖｏ：５１０ボルト
ＶＰ：４８５ボルト
Ｅ、イ：１２．５マイクロジュール／一実施例１２゜
アルミ蒸着ポリエチレンテレフタレートフィルムのアル
ミ面上に膜厚１．１ミクロンのポリビニルアルコールの
被膜を形成した。Vo: 510 volts VP: 485 volts E, A: 12.5 microjoules/Example 1 A polyvinyl alcohol film having a thickness of 1.1 microns was formed on the aluminum surface of a 2° aluminum-deposited polyethylene terephthalate film.
次に、実施例１で用いた前述の化合物産（４）の化合物
の分散液を先に形成したポリビニルアルコール層の上に
乾燥後の膜厚が０．５ミクロンとなる様にマイヤーバー
で塗布し、乾燥して電荷発生層を形成した、
次に、構造式
のピラゾリン化合物５ｇとボリアリレート樹脂（ビスフ
ェノールＡとテレフタル酸−イノフタル酸の縮重合体）
５ｇをテトラヒドロ７ラン７０ｍ１ Ｋ溶かした液を電
荷発生層の上に乾燥後の膜厚が１０ミクロンとなる様に
塗布し、乾燥して電荷輸送層を形成した。Next, a dispersion of the compound (4) used in Example 1 was applied onto the previously formed polyvinyl alcohol layer using a Meyer bar so that the film thickness after drying was 0.5 microns. Next, 5 g of a pyrazoline compound having the structural formula and a polyarylate resin (condensation polymer of bisphenol A and terephthalic acid-inophthalic acid) were added.
A solution obtained by dissolving 5 g of tetrahydro 7 run in 70 ml of K was applied onto the charge generation layer so that the thickness after drying would be 10 microns, and dried to form a charge transport layer.
こうして調製した感光体の帯電特性を実施例１と同様の
方法によって測定した。これの結果は、次のとおりであ
った。The charging characteristics of the photoreceptor thus prepared were measured in the same manner as in Example 1. The results of this were as follows.
ｖｏ コ −４７０ボルト
Ｖ、： ４５０ボルト
鮨イ：１１．２マイクロジュール／−
前述の各実施例から判るとおり、本発明の電子写真感光
体は、７５０ ｎｍ以上の波長域で著しい高感度特性を
有するとともに、初期電位や暗減衰などの帯電特性に優
れている。vo -470 volts: 450 volts: 11.2 microjoules/- As can be seen from the above-mentioned examples, the electrophotographic photoreceptor of the present invention has extremely high sensitivity characteristics in the wavelength range of 750 nm or more. It also has excellent charging characteristics such as initial potential and dark decay.
実施例１３゜
ニトロセルロース溶液（ダイセル化学工業■製；オーバ
ーレスラッカー：ニトロセルロース２５重量％のメチル
エチルケトン溶液）１２重量部、前述の化合物産（４）
の化合物３重量部およびメチルエチルケトン７０重量部
を混合し、十分に攪拌した。この溶液をアルミ蒸着ガラ
ス板上に浸漬コーティング法により塗布した後、乾燥し
て０．６ ｇ／ｍｊの記録層を得た。Example 13 12 parts by weight of nitrocellulose solution (manufactured by Daicel Chemical Industries, Ltd.; overless lacquer: 25% by weight nitrocellulose solution in methyl ethyl ketone), produced from the above-mentioned compound (4)
3 parts by weight of the compound and 70 parts by weight of methyl ethyl ketone were mixed and thoroughly stirred. This solution was coated on an aluminum vapor-deposited glass plate by a dip coating method and then dried to obtain a recording layer of 0.6 g/mj.
こうして作成した光デイスク記録体をターンテーブル上
に取り付け、ターンテーブルをモータで１８０ Ｏｒｐ
ｍの回転を与えながら、スポットサイズ１．０ミクロン
に集束した５ｍＷおよび８ＭＨｚのガリウムーアルミニ
ウムーヒ素半導体レーザ（発振波長７８０ｎｍ）’（ｒ
記録層面にトラック状で照射して記録を行なった。The optical disc recording medium thus created was mounted on a turntable, and the turntable was rotated by a motor to 180 or
A 5 mW and 8 MHz gallium-aluminum-arsenide semiconductor laser (oscillation wavelength 780 nm)' (r
Recording was performed by irradiating the surface of the recording layer in the form of a track.
この記録された光ディスクの表面を走査型電子顕微鏡で
観察したところ、鮮明なピットが認められた。オだ、こ
の元ディスクに低出力のガリウムーアルミニウムーヒ素
半導体レーザを入射し、反射光の検知を行なったところ
、十分なＳ／Ｎ比を有する波形が得られた。When the surface of this recorded optical disc was observed using a scanning electron microscope, clear pits were observed. When a low-power gallium-aluminum-arsenide semiconductor laser was incident on this original disk and the reflected light was detected, a waveform with a sufficient S/N ratio was obtained.
実施例】４゜
前述の化合物層（５）の化合物５００ｍｇを蒸着用モリ
ブテンボートに入れ、Ｉ Ｘ １０ ｍｍＨｇ以下に排
気した後、アルミ蒸着ガラス板に蒸着した。EXAMPLE 4. 500 mg of the compound of the compound layer (5) described above was placed in a molybdenum boat for vapor deposition, evacuated to below I x 10 mmHg, and then vapor-deposited on an aluminum vapor-deposited glass plate.
蒸着中は真空室内の圧力が１０ ｍｍＨｇ以上に上昇し
ない様にヒーターを制御しながら、０．２ミクロンの蒸
着膜を形成させた。During the deposition, a 0.2-micron deposited film was formed while controlling the heater so that the pressure in the vacuum chamber did not rise above 10 mmHg.
こうして作成した光デイスク記録体に実施例１３と同様
の方法で情報を記憶させたところ、実施例１３と同様の
鮮明なピットが認められ、また実施例１３と同様の方法
で情報を再生したが、この際十分なＳ／Ｎ比を有する波
形が認められた。When information was stored in the optical disc recording medium thus prepared in the same manner as in Example 13, clear pits similar to those in Example 13 were observed, and information was reproduced in the same manner as in Example 13. At this time, a waveform with a sufficient S/N ratio was observed.
実施例１５゜
前述の化合物層αＱの化合物を実施例１３と同様の方法
でアルミ蒸着ガラス板の上に蒸着して、０．２ミクロン
の記録層を有する光デイスク記録体を作成した。Example 15 The compound of the compound layer αQ described above was vapor-deposited on an aluminum-deposited glass plate in the same manner as in Example 13 to prepare an optical disk recording medium having a recording layer of 0.2 microns.
この光デイスク記録体に実施例１３と同様の方法で情報
を記憶させてから、再生したところ、十分なＳ／Ｎ比を
有する波形が認められた。又、情報を書き込みした後の
記録層面を走査型電子顕微鏡で観察したところ、鮮明な
ピットが形成されていた。When information was stored on this optical disc recording medium in the same manner as in Example 13 and then reproduced, a waveform with a sufficient S/N ratio was observed. Further, when the surface of the recording layer after information was written was observed with a scanning electron microscope, clear pits were found to have been formed.
第１図および第２図は、本発明の有機被膜を光デイスク
記録体に用いた時の断面図で、第３図はこの光デイスク
記録体の実施態様を示す説明図である。
１・・・・・基板 ２・・・・・・有機被膜３・
・・・・・反射層 ４・・・・・レーザ光線５・・
・・・ピット
コ ２
３８
−1 and 2 are cross-sectional views when the organic film of the present invention is used in an optical disk recording medium, and FIG. 3 is an explanatory view showing an embodiment of this optical disk recording medium. 1...Substrate 2...Organic film 3.
...Reflection layer 4 ...Laser beam 5 ...
... Pitco 2 38 -
Claims (1)
徴とする有機被膜。 （式中Ｒ１はアルキル基、置換基を有していても良いフ
ェニル基又はスチリル基を表わす。 Ｒ７け隣接した２つの−ＣＨ＝ＣＨ−基と共役二重結合
系を形成する置換基を有していても良いアリーレン基を
表わす、Ｒｓは置換基を有していても良いフェニル基又
はす７ｆｋ基を表わす。Ａけアニオン残基を表わす、、
）[Scope of Claims] An organic film characterized by containing a compound represented by the following general formula (1). (In the formula, R1 represents an alkyl group, a phenyl group that may have a substituent, or a styryl group. R1 has a substituent that forms a conjugated double bond system with two adjacent -CH=CH- groups. Rs represents an arylene group which may have a substituent, Rs represents a phenyl group or a 7fk group which may have a substituent, A represents an anion residue,
)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57194349A JPS5984249A (en) | 1982-11-05 | 1982-11-05 | Organic coat |
| US06/526,533 US4501808A (en) | 1982-08-30 | 1983-08-25 | Recording medium and process employing a photosensitive organic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57194349A JPS5984249A (en) | 1982-11-05 | 1982-11-05 | Organic coat |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5984249A true JPS5984249A (en) | 1984-05-15 |
| JPH0211134B2 JPH0211134B2 (en) | 1990-03-13 |
Family
ID=16323099
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57194349A Granted JPS5984249A (en) | 1982-08-30 | 1982-11-05 | Organic coat |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5984249A (en) |
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| Publication number | Publication date |
|---|---|
| JPH0211134B2 (en) | 1990-03-13 |
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